JPS5910998B2 - Manufacturing method of amorphous alloy - Google Patents
Manufacturing method of amorphous alloyInfo
- Publication number
- JPS5910998B2 JPS5910998B2 JP5830576A JP5830576A JPS5910998B2 JP S5910998 B2 JPS5910998 B2 JP S5910998B2 JP 5830576 A JP5830576 A JP 5830576A JP 5830576 A JP5830576 A JP 5830576A JP S5910998 B2 JPS5910998 B2 JP S5910998B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- amorphous
- amorphous alloy
- plating bath
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/24—Alloys obtained by cathodic reduction of all their ions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
【発明の詳細な説明】
本発明は非晶質(アモルファス)合金の製造方5 法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an amorphous alloy.
近年、非晶質合金はその構造と物理的性質(特に熱的、
電気的及び磁気的性質)、更には力学的性質の点で注目
されはじめている。In recent years, amorphous alloys have been developed to improve their structure and physical properties (especially thermal,
It is beginning to attract attention for its electrical and magnetic properties) as well as its mechanical properties.
即ち、非晶質合金の一般的な特長として下記のものが考
えられ″o る。(1)機械的強度が実用金属材料に比
べて高く、実用金属材とウィスカ−との中間であること
。That is, the following are considered to be the general features of amorphous alloys: (1) Mechanical strength is higher than that of practical metal materials, and is intermediate between that of practical metal materials and whiskers.
(2)剛性率が結晶金属に比べて20〜40%低いこと
。15(3)殆んど加工硬化がないこと。(2) The rigidity is 20 to 40% lower than that of crystalline metals. 15(3) Almost no work hardening.
(4)電気抵抗が一般に高いこと。(4) Electrical resistance is generally high.
(5)Cr等の添加によつて耐食性が著しく向上するこ
と。(5) Corrosion resistance is significantly improved by adding Cr or the like.
(6)高透磁住を有するものの製造が可能であるこフ0
と。(6) It is possible to manufacture products with high magnetic permeability.
and.
従来此種の非晶質合金の製造方法としては、スパッタリ
ングによる方法、容融物の急冷法(例えばガン法、ピス
トンアンビル法、圧延法、遠心法)等が知られているが
、後者の急冷法の方が一般的25に行なわれている。Conventionally, known methods for producing this type of amorphous alloy include sputtering, rapid cooling of a melt (e.g. gun method, piston anvil method, rolling method, centrifugal method), etc. The method is more commonly practiced25.
この方法によれば、Fe系金属と、非晶質元素(例えば
P、C、B、Si)の2種以上とを一旦溶解せしめ、こ
れを冷却してから粉砕し、再び溶解せしめ、これを吹き
付ける等して急冷することにより非晶質化するようにし
て鍜 いる。この結果、非晶質合金被膜を形成すること
は出来るが、Feの融点が高く、共晶温度を下げて製造
を容易にするために非晶質元素を少なくとも2種類含有
させることが必要となる。従つて例えばFe−Pの2元
素からなる合金を製造するこ35とは不可能であわ、然
も急冷法によるプロセスは非常に面倒なものである。ま
た合金被膜の膜厚をコントロールしたわ或いは合金被膜
の形状のパターンを様々なものとするのは困難である。
本発明は上述の如き欠陥を是正すべく発明されたもので
あつて、その第1の発明は、FesO4・7H20とし
で計算して100〜5009/tに相当する2価Feイ
オンと、NaH2pO2・H2Oとして計算して8〜3
09/tに相当する次亜リン酸及び/又は次亜リン酸塩
とを主として含有するメツキ浴を用いて、PHl.O〜
2.2、温度30〜50℃、電流密度5〜20A/Di
2の条件下で電気メツキするFe−Pを主体とする非晶
質合金の製造方法に係るものである。According to this method, an Fe-based metal and two or more types of amorphous elements (for example, P, C, B, and Si) are once dissolved, cooled, crushed, and melted again. It is then quenched by spraying or other means to make it amorphous. As a result, it is possible to form an amorphous alloy film, but since the melting point of Fe is high, it is necessary to include at least two types of amorphous elements in order to lower the eutectic temperature and facilitate manufacturing. . Therefore, it is impossible to manufacture an alloy consisting of two elements, for example Fe--P, and the rapid cooling process is extremely troublesome. Furthermore, it is difficult to control the thickness of the alloy coating or to vary the shape of the alloy coating.
The present invention was invented to correct the above-mentioned defects, and the first invention consists of divalent Fe ions corresponding to 100 to 5009/t calculated as FesO4.7H20, and NaH2pO2. Calculated as H2O 8-3
Using a plating bath mainly containing hypophosphorous acid and/or hypophosphite corresponding to PHL. O~
2.2, temperature 30~50℃, current density 5~20A/Di
The present invention relates to a method for producing an amorphous alloy mainly composed of Fe-P, which is electroplated under the conditions of 2.
