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JPS5923255B2 - Manufacturing method for mosaic flooring - Google Patents
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JPS5923255B2 - Manufacturing method for mosaic flooring - Google Patents

Manufacturing method for mosaic flooring

Info

Publication number
JPS5923255B2
JPS5923255B2 JP5976878A JP5976878A JPS5923255B2 JP S5923255 B2 JPS5923255 B2 JP S5923255B2 JP 5976878 A JP5976878 A JP 5976878A JP 5976878 A JP5976878 A JP 5976878A JP S5923255 B2 JPS5923255 B2 JP S5923255B2
Authority
JP
Japan
Prior art keywords
mosaic
chip
chips
base material
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5976878A
Other languages
Japanese (ja)
Other versions
JPS54150466A (en
Inventor
勝幸 榎本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aron Kasei Co Ltd
Original Assignee
Aron Kasei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aron Kasei Co Ltd filed Critical Aron Kasei Co Ltd
Priority to JP5976878A priority Critical patent/JPS5923255B2/en
Publication of JPS54150466A publication Critical patent/JPS54150466A/en
Publication of JPS5923255B2 publication Critical patent/JPS5923255B2/en
Expired legal-status Critical Current

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  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)

Description

【発明の詳細な説明】 本発明はモザイク調床材の製造法に関するものであり、
さらに詳しくは色彩、形状あるいは質感等を異にする二
種類以上のモザイクチップを所望の配設パターンに従つ
て基材上に融着してなる審美性を改善せしめた熱可塑性
樹脂製床材の製造法に関する。
[Detailed Description of the Invention] The present invention relates to a method for manufacturing mosaic flooring,
More specifically, it is a thermoplastic resin flooring material with improved aesthetics that is made by fusing two or more types of mosaic chips with different colors, shapes, textures, etc. onto a base material according to a desired arrangement pattern. Regarding manufacturing methods.

床面あるいは壁面の装飾手段として、石、ガラス、金属
、磁器などの小片をモルタルで固定し、該小片の接合端
部に水硬化性セメントによる目止めを施こす方法、ある
いは長尺基材上にモザイクチップを前以つて施用した接
着剤によつで連続的に接着する方法などが知られている
As a means of decorating floors or walls, small pieces of stone, glass, metal, porcelain, etc. are fixed with mortar and the joined ends of the pieces are sealed with hydraulic cement, or on long base materials. A method is known in which mosaic chips are continuously bonded with an adhesive that has been applied in advance.

これらの方法によつてもある程度審美性に優れた床材や
壁材を形成することはできるが、これら既存の方法は何
れも施工に著しく労力と時間を要し、かつ床面あるいは
壁面の形成作業に高度の熟練を要するため実用的でない
。一方、これら既存の方法に代わる床材もしくは壁材の
新規な製造手段として、米国特許第3170808号明
細書には、長尺基材上に樹脂材料よりなるモザイク片を
一面に敷設し、配向、接着した後、該モザイク片間の隙
間に粉末状のマトリックス樹脂を充填し、これを加熱下
に加圧してモザイク調床材を形成する方法が記載されて
いる。
Although it is possible to form flooring and wall materials with good aesthetics to some extent using these methods, all of these existing methods require significant labor and time for construction, and are difficult to form when forming the floor or wall surface. It is not practical as it requires a high degree of skill. On the other hand, as a new method for producing flooring or wall materials in place of these existing methods, US Pat. A method is described in which, after bonding, the gaps between the mosaic pieces are filled with a powdered matrix resin, and this is pressed under heat to form a mosaic-like flooring material.

この方法によつて工業的規模における床材の製造は著し
く容易化されたが、反面この方法は基材上にモザイク片
を全面に亘りかつ一度限り敷設する工程を採用している
ため、基材上におけるモザイク片配設パターンの選択が
実質上不可能であるという致命的な欠点を内在せしめて
いる。即ち、この方法によつてはモザイク片敷設面の全
域に亘つてほぼ一様なモザイク片の不規則配置が形成さ
れるに過ぎず、幾可学的な繰返し模様や具象的あるいは
抽象的な絵画模様をモザイク片敷設面に形成することは
全く不可能であつた。本発明の主要な目的は、上述の先
行技術に付随する実用上の制約を解消し、モザイクチッ
プ配設の自由度、即ち床材表面においてモザイクチップ
が形成する図柄や模様の種類を自由に変えることのでき
る新規なモザイク調床材の製造手段を提供することにあ
る。
Although this method has greatly facilitated the manufacture of flooring on an industrial scale, it also requires a process in which the mosaic pieces are laid over the entire surface of the substrate only once. This has a fatal drawback in that it is virtually impossible to select the pattern for disposing the mosaic pieces. In other words, this method only forms an irregular arrangement of mosaic pieces that is almost uniform over the entire area on which the mosaic pieces are laid, and does not produce geometric repeating patterns or figurative or abstract paintings. It was completely impossible to form a pattern on the surface of the mosaic piece. The main purpose of the present invention is to eliminate the practical constraints associated with the above-mentioned prior art, and to freely change the degree of freedom in mosaic chip arrangement, that is, the type of designs and patterns formed by mosaic chips on the surface of the flooring material. An object of the present invention is to provide a means for manufacturing a new mosaic-like flooring material.

本発明の他の目的は、所望のモザイクチップ配設パター
ンを繰返し自在に連続することのできる生産性と操業の
安定性に優れたモザイク調床材の製造工程を提供するこ
とにある。
Another object of the present invention is to provide a process for manufacturing a mosaic-like flooring material that is capable of repeating a desired mosaic chip arrangement pattern and has excellent productivity and operational stability.

