JPS5913811B2 - Manufacturing method of switch movable body - Google Patents
Manufacturing method of switch movable bodyInfo
- Publication number
- JPS5913811B2 JPS5913811B2 JP51137750A JP13775076A JPS5913811B2 JP S5913811 B2 JPS5913811 B2 JP S5913811B2 JP 51137750 A JP51137750 A JP 51137750A JP 13775076 A JP13775076 A JP 13775076A JP S5913811 B2 JPS5913811 B2 JP S5913811B2
- Authority
- JP
- Japan
- Prior art keywords
- movable body
- permanent magnet
- metal layer
- switch
- soft metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Manufacture Of Switches (AREA)
- Switches That Are Operated By Magnetic Or Electric Fields (AREA)
Description
【発明の詳細な説明】
本発明はスイッチ可動体の製造方法に関するものであり
、さらに詳しく述べるならば磁場によって移動せしめら
れてスイッチ動作を行うスイッチ可動体の製法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a switch movable body, and more specifically, to a method of manufacturing a switch movable body that is moved by a magnetic field to perform a switch operation.
前述のスイッチ可動体が使用されている一例として第1
図に示す如きスイッチがある。As an example in which the above-mentioned switch movable body is used, the first
There is a switch as shown in the figure.
このスイッチでは、二組の軟質磁性体から々る固定電極
3aと3bおよび4aと4bを夫々電気的に導通したり
遮断したりするために、多孔質焼結体の永久磁石からな
るスイッチ可動体1が前記固定電極3 a t 3 b
および4a、4bに対して図示されていない磁界コイル
によって高速で移動せしめラレ、磁気吸着で衝突接触せ
しめられる。In this switch, a switch movable body made of a permanent magnet made of porous sintered body is used to electrically conduct or cut off two sets of fixed electrodes 3a and 3b and 4a and 4b made of soft magnetic material. 1 is the fixed electrode 3 a t 3 b
4a and 4b are moved at high speed by a magnetic field coil (not shown) and brought into colliding contact with each other by rare and magnetic attraction.
磁界コイルの作用によって可動体1が高速で移動するた
めに、可動体1は固定電極3a、3b或は4 a 、4
bと衝撃的に接触する。In order for the movable body 1 to move at high speed due to the action of the magnetic field coil, the movable body 1 has fixed electrodes 3a, 3b or 4a, 4.
impacting contact with b.
ところで、軟質磁性体は高度の剛性を有するが永久磁石
材料は一般に脆い性質を有しまた磁気的性質が優れた希
土類コバルト磁石は特に脆い性質を有する。By the way, although soft magnetic materials have a high degree of rigidity, permanent magnet materials generally have brittle properties, and rare earth cobalt magnets, which have excellent magnetic properties, are particularly brittle.
したがって永久磁石材料からなるスイッチ可動体1は使
用中にチッピングが生じ、チッピングがスイッチの寿命
を制限している。Therefore, the switch movable body 1 made of a permanent magnetic material is subject to chipping during use, and the chipping limits the life of the switch.
このチッピングを抑制するだめに、昭和51年2月10
日付にて11特願昭51−12799号「スイッチ」”
を提出した。In order to suppress this chipping,
No. 11 Patent Application No. 12799/1979 ``Switch''
submitted.
これは、永久磁石上にニッケル、銅、スズ等の軟質金属
層を形成した後、該金属層上にロジウム、タングステン
等の硬質接点層を形成し、しかる後生なくとも軟質金属
層と永久磁石とを熱拡散するものである。This method involves forming a soft metal layer such as nickel, copper, or tin on a permanent magnet, and then forming a hard contact layer such as rhodium or tungsten on the metal layer. It diffuses heat.
これによれば、接点層が固定電極に衝突した際の衝撃力
を軟質金属層が吸収するだめ、永久磁石の割れや欠けが
生じにくくなり、結果としてチッピングが軽減できるも
のであった。According to this, since the soft metal layer absorbs the impact force when the contact layer collides with the fixed electrode, the permanent magnet is less likely to crack or chip, and as a result, chipping can be reduced.
ところで、このチッピングを防止するには軟質金属層を
少なくとも50μ以上に十分厚くする必要があるが、一
般に金属を厚く被着させるにはメッキ処理が適している
。By the way, in order to prevent this chipping, it is necessary to make the soft metal layer sufficiently thick to at least 50 μm or more, but in general, plating treatment is suitable for depositing metal thickly.
ところが、従来の如く軟質金属として特にニッケル、ス
ズを用い、それを永久磁石上に厚く例えば50μ以上の
厚さでメツキ形成した場合には、熱拡散した際に該軟質
金属は11ふくれ!1を生じ剥離しやすくなることを実
験の結果見出しだ。However, when nickel or tin, in particular, is used as a soft metal and is plated on a permanent magnet to a thickness of, for example, 50μ or more, the soft metal swells by 11 times when thermally diffused! The results of the experiment showed that 1 is generated and peeling becomes easier.
本発明は、軟質金属層が衝撃吸収用に十分に厚く、有効
なチッピング抑止効果をもちさらに密着性が有効なスイ
ッチ可動体の製造方法を提供するものである。The present invention provides a method for manufacturing a switch movable body in which the soft metal layer is sufficiently thick for shock absorption, has an effective chipping prevention effect, and has effective adhesion.
本発明は、容器内に多孔質焼結体の永久磁石からなる可
動体が封入されると共にその両端に軟質磁性体からなる
固定電極が封着され、該可動体が該固定電極の封入端部
に磁気吸着で衝突接触して電気開閉されるスイッチであ
って、前記永久磁石の全面が、前記衝突接触時の衝突エ
ネルギを吸収するだめの軟質金属層により被覆されてお
り、該軟質金属層上に硬質接点金属層が形成されるとと
もに、該永久磁石と前記軟質金属層との間に両者の熱拡
散による密着層を形成されているスイッチ可動体の製造
方法において、前記軟質金属層を厚さ50μ以上の銀メ
ッキ膜で形成するとともに、該銀メツキ膜形成前に該永
久磁石と該銀メッキ膜が熱拡散できる厚さを有し且つ銀
がメッキ附着しうる軟質金属膜からなる下地層をドライ
コーチングによって該永久磁石上に形成することを特徴
とする。In the present invention, a movable body made of a porous sintered permanent magnet is enclosed in a container, and a fixed electrode made of a soft magnetic material is sealed at both ends of the movable body, and the movable body is attached to the enclosed end of the fixed electrode. The switch is electrically opened and closed by magnetically adsorbing collision contact with the permanent magnet, and the entire surface of the permanent magnet is covered with a soft metal layer that absorbs the collision energy at the time of the collision contact, and the soft metal layer is coated with a soft metal layer. In the method for manufacturing a switch movable body, a hard contact metal layer is formed on the permanent magnet and the soft metal layer, and an adhesion layer is formed between the permanent magnet and the soft metal layer by heat diffusion between the two. Formed with a silver plating film of 50μ or more, and before forming the silver plating film, a base layer made of a soft metal film having a thickness that allows the permanent magnet and the silver plating film to thermally diffuse and to which silver can be attached. It is characterized in that it is formed on the permanent magnet by dry coating.
本発明において、銀のメッキ膜を被着する前に形成する
下地膜としては例えばニッケルを、スパッタリング等の
ドライコーチングによって好ましくは10μ以下、被着
させ永久磁石と銀メッキ膜が熱拡散する厚さとしたもの
が使用される。In the present invention, as the base film to be formed before depositing the silver plating film, for example, nickel is deposited by dry coating such as sputtering, preferably to a thickness of 10μ or less, so that the permanent magnet and the silver plating film can be thermally diffused. is used.
この下地膜を使用すると次の工程で銀を永久磁石上にメ
ッキする際に該永久磁石(多孔質体)中に電解液が混入
しない利点がある。The use of this base film has the advantage that the electrolyte will not be mixed into the permanent magnet (porous body) when silver is plated on the permanent magnet in the next step.
下地膜にはスズ、銅等を用いてもよい。Tin, copper, etc. may be used for the base film.
銀のメッキ膜はスイッチ可動体の全面、すなわち固定電
極と接触する面及び接触しない面にも、前者が後者をつ
つみ込むように形成される。The silver plating film is formed on the entire surface of the switch movable body, that is, on the surface in contact with the fixed electrode and on the surface not in contact with it, so that the former covers the latter.
固定電極と接触しない面のメッキ膜はその他の面のメッ
キ膜を支持し補強するために、接触面のチッピング及び
これによる剥離が起こり難くなると考えられる。Since the plating film on the surface not in contact with the fixed electrode supports and reinforces the plating film on other surfaces, it is thought that chipping of the contact surface and resulting peeling are less likely to occur.
銀のメッキ膜の厚さはチッピングが生じないよう50μ
以上とする。The thickness of the silver plating film is 50μ to prevent chipping.
The above shall apply.
メッキ方法としては公知の銀の電解又は無電解メッキが
使用される。As a plating method, known silver electrolytic or electroless plating is used.
なお、微小な可動体にメッキを行う場合は一般のメッキ
法では被処理材の取扱いが困難であるため、被処理材を
ステンレス製の籠に多数人れて、籠を電源に接続してメ
ッキを行つパレルメツキ法が有益である。When plating small moving objects, it is difficult to handle the materials using general plating methods, so the materials to be treated are placed in a stainless steel cage, and the basket is connected to a power source for plating. The Palermecki method is useful.
以上の方法で銀のメッキ膜が形成された可動体を永久磁
石が希土類、コバルト磁石の場合は500ないし850
℃の温度、好ましくは700〜820℃の温度に加熱し
て銀のメッキ膜と永久磁石との間に拡散を起こさせる。If the permanent magnet is a rare earth or cobalt magnet, the movable body on which the silver plating film is formed by the above method has a magnetization of 500 to 850.
C., preferably 700 to 820.degree. C., to cause diffusion between the silver plating film and the permanent magnet.
この拡散によってメッキ膜の密着性が確保されるととも
に膜厚が若干減少する。This diffusion ensures the adhesion of the plating film and also slightly reduces the film thickness.
拡散温度が500°C未満であると拡散が十分進行せず
、850℃を超えると永久磁石の特性が著しく劣下する
。If the diffusion temperature is less than 500°C, diffusion will not proceed sufficiently, and if it exceeds 850°C, the properties of the permanent magnet will deteriorate significantly.
拡散処理は真空中又は不活性ガス雰囲気中で行われる。Diffusion treatment is performed in vacuum or in an inert gas atmosphere.
その理由は表面の酸化物層が、接点性能を害したり又は
さらに皮膜を形成する場合に密着性を害したりするから
である。The reason for this is that the oxide layer on the surface impairs contact performance or impairs adhesion when a film is further formed.
なお本発明の対象とするところは、固定電極がかなシの
剛性を有しているので可動体の衝突エネルギが固定電極
側に十分には吸収されず、チッピング等が可動体被覆部
に生じる如きスイッチである。The object of the present invention is that since the fixed electrode has a slight rigidity, the collision energy of the movable body is not sufficiently absorbed by the fixed electrode side, and chipping etc. occur on the movable body covering part. It's a switch.
本発明ではスイッチ開閉の際の衝突エネルギが極めて犬
なので貴金属接点では強度、耐摩耗、衝撃性が不足する
ので、ロジウム、タングステン等の硬質金属を接点表面
に使用している。In the present invention, since the collision energy when opening and closing the switch is extremely high, noble metal contacts lack strength, wear resistance, and impact resistance, so hard metals such as rhodium and tungsten are used for the contact surfaces.
また、最終製品でもかなりの銀メッキ厚さが残っており
、しかも拡散により膜の密着強度が高められていること
が肝要である。It is also important that a considerable thickness of silver plating remains in the final product, and that the adhesion strength of the film is increased by diffusion.
次に、必要に応じて、接点として一般に使用されるロジ
ウム、タングステン等の硬質接点金属を銀メッキ膜の上
にスパッタリング又はメッキなどの方法で形成する。Next, if necessary, a hard contact metal such as rhodium or tungsten, which is commonly used as a contact, is formed on the silver plating film by sputtering or plating.
以下、本発明を実施例及び比較例に基づいて説明する。The present invention will be described below based on Examples and Comparative Examples.
この実施例及び比較例では希土類コバルト磁石SmCo
5を直径3.5 mm厚さ2朋の円柱状に焼結して、こ
の焼結体に以下説明する表面処理を行って可動体1を形
成した。In this example and comparative example, rare earth cobalt magnet SmCo
5 was sintered into a cylindrical shape with a diameter of 3.5 mm and a thickness of 2 mm, and this sintered body was subjected to the surface treatment described below to form the movable body 1.
尚、この可動体1は実際には第1図に示す如きスイッチ
に適用される。Incidentally, this movable body 1 is actually applied to a switch as shown in FIG.
このスイッチはガラス管等の絶縁容器2中に可動体1を
封入すると共に、該容器2の両端に軟質磁性体例えば5
270イからなる2組の固定電極3a+3bと4a r
4bを夫々封着して形成されている。This switch has a movable body 1 enclosed in an insulating container 2 such as a glass tube, and a soft magnetic material such as 5
Two sets of fixed electrodes 3a + 3b and 4a r consisting of 270
4b and are formed by sealing each other.
