JPS5911536B2 - How to make a quartz glass tube - Google Patents
How to make a quartz glass tubeInfo
- Publication number
- JPS5911536B2 JPS5911536B2 JP54075620A JP7562079A JPS5911536B2 JP S5911536 B2 JPS5911536 B2 JP S5911536B2 JP 54075620 A JP54075620 A JP 54075620A JP 7562079 A JP7562079 A JP 7562079A JP S5911536 B2 JPS5911536 B2 JP S5911536B2
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- tube
- cylindrical tube
- glass
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma- or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma- or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01853—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】
本発明は高精度で高純度の石英ガラス管を、気相反応に
より作製する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a highly precise and highly pure quartz glass tube by a gas phase reaction.
従来、石英ガラス管を作製する方法として、第１５１図
に示すような方法が知られている。Conventionally, a method as shown in FIG. 151 is known as a method for manufacturing a quartz glass tube.
この方法は石英ガラスの原石である水晶や砂石を粉砕し
た後、グラファイトやモリブデンなど高温度の融点を有
するるつぼ内で溶融して溶融された石英ガラスとし、る
つぼ底面の中心軸上に設けたダイスにフｏ より、流出
させて石英ガラス管を得るものである。すなわち水晶等
の微粉体をるつぼ２の中に入れ、電気炉３で２２００℃
〜２５００℃の高温に加熱して溶融させ、るつぼ２の底
にある穴４から溶融された石英ガラス１を流出させる。
同時にるつぼク５２の中心軸上に設けたダイス５により
中空の石英ガラス管を得る方法である。この方法で得ら
れる石英ガラス管はるつぼ材、ダイスと接触するので、
石英ガラス管の内壁、外壁面上に゛キズ”がつき易く、
エアラインと呼ば３０れる線状の気泡が発生したり、る
つぽ材から不純物が取り込まれる。This method involves crushing quartz crystal and sandstone, which are the raw materials for quartz glass, and then melting graphite or molybdenum in a crucible that has a high melting point to create molten quartz glass. A quartz glass tube is obtained by pouring the foam into a die. That is, a fine powder such as crystal is placed in a crucible 2 and heated to 2200°C in an electric furnace 3.
The melted quartz glass 1 is heated to a high temperature of ~2500° C. to melt it, and the molten quartz glass 1 is flowed out from the hole 4 at the bottom of the crucible 2.
At the same time, a hollow quartz glass tube is obtained using a die 5 provided on the central axis of a crucible 52. Since the quartz glass tube obtained by this method comes into contact with the crucible material and the die,
Scratches easily form on the inner and outer walls of quartz glass tubes.
Linear air bubbles called airlines are generated and impurities are taken in from the crucible material.
また石英ガラス管の寸法は、穴径とダイスの寸法により
規定されるので、きわめて精度の高いるつぼを作製しな
ければならない。Furthermore, since the dimensions of the quartz glass tube are determined by the hole diameter and the dimensions of the die, the crucible must be manufactured with extremely high precision.
しかもこの方法３５によると、るつぼの底の穴から溶融
した石英ガラスを流出させる時のダイスの位置、または
所望の石英ガラス管の内径・外径比に合わせた寸法のる
っぼおよびダイスを使用する必要があり、石英ガラスの
粘性係数が温度に敏感であるから、高精度の温度制御が
必要である。さらに溶融ガラス中の気泡を取り除くため
、粘性係数の低い状態まで高温に加熱するので、低沸点
の添加剤を加えることはできない。Moreover, according to this method 35, a crucible and a die are used whose dimensions match the position of the die when the molten quartz glass flows out from the hole at the bottom of the crucible, or the desired ratio of the inner diameter to the outer diameter of the quartz glass tube. Since the viscosity coefficient of quartz glass is sensitive to temperature, highly accurate temperature control is required. Furthermore, in order to remove air bubbles in the molten glass, it is heated to a high temperature to a state where the viscosity coefficient is low, so additives with low boiling points cannot be added.