而して本発明のこれらの目的は、第一の熱可塑性樹脂モ
ザイクチツプを連続的に供給される長尺基材上に供給し
、基材上に該モザイクチツブの重なりのない敷設層を形
成し、加熱後、所定のモザイクチツプ圧着パターンに従
つて周面に加圧突起を設けた加圧ロールに供給してモザ
イクチツプを基材上に圧着し、該加圧ロールによつて圧
着されないモザイクチツプを基材上から取去つた後、第
二の熱可塑性樹脂モザィクチツプを前記長尺基材の前記
第一のモザィクチツプが圧着されてぃない表面に圧着し
、この後さらに基材上に圧着された第一および第二のモ
ザィクチツプ間の隙間に粉末状のマトリツクス樹脂を供
給し、予備加熱ならびに加熱下加圧してマトリツクス樹
脂ならびにモザイクチツプ圧着層を展延し、モザィクチ
ツプの周りをマトリツクスで埋没するモザイク調床材の
製造法を採用することによつて工業的に有利に達成する
ことができる。
These objects of the present invention are to supply first thermoplastic resin mosaic chips onto a continuously supplied elongated base material, and to form a non-overlapping layer of the mosaic chips on the base material. After heating, the mosaic chips are fed to a pressure roll having pressure protrusions on the circumference according to a predetermined mosaic chip pressure bonding pattern to pressure the mosaic chips onto the base material, and the mosaic chips that are not pressure bonded by the pressure roll are was removed from the base material, a second thermoplastic resin mosaic chip was crimped onto the surface of the elongated base material to which the first mosaic chip was not crimped, and then further crimped onto the base material. Powdered matrix resin is supplied into the gap between the first and second mosaic chips, and the matrix resin and mosaic chip pressure bonding layer are spread by preheating and applying pressure under heat to create a mosaic style in which the mosaic chip is buried around the mosaic chip with the matrix. This can be achieved industrially advantageously by employing a method for producing flooring materials.

以下、添付図面の例示に基づいて本発明方法を詳述する
Hereinafter, the method of the present invention will be explained in detail based on the illustrations of the accompanying drawings.

図面において第1図は本発明方法を示す工程概略図であ
り、第2図は周面に加圧突起を有する加圧ロールの全体
斜視図である。第3図は第2図の第一の加圧ロールによ
つて基材上に圧着されたモザイクチツプ敷設層の上面斜
視図であり、第4図は本発明方法によつて製せられたモ
ザイク調床材の上面斜視図である。本発明の実施に際し
、モザイクチツプを形成する熱可塑性樹脂は、ポリ塩化
ビニルもしくはその共重合合体、ポリ塩化ビニリデンも
しくはその共重合体、塩化ビニル一酢酸ビニル,塩化ビ
ニル一塩化ビニリデン、塩化ビニリデン一酢酸ビニル,
塩化ビニル一酢酸ピニルービニルアルコールのような上
記重合体もしくは共重合体の混合物からモザイクチツプ
に要求される物理化学的特性に応じて任意に選択するこ
とができる。
In the drawings, FIG. 1 is a process schematic diagram showing the method of the present invention, and FIG. 2 is an overall perspective view of a pressure roll having pressure projections on its circumferential surface. FIG. 3 is a top perspective view of the mosaic chip laying layer pressed onto the base material by the first pressure roll of FIG. 2, and FIG. FIG. 3 is a top perspective view of the conditioned flooring material. In carrying out the present invention, the thermoplastic resin forming the mosaic chip is polyvinyl chloride or a copolymer thereof, polyvinylidene chloride or a copolymer thereof, vinyl chloride vinyl monoacetate, vinyl chloride monovinylidene chloride, vinylidene chloride monoacetic acid. vinyl,
It can be arbitrarily selected from mixtures of the above polymers or copolymers, such as vinyl chloride monoacetate pinyruvinyl alcohol, depending on the physicochemical properties required for the mosaic chip.

これらのモザィクチツプを形成する樹脂材料の加熱温度
における流動性に関して厳密な制限は認められないが、
基材への融着性ならびに製品表面におけるエンボス形成
の容易性を考慮して、後記マトリツクスを形成する熱可
塑性樹脂材料よりも加熱温度における流動性の小さな樹
脂材料を選択することが望ましい。したがつてこのよう
な流動特性を示すものであれば、モザイクチツプ形成素
材はこれ迄に例示した樹脂以外のものであつても本発明
に好適に使用することができ、例えばポリエチレン、ポ
リプロピレン、メタクリルあるいはABS等の樹脂材料
も本発明のモザイクチツプ形成素材として選択すること
ができる。これらの熱可塑性樹脂はまた、必要に応じて
各種の可塑剤、安定剤、充填剤、滑剤あるいは顔料等を
含有するものであつてもよい。而してモザイクチツプの
加熱温度における流動性をマトリツクスの加熱温度にお
ける流動性よりも小さくするためには、モザイクチツブ
ならびに粉末状マトリツクを形成する樹脂の選択に際し
樹脂の重合度、共重合すべき単量体の種類および量、充
填剤あるいは可塑剤の種類および含有量、あるいはこれ
らの組合せを調節する。一方、マトリツクス形成素材と
して使用する粉末状の熱可塑性樹脂は、基材上に圧着さ
れた第一および第二のモザイクチツプ間の隙間を充填し
、加熱により融解して該モザイクチツプ相互間に強固な
融着構造を形成することが必要であり、このため粒度3
5メツシユ以下さらに望ましくは42メツシユ以下の微
粒粉末であることが好ましく、また炭酸カルシウム等の
充填剤を含有するものであつてもよいが、かかる充填剤
は最終製品の光沢、強度、床材表面におけるエンボス形
成性等を実用上満足し得る水準に維持するため、マトリ
ツクス樹脂の重量に対し等量以下配合することが望まし
い第一および第二のモザイクチツプを形成する熱可塑性
樹脂は、それぞれ二ロロールミル等の調合装置に供給し
て混練し、カレンダ加工または押出し加工してシートに
形成した後、ダイシングマシンに供給して定形切断する
かあるいぱクラツシャで不定形切断してチツプに形成す
る。
Although there are no strict restrictions on the fluidity of the resin material forming these mosaic chips at the heating temperature,
In consideration of the adhesion to the base material and the ease of forming embossing on the surface of the product, it is desirable to select a resin material that has lower fluidity at the heating temperature than the thermoplastic resin material forming the matrix described below. Therefore, any resin other than those exemplified above can be suitably used as the mosaic chip forming material in the present invention as long as it exhibits such fluidity characteristics, such as polyethylene, polypropylene, methacrylate, etc. Alternatively, resin materials such as ABS may also be selected as the material for forming the mosaic chips of the present invention. These thermoplastic resins may also contain various plasticizers, stabilizers, fillers, lubricants, pigments, etc., as required. In order to make the fluidity at the heating temperature of the mosaic chip lower than that at the heating temperature of the matrix, the degree of polymerization of the resin and the amount of monomers to be copolymerized must be adjusted when selecting the resin for forming the mosaic chip and the powdered matrix. Adjust the type and amount of body, the type and content of filler or plasticizer, or a combination thereof. On the other hand, the powdered thermoplastic resin used as the matrix forming material fills the gap between the first and second mosaic chips that are pressed onto the base material, and is melted by heating to solidify the space between the mosaic chips. It is necessary to form a fused structure with a grain size of 3.
The fine powder is preferably 5 mesh or less, more preferably 42 mesh or less, and may contain a filler such as calcium carbonate. In order to maintain the embossability etc. at a practically satisfactory level, the thermoplastic resins forming the first and second mosaic chips are desirably blended in an amount equal to or less than the weight of the matrix resin. After being fed to a compounding device such as the above, kneaded, calendered or extruded to form a sheet, fed to a dicing machine and cut into regular shapes, or cut into irregular shapes with a crusher to form chips.

第一および第二のモザイクチツプの形状、寸法、色彩あ
るいは質感の選択は自由であり、該第一および第二のモ
ザイクチツプはそれぞれ必要であれば形状、寸法、色彩
あるいは質感等を異にする複数種類のチツプの混合物を
使用することもできる。しかしながら加圧ロールによる
圧着に際し基材上に敷設されたモザイクチツプの全面に
均一な加圧力を作用させることが必要であり、このため
少なくとも長尺基材上に同一時期に供給されるモザィク
チツプ群は、それぞれ実質的に等しい厚みを有すること
が望ましい。またモザイクチツプを圧着する長尺基材は
、アスベスト、繊維布、樹脂フイルム、紙等から製せら
れた無端のチツプ載置用シートであり、本発明において
はチツプ載置面に前以つて接着剤を施用しておくことは
必らずしも必要でないが、後続の加熱後の加圧ロールに
よるモザイクチツプの圧着を容易化するため、供給に先
立つて例えばFVA樹脂系接着剤のような乾燥した熱活
性を有する接着剤を該基材のチツプ載置面に塗布してお
くこともできる。
The shape, size, color or texture of the first and second mosaic chips may be freely selected, and the first and second mosaic chips may have different shapes, sizes, colors, textures, etc., if necessary. Mixtures of several types of chips can also be used. However, when crimping with a pressure roll, it is necessary to apply a uniform pressure force to the entire surface of the mosaic chips laid on the base material, so at least a group of mosaic chips supplied at the same time on a long base material , each preferably having substantially equal thickness. Furthermore, the long base material to which the mosaic chips are crimped is an endless chip-placing sheet made of asbestos, fiber cloth, resin film, paper, etc. Although it is not absolutely necessary to apply an adhesive, it is possible to use a drying agent, such as an FVA resin adhesive, prior to supply, to facilitate the pressing of the mosaic chips with a pressure roll after subsequent heating. It is also possible to apply a thermally activated adhesive to the chip-receiving surface of the substrate.

第1図において、計量ロール11ならびにドクターブレ
ード13を有するホツパ一12内に収容された第一の熱
可塑性樹脂モザイクチツプ40は、別に設けた供給源か
ら連続的に供給される長尺基材10上に供給され、該長
尺基材の走行経路下面に位置する振動装置14の作動に
よつて基材上に該モザイクチツプの重なりのない敷設層
50を形成する。
In FIG. 1, a first thermoplastic resin mosaic chip 40 housed in a hopper 12 having a metering roll 11 and a doctor blade 13 is connected to a long base material 10 that is continuously supplied from a separate supply source. A non-overlapping laying layer 50 of the mosaic chips is formed on the substrate by the operation of the vibrating device 14 which is supplied above and positioned below the travel path of the elongated substrate.

好ましい実施態様として、振動装置14に隣接して吸引
空気流等を利用する図示しない滑落チツプ回収装置を設
け、前記振動装置の作動によつて基材上から滑落したモ
ザィクチツプを回収して前記ホツパ一12内へ返送する
こともできる。重なりのない敷設層50として基材10
上に載置された第一のモザイクチツプ40は、赤外線ヒ
ーター等を利用する公知の加熱装置20へ移送し該部で
加熱してモザイクチツプ40を後続の加圧ロール30に
よる基材上への圧着が可能になる程度まで軟化させる。
加熱温度は該第一のモザイクチツプを形成する熱可塑性
樹脂の種類あるいは組成によつて異なるので一律に決め
ることはできないが、例えばモザイクチツプの形成素材
として塩化ビニル樹脂を選択する場合には170℃乃至
190℃に加熱することによつて第一のモザイクチツプ
40の軟化を完了することができる。また別法としてモ
ザイクチツプ敷設に先立つて基材に前記の如く接着剤が
施用されている場合には110乃至130℃に加熱する
ことによつて接着剤の軟化を完了することができる。重
なりのない敷設層50を形成した第一のモザイクチツプ
40は、次いで所定のモザィクチツプ圧着パターンに従
つて周面に加圧突起32を突出させた第一の加圧ロール
30に供給し前記圧着パターンに従つて該第一のモザイ
クチツプ40を基材10上に圧着し、その後モザィクチ
ツプ敷設層50に対向して吸引口を開口させた公知の真
空吸引装置60に供給し該部で前記加圧ロール30によ
つて圧着されなかつたモザイクチツプを吸引除去し、第
一の加圧ロール30に設けられた加圧突起32のモザイ
クチツプ圧着パターンに対応して第一のモザイクチツプ
40を基材10に圧着した第一の中間製品に形成する。
真空吸引装置60によつて吸引除去された未圧着のモザ
イクチツプは、前記ホツパ一12内へ返送して再使用す
る。かくして得られた第一の中間製品は、この後除冷し
て巻取つた後、あるいは巻取らずにそのまま熱可塑性樹
脂よりなる第二のモザイクチツプ42を収容した第二の
ホツパ一17の下方位置へ供給する。
In a preferred embodiment, a fallen chip collecting device (not shown) that utilizes a suction air flow or the like is provided adjacent to the vibrating device 14, and the mosaic chips that have slid down from the base material are collected by the operation of the vibrating device and returned to the hopper. You can also send it back to 12. Base material 10 as a laying layer 50 with no overlap
The first mosaic chip 40 placed on the top is transferred to a known heating device 20 that uses an infrared heater or the like, where it is heated and the mosaic chip 40 is placed on the base material by the subsequent pressure roll 30. Soften to the extent that crimping is possible.
The heating temperature cannot be determined uniformly because it varies depending on the type or composition of the thermoplastic resin forming the first mosaic chip, but for example, when vinyl chloride resin is selected as the material for forming the mosaic chip, it is 170°C. The softening of the first mosaic chip 40 can be completed by heating it to 190°C. Alternatively, if an adhesive has been applied to the substrate prior to laying the mosaic chips, the softening of the adhesive can be completed by heating to 110 to 130°C. The first mosaic chip 40 on which the non-overlapping laying layer 50 has been formed is then supplied to the first pressure roll 30 having pressing protrusions 32 protruding from the circumferential surface according to a predetermined mosaic chip crimping pattern, and then the first mosaic chip 40 is fed to the first pressure roll 30 having pressure protrusions 32 protruding from the circumferential surface according to a predetermined mosaic chip crimping pattern. Accordingly, the first mosaic chip 40 is crimped onto the base material 10, and then supplied to a known vacuum suction device 60 having a suction port facing the mosaic chip laying layer 50, where the pressure roll is removed. The mosaic chips 40 that have not been crimped by the pressure roller 30 are removed by suction, and the first mosaic chips 40 are attached to the base material 10 in accordance with the mosaic chip crimping pattern of the pressure protrusions 32 provided on the first pressure roll 30. Form into a crimped first intermediate product.
The unpressed mosaic chips removed by the vacuum suction device 60 are returned to the hopper 12 for reuse. The first intermediate product obtained in this way is then slowly cooled and rolled up, or is placed directly under the second hopper 17 containing the second mosaic chip 42 made of thermoplastic resin without being rolled up. Supply to position.

第二のモザイクチツプ42の基材10上への敷設は、真
空吸引装置60の作動によつて未圧着の第一のモザイク
チツプ40を吸引除去した基材10上のモザイクチツプ
未敷設部分に第二のモザィクチツプ42の敷設層52を
形成するように計量ロール15ならびにドクターブレー
ド16を作動させて実施する。長尺基材の走行経路下面
に位置する第二の振動装置19の作動は、第二のモザイ
クチツプ42の重なりのない敷設層52の形成を助長す
る。この場合も好ましい実施態様として振動装置19に
隣接して吸引空気流等を利用する図示しない滑落チツプ
回収装置を設け、前記振動装置19の作動によつて基材
上から滑落した第二のモザイクチツプ42を回収して前
記ホツパ一17内へ返送することもできる。重なりのな
い敷設層52として基材10上に載置された第二のモザ
イクチツプ42は、既に形成されている第一のモザイク
チツプ40による重なりのない敷設層50と一体になつ
て、基材10上に第一のモザイクチツプ40と第二のモ
ザイクチツプ42とを所定の配設パターンに従つて載置
したモザイクチツプ敷設層54を形成する。異種モザイ
クチツプの繰返し敷設によつて形成された重なりのない
チツプ敷設層54は、次いで赤外線ヒーター等を利用す
る第二の加熱装置22へ移送し該部で加熱して第二のモ
ザィクチツプ42を後続の平担な加圧面36を有する第
二の加圧ロール34による基材上への圧着が可能になる
程度まで軟化させる。第二のモザイクチツプの加熱温度
条件は第二のモザイクチツプを形成する熱可塑性樹脂の
種類を考慮して決めねばならないが、仮に第二のモザイ
クチツブが第一のモザィクチツプ40と同一の組成を有
するものであれば、加熱条件も第一のモザイクチツプと
同一に選定することができる。加熱装置22による加熱
は、第二のモザイクチツプ42とともに基材上に圧着さ
れている第一のモザイクチツプ40にも当然軟化現象を
もたらすが、第一のモザイクチツプ40は後続の平坦な
加圧面を有する第二の加圧ロール34によつて繰返し加
圧されるに過ぎないので、第一のモザイクチツプに関す
る限り軟化程度はあまり問題にしなくてもよい。なお別
法して基材表面に接着剤が予かじめ施用されている場合
には、加熱温度は該接着剤を軟化し得る110乃至13
0加の範囲で選択することが可能である。加熱されたチ
ツプ敷設層54は、次ぃでモザィクチツプ40および4
2敷設層の全面に亘つて加圧力を作用させる平坦な加圧
面を有する第二の加圧ロール34に供給し第一のモザイ
クチツプ40と第二のモザイクチツプ42との配設パタ
ーンを維持しながら第二のモザイクチツプ42を基材1
0上に圧着し、二種のモザィクチツプ40および42を
圧着してなるチツプ敷設層56を形成する。第一の加圧
ロール30は、周面にモザイクチツブの圧着パターンに
対応する加圧突起32を設けた金属ロールであつて水冷
によつて表面温度8を50乃至80℃に維持し、またモ
ザイクチツプ敷設層50を挟持するようにその下面にバ
ツクアツプロール35を設けてモザイクチツプ敷設層の
全幅あたり400乃至3000K9の加圧力を作用せし
める。第二の加圧ロール34は加圧突起のない平坦な加
圧面を有するほかは第一の加圧ロールと同一の構造と機
能を備え第一および第二のモザィクチツプを同時加圧し
てチツプ敷設層56を形成する。理解を容易にするため
上述の説明においては基材上へのモザイクチツプの供給
と圧着を二度反復する態様を例示したが、モザィクチツ
プの供給から加圧突起を有する加圧ロールによる圧着に
到る工程は基材上へ敷設するモザイクチツプの種類ある
いは該モザイクチツプの圧着パターンに応して上記と同
様の工程順序の組合せに従つて所望回数繰返すことがで
きる。第二の中間製品56は、この後室温程度まで冷却
し、一旦巻取つた後、あるいは巻取らずそのまま粉末状
のマトリツクス樹脂44を収容した第三のホツパ一18
の下方へ導く。
The second mosaic chip 42 is laid on the base material 10 on the part of the base material 10 on which the unpressed first mosaic chip 40 has been suctioned and removed by the operation of the vacuum suction device 60. The measuring roll 15 and the doctor blade 16 are operated to form the laying layer 52 of the second mosaic chip 42. The operation of the second vibrating device 19 located below the travel path of the elongated substrate facilitates the formation of a laying layer 52 of the second mosaic chips 42 without overlapping. In this case as well, as a preferred embodiment, a falling chip recovery device (not shown) using a suction air flow or the like is provided adjacent to the vibration device 19, and the second mosaic chip that has slipped from the base material due to the operation of the vibration device 19 is removed. 42 can also be collected and returned to the hopper 17. The second mosaic chip 42 placed on the base material 10 as a non-overlapping laying layer 52 is integrated with the non-overlapping laying layer 50 formed by the first mosaic chips 40 that has already been formed. A mosaic chip laying layer 54 is formed on the mosaic chips 10 in which a first mosaic chip 40 and a second mosaic chip 42 are placed according to a predetermined arrangement pattern. The non-overlapping chip laying layer 54 formed by repeatedly laying different types of mosaic chips is then transferred to a second heating device 22 that uses an infrared heater or the like, where it is heated and the second mosaic chips 42 are placed next. The material is softened to the extent that it can be pressed onto the substrate by a second pressure roll 34 having a flat pressure surface 36 . The heating temperature conditions for the second mosaic chip must be determined in consideration of the type of thermoplastic resin forming the second mosaic chip, but if the second mosaic chip has the same composition as the first mosaic chip 40, If so, the heating conditions can be selected to be the same as those for the first mosaic chip. The heating by the heating device 22 naturally brings about a softening phenomenon in the first mosaic chip 40 that is pressed onto the substrate together with the second mosaic chip 42, but the first mosaic chip 40 is heated by the subsequent flat pressing surface. Since the first mosaic chip is merely repeatedly pressed by the second pressure roll 34 having a pressure of 100.degree. Alternatively, if an adhesive has been previously applied to the surface of the substrate, the heating temperature may be between 110 and 13, which may soften the adhesive.
It is possible to select within the range of 0 addition. The heated chip laying layer 54 is then applied to the mosaic chips 40 and 4.
The second mosaic chip 40 and the second mosaic chip 42 are supplied to a second pressure roll 34 having a flat pressure surface that applies a pressure force over the entire surface of the two laid layers to maintain the arrangement pattern of the first mosaic chips 40 and the second mosaic chips 42. While attaching the second mosaic chip 42 to the base material 1
0 and two types of mosaic chips 40 and 42 are pressed together to form a chip laying layer 56. The first pressure roll 30 is a metal roll having pressure protrusions 32 on its circumferential surface that correspond to the pressure bonding pattern of the mosaic chips. A back-up roll 35 is provided on the lower surface of the laying layer 50 so as to sandwich it, and a pressing force of 400 to 3000 K9 is applied to the entire width of the mosaic chip laying layer. The second pressure roll 34 has the same structure and function as the first pressure roll except that it has a flat pressure surface without pressure protrusions, and simultaneously presses the first and second mosaic chips to create a chip laying layer. form 56. In order to facilitate understanding, the above explanation has exemplified a mode in which supplying and crimping of mosaic chips onto a base material is repeated twice, but from supplying mosaic chips to crimping using a pressure roll having pressure protrusions. The process can be repeated as many times as desired according to the same combination of process sequences as described above, depending on the type of mosaic chip to be laid on the substrate or the crimp pattern of the mosaic chip. The second intermediate product 56 is then cooled to about room temperature, and after being rolled up, or without being rolled up, it is transferred to the third hopper 18 containing the powdered matrix resin 44.
lead downwards.

