JPS5921153B2 - Glow discharge device - Google Patents
Glow discharge deviceInfo
- Publication number
- JPS5921153B2 JPS5921153B2 JP4127979A JP4127979A JPS5921153B2 JP S5921153 B2 JPS5921153 B2 JP S5921153B2 JP 4127979 A JP4127979 A JP 4127979A JP 4127979 A JP4127979 A JP 4127979A JP S5921153 B2 JPS5921153 B2 JP S5921153B2
- Authority
- JP
- Japan
- Prior art keywords
- glow discharge
- main
- glow
- discharge
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Discharge Heating (AREA)
Description
【発明の詳細な説明】
この発明はグロー放電装置に関するものであつて、詳し
くはグロー放電を空間的、及び時間的に制御をさせる手
段を持つたグロー放電装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a glow discharge device, and more particularly to a glow discharge device having means for spatially and temporally controlling glow discharge.
従来、この種の装置の1例として第1図に示すようなイ
オン窒化装置がある。Conventionally, there is an ion nitriding apparatus as shown in FIG. 1 as an example of this type of apparatus.
図において、1は放電炉、2は放電炉1に窒素などのガ
スを供給するガスボンベ、3は真空ポンプ、4は主電源
、5はガス流量を調節して供給するためのコック、6は
陽極、1は陰極であつて、ここでは被処理物である。8
は温度センサであつて被処理物Tの温度を検出する。In the figure, 1 is a discharge furnace, 2 is a gas cylinder that supplies gas such as nitrogen to the discharge furnace 1, 3 is a vacuum pump, 4 is a main power source, 5 is a cock for adjusting and supplying gas flow rate, and 6 is an anode , 1 is a cathode, which is the object to be treated here. 8
is a temperature sensor that detects the temperature of the object T to be processed.
9は主電源4の一端に接続された陽極端子、10は主電
源4の他端に接続された陰極端子、11は温度検出用端
子、121、122および123は電気絶縁物、13は
放電炉1を構成する炉壁、14は放電を安定にさせるた
めの安定化抵抗、15は主電源を開閉するためのスイッ
チである。9 is an anode terminal connected to one end of the main power supply 4, 10 is a cathode terminal connected to the other end of the main power supply 4, 11 is a temperature detection terminal, 121, 122 and 123 are electrical insulators, and 13 is a discharge furnace. 1 is a furnace wall, 14 is a stabilizing resistor for stabilizing the discharge, and 15 is a switch for opening and closing the main power source.
次に動作について説明する。Next, the operation will be explained.
最初にガスボンベ2から、放電炉1に窒素を含むガスを
低圧(0.5〜10Torr)のガス雰囲気に保つよう
に矢印で示したように真空ポンプ3により真空に引きな
がら供給する。この状態で主電源4から陽極6と陰極1
(被処理物)間に直流電圧を印加させると電極6、T間
が放電破壊を起こして、後にグロー放電が生じる。雰囲
気中の窒素はグロー放電によりイオン化されて高い運動
エネルギーをもち、陰極?(被処理物)の表面に衝突す
る。このイオンの衝突した運動エネルギーは熱エネルギ
ーに変換されて陰極T(被処理物)を加熱する。このよ
うにして陰極7(被処理物)を加熱してやると陰極T(
被処理物)の表面が窒化される。さらに陰極□(被処理
物)の温度を温度センサ8VCより検出して主電源4に
フイードバツクしてグロー放電に流れる電流を制御する
事によつて陰極7(被処理物)の温度をコントロールす
るようになつている。従来のグロー放電によるイオン窒
化装置は以上のように構成されているので被処理物にグ
ロー放電を起すと全面にグロー放電を拡げて全面を均一
にイオン窒化する事は可能であるが、グロー放電を被処
理物の限られた部分にだけ起こす事のできる、いわゆる
グロー放電の空間的制御を行なう事ができないという欠
点があつた。また、グロー放電の始動、停止には、スイ
ツチ15が必要であり、大電流グロー放電の始動、停止
には、スイツチの容量が大きくなり、コストが高くなる
欠点があつた。この発明は従来のものの欠点を除去する
ためになされたもので、放電炉内の陽極と陰極(被処理
物)間に、予備グロー放電を起こさせるための補助電極
を移動自在に設けるとともに、グロー放電電流、雰囲気
ガス圧力及び陰極の温度のうちの少なくとも1つをコン
トロールし、又陽極と陰極間に少なくとも最小グロ±維
持電圧を横切る脈流波形の電圧を印加することにより、
グロー放電を被処理物の限られた部分に起こすことがで
き、しかも0N,0FF制御ができるグロー放電装置を
提供することを目的としている。First, a gas containing nitrogen is supplied from the gas cylinder 2 to the discharge furnace 1 while being evacuated by the vacuum pump 3 as indicated by the arrow so as to maintain the gas atmosphere at a low pressure (0.5 to 10 Torr). In this state, the main power supply 4 connects the anode 6 and cathode 1.