本発明は前述の欠点に鑑みなされたもので、るつぼを用
いないで、気相反応でガラス微粒子堆積体を作製した後
、透明化することにより高純度でしかも気泡を含まない
高品質の石英ガラス管を製造することを目的とし、さら
にガラス微粒子堆積体を加熱し透明化する以前に脱水処
理することにより、０Ｈ基の含有量の少ない石英ガラス
管を製造すること、また従来法では困難であつた添加剤
を含む石英ガラス管を作製することも目的としている。The present invention was made in view of the above-mentioned drawbacks, and it is possible to produce high-purity, bubble-free, high-quality quartz glass by producing a glass particle deposit by a gas phase reaction without using a crucible, and then making it transparent. For the purpose of manufacturing tubes, it is possible to manufacture silica glass tubes with a low content of 0H groups by dehydrating the glass fine particle deposit before heating it to make it transparent, and it is difficult to do so by conventional methods. The aim is also to fabricate quartz glass tubes containing additives.
第２図は本発明の実施例の概要図であつて、１１は堆積
されたガラス微粒子堆積体、１２は耐火性材料からなる
円筒管、１３は円筒管１２を支持し回転させるための支
持具、１４は円筒管１２に取り付けられ、取りはずし可
能なふた、１５は原料を酸水素炎とともに供給するため
の吹出しノズル、１６は回転を伝える回転軸である。FIG. 2 is a schematic diagram of an embodiment of the present invention, in which 11 is a deposited glass particle deposit, 12 is a cylindrical tube made of a refractory material, and 13 is a support for supporting and rotating the cylindrical tube 12. , 14 is a removable lid attached to the cylindrical tube 12, 15 is a blowing nozzle for supplying raw materials together with an oxyhydrogen flame, and 16 is a rotating shaft for transmitting rotation.
第３図は得られたガラス微粒子堆積体を透明化する装置
の概要図であつて、２１は電気炉、２２は雰囲気ガスの
流入口、２３は余剰ガスの排出口、２４は雰囲気を作る
ための炉心管を示す。FIG. 3 is a schematic diagram of an apparatus for making the obtained glass particle deposit transparent, in which 21 is an electric furnace, 22 is an inlet for atmospheric gas, 23 is an outlet for excess gas, and 24 is for creating an atmosphere. The furnace tube is shown.
第４図は本発明の他の実施例の概要図であつて、４１は
耐火性材料からなる円筒管、４２は支持具、４３は回転
軸、４４はガラス敷粒子堆積体、４５は吹出しノズルで
ある。FIG. 4 is a schematic diagram of another embodiment of the present invention, in which 41 is a cylindrical tube made of a fire-resistant material, 42 is a support, 43 is a rotating shaft, 44 is a glass bed particle deposit, and 45 is a blowing nozzle. It is.
以下実施例について本発明を詳細に説明する。実施例
１
ＳｉＣ１，などの原料ガス２００ｃｃ／Ｍｉｎを、酸素
４１／Ｍｉｎｓ水素２′／Ｍｉｎともに第２図に示す吹
出しノズル１５から吹き出し、円筒管１２内において火
炎加水分解反応させ、ＳｉＯ２微粒子を形成した。The present invention will be described in detail with reference to Examples below. Example
200 cc/min of raw material gas such as 1 SiCl, 41/min of oxygen and 2'/min of hydrogen were blown out from the blow-off nozzle 15 shown in FIG.