第三のホツパ一18は第一および第二のホツパ一12,
17と同様の計量ロールとドクターブレードを有し、第
三のホツパ一18から基材10の上面に圧着されたモザ
イクチツプ間の隙間に供給されるマトリツクス樹脂44
の分量を調節する。好ましい実施態様として、ホツパ一
18に隣接して、マトリツクス樹脂44の供給を終了し
た中間製品56の下方に図示しない振動装置を設け、モ
ザイクチツプ間の隙間に充填された粉末状のマトリツク
ス樹脂44に振動を与えてマトリツクス樹脂の充填密度
を増加させてもよい。中間製品56は次いで前記隙間に
充填されないままモザイクチツプ敷設層の表面に残存し
ている過剰のマトリツクス樹脂44を吸引除去するため
第二の真空吸引装置64へ供給し、ロールブラシ65に
モザイクチツプ敷設層の表面を軽く接触させた状態で該
ブラシを中間製品56の移動方向に対して反対方向に回
転し過剰のマトリツクス樹脂を浮き上らせ、吸引クリー
ナー66で吸引除去する。吸引除去された過剰のマトリ
ツクス樹脂は、第三のホツパ一18へ返送して再使用す
る。過剰のマトリツクス樹脂を取り除いた中間製品56
は、この後例えば赤外線ヒーターを利用する第三の加熱
装置24へ供給して150乃至200℃に加熱し、モザ
ィクチツプ間に充填された粉末状のマトリツクス樹脂を
融解し、この状態でロトキユア等の公知の加熱プレス7
0へ供給する。
The third hopper 18 is connected to the first and second hoppers 12,
The matrix resin 44 has a measuring roll and a doctor blade similar to 17, and is supplied from the third hopper 18 to the gap between the mosaic chips crimped onto the upper surface of the base material 10.
Adjust the amount. In a preferred embodiment, a vibration device (not shown) is provided adjacent to the hopper 18 and below the intermediate product 56 for which the matrix resin 44 has been supplied, so that the powdered matrix resin 44 filled in the gaps between the mosaic chips is heated. Vibration may be applied to increase the packing density of the matrix resin. The intermediate product 56 is then supplied to a second vacuum suction device 64 to remove by suction the excess matrix resin 44 remaining on the surface of the mosaic chip laying layer without being filled into the gaps, and the mosaic chips are laid on a roll brush 65. With the surfaces of the layers in light contact, the brush is rotated in a direction opposite to the direction of movement of the intermediate product 56 to lift up excess matrix resin, which is then suctioned away by a suction cleaner 66. The excess matrix resin removed by suction is returned to the third hopper 18 for reuse. Intermediate product 56 from which excess matrix resin has been removed
The material is then supplied to a third heating device 24 using, for example, an infrared heater and heated to 150 to 200°C to melt the powdered matrix resin filled between the mosaic chips. heating press 7
Supply to 0.

