JPS5916833B2 - Method for forming slippery thin film - Google Patents
Method for forming slippery thin filmInfo
- Publication number
- JPS5916833B2 JPS5916833B2 JP55109413A JP10941380A JPS5916833B2 JP S5916833 B2 JPS5916833 B2 JP S5916833B2 JP 55109413 A JP55109413 A JP 55109413A JP 10941380 A JP10941380 A JP 10941380A JP S5916833 B2 JPS5916833 B2 JP S5916833B2
- Authority
- JP
- Japan
- Prior art keywords
- slippery
- thin film
- film
- particles
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 本発明は、滑性薄膜の形成方法に関する。[Detailed description of the invention] The present invention relates to a method for forming a slippery thin film.
薄膜型の磁気記録媒体、すなわち蒸着磁気テープは、平
面性を有するプラスチックフィルムを使用しているとい
うものの、テープの走行時に滑性が悪く鳴の原因となD
、磁性面、非磁住面に滑性を有する層を設ける必要があ
る。Thin-film magnetic recording media, ie, vapor-deposited magnetic tape, use a flat plastic film, but the tape has poor lubricity and can cause noise when running.
It is necessary to provide a layer having lubricity on the magnetic surface and the non-magnetic surface.
磁性面に滑性層を設ける場合、滑性層の厚みは100O
A以下でなければ、電磁変換特性に悪影響を与える。そ
して従来、滑性を有する薄膜を形成する際、樹脂に滑性
物質として低分子成分のエステル系滑剤等を混入して塗
布し、滑性のある膜を得ていた。しかしながら、テープ
を使用する際は、金属面とテープとの過酷な摩擦の発生
する状態であるため、長時間の信頼性に問題があつた。
本発明は、このような従来からの問題点に対処してなさ
れたものであり、滑性を有する薄膜を容5 易に得んと
するものであ・る。When providing a slippery layer on the magnetic surface, the thickness of the slippery layer is 100O.
If it is less than A, the electromagnetic conversion characteristics will be adversely affected. Conventionally, when forming a thin film having lubricity, a lubricious substance such as an ester lubricant having a low molecular weight component was mixed into a resin and applied to obtain a lubricious film. However, when the tape is used, severe friction occurs between the metal surface and the tape, which poses a problem in long-term reliability.
The present invention has been made to address these conventional problems, and aims to easily obtain a thin film having slipperiness.
第1図は、そのために装置の概略である。図において、
1は塗布されるプラスチックフィルム等の基板、2は紫
外線照射により固化しうる低分子液状樹脂に滑性微粒子
を混合した混合物を基板1上に塗布する塗布装置0 で
あり、ここではグラビア式の塗布機の構造を示す。3は
熱風乾燥炉で、塗布された基板1が加熱され、熱風で塗
布した混合物の一部が飛散蒸発するように設置されてい
る。FIG. 1 is a schematic diagram of a device for this purpose. In the figure,
1 is a substrate such as a plastic film to be coated, and 2 is a coating device 0 that coats a mixture of a low-molecular liquid resin that can be solidified by ultraviolet irradiation and slippery particles onto the substrate 1; The structure of the machine is shown. 3 is a hot air drying oven, which is installed so that the coated substrate 1 is heated and a part of the coated mixture is scattered and evaporated with hot air.
基板1の進行方向と同万回に熱風は流れるようになつて
いる。4は紫外5 線を発生するランプで、樹脂混合物
の硬化を行う。The hot air is designed to flow in the same direction as the direction in which the substrate 1 moves. Reference numeral 4 denotes a lamp that generates ultraviolet rays to cure the resin mixture.
なお、5は基板1の送出部、6は塗布された基板1の巻
取部である。第2図は、樹脂に滑性微粒子を混合して塗
布し、熱風乾燥炉を通さずに紫外線を照射して硬化した
0 状態の樹脂膜の断面図である。Note that 5 is a feeding section for the substrate 1, and 6 is a winding section for the coated substrate 1. FIG. 2 is a sectional view of a resin film in a zero state, which is obtained by applying a mixture of slippery particles to a resin and curing the film by irradiating it with ultraviolet rays without passing through a hot air drying oven.
1は基板、1は樹脂層、8、9は滑性微粒子である。1 is a substrate, 1 is a resin layer, and 8 and 9 are slippery particles.