微粒子は中心軸の周りに１０ｒｐ１の速度で回転してい
る円筒管１２の内壁上に順次堆積され、堆積に合わせて
、円筒管１２と吹出しノズル１５の相対的な位置を変え
ると、円筒管１２の内壁上に一様な厚さ３０１Ｅのガラ
ス微粒子堆積体１１が形成された。使用した円筒管１２
の大きさは外径１００ｍ』内径９０Ｕ１，長さ４００ｍ
！のグラフアイトで作製されている。堆積体の見かけ密
度は、円筒管１２内の温度によつて決定されるので、全
体を加熱できるようにしてもよい。このようにして得た
ガラス微粒子堆積体１１は、円筒管１２とともに第３図
に示す電気炉２１内に、炉心管２４とともに設置し、電
気炉２１で１５００℃に加熱し、２時間保持した。炉心
管２４内には雰囲気ガス流入口２２を通して不活性ガス
Ｈｅとともに塩素ガスを流した。この塩素ガスは、ガラ
ス微粒子堆積体中に存在する０Ｈ基と置換し、ガラ又微
粒子堆積体から０Ｈ基を除去するために流すものであり
、ガラスが焼結される以前から流すので、内部に存在す
る０Ｈ基も十分に置換される。余剰ガスは上方に設置し
てある排出口２３から排出される。この結果、ガラス微
粒子堆積体１１は焼結し透明化され、外径４０ｍｍ１内
径１５詣、長さ２００Ｗ！ｌの透明石英ガラス管が得ら
れた。０Ｈ基濃度は０．１卿程度に低下していた。The fine particles are sequentially deposited on the inner wall of the cylindrical tube 12 that is rotating at a speed of 10 rpm around the central axis, and when the relative positions of the cylindrical tube 12 and the blow-off nozzle 15 are changed according to the deposition, the cylindrical tube 12 A glass fine particle deposit 11 having a uniform thickness of 301E was formed on the inner wall of the chamber. Cylindrical tube 12 used
The size is outer diameter 100m, inner diameter 90U1, length 400m.
! It is made of graphite. Since the apparent density of the deposit is determined by the temperature inside the cylindrical tube 12, it may be possible to heat the entire body. The glass particle deposit 11 thus obtained was placed together with the cylindrical tube 12 in an electric furnace 21 shown in FIG. 3 together with a furnace tube 24, heated to 1500° C. in the electric furnace 21, and held for 2 hours. Chlorine gas was flowed into the furnace core tube 24 through the atmospheric gas inlet 22 together with an inert gas He. This chlorine gas is flowed to replace the 0H groups present in the glass fine particle deposit and to remove the 0H group from the glass or fine particle deposit.Since it is flowed before the glass is sintered, Any OH groups present are also fully substituted. Excess gas is discharged from the discharge port 23 installed above. As a result, the glass particle deposit body 11 is sintered and made transparent, has an outer diameter of 40 mm, an inner diameter of 15 mm, and a length of 200 W! 1 of transparent quartz glass tubes were obtained. The 0H group concentration had decreased to about 0.1%.
実施例 ２
ＳｉＣ１４２００ＣＣ／Ｍｉｎ，．ＰＯＣｌ３５ＯＣＣ
／Ｍｉｎの割合の原料ガスを、４００℃に加熱した水蒸
気４１／Ｍｉｎとともに、第４図に示す吹出しノズル４
５から吹き出し、円筒管４１内で加水分解させてＳｉＯ
２とＰ２Ｏ，の混合ガラス微粒子を形成した。Example 2 SiC14200CC/Min,. POCl35OCC
The raw material gas at a ratio of /Min and steam heated to 400° C. 41/Min are passed through the blow-off nozzle 4 shown in FIG.
5 and hydrolyzed in the cylindrical tube 41 to form SiO.
Mixed glass fine particles of 2 and P2O were formed.
ガラス微粒子は円筒管４１の内壁上に堆積する。円筒管
４１は外径１００ｍ１１内径９０ｍ』長さ５００Ｕ！の
グラフアイト製で、回転数１５ｒｐ１で回転している。
かつ堆積に応じて、円筒管４１は７０ｍ１！Ｌ／ＨＯｕ
ｒの速度で下方に移動される。移動に伴つて、円筒管４
１の内壁上に順次ガラス微粒子堆積体が形成され、この
ようにして形成されたガラス微粒子堆積体４４は、第３
図に示す電気炉２１を用いて１４５０℃の温度で加熱し
た結果、Ｐ２Ｏ５が微量添加された石英ガラス管（外径
４０ｗ！ｔ１内径１７ｍ』長さ２４０Ｗ！ｌ）の石英ガ
ラス管が得られた。以上説明したように、本発明による
石英ガラス管の作製方法は、気相状態の原料を用いて、
石英ガラスを軟化させることなく透明化するので、高純
度の石英ガラス管が得られることなどの利点がある。Glass particles are deposited on the inner wall of the cylindrical tube 41. The cylindrical tube 41 has an outer diameter of 100 m, an inner diameter of 90 m, and a length of 500 U! It is made of graphite and rotates at a rotation speed of 15 rpm.
And depending on the accumulation, the cylindrical tube 41 is 70 m1! L/Hou
It is moved downward at a speed of r. As it moves, the cylindrical tube 4
The glass fine particle deposits 44 formed in this way are sequentially formed on the inner wall of the third glass particle deposit body 44.
As a result of heating at a temperature of 1450° C. using the electric furnace 21 shown in the figure, a quartz glass tube (outer diameter 40W! t1 inner diameter 17m, length 240W!l) to which a small amount of P2O5 was added was obtained. . As explained above, the method for manufacturing a quartz glass tube according to the present invention uses raw materials in a gas phase,
Since the quartz glass is made transparent without being softened, it has the advantage that a high-purity quartz glass tube can be obtained.
また多孔質状態で脱水処理を行うことにより、石英ガラ
ス管中に含まれる水分または０Ｈ基を、容易に１匹以下
にすることができる利点がある。０Ｈ基含有量を減少さ
せるための脱水処理剤としては、以上の実施例で用いた
塩素（Ｃｌ２）ガスのほか、ＳＯＣｌ２，ＳＯ２Ｃｌ２
等のガスを用いることも可能である。Further, by performing the dehydration treatment in a porous state, there is an advantage that the amount of water or OH group contained in the quartz glass tube can be easily reduced to one or less. In addition to the chlorine (Cl2) gas used in the above examples, SOCl2, SO2Cl2, and other dehydrating agents for reducing the 0H group content include
It is also possible to use gases such as.
第１図は従来の石英ガラス管の作製法を示す概要図、第
２図は本発明の一実施例の概要図、第３図は本発明によ
り得られるガラス微粒子堆積体を透明化する装置の概要
図、第４図は本発明の他の実施例の概要図である。
１・・・・・・溶融された石英ガラス、２・・・・・・
るつぼ、３・・・・・・電気炉、４・・・・・・穴、５
・・・・・・ダイス、６・・・・・・石英ガラス管、１
１・・・・・・ガラス微粒子堆積体、１２・・・・・・
円筒管、１３・・・・・・支持具、１４・・・・・・ふ
た、１５・・・・・・吹出しノズル、１６・・・・・・
回転軸、２１・・・・・・電気炉、２２・・・・・・雰
囲気ガス流入口、２３・・・・・・排出口、２４・・・
・・・炉心管、４１・・・・・・円筒管、４２・・・・
・・支持具、４３・・・・・・回転軸、４４・・・・・
・ガラス微粒子堆積体、４５・・・・・・吹出しノズル
。Fig. 1 is a schematic diagram showing a conventional method for manufacturing a quartz glass tube, Fig. 2 is a schematic diagram of an embodiment of the present invention, and Fig. 3 is a schematic diagram of an apparatus for making a glass fine particle deposit obtained by the present invention transparent. Schematic diagram, FIG. 4 is a schematic diagram of another embodiment of the present invention. 1...Fused quartz glass, 2...
Crucible, 3... Electric furnace, 4... Hole, 5
...Dice, 6...Quartz glass tube, 1
1... Glass fine particle deposit body, 12...
Cylindrical tube, 13...Support, 14...Lid, 15...Blowout nozzle, 16...
Rotating shaft, 21... Electric furnace, 22... Atmospheric gas inlet, 23... Outlet, 24...
... Furnace core tube, 41 ... Cylindrical tube, 42 ...
...Support, 43... Rotating shaft, 44...
-Glass particulate deposit body, 45...Blowout nozzle.
Claims (1)
Ｃｌ＿４等が酸化反応してＳｉＯ＿２となる原料を、酸
水素炎または高温に加熱された水蒸気または高温に加熱
された酸素ガスまたは酸素を含むプラズマ炎のいずれか
とともに吹き込み、円筒管内で酸化反応してできるＳｉ
Ｏ＿２ガラス微粒子を、該円筒管内の内壁上に堆積させ
、ついで円筒管と吹き込み用ノズルを軸方向に相対的に
移動させて、前記ＳｉＯ＿２ガラス微粒子を所定の厚さ
に堆積させた後、円筒管全体を塩素を含む雰囲気中で加
熱し、堆積したＳｉＯ＿２ガラス微粒子を焼結、透明化
することを特徴とする石英ガラス管の作製方法。 ２ 特許請求の範囲第１項記載の石英ガラス管の作製方
法において、前記ＳｉＯ＿２となる原料に、酸化反応し
てＧｅＯ＿２、Ｐ＿２Ｏ＿５、Ｂ＿２Ｏ＿３、ＴｉＯ＿
２、ＺｒＯ＿２、Ｂｉ＿２Ｏ＿３、Ｎｂ＿２Ｏ＿５、Ａ
ｌ＿２Ｏ＿３、Ｓｂ＿２Ｏ＿３、ＡＳ＿２Ｏ＿３のいず
れかとなる添加物を加えることを特徴とする石英ガラス
管の作製方法。[Claims] 1. Si
A raw material that becomes SiO_2 through an oxidation reaction of Cl_4, etc. is blown in with either an oxyhydrogen flame, high-temperature steam, high-temperature oxygen gas, or oxygen-containing plasma flame, and the oxidation reaction takes place inside a cylindrical tube. Possible Si
O_2 glass particles are deposited on the inner wall of the cylindrical tube, and then the cylindrical tube and the blowing nozzle are moved relative to each other in the axial direction to deposit the SiO_2 glass particles to a predetermined thickness. A method for producing a quartz glass tube, which comprises heating the entire tube in an atmosphere containing chlorine to sinter and make the deposited SiO_2 glass particles transparent. 2. In the method for producing a quartz glass tube according to claim 1, the raw material to become SiO_2 undergoes an oxidation reaction to form GeO_2, P_2O_5, B_2O_3, TiO_
2, ZrO_2, Bi_2O_3, Nb_2O_5, A
A method for producing a quartz glass tube, the method comprising adding an additive selected from l_2O_3, Sb_2O_3, and AS_2O_3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54075620A JPS5911536B2 (en) | 1979-06-18 | 1979-06-18 | How to make a quartz glass tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54075620A JPS5911536B2 (en) | 1979-06-18 | 1979-06-18 | How to make a quartz glass tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55167144A JPS55167144A (en) | 1980-12-26 |
| JPS5911536B2 true JPS5911536B2 (en) | 1984-03-16 |
Family
ID=13581429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54075620A Expired JPS5911536B2 (en) | 1979-06-18 | 1979-06-18 | How to make a quartz glass tube |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5911536B2 (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5720251B2 (en) * | 1972-06-26 | 1982-04-27 | ||
| JPS5150745A (en) * | 1974-10-28 | 1976-05-04 | Sumitomo Electric Industries | HIKARIDENSOYOFUAIBAANO SEIZOHOHO |
-
1979
- 1979-06-18 JP JP54075620A patent/JPS5911536B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55167144A (en) | 1980-12-26 |
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