加熱プレス70は、例えば中間製品56の全幅あたり4
000Kf程度の線圧を作用させる加圧ロール72と、
180℃前後の加熱温度下5Kf/Cfli前後の加圧
力を作用させるスチールバンド74とを有するシート状
物の展延手段であつて、融解したマトリツクス樹脂をモ
ザイクチツプ間の隙間に圧入しながらモザイクチツプと
ともに展延する。かくして得られたシート状物58は、
次いでフエストン型アキユムレータ80等の公知の装置
に供給して徐冷し、加熱下加圧によつて厚みを減少せし
めたモザイクチツプ40,42の周囲にマトリツクス樹
脂44が強固に融着したモザイク調床材90に形成され
る。本発明によつて製せられるモザイク調床材は、床材
の表面においてモザイクチツプとマトリツクス樹脂がほ
ぼ等高の実質的に平滑な表面を形成するもののほか、変
形例としてモザイクチツプとマトリツクス樹脂を形成す
る熱可塑性樹脂の重合度、充填剤の含有量あるいはモザ
イクチツプ一とマトリツクス樹脂との混合重量比を調節
する等の方法によつて、前記徐冷工程において樹脂に収
縮速度の差を発現させ、床材表面にエンボスを顕出する
ものをも含むことができる。
For example, the heating press 70 may be
A pressure roll 72 that applies a linear pressure of about 000 Kf,
It is a means for spreading a sheet-like material having a steel band 74 that applies a pressing force of about 5 Kf/Cfli at a heating temperature of about 180° C., and the sheet-like material is spread by pressing the melted matrix resin into the gaps between the mosaic chips. It spreads along with. The sheet-like material 58 thus obtained is
The mosaic flooring is then supplied to a known device such as a Feston type accumulator 80 for slow cooling, and the matrix resin 44 is firmly fused around the mosaic chips 40, 42 whose thickness is reduced by heating and pressurizing. It is formed in the material 90. The mosaic-like flooring material manufactured by the present invention has mosaic chips and matrix resin that form a substantially smooth surface with approximately the same height on the surface of the flooring material, and as a modified example, mosaic chips and matrix resin that are By controlling the degree of polymerization of the thermoplastic resin to be formed, the content of the filler, or the mixing weight ratio of the mosaic chips and the matrix resin, a difference in shrinkage rate can be caused in the resin in the slow cooling step. , can also include those that have embossing on the surface of the flooring material.

以下、本発明方法を実施例によつて説明するが、説明は
例証の目的のみによつて記載するものであつて、本発明
の要旨を限定するものではない。
Hereinafter, the method of the present invention will be explained with reference to Examples, but the explanations are given for the purpose of illustration only and are not intended to limit the gist of the present invention.

なお、特に断らない限り部または百分率は原則として重
量基準で表示するものとする。実施例 1 平均重合度1100のPVClOO部,DOP35部、
エポキシ系可塑剤2部,Ca−Zn系安定剤3部、炭酸
カルシウム200部(平均粒子径0.08μのコロイド
状炭酸カルシウムと平均粒子径10.3μの重質炭酸カ
ルシウムとの等量混合物),滑剤2部、およびライトグ
リーン色顔料0.5部を二ロロールミルで混練し、カレ
ンダ加工して厚さ1.6wr!nのシートに形成した後
ダイシングマシンに供給して一辺の長さ5rmの正方形
に定形切断し第一のモザイクチツプ40を作成した。
In addition, unless otherwise specified, parts or percentages shall be expressed on a weight basis as a general rule. Example 1 Parts of PVClOO with an average degree of polymerization of 1100, 35 parts of DOP,
2 parts of epoxy plasticizer, 3 parts of Ca-Zn stabilizer, 200 parts of calcium carbonate (equal mixture of colloidal calcium carbonate with an average particle size of 0.08μ and heavy calcium carbonate with an average particle size of 10.3μ) , 2 parts of lubricant, and 0.5 part of light green color pigment were kneaded in a two-roll mill, and calendered to a thickness of 1.6wr! After forming the sheet into n sheets, it was fed to a dicing machine and cut into regular squares with a side length of 5 rm to produce a first mosaic chip 40.

また顔料が黄色であるほかは上記と同一のモザィクチツ
プ製造工程によつて第二のモザイクチツプ42を作成し
た。
A second mosaic chip 42 was also produced using the same mosaic chip manufacturing process as described above except that the pigment was yellow.

一方、平均重合度700のPVClOO部、DOP3O
部、エポキシ系可塑剤2部、Ba−Zn系安定剤3部、
白色顔料0.25部をスーパーミキサーに供給し110
乃至140℃の温度条件下に混合し、粒度42メツシユ
以下の微粉末状マトリツクス樹脂44を調製した。
On the other hand, PVClOO part with an average degree of polymerization of 700, DOP3O
parts, 2 parts of epoxy plasticizer, 3 parts of Ba-Zn stabilizer,
0.25 parts of white pigment was fed to the super mixer and the mixture was heated to 110
By mixing under temperature conditions of 140° C. to 140° C., a finely powdered matrix resin 44 having a particle size of 42 mesh or less was prepared.

まず第一のモザイクチツプ40を第1図に示すようにホ
ツパ一12に収容し、計量ロール11ならびにドクター
ブレード13の作動下に、別に設けた供給源から3m/
RwLの速度で連続的に供給される厚さ0.7rIrm
5幅1900wanのアスベストシートよりなる長尺基
材10上に供給し、該長尺基材の走行経路の下面に設け
られた振動装置14の作動により基材10上に第一のモ
ザイクチツプの重なりのない敷設層50を形成し塙なお
基材10のモザイクチツプ敷設面にはモザイクチツプの
圧着を容易化するため、ホツパ一12への供給に先立つ
てEVAエマルジヨン(固形分9q6)100部,アク
リル酸エマルジヨン0.2部,濃アンモニア水1部より
なる熱活性を有する接着剤を塗布乾燥した。
First, the first mosaic chip 40 is housed in the hopper 12 as shown in FIG.
Thickness 0.7rIrm supplied continuously at a rate of RwL
The first mosaic chip is supplied onto a long base material 10 made of an asbestos sheet having a width of 1,900 wan, and the first mosaic chips are stacked on the base material 10 by the operation of a vibration device 14 provided on the lower surface of the travel path of the long base material. 100 parts of EVA emulsion (solid content: 9q6) and acrylic are applied to the mosaic chip laying surface of the base material 10 to form a layer 50 with no cracks and to facilitate the crimping of the mosaic chips. A heat-activated adhesive consisting of 0.2 parts of acid emulsion and 1 part of concentrated ammonia water was applied and dried.

