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JPS5919836B2 - Recording parts - Google Patents
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JPS5919836B2 - Recording parts - Google Patents

Recording parts

Info

Publication number
JPS5919836B2
JPS5919836B2 JP49119341A JP11934174A JPS5919836B2 JP S5919836 B2 JPS5919836 B2 JP S5919836B2 JP 49119341 A JP49119341 A JP 49119341A JP 11934174 A JP11934174 A JP 11934174A JP S5919836 B2 JPS5919836 B2 JP S5919836B2
Authority
JP
Japan
Prior art keywords
light
paraffin
recording
transparent electrode
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49119341A
Other languages
Japanese (ja)
Other versions
JPS5146124A (en
Inventor
元康 寺尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP49119341A priority Critical patent/JPS5919836B2/en
Publication of JPS5146124A publication Critical patent/JPS5146124A/ja
Publication of JPS5919836B2 publication Critical patent/JPS5919836B2/en
Expired legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Recording Measured Values (AREA)

Description

【発明の詳細な説明】 この発明は、光を照射し、抵触(軟化)点物質の蒸発ま
たは拡散またはそれらの両方による変形を利用して像の
記録、または記録の書換えを行なう装置に関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a device that records an image or rewrites the recording by irradiating light and utilizing deformation of a contact (softening) point substance by evaporation, diffusion, or both. be.

油などの有機物の膜に赤外線を照射すると、蒸発や拡散
によつて変形が起こり、像の表示や記録を行なえること
は古くから知られている。
It has long been known that when a film of organic matter such as oil is irradiated with infrared rays, it undergoes deformation through evaporation and diffusion, allowing images to be displayed or recorded.

また。本出願人の先願(特願昭48−133420号)
において述べられているように、表面に微細な凹凸を持
つた基板上に抵触(軟化)点物質を広げて光を照射し、
上記の抵触(軟化)点物質の蒸発または拡散またはそれ
らの両方による変形を利用して記録または記録の書換え
を行なうと解像度が高く、記録の書換えも極めて多数回
行なえる。記録を多数の記録用部材に行なう場合、或い
は記録の書換えを多数回行なうと蒸発量はわずかである
が。光源または光源からの光を処理する光学系およびそ
の他の部分に抵触(軟化)点物質が付着して、光を記録
面上に導くのに支障が起こつたり、他の部分、例えば記
録部分を移動させる機構の機能をさまたげたυする。ま
た、記録膜上への塵埃の付着によつて、記録、再生に障
害を受ける。本発明の目的は、記録装置の記録用部分以
外に記録材料等が多量に付着することを防止すること。
Also. The applicant's earlier application (Japanese Patent Application No. 133420/1982)
As described in , a contact (softening) point substance is spread on a substrate with fine irregularities on the surface and irradiated with light.
Recording or rewriting of records using deformation due to evaporation, diffusion, or both of the above-mentioned collision (softening) point substance provides high resolution and allows recording to be rewritten an extremely large number of times. When recording is performed on a large number of recording members, or when recording is rewritten many times, the amount of evaporation is small. Contact (softening) point substances may adhere to the light source, the optical system that processes the light from the light source, and other parts, causing problems in guiding the light onto the recording surface or damaging other parts, such as the recording part. Interfering with the function of the moving mechanism. Further, the adhesion of dust on the recording film causes problems in recording and reproduction. An object of the present invention is to prevent a large amount of recording material from adhering to areas other than the recording portion of a recording device.

および記録面の損傷、汚染の防止をはかることにある。
上記の目的を達成するために、本発明の装置は基本的に
次の如き構成を取る。
and to prevent damage and contamination of the recording surface.
In order to achieve the above object, the apparatus of the present invention basically has the following configuration.

