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JPS588734B2 - Sample gas sampling device - Google Patents
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JPS588734B2 - Sample gas sampling device - Google Patents

Sample gas sampling device

Info

Publication number
JPS588734B2
JPS588734B2 JP53051496A JP5149678A JPS588734B2 JP S588734 B2 JPS588734 B2 JP S588734B2 JP 53051496 A JP53051496 A JP 53051496A JP 5149678 A JP5149678 A JP 5149678A JP S588734 B2 JPS588734 B2 JP S588734B2
Authority
JP
Japan
Prior art keywords
water
gas
sample gas
cleaning
sampling device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53051496A
Other languages
Japanese (ja)
Other versions
JPS54145185A (en
Inventor
金子輝男
上田伸也
杉本啓介
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP53051496A priority Critical patent/JPS588734B2/en
Priority to DE2917274A priority patent/DE2917274A1/en
Priority to GB7914655A priority patent/GB2020016B/en
Publication of JPS54145185A publication Critical patent/JPS54145185A/en
Publication of JPS588734B2 publication Critical patent/JPS588734B2/en
Expired legal-status Critical Current

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  • Sampling And Sample Adjustment (AREA)

Description

【発明の詳細な説明】 本発明は試料ガスサンプリング装置に係り、特に試料ガ
スを吸引する洗浄エゼクタのノズル部に供給される洗浄
水中に除塵された清浄な試料ガスを混入させることによ
り水中の浴解ガス成分と試料ガス成分とを濃度平衡させ
るようにした試料ガスサンプリング装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a sample gas sampling device, and more particularly, the present invention relates to a sample gas sampling device, and more particularly, to a sample gas sampling device, in which a clean sample gas from which dust has been removed is mixed into cleaning water supplied to a nozzle portion of a cleaning ejector that sucks a sample gas. The present invention relates to a sample gas sampling device that balances the concentrations of dissolved gas components and sample gas components.

排ガスの成分を調べるためこ、採取された排ガスを直接
ガス分析計へ導入すると、排ガス中のダスト、ミスト、
水分等によって分析計が汚損されたり、測定成分に干渉
する成分が混入したりして正確な分析結果が得られない
In order to investigate the components of exhaust gas, when the collected exhaust gas is introduced directly into a gas analyzer, dust, mist,
Accurate analysis results cannot be obtained because the analyzer is contaminated by moisture or other components that interfere with the measured components are mixed in.

そこで、通常は、試料ガスとして採取された排ガスをガ
ス分析計へ導入する前に排ガスサンプリング装置を使っ
て必要な前処理を施している。
Therefore, normally, the exhaust gas sampled as a sample gas is subjected to necessary pretreatment using an exhaust gas sampling device before being introduced into the gas analyzer.

この種の排ガスサンプリング装置として、従来、金網フ
ィルタや口紙フィルタを使って除塵することが行われて
いたが、この方式によれば、フィルタの清掃や交換など
の保守が厄介であったり、また水溶性の腐蝕成分が含ま
れている場合には別の手段で除去しなければならなかっ
た。
Conventionally, this type of exhaust gas sampling device has used a wire mesh filter or a mouthpiece filter to remove dust, but with this method, maintenance such as filter cleaning and replacement is troublesome, and If water-soluble corrosive components were present, they had to be removed by other means.

さらに、この方式とは別の方式として洗浄水がノズル部
に供給されるエゼクタを使って試料ガスを吸引し、洗浄
水によって排ガス中のダストや水溶性の腐蝕成分を除去
する方式があるが、02分析の場合、洗浄水中の醇存酸
素が加って高い分析値を表示したり、C02分析の場合
に洗浄水中へのCO2の溶解のために低い分析値を表示
したりする欠点があった。
Furthermore, there is another method that uses an ejector in which cleaning water is supplied to the nozzle section to suck in the sample gas, and uses the cleaning water to remove dust and water-soluble corrosive components from the exhaust gas. In the case of 02 analysis, a high analysis value was displayed due to the addition of residual oxygen in the wash water, and in the case of C02 analysis, a low analysis value was displayed due to the dissolution of CO2 in the wash water. .

そこで、近時洗浄水を循環させて洗浄水と試料ガスの濃
度とを平衡させる方式が試みられている。
Therefore, a method has recently been attempted in which the cleaning water is circulated to balance the concentration of the cleaning water and the sample gas.

