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JPS5913141B2 - Objective lenses for scanning electron microscopes, etc. - Google Patents
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JPS5913141B2 - Objective lenses for scanning electron microscopes, etc. - Google Patents

Objective lenses for scanning electron microscopes, etc.

Info

Publication number
JPS5913141B2
JPS5913141B2 JP54053226A JP5322679A JPS5913141B2 JP S5913141 B2 JPS5913141 B2 JP S5913141B2 JP 54053226 A JP54053226 A JP 54053226A JP 5322679 A JP5322679 A JP 5322679A JP S5913141 B2 JPS5913141 B2 JP S5913141B2
Authority
JP
Japan
Prior art keywords
magnetic pole
pole piece
objective lens
pole pieces
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54053226A
Other languages
Japanese (ja)
Other versions
JPS55144639A (en
Inventor
清一 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP54053226A priority Critical patent/JPS5913141B2/en
Publication of JPS55144639A publication Critical patent/JPS55144639A/en
Publication of JPS5913141B2 publication Critical patent/JPS5913141B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/14Lenses magnetic

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)

Description

【発明の詳細な説明】 本発明は球面収差係数を極めて小さくすることのできる
走査電子顕微鏡やX線マイクロアナライザー等の対物レ
ンズ磁極片に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an objective lens magnetic pole piece for a scanning electron microscope, an X-ray microanalyzer, etc., which can have an extremely small spherical aberration coefficient.

走査電子顕微鏡等において、分解能を向上させるには対
物レンズの各種収差係数、とりわけ球面収差係数を小さ
くすることが必要である。
In order to improve the resolution of a scanning electron microscope or the like, it is necessary to reduce various aberration coefficients of the objective lens, especially the spherical aberration coefficient.

第1図は従来から広く用いられている走査電子顕微鏡の
対物レンズの断面を示す略図である。
FIG. 1 is a schematic diagram showing a cross section of an objective lens of a conventionally widely used scanning electron microscope.

図中1は内部に励磁コイル2が巻回されたレンズヨーク
を示し、3,4は夫々上、下磁極片を示す。
In the figure, 1 indicates a lens yoke in which an excitation coil 2 is wound, and 3 and 4 indicate upper and lower magnetic pole pieces, respectively.

該上、下磁極片3,4に穿たれた穴を通して電子線5が
通過し、上、下磁極片間には光軸6に関して対称な磁場
が形成される。
An electron beam 5 passes through holes drilled in the upper and lower magnetic pole pieces 3 and 4, and a magnetic field symmetrical with respect to the optical axis 6 is formed between the upper and lower magnetic pole pieces.

7aと7bは試料8上に電子線を走査するための偏向コ
イルで、9は試料8から電子線照射によって発生する2
次電子と反射電子を検出するための検出手段を示し、そ
の出力はブラウン管(図示せず)に供給される。
7a and 7b are deflection coils for scanning the electron beam on the sample 8, and 9 is a deflection coil for scanning the electron beam on the sample 8;
Detection means for detecting secondary electrons and reflected electrons is shown, the output of which is supplied to a cathode ray tube (not shown).

破線10は試料8から発生するX線を示し、該X線は取
り出し角βでX線分光器(図示せず)に入射して分光さ
れる。
A broken line 10 indicates the X-rays generated from the sample 8, and the X-rays enter an X-ray spectrometer (not shown) at an extraction angle β and are separated into spectra.

Zoは対物レンズ主面と試料表面の距離を示し、この距
離は対物レンズの焦点距離と略等しい。
Zo indicates the distance between the main surface of the objective lens and the sample surface, and this distance is approximately equal to the focal length of the objective lens.

このようなレンズにおける球面収差係数Csの実測値を
第2図に示しである。
FIG. 2 shows the measured value of the spherical aberration coefficient Cs in such a lens.

図中横軸は上、下磁極片径D2.D10寸法を変えたと
き得られる上。
In the figure, the horizontal axes are the upper and lower magnetic pole piece diameters D2. The top obtained when changing the D10 dimension.

