JPS5919721B2 - Method for concentrating adhesive substances - Google Patents
Method for concentrating adhesive substancesInfo
- Publication number
- JPS5919721B2 JPS5919721B2 JP7427280A JP7427280A JPS5919721B2 JP S5919721 B2 JPS5919721 B2 JP S5919721B2 JP 7427280 A JP7427280 A JP 7427280A JP 7427280 A JP7427280 A JP 7427280A JP S5919721 B2 JPS5919721 B2 JP S5919721B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning liquid
- thin film
- film evaporator
- concentrating
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
- B01D1/222—In rotating vessels; vessels with movable parts
- B01D1/223—In rotating vessels; vessels with movable parts containing a rotor
- B01D1/225—In rotating vessels; vessels with movable parts containing a rotor with blades or scrapers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Description
【発明の詳細な説明】
本発明は、付着性を有する物質の濃縮方法に係り、特に
付着物の生成を予防して長時間連続運転を可能ならしめ
る濃縮方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for concentrating a substance having adhesive properties, and more particularly to a concentration method that prevents the formation of deposits and enables continuous operation for a long time.
近年、石油資源の供給減少に伴い、これまで廃棄、焼却
などの方法によって処理してきた、各種産業廃棄物、廃
油、廃水などを再利用することが注目されている。In recent years, with the decrease in the supply of petroleum resources, attention has been paid to the reuse of various industrial wastes, waste oil, waste water, etc., which have been disposed of by methods such as disposal and incineration.
これらの物質の中には、溶剤、樹脂原料、燃料油などと
して利用できる有効成分を含有している場合が多くある
。These substances often contain active ingredients that can be used as solvents, resin raw materials, fuel oil, etc.
これらの物質中の有効成分を回収する方法としては、蒸
発濃縮する方法が手軽で、操作が比較的簡単であること
から、実用性が高い。As a method for recovering the active ingredients in these substances, the method of evaporation and concentration is convenient and relatively easy to operate, and is therefore highly practical.
しかしながら、これらの物質は一般に種々の成分の混合
物であることが多く、濃縮の過程で固形物が生成したり
、非常に粘稠な物質となったりして付着が発生し、有効
成分の回収率を高めようとすればする程、前記の現象が
顕著に表われてくる。However, these substances are generally mixtures of various components, and during the process of concentration, solids are formed or become very viscous substances, which can cause adhesion and reduce the recovery rate of active ingredients. The more you try to increase the value, the more the above phenomenon becomes more noticeable.
従来の有効成分の回収方法は、回分式蒸発缶が主として
使われているが、前記した現象があるので伝熱効率が低
下し、処理時間が長(かかる。Batch-type evaporators are mainly used in conventional methods for recovering active ingredients, but due to the above-mentioned phenomena, the heat transfer efficiency decreases and the processing time is long.
濃縮終了後の清掃など後処理に多大の労力と時間を必要
とする等の欠点を有している。It has drawbacks such as requiring a great deal of labor and time for post-processing such as cleaning after completion of concentration.
本発明(″!、上述した欠点を解消し1、高い伝熱効率
を保持しながら、長時間連続運転することが可能な、付
着性を有する物質の濃縮方法を提供することを目的とし
たものである。The present invention (''!) aims to eliminate the above-mentioned drawbacks and provide a method for concentrating adhesive substances that can be operated continuously for a long time while maintaining high heat transfer efficiency. be.
発明の要点は、濃縮装置として、専用の洗浄液入口を有
する薄膜蒸発機を用いて蒸発濃縮を行い、処理すべき原
料の種類あるいは濃縮物の性状に応じて、洗浄液の種類
、注入量などを制御することを特徴とするものである。The main point of the invention is to perform evaporative concentration using a thin film evaporator with a dedicated cleaning liquid inlet as a concentrator, and to control the type of cleaning liquid, injection amount, etc. according to the type of raw material to be treated or the properties of the concentrate. It is characterized by:
以下、本発明の実施例を図面に基いて説明する。Embodiments of the present invention will be described below with reference to the drawings.
第1図〜第7図において、共通する部分については同一
の符号をつけである。In FIGS. 1 to 7, common parts are denoted by the same reference numerals.
第1図は本発明に用いる竪型薄膜蒸発機の一例を示した
もので、第1図により薄膜蒸発機11の構成および作用
を説明する。FIG. 1 shows an example of a vertical thin film evaporator used in the present invention, and the structure and operation of the thin film evaporator 11 will be explained with reference to FIG.
40は円筒状の伝熱胴で、その内部に放射状に回転翼2
を取付けた回転軸1を設け、この回転軸1は前記伝熱胴
40と回転翼2との間隙41が適当な値に保持されるよ
うに上部軸受42と下部軸受4によって支持され、駆動
プーリー43を介してモーター(図示せず)によって回
転できるように構成されている。40 is a cylindrical heat transfer shell, inside which rotor blades 2 are arranged radially.
A rotating shaft 1 is provided, and this rotating shaft 1 is supported by an upper bearing 42 and a lower bearing 4 so that the gap 41 between the heat transfer shell 40 and the rotor blade 2 is maintained at an appropriate value, and is supported by a drive pulley. 43 so that it can be rotated by a motor (not shown).
伝熱用40の外部には熱媒入口8および熱媒出口9を有
するジャケット3がもうけてあり、加熱用熱媒によって
加熱される。A jacket 3 having a heating medium inlet 8 and a heating medium outlet 9 is provided outside the heat transfer 40, and is heated by the heating medium.
また、伝熱用40には下半部の任意の位置に洗浄液人口
44がもうけである。In addition, the heat transfer 40 has a cleaning liquid 44 located at an arbitrary position in the lower half thereof.
この洗浄液人口44は、軸長手方向あるいは円周方向に
複数個もうけても差支えない。A plurality of the cleaning liquid portions 44 may be provided in the longitudinal direction of the shaft or in the circumferential direction.
濃縮すべき原料は、原料供給口5より薄膜蒸発機11の
内部に注入され、回転している回転翼2の作用によって
伝熱用40内壁面に薄膜を形成し、間隙41を下方に移
行する。The raw material to be concentrated is injected into the thin film evaporator 11 from the raw material supply port 5, forms a thin film on the inner wall surface of the heat transfer 40 by the action of the rotating rotor 2, and moves downward through the gap 41. .
伝熱用40はジャケット3内の熱媒によって加熱されて
いるため、原料中の蒸発成分が蒸発する。Since the heat transfer member 40 is heated by the heat medium in the jacket 3, the evaporative components in the raw material evaporate.
蒸発を完了した濃縮物は濃縮物出口6により抜出される
。The concentrate that has completed evaporation is extracted through the concentrate outlet 6.
一方、蒸発気体は伝熱用40の空間を上方に移行し、蒸
発気休出ロアより抜出される。On the other hand, the evaporated gas moves upward through the heat transfer space 40 and is extracted from the evaporated gas outlet lower part.
また、洗浄液人口44より洗浄液が連続的あるいは間欠
的に伝熱用40下半部に注入され、伝熱用40および回
転翼2に生成した付着物を洗浄する。Further, the cleaning liquid is continuously or intermittently injected into the lower half of the heat transfer 40 from the cleaning liquid 44 to clean the deposits generated on the heat transfer 40 and the rotor 2 .
前記洗浄液の一部は、上述した蒸発作用によって蒸発し
て蒸発気体と合一し、残りは濃縮物と合一して抜出され
る。A part of the cleaning liquid is evaporated by the above-mentioned evaporation effect and combined with the evaporated gas, and the rest is combined with the concentrate and extracted.
上記した作用によって付着性を有する物質を濃縮するこ
とができる。The above-mentioned action allows the adhesive substance to be concentrated.
一般に、各種産業廃棄物、廃油、廃水などを長時間加熱
すると、その一部または全部の成分が分解変質し、真に
有効な成分が回収できないことがある。Generally, when various industrial wastes, waste oil, waste water, etc. are heated for a long time, some or all of their components decompose and deteriorate, and truly effective components may not be recovered.
ところが、薄膜蒸発機11は上記したように薄膜を形成
して加熱するので、非常に短時間で蒸発を完了させるこ
とができ、短い滞留時間で効率よく濃縮することができ
るため、上記物質の濃縮機として最適である。However, since the thin film evaporator 11 forms a thin film and heats it as described above, it can complete evaporation in a very short time and can efficiently concentrate the substance with a short residence time. It is ideal as a machine.
特に上記物質のように付着性を有する物質を濃縮する場
合には、洗浄液人口44をもうけた薄膜蒸発機11を用
いることが真に有効である。Particularly when concentrating a substance that has adhesive properties such as the above-mentioned substance, it is truly effective to use the thin film evaporator 11 provided with the cleaning liquid 44.
なお、薄膜蒸発機11には竪型と横型があるが、処理す
べき原料の性状によって使い分けすることができる。The thin film evaporator 11 has a vertical type and a horizontal type, which type can be used depending on the properties of the raw material to be treated.
すなわち、濃縮物の粘度が比較的低い場合には横型が適
当であり、粘度が高い場合には竪型の方が適当である。That is, when the viscosity of the concentrate is relatively low, a horizontal type is appropriate, and when the viscosity is high, a vertical type is more appropriate.
本発明の一実施例を第2図によって説明する。An embodiment of the present invention will be described with reference to FIG.
原料21を薄膜蒸発機11に注入し、ここで蒸発すべき
成分を蒸発濃縮させて濃縮物受槽12に導き、濃縮物2
6として抜出す。The raw material 21 is injected into the thin film evaporator 11, where the components to be evaporated are evaporated and concentrated and guided to the concentrate receiving tank 12, where the concentrate 2
Extract as 6.
蒸発気体23は冷媒34によって冷却されている冷却器
15に導き、冷却凝縮されて凝縮物22となり、凝縮物
受槽16に入り抜出される。The evaporated gas 23 is guided to the cooler 15 where it is cooled by a refrigerant 34, where it is cooled and condensed to form a condensate 22, which enters a condensate receiving tank 16 and is extracted.
洗浄液31は薄膜蒸発機11の付着の激しい部分に注入
され、所要部分の洗浄をなし、一部は蒸発気体と合一し
、残りは濃縮物と合一する。The cleaning liquid 31 is injected into areas of the thin film evaporator 11 with heavy adhesion to clean the required areas, part of which is combined with the evaporated gas, and the remaining part is combined with the concentrate.
この洗浄作用により、薄膜蒸発機11は常に付着のない
清浄な状態に保持される。Due to this cleaning action, the thin film evaporator 11 is always maintained in a clean state free from adhesion.
以上のような構成および作用により、短時間に効率よく
、安価に、かつ装置の運転を停止して清掃を行う必要が
なく、付着性を有する物質を連続運転により濃縮するこ
とができる。With the above-described configuration and operation, it is possible to concentrate adhesive substances in a continuous operation in a short time, efficiently, at low cost, and without having to stop the operation of the apparatus for cleaning.
実施例
伝熱用40の直径100mm、長さ1000mm、洗浄
液人口44を上から700mmのところにもうけた竪型
薄膜蒸発機11に、熱媒として160℃の飽和水蒸気を
使用し、10%の固形物を含有する汚泥を濃度70%ま
で濃縮した結果
(1)洗浄液(水道水)を原料注入量の古とした時、8
時間連続運転して蒸発量は全く変化しない。Example A vertical thin film evaporator 11 having a heat transfer device 40 with a diameter of 100 mm and a length of 1000 mm and a cleaning liquid evaporator 44 placed 700 mm from the top was equipped with saturated steam at 160° C. as a heat medium and a 10% solid vapor. As a result of concentrating the sludge containing substances to a concentration of 70% (1) When the cleaning liquid (tap water) is used as the amount of raw material injected, 8
The amount of evaporation does not change at all after continuous operation for hours.
この時の原料注入量は607/hであった。The raw material injection rate at this time was 607/h.
(2)洗浄液を注入しない場合、運転開始後4時間で蒸
発量は当初の÷に減少した。(2) When no cleaning liquid was injected, the amount of evaporation decreased to ÷ the initial amount 4 hours after the start of operation.
この時伝熱用400下側+の部分に付着物の生成が認め
られた。At this time, the formation of deposits was observed on the bottom + portion of the heat transfer 400.