チツプ敷設層50は、次いで赤外線ヒーター20へ移送
し120℃に加熱して接着剤塗布層を基材10上への第
一のモザイクチツプ40の圧着が可能になる程度まで軟
化させた後、周面に網目状の加圧突起32を突出させた
第一の加圧ロール30に供給し、70℃の温度下チツプ
敷設層の全幅あたり2000Kfの圧力を作用せしめて
前記加圧突起32の圧着パターンに従つて第一のモザイ
クチツプを基材10上に圧着した。
The chip laying layer 50 is then transferred to the infrared heater 20 and heated to 120° C. to soften the adhesive coating layer to the extent that the first mosaic chip 40 can be crimped onto the base material 10, and then the surrounding area is heated. The chip is supplied to a first pressure roll 30 having mesh-like pressure protrusions 32 protruding from its surface, and a pressure of 2000 Kf is applied to the entire width of the chip laying layer at a temperature of 70°C to form a crimping pattern of the pressure protrusions 32. The first mosaic chip was pressed onto the base material 10 in accordance with the procedure.

加圧ロール30によつて圧着されなかつたモザイクチツ
プは、前記圧着工程に続いて設けられた真空吸引装置6
0によつて吸引除去し前記ホツパ一12内へ返送した。
このようにして得られた第一の中間製品は、この後第二
のモザィクチツプ42を収容した第二のホツパ一17の
下方に移動して第二のモザィクチツプ42を載置し、計
量ロール15、ドクターブレード16、第二の振動装置
19の作動によつて第二のモザイクチツプの重なりのな
い敷設層52に形成した。チツブ敷設層52は、前述の
如く第一のモザイクチツプ40が圧着されていない基材
10上の残余の表面に形成されるものであつて、既に形
成されている第一のモザイクチツプ40の敷設層50と
一体になつて、第一のモザイクチツプ40を網目状に配
置し第二のモザイクチツプ42を該網目で囲まれた部分
に配置した新たなモザイクチツプ敷設層54を形成する
。このモザイクチツプ敷設層54は、次いで第二の赤外
線ヒーター22へ移送し120℃に加熱して接着剤塗布
層を基材10上への第二のモザイクチツプ42の圧着が
可能になる程度まで軟化させこの後モザイクチツプ敷設
層54を加圧する平坦な加圧面36を有する第二の加圧
ロール34に供給し、70℃の温度下チツプ敷設層の全
幅あたり2000Kfの圧力を作用せしめてモザイクチ
ツ3プを基材10上に圧着した。
The mosaic chips that have not been crimped by the pressure roll 30 are removed by a vacuum suction device 6 provided following the crimping process.
0 and returned to the hopper 12.
The first intermediate product thus obtained is then moved below the second hopper 17 containing the second mosaic chip 42, where the second mosaic chip 42 is placed, and the measuring roll 15, By operating the doctor blade 16 and the second vibrating device 19, a second mosaic chip was formed in a laid layer 52 without overlapping. The chip laying layer 52 is formed on the remaining surface of the base material 10 to which the first mosaic chips 40 are not crimped as described above, and is formed by laying the already formed first mosaic chips 40. A new mosaic chip laying layer 54 is formed integrally with the layer 50 in which the first mosaic chips 40 are arranged in a mesh pattern and the second mosaic chips 42 are arranged in the area surrounded by the mesh. This mosaic chip laying layer 54 is then transferred to the second infrared heater 22 and heated to 120° C. to soften the adhesive coating layer to the extent that the second mosaic chip 42 can be crimped onto the base material 10. After this, the mosaic chip laying layer 54 is supplied to a second pressure roll 34 having a flat pressing surface 36 for applying pressure, and a pressure of 2000 Kf is applied to the entire width of the chip laying layer at a temperature of 70° C. to form the mosaic chips 3. was crimped onto the base material 10.

かくして得られた第二の中間製品56は室温程度まで冷
却し、巻取らずにそのまま微粉末状のマトリツクス樹脂
44を収容した第三のホツパ一18の下方へ導き、計量
ロールとドクターブレードの作動によつて、第一および
第二のモザイクチツプ間の隙間にマトリツクス樹脂44
を供給した。
The second intermediate product 56 thus obtained is cooled to about room temperature, and without being wound up, is guided directly below the third hopper 18 containing the finely powdered matrix resin 44, and is operated by a measuring roll and a doctor blade. By applying matrix resin 44 to the gap between the first and second mosaic chips,
was supplied.