下磁極片3と4との間に形成されるレンズ磁場の半値巾
dを示し、Zoをパラメータにして球面収差係数C8を
実測した結果である。
It shows the half width d of the lens magnetic field formed between the lower magnetic pole pieces 3 and 4, and is the result of actually measuring the spherical aberration coefficient C8 using Zo as a parameter.

この図から球面収差係数Csはレンズ磁場の半値巾dと
レンズ主面と試料との距離Z。
From this figure, the spherical aberration coefficient Cs is the half width d of the lens magnetic field and the distance Z between the lens principal surface and the sample.

の両者に依存することがわかる。It can be seen that it depends on both.

第2図からZ。Z from Figure 2.

を小さくして球面収差係数を小さくする方法は一般には
ワークディスタンス(試料と磁極片4との間隔)を短か
くしなければならないので、試料を傾斜回転させ得る範
囲と試料の大きさを制限する。
The method of reducing the spherical aberration coefficient by reducing the spherical aberration coefficient generally requires shortening the work distance (the distance between the sample and the magnetic pole piece 4), which limits the range in which the sample can be tilted and the size of the sample.

第1図に8′で示す試料位置は下磁極片4に極めて接近
させた状態を示す。
The sample position indicated by 8' in FIG. 1 is very close to the lower pole piece 4.

又ワークディスタンスを短かくするとX線取り出し角が
βからβ′のように小さくなるのでX線分光による試料
元素の定量測定における補正計算が不正確になる欠点が
ある。
Furthermore, when the work distance is shortened, the X-ray extraction angle becomes smaller from β to β', which has the disadvantage that correction calculations in quantitative measurement of sample elements by X-ray spectroscopy become inaccurate.

一方レンズ磁場の半値巾を大きくする方法として下磁極
片の孔径を大きくすることも考えられるが、この孔を通
してレンズ磁界が下方に張り出し、試料や電子線検出器
に悪影響(例えば、磁性材料の観察や試料からの2次電
子が対物レンズにトラップされる。
On the other hand, one way to increase the half-width of the lens magnetic field is to increase the hole diameter of the lower magnetic pole piece, but the lens magnetic field extends downward through this hole, which has a negative effect on the sample and the electron beam detector (for example, when observing magnetic materials. Secondary electrons from the sample are trapped in the objective lens.

)を与えるため、該下磁極片の孔径はできるだけ小さく
することが必要となる。
), it is necessary to make the hole diameter of the lower pole piece as small as possible.

そこで従来は第3図に示す如く下磁極片の孔径D1を小
さく、又上磁極片3の孔径D2を大きくした状態で両磁
極片の間隔Sを大きくし、D2〉2・Dlの関係式を満
たすようにしている。
Therefore, conventionally, as shown in Fig. 3, the hole diameter D1 of the lower magnetic pole piece 3 is made small and the hole diameter D2 of the upper magnetic pole piece 3 is made large, and the distance S between both magnetic pole pieces is increased, and the relational expression D2>2・Dl is I try to fulfill it.

更に第4図は第3図の装置における光軸6に沿った磁場
分布を示すものである。
Furthermore, FIG. 4 shows the magnetic field distribution along the optical axis 6 in the apparatus of FIG.

第4図において磁極片間隔S′が比較的小さいときの軸
上磁場分布はaで表わされ、上磁極片を破線位置まで移
動して磁極間隔S〃を大きくした場合の磁場分布をbで
示し、これらの磁場分布の半値巾をd 1 * d 2
で示す。
In Fig. 4, the axial magnetic field distribution when the pole piece spacing S' is relatively small is represented by a, and the magnetic field distribution when the magnetic pole piece is moved to the broken line position and the magnetic pole spacing S〃 is increased is represented by b. and the half-width of these magnetic field distributions is d 1 * d 2
Indicated by

第5図に示すように、上、下磁極片間の距離を大きくす
ることによって半値巾dの値を大きくすることができる
As shown in FIG. 5, the value of the half width d can be increased by increasing the distance between the upper and lower magnetic pole pieces.

しかし乍ら、間隙Sを大きくするにつれて、第4図中曲
線すに示すように上磁極片3の上方にまで磁場分布がお
よび対物レンズ磁場と偏向コロルアaによる偏向磁場の
相互干渉が生じる。
However, as the gap S is increased, the magnetic field distribution extends to above the upper magnetic pole piece 3, as shown by the curved line in FIG. 4, and mutual interference occurs between the objective lens magnetic field and the deflection magnetic field due to the deflection collar a.