しかしながら、この場合洗浄水が段々とダストを含んで
汚れてくると、排ガス中のイオウ酸化物(S02,SO
3など)が洗浄水中に溶解し、洗浄水が酸性となって腐
蝕性が高まり、そのために、洗浄タンク、洗浄エゼクタ
、導管、水ガス分離器、水ポンプ等の設備機器を耐蝕性
材料で構成しなければならなくなって設備費の高とうを
招来するという問題があった。
However, in this case, as the cleaning water gradually becomes contaminated with dust, sulfur oxides (S02, SO2) in the exhaust gas
3 etc.) dissolve in the cleaning water, making the cleaning water acidic and increasing its corrosivity. Therefore, equipment such as cleaning tanks, cleaning ejectors, conduits, water gas separators, water pumps, etc. must be constructed of corrosion-resistant materials. There was a problem in that this resulted in high equipment costs.

そこで、本発明の目的は、上述した従来の装置が有する
欠点を解消し、試料ガス中のダスト、ミストおよび水溶
性の腐蝕成分を除去した清浄な試料ガスをガス分析計へ
導入できる安価な試料ガスサンプリング装置を提供する
ことにある。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the drawbacks of the conventional apparatus described above and to provide an inexpensive sample gas that can introduce clean sample gas from which dust, mist, and water-soluble corrosive components have been removed into a gas analyzer. An object of the present invention is to provide a gas sampling device.

しかして前述の目的を達成するため、本発明装置によれ
ば、排ガス採取器と、洗浄水タンクおよび洗浄エゼクタ
を直列に接続して構成され、かつ前記洗浄エゼクタが前
記排ガス採取器と接続された洗浄水供給系路と、水ガス
分離器およびガス分析計を直列に接続して構或され、か
つ前記水ガス分離器が前記洗浄エゼクタと接続された分
析試料ガス供給系路と、帰環管路を有し、この管路を介
して前記分析試料ガス供給系路を前記洗浄水タンクに接
続する平衡試料ガス供給系路とを備えてなることを特徴
とする。
In order to achieve the above-mentioned object, the device of the present invention is constructed by connecting an exhaust gas sampling device, a cleaning water tank, and a cleaning ejector in series, and the cleaning ejector is connected to the exhaust gas sampling device. A cleaning water supply system line, an analysis sample gas supply system line configured by connecting a water gas separator and a gas analyzer in series, and in which the water gas separator is connected to the cleaning ejector, and a return pipe. and an equilibrium sample gas supply line connecting the analysis sample gas supply line to the wash water tank via the line.

以上本発明による試料ガスサンプリング装置の一実施例
を図を参照して説明する。
An embodiment of the sample gas sampling device according to the present invention will be described above with reference to the drawings.

図は本発明こよる試料ガスサンプリング装置の系路の全
体をブロック図で示しており、全体の系路は、洗浄水供
給系路Aと分析試料ガス供給系路Bと平衡試料ガス供給
系路Cとから構成されている。
The figure shows the entire system of the sample gas sampling device according to the present invention in a block diagram. It is composed of C.

上記洗浄水供給系路Aは、洗浄水タンク1、水ポンプ2
および洗浄エゼクタ3を直列こ接続してなり、洗浄水タ
ンク1内には水供給管路4を通して新規な洗浄水が供給
される。
The cleaning water supply system A includes a cleaning water tank 1 and a water pump 2.
and a cleaning ejector 3 are connected in series, and new cleaning water is supplied into the cleaning water tank 1 through a water supply pipe 4.

また、図中符号5は排ガスの採取器を示しており、採取
器5によって採取された試料ガスとしての排ガスは、洗
浄エゼクタ3内に吸引され洗浄水と強制的に混合させら
れる。
Further, reference numeral 5 in the figure indicates an exhaust gas sampler, and the exhaust gas as a sample gas sampled by the sampler 5 is sucked into the cleaning ejector 3 and forcibly mixed with cleaning water.

上記分析試料ガス供給系路Bは、管路6上に水ガス分離
器1、フィルタ8、除湿器9およびガス分析計10を順
次直列に接続して構成されている。
The analysis sample gas supply line B is constructed by sequentially connecting a water gas separator 1, a filter 8, a dehumidifier 9, and a gas analyzer 10 in series on a pipe line 6.