この図の状態では、滑性微粒子は8のように樹脂の被膜
が出来やすい。9の滑性微粒子のように樹脂の被膜に覆
れないものもあるが、その確率は低い。In the state shown in this figure, the slippery fine particles tend to form a resin film as shown in 8. Although there are some particles such as the slippery particles in No. 9 that cannot be covered with the resin film, the probability of this happening is low.
”5 第3図は、第1図に示すような工程で作成した膜
の構造を示す。"5 FIG. 3 shows the structure of a film created by the process shown in FIG. 1.
1は基板、10は塗布した樹脂膜、11、12は滑性微
粒子である。1 is a substrate, 10 is a coated resin film, and 11 and 12 are slippery particles.
熱風乾燥炉を通すと、11に見られるように滑性微粒子
が樹脂層から一部露出したような構造のものが増加すり
る。12のよウな樹脂に覆れた滑性微粒子は少なくな
る。When the material is passed through a hot air drying oven, the number of slippery particles with a structure partially exposed from the resin layer increases as shown in No. 11. The number of slippery particles covered with resin such as No. 12 is reduced.
第4図は、第2図と第3図の滑性薄膜の摩擦係数を研摩
した金属との接触で調べたものである。FIG. 4 shows the coefficient of friction of the slippery thin films shown in FIGS. 2 and 3 investigated by contact with polished metal.
第4図を見てわかるように第2図の滑性薄膜Aよ5 ク
第3図の滑性薄膜Bが摩擦係数が小さく、滑性が良いこ
とを示している。■−
また信頼性も高い。As can be seen from FIG. 4, the slippery thin film A in FIG. 2 and the slippery thin film B in FIG. 3 have a small coefficient of friction, indicating that they have good lubricity. ■− It is also highly reliable.
本発明で使用する低分子液状樹脂としては、通常の紫外
線硬化樹脂が使用できるが、特に好しいものは1気圧で
沸点が300℃以下のモノマーを主成分とするもので、
ラジカル重合形であれば、シクロヘキシルメタクリレー
ト、t−ブチルスチレン、ジブチルマレート等の単官能
アクリレート類、14−ブタンジオールジアクリレート
、ジエチレングリコールジアクリレート、トリメチロー
ルプロパントリアクリレート等の多官能アクリレート類
の単体あるいは混合体を主成分とし、これにペンゾーン
イソフッビルエーテル、ベンゾフエノン等の光増感剤そ
の他の塗料用添加剤を加えたものがあジ、イオン重合形
であれば、ビニルシクロヘキセンジオキシド、シンクロ
ペンタンエッジオキシド、ジペンテンジオキシド、3−
4エポキシシクロヘキシルメチル一3−4エポキシシク
ロヘキサンカルボキシレート等の脂壊式エポキシ類と、
アリルグリシジルエーテル、フエニルグリシジルエーテ
ル等の他のエポキシ類と紫外線照射によジ分解してルイ
ス酸を生じる硬化触媒、例えばP−ニトロベンゼンジア
ゾニウムヘキサフロロホスフェート、2,4−ジクロロ
ベンゼンジアゾニウムテトラフルオロボレイド等と、ア
セトニトリルプロピオニトリル等の安定剤とからなる組
成物に必要に応じて各種塗料用添加剤を加えたものがあ
る。As the low-molecular liquid resin used in the present invention, ordinary ultraviolet curable resins can be used, but particularly preferred are those whose main component is a monomer with a boiling point of 300°C or less at 1 atm.
In the case of radical polymerization, monofunctional acrylates such as cyclohexyl methacrylate, t-butylstyrene, and dibutyl maleate, and single or polyfunctional acrylates such as 14-butanediol diacrylate, diethylene glycol diacrylate, and trimethylolpropane triacrylate are used. If the main component is a mixture containing a photosensitizer such as penzone isofububyl ether or benzophenone or other paint additives, it is a di-ion polymerized type, then vinyl cyclohexene dioxide, synchro Pentane edge oxide, dipentene dioxide, 3-
4-epoxycyclohexylmethyl-3-4 epoxycyclohexane carboxylate and other fat-breakable epoxies;
Curing catalysts that produce Lewis acids when di-decomposed by UV irradiation with other epoxies such as allyl glycidyl ether and phenyl glycidyl ether, such as P-nitrobenzenediazonium hexafluorophosphate, 2,4-dichlorobenzenediazonium tetrafluoroboride There are compositions comprising a stabilizer such as acetonitrile propionitrile, etc., and various paint additives added thereto as necessary.