その結果特に低倍率の走査画像における歪が生じること
になる。
This results in distortions, especially in scanned images at low magnifications.

更に分布曲線すは基本的にはベル型であるため、対物レ
ンズ主面は磁場強度に拘らず上磁極片3の側へ移動する
Furthermore, since the distribution curve is basically bell-shaped, the main surface of the objective lens moves toward the upper magnetic pole piece 3 regardless of the magnetic field strength.

同時に、対物レンズの焦点距離fと略等しいZ。At the same time, Z is approximately equal to the focal length f of the objective lens.

が長くなり、又焦点距離に略比例する対物レンズの色収
差係数も増大する。
becomes longer, and the chromatic aberration coefficient of the objective lens, which is approximately proportional to the focal length, also increases.

そのため対物レンズによる球面収差だけでなく色収差に
よる影響が無視できなくなり、試料上におけるビーム径
もむしろ大きくなる。
Therefore, the influence of not only spherical aberration due to the objective lens but also chromatic aberration cannot be ignored, and the beam diameter on the sample also becomes larger.

従って、これらの理由から上、下磁極片間隔Sを大きく
することにユ限界がある。
Therefore, for these reasons, there is a limit to increasing the distance S between the upper and lower magnetic pole pieces.

前述の問題を解決するため、本発明者は対物レンズ磁場
を単一の磁極間隙でなく、2つの磁極間隙によって発生
することによって色収差係数を低く抑えたまま球面収差
係数を小さくした対物レンズを試作した。
In order to solve the above-mentioned problem, the present inventor prototyped an objective lens in which the spherical aberration coefficient was reduced while keeping the chromatic aberration coefficient low by generating the objective lens magnetic field not by a single magnetic pole gap but by two magnetic pole gaps. did.

第6図はこのような対物レンズの一例を示す要部断面図
を示すもので、第1図と比較して上磁極片3と下磁極片
との間に両者と一定の間隙を保って補助磁極片11を設
置したことに大きな特徴がある。
FIG. 6 shows a cross-sectional view of the main part of an example of such an objective lens, and compared to FIG. A major feature is that the magnetic pole pieces 11 are installed.

これらの磁極片は非磁性体製のスペーサー12.13と
結合部材14.15によってヨーク1に取り付けられて
いる。
These pole pieces are attached to the yoke 1 by spacers 12.13 and coupling members 14.15 made of non-magnetic material.

非点補正用コイル16は補助磁極片11の内部に組み込
まれている。
The astigmatism correction coil 16 is incorporated inside the auxiliary pole piece 11 .

該コイル16は直流電流が供給されているので、対物レ
ンズ磁場と非点補正磁場との間に生じる相互干渉などは
ない。
Since the coil 16 is supplied with a direct current, there is no mutual interference between the objective lens magnetic field and the astigmatism correction magnetic field.

補助磁極片11の内径D3は上磁極片3の内径D2と略
等しく下磁極片4の内径D1の略2倍以上である。
The inner diameter D3 of the auxiliary magnetic pole piece 11 is approximately equal to the inner diameter D2 of the upper magnetic pole piece 3 and approximately twice or more than the inner diameter D1 of the lower magnetic pole piece 4.

従って次の(1)式が成り立つ。Therefore, the following equation (1) holds true.

このようにDlの値を小さくすることによって対物レン
ズ磁界が試料近傍にまで達することを防止することがで
きる。
By reducing the value of Dl in this way, it is possible to prevent the objective lens magnetic field from reaching the vicinity of the sample.

第7図は第6図の装置における光軸上の磁場分布を示す
図である。
FIG. 7 is a diagram showing the magnetic field distribution on the optical axis in the apparatus of FIG. 6.

図中曲線Cに間隙S1に生じる磁場分布を、曲線eは間
隙S2に生じる磁場分布を、又曲線gの半値巾d4は曲
線Cの半値巾d3よりも大きいので、間隙S1 と82
の大きさと上。
In the figure, the curve C represents the magnetic field distribution generated in the gap S1, and the curve e represents the magnetic field distribution generated in the gap S2.Since the half-value width d4 of the curve g is larger than the half-value width d3 of the curve C, the gap S1 and 82
size and top.