書き込みのための光源を含む部分と記録部分とを隔壁に
よつて分離し、光源を含む部分から記録部分へ光が入射
する部分には、記録に必要な光を透過する透光性領域(
窓)を設ける。これによつて記録部分以外に記録材料が
付着するのを防ぐことができる。抵触(軟化)点物質と
しては、パラフィン、ロウ、高級アルコール、高級脂肪
酸などが考えられるが、本発明は本質的にこれらの物質
の性質に依存するものではない。
The area containing the light source for writing and the recording area are separated by a partition wall, and the area where light enters the recording area from the area containing the light source is provided with a light-transmitting area (transparent area) that transmits the light necessary for recording.
window). This can prevent the recording material from adhering to areas other than the recorded area. Paraffin, wax, higher alcohol, higher fatty acid, etc. can be considered as the conflict (softening) point substance, but the present invention does not essentially depend on the properties of these substances.

常温で液体または固体であり、基板に付着し得る物質で
、基板に損傷を与えないものであれば、広範囲な物質を
用いることができる。たとえば鉛、タンタル等をはじめ
とする金属、合金、カルコゲン化物等を記録材料とし得
る。本発明の装置の用途によつて、基板としてたとえば
熱伝導度の低い物質を用い、熱の像形成面に対して横方
向への広がりを防いで解像度を高めるとか、抵触(軟化
)点物質と屈折率があまわ違ヒわず、透過率の高い物質
を用いて光の乱反射・乱屈折を防ぐとか6低融(軟化)
点物質として光重合性を持つ物質を用いるとか,読み出
し光に対する透過率の高い物質を用いるとかする必要が
あることはもちろんである。
A wide range of substances can be used as long as they are liquid or solid at room temperature, can adhere to the substrate, and do not damage the substrate. For example, metals including lead, tantalum, etc., alloys, chalcogenides, etc. can be used as recording materials. Depending on the application of the device of the invention, for example, the substrate may be made of a material with low thermal conductivity to prevent the spread of heat laterally to the imaging surface to increase resolution, or a material with a collision (softening) point may be used as the substrate. 6. Low melting (softening): Preventing diffuse reflection and refraction of light by using a material with a high transmittance without changing the refractive index.
It goes without saying that it is necessary to use a photopolymerizable material as the dot material, or to use a material with high transmittance to read light.

たとえば基板としてガラスや石英ガラスなどが用いられ
る。この装置において像を記録するには.光源の光を、
マイクロフイルム等を通して.この装置の低融(軟化)
点物質か,低融(軟化)点物質に近接して設けた光吸収
層に照射したり、ホログラムを形成する光を照射したD
.像の情報に応じて強度変調された光を集光し.走査し
ながら.あるいは逆に記録面を動かしながら照射するこ
とによつて低融(軟化)点物質に蒸発や拡散などによる
変形や,重合と,加熱による重合していない部分の蒸発
による変形を起こさせる。
For example, glass or quartz glass is used as the substrate. To record images with this device. The light of the light source,
Through microfilm, etc. Low melting (softening) of this device
A point material or a light absorbing layer provided close to a low melting (softening) point material is irradiated, or a light that forms a hologram is irradiated.
.. It focuses light whose intensity is modulated according to image information. While scanning. Alternatively, by irradiating the recording surface while moving it, the low-melting (softening) point material is deformed by evaporation, diffusion, etc., or deformed by polymerization and evaporation of the unpolymerized portion by heating.