第二の中間製品56は次いで第二の真空吸引装置64へ
供給しロールブラシ65にモザイクチツプ敷設層の表面
を軽く接触させた状態で該ブラシを中間製品56の移動
方向に対して逆方向に回転し、過剰のマトリツクス樹脂
を浮き上らせ吸引クリーナ66で吸引除去した。この後
該中間製品56を第三の赤外線ヒーター24へ供給し1
80℃に加熱してモザィクチツプ間の隙間に充填された
マトリツクス樹脂を融解し、この状態で該中間製品56
の全幅あたり2000Kfの線圧を作用させる加圧ロー
ル72と180℃の加熱温度下5Kf/Cdの加圧力を
作用させるスチールバンド74を有するロトキユア型加
熱プレス70に供給し、融解したマトリツクス樹脂をモ
ザイクチツプ間の隙間に圧入しながらモザイクチツプ敷
設層を基材10の厚みを含む最終製品の厚みが2fmに
なるまで展延しシート状物58を得た。かくして得られ
たシート状物58は、次いでフエストン型アキユムレー
タ80に供給して徐冷し、モザイクチツプ40,42の
周囲にマトリツクス樹脂44が強固に融着したモザイク
調床材90に形成した。最終的に得られた床材において
、モザイクチツプ40,42の表面は樹脂材料の重合度
差に起因してマトリツクス樹脂の表面より0.2鵡程度
盛り上つてエンボス調表面を形成した。上記実施例に見
られるように、本発明方法は床材表面に所望の圧着パタ
ーンに従つて複数種類のモザイクチツプを規則配置する
ものであつて、床材表面に形成し得る模様あるいは図柄
の多様性ならびにエンボス調の表面効果に基いて極めて
有用なモザイク調床材の製造手段を提供するものである
The second intermediate product 56 is then supplied to a second vacuum suction device 64, and with the surface of the mosaic chip laying layer lightly in contact with the roll brush 65, the brush is moved in the opposite direction to the direction of movement of the intermediate product 56. It was rotated, and the excess matrix resin was floated up and removed by suction cleaner 66. Thereafter, the intermediate product 56 is supplied to the third infrared heater 24.
The matrix resin filled in the gaps between the mosaic chips is heated to 80°C and melted, and in this state the intermediate product 56 is
The melted matrix resin is supplied to a rotocure-type hot press 70 having a pressure roll 72 that applies a linear pressure of 2000 Kf per full width and a steel band 74 that applies a pressing force of 5 Kf/Cd at a heating temperature of 180° C., and the melted matrix resin is mosaiced. While pressing into the gaps between the chips, the mosaic chip laying layer was rolled out until the final product had a thickness of 2 fm, including the thickness of the base material 10, to obtain a sheet-like material 58. The thus obtained sheet-like material 58 was then fed to a Feston type accumulator 80 and slowly cooled to form a mosaic-like floor material 90 in which the matrix resin 44 was firmly fused around the mosaic chips 40 and 42. In the finally obtained flooring material, the surfaces of the mosaic chips 40 and 42 were raised about 0.2 cm above the surface of the matrix resin to form an embossed surface due to the difference in the degree of polymerization of the resin materials. As seen in the above embodiments, the method of the present invention involves regularly arranging a plurality of types of mosaic chips on the surface of a flooring material according to a desired crimping pattern. The object of the present invention is to provide a means for producing a mosaic-like flooring material, which is extremely useful based on its texture and embossed surface effect.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明方法の工程概略図であり、第2図は周面
に加圧突起を有する加圧ロールの全体斜視図である。 第3図は第2図の第一の加圧ロールによつて基材上に圧
着されたモザイクチツブ敷設層の上面斜視図である。ま
た、第4図は本発明方法によつて製せられたモザイク調
床材の上面斜視図である。10:長尺基材、50,52
,54:モザイクチツプ敷設層、11,15:計量ロー
ル、20,22,24:加熱装置、12,17,18:
ホツパ一 30,34:加圧ロール、13,16:ドク
ターブレード、32:加圧突起、14,19:振動装置
、60,64:真空吸引装置、40,42:モザイクチ
ツプ、56:中間製品、44:マトリツクス樹脂、70
:加熱プレス、65:ロールブラシ、80:徐冷装置、
66:吸引クリーナー90:モザイク調床材。
FIG. 1 is a schematic process diagram of the method of the present invention, and FIG. 2 is an overall perspective view of a pressure roll having pressure projections on its circumferential surface. 3 is a top perspective view of the mosaic chip laying layer pressed onto the base material by the first pressure roll of FIG. 2; FIG. Moreover, FIG. 4 is a top perspective view of a mosaic-like flooring material manufactured by the method of the present invention. 10: Long base material, 50, 52
, 54: Mosaic chip laying layer, 11, 15: Measuring roll, 20, 22, 24: Heating device, 12, 17, 18:
Hopper 1 30, 34: Pressure roll, 13, 16: Doctor blade, 32: Pressure projection, 14, 19: Vibration device, 60, 64: Vacuum suction device, 40, 42: Mosaic chip, 56: Intermediate product, 44: Matrix resin, 70
: heating press, 65: roll brush, 80: slow cooling device,
66: Suction cleaner 90: Mosaic flooring material.

Claims (1)

【特許請求の範囲】[Claims] 1 第一の熱可塑性樹脂モザイクチップを連続的に供給
される長尺基材上に供給し、基材上に該モザイクチップ
の重なりのない敷設層を形成し、加熱後、所定のモザイ
クチップ圧着パターンに従つて周面に加圧突起を設けた
加圧ロールに供給してモザイクチップを基材上に圧着し
、該加圧ロールによつて圧着されないモザイクチップを
基材上から取去つた後、第二の熱可塑性樹脂モザイクチ
ップを前記長尺基材の前記第一のモザイクチップが圧着
されていない表面に圧着し、この後さらに基材上に圧着
された第一および第二のモザイクチップ間の隙間に粉末
状のマトリックス樹脂を供給し、予備加熱ならびに加熱
下加圧してマトリックス樹脂ならびにモザイクチップ圧
着層を展延し、モザイクチップの周りをマトリックスで
埋没することを特徴とするモザイク調床材の製造法。
1. The first thermoplastic resin mosaic chips are continuously supplied onto a long base material, a non-overlapping layer of the mosaic chips is formed on the base material, and after heating, the predetermined mosaic chips are compressed. After feeding the mosaic chips to a pressure roll having pressure protrusions on the circumferential surface according to the pattern to press the mosaic chips onto the base material, and removing the mosaic chips that are not pressed by the pressure roll from the base material. , a second thermoplastic resin mosaic chip is crimped onto the surface of the elongated base material to which the first mosaic chip is not crimped, and then the first and second mosaic chips are further crimped onto the base material. A mosaic-like floor characterized by supplying a powdered matrix resin into the gap between the gaps, preheating and applying pressure under heat to spread the matrix resin and a mosaic chip pressure bonding layer, and burying the mosaic chips around them with the matrix. Manufacturing method of wood.
JP5976878A 1978-05-18 1978-05-18 Manufacturing method for mosaic flooring Expired JPS5923255B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5976878A JPS5923255B2 (en) 1978-05-18 1978-05-18 Manufacturing method for mosaic flooring

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5976878A JPS5923255B2 (en) 1978-05-18 1978-05-18 Manufacturing method for mosaic flooring

Publications (2)

Publication Number Publication Date
JPS54150466A JPS54150466A (en) 1979-11-26
JPS5923255B2 true JPS5923255B2 (en) 1984-05-31

Family

ID=13122784

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5976878A Expired JPS5923255B2 (en) 1978-05-18 1978-05-18 Manufacturing method for mosaic flooring

Country Status (1)

Country Link
JP (1) JPS5923255B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60231874A (en) * 1984-04-11 1985-11-18 Toyo Linoleum Mfg Co Ltd:The Production of decorative material
JPH0611763Y2 (en) * 1987-03-06 1994-03-30 東リ株式会社 Decoration material

Also Published As

Publication number Publication date
JPS54150466A (en) 1979-11-26

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