下磁極片間の距離tを適当に選ぶことによって大きな半
値巾を得ることができる。
A large half-width can be obtained by appropriately selecting the distance t between the bottom pole pieces.

第8図はDI=10mm、D2=20mmの条件におい
てlLの値をパラメータとして距離tと半l 鎖中dの関係を求めた実験結果を示すものである。
FIG. 8 shows the results of an experiment in which the relationship between the distance t and the distance d in the half l chain was determined using the value of lL as a parameter under the conditions of DI=10 mm and D2=20 mm.

この実験結果を第5図の実験結果と比較するため第5図
の曲線を第8図中に破線曲線りで示した。
In order to compare this experimental result with the experimental result shown in FIG. 5, the curve shown in FIG. 5 is shown as a dashed curve in FIG.

従ってこれらの曲線の比較から!、)15mmの領域で
次式を満足するときには複数間隙による磁場の半値巾の
方が単一間隙による磁場の半値巾よりも大きいことが分
る。
Hence from the comparison of these curves! , ) When the following equation is satisfied in the area of 15 mm, it can be seen that the half-width of the magnetic field due to multiple gaps is larger than the half-width of the magnetic field due to a single gap.

s2 s2 し机乍6・−;6E 1.5以上例9ば垢7:O曲l 線では/!、=20mmにおける半値巾の値がm=1.
51 の曲線の値よりも小さくなってしまうことが分る。
s2 s2 し机乍6・-;6E 1.5 or moreExample 9Bare 7: O curve l In the line /! , = 20mm, the value of the half width is m = 1.
It can be seen that the value is smaller than the value of the curve 51.

又S2が大きくなって”−=> 1.5の状態に達する
8ムえ と軸上磁場が上磁極片を て偏向コイルにまでおよび
、前述した好ましくない相互干渉を生じたり、更には軸
上磁場分布に第9図に示す如く、はつきつと分離された
2つのピークP1とP2を生じるようになる。
Furthermore, as S2 increases, the axial magnetic field reaches the state of ``-=>1.5'' and extends through the upper pole piece to the deflection coil, causing the aforementioned undesirable mutual interference, and furthermore, the axial magnetic field As shown in FIG. 9, two clearly separated peaks P1 and P2 appear in the distribution.

このようなレンズ磁場分布に関しては第2図に示したよ
うな関係が成立しなくなり、半値巾dの増加によって球
面収差係数CSも大きくなる現象が生じると共に、対物
レンズの主面も上方に移動するため、対物レンズの焦点
距離も大きくなり、対物レンズの色収差係数も増大する
Regarding such a lens magnetic field distribution, the relationship shown in Figure 2 no longer holds, and as the half-width d increases, the spherical aberration coefficient CS also increases, and the principal surface of the objective lens also moves upward. Therefore, the focal length of the objective lens also increases, and the chromatic aberration coefficient of the objective lens also increases.

従って以上の理由から且盈の値は次の条件を、1ヶ、、
−jゎイヶ、ヶい。
Therefore, for the above reasons, the value of Ei must meet the following conditions:
−jゎIt's so big, so big.

8・本発明者は走査電子顕微鏡の対物レンズとして要求
される前述した種々の制約の下に、その球面収差係数を
更に低減する方法として、3つ以上の磁極間隙によって
得られる単一の合成磁場を対物レンズとして用いること
を試み、各磁極間隙が一定の条件を満足するとき従来よ
りも優れた性能を有する対物レンズが得られることを見
出した。
8. Under the various constraints mentioned above required for the objective lens of a scanning electron microscope, the present inventor proposed a method for further reducing the spherical aberration coefficient by using a single composite magnetic field obtained by three or more magnetic pole gaps. We tried using this as an objective lens and found that when the gap between each magnetic pole satisfies certain conditions, an objective lens with better performance than conventional ones can be obtained.