本発明の第2の発明は、FeSO4・7H20としで計
算して100〜500g/tに相当する2価Feイオン
と、NaH2PO2・H2Oとして計算して8〜309
/tに相当する次亜リン酸及び/又は次亜リン酸塩と、
スルフアミン酸ニツケル及び/又はスルフアミン酸コバ
ルトとして計算して109/t以下のNiイオン及び/
又はCOイオンとを主として含有するメツキ浴を用いて
、PHl.O〜2.2、温度30〜50℃、電流密度5
〜20A/d!? の条件下で電気メツキすることによ
り、60〜88at%のFeと、0より大かつ10at
%以下のNi及び/又はCOと、12〜30at%のP
とを含む非晶質合金の製造方法に係るものである。The second invention of the present invention has divalent Fe ions equivalent to 100 to 500 g/t calculated as FeSO4.7H20 and 8 to 309 g/t calculated as NaH2PO2.H2O.
/t of hypophosphorous acid and/or hypophosphite;
Ni ions and/or 109/t or less calculated as nickel sulfamate and/or cobalt sulfamate
Or, using a plating bath mainly containing CO ions, PHL. O~2.2, temperature 30~50℃, current density 5
~20A/d! ? By electroplating under the conditions of 60 to 88 at% Fe and a
% or less of Ni and/or CO and 12 to 30 at% of P
The present invention relates to a method for producing an amorphous alloy comprising:
これらの方法によつて、1種の非晶質元素を用いて非晶
質合金を極めて簡単に製造することが出来、然も非晶質
元素の量を少なくすることが出来、また合金の膜厚及び
形状のコントロールも非常に簡単となる。次に本発明の
方法によつて製造される非晶質合金の成分の割合を上述
の範囲に限定した理由を説明すると、まずFeを60〜
88at%(原子数の割合)としたのは、Feが60a
t%未満ではメツキの付きが悪くなbかつまたP濃度が
増えて磁束密度Bmが低下してしまい、またFeが88
at%を越えるとP濃度が減少して非晶質(アモルフア
ス)合金とならないからである。By these methods, it is possible to manufacture an amorphous alloy using one type of amorphous element very easily, and the amount of the amorphous element can be reduced, and the alloy film can be manufactured very easily. The thickness and shape can also be controlled very easily. Next, to explain the reason why the proportions of the components of the amorphous alloy produced by the method of the present invention are limited to the above range, first, Fe is
The reason for the 88 at% (ratio of the number of atoms) is that Fe is 60a
If it is less than t%, the plating will be poor b, the P concentration will increase and the magnetic flux density Bm will decrease, and Fe will be 88
This is because if it exceeds at%, the P concentration will decrease and an amorphous alloy will not be formed.
またPを12〜30at%としたのは、上記のFeの害
拾と丁度逆の関係からPが12at%味満では非晶質合
金が得られ難く、またPが30at%を越えると電気抵
抗が高くなりすぎてメツキの付きが悪くなDかつまた磁
束密度Bmが低下してしまうからである。第1図には、
後述するメツキ条件を満足した状態でメツキを行なつた
場合のメツキ浴中のPの濃度とメツキ被膜中のPの濃度
との関係が示されている。In addition, the P content was set at 12 to 30 at% because of the exact opposite relationship to the above-mentioned negative effects of Fe, so it is difficult to obtain an amorphous alloy when the P content is 12 at%, and when the P content exceeds 30 at%, the electrical resistance This is because D becomes too high, resulting in poor plating and also a decrease in magnetic flux density Bm. In Figure 1,
The relationship between the concentration of P in the plating bath and the concentration of P in the plating film is shown when plating is performed while satisfying the plating conditions described below.
これによれば析出物(即ち合金)中のPの濃度が12a
t%未満となれば、非晶質とな勺にくいことが分る。ま
た第2図には、後述するスルフアミン酸浴を用いて後述
するメツキ条件を満足した状態で、メツキ浴のPHを変
化させた場合にメツキ被膜中のPの濃度が変化する状態
が示されているが、これによつても析出物(即ち合金)
中のPの濃度が12at%以上でないと、非晶質になわ
にくいことが分る。なお本発明の方法によつ製造される
非晶質合金は上述のFe及びP以外に、例えばNi,C
O等をO−10at(F6含有するFe−Ni−P系、
Fe一CO−P系、Fe−Ni−CO−P系等の非晶質
合金であつてもよい。According to this, the concentration of P in the precipitate (i.e. alloy) is 12a
It can be seen that if it is less than t%, it is difficult to become amorphous. Furthermore, Fig. 2 shows how the concentration of P in the plating film changes when the pH of the plating bath is changed using a sulfamic acid bath, which will be described later, and satisfying the plating conditions described below. However, this also results in the formation of precipitates (i.e. alloys).
It can be seen that unless the concentration of P in the material is 12 at% or more, it is difficult to form an amorphous state. Note that the amorphous alloy produced by the method of the present invention contains, in addition to the above-mentioned Fe and P, for example, Ni, C
O etc. at O-10at (Fe-Ni-P system containing F6,
It may be an amorphous alloy such as Fe-CO-P system or Fe-Ni-CO-P system.