滑性微粒子には、黒鉛、グラフアイト、フツ化カーボン
、フツ化黒鉛、二酸化タングステン、窒化ホウ素、二硫
化モリブデン等、渭性を有する微.粉体であればよい。The slippery particles include graphite, graphite, carbon fluoride, graphite fluoride, tungsten dioxide, boron nitride, molybdenum disulfide, and other fine particles with slippery properties. Any powder is fine.
通常は上記樹脂の一種と滑性微粉体を目的に応じて重量
比で0.1%〜50%程度の混合比で使用するが、用途
に応じては、醇剤または他の添加剤を使用し塗布性を改
良することもできる。以下に本発明の具体的な一実施例
を説明する。第3図に示す、本発明で形成する清性薄膜
は、材料として、3−4エポキシシクロヘキシルメチル
一3−4エポキシシクロヘキサンカルボキシレートの樹
脂にP−ニトロベンゼンジアゾニユウムヘキサフロロホ
スフエイトの硬化剤を.5%添加し滑性微粒子として黒
鉛の微粉末で500A〜1000Aのものを重量比で2
0%添加したものを、ボールミルで分散した塗布原液を
、第1図に示す本発明の塗布装置で塗布する。Normally, one of the above resins and a slippery fine powder are used at a mixing ratio of about 0.1% to 50% by weight depending on the purpose, but depending on the purpose, a glaze or other additives may be used. It is also possible to improve the coating properties. A specific embodiment of the present invention will be described below. The clean thin film formed by the present invention shown in FIG. 3 is made of a resin of 3-4 epoxycyclohexylmethyl-3-4 epoxycyclohexane carboxylate and a curing agent of P-nitrobenzenediazonium hexafluorophosphate. .. Add 5% of graphite fine powder as slippery particles with a weight ratio of 500A to 1000A.
A coating stock solution containing 0% additive dispersed in a ball mill is coated using the coating apparatus of the present invention shown in FIG.
塗布する膜厚.は0.5μを塗布し乾燥炉の温度は12
0℃で風量50m3/分を流す。この時の乾燥炉の長さ
は5rrLである。この様な条件で乾燥すると塗布した
膜厚は0.2μ飛散し、その部分の滑性粒子が露出する
。この後、乾燥炉を出た膜の表面に紫外線を照射して、
樹脂を硬化させると第3図に示す滑性薄膜が形成される
。以上のように本発明によれば、渭性のすぐれた渭性薄
膜を得ることができるものであり、蒸着磁気テーブ等の
フイルム面に形成すれば走行性のよい磁気テープを得る
ことができるものである。Thickness of film to be applied. The coating was 0.5 μ and the temperature of the drying oven was 12
Flow an air volume of 50 m3/min at 0°C. The length of the drying oven at this time was 5rrL. When dried under such conditions, the applied film thickness will scatter by 0.2 microns, and the slippery particles in that area will be exposed. After this, the surface of the film that has left the drying oven is irradiated with ultraviolet rays,
When the resin is cured, a slippery thin film shown in FIG. 3 is formed. As described above, according to the present invention, a thin film with excellent wave properties can be obtained, and when formed on the film surface of a vapor-deposited magnetic tape, etc., a magnetic tape with good running properties can be obtained. It is.
第1図は本発明による滑性薄膜の形成方法を実施するた
めに使用する装置の概略構成図、第2図は本発明によら
ない渭性薄膜の断面図、第3図は本発明による渭性薄膜
の断面図、第4図は第2図と第3図の渭性薄膜の摩擦係
数の比較図である。
1・・・・・・基板、2・・・・・・塗布装置、3・・
・・・・熱風乾燥炉、4・・・・・・紫外線発生ランプ
、10・・・・・・樹脂膜、11,12・・・・・・滑
性微粒子。FIG. 1 is a schematic diagram of an apparatus used to carry out the method for forming a slippery thin film according to the present invention, FIG. 2 is a sectional view of a slippery thin film not according to the present invention, and FIG. 3 is a cross-sectional view of a slippery thin film according to the present invention. FIG. 4 is a cross-sectional view of the flexible thin film, and is a comparison diagram of the coefficient of friction of the flexible thin films of FIGS. 2 and 3. 1...Substrate, 2...Coating device, 3...