第10図は、本発明の後述する条件を満足する3つの磁
極間隙を有する対物レンズの要部を示すもので、2つの
補助磁極片19.20が非磁性体のスペーサー13.2
1と結合部材15.22によって上磁極片3に取り付け
られており、3つの磁極間隙によって単一の合成磁場を
得るように構成されている。
FIG. 10 shows the main part of an objective lens having three magnetic pole gaps that satisfy the conditions described later in the present invention, in which two auxiliary magnetic pole pieces 19.20 are spacers 13.2 made of non-magnetic material.
1 and a coupling member 15.22 to the upper pole piece 3, and is configured to obtain a single combined magnetic field through the three pole gaps.

第11図は第10図の対物レンズにおける軸上磁場分布
を示す略図であり、図中曲線jが合成された対物レンズ
磁場強度分布を示す。
FIG. 11 is a schematic diagram showing the axial magnetic field distribution in the objective lens of FIG. 10, and the curve j in the figure shows the combined objective lens magnetic field intensity distribution.

この対物レンズ磁場の主面位置が大きく上方に移動する
ことは前述した理由から避けなければならず、そのため
の条件として前述した(3)式に相当する次の(4)式
が導かれる。
It is necessary to avoid a large upward movement of the position of the principal surface of the objective lens magnetic field for the reasons mentioned above, and the following equation (4), which corresponds to the above-mentioned equation (3), is derived as a condition for this purpose.

ここでG1 は上下磁極片間の下側半分の領域に存在す
る磁極間隙の間隔の総和を表わし、G2は上下磁極片間
の上側半分の領域に存在する磁極間隙の間隔の総和を表
わす。
Here, G1 represents the sum of the distances between the magnetic pole gaps existing in the lower half region between the upper and lower magnetic pole pieces, and G2 represents the total sum of the distances between the magnetic pole gaps existing in the upper half region between the upper and lower magnetic pole pieces.

第11図の装置においてはGにS1+S2 、G2二S
3となるが、磁極間隙が4つ以上の場合にも上記(4)
式の条件を満たすことが必要であり、このとき対物レン
ズの主面位置が上下磁極片間の中央よりも下側にくるこ
とを確認した。
In the device shown in Fig. 11, G is S1+S2, G22S
3, but the above (4) also applies when there are four or more magnetic pole gaps.
It is necessary to satisfy the condition of the formula, and it was confirmed that the main surface of the objective lens is located below the center between the upper and lower magnetic pole pieces.

処で、第11図における間隙S2を磁性体で充填して破
線20′で示すように上下磁極片間に単一の補助磁極片
を用いた場合には、破線曲線にで示されるように磁極片
を用いた場合に磁場分布に複数のピークを生じさせない
ための条件を実験により求めた。
However, if the gap S2 in FIG. 11 is filled with a magnetic material and a single auxiliary magnetic pole piece is used between the upper and lower magnetic pole pieces as shown by the broken line 20', the magnetic poles will be separated as shown by the broken line curve. We experimentally determined the conditions to prevent multiple peaks from occurring in the magnetic field distribution when using a magnetic strip.

その結果、前記(4)式の条件の他に主となる最下端の
磁極間隔の間隔S1に比較して補助的な磁極間隙の間隔
S 2 # S 3が次の(5)、(6)式に示す如く
一定の範囲の大きさとする条件を満足させる必要がある
ことを見出した。
As a result, in addition to the condition of equation (4) above, the auxiliary magnetic pole gap spacing S 2 # S 3 compared to the main magnetic pole gap spacing S1 at the lowest end satisfies the following (5) and (6). It has been found that it is necessary to satisfy the condition that the size is within a certain range as shown in the formula.

更に本発明者は上磁極片3忙隣接する補助磁極片の上側
内径を下側内径よりも大きくすることにより、より良い
結果の得られることを見出したが、その実施例要部と軸
上磁場分布の一例を第12図に示す。
Furthermore, the inventor found that better results could be obtained by making the upper inner diameter of the auxiliary pole piece adjacent to the upper magnetic pole piece 3 larger than the lower inner diameter. An example of the distribution is shown in FIG.

即ち、第12図の装置は単一の補助磁極片11を用いた
場合のものであるが、その上磁極側に近い部分の内径d
3□が他の部分の内径D3よりも大きくしである。
That is, although the device shown in FIG. 12 uses a single auxiliary magnetic pole piece 11, the inner diameter d of the portion close to the magnetic pole side
3□ is larger than the inner diameter D3 of other parts.