また更にCr等を1〜2at%含有せしめて合金の耐食
性を向上させることも出来るが、この場合CrがCr3
+としてメツキ浴中に存在していないとFe2+をFe
3+に酸化させてしまうので望ましくか八また本発明に
よる非晶質合金の製造方法に卦いて、メツキ浴の主成分
である2価のFeイオンは、硫酸第一鉄(FeSO4)
、スルフアミン酸鉄(Fe(NH2SO.3)2)等、
或いはこれらの混合物のようにFe2+を供給するもの
から得られる。It is also possible to improve the corrosion resistance of the alloy by further containing 1 to 2 at% of Cr, but in this case Cr is Cr3
Fe2+ is Fe if it is not present in the bath as +.
In addition, in the method for producing an amorphous alloy according to the present invention, divalent Fe ions, which are the main component of the plating bath, are preferably oxidized to ferrous sulfate (FeSO4).
, iron sulfamate (Fe(NH2SO.3)2), etc.
Alternatively, it can be obtained from sources that supply Fe2+, such as mixtures thereof.
またメツキ浴の他方の主成分はPの供給源であつて、次
亜リン酸(H3PO2)、次亜リン酸塩、或いはこれら
の混合物を用いるが、この次亜リン酸塩としては次亜リ
ン酸ナトリウム(NaH2PO2)、次亜リン酸カリウ
ム(KH2PO2戸?く挙げられる。次にメツキの原理
を概略的に述べると、例えばFesO4はFe2+とS
O42− に解離してFe2+が陰極側に移動し、ここ
で還元されてFeとして電着される。また次亜リン酸塩
、例えばNaH2pO2は一旦Na+と(H2PO2)
−に解離し、これらはH2OによつてNaOHとH3P
O2となるが、このうちNaOHはメツキ浴のPHが低
いためにNa2SO4に変化してしまう。The other main component of the plating bath is a source of P, and hypophosphorous acid (H3PO2), hypophosphite, or a mixture thereof is used. Sodium acid (NaH2PO2) and potassium hypophosphite (KH2PO2) are often mentioned.Next, to outline the principle of Metsuki, for example, FesO4 is a combination of Fe2+ and S
Fe2+ dissociates into O42- and moves to the cathode side, where it is reduced and electrodeposited as Fe. Also, hypophosphite, for example, NaH2pO2, once becomes Na+ (H2PO2)
- dissociates into NaOH and H3P by H2O
However, since the pH of the plating bath is low, NaOH changes to Na2SO4.
従つて次亜リン酸塩はほとんどがH3PO2となり、こ
れからPが供給されるものと考えられる。な卦NaH2
PO2のNaはこの試薬を安定化させる作用をする。Therefore, most of the hypophosphite becomes H3PO2, and it is thought that P is supplied from this. Naka NaH2
The Na in PO2 acts to stabilize this reagent.
本発明によるメツキ浴は下記の基本組成から成り、下記
の条件下で電気メツキするのが望ましい。The plating bath according to the present invention has the following basic composition and is preferably electroplated under the following conditions.
この場合、L−アスコルビン酸はFe2+の安定化剤と
して作用する。また上記基本組成の成分以外に、Niの
供給源として適量の硫酸ニツケル(NiSO4・7H2
0)、COの供給源として適量の硫酸コバルト(COS
O4・7H20)を添加してもよい。またホウ酸(H3
BO3)や塩化アンモニウム(NH4Ct)??加して
もよい。メツキ条件としてPHが上記の範囲から外れ、
1.0未満になるとPの濃度が増えてメツキの付きが悪
くなり、2.2を越えるとメツキは付くが非晶質のメツ
キにするのが困難となる。In this case, L-ascorbic acid acts as a stabilizer for Fe2+. In addition to the above basic composition, an appropriate amount of nickel sulfate (NiSO4.7H2) is used as a source of Ni.
0), an appropriate amount of cobalt sulfate (COS) as a source of CO
O4.7H20) may be added. Also, boric acid (H3
BO3) or ammonium chloride (NH4Ct)? ? You may add As a plating condition, the PH is out of the above range,
If it is less than 1.0, the P concentration increases and plating becomes difficult, and if it exceeds 2.2, plating will occur but it will be difficult to form an amorphous plating.
また電流密度が上記の範囲から外れ、5A/Dm2未満
になるとメツキが困難となD、20A/Diを越えると
電極に焼けが生じるので好ましくない。また浴温もあま
り高すぎるとメツキ浴の成分が沈澱してしまう。第3図
には、メツキ浴のPH.5Fe系の酸化還元電位Ehと
の関係ぎ示されている力(これによればFeとFe2+
との間の酸化還元電位は−0.47mVであつてPH=
0〜6では一定である。Further, if the current density deviates from the above-mentioned range and becomes less than 5 A/Dm2, plating becomes difficult, and if it exceeds 20 A/Di, the electrode will be burnt, which is not preferable. Furthermore, if the bath temperature is too high, the components of the plating bath will precipitate. Figure 3 shows the pH of the plating bath. The relationship between the redox potential Eh of the 5Fe system is also shown (according to this, Fe and Fe2+
The redox potential between is -0.47mV and PH=
It is constant between 0 and 6.
第4図には、メッキ浴のPHとP系の酸化還元電位Eh
との関係が示されているが、FeとPとの共晶によるF
e−P系共晶合金をメツキするためには、Feに関する
上記酸化還元電位(−0.47mV)とPに関する酸化
還元電位とが接近していなければならない。ところ力第
4図によれば、PHが2以上になれば、PとH3PO2
又はH2POiとの間の酸化還元電位が非常に低下する
傾向があり、従つてFeの上記酸化還元電位ではPが共
折されにくく、非晶質のものが得難いことが分る。この
ため第4図に卦いて、Pの酸化還元電位に近づけた状態
で非晶質合金を川るにはPHを2.2以下、好ましくは
1.5〜2.0にすることが必要である。また本発明に
よるメツキ浴は上記基本組成を変更したものであつてよ
く、FeSO4・7H20の代りに★〜→モルのスルフ
アミン酸鉄を用いてよく、またこの変更した基本組成に
対し、低活性及び光沢性付与のためにO〜130g/t
の尿素を、PHを調節してバツフア作用をする20〜6
0g/tのスルフアミン酸アンモニウムを、少量の光沢
剤を夫々添加してもよい。また適量のスルフアミン酸ニ
ツケルやスルフアミン酸コバルトを添加することにより
、Fe−Ni又はCO−P系非晶質合金とすることも出
来る。本発明による上述のメツキ浴を用いて非晶質合金
を製造する際には、メツキの前処理として、例えばCu
試験片からなる被メツキ物をまずトリクレン蒸気に脱脂
洗浄し、次いで例えば30g/tのメタレツクスwスペ
シヤル(マクダーミド社製の商品名)にて陰極洗浄して
から後水洗し、本メッキに入つた。Figure 4 shows the PH of the plating bath and the redox potential Eh of the P system.
However, F due to the eutectic of Fe and P
In order to plate an e-P eutectic alloy, the redox potential (-0.47 mV) for Fe and the redox potential for P must be close to each other. However, according to Figure 4, if PH becomes 2 or more, P and H3PO2
It can be seen that the oxidation-reduction potential between Fe and H2POi tends to be extremely low, and therefore, at the above-mentioned oxidation-reduction potential of Fe, it is difficult to co-fract P and it is difficult to obtain an amorphous material. Therefore, as shown in Figure 4, in order to flow an amorphous alloy in a state close to the redox potential of P, it is necessary to set the pH to 2.2 or less, preferably 1.5 to 2.0. be. Furthermore, the plating bath according to the present invention may have a modified basic composition, and instead of FeSO4.7H20, ★~→mol of iron sulfamate may be used. O~130g/t for glossiness
20-6, which adjusts the pH and has a buffering effect on urea.
0 g/t of ammonium sulfamate and a small amount of brightener may be added respectively. Furthermore, by adding an appropriate amount of nickel sulfamate or cobalt sulfamate, it is possible to form an Fe--Ni or CO--P based amorphous alloy. When producing an amorphous alloy using the above-mentioned plating bath according to the present invention, for example, Cu
The test piece to be plated was first degreased and cleaned using Triclean vapor, then cathodically cleaned using, for example, 30 g/t Metalex W Special (trade name, manufactured by MacDermid Co., Ltd.), and then rinsed with water before entering the actual plating.
また他の前処理として、At試験片をトリクレン蒸気で
洗浄し、次いでZn又はSn置換法によりシアン化銅浴
からCuストライク(即ち薄いCu膜を付けること)を
行ない、更にピロリン酸銅浴からCuメツキした後に本
メツキに入つた。本メツキは、以下に述べる本発明の各
実施例によるメツキ浴で行なつた。Other pretreatments include cleaning the At specimen with trichlene vapor, followed by Cu strike (i.e., applying a thin Cu film) from a copper cyanide bath using the Zn or Sn substitution method, and then Cu strike (i.e., applying a thin Cu film) from a copper pyrophosphate bath. After finishing the mitsuki, I started the hon-metsuki. The main plating was carried out using plating baths according to the following examples of the present invention.
実施例 1 下記の組成の酸性メツキ浴を調製した。Example 1 An acid plating bath having the following composition was prepared.
そしてこのメツキ浴を用い、下記の条件でメツキを行な
つた。Using this plating bath, plating was performed under the following conditions.
この結果、第5図に示す如く、厚さ0.2朗程度のAt
試験片1上の厚さlμ程度のCu膜2には、Fe−P系
の非晶質合金メツキ被膜3が厚さ30〜100μ(例え
ば50μ程度)に析出した。As a result, as shown in Fig. 5, an At
On the Cu film 2 having a thickness of about lμ on the test piece 1, an Fe-P based amorphous alloy plating film 3 was deposited to a thickness of 30 to 100μ (for example, about 50μ).
このメツキ被膜3のみを取出すには、At試験片1をま
ずNaOH又はKOHでエツチング除去し、更にCu膜
2をNH4OH+NH4Ctで電解エツチングして除去
すればよい。本実施例によれば、メツキ被膜3の膜厚は
メツキ浴の成分の濃度、PH、電流密度等のコントロー
ルによつて自由に変えることが出来る。In order to remove only the plating film 3, the At test piece 1 should first be removed by etching with NaOH or KOH, and then the Cu film 2 should be removed by electrolytic etching with NH4OH+NH4Ct. According to this embodiment, the thickness of the plating film 3 can be freely changed by controlling the concentration of the components of the plating bath, pH, current density, etc.
