JPS5856950B2 - Aperture device for electron microscopes, etc. - Google Patents
Aperture device for electron microscopes, etc.Info
- Publication number
- JPS5856950B2 JPS5856950B2 JP53151326A JP15132678A JPS5856950B2 JP S5856950 B2 JPS5856950 B2 JP S5856950B2 JP 53151326 A JP53151326 A JP 53151326A JP 15132678 A JP15132678 A JP 15132678A JP S5856950 B2 JPS5856950 B2 JP S5856950B2
- Authority
- JP
- Japan
- Prior art keywords
- optical axis
- aperture
- diaphragm
- hole
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Description
【発明の詳細な説明】
本発明は電子顕微鏡等に用いられる絞り装置における絞
り孔の位置合せに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to alignment of an aperture hole in an aperture device used in an electron microscope or the like.
電子顕微鏡に使用される絞り孔は例えば数十及全数百μ
mの如き極めて微小であるため、絞り孔の中心を光軸に
対して高精度に位置合せする必要がある。The aperture holes used in electron microscopes are, for example, several tens to several hundred microns in size.
Since the aperture hole is extremely small such as m, it is necessary to align the center of the aperture hole with high precision with respect to the optical axis.
そこで絞り装置には絞り板を微小移動させるための微調
整機構が組み込1れている。Therefore, the aperture device incorporates a fine adjustment mechanism for minutely moving the aperture plate.
しかして斯かる微調整機構としではイ・ジ機構を利用し
た機械的なものが従来一般に使用されて耘り、そのため
機構が複雑且つ大型化すると共に微調整操作が非常に難
かしくなる欠点を有していた。However, as such fine adjustment mechanisms, mechanical ones using an index mechanism have generally been used, which has the disadvantage that the mechanism is complicated and large, and fine adjustment operations are extremely difficult. Was.
本発明は斯様な不都合を解決することを目的とするもの
で、以下図面に基づき詳説する。The present invention aims to solve such inconveniences, and will be explained in detail below with reference to the drawings.
第1図は本発明の基本的構成を示す平面断面図で、1は
電子顕微鏡等の鏡体である。FIG. 1 is a plan sectional view showing the basic configuration of the present invention, and 1 is a mirror body of an electron microscope or the like.
2は該鏡体1の側壁に球体軸受3を介して移動且つ回動
可能に貫通して取付けられた保持体で、該保持体の軸心
は電子線の光軸Zと直交したX軸と一致するように釦か
れている。Reference numeral 2 denotes a holder attached to the side wall of the mirror body 1 through a spherical bearing 3 so as to be movable and rotatable, and the axis of the holder is aligned with the X axis perpendicular to the optical axis Z of the electron beam. Buttoned to match.
又該保持体の一端(真空側)には後述する圧電素子4を
介して数個の絞り孔5a 、5b 、5cを有する絞り
板6が取付けである。A diaphragm plate 6 having several diaphragm holes 5a, 5b, 5c is attached to one end (vacuum side) of the holder via a piezoelectric element 4, which will be described later.
該各校り孔5a、5b、5cは前記X軸に沿って略等間
隔に形成しである。The calibration holes 5a, 5b, and 5c are formed at approximately equal intervals along the X-axis.
前記保持体2の他端(大気側)には把持部7が設けてあ
り、該把持部7にはピン8が植設されている。A gripping portion 7 is provided at the other end (atmospheric side) of the holding body 2, and a pin 8 is implanted in the gripping portion 7.
該ピン8は前記側壁1に固定された案内体9に形成した
E字状の案内溝10内に係合され、それによって前記各
校り孔5a、5b、5cの位置が規制される。The pin 8 is engaged in an E-shaped guide groove 10 formed in a guide body 9 fixed to the side wall 1, thereby regulating the positions of the calibration holes 5a, 5b, and 5c.
っ1リピン8が同図中実線で示す位置にセットされたと
き、絞り孔5bの中心が略光軸上に位置し、又把持部7
を回転してピン8が案内溝10付号a又はbの位置にセ
ットされたとき、絞り孔5c又u5aの中心が夫々略光
軸2上に位置する。1. When the repin 8 is set at the position shown by the solid line in the figure, the center of the aperture hole 5b is located approximately on the optical axis, and the grip portion 7
When the pin 8 is set in the position indicated by number a or b in the guide groove 10, the center of the aperture hole 5c or u5a is located approximately on the optical axis 2, respectively.