この実施例装置において得られる半値巾d6の軸上磁場
分布を曲線1で示しである。
Curve 1 shows the on-axis magnetic field distribution with half width d6 obtained in this example device.

図中破線にで示す曲線は補助磁極片17の内径を全てD
3の値とした場合に得られる軸上磁場分布を表わしてお
り、その半値巾d7は半値巾d6よりも小さいことが分
る。
The curve indicated by the broken line in the figure shows the inner diameter of the auxiliary pole piece 17 as D.
It shows the axial magnetic field distribution obtained when the value is 3, and it can be seen that the half-width d7 is smaller than the half-width d6.

尚補助磁極片170代わりに第13図に示す磁極片18
の如く、その内径に部分的にテーパーを設けた形状のも
のを用いても略同様の効果が得られる。
Incidentally, instead of the auxiliary magnetic pole piece 170, the magnetic pole piece 18 shown in FIG.
Substantially the same effect can be obtained by using a shape in which the inner diameter is partially tapered.

又単−の補助磁極片でなく複数の補助磁極片を用いる場
合にも、その上磁極片と隣接する補正磁極片の内径を部
分的に変化させることにより、第12図に述べたものと
略同様の効果が得られる。
Also, when using multiple auxiliary magnetic pole pieces instead of a single auxiliary magnetic pole piece, by partially changing the inner diameter of the upper magnetic pole piece and the adjacent correction magnetic pole piece, it is possible to obtain a structure similar to that shown in FIG. 12. A similar effect can be obtained.

以上詳説した如く、本発明により走査電子顕微鏡に使用
される対物レンズの球面収差係数を減少させて高分解能
像を得ることが可能となるが、更に非点収差の発生量も
球面収差係数の減少につれて少なくなることが実験によ
り確認された。
As explained in detail above, the present invention makes it possible to obtain a high-resolution image by reducing the spherical aberration coefficient of the objective lens used in a scanning electron microscope. It was confirmed through experiments that the amount decreases over time.

このことは非点収差補正装置を用いた複雑な非点補正操
作が幾分容易になることを意味している。
This means that complex astigmatism correction operations using an astigmatism correction device become somewhat easier.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の対物レンズを示す断面図、第2図は軸上
磁場の半値巾に対する球面収差係数を示す略図、第3図
は従来レンズの要部を示す略図、第4図はその軸上磁場
分布を示す略図、第5図は磁極間隔と半値巾との関係を
示す図、第6図は複数磁極片間隔を用いる対物レンズを
示す断面図、第7図と第9図は第6図のレンズの軸上磁
場分布を示す略図、第8図は2つの磁極間隙を有する対
物レンズの球面収差係数の変化を示す略図、第10図は
本発明の一実施例を示す断面図、第11図は第10図の
レンズの軸上磁場分布を示す略図、第12図及び第13
図は夫々本発明の他の実施例を示す略図である。 1:対物レンズヨーク、2:励磁コイル、3:上磁極片
、4:下磁極片、5:電子線、6:光軸、7a、7b:
偏向コイル、8.8’ :偏向コイル、9:電子線検
出器、10:X線、11 、17.18゜19.20:
補助磁極片、12.13.21 ニスペーサ−115,
22:結合部材。
Figure 1 is a cross-sectional diagram showing a conventional objective lens, Figure 2 is a schematic diagram showing the spherical aberration coefficient with respect to the half-width of an axial magnetic field, Figure 3 is a schematic diagram showing the main parts of a conventional lens, and Figure 4 is its axis. A schematic diagram showing the upper magnetic field distribution, FIG. 5 is a diagram showing the relationship between magnetic pole spacing and half width, FIG. 6 is a cross-sectional view showing an objective lens using multiple magnetic pole piece spacing, and FIGS. FIG. 8 is a schematic diagram showing the change in the spherical aberration coefficient of an objective lens having two magnetic pole gaps. FIG. 10 is a cross-sectional diagram showing an embodiment of the present invention. Figure 11 is a schematic diagram showing the axial magnetic field distribution of the lens in Figure 10, Figures 12 and 13.
The figures are schematic diagrams showing other embodiments of the invention, respectively. 1: Objective lens yoke, 2: Excitation coil, 3: Upper magnetic pole piece, 4: Lower magnetic pole piece, 5: Electron beam, 6: Optical axis, 7a, 7b:
Deflection coil, 8.8': Deflection coil, 9: Electron beam detector, 10: X-ray, 11, 17.18° 19.20:
Auxiliary pole piece, 12.13.21 Varnish spacer-115,
22: Connecting member.