When a DC voltage is applied between (the object to be treated), discharge breakdown occurs between the electrode 6 and T, and glow discharge occurs later. Nitrogen in the atmosphere is ionized by glow discharge and has a high kinetic energy, which causes it to become a cathode. Collisions with the surface of the (processed object). The kinetic energy of this ion collision is converted into thermal energy and heats the cathode T (workpiece). When the cathode 7 (workpiece) is heated in this way, the cathode T (
The surface of the object) is nitrided. Furthermore, the temperature of the cathode 7 (workpiece) is controlled by detecting the temperature of the cathode □ (workpiece) from the temperature sensor 8VC and feeding it back to the main power supply 4 to control the current flowing to the glow discharge. It's getting old. Conventional ion nitriding equipment using glow discharge is configured as described above, so when glow discharge is generated on the workpiece, it is possible to spread the glow discharge over the entire surface and uniformly ion nitride the entire surface, but glow discharge The drawback is that it is not possible to spatially control so-called glow discharge, which can occur only in a limited area of the object to be treated. In addition, a switch 15 is required to start and stop glow discharge, and starting and stopping large current glow discharge has the disadvantage that the capacity of the switch becomes large and the cost increases. This invention was made to eliminate the drawbacks of the conventional ones, and includes a movable auxiliary electrode for causing preliminary glow discharge between the anode and cathode (workpiece) in the discharge furnace. By controlling at least one of the discharge current, atmospheric gas pressure, and cathode temperature, and applying a voltage with a pulsating waveform that crosses at least the minimum glow ± maintenance voltage between the anode and the cathode,
It is an object of the present invention to provide a glow discharge device that can generate glow discharge in a limited portion of a workpiece and can perform ON/OFF control.
以下、この発明の一実施例を第2図について説明する。An embodiment of the present invention will be described below with reference to FIG.
第2図では放電炉1、ガスボンペ2、卦よび真空ポンプ
3は第1図と同様であるので省略する。ここではグロー
放電部分(陽極と陰極部分)と電源回路についてのみ図
示する。第2図において、4は主電源で商用交流電源1
6、一次側と二次側を電気的に独立にさせるための絶縁
トランスTrl、全波整流回路17から構成されている
。In FIG. 2, the discharge furnace 1, gas cylinder 2, hexagram, and vacuum pump 3 are the same as those in FIG. 1, and are therefore omitted. Here, only the glow discharge portion (anode and cathode portions) and the power supply circuit are illustrated. In Figure 2, 4 is the main power supply and commercial AC power supply 1
6. It is composed of an isolation transformer Trl for making the primary side and the secondary side electrically independent, and a full-wave rectifier circuit 17.
18は高電圧用トランスTr2の二次側に接続された補
助電源回路、19はサイリスタ、20はサイリスタのゲ
ート回路および温度制御回路、21は電流を制御するた
めの限流抵抗、22は主電極である陽極6と陰極7との
間に設けられた補助電極で、主電極6,7に対して三次
元的に移動し得るようになつている。18 is an auxiliary power supply circuit connected to the secondary side of the high voltage transformer Tr2, 19 is a thyristor, 20 is a gate circuit and temperature control circuit of the thyristor, 21 is a current limiting resistor for controlling the current, and 22 is a main electrode This is an auxiliary electrode provided between an anode 6 and a cathode 7, which are movable three-dimensionally relative to the main electrodes 6 and 7.
なお被処理物として作用する陰極7のA部分はグロー放
電を起こさない部分、B部分はグロー放電を起こしたい
部分を示す。次にこの装置の動作について説明する。Note that part A of the cathode 7, which acts as an object to be treated, indicates a part where glow discharge does not occur, and part B indicates a part where glow discharge is desired to occur. Next, the operation of this device will be explained.
最初に、被処理物の内、放電を行なつて表面処理をした
い部分B近傍に補助電極22を移動させる。つづいて、
トランスTr,Vcよつて陽極6と陰極7(被処理物)
間に印加する電圧の最大値Vmaxを、陽極と陰極間の
放電破壊電圧値より低く、また最小グロー維持電圧V。
より高いように、つまりVO<VnlaX<EBの条件
を満たすように設定する。さらにこの状態で、ゲート回
路20により、サイリスタ19を0Nにすると補助電源
18からの高電圧が補助電極22に印加される。そうす
ると補助電極22と陰極7のB部間に限流抵抗21によ
つて制限された小さな予備グロー放電が生ずる。その誘
導によつて、陽極6と陰極7のB間に主グロー放電が生
じて、B部分が表面処理される。次に、温度センサ8V
Cより被処理物7のB部分の温度を検出して、サイリス
タ19のゲート回路に0N,0FFの指示を与え、サイ
リスタ19を開閉する。そうすると第2図の主電源4の
出力波形け第3図aに示すような全波整流波形25であ
るため、ゲート回路20の0N,0FFの指示に応じて
、陽極6と陰極7のB間の主グロ7放電が0N−0FF
制御され、B部分の温度を制御する事ができる。もう少
し詳しく説明すると、グロー放電の放電面積Sは雰囲気
ガス圧力P、陰極(被処理物)の温度T1グロー放電電
流1によつて決まり、ガスの種類及び陰極材料によつて
決まる比例定数をkとすると、これらの関係は次のよう
な式になる。First, the auxiliary electrode 22 is moved to the vicinity of the portion B of the object to be treated where the surface treatment is to be performed by performing electric discharge. Continuing,
Transformer Tr, Vc, anode 6 and cathode 7 (object to be treated)
The maximum value Vmax of the voltage applied between the anode and the cathode is lower than the discharge breakdown voltage value between the anode and the cathode, and the minimum glow sustaining voltage V.
It is set to be higher, that is, to satisfy the condition of VO<VnlaX<EB. Furthermore, in this state, when the thyristor 19 is turned ON by the gate circuit 20, a high voltage from the auxiliary power supply 18 is applied to the auxiliary electrode 22. Then, a small preliminary glow discharge is generated between the auxiliary electrode 22 and the B section of the cathode 7, which is limited by the current limiting resistor 21. Due to the induction, a main glow discharge occurs between the anode 6 and the cathode 7, and the surface of the B portion is treated. Next, temperature sensor 8V
The temperature of part B of the object 7 to be processed is detected from C, and instructions of 0N and 0FF are given to the gate circuit of the thyristor 19 to open and close the thyristor 19. Then, the output waveform of the main power supply 4 in FIG. 2 is a full-wave rectified waveform 25 as shown in FIG. Main glow 7 discharge is 0N-0FF
It is possible to control the temperature of part B. To explain in more detail, the discharge area S of glow discharge is determined by the atmospheric gas pressure P, the temperature T1 of the cathode (workpiece), the glow discharge current 1, and the proportionality constant determined by the type of gas and the cathode material is k. Then, these relationships become the following formula:
従つて?1)から、温度T1グロー放電電流1もしくは
ガス圧力Pをコントロールすれば、放電面積Sを制限す
ることができる。またグロー放電へ予備グロー放電によ
るプラズマによつて誘起されるため、該グロー放電は予
備グロー放電を含む放電位置で拡がる。Follow me? 1), the discharge area S can be limited by controlling the temperature T1, the glow discharge current 1, or the gas pressure P. Further, since the glow discharge is induced by the plasma generated by the preliminary glow discharge, the glow discharge spreads at the discharge position including the preliminary glow discharge.
従つて補助電極を放電させたい部分(処理面)へ移動さ
せると、その部分でグロー放電面積Sを有したグロー放
電が生成される。このように放電面積Sのコントロール
及び補助電極の位置の可変制御の2点によつて、一部分
のみのグロー放電が得られる。Therefore, when the auxiliary electrode is moved to a portion (processing surface) where discharge is desired, a glow discharge having a glow discharge area S is generated at that portion. In this way, only a partial glow discharge can be obtained by controlling the discharge area S and variable control of the position of the auxiliary electrode.
またグロー放電は電極の間隔の短い部分へ移行しようと
する習性があるので、連続的にグロー放電を点灯させて
おくと、補助電極の予備グロー放電で誘導したグロー放
電が、補助電極近傍の被処理面(例えばB面)から電極
間の間隔の短い部分(例えばA面)へ移行することがあ
る。In addition, glow discharge tends to migrate to areas where the distance between the electrodes is short, so if the glow discharge is turned on continuously, the glow discharge induced by the preliminary glow discharge of the auxiliary electrode will spread to the area near the auxiliary electrode. There may be a transition from the treated surface (for example, B surface) to a portion where the spacing between electrodes is short (for example, A surface).
このグロー放電の移行を防ぐため、実用上、主電極に印
加する電圧を脈流波形にし、グロー放電を脈流波形毎に
切ることによつて補助電極近傍の処理面Bでグロー放電
を維持させることができる。例えば第3図a上部に示す
ようにf点からg点までの間ゲート回路20が0Nの指
示信号24を出すとする。そうすると第3図aの全波整
流波形25の電圧値が最小グロー維持電圧V。以上にな
つた時点hで主グロー放電が生じて、毎サイクルごと点
減し、g点を過ぎて最初に全波整流波形25の電圧値が
o以下になつた時点1で主グロー放電が消える。したが
つて主電極間に波形26のグロー電流が流れて被処理物
のB部分の温度を制御し得る。伺、本発明の実施の際に
はこのグロー放電の空間的制御の可能な条件は放電ガス
の圧力、被処理物7のA部分、B部分の空間的位置、及
び紫外線等によつて変わるので、これら諸条件について
も配慮する。な}、上記実施例では、主電源4の電圧波
形を全波整流波形について示したが第3図bのような少
なくとも最小グロ±維持電圧。In order to prevent this migration of glow discharge, in practice, the voltage applied to the main electrode is made into a pulsating waveform, and the glow discharge is maintained on the treated surface B near the auxiliary electrode by cutting off the glow discharge for each pulsating waveform. be able to. For example, suppose that the gate circuit 20 outputs an ON instruction signal 24 from point f to point g, as shown in the upper part of FIG. 3a. Then, the voltage value of the full-wave rectified waveform 25 in FIG. 3a is the minimum glow maintenance voltage V. A main glow discharge occurs at a point h when the voltage is higher than that, and the point decreases every cycle, and the main glow discharge disappears at a point 1 when the voltage value of the full-wave rectified waveform 25 first becomes less than o after passing a point g. . Therefore, a glow current having a waveform 26 flows between the main electrodes to control the temperature of the B portion of the object. However, when implementing the present invention, the conditions under which this glow discharge can be spatially controlled vary depending on the pressure of the discharge gas, the spatial positions of portions A and B of the object 7, ultraviolet rays, etc. , these conditions will also be considered. In the above embodiment, the voltage waveform of the main power source 4 is shown as a full-wave rectified waveform, but the voltage waveform of the main power supply 4 is at least the minimum voltage ±maintenance voltage as shown in FIG. 3b.