11は前記鏡体1内にかかれた押し棒で、該押し棒の一
端は前記保持体2に当接しておシ、又他端は後述する圧
電素子12を介して前記鏡体1の内壁に固定されている
。Reference numeral 11 denotes a push rod placed inside the mirror body 1. One end of the push rod is in contact with the holder 2, and the other end is connected to the inner wall of the mirror body 1 via a piezoelectric element 12, which will be described later. Fixed.
前述した圧電素子4及び12は電圧を印加することによ
り機械的歪を生ずる物質で形成され、又該各圧電素子に
は夫々2つの電極板13a、13b及び14a及び14
bが貼着しており、その各電極板間に直流可変電源15
及び16から電圧を印加することにより圧電素子4及び
12は夫々絞り板6及び押し棒11の長手方向に伸長又
は収縮するように構成されている。The piezoelectric elements 4 and 12 described above are formed of a material that causes mechanical strain when a voltage is applied, and each piezoelectric element has two electrode plates 13a, 13b and 14a and 14, respectively.
b is attached, and a DC variable power supply 15 is attached between each electrode plate.
The piezoelectric elements 4 and 12 are configured to expand or contract in the longitudinal direction of the aperture plate 6 and the push rod 11, respectively, by applying voltages from the piezoelectric elements 4 and 16.
従って直流可変電源15により圧電素子4を伸縮させれ
ば絞り板6がX軸方向に微動する。Therefore, when the piezoelectric element 4 is expanded or contracted by the DC variable power source 15, the aperture plate 6 moves slightly in the X-axis direction.
又他方の直流電源16により圧電素子12を伸縮させれ
ば押し棒11が同方向に移動し、それによって保持棒2
が光軸Zと直交した平面内において球体軸受3を中心に
して回動するため、絞り板6が略Y軸方向に微動する。Furthermore, if the piezoelectric element 12 is expanded or contracted by the other DC power source 16, the push rod 11 moves in the same direction, and thereby the holding rod 2
rotates about the spherical bearing 3 in a plane perpendicular to the optical axis Z, so the diaphragm plate 6 slightly moves approximately in the Y-axis direction.
その結果直流可変電源15及び16を適宜に調整するこ
とにより絞り板6を任意方向に水平微動させることがで
きる。As a result, by appropriately adjusting the DC variable power supplies 15 and 16, the diaphragm plate 6 can be horizontally slightly moved in any direction.
そこで把持部7を操作して所望の絞り孔を略光軸上にセ
ットした後、図示外の螢光板上に投影されるこの絞りの
像を観察しながら2つの直流可変電源15.16を調整
すれば、所望とする絞り孔の中心を光軸Zに正確に一致
させることができる。After operating the grip part 7 to set the desired aperture hole approximately on the optical axis, the two variable DC power supplies 15 and 16 are adjusted while observing the image of this aperture projected on a fluorescent plate (not shown). In this way, the desired center of the aperture hole can be precisely aligned with the optical axis Z.
第2図は本発明の一実施例を示すもので、該実施例では
各校り孔の交換動作に連動して自動的に絞り孔位置の微
調整を行うことを特徴とするものであり、同図中第1図
と同一番号は同一構成要素を示す。FIG. 2 shows an embodiment of the present invention, which is characterized in that the aperture hole position is automatically finely adjusted in conjunction with the replacement operation of each calibration hole. In the figure, the same numbers as in FIG. 1 indicate the same components.
第2図において、17は記憶回路で、該記憶回路には把
持部7により各校り孔5a、5b、5cを光軸Z上にセ
ットしたときの各校り孔中心と光軸とのズレ量を補正す
るための信号が記憶されており、又該記憶された信号は
各校り孔5a、5b5cの位置規制を行うための案内溝
10部分に設置された例えばマロクロスインチの如き位
置検出器18a、18b、18cからの位置信号に基づ
いて読み出される。In FIG. 2, numeral 17 is a memory circuit, and the memory circuit stores the deviation between the center of each calibrating hole and the optical axis when each calibrating hole 5a, 5b, 5c is set on the optical axis Z by the grip part 7. A signal for correcting the amount is stored, and the stored signal is used for position detection such as a Maro cross inch installed in the guide groove 10 portion for regulating the position of each calibration hole 5a, 5b5c. The position signals are read out based on the position signals from the devices 18a, 18b, and 18c.
該記憶回路17から続み出された信号はX及びY方向用
直流電源19及び20に送られて該電源を制御し、各電
極板13aと13b及び14aと14b間に前記ズレ量
を補正する電圧を印加する。The signal continued from the memory circuit 17 is sent to the X and Y direction DC power supplies 19 and 20 to control the power supplies and correct the amount of deviation between each electrode plate 13a and 13b and 14a and 14b. Apply voltage.
しかして、今、把持部7を操作して図面中実線でその状
態を示すように絞り孔5bを光軸Z上にセットすると、
把持部7に設けたピン8が位置検出器18bと係合する
ため、該位置検出器18bから位置信号が発生して記憶
回路17に送られる。Now, if you operate the grip part 7 and set the aperture hole 5b on the optical axis Z as shown by the solid line in the drawing,
Since the pin 8 provided on the grip portion 7 engages with the position detector 18b, a position signal is generated from the position detector 18b and sent to the memory circuit 17.
これにより記憶回路17からは絞り孔5bにおける光軸
とのズレ量を補正する電圧値に対応する信号が読み出さ
れ、直流電源19及び20を経て電極板13aと13b
及び14aと14b間に印加されるので、各電圧素子4
及び12が絞り孔5bの光軸とのズレを補正する方向に
夫々伸長又は収縮し、絞り孔5bの中心は自動的に光軸
Z上に位置する。As a result, a signal corresponding to a voltage value for correcting the amount of deviation from the optical axis at the aperture hole 5b is read out from the memory circuit 17, and is passed through the DC power supplies 19 and 20 to the electrode plates 13a and 13b.
and 14a and 14b, so each voltage element 4
and 12 expand or contract, respectively, in the direction to correct the deviation from the optical axis of the aperture hole 5b, and the center of the aperture hole 5b is automatically positioned on the optical axis Z.
又把持部7により他の絞り孔5a及び5cを光軸Z上に
セットすればピン8が位置検出器18a及び18cに夫
々係合するため、前述と同様な動作により絞り孔5a及
び5cの中心は自動的に光軸Z上に位置する。Furthermore, if the other aperture holes 5a and 5c are set on the optical axis Z using the gripping part 7, the pins 8 will engage with the position detectors 18a and 18c, respectively, so that the centers of the aperture holes 5a and 5c can be set by the same operation as described above. is automatically located on the optical axis Z.
以上の如く構成することにより本発明は極めて簡単且つ
小型の構造にして絞り孔の光軸との位置合わせを高精度
で行うことができ、しかも絞シ孔位置の微調整を極めて
容易に行うことができる。By configuring as described above, the present invention has an extremely simple and compact structure, and can align the aperture hole with the optical axis with high precision, and furthermore, can perform fine adjustment of the aperture hole position extremely easily. I can do it.
又各校り孔の光軸とのズレ量を補正する信号記憶回路を
用いることにより絞り孔の交換動作に連動して自動的に
絞り中心を光軸に一致させることが可能となるため、よ
り一層取扱い操作の向上をはかることができ、実用性大
なる効果を有する。In addition, by using a signal memory circuit that corrects the amount of misalignment between each calibration hole and the optical axis, it becomes possible to automatically align the aperture center with the optical axis in conjunction with the operation of replacing the aperture holes. It is possible to further improve the handling operation and has a great practical effect.
伺、前述の説明は本発明の例示であり、実施にあたって
は幾多の変形が考えられる。Please note that the above description is an example of the present invention, and many modifications may be made to its implementation.
例えば前述の説明では絞り板に3個の絞り孔を設けた場
合について述べたが、その個数に限定されるものではな
い。For example, in the above description, the case where three aperture holes are provided in the aperture plate is described, but the number is not limited to this.