同様の濃縮操作を内容積1001の蒸発缶で行った処、
単位時間あたりの蒸発量は、伝熱面積換算で薄膜蒸発機
11の+であり、濃度50%を越えた時点から蒸発量が
極端に減少し、濃度70%に濃縮した濃縮物を得るのに
前記(1)の場合の3倍の時間を必要とし、かつ強固な
付着物が生成して清掃に多大の時間を必要とした。When the same concentration operation was performed in an evaporator with an internal volume of 1001,
The amount of evaporation per unit time is + of the thin film evaporator 11 in terms of heat transfer area, and the amount of evaporation decreases extremely from the point when the concentration exceeds 50%, and it takes until a concentrate with a concentration of 70% is obtained. The time required was three times that of the case (1) above, and strong deposits were formed, requiring a large amount of time for cleaning.
第3図は本発明の他の実施例を示したもので、この実施
例は薄膜蒸発機11へ注入する洗浄液31として、原料
21の一部を用いるようにしたものであり、注入量は原
料制御弁51および洗浄液制御弁52によって制御され
ており、他は第2図の場合と同様である。FIG. 3 shows another embodiment of the present invention, in which a part of the raw material 21 is used as the cleaning liquid 31 injected into the thin film evaporator 11, and the injection amount is It is controlled by a control valve 51 and a cleaning liquid control valve 52, and the rest is the same as in the case of FIG.
このように構成することによって、原料の一部をそのま
ま洗浄液として利用できるので、洗浄液タンクなどの特
別の設備を必要とせず、また、濃縮物および凝縮物の成
分に原料以外の不純物が含有されない効果がある。With this configuration, a part of the raw material can be used as a cleaning liquid as is, so special equipment such as a cleaning liquid tank is not required, and the concentrate and condensate components do not contain impurities other than the raw materials. There is.
第4図は本発明の更に他の実施例を示したもので、この
実施例は薄膜蒸発機11へ注入する洗浄液31として、
凝縮物22の一部を用いるようにしたものであり、注入
量は凝縮液制御弁53および洗浄液制御弁52によって
制御されており、他は第2図の場合と同様である。FIG. 4 shows still another embodiment of the present invention, in which the cleaning liquid 31 to be injected into the thin film evaporator 11 is
A portion of the condensate 22 is used, and the amount of injection is controlled by a condensate control valve 53 and a cleaning liquid control valve 52, and the rest is the same as in the case of FIG.
このように構成することによって、M物22の一部をそ
のまま洗浄液として利用できるため、第3図に示した実
施例と同様な効果がある他に、一般に凝縮物は付着物を
溶解させる性質が強いので、洗浄液31の注入量が少な
(てすむという効果がある。With this configuration, a part of the M material 22 can be used as a cleaning liquid as it is, so in addition to having the same effect as the embodiment shown in FIG. 3, condensate generally has the property of dissolving deposits. Since it is strong, it has the effect of requiring less injection of the cleaning liquid 31.
第5図は本発明の更に他の実施例を示したもので、この
実施例は薄膜蒸発機110回転翼2の駆動動力を動力検
出計55によって検出し、この動力が一定となるように
洗浄液制御弁52を開閉して、洗浄液31の注入量を制
御するようにしたもので、他は第2図の場合と同様であ
る。FIG. 5 shows still another embodiment of the present invention, in which the driving power of the rotor blades 2 of the thin film evaporator 110 is detected by a power detector 55, and the cleaning fluid is The control valve 52 is opened and closed to control the amount of cleaning liquid 31 injected, and the rest is the same as the case shown in FIG. 2.
この場合、実験結果より付着物が生成しはじめる場合に
は、粘度上昇による動力増大、あるいは動力変動中が大
きくなる等の異常が生じることが判明しており、これら
の異常が生じないよう一定の動力値に制御すればよい。In this case, it has been found from experimental results that when deposits begin to form, abnormalities such as increased power due to increased viscosity or increased power fluctuations occur, and certain measures are taken to prevent these abnormalities from occurring. It is sufficient to control the power value.
このように構成することによって、洗浄液31の注入量
を節約することができ、経費を低減することができるの
みならず、一定品質の濃縮物が常に安定して得られると
いう効果がある。By configuring in this way, it is possible to save the injection amount of the cleaning liquid 31, which not only reduces costs, but also has the effect that a concentrate of constant quality can always be stably obtained.
第6図は本発明の更に他の実施例を示したもので、この
実施例は薄膜蒸発機11から抜出した直後の濃縮物26
の温度を濃縮物温度計56によって検知し、この温度が
一定になるように洗浄液制御弁52を開閉して、洗浄液
31の注入量を制御するようにしたものであり、他は第
2図の場合と同様である。FIG. 6 shows still another embodiment of the present invention, in which the concentrate 26 immediately after being extracted from the thin film evaporator 11 is shown in FIG.