そして、該スイッチはコイル磁界で2組の固定電極3a
、3bと4 a t 4 bを夫々A、A’或はB。Then, the switch is connected to two sets of fixed electrodes 3a by the coil magnetic field.
, 3b and 4 a t 4 b as A, A' or B respectively.
■方向に同時に磁化して可動体1を反撥と吸引の磁気力
で左右に移動させ、該可動体1が一方の固定電極に吸着
することにより、該固定電極3aと3b或は4aと4b
が可動体1を介して導通状態となり、スイッチ動作が行
なわれるものである。The movable body 1 is simultaneously magnetized in the direction (1) and moved left and right by the magnetic force of repulsion and attraction, and the movable body 1 is attracted to one of the fixed electrodes, so that the fixed electrodes 3a and 3b or 4a and 4b
becomes conductive via the movable body 1, and a switching operation is performed.
前記永久磁石表面にニッケルのメッキ膜を50μの厚さ
に形成しく第2図A)、これを拡散のために真空中にて
750℃で1時間加熱した(第2図B)。A nickel plating film was formed on the surface of the permanent magnet to a thickness of 50 μm (FIG. 2A), and this was heated in a vacuum at 750° C. for 1 hour for diffusion (FIG. 2B).
この比較例から理解される通り、拡散前の状態ではニッ
ケルは永久磁石に密着しているように見えるが、加熱す
るとB図の如く”ふくれ”を生じる。As understood from this comparative example, nickel appears to be in close contact with the permanent magnet before being diffused, but when heated, it "bulges" as shown in Figure B.
このふくれ現象は熱応力によって生じるものと思われる
が、メッキ厚が50μの場合には部分的に生じただけで
あった。This blistering phenomenon is thought to be caused by thermal stress, but only partially occurred when the plating thickness was 50 μm.
ところが、メッキ厚が60μ、70μ・・・・・・と厚
くするに従ってこのふくれ現象はいたるところに発生し
激しく々る一方であった。However, as the plating thickness increased to 60 μm, 70 μm, etc., this blistering phenomenon occurred everywhere and became more severe.
また、50μ以下では11ふくれ11はほとんど生じな
かった。Further, when the thickness was 50 μm or less, 11 bulges 11 hardly occurred.
〔実施例 1〕
前記永久磁石表面に先づスパッタリングによって6μの
ニッケル下地層を形成した後、該下地層上に銀のメッキ
膜を50μの厚さに形成しく第3図A)、これに拡散の
ため真空中にて750℃で1時間加熱した(第3図B)
。[Example 1] First, a nickel base layer of 6 μm was formed on the surface of the permanent magnet by sputtering, and then a silver plating film was formed on the base layer to a thickness of 50 μm. Therefore, it was heated at 750°C for 1 hour in a vacuum (Fig. 3B).
.
尚、上記実施例1,2の銀メッキ膜は以下の条件で形成
した。Incidentally, the silver plating films of Examples 1 and 2 were formed under the following conditions.
メッキ液組成’ A g CN 50 F! / 1
3 ? KCN60 g/ it t K2 CO35
9/l。Plating solution composition' A g CN 50 F! / 1
3? KCN60 g/it K2 CO35
9/l.
KOH10g/l
浴 温:室温
電流密度=0.2〜0.3 A/ d m攪 拌:
有 り
陽 極:銀
この実施例から明らか々如く、本発明に係る可動体にお
いては、下地層としてニッケルを使用し、衝撃吸収部材
として作用する金属層として銀メッキ膜を用いたもので
あシ、メッキ厚さを50μ以上にしても”ふくれI+を
生じず、密着性の良好なメッキ膜が得られる。KOH 10g/l Bath temperature: room temperature Current density = 0.2-0.3 A/dm Stirring:
Yes Anode: Silver As is clear from this example, in the movable body according to the present invention, nickel is used as the base layer and a silver plating film is used as the metal layer that acts as a shock absorbing member. Even if the plating thickness is 50μ or more, a plating film with good adhesion can be obtained without causing blistering I+.
また、当然ながら、本可動体上にタングステン、ロジウ
ム等の硬質接点層を形成して第1図の如きスイッチに適
用した場合には、銀はニッケルよシ硬度が低く、且つ十
分厚くメッキ形成することが可動であるので、チッピン
グを更によシ軽減できスイッチの寿命化を図ることがで
きる。Also, of course, if a hard contact layer of tungsten, rhodium, etc. is formed on the movable body and applied to a switch as shown in Figure 1, silver has a lower hardness than nickel and must be plated sufficiently thickly. Since the switch is movable, chipping can be further reduced and the life of the switch can be extended.