又、絞り孔の交換は手動で行う場合について述べたが、
例えばモータ等を利用して電気的に行うことも可能であ
る。Also, although I have described the case where the aperture hole is replaced manually,
For example, it is also possible to perform this electrically using a motor or the like.
第1図は本発明の基本的構成を示す平面断面図、第2図
は本発明の一実施例を示す平面断面図である。
第1図にお・いて、1は電子顕微鏡の鏡体、2は保持体
、3は球体軸受、4及び12は圧電素子、5a 、5b
及び5cu絞り孔、6は絞り板、γは把持部、8はピン
、9は案内体、10は案内溝、11は押し棒、13a、
13b、14a及び14bは電極板、15及び16は直
流可変電源である。FIG. 1 is a sectional plan view showing the basic configuration of the present invention, and FIG. 2 is a sectional plan view showing an embodiment of the present invention. In Fig. 1, 1 is the mirror body of an electron microscope, 2 is a holder, 3 is a spherical bearing, 4 and 12 are piezoelectric elements, 5a, 5b
and 5cu aperture hole, 6 is the aperture plate, γ is the grip part, 8 is the pin, 9 is the guide body, 10 is the guide groove, 11 is the push rod, 13a,
13b, 14a and 14b are electrode plates, and 15 and 16 are DC variable power supplies.
Claims (1)
に保持するための保持部材と、該保持部材を移動させる
ことにより前記絞り孔のうちの任意の孔を選択的に前記
光軸上に位置付けるための機械的位置付は手段とを備え
た装置において、前記保持部材に取り付けられ電圧を印
加することにより機械的歪を生じる部材と、該機械的歪
を生じる部材に電圧を印加するための電源と、前記各孔
が該機械的位置付は手段によって位置付けられる際の光
軸からのづれを補正するための信号を記憶するための記
憶手段と、前記絞り孔のうちのどの絞り孔が光軸上に配
置されているかを表わす信号に基づいて前記記憶手段か
ら対応する補正信号を読み出し、該続み出された補正信
号に基づいて前記電源の出力を制御する手段とを備えた
ことを特徴とする電子顕微鏡等における絞り装置。1. A diaphragm plate having a plurality of diaphragm holes, a holding member for holding the diaphragm plate on a mirror body, and an arbitrary one of the diaphragm holes being selectively fixed by moving the holding member. A mechanical positioning device for positioning on the optical axis, a member that is attached to the holding member and generates mechanical strain by applying a voltage; and a member that generates mechanical strain by applying a voltage to the member. a storage means for storing a signal for correcting deviation from the optical axis when each of the apertures is positioned by the mechanical positioning means; means for reading out a corresponding correction signal from the storage means based on a signal indicating whether the aperture hole is arranged on the optical axis, and controlling the output of the power supply based on the read-out correction signal. A diaphragm device for an electron microscope, etc., characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53151326A JPS5856950B2 (en) | 1978-12-06 | 1978-12-06 | Aperture device for electron microscopes, etc. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53151326A JPS5856950B2 (en) | 1978-12-06 | 1978-12-06 | Aperture device for electron microscopes, etc. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5578453A JPS5578453A (en) | 1980-06-13 |
| JPS5856950B2 true JPS5856950B2 (en) | 1983-12-17 |
Family
ID=15516157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53151326A Expired JPS5856950B2 (en) | 1978-12-06 | 1978-12-06 | Aperture device for electron microscopes, etc. |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5856950B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0619962B2 (en) * | 1986-06-17 | 1994-03-16 | 日電アネルバ株式会社 | Charge beam device |
| JPH0743935Y2 (en) * | 1986-09-19 | 1995-10-09 | 日本電子株式会社 | Sample moving device for electron microscope |
| JPS63152145U (en) * | 1987-03-27 | 1988-10-06 | ||
| US5920073A (en) * | 1997-04-22 | 1999-07-06 | Schlumberger Technologies, Inc. | Optical system |
-
1978
- 1978-12-06 JP JP53151326A patent/JPS5856950B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5578453A (en) | 1980-06-13 |
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