The temperature of the liquid is detected by a concentrate thermometer 56, and the injection amount of the cleaning liquid 31 is controlled by opening and closing the cleaning liquid control valve 52 so that this temperature becomes constant. Same as in case.
この場合、実験結果より濃縮物26の温度と濃度の間に
は一定の関係があることが判明しており、また、付着物
は、濃度が高い程生成し易いことも判明しているため、
付着を生成しない最高限度の温度に制御すればよい。In this case, experimental results have shown that there is a certain relationship between the temperature and concentration of the concentrate 26, and it has also been found that deposits are more likely to form as the concentration increases.
It is sufficient to control the temperature to the maximum limit that does not cause adhesion.
このように構成することによって第5図に示した実施例
と同様な効果がある。This configuration provides the same effect as the embodiment shown in FIG. 5.
第7図は本発明の更に他の実施例を示したもので、この
実施例は薄膜蒸発機11から抜出した直後の蒸発気体2
3の温度を蒸発気体温度計57によって検知し、この温
度が一定になるように洗浄液制御弁52を開閉して洗浄
液31の注入量を制御するようにしたものであり、他は
第2図の場合と同様である。FIG. 7 shows still another embodiment of the present invention, in which the evaporated gas 2 immediately after being extracted from the thin film evaporator 11 is
3 is detected by an evaporative gas thermometer 57, and the cleaning liquid control valve 52 is opened and closed to control the injection amount of cleaning liquid 31 so that this temperature is kept constant. Same as in case.
特に蒸発物が2成分以上あり、おのおのの沸点が異って
いる場合、蒸発気体23の温度と濃縮物26の濃度の間
には一定の関係があることが判明しており、第6図に示
した実施例と同様に制御すればよい。In particular, when there are two or more evaporated components, each with a different boiling point, it has been found that there is a certain relationship between the temperature of the evaporated gas 23 and the concentration of the condensate 26, as shown in Figure 6. Control may be performed in the same manner as in the embodiment shown.
このように構成することによって第5図に示した実施例
と同様な効果がある。This configuration provides the same effect as the embodiment shown in FIG. 5.
本発明は以上述べたようにしたものであるから、つぎの
ような効果がある。Since the present invention is as described above, it has the following effects.
(1)付着性を有する物質中から、効率よく連続的に有
効成分を回収することができ、運転経費、人件費等の諸
経費を低減することができる。(1) Active ingredients can be efficiently and continuously recovered from adhesive substances, and various expenses such as operating costs and personnel costs can be reduced.
(2)装置の運転開始および停止が容易であり、必要に
応じて種々の物質を処理することができ、経済的である
。(2) The device is easy to start and stop, can process various substances as needed, and is economical.
(3)装置をひんばんに清掃する必要がないため、清掃
作業に伴う有害環境への出入り等が少なくてすみ、安全
性が高い。(3) Since there is no need to frequently clean the device, there is less need to enter and exit the hazardous environment associated with cleaning work, resulting in high safety.
第1図は本発明に使用する竪型薄膜蒸発機の一例を示す
縦断面図、第2図は本発明の一実施例を示す系統図、第
3図ないし第7図は本発明の他の実施例を示す系統図で
ある。
1・・・・・・回転軸、2・・・・・・回転翼、計・・
・・・ジャケット、4・・・・・・下部軸受、5・・・
・・・原料供給口、6・−・・・・濃縮物出口、7・−
・・・・蒸発気体出口、8・・・・・・熱媒入口、9・
・・・・・熱媒出口、11・−・・・・薄膜蒸発機、1
2・・・・・・濃縮物受槽、15・・・・・・冷却器、
16・・・・・・凝縮物受槽、21・・・・・・原料、
22・・・・−・凝縮物、23・・・・・・蒸発気体、
26・・・・・・濃縮物、31・・・・・・洗浄液、3
2・・・・・・熱媒、34・・・・・・冷媒、40・・
・・・・伝熱胴、41・・・・・・間隙、42・・・・
・・上部軸受、43・・・・・・駆動プーリー、44・
・・・・・洗浄液入口、51・・・−・・原料制御弁、
52・・・・・・洗浄液制御弁、53・・・・・・凝縮
液制御弁、55・・・・・・動力検出計、56−・・・
・・濃縮物温度計、57・・・・・・蒸発気体温度計。FIG. 1 is a longitudinal sectional view showing an example of a vertical thin film evaporator used in the present invention, FIG. 2 is a system diagram showing an embodiment of the present invention, and FIGS. It is a system diagram showing an example. 1...rotating shaft, 2...rotor blade, total...