またCu膜2の表面に所定パターンのメツキレジスト層
(図示せず)を被着しておけば、このメツキレジスト層
が存在しない部分にメツキ被膜3を付けられるから、メ
ツキレジスト層の形状によつて様様なパターンのメツキ
被膜を容易に形成することが出来る。次に以上のように
して製遺したFe−P系の合金についてX線回析を行な
つたところ、第6図に示す如く、プロードなスペクトル
を示し、結晶質特有のピークは現われなかつた。Furthermore, if a plating resist layer (not shown) with a predetermined pattern is deposited on the surface of the Cu film 2, the plating film 3 can be applied to areas where this plating resist layer does not exist, so depending on the shape of the plating resist layer. Plating films with various patterns can be easily formed. Next, when X-ray diffraction was performed on the Fe--P alloy produced in the above manner, it showed a broad spectrum as shown in FIG. 6, and no peaks characteristic of crystallinity appeared.
また、磁気天秤による磁化量の温度変化を第7図に示し
たが、これによれば温度上昇に伴なつて磁化量が低下し
、300℃を越えたあたうで結晶質であれば点線のよう
に磁化量が低下してゼロ(キユリ一点)となるのに、本
実施例による非晶質合金の場合、磁化量がゼロにならず
温度上昇に伴なつて磁化量が上昇することが分る。この
磁化量の上昇は、非晶質が結晶化することによう生じる
ものであり、従つて本実施例により製造されたメツキ被
膜は非晶質のものであることが明らかである。また第8
図には、メツキ被膜を示差熱分析した結果が示されてい
るが、これによれば磁化量の上記上昇(第7図)が起こ
る温度に卦いて非晶質の結晶化によつて示差熱での発熱
反応か起こつていることが明らかである。なお本実施例
により得られたFe−P系非晶質合金は例えばFe85
.lpl4.9からなb、磁束密度Bm=13200g
aussであつた。Figure 7 shows the change in magnetization with temperature using a magnetic balance, and it shows that as the temperature rises, the magnetization decreases, and if the temperature exceeds 300°C and it is crystalline, then the dotted line shows It can be seen that although the magnetization decreases to zero (single point), in the case of the amorphous alloy according to this example, the magnetization does not become zero and increases as the temperature rises. . This increase in magnetization is caused by the crystallization of amorphous material, and it is therefore clear that the plating film produced in this example is amorphous. Also the 8th
The figure shows the results of differential thermal analysis of the plating film, which shows that at the temperature at which the above-mentioned increase in magnetization (Figure 7) occurs, differential heat is generated due to crystallization of the amorphous material. It is clear that an exothermic reaction is occurring. The Fe-P amorphous alloy obtained in this example is, for example, Fe85.
.. b from lpl4.9, magnetic flux density Bm=13200g
It was auss.
また上記のメツキ浴中にNi又はCO等の金属イオンを
添加することによつて、Fe−Ni−P系又はFe−C
O−P系の非晶質合金も製造可能であつた。以上説明し
たように、Feの供給源であるFesO4とPの供給源
であるNaH2PO2とを主成分とする酸性メツキ浴を
用いて電気メツキするようにしているから、従来不可能
であつたFe−Pの2元素からなる非晶質合金を製造す
ることが可能となつた。In addition, by adding metal ions such as Ni or CO to the above plating bath, Fe-Ni-P system or Fe-C
It was also possible to manufacture O-P type amorphous alloys. As explained above, electroplating is carried out using an acidic plating bath whose main components are FesO4, which is a source of Fe, and NaH2PO2, which is a source of P. It has now become possible to produce an amorphous alloy consisting of two elements, P.
然もメツキ法によるものであるから、従来法と比べてそ
の操作が極めて簡単となり、また非晶質元素であるPの
量も比較的少なくなる。本実施例による非晶質合金は従
来の非晶質合金の有する諸特性を具備している。即ち、
機械的強度が高く、加工硬化が殆んどなく、剛性率が比
較的低く、電気抵抗が高く、然も高透磁性を有したもの
となり、磁性材料をはじめ、強度が要求される小物部品
や複合材料、板材、線材等に非常に有用である。実施例
2
本実施例では下記の組成の酸性メ
した。Since it is based on the plating method, the operation is extremely simple compared to conventional methods, and the amount of P, which is an amorphous element, is relatively small. The amorphous alloy according to this example has various properties of conventional amorphous alloys. That is,
It has high mechanical strength, almost no work hardening, relatively low rigidity, high electrical resistance, and high magnetic permeability, making it suitable for small parts that require strength, including magnetic materials. Very useful for composite materials, plates, wires, etc. Example 2 In this example, an acidic solution having the following composition was used.
ツキ浴を調製 そしてこのメツキ浴を用い、 キを行なつた。Prepare a lucky bath Then, using this metal bath, I did this.
下記の条件でメツ
上記メツキ浴ではNaH2PO2・H2Oを前記実施例
1よりも少なくしているが、前記実施例1で述べたと同
様のFe−P系非晶質合金を製造することが出来た。Although the content of NaH2PO2.H2O in the above plating bath was lower than that in Example 1, an Fe--P amorphous alloy similar to that described in Example 1 could be produced under the following conditions.