を横切るような脈流波形27でもよい。この場合グロー
電流は波形28となる。さらに第3図cに示すような交
流波形29でもよい。交流波形の場合、主電極6,7の
どちらの電極も陰極になり得るので、したがつて、被処
理物2個を電極にすると、同時に2個の被処理物が処理
される効果がある。この場合のグロー電流は波形30と
なる。また図示していないが、主電源4の電圧波形は半
波整流のものでもよい。また、上記実施例では電極の表
面処理の場合について説明したが、他のグロー放電装置
、例えば、洗浄装置であつてもよく、上記実施例と同様
の効果を奏する。以上のように、この発明によれば、主
電源の電圧波形を少なくとも最小グロー維持電圧を横切
る脈流波形にし、主電極間に可動な補助電極卦よびこの
補助電極に予備グロー放電を行なわせる補助電源を設け
、さらにグロー放電電流、雰囲気ガス圧力及び被処理側
主電極の温度のうちの少なくとも1つをコントロールす
るようにしたので、グロー放電の空間的制御が出来、ま
たグロー放電の始動、停止も容易であり、0N,0FF
制御が出来る。It may be a pulsating flow waveform 27 that crosses the . In this case, the glow current has a waveform 28. Furthermore, an AC waveform 29 as shown in FIG. 3c may be used. In the case of an AC waveform, either of the main electrodes 6 and 7 can serve as a cathode, so if two objects to be processed are used as electrodes, there is an effect that two objects to be processed can be processed at the same time. The glow current in this case has a waveform 30. Although not shown, the voltage waveform of the main power source 4 may be half-wave rectified. Further, in the above embodiments, the case of surface treatment of electrodes has been described, but other glow discharge devices, such as cleaning devices, may be used, and the same effects as in the above embodiments can be obtained. As described above, according to the present invention, the voltage waveform of the main power supply is made into a pulsating waveform that crosses at least the minimum glow maintenance voltage, and the auxiliary electrode is movable between the main electrodes and the auxiliary electrode is used to perform a preliminary glow discharge. Since a power source is provided and at least one of the glow discharge current, atmospheric gas pressure, and temperature of the main electrode to be treated is controlled, the glow discharge can be spatially controlled, and the glow discharge can be started and stopped. is also easy, 0N, 0FF
Can be controlled.
第1図は従来のグロー放電表面処理装置を示す断面図、
第2図はこの発明の一実施例によるグロー放電表面処理
装置の構成図、第3図はこの発明のグロー放電表面処理
装置の電流、電圧波形を示す図である。
図に}いて、1は放電炉、2はがスポンベ、3は真空ポ
ソプ、4は主電源、6は陽極、7は陰極(被処理物)、
8は温度センサー、18は補助電源回路、20はゲート
回路、22は補助電極、Tr,,Tr2はトランス、M
axは主電源4の出力波形のピーク電圧値、VOは最小
グロー維持電圧値。Figure 1 is a sectional view showing a conventional glow discharge surface treatment device.
FIG. 2 is a block diagram of a glow discharge surface treatment apparatus according to an embodiment of the present invention, and FIG. 3 is a diagram showing current and voltage waveforms of the glow discharge surface treatment apparatus of the present invention. In the figure, 1 is a discharge furnace, 2 is a sponge, 3 is a vacuum pot, 4 is a main power supply, 6 is an anode, 7 is a cathode (workpiece),
8 is a temperature sensor, 18 is an auxiliary power supply circuit, 20 is a gate circuit, 22 is an auxiliary electrode, Tr, Tr2 is a transformer, M
ax is the peak voltage value of the output waveform of the main power supply 4, and VO is the minimum glow maintenance voltage value.