上記水ガス分離器1は、器内で試料ガスと洗浄水とを分
離し、洗浄水はドレン管11より排水シールポット(図
示せず)へ排出される。
The water gas separator 1 separates sample gas and cleaning water within the vessel, and the cleaning water is discharged from a drain pipe 11 to a drainage seal pot (not shown).

また、上記フィルタ8および除湿器9で除去された水分
はドレンポット12へ排出される。
Further, the water removed by the filter 8 and the dehumidifier 9 is discharged to the drain pot 12.

一方,上記平衡試料ガス供給系路Cは、上記ガス分析計
10より導出され前記洗浄水タンク1に導かれる帰環管
路13を有し、この管路13上にはガスボンプ14が組
込まれている。
On the other hand, the equilibrium sample gas supply line C has a return line 13 led out from the gas analyzer 10 and led to the washing water tank 1, and a gas pump 14 is installed on this line 13. There is.

しかして、上記ガス分析計10の前後こは、バイパス管
路15が迂回接続され、さらに、バイパス菅路15から
は排出管路16が分岐しCいる。
A bypass pipe line 15 is connected in a detour manner before and after the gas analyzer 10, and furthermore, a discharge pipe line 16 branches off from the bypass pipe line 15.

なお、符号11は、それぞれ管路上に組込まれた流量計
を示している。
In addition, the code|symbol 11 has shown the flow meter incorporated in each pipe path.

このようこ構成された実施例において、採取器5によっ
て採取された試料ガスとしての排ガスは、洗浄タンク1
より水ポンプ2を通して洗浄エゼクタ3のノズル部こ供
給された洗浄水と混合され、管路6を通して水ガス分離
器1へ供給される。
In the embodiment configured in this way, the exhaust gas as the sample gas collected by the collector 5 is transferred to the cleaning tank 1.
The water is then mixed with the washing water supplied to the nozzle of the washing ejector 3 through the water pump 2, and is supplied to the water gas separator 1 through the pipe line 6.

この水ガス分離器γの内で洗浄水と試料ガスとは気水分
離され、洗浄水はドレン管11より排水されると共に、
除塵されて清浄こなった試料ガスは、フィルタ8、除湿
器9を通して一部はガス分析計10へ送られ、ここで試
料ガスの成分が分析される。
The cleaning water and the sample gas are separated in the water gas separator γ, and the cleaning water is drained from the drain pipe 11.
Part of the sample gas that has been cleaned and dust-removed is sent to a gas analyzer 10 through a filter 8 and a dehumidifier 9, where the components of the sample gas are analyzed.

一方、清浄となった試料ガスの大部分は、バイパス管路
15を通してガスポンプ14によって送り出され、上記
洗浄水タンク1内の供給水中へ吹き込まれ、水と試料ガ
スとがかくはん接触される。
On the other hand, most of the purified sample gas is sent out by the gas pump 14 through the bypass line 15 and blown into the supply water in the wash water tank 1, so that the water and the sample gas are stirred and brought into contact.

その結果、洗浄水タンク1の中で供給水中に含まれた溶
存空気は除去され、水中のm解ガス成分と試料ガス成分
との濃度は平衡状態となる。
As a result, the dissolved air contained in the supplied water in the wash water tank 1 is removed, and the concentrations of the m-resolved gas component and the sample gas component in the water are brought to an equilibrium state.

なお、ガス分析計10内の試料ガスの圧力を大気圧に維
持するためには、バイパス管路15に流す清浄な試料ガ
スの流量を大きくすることが望ましい。
Note that in order to maintain the pressure of the sample gas in the gas analyzer 10 at atmospheric pressure, it is desirable to increase the flow rate of the clean sample gas flowing into the bypass pipe 15.

以上の説明から明らかなように、本発明によれば、ダス
トやミストや水啓性の腐蝕成分等を除去した試料ガスを
、新規な洗浄水の供給を受ける洗浄水タンク内に供給し
、供給水中の溶解ガス成分と試料ガス成分とを濃度平衡
させた新鮮な水を洗浄エゼクタのノズル部へ供給して試
料ガスと接触させるようこしたから、洗浄水からの溶存
酸素の放出や洗浄水へのffこ伴なう分析の測定誤差を
低減することができる。
As is clear from the above description, according to the present invention, a sample gas from which dust, mist, water-permeable corrosive components, etc. have been removed is supplied into a cleaning water tank that receives new cleaning water supply. Fresh water with concentrations of dissolved gas components and sample gas components in the water equilibrated was supplied to the nozzle of the cleaning ejector and brought into contact with the sample gas, thereby preventing the release of dissolved oxygen from the cleaning water and the ff It is possible to reduce measurement errors in analysis.