Claims (1)

【特許請求の範囲】 1 電子銃から発生する電子線を試料上に細く集束させ
るための電子レンズ系を有し、該電子レンズ系における
対物レンズの上(電子銃側)磁極片の孔径D2を下(試
料側)磁極片の孔径D1よりも大きくした装置において
、前記上、下磁極片間に複数の補助磁極片を設け、上、
下磁極片間の上側半分の領域に存在する隣接した各磁極
片間の間隙の総和G2を上、下磁極片間の下側半分の領
域に存在する隣接した各磁極片間の間隙の総和G1の1
,5倍よりも小さくしたことを特徴とする走査電子顕微
鏡等の対物レンズ。 2 前記G1とG2 がG1−S1+S2且つG2−S
3で表わされるような距離S1.S2.S3だけ下側か
ら互いに離間して、前記補助磁極片が2個設けられてお
り、次の2つの関係式 0式% を満足するように構成したことを特徴とする特許請求の
範囲第1項に記載する走査電子顕微鏡等の対物レンズ。 3 前記上磁極片に隣接する補助磁極片の孔径を上磁極
片の孔径より大きくしたことを特徴とする特許請求の範
囲第1項に記載する走査電子顕微鏡等の対物レンズ。
[Claims] 1. An electron lens system for narrowly focusing an electron beam generated from an electron gun onto a sample, and a hole diameter D2 of a magnetic pole piece above an objective lens (on the electron gun side) in the electron lens system. In an apparatus in which the hole diameter D1 of the lower (sample side) magnetic pole piece is larger than the hole diameter D1, a plurality of auxiliary magnetic pole pieces are provided between the upper and lower magnetic pole pieces, and the upper and
The sum G2 of the gaps between adjacent magnetic pole pieces existing in the upper half area between the lower magnetic pole pieces is the upper sum G1, and the sum G1 of the gaps between adjacent magnetic pole pieces existing in the lower half area between the lower magnetic pole pieces. 1
, an objective lens for a scanning electron microscope, etc., characterized by being smaller than 5 times. 2 G1 and G2 are G1-S1+S2 and G2-S
3 such that the distance S1. S2. Claim 1, characterized in that two of the auxiliary magnetic pole pieces are provided at a distance of S3 from each other from below, and are configured to satisfy the following two relational expressions: Objective lenses for scanning electron microscopes, etc. described in . 3. An objective lens for a scanning electron microscope or the like as set forth in claim 1, wherein the hole diameter of the auxiliary magnetic pole piece adjacent to the upper magnetic pole piece is larger than the hole diameter of the upper magnetic pole piece.
JP54053226A 1979-04-28 1979-04-28 Objective lenses for scanning electron microscopes, etc. Expired JPS5913141B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54053226A JPS5913141B2 (en) 1979-04-28 1979-04-28 Objective lenses for scanning electron microscopes, etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54053226A JPS5913141B2 (en) 1979-04-28 1979-04-28 Objective lenses for scanning electron microscopes, etc.

Publications (2)

Publication Number Publication Date
JPS55144639A JPS55144639A (en) 1980-11-11
JPS5913141B2 true JPS5913141B2 (en) 1984-03-28

Family

ID=12936903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54053226A Expired JPS5913141B2 (en) 1979-04-28 1979-04-28 Objective lenses for scanning electron microscopes, etc.

Country Status (1)

Country Link
JP (1) JPS5913141B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118357A (en) * 1981-01-14 1982-07-23 Jeol Ltd Objective lens for scan type electron microscope

Also Published As

Publication number Publication date
JPS55144639A (en) 1980-11-11

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