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JPS5928571B2 - Photoinsoluble polymer materials and their manufacturing method - Google Patents
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JPS5928571B2 - Photoinsoluble polymer materials and their manufacturing method - Google Patents

Photoinsoluble polymer materials and their manufacturing method

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Publication number
JPS5928571B2
JPS5928571B2 JP12278481A JP12278481A JPS5928571B2 JP S5928571 B2 JPS5928571 B2 JP S5928571B2 JP 12278481 A JP12278481 A JP 12278481A JP 12278481 A JP12278481 A JP 12278481A JP S5928571 B2 JPS5928571 B2 JP S5928571B2
Authority
JP
Japan
Prior art keywords
mol
formula
group
photosensitive
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12278481A
Other languages
Japanese (ja)
Other versions
JPS5825303A (en
Inventor
国宏 市村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP12278481A priority Critical patent/JPS5928571B2/en
Publication of JPS5825303A publication Critical patent/JPS5825303A/en
Publication of JPS5928571B2 publication Critical patent/JPS5928571B2/en
Expired legal-status Critical Current

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  • Adhesives Or Adhesive Processes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Description

【発明の詳細な説明】 本発明は、感光基導入率が著しく少量で高感度を示す水
溶性の光不溶性高分子材料およびその製造方法に関する
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a water-soluble photo-insoluble polymeric material that exhibits high sensitivity with an extremely small introduction rate of photosensitive groups, and a method for producing the same.

感光性樹脂は印刷版製造材料、フオトエツチング、フオ
トミリングなどのフオトレジストとして、あるいは塗料
や印刷インキの感光性ビヒクルとして用いられてきたが
、最近に至り酵素の固定化に利用することが研究されて
いる。
Photosensitive resins have been used as printing plate manufacturing materials, photoresists for photoetching and photomilling, and as photosensitive vehicles for paints and printing inks, but recently research has begun to explore their use in immobilizing enzymes. ing.

ところで、これまで感光性樹脂としては、アジド基、シ
ンナモイル基、アクリロイル基などを感光性残基とする
ものが知られているが、これらの樹脂が及ぼす酵素への
影響、水溶性の問題などから、従来の感光性樹脂は十分
に満足しうるものとは云えなかつた。
By the way, photosensitive resins with photosensitive residues such as azide groups, cinnamoyl groups, and acryloyl groups have been known so far, but due to the influence of these resins on enzymes and problems with water solubility, etc. However, conventional photosensitive resins could not be said to be fully satisfactory.

このような新しい用途に適合する感光性高分子として、
2−クロロエチルビニルエーテルの重合体とスチルバゾ
ールとの反応によるスチルバゾリウム基を有する樹脂(
特願昭53−022512号)やポリビニルアルコール
ヘアセタール化反応によりスチルバゾリウム基あるいは
その類縁基を導入した樹脂(特願昭53−96803号
、特願昭53−136536号)が提案されている。
As a photosensitive polymer suitable for such new applications,
A resin having a stilbazolium group produced by the reaction of a polymer of 2-chloroethyl vinyl ether and stilbazole (
Japanese Patent Application No. 53-022512) and resins into which stilbazolium groups or related groups are introduced by polyvinyl alcohol hair acetalization reaction (Japanese Patent Application No. 53-96803 and Japanese Patent Application No. 53-136536) have been proposed.

とくに、後者のものは著しく高い感度を持ち、しか※く
も良好な膜物性を与えるものとして注目すべきである。
一方、前記のような用途にこれらの感光性樹脂を用いる
場合に、膜厚の大きなものが必要となる場合が多い。
In particular, the latter one should be noted as having extremely high sensitivity and offering excellent film properties.
On the other hand, when these photosensitive resins are used for the above-mentioned purposes, a large film thickness is often required.

膜厚の大きなものを十分に光不溶化させるためには、膜
中に十分に光が浸透しなければならない。そのためには
、感光基の吸光係数が重要な役割を担うものであつて、
あまりに大きな吸光係数を持つ感光基では、照射される
光は膜表面で十分に吸収され、膜厚の大きなものを十分
に光不溶化するには不適当となる。スチルバゾリウム基
あるいはその類縁基の吸光係数は数万のオーダーであり
比較的大きい。このために、この種の感光基を持つ高分
子は、数μ以上の膜厚にして光不溶化すると、光が十分
に下部まで浸透せず、このために画像形成の際に十分な
解像力が得られない。本発明者らは、この点を改良すべ
く鋭意研究を重ねた結果、吸収係数をさらに減じたカル
コン型感光基をポリビニルアルコールに導入すれば、そ
の目的が達せられることを見い出し、この知見に基づい
て本発明をなすに至つたものである。
In order to sufficiently