...Jacket, 4...Lower bearing, 5...
... Raw material supply port, 6.-- Concentrate outlet, 7.-
...Evaporation gas outlet, 8...Heat medium inlet, 9.
... Heat medium outlet, 11 ... Thin film evaporator, 1
2...Concentrate receiving tank, 15...Cooler,
16... Condensate receiving tank, 21... Raw material,
22... Condensate, 23... Evaporated gas,
26...Concentrate, 31...Washing liquid, 3
2... Heat medium, 34... Refrigerant, 40...
... Heat transfer cylinder, 41 ... Gap, 42 ...
... Upper bearing, 43 ... Drive pulley, 44.
...Cleaning liquid inlet, 51...Raw material control valve,
52...Cleaning liquid control valve, 53...Condensate control valve, 55...Power detector, 56-...
...Concentrate thermometer, 57...Evaporating gas thermometer.
Claims (1)
含む原料を供給して蒸発成分を除去すると共に、前記薄
膜蒸発機内に洗浄液を供給して付着生成物を洗浄するよ
うにした付着性を有する物質を濃縮する方法において、
前記洗浄液の供給量を前記薄膜蒸発機の駆動動力に応じ
て制御することを特徴とする付着性を有する物質の濃縮
方法。 2 前記洗浄液として原料の一部を供給する特許請求の
範囲第1項記載の付着性を有する物質の濃縮方法。 3 前記洗浄液として蒸発成分を冷却凝縮した凝縮物の
一部を供給する特許請求の範囲第1項記載の付着性を有
する物質の濃縮方法。[Scope of Claims] 1. A raw material containing an adhesive substance is supplied to a thin film evaporator having a heating jacket to remove the evaporated component, and a cleaning liquid is supplied to the thin film evaporator to clean the adhered product. In a method for concentrating a substance having an adhesive property,
A method for concentrating a substance having adhesive properties, characterized in that the supply amount of the cleaning liquid is controlled according to the driving power of the thin film evaporator. 2. The method for concentrating a substance having adhesive properties according to claim 1, wherein a part of the raw material is supplied as the cleaning liquid. 3. The method for concentrating a substance having adhesive properties according to claim 1, wherein a part of the condensate obtained by cooling and condensing the evaporated components is supplied as the cleaning liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7427280A JPS5919721B2 (en) | 1980-06-04 | 1980-06-04 | Method for concentrating adhesive substances |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7427280A JPS5919721B2 (en) | 1980-06-04 | 1980-06-04 | Method for concentrating adhesive substances |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS571403A JPS571403A (en) | 1982-01-06 |
| JPS5919721B2 true JPS5919721B2 (en) | 1984-05-08 |
Family
ID=13542306
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7427280A Expired JPS5919721B2 (en) | 1980-06-04 | 1980-06-04 | Method for concentrating adhesive substances |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5919721B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100398706B1 (en) * | 2001-05-22 | 2003-09-19 | 삼원금속 주식회사 | Evaporator of waste-water for the recovery of precious metals |
| KR100784190B1 (en) * | 2001-12-17 | 2007-12-11 | 주식회사 포스코 | Exhaust Fume Removal Device of Electroplating Solution Solution Tank |
| KR100827625B1 (en) | 2006-10-19 | 2008-05-07 | 정윤기 | Pretreatment device for wastewater treatment |
| JP5186807B2 (en) | 2007-05-28 | 2013-04-24 | 株式会社日立プラントテクノロジー | Liquid concentration system |
| CN117122943B (en) * | 2023-10-27 | 2024-01-30 | 深圳市中瑞远博智能系统有限公司 | MVR concentration equipment suitable for heat-sensitive material |
-
1980
- 1980-06-04 JP JP7427280A patent/JPS5919721B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS571403A (en) | 1982-01-06 |
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