特に重合によらない変形の場合には.光に対する感度が
比較的低いので増感を行なうのがよく6その方法として
は6低融(軟化)点物質に近接して透明電極などの導電
性物質を設け,補助加熱する方法.低融(軟化)点物質
に近接して光吸収層を設ける方法,高周波電圧を印加す
る方法など.多くの方法が考えられる。光吸収層の物質
の選択によつて.紫外光6赤外光を含むあらゆる光を吸
収させることができ.光吸収層の膜厚を適当に選べば半
透明にすることもできるので.任意の波長の光で像を形
成し、同じ波長の光で像の読み出しを行なうこともでき
る。記録の消去は.それが可能な場合6たとえば低融(
軟化)点物質に近接して設けた導電性物質に電流を流し
て加熱し低融(軟化)点物質の基板上での拡散によつて
.一様な膜にもどすこと.上記の電流による加熱を高温
まで行ない.低融(軟化)点物質を高速度で蒸発させる
と同時に基板上で拡散させて膜厚の減少した一様な膜と
すること,光重合性の低融(軟化)点物質の場合には.
重合した部分をも含めて膜を蒸発させること,によつて
行なうことができる。以下、本発明を実施例によつて詳
しく説明する。
Especially in the case of deformation that is not due to polymerization. Since the sensitivity to light is relatively low, it is best to sensitize it6.One method is to provide auxiliary heating by providing a conductive material such as a transparent electrode in the vicinity of the low melting (softening) point material. Methods include providing a light absorption layer close to a low melting (softening) point substance, and applying high frequency voltage. Many methods are possible. Depending on the choice of material for the light absorption layer. It can absorb all kinds of light including ultraviolet light and 6 infrared light. If the thickness of the light absorption layer is selected appropriately, it can be made semitransparent. It is also possible to form an image using light of any wavelength and read out the image using light of the same wavelength. Deletion of records. If it is possible6. For example, low melting point (
A conductive material placed close to a material with a low melting (softening) point is heated by passing an electric current through it, and the material with a low melting (softening) point is diffused on the substrate. Return to a uniform film. Heating with the above electric current is performed to a high temperature. In the case of photopolymerizable low melting (softening) point substances, a low melting (softening) point substance is evaporated at high speed and simultaneously diffused on the substrate to form a uniform film with a reduced thickness.
This can be done by evaporating the film including the polymerized portion. Hereinafter, the present invention will be explained in detail with reference to Examples.

実施例 1第1図に示す如く、ガラス基板1上に透明電
極2を着け.その上に基板を200℃に保つてCdS膜
3を約5000Xの膜厚に蒸着する。
Example 1 As shown in FIG. 1, a transparent electrode 2 was placed on a glass substrate 1. A CdS film 3 is deposited thereon to a thickness of about 5000× while keeping the substrate at 200° C.

その上に石英ガラス4をスパツタリングによつて約20
00xの膜厚に着け6これに凹凸を設ける。一方,ガラ
ス板6上に透明電極7を着け,その上に石英ガラス8を
約1500λの膜厚に着け.これに凹凸を設ける。凹凸
の作b方は,まず凹凸を形成する面およびその周辺に.
ポジタイプ(光分解型)フオトレジストを塗布する。
Approximately 20 pieces of quartz glass 4 are sputtered on top of it.
A film thickness of 00x is formed and unevenness is provided on this. On the other hand, a transparent electrode 7 was placed on a glass plate 6, and a quartz glass 8 was placed on top of it to a thickness of about 1500λ. Provide irregularities on this. To create the unevenness, first create the surface on which the unevenness is to be formed and its surroundings.
Apply a positive type (photodegradable) photoresist.

次に第2図に示したようにHe−Cdレーザ12からの
レーザ光をビームエキスパンダー13で広げ6ハーフミ
ラー14によつて2つに分け6鏡15および16を用い
て上記の2つの光を交差させる。上記の2つの光の交差
するところに,上記のフオトレジストを塗布した基板1
1を置いて6干渉縞によつてフオトレジストの凹凸を形
成する部分を感光させる。次に、上記のフオトレジスト
を塗布した面に平行な面内で90回転させ.同じ干渉縞
にフオトレジストを感光させる。これらの感化によつて
.フオトレジスト上には6基盤の目のような感光部分が
形成される。感光部分を現像液で除去した後,弗酸で上
記の石英ガラスのエツチングを行なえば,石英ガラスに
基盤の目状の微細な凹凸を形成することができる。エツ
チングの深さは.石英ガラス膜の膜厚程度とする。最後
に,残つたフオトレジストを除去すれば.凹凸ができあ
がる。基板1の凹凸を持つた面には.小さなパラフイン
の塊を着けておく。次に6基板1とガラス板6とは対向
させて.記録部分の周囲を囲むスペーサー10,10″
をはさんで押しつけ,接着剤で密閉する。この様に本発
明は、記録用部材を6第1の板状部材1と,スペーサ1
0,10″を介してこの第1の板状部材と対向して配置
された第2の板状部材6とを少なくとも有し.前記第1
および第2の板状部材の対向表面の少なくともいずれか
に記録層を具備し.前記板状部材の少なくとも一方を透
光性となす構成とすることによつて,(1)記録部分以
外に記録材料が付着するのを防ぎ得る。
Next, as shown in FIG. 2, the laser beam from the He-Cd laser 12 is expanded by a beam expander 13 and divided into two by a half mirror 14, and the two beams are split using mirrors 15 and 16. Cross. The substrate 1 coated with the above photoresist is placed where the above two lights intersect.
1 and 6, the portions of the photoresist where the unevenness is to be formed are exposed to light using interference fringes. Next, it was rotated 90 times in a plane parallel to the surface on which the photoresist was applied. Expose the photoresist to the same interference fringes. By these influences. A 6-base eye-like photosensitive area is formed on the photoresist. After removing the photosensitive area with a developer, the quartz glass is etched with hydrofluoric acid to form fine irregularities in the shape of the base grains on the quartz glass. The depth of etching. The thickness should be about the same as that of a quartz glass film. Finally, remove the remaining photoresist. This creates unevenness. On the uneven surface of the substrate 1. Put on a small block of paraffin. Next, 6 substrate 1 and glass plate 6 are placed facing each other. Spacer 10,10″ surrounding the recording part
Press them together and seal them with adhesive. In this way, the present invention includes recording members 6, the first plate member 1, and the spacer 1.
and a second plate-like member 6 disposed opposite to the first plate-like member via a distance of 0.0,10''.
and a recording layer on at least one of the opposing surfaces of the second plate-like member. By configuring at least one of the plate-like members to be translucent, (1) it is possible to prevent recording material from adhering to areas other than the recording portion;

(2)記録面の損傷からの保護に有用である。(3)取
り扱いや雰囲気による記録面の汚染(例えば塵埃の付着
)が防ぎ得る等.実用上極めて有効なものとなし得る。
更に当然,記録6読み出し特性に悪影響はない。次に.
透明電極2に電流を流して6パラフインの塊を融かし.
基板上の凹凸を持つた部分に広がらせて一様な膜を形成
し.(バラフイン膜−5)余分のバラフインは蒸発させ
て透明電極7上の凹凸を持つた石英ガラス8上に着ける
(パラフイン膜−9)。凹凸を持つた石英ガラス8は、
透明電極2の加熱によつて熱せられるので,この熱によ
つてパラフインを融かし.拡散させて一様に広がらせる
こともできるが,透明電極7を電流で加熱した方が.短
時間で一様に広がらせることができる。像を形成するに
は6像の情報を持つた光,すなわち文字や図形のマスク
を透過した光またはホログラムを形成する光を6ガラス
板6,透明電極7石英ガラスの凹凸8およびパラフイン
9を通して照射するか,又はガラス基板1.透明電極2
を通して照射する。
(2) It is useful for protecting the recording surface from damage. (3) Contamination (for example, dust adhesion) of the recording surface due to handling or atmosphere can be prevented. This can be extremely effective in practice.
Furthermore, of course, there is no adverse effect on the recording/reading characteristics. next.
A current is applied to the transparent electrode 2 to melt the paraffin mass.
It is spread over the uneven parts of the substrate to form a uniform film. (Paraffin film-5) Excess paraffin is evaporated and applied to the uneven quartz glass 8 on the transparent electrode 7 (paraffin film-9). The quartz glass 8 with unevenness is
Since it is heated by the heating of the transparent electrode 2, the paraffin is melted by this heat. Although it is possible to spread it uniformly by diffusing it, it is better to heat the transparent electrode 7 with an electric current. It can be spread evenly in a short time. To form an image, light with image information, that is, light that has passed through a mask of characters or figures, or light that forms a hologram, is irradiated through 6 glass plates 6, transparent electrodes, quartz glass irregularities 8, and paraffin 9. or glass substrate 1. Transparent electrode 2
irradiate through.

ガラス基板1側から光を照射した方が,途中の層で光が
散乱されるおそれは無く.この点で好ましい。上記の光
の波長は,CdS層でよく吸収されるように5000X
より短かいのがよい。
If the light is irradiated from the glass substrate 1 side, there is no risk of the light being scattered by intermediate layers. It is preferable in this respect. The wavelength of the above light is 5000X so that it is well absorbed by the CdS layer.
The shorter the better.

CdS層で吸収された光は熱を発生し,その熱エネルギ
ーがパラフイン膜に与えられて蒸発や,高温部から低温
部への拡散によつて像が形成される。上記のように光を
入射させると同時に6透明電極2に電流を流してパラフ
イン膜の温度を一様に上昇させると.像の形成は弱い光
で可能になる。像形成を弱い光で行なう他の方法として
は,透明電極2と透明電極7との間に高周波電圧を印加
する方法がある。光によつてCdS層中に発生した電子
や正孔は,高周波電圧で揺すぶられて熱を発生し6この
熱エネルギーはパラフイン膜に与えられる。パラフイン
膜は.温度が上がるほど誘電損失が増す性質を持つので
6適当な周波数の高周波で熱の像を増幅することができ
る。高周波電圧をかける方法と6透明電極に電流を流す
方法とを共に用いることもできる。像を形成する他の方
法として.記録すべき情報によつて強度変調されたレー
ザ光を集光して照射し6光を走査するか6基板を動かし
て順々に像を形成してゆく方法も採用可能である。
The light absorbed by the CdS layer generates heat, and the thermal energy is applied to the paraffin film to form an image by evaporation or diffusion from a high temperature area to a low temperature area. As described above, when light is incident and at the same time a current is applied to the transparent electrode 2, the temperature of the paraffin film is uniformly raised. Image formation is possible with weak light. Another method of forming an image using weak light is to apply a high frequency voltage between the transparent electrode 2 and the transparent electrode 7. Electrons and holes generated in the CdS layer by the light are agitated by a high-frequency voltage and generate heat, and this thermal energy is applied to the paraffin film. Paraffin membrane. Since the dielectric loss increases as the temperature rises, it is possible to amplify the thermal image using a suitable high frequency. It is also possible to use both the method of applying a high frequency voltage and the method of flowing a current through the six transparent electrodes. Another way to form an image. It is also possible to adopt a method in which laser light whose intensity is modulated according to the information to be recorded is focused and irradiated, and six lights are scanned, or six substrates are moved to sequentially form images.

この場合も.記録又は読み出しのための光は,ガラス基
板6側6又はガラス基板1側から照射することは前述し
た通りである。像を形成する膜を着けた基板側から光を
集光した方が.レンズから集光点までの距離を短かくで
き.ワーキングデイスタンスの短かく開口数の大きいレ
ンズを使い得る。従つて集光率を高く取れ,高密度記録
に有利である。光シヤツタ一を用いてレーザー光を多数
のパルス状にすれば,像は微細な点の集合の形で形成さ
れる。光が強く当たつた点ほど,大きく深い窪みになる
。像の消去には次の3つの方法がある。1番目の方法で
は6透明電極2に電流を流して凹凸4上のパラフインを
急速に蒸発させ6透明電極7上の凹凸に付着させる。
In this case too. As described above, the light for recording or reading is irradiated from the glass substrate 6 side 6 or the glass substrate 1 side. It is better to focus the light from the side of the substrate that has the film that forms the image. The distance from the lens to the focal point can be shortened. A lens with a short working distance and a large numerical aperture can be used. Therefore, a high light collection rate can be obtained, which is advantageous for high-density recording. When a laser beam is made into many pulses using an optical shutter, an image is formed in the form of a collection of minute dots. The stronger the light hits the point, the larger and deeper the depression becomes. There are three methods for erasing images: In the first method, a current is applied to the six transparent electrodes 2 to rapidly evaporate the paraffin on the unevenness 4 and make it adhere to the unevenness on the six transparent electrode 7.

ただし凹凸4上のパラフインをすべて蒸発させる必要は
ない。続いてすぐに透明電極7に電流を流して付着した
パラフインを再蒸発させ,透明電極2上の凹凸4の上に
付着させ一様な膜とする。2番目の方法では,まず透明
電極7に電流を流して凹凸8に着いているパラフインの
一部または全部を蒸発させ,膜厚変化として像を記録し
たパラフイン膜5上に一様に付着させる。
However, it is not necessary to evaporate all the paraffin on the unevenness 4. Immediately thereafter, a current is applied to the transparent electrode 7 to re-evaporate the attached paraffin, and the paraffin is deposited on the unevenness 4 on the transparent electrode 2 to form a uniform film. In the second method, first, a current is applied to the transparent electrode 7 to evaporate part or all of the paraffin adhering to the irregularities 8, and the paraffin is uniformly deposited on the paraffin film 5 on which an image is recorded as a change in film thickness.

次に透明電極7の冷却中または冷却後にパラフイン膜5
の温度を上昇させて急速にパラフインを蒸発させ,再び
凹凸8の上に付着させる。これによつて.凹凸4}よび
凹凸8上のパラフイン膜は.いずれもほぼ一様になる。
凹凸8に付着したパラフインの分布が完全に一様でない
場合には6透明電極7を再び加熱してパラフインの融点
より少し高い温度に保ち,拡散によつて一様に広がらせ
ることができる。3番目の方法は6透明電極2に電流を
流して6膜厚の差によつて像を記録したパラフイン膜5
を融点より少し高い温度に保ち6一様な膜にもどす方法
である。
Next, during or after cooling the transparent electrode 7, the paraffin film 5 is
The temperature of the paraffin is increased to rapidly evaporate the paraffin, and the paraffin is deposited on the uneven surfaces 8 again. Due to this. The paraffin film on unevenness 4} and unevenness 8 is. All become almost the same.
If the distribution of paraffin adhering to the unevenness 8 is not completely uniform, the transparent electrode 7 can be heated again to maintain a temperature slightly higher than the melting point of paraffin, and the paraffin can be spread uniformly by diffusion. The third method is to apply a current to 6 transparent electrodes 2 and record an image based on the difference in the thickness of the paraffin film 5.
This method maintains the temperature slightly higher than the melting point to restore it to a uniform film.

像形成時および消去時にわずかに蒸発したパラフインは
,透明電極7上の凹凸8に付着しているので,必要な時
に透明電極7を加熱してもとにもどす。これら3つの方
法とも6透明電極7上の凹凸8は必ずしも必要としない
が,凹凸があると.多数回の記録書換えで記録面上のパ
ラフインの分布にかたよりを生ずるおそれのある時は,
凹凸8上に着いたパラフインの分布を一様に直して凹凸
4上にもどすことにより6分布の一様化を行なうことが
できる。3番目の方法は像の消去に比較的時間がかかる
The paraffin slightly evaporated during image formation and erasing is attached to the unevenness 8 on the transparent electrode 7, so the transparent electrode 7 can be heated to return it to its original state when necessary. In all of these three methods, the unevenness 8 on the transparent electrode 7 is not necessarily required, but if there is an unevenness. If there is a risk that the distribution of paraffin on the recording surface may become uneven due to multiple recording rewrites,
By uniformly correcting the distribution of the paraffin that has arrived on the uneven surfaces 8 and returning it to the uneven surfaces 4, the distribution of the paraffin 6 can be made uniform. The third method takes a relatively long time to erase the image.

2番目の方法は.消去時の熱の余熱を利用して書込みを
助けることができるし,消去しながら書込みを行なうこ
ともできるので,書換え(消去と書込み)の時間を大巾
に短縮することができる。
The second method is. The residual heat from erasing can be used to assist writing, and since writing can be performed while erasing, the time for rewriting (erasing and writing) can be greatly shortened.