Claims (1)
の主電極間に設けられ上記主電極に対して相対的に移動
し得る補助電極と、上記一対の主電極に接続され少なく
とも最小グロー維持電圧を横切る脈流波形の電圧を上記
主電極間に印加してグロー放電を所定期間毎に発生消減
させる主電源と、上記補助電極と主電極との間に予備グ
ロー放電を行なわせる補助電源と、グロー放電電流、雰
囲気ガス圧力及び上記一方の主電極の温度のうちの少な
くとも1つを制御する手段とを備えたことを特徴とする
グロー放電装置。 2 上記主電源の出力電圧波形は交流、全波整流または
半波整流の電圧波形のいずれかである特許請求の範囲第
1項記載のグロー放電装置。 3 上記補助電源はその出力がON、OFF制御される
ものである特許請求の範囲第1項または第2項記載のグ
ロー放電装置。[Claims] 1. A pair of main electrodes facing each other with a predetermined gap therebetween, an auxiliary electrode provided between the main electrodes and movable relative to the main electrode, and the pair of main electrodes. A main power supply is connected to the main electrode and applies a voltage with a pulsating waveform that crosses at least the minimum glow maintenance voltage between the main electrodes to generate and reduce glow discharge at predetermined intervals, and a preliminary glow is connected between the auxiliary electrode and the main electrode. A glow discharge device comprising: an auxiliary power source for causing discharge; and means for controlling at least one of glow discharge current, atmospheric gas pressure, and temperature of one of the main electrodes. 2. The glow discharge device according to claim 1, wherein the output voltage waveform of the main power source is an alternating current, full-wave rectification, or half-wave rectification voltage waveform. 3. The glow discharge device according to claim 1 or 2, wherein the output of the auxiliary power source is controlled to be turned on or off.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4127979A JPS5921153B2 (en) | 1979-04-04 | 1979-04-04 | Glow discharge device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4127979A JPS5921153B2 (en) | 1979-04-04 | 1979-04-04 | Glow discharge device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55133792A JPS55133792A (en) | 1980-10-17 |
| JPS5921153B2 true JPS5921153B2 (en) | 1984-05-17 |
Family
ID=12604001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4127979A Expired JPS5921153B2 (en) | 1979-04-04 | 1979-04-04 | Glow discharge device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5921153B2 (en) |
-
1979
- 1979-04-04 JP JP4127979A patent/JPS5921153B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55133792A (en) | 1980-10-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| MX2021015128A (en) | Apparatus for an aerosol generating device. | |
| JPH06113561A (en) | Circuit arrangements for power supplies for plasma and surface technology devices | |
| JPS57202988A (en) | Accommodation controlling device for resistance welding | |
| EP1801259A2 (en) | Vacuum arc vapor deposition apparatus | |
| US3914575A (en) | Power supplying device for the operation of a gas discharge container | |
| US4394720A (en) | Auto-stabilized high power electric generator especially adapted for powering processes involving discharge in a rarefied gaseous atmosphere | |
| JP3829233B2 (en) | Control method of high frequency power supply | |
| US5643475A (en) | Power supply apparatus | |
| JPS5921153B2 (en) | Glow discharge device | |
| JP3047277B2 (en) | Recovery method after arc discharge in glow discharge treatment equipment | |
| GB1101327A (en) | Electric-arc producing apparatus, namely an arc heater or arc furnace | |
| EP0542813B1 (en) | Apparatus and method of induction-hardening machine components with precise power output control | |
| JPH07335380A (en) | High frequency induction heating device, and its power supply circuit | |
| US3641311A (en) | Apparatus for the ignition of direct current welding and cutting arcs | |
| JPH0778697A (en) | Method and device for glow discharge processing | |
| US2128562A (en) | Means for controlling the voltage of discharge devices | |
| JPS5744469A (en) | Device for preventing damage of torch for plasma arc | |
| JPS6128026B2 (en) | ||
| JP2796191B2 (en) | Method and apparatus for maintaining current zero point of AC plasma torch | |
| JP2724850B2 (en) | Thermochemical treatment equipment for metals, etc. | |
| JPH0728535A (en) | Power source circuit | |
| JPH0371180B2 (en) | ||
| JPS5784743A (en) | Plasma cvd method and apparatus therefor | |
| KR0171289B1 (en) | Negative ions generation and control device | |
| KR950001779B1 (en) | Source of electric power of plasma welding torch |