... Hot air drying oven, 4 ... Ultraviolet generating lamp, 10 ... Resin film, 11, 12 ... Slippery fine particles.
Claims (1)
微粒子を混合した混合物を基板上に塗工した直後に前記
滑性微粒子が露出するように熱風乾燥炉を通過させて前
記混合物の表面部を飛散蒸発させ、その後紫外線を照射
させて硬化させることを特徴とする滑性薄膜の形成方法
。1 Immediately after coating a mixture of a low-molecular liquid resin that can be solidified by ultraviolet irradiation with slippery particles on a substrate, the surface portion of the mixture is passed through a hot air drying oven so that the slippery particles are exposed. A method for forming a slippery thin film, characterized by scattering and evaporating it, and then curing it by irradiating it with ultraviolet rays.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55109413A JPS5916833B2 (en) | 1980-08-09 | 1980-08-09 | Method for forming slippery thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55109413A JPS5916833B2 (en) | 1980-08-09 | 1980-08-09 | Method for forming slippery thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5735971A JPS5735971A (en) | 1982-02-26 |
| JPS5916833B2 true JPS5916833B2 (en) | 1984-04-18 |
Family
ID=14509611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55109413A Expired JPS5916833B2 (en) | 1980-08-09 | 1980-08-09 | Method for forming slippery thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5916833B2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5740755A (en) * | 1980-08-25 | 1982-03-06 | Sony Corp | Magnetic recording medium |
| JPS60214419A (en) * | 1984-04-11 | 1985-10-26 | Matsushita Electric Ind Co Ltd | magnetic recording medium |
| JPH0685267B2 (en) * | 1984-05-07 | 1994-10-26 | 富士写真フイルム株式会社 | Flexible magnetic disk |
| JPS63106924A (en) * | 1986-10-24 | 1988-05-12 | Furukawa Electric Co Ltd:The | Production of protective film for magnetic disk |
| JPS63276712A (en) * | 1987-05-08 | 1988-11-15 | Nippon Telegr & Teleph Corp <Ntt> | Magnetic disk medium |
| JPH02253889A (en) * | 1989-03-29 | 1990-10-12 | Toppan Printing Co Ltd | Formation of uv curing resin coated film |
| JPH0634968B2 (en) * | 1989-08-07 | 1994-05-11 | 関西ペイント株式会社 | Coating film formation method |
| JP4649344B2 (en) * | 2006-02-17 | 2011-03-09 | トリニティ工業株式会社 | UV paint curing equipment, paint curing method |
-
1980
- 1980-08-09 JP JP55109413A patent/JPS5916833B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5735971A (en) | 1982-02-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0119219B1 (en) | Coating compositions and their use in the restorative and/or protective treatment of photographic elements | |
| CA1111722A (en) | Method for coating a polycarbonate article with silica filled organopolysiloxane | |
| JPS5916833B2 (en) | Method for forming slippery thin film | |
| JPS56130835A (en) | Manufacture for magnetic recording medium | |
| JPS5897132A (en) | Manufacture for magnetic recording member | |
| JPS5599987A (en) | Method of preventing transparent article from fogging | |
| JPS5747330A (en) | Production of transparent material with antireflexion properties | |
| WO1983000340A1 (en) | Radiation-curable magnetic paint and magnetic recording medium obtained by using the same | |
| JPS5864627A (en) | Magnetic recording medium | |
| JPS5930142B2 (en) | Method of forming resin thin film | |
| JPH06122841A (en) | Water repellent powder coating and its coating method | |
| JPS6071641A (en) | Electromagnetic shielding for electronic instrument | |
| JPS6087429A (en) | Magnetic recording medium and its production | |
| JPS58220893A (en) | How to prevent paper from curling | |
| JPS5986001A (en) | Method for coating surface of plastic lens | |
| JPS59227045A (en) | Information recording medium | |
| JP3354122B2 (en) | How to paint hard plastic surface | |
| Kang et al. | Fabrication and Characteristics of Non-Solvent Silica-Acryl Monomer Hybrid Sol for Optical Device | |
| JPS6069648A (en) | Silver halide photosensitive material | |
| JPH0327971B2 (en) | ||
| JPS60117430A (en) | Optical disc | |
| JPS6346883B2 (en) | ||
| JPS58218035A (en) | Manufacture of magnetic recording medium | |
| JPS61133029A (en) | Production of magnetic disk medium | |
| JPWO2023054222A5 (en) |