また.像形成後適当な時期に透明電極7上の凹凸8に着
いているパラフインの一部を蒸発させて6像を記録した
パラフイン膜5上に移す操作を行なつておくと6記録の
消去と次の書込みへの準備は.凹凸4上のバラフインを
加熱するだけで行なうことができ.書込み時の熱を利用
して書込みながら消去を行なうこともできるのでさらに
高速になる。透明電極7上の凹凸に着いているパラフイ
ンは、像を記録したパラフイン膜5上にほぼ一様に移す
ことができるので,この操作によつて像を乱すことはほ
とんどない。なお6以上の例は記録材料がバラフインの
場合を説明したが.記録材料の種類や用途によつて6透
明電極や光吸収のためのCdS層.パラフインの一様性
を確保するための基板の凹凸部,石英ガラス板上の凹凸
等が不用となることはいうまでもない。
Also. If, at an appropriate time after image formation, a part of the paraffin adhering to the irregularities 8 on the transparent electrode 7 is evaporated and transferred onto the paraffin film 5 on which the 6 images have been recorded, the 6 recordings can be erased and the next image can be erased. How to prepare for writing. This can be done simply by heating the rosette on the uneven surface 4. Erasing can be performed while writing using the heat generated during writing, resulting in even higher speeds. Since the paraffin adhering to the irregularities on the transparent electrode 7 can be almost uniformly transferred onto the paraffin film 5 on which the image has been recorded, this operation hardly disturbs the image. Note that in the above examples, the case where the recording material was varafine was explained. Depending on the type and purpose of the recording material, 6 transparent electrodes or a CdS layer for light absorption may be used. Needless to say, uneven portions on the substrate, uneven portions on the quartz glass plate, etc. for ensuring uniformity of the paraffin become unnecessary.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は.本発明の一実施例である装置の構造を示す断
面図.第2図は,第1図に構造を示した装置の,石英ガ
ラス層に凹凸を形成する方法を示す図。 1:ガラス基板,2:透明電極.3:CdS層,4:石
英ガラスの凹凸, 5:像を記録したパラフイン膜.6
:ガラス板、7:透明電極68:石英ガラスの凹凸69
:パラフイン膜.10,101:スペーサ一.11:凹
凸を形成する板.12:He−Cdレーザー.13:ビ
ームエキスパンダ一 14:ハーフミラ一15,16:
鏡。
Figure 1 is. 1 is a sectional view showing the structure of a device that is an embodiment of the present invention. FIG. 2 is a diagram showing a method for forming irregularities on a quartz glass layer of the apparatus whose structure is shown in FIG. 1. 1: Glass substrate, 2: Transparent electrode. 3: CdS layer, 4: Unevenness of quartz glass, 5: Paraffin film with image recorded. 6
: Glass plate, 7: Transparent electrode 68: Unevenness of quartz glass 69
:Paraffin film. 10,101: Spacer 1. 11: A plate that forms unevenness. 12: He-Cd laser. 13: Beam expander 1 14: Half mirror 15, 16:
mirror.

Claims (1)

【特許請求の範囲】[Claims] 1 第1の板状部材と、この第1の板状部材と対向して
配置された第2の板状部材とを少なくとも有し、前記第
1および第2の板状部材の対向表面の少なくともいずれ
かに記録層を具備し、前記板状部材の少なくとも一方を
透光性となし、上記第1および第2の板状部材と、それ
らの間に挾まれたスペーサと、これらを接着する接着材
によつて、前記第1および第2の板状部材間の記録層の
記録領域がその外部と実質的に遮断されたことを特徴と
する記録用部材。
1 At least a first plate-like member and a second plate-like member disposed opposite to the first plate-like member, and at least one of the opposing surfaces of the first and second plate-like members one of the plate-like members is provided with a recording layer, at least one of the plate-like members is transparent, the first and second plate-like members, a spacer sandwiched between them, and an adhesive for bonding these together. A recording member characterized in that a recording area of a recording layer between the first and second plate-like members is substantially shielded from the outside by a material.
JP49119341A 1974-10-18 1974-10-18 Recording parts Expired JPS5919836B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP49119341A JPS5919836B2 (en) 1974-10-18 1974-10-18 Recording parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49119341A JPS5919836B2 (en) 1974-10-18 1974-10-18 Recording parts

Publications (2)

Publication Number Publication Date
JPS5146124A JPS5146124A (en) 1976-04-20
JPS5919836B2 true JPS5919836B2 (en) 1984-05-09

Family

ID=14759074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49119341A Expired JPS5919836B2 (en) 1974-10-18 1974-10-18 Recording parts

Country Status (1)

Country Link
JP (1) JPS5919836B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58142944A (en) * 1982-02-19 1983-08-25 Pentel Kk Solid coating material

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4932346A (en) * 1972-07-26 1974-03-25

Also Published As

Publication number Publication date
JPS5146124A (en) 1976-04-20

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