また、洗浄水を生成し、流通させる緒設備機器に対する
耐蝕性を考慮しなくとも良いから装置を安価こ構成でき
る。
Furthermore, since there is no need to consider the corrosion resistance of the equipment that generates and distributes the cleaning water, the apparatus can be constructed at low cost.

なお、バイパス管路15を設けないで、ガス分析計10
の排出ガスのみを洗浄水タンク1内に供給するようにし
てもよい。
Note that the gas analyzer 10 is not provided with the bypass line 15.
It is also possible to supply only the exhaust gas into the wash water tank 1.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明による試料ガスサンプリング装置の一実施例
を示した系統図である。 A・・・洗浄水供給系路、B・・・分析試料ガス供給系
路、C・・・平衡試料ガス供給系路、1・・・洗浄水タ
ン久,2・・・水ポンプ、3・・・洗浄エゼクタ、5・
・・採取器、7・・・水ガス分離器、10・・・ガス分
析計、13・・・帰壌管路、14・・・ガスポンプ、1
5・・・バイパス管路。
The figure is a system diagram showing an embodiment of the sample gas sampling device according to the present invention. A...Washing water supply system line, B...Analysis sample gas supply system line, C...Equilibrium sample gas supply system line, 1...Washing water tank, 2...Water pump, 3.・・Cleaning ejector, 5・
... Sampler, 7... Water gas separator, 10... Gas analyzer, 13... Return pipe, 14... Gas pump, 1
5...Bypass pipeline.

Claims (1)

【特許請求の範囲】[Claims] 1 排ガス採取器と、洗浄水タンクおよび洗浄エゼクタ
を直列に接続して構成され、かつ前記洗浄エゼクタが前
記排ガス採取器と接続された洗浄水供給系路と、水ガス
分離器およびガス分析計を直列に接続して構成され、か
つ前記水ガス分離器が前記洗浄エゼクタと接続された分
析試料ガス供給系路と、帰環管路を有し、この管路を介
して前記分析試料ガス供給系路を前記洗浄水タンクに接
続する平衡試料ガス供給系路とを備えてなる試料ガスサ
ンプリング装置。
1. A cleaning water supply line configured by connecting an exhaust gas sampling device, a cleaning water tank, and a cleaning ejector in series, and in which the cleaning ejector is connected to the exhaust gas sampling device, a water gas separator, and a gas analyzer. The water gas separator is configured to be connected in series and has an analysis sample gas supply line connected to the cleaning ejector, and a return pipe, and the analysis sample gas supply system is connected through this pipe. an equilibrium sample gas supply system line connecting the line to the wash water tank.
JP53051496A 1978-04-30 1978-04-30 Sample gas sampling device Expired JPS588734B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP53051496A JPS588734B2 (en) 1978-04-30 1978-04-30 Sample gas sampling device
DE2917274A DE2917274A1 (en) 1978-04-30 1979-04-27 PROCESS AND DEVICE FOR THE PROCESSING OF UNCLEANED GAS MIXTURES AS SAMPLE GAS FOR GAS ANALYSIS
GB7914655A GB2020016B (en) 1978-04-30 1979-04-27 Winter gas washing and analysis apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53051496A JPS588734B2 (en) 1978-04-30 1978-04-30 Sample gas sampling device

Publications (2)

Publication Number Publication Date
JPS54145185A JPS54145185A (en) 1979-11-13
JPS588734B2 true JPS588734B2 (en) 1983-02-17

Family

ID=12888573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53051496A Expired JPS588734B2 (en) 1978-04-30 1978-04-30 Sample gas sampling device

Country Status (1)

Country Link
JP (1) JPS588734B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58195051A (en) * 1982-05-04 1983-11-14 ナウチノ−イスレドワ−チエルスキ−・インスチツ−ト・チエフノロギ−・トラクトルノボ・イ・セルスコフオズイアイストベンノボ・マシノストロエニア Composite oil ring

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58195051A (en) * 1982-05-04 1983-11-14 ナウチノ−イスレドワ−チエルスキ−・インスチツ−ト・チエフノロギ−・トラクトルノボ・イ・セルスコフオズイアイストベンノボ・マシノストロエニア Composite oil ring

Also Published As

Publication number Publication date
JPS54145185A (en) 1979-11-13

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