以上の如く、本発明によればチッピング防止効果が十分
で且つ長寿命な可動体が得られ、その効果は極めて著し
いものである。As described above, according to the present invention, a movable body having a sufficient chipping prevention effect and a long life can be obtained, and the effect is extremely remarkable.
第1図は本発明の方法で製作された可動体が使用される
スイッチの一例を示す概念図。
第2図A。Bは従来の可動体断面の組織を示す顕微鏡写
真であって、Aは拡散前、Bは拡散後の状態を示す。
第3図は本発明の一実施例による可動体断面の組織を示
す顕微鏡写真であって、Aは拡散前、Bは拡散後の状態
を示す。
〔符号の説明〕 1・・・・・・可動体、2・・・・・
・絶縁容器、3a、3b、4a、4b・・・・・・固定
電極。FIG. 1 is a conceptual diagram showing an example of a switch in which a movable body manufactured by the method of the present invention is used. Figure 2A. B is a micrograph showing the structure of a cross section of a conventional movable body, where A shows the state before diffusion and B shows the state after diffusion. FIG. 3 is a micrograph showing the structure of a cross section of a movable body according to an embodiment of the present invention, where A shows the state before diffusion and B shows the state after diffusion. [Explanation of symbols] 1...Movable body, 2...
- Insulating container, 3a, 3b, 4a, 4b...Fixed electrode.
Claims (1)
封入されると共にその両端に軟質磁性体からなる固定電
極が封着され、該可動体が該固定電極の封入端部に磁気
吸着で衝突接触して電気開閉されるスイッチであって、
前記永久磁石の全面が前記衝突接触時の衝突エネルギを
吸収するだめの軟質金属層により被覆されており、該軟
質金属層上に硬質接点金属層が形成されるとともに、該
永久磁石と前記軟質金属層との間に両者の熱拡散による
密着層を形成されているスイッチ可動体の製造方法にお
いて、 前記軟質金属層を厚さ50μ以上の銀メッキ膜で形成す
るとともに、該銀メツキ膜形成前に該永久磁石と該銀メ
ッキ膜が熱拡散できる厚さを有し且つ銀かメッキ附着し
うる軟質金属膜からなる下地層をドライコーチングによ
って該永久磁石上に形成することを特徴とするスイッチ
可動体の製造方法。[Claims] 1. A movable body made of a porous sintered permanent magnet is enclosed in a container, and a fixed electrode made of a soft magnetic material is sealed at both ends of the movable body, and the movable body is made of a porous sintered permanent magnet. A switch that is electrically opened and closed by colliding contact with the enclosed end by magnetic attraction,
The entire surface of the permanent magnet is covered with a soft metal layer that absorbs the collision energy at the time of collision contact, and a hard contact metal layer is formed on the soft metal layer, and the permanent magnet and the soft metal layer are formed on the soft metal layer. In the method for manufacturing a switch movable body in which an adhesion layer is formed between the layers by thermal diffusion of both layers, the soft metal layer is formed with a silver plating film having a thickness of 50 μ or more, and before forming the silver plating film, A movable switch body characterized in that a base layer made of a soft metal film having a thickness that allows thermal diffusion of the permanent magnet and the silver plating film and to which the silver plating can be attached is formed on the permanent magnet by dry coating. manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51137750A JPS5913811B2 (en) | 1976-11-18 | 1976-11-18 | Manufacturing method of switch movable body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51137750A JPS5913811B2 (en) | 1976-11-18 | 1976-11-18 | Manufacturing method of switch movable body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5363584A JPS5363584A (en) | 1978-06-07 |
| JPS5913811B2 true JPS5913811B2 (en) | 1984-04-02 |
Family
ID=15205949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51137750A Expired JPS5913811B2 (en) | 1976-11-18 | 1976-11-18 | Manufacturing method of switch movable body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5913811B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3203037C2 (en) * | 1982-01-29 | 1984-03-08 | Siemens AG, 1000 Berlin und 8000 München | Contact element and process for its manufacture |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4212671Y1 (en) * | 1965-11-06 | 1967-07-18 |
-
1976
- 1976-11-18 JP JP51137750A patent/JPS5913811B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5363584A (en) | 1978-06-07 |
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