JPS591239B2 - Boat for liquid phase epitaxial growth - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in liquid phase epitaxial phase length boats.

Liquid phase epitaxial growth is widely used in the manufacture of compound semiconductor devices such as semiconductor lasers and LEDs.

For example, a compound semiconductor substrate used for manufacturing an InGaAsP compound semiconductor device for optical communication in the 1 [μm] wavelength band is an I
It is manufactured by laminating and growing a crystal layer of InGaAsP or the like on an nP substrate by liquid phase epitaxial growth.

That is, as shown in FIG. 1, an InP substrate 3, which is a substrate to be processed, is placed in a substrate placement section 2 provided on the top surface of a boat substrate 1, and an InP substrate 3, which is a substrate to be processed, is placed on a slider 4 that slides on the boat substrate 1. In, InP, and GaA are contained in the solution reservoir 5.
A raw material solution 6 made by weighing and melting a solid such as S, InAs, etc. is pressed downward with a weight T, and then a second
As shown in the figure, slide the slider 4 to move the raw material solution 6 onto the InP substrate 3 and perform liquid phase epitaxial growth, then slide the slider 4 again to remove the raw material solution 6 from the InP substrate 3. By this method, an epitaxial growth layer made of InGaAsP or the like is formed.

Here, the weight is used to prevent the epitaxial layer from growing abnormally thick around the periphery. However, by sliding the slider 4 mentioned above, the raw material solution 6 is transferred to the InP substrate 3.
Since the raw material solution 6 is always pressed downward by the weight 1 when it is removed from above, there is a problem that a part of the raw material solution remains on the InP substrate. An object of the present invention is to provide a boat for liquid phase epitaxial growth that can prevent the raw material solution from remaining on the substrate to be processed by removing the force that presses the raw material solution when removing the raw material solution from the substrate to be processed. There is a particular thing. The present invention is characterized by a boat substrate having a processing target substrate mounting section, a slider having a solution reservoir for storing a raw material solution and sliding on the boat substrate to move the raw material solution, and a slider that is inserted into the solution reservoir. a stop means for preventing the weight from falling below a predetermined position in the solution reservoir; and a recess for accommodating unnecessary raw material solution in the port substrate. A boat for liquid phase epitaxial growth is provided.

Embodiments of the present invention will be described below with reference to the drawings. 3 and 4 are sectional views of essential parts showing one embodiment of the present invention. In FIG. 3, 1 is a boat substrate, 2 is a processing substrate mounting section,
Reference numeral 3 denotes a substrate to be processed, 4 a slider, 5 a solution reservoir, and 6 a raw material solution, which are no different from conventional liquid phase epitaxial manufacturing equipment.

7 is a weight, and a tsuba 8 is provided at the top.

The length from the bottom surface of the weight 7 to the lower surface of the collar 8 is made slightly longer than the length from the upper surface of the raw material solution 6 to the soil surface of the slider 4.
Reference numeral 9 denotes a recessed portion for accommodating the raw material solution that is no longer needed, and is provided in the direction in which the slider 4 moves with respect to the processing target substrate mounting portion 2 (the direction of arrow A in the figure).

The distance D between the two is selected to be smaller than the length L of one side of the solution reservoir. Next, a method for manufacturing an epitaxial substrate using the liquid phase epitaxial growth boat will be described.

As shown in FIG. 3, a raw material solution 6 having a predetermined composition, heated and melted, and pressed by a weight 7 is brought into contact with the surface of a substrate to be processed 3 placed in a substrate to be processed mounting section 2, By maintaining the temperature at a predetermined temperature, liquid phase epitaxial growth is performed to a desired thickness.

Up to this point, there is no difference from the usual liquid phase epitaxial growth method. Next, slider 4 as shown in FIG.
The unnecessary raw material solution 6 is removed from the substrate 3 to be processed by sliding it in the direction of arrow A in the figure.

In this process, as shown in the figure, when the end of the solution reservoir 5 reaches the edge soil of the recess 9, the bottom of the raw material solution 6 is opened and the raw material solution 6 begins to flow toward the recess 9, and the liquid level of the raw material solution 6 is lowered, and the weight 7 is also lowered accordingly, but the lower surface of the collar 8 immediately hits the upper surface of the slider 4 and stops. Therefore, the pressing force of the weight 7 against the raw material solution 6 disappears at this point, so if the slider 4 is further slid to move the raw material solution 6 from above the target substrate 3, the raw material solution 6 will be transferred to the target substrate 3.
Everything is accommodated in the recess 9 without any remaining on top.
To perform multilayer epitaxial growth on the substrate 3 to be processed, a desired number of the above-mentioned solution reservoirs 5 and weights 7 are provided on the slider, a predetermined raw material solution is poured into each solution reservoir, and the above-mentioned operations are performed sequentially. This can be done by repeating. Note that the means for stopping the descent of the weight at a predetermined position is not limited to the above embodiment, and for example, as shown in FIG. Various modifications can be made, such as a structure in which the weight 7 is stopped at this step.

As explained above, according to the liquid phase epitaxial growth boat of the present invention, when the raw material solution is removed from the substrate to be processed, the force that presses the raw material solution is removed, so that the raw solution remains on the substrate to be processed. There's nothing to do.

[Brief explanation of drawings]

1 and 2 are sectional views of essential parts showing a conventional liquid phase epitaxial growth boat, FIGS. 3 and 4 are sectional views of essential parts showing an embodiment of the present invention, and FIG. FIG. 7 is a cross-sectional view of main parts showing another embodiment of the invention. DESCRIPTION OF SYMBOLS 1...Boat board, 2...Processed substrate mounting section, 3...Processed substrate, 4...Slider, 5...・Solution reservoir, 6... Raw material solution, 7... Weight, 8... Tsuba, 9...
・・・Concavity.

Claims (1)

[Claims] 1. A boat substrate having a substrate mounting section to be processed, a slider having a solution reservoir for storing a raw material solution and sliding on the boat substrate to move the raw material solution, and a slider that is inserted into the solution reservoir and moves the raw material by its own weight. A weight for pushing the solution, a stopping means for preventing the weight from falling below a predetermined position in the solution reservoir, and a recess for accommodating unnecessary raw material solution in the boat substrate. A boat for liquid phase epitaxial growth characterized by: