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JPS5914103B2 - Ion nitriding equipment - Google Patents
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JPS5914103B2 - Ion nitriding equipment - Google Patents

Ion nitriding equipment

Info

Publication number
JPS5914103B2
JPS5914103B2 JP17039379A JP17039379A JPS5914103B2 JP S5914103 B2 JPS5914103 B2 JP S5914103B2 JP 17039379 A JP17039379 A JP 17039379A JP 17039379 A JP17039379 A JP 17039379A JP S5914103 B2 JPS5914103 B2 JP S5914103B2
Authority
JP
Japan
Prior art keywords
anode
airtight tank
ion nitriding
tank
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17039379A
Other languages
Japanese (ja)
Other versions
JPS5693872A (en
Inventor
光昭 荒金
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP17039379A priority Critical patent/JPS5914103B2/en
Publication of JPS5693872A publication Critical patent/JPS5693872A/en
Publication of JPS5914103B2 publication Critical patent/JPS5914103B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Description

【発明の詳細な説明】 この発明は、イオン窒化処理装置に関する。[Detailed description of the invention] The present invention relates to an ion nitriding apparatus.

詳述すればこの発明は、被処理物を収容した気密槽の中
を、窒素からなる若しくはこれを含有する処理用気体の
雰囲気になし、気密槽内で陽極と陰極の間に電圧を印加
してグロー放電を発生させ、グロー放電および電圧の作
用で処理用気体中の窒素をイオン化し形成された窒素イ
オンを被処理物に衝突させて被処理物の窒化処理を行な
うイオン窒化処理装置に関する。従来のかかるイオン窒
化処理装置においては、気密槽を陽極にしまたはさらに
補助電極を設けてこれを陽極の一部とし、支持台または
吊り治具のような支持具を陽極電位にしてこれで保持さ
れる被処理物を陰極とし、かかる陰極と陽極の間に電圧
を印加してグロー放電を発生させるような電極配備が行
なわれている。
Specifically, the present invention creates an atmosphere of a processing gas consisting of or containing nitrogen in an airtight tank containing a workpiece, and applies a voltage between an anode and a cathode in the airtight tank. The present invention relates to an ion nitriding treatment apparatus that generates a glow discharge, ionizes nitrogen in a processing gas by the action of the glow discharge and voltage, and causes the formed nitrogen ions to collide with the workpiece to nitridize the workpiece. In conventional ion nitriding equipment, the airtight tank is used as an anode, or an auxiliary electrode is provided as part of the anode, and a support such as a support stand or a hanging jig is held at an anode potential. Electrodes are arranged in such a way that the object to be treated is used as a cathode, and a voltage is applied between the cathode and the anode to generate glow discharge.

5 しかしながらこのように気密槽を陽極とした場合に
は、気密槽の不必要な個所での電子衝撃を伴なう放電が
行なわれて放電がアーク放電に移行し易く、気密槽の構
成部分のすみに蓄積した汚染物がアーク放電の原因とな
り、これらの点と相俟つ10て作動初期に極めて大きな
1時アーク放電が発生し、これらはいずれも明らかに望
ましいグロー放電の発生および維持を妨げる。
5 However, when the hermetic tank is used as an anode in this way, discharge accompanied by electron bombardment occurs in unnecessary parts of the hermetic tank, and the discharge tends to shift to arc discharge, causing damage to the constituent parts of the hermetic tank. Contaminants accumulated in the corners cause arcing, and together with these points10 a very large one-hour arc occurs during the early stages of operation, both of which obviously interfere with the production and maintenance of the desired glow discharge. .

さらに前述しなかつたが気密槽は過熱防止のために冷却
され一力窒化処理は540℃程度で行なわれるため、放
電の15発生のために陽極の気密槽に陰極の被処理物を
直接対面させる前述の従来の配備では大きな熱損失が生
じる。また、このような従来の配備によれば気密槽の汚
れで被処理物の汚染が生じるおそれもある。さらに陽極
は分解消掃できることが望まし20いが、気密槽を陽極
とした場合にはその清掃は簡単には達成できない。この
発生の主な目的は、上述したような電極配備に主として
起因する従来のイオン窒化処理装置の欠点を除去するこ
とにある。
Furthermore, although it was not mentioned above, the airtight tank is cooled to prevent overheating and the single-strength nitriding process is carried out at about 540°C, so the cathode to be treated is placed directly in front of the anode airtight tank in order to generate electric discharge. The conventional deployment described above results in large heat losses. In addition, with such a conventional arrangement, there is a risk that the objects to be treated may be contaminated due to dirt in the airtight tank. Furthermore, it is desirable that the anode can be cleaned by decomposition, but cleaning cannot be easily achieved when an airtight tank is used as the anode. The main purpose of this generation is to eliminate the drawbacks of conventional ion nitriding processing equipment, mainly due to the electrode arrangement as described above.

この目的の達成の25ため、この発明は、被処理物を陰
極とし、これを少くとも部分的におおう陽極を気密槽の
中に配置し、気密槽を電気的に中性にしたことを特徴と
する。この特徴によれば、気密槽が放電に無縁の中性3
0に保たれしかもこの気密槽は被処理物とこれを少くと
も部分的に包囲する陽極との間の放電空間から実質上隔
離されることになるので、アーク放電に関連する従来の
欠点はすべて除去されてグロー放電の開始、発生および
維持が容易になる。
In order to achieve this object, the present invention is characterized in that the object to be treated is used as a cathode, and an anode that at least partially covers the cathode is disposed in an airtight tank to make the airtight tank electrically neutral. shall be. According to this feature, the airtight tank is a neutral 3
0 and because this hermetic chamber is virtually isolated from the discharge space between the workpiece and the anode surrounding it at least partially, all of the conventional drawbacks associated with arc discharge are eliminated. removed to facilitate the initiation, generation and maintenance of a glow discharge.

さら35に陽極が気密槽と被処理物の間に配置される一
種の断熱板すなわち熱反射板を構成するので熱損失が従
来のものに比べて著しく低減する。この熱損失の低下は
1例によれば約40%であつた。しかも陽極は取外し可
能に配置できるので、これによつてその分解消掃は極め
て簡単になる。これらの点に加えてこの配置の陽極は気
密槽の汚染による被処理物の汚れを阻止できるような位
置に存する。以下、図面を参照しながらこの発明のイオ
ン窒化処理装置の実施例について説明する。図示のイオ
ン窒化処理装置の実施例において、気密槽10は水平の
基板11とこれの上面周縁部に取外し可能に気密連結さ
れるベル形の槽本体12とによつて構成され、32で示
すように接地される。
Further, since the anode 35 constitutes a kind of heat insulating plate, that is, a heat reflecting plate, disposed between the airtight tank and the object to be treated, heat loss is significantly reduced compared to the conventional one. This reduction in heat loss was approximately 40% in one example. Moreover, since the anode can be arranged in a removable manner, cleaning is thereby considerably simplified. In addition to these points, the anode in this arrangement is located in such a position as to prevent contamination of the treated material due to contamination of the airtight tank. Embodiments of the ion nitriding apparatus of the present invention will be described below with reference to the drawings. In the illustrated embodiment of the ion nitriding treatment apparatus, the airtight tank 10 is composed of a horizontal substrate 11 and a bell-shaped tank body 12 that is removably and airtightly connected to the upper peripheral edge of the horizontal substrate 11, as shown at 32. grounded.

気密槽の中で被処理物14を支持する支持台15はその
脚部によつて気密係合の電気絶縁体16を介して基板1
1に取付けられる。処理用気体の送入部材17は実質上
管状に形成され、下端に送入開口18を有し、上方部分
で槽本体12の頂部開口19を貫通する。送入部材17
の上方個所に取付けられたフランジ20は頂部開口19
をおおいかつ気密係合の電気絶縁体21を介して槽本体
12に連結される。送入部材17の上部開口は電気絶縁
部を有する送入配管22およびこれに配備された弁23
を介して処理用気体源24に連結される。基板11は排
出開口25を有し、これは排出配管26およびこれに配
備された弁27を介して真空排気装置28に連結される
。陽極29は被処理物14の上方および側方をおおうよ
うに気密槽10内に配置されたベル形の金属板であつて
、この陽極は、送入部材17に機械的に取付けられかつ
これに電気的に接続される。
A support stand 15 that supports a workpiece 14 in an airtight tank is connected to a substrate 1 by its legs through an electrical insulator 16 in airtight engagement.
Attached to 1. The treatment gas inlet member 17 is substantially tubular in shape, has an inlet opening 18 at its lower end, and passes through the top opening 19 of the tank body 12 in its upper part. Feeding member 17
The flange 20 attached to the upper part of the top opening 19
It is connected to the tank body 12 via an electrical insulator 21 that covers the body and is in airtight engagement. The upper opening of the feed member 17 is connected to a feed pipe 22 having an electrically insulating part and a valve 23 disposed therein.
It is connected to the processing gas source 24 via. The substrate 11 has a discharge opening 25, which is connected to a vacuum evacuation device 28 via a discharge pipe 26 and a valve 27 arranged therein. The anode 29 is a bell-shaped metal plate placed in the airtight tank 10 so as to cover the top and sides of the workpiece 14, and is mechanically attached to the feeding member 17 and attached thereto. electrically connected.

陽極29を正の電位にするため送入部材17はスイツチ
30を介して電源31に接続される。支持台15を陽極
電位に対して負の電位にして被処理物14を陰極にする
ため、支持台15はスイツチ30を介して電源31に接
続される。上述の構成のイオン窒化処理装置において、
真空排気装置28を作動させ弁27を開いて気密槽の内
部を高度の真空に排気しその後に弁23を開けば気体源
24から配管22を通りさらに送入部材17を通つて処
理用気体が気密槽10の中に充たされる。
The feed member 17 is connected to a power source 31 via a switch 30 in order to bring the anode 29 to a positive potential. The support base 15 is connected to a power source 31 via a switch 30 in order to set the support base 15 at a negative potential with respect to the anode potential and make the object to be treated 14 a cathode. In the ion nitriding apparatus configured as described above,
By activating the vacuum evacuation device 28 and opening the valve 27 to evacuate the inside of the airtight tank to a high degree of vacuum, and then opening the valve 23, the processing gas is passed from the gas source 24 through the piping 22 and further through the inlet member 17. The airtight tank 10 is filled.

気密槽内の処理用気体の圧力は弁23,27の調節によ
つてグロー放電に適した値(低圧)に維持される。次い
でスイツチ30を閉じ陽極29と陰極14の間にグロー
放電発生に適した電圧を印加すれば、前述したような作
用で被処理物14の窒化処理が達成される。このような
イオン窒化処理装置によれば、陽極29が陰極できる被
処理物14の上方および側方をおおうようにかつ被処理
物14と気密槽10の間を遮断するように位置している
ので、また気密槽10が空気的に中性に維持されている
ので、アーク放電によるグロー放電の発生および維持の
妨害が生じることはなく、さらに陽極29は断熱板すな
わち熱反射板を構成して熱損失の低下に役立ちしかも汚
染を遮断する作用をも達成する。
The pressure of the processing gas in the airtight tank is maintained at a value (low pressure) suitable for glow discharge by adjusting the valves 23 and 27. Next, when the switch 30 is closed and a voltage suitable for generating a glow discharge is applied between the anode 29 and the cathode 14, the nitriding treatment of the object 14 is accomplished as described above. According to such an ion nitriding treatment apparatus, the anode 29 is positioned so as to cover the upper side and the side of the object to be treated 14, which can be used as a cathode, and to isolate between the object to be treated 14 and the airtight tank 10. In addition, since the airtight tank 10 is maintained air-neutral, there is no interference with the generation and maintenance of glow discharge due to arc discharge, and furthermore, the anode 29 constitutes a heat insulating plate, that is, a heat reflecting plate, and prevents the generation and maintenance of glow discharge due to arc discharge. It helps reduce losses and also achieves a contamination blocking effect.

さらに上述の説明では明記しなかつたが陽極29は送入
部材17に取外し可能に取付けでき、このように槽成す
れば陽極の分解消掃が極めて容易に遂行できる。
Further, although not specified in the above description, the anode 29 can be removably attached to the feeding member 17, and if the tank is constructed in this way, the anode can be cleaned up very easily.

【図面の簡単な説明】[Brief explanation of drawings]

図面はこの発明によるイオン窒化処理装置の1実施例を
表わす図解図である。 図面において、10は気密槽、14は被処理物、18は
処理用気体の送入部材、25は処理気体の排出開口、2
9は陽極、31は電圧印加用の電源を示す。
The drawing is an illustrative view showing one embodiment of the ion nitriding apparatus according to the present invention. In the drawing, 10 is an airtight tank, 14 is an object to be processed, 18 is a processing gas inlet member, 25 is a processing gas discharge opening, 2
9 is an anode, and 31 is a power source for voltage application.

Claims (1)

【特許請求の範囲】[Claims] 1 被処理物を収容した気密槽の中を、窒素からなる若
しくはこれを含有する処理用気体の雰囲気になし、気密
槽内で陽極と陰極の間に電圧を印加してグロー放電を発
生させ、グロー放電および電圧の作用で処理用気体中の
窒素をイオン化し形成された窒素イオンを被処理物に衝
突させて被処理物の窒化処理を行なうイオン窒化処理装
置において、被処理物を陰極とし、これを少くとも部分
的におおう陽極を気密槽の中に配置し、気密槽を電気的
に中性にしたことを特徴とするイオン窒化処理装置。
1 Create an atmosphere of a processing gas consisting of or containing nitrogen in the airtight tank containing the object to be treated, and generate a glow discharge by applying a voltage between the anode and the cathode in the airtight tank, In an ion nitriding treatment apparatus that ionizes nitrogen in a processing gas by the action of glow discharge and voltage and causes the formed nitrogen ions to collide with the workpiece to nitride the workpiece, the workpiece is used as a cathode, An ion nitriding treatment apparatus characterized in that an anode that at least partially covers the anode is disposed in an airtight tank to make the airtight tank electrically neutral.
JP17039379A 1979-12-28 1979-12-28 Ion nitriding equipment Expired JPS5914103B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17039379A JPS5914103B2 (en) 1979-12-28 1979-12-28 Ion nitriding equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17039379A JPS5914103B2 (en) 1979-12-28 1979-12-28 Ion nitriding equipment

Publications (2)

Publication Number Publication Date
JPS5693872A JPS5693872A (en) 1981-07-29
JPS5914103B2 true JPS5914103B2 (en) 1984-04-03

Family

ID=15904088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17039379A Expired JPS5914103B2 (en) 1979-12-28 1979-12-28 Ion nitriding equipment

Country Status (1)

Country Link
JP (1) JPS5914103B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105804509B (en) * 2016-04-22 2017-11-07 南京物联传感技术有限公司 A kind of Anti-dismantling doorbell structure

Also Published As

Publication number Publication date
JPS5693872A (en) 1981-07-29

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