実施例 3
本実施例では下記の組成の酸性メツキ浴を用い前記実施
例2と同一条件でメツキを行なつた。Example 3 In this example, plating was carried out under the same conditions as in Example 2 using an acidic plating bath having the composition shown below.
このメツキ浴から製造された非晶質合金はFe85Ni
2.lPl2.9からなつていた。この合金もX線回析
したところ第6図と同様にプロードなスペクトルが得ら
れ、またその他の特性も前記実施例1で得られたものと
同様であつた。実施例 4
本実施例では下記の組成の酸性メツキ浴を用い、前記実
施例2と同一条件でメツキを行なつた。The amorphous alloy produced from this plating bath is Fe85Ni
2. lPl was 2.9. When this alloy was subjected to X-ray diffraction, a broad spectrum similar to that shown in FIG. 6 was obtained, and other characteristics were also similar to those obtained in Example 1. Example 4 In this example, plating was carried out under the same conditions as in Example 2 using an acidic plating bath having the following composition.
このメッキ浴から製造された非晶質合金はFe−CO−
P係であり、その組成はFe84.lCO2.8Pl3
.lであつた。実施例 5
本実施例では下記の組成の酸性メツキ浴を調製した。The amorphous alloy produced from this plating bath is Fe-CO-
P group, its composition is Fe84. lCO2.8Pl3
.. It was l. Example 5 In this example, an acid plating bath having the following composition was prepared.
そしてこのメツキ浴を用い、下記の条件でメツキを行な
つた。Using this plating bath, plating was performed under the following conditions.
上記メツキ浴から析出したFe−P系の合金についてX
線回析を行なつたところ、第9図に示すスペクトルaに
示す如く、プロードなスペクトルが得られたが、シヤー
ブなピークを示すd一鉄のスペクトルbと比較すれば本
実施例による合金は非晶質のものであることを表わして
いる。Regarding the Fe-P alloy precipitated from the above plating bath
When line diffraction was performed, a broad spectrum was obtained as shown in spectrum a shown in FIG. This indicates that it is amorphous.
また本実施例による合金は、分析の結果、Fe87.2
Pl2.8の組成を有して訃り、磁気天秤による磁気量
の測定結果は磁束密度Bm=14200gaussであ
り、その温度特性は第10図に示す如くになつた。即ち
温度上昇に伴なつて磁化量が減少するが、点線で示す結
晶質のものとは違つて更に温度を上げた場合に逆に磁化
量が増えた。これは結晶化によるものであり、本実施例
による合金が明らかに非晶質であることを示している。
また示差熱分析の結果を示す第11図によれば、温度上
昇に伴なつて吸熱反応から発熱反応を起こすようになる
が、これは非晶質の結晶化によるものであることを示し
ている。な卦比較のために、上記メツキ浴のPHを2.
27としてメツキした場合、第9図のスペクトルbで示
すようなα一鉄の(110)のピークが現われ、この合
金メツキは非晶質ではないことが分る。Moreover, as a result of analysis, the alloy according to this example has Fe87.2
The material had a composition of Pl 2.8, and the measurement result of the magnetic quantity using a magnetic balance was that the magnetic flux density Bm was 14,200 gauss, and its temperature characteristics were as shown in FIG. That is, the amount of magnetization decreases as the temperature rises, but unlike the crystalline material shown by the dotted line, the amount of magnetization increases when the temperature is further increased. This is due to crystallization and shows that the alloy according to this example is clearly amorphous.
Furthermore, according to Figure 11, which shows the results of differential thermal analysis, as the temperature rises, the endothermic reaction turns into an exothermic reaction, which indicates that this is due to crystallization of the amorphous substance. . For comparison, the pH of the plating bath was set to 2.
When plated as No. 27, a (110) peak of α-iron appears as shown in spectrum b in FIG. 9, indicating that this alloy plating is not amorphous.
実施例 6本実施例では、前記実施例5で述べたメツキ
浴に卦いて、NaH2PO2・H2Oを42g/tに増
加させ、かつH3BO3を20g添加した。Example 6 In this example, in addition to the plating bath described in Example 5, NaH2PO2.H2O was increased to 42 g/t and 20 g of H3BO3 was added.
そしてこのメツキ浴を用い、下記の条件でメツキを行な
つた。PHl.68
上記メツキ浴から析出したFe−P系の合金のX線回析
は第9図に示したスペクトルaと同様であり、やはり非
晶質であることを示している。Using this plating bath, plating was performed under the following conditions. PHL. 68 The X-ray diffraction of the Fe--P alloy deposited from the plating bath is similar to spectrum a shown in FIG. 9, indicating that it is amorphous.
また本実施例による合金は、分析の結果、Fe7l.8
P28.2の組成を有して}り、磁束密度Bm=120
00gaussであつた。実施例 7
本実施例では、前記実施例5で述べたメツキ浴に更にス
ルフアミン酸ニツケルを2.0g/t添加してメツキを
行なつたが、得られた合金メツキ被膜はFe87.2N
iO.4Pl2.4の組成を有していた。Further, as a result of analysis, the alloy according to this example has Fe7l. 8
It has a composition of P28.2}, and magnetic flux density Bm=120
It was 00gauss. Example 7 In this example, plating was performed by adding 2.0 g/t of nickel sulfamate to the plating bath described in Example 5, and the resulting alloy plating film was Fe87.2N.
iO. It had a composition of 4Pl2.4.
この合金を磁気天秤で測定したところ、磁束密度Bm=
13700gaussであり,磁気量の温度特性及び示
差熱分析の結果は第10図及び第11図に示したものと
殆んど差がなかつた。実施例 8
本実施例では、前記実施例5で述べたメツキ浴に更にス
ルフアミン酸ニツケルを10g/t添加してメッキを行
なつたが、得られた合金メツキ被膜はFe85.2Ni
l.9Pl2.9の組成を有しており、また磁束密度B
m=13300gaussであつた。When this alloy was measured with a magnetic balance, the magnetic flux density Bm=
13,700 gauss, and the temperature characteristics of magnetic quantity and the results of differential thermal analysis had almost no difference from those shown in FIGS. 10 and 11. Example 8 In this example, 10 g/t of nickel sulfamate was further added to the plating bath described in Example 5 for plating, and the resulting alloy plating film was Fe85.2Ni.
l. It has a composition of 9Pl2.9 and a magnetic flux density of B
m=13300 gauss.
実施例 9本実施例では、前記実施例5で述べたメツキ
浴に更にスルフアミン酸コバルトを5g/t添加してメ
ツキを行なつたところ、得られた合金メツキ被膜はFe
85.2cOl.8pl8.Oの組成を有して訃り、磁
束密度Bm=13500gaussであつた。Example 9 In this example, plating was performed by adding 5 g/t of cobalt sulfamate to the plating bath described in Example 5, and the resulting alloy plating film was made of Fe.
85.2 cOl. 8pl8. It had a composition of O, and the magnetic flux density Bm was 13,500 gauss.
またその磁化量の温度特性及び示差熱分析の結果は第1
0図及び第11図に示したものと殆んど変化がなかつた
。本発明は上述の如く、Feが60〜88at%、Pが
12〜30at%としているから、非晶質合金特有の諸
特性を有する非晶質合金を製造することができる。In addition, the temperature characteristics of the magnetization amount and the results of differential thermal analysis are the first
There was almost no change from what was shown in Figures 0 and 11. As described above, in the present invention, since Fe is 60 to 88 at% and P is 12 to 30 at%, an amorphous alloy having various characteristics unique to an amorphous alloy can be manufactured.
またこの非晶質合金を電気メツキで製造するようにして
いるから、1種の非晶質元素Pを用いて非晶質合金を極
めて簡単に製造出来、然も膜厚及び形状のコントロール
も非常に容易である。In addition, since this amorphous alloy is manufactured by electroplating, it is possible to manufacture the amorphous alloy extremely easily using one kind of amorphous element P, and the film thickness and shape can be controlled very easily. Easy to use.
図面は本発明による非晶質合金を説明するためのもので
あつて、第1図はメツキ浴中のP濃度とメツキ析出物の
P濃度との関係及び非晶質領域を示す曲線図、第2図は
メツキ浴のPHとメツキ析出物のP濃度の関係及び非晶
質領域を示す曲線図、第3図はメツキ浴のPHとFe系
の酸化還元卯粒Ehとの関係を示すダイヤグラム、第4
図はメツキ浴のPHとP系の酸化還元電位Ehとの関係
を示すダイヤグラム、第5図はFe−P系非晶質合金メ
ツキ被膜が析出したA1試験片の断面図、第6図はFe
−P系非晶質合金のX線回析スペクトル図、第7図はそ
の磁化量の温度特性を示す曲線図、第8図はその示差熱
分析の結果を示す曲線図、第9図は別のFe−P系非晶
質合金及びd一鉄のX線回析スペクトル図、第10図は
その非晶質合金の磁化量の温度特性を示す曲線図、第1
1図はその示差熱分析の結果を示す曲線図である。The drawings are for explaining the amorphous alloy according to the present invention, and FIG. 1 is a curve diagram showing the relationship between the P concentration in the plating bath and the P concentration in the plating precipitate and the amorphous region. Figure 2 is a curve diagram showing the relationship between the PH of the plating bath and the P concentration of the plating precipitate and the amorphous region, and Figure 3 is a diagram showing the relationship between the PH of the plating bath and the Fe-based redox grains Eh. Fourth
The figure is a diagram showing the relationship between the PH of the plating bath and the redox potential Eh of the P system, Figure 5 is a cross-sectional view of the A1 specimen on which the Fe-P amorphous alloy plating film was deposited, and Figure 6 is the diagram showing the relationship between the PH of the plating bath and the P-based redox potential Eh.
- An X-ray diffraction spectrum diagram of the P-based amorphous alloy, Figure 7 is a curve diagram showing the temperature characteristics of its magnetization, Figure 8 is a curve diagram showing the results of its differential thermal analysis, and Figure 9 is a separate diagram. Fig. 10 is a curve diagram showing the temperature characteristics of the magnetization amount of the amorphous alloy;
Figure 1 is a curve diagram showing the results of differential thermal analysis.
Claims (1)
500g/lに相当する2価Feイオンと、NaH_2
PO_2・H_2Oとして計算して8〜30g/lに相
当する次亜リン酸及び/又は次亜リン酸塩とを主として
含有するメッキ浴を用いて、pH1.0〜2.2、温度
30〜50℃、電流密度5〜20A/dm^2の条件下
で電気メッキすることにより、Fe−Pを主体とする非
晶質合金を製造するようにした非晶質合金の製造方法。 2 FeSO_4・7H_2Oとして計算して100〜
500g/lに相当する2価Feイオンと、NaH_2
PO_2・ H_2Oとして計算して8〜30g/lに
相当する次亜リン酸及び/又は次亜リン酸塩と、スルフ
ァミン酸ニッケル及び/又はスルファミン酸コバルトと
して計算して10g/l以下のNiイオン及び/又はC
oイオンとを主として含有するメッキ浴を用いて、pH
1.0〜2.2、温度30〜50℃、電流密度5〜20
A/dm^2の条件下で電気メッキすることにより、6
0〜88at%のFeと、0より大かつ10at%以下
のNi及び/又はCoと、12〜30at%のPとを含
む非晶質合金を製造するようにした非晶質合金の製造方
法。[Claims] 100~calculated as 1 FeSO_4.7H_2O
Divalent Fe ions equivalent to 500g/l and NaH_2
Using a plating bath mainly containing hypophosphorous acid and/or hypophosphite corresponding to 8 to 30 g/l calculated as PO_2.H_2O, pH 1.0 to 2.2, temperature 30 to 50. A method for manufacturing an amorphous alloy, which comprises manufacturing an amorphous alloy mainly composed of Fe--P by electroplating under the conditions of .degree. C. and a current density of 5 to 20 A/dm^2. 2 Calculated as FeSO_4・7H_2O 100~
Divalent Fe ions equivalent to 500g/l and NaH_2
Hypophosphorous acid and/or hypophosphite corresponding to 8 to 30 g/l calculated as PO_2・H_2O, and Ni ions and/or not more than 10 g/l calculated as nickel sulfamate and/or cobalt sulfamate. / or C
Using a plating bath mainly containing o ions, pH
1.0-2.2, temperature 30-50℃, current density 5-20
By electroplating under the condition of A/dm^2, 6
A method for producing an amorphous alloy comprising 0 to 88 at% Fe, greater than 0 and 10 at% Ni and/or Co, and 12 to 30 at% P.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5830576A JPS5910998B2 (en) | 1976-05-20 | 1976-05-20 | Manufacturing method of amorphous alloy |
| CA278,543A CA1072910A (en) | 1976-05-20 | 1977-05-16 | Method of manufacturing amorphous alloy |
| US05/797,241 US4101389A (en) | 1976-05-20 | 1977-05-16 | Method of manufacturing amorphous alloy |
| NL7705464A NL7705464A (en) | 1976-05-20 | 1977-05-17 | METHOD OF MAKING AN AMORPHIC ALLOY. |
| GB20931/77A GB1519125A (en) | 1976-05-20 | 1977-05-18 | Methods of manufacturing amorphous alloy |
| FR7715357A FR2352076A1 (en) | 1976-05-20 | 1977-05-18 | PROCESS FOR MANUFACTURING AN AMORPHIC ALLOY AND THE ALLOY OBTAINED |
| DE19772722946 DE2722946A1 (en) | 1976-05-20 | 1977-05-20 | METHOD FOR PRODUCING AMORPHIC ALLOY |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5830576A JPS5910998B2 (en) | 1976-05-20 | 1976-05-20 | Manufacturing method of amorphous alloy |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26041284A Division JPS60145392A (en) | 1984-12-10 | 1984-12-10 | Production of amorphous alloy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52140403A JPS52140403A (en) | 1977-11-24 |
| JPS5910998B2 true JPS5910998B2 (en) | 1984-03-13 |
Family
ID=13080506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5830576A Expired JPS5910998B2 (en) | 1976-05-20 | 1976-05-20 | Manufacturing method of amorphous alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5910998B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1993023583A1 (en) * | 1992-05-14 | 1993-11-25 | Mitsubishi Rayon Co., Ltd. | Amorphous alloy and production thereof |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60165384A (en) * | 1984-02-09 | 1985-08-28 | C Uyemura & Co Ltd | Iron-phosphorus electroplating bath |
| JPS63202081A (en) * | 1987-02-18 | 1988-08-22 | Aisin Seiki Co Ltd | Amorphous magnetic material by plating method |
| EP0422760A1 (en) * | 1989-10-12 | 1991-04-17 | Mitsubishi Rayon Co., Ltd | Amorphous alloy and process for preparation thereof |
| CA2576752A1 (en) * | 2007-02-02 | 2008-08-02 | Hydro-Quebec | Amorpheous fe100-a-bpamb foil, method for its preparation and use |
| KR101693514B1 (en) * | 2015-12-24 | 2017-01-06 | 주식회사 포스코 | Fe-Ni-P ALLOY MULTILAYER STEEL SHEET AND METHOD FOR MANUFACTURING THE SAME |
-
1976
- 1976-05-20 JP JP5830576A patent/JPS5910998B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1993023583A1 (en) * | 1992-05-14 | 1993-11-25 | Mitsubishi Rayon Co., Ltd. | Amorphous alloy and production thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52140403A (en) | 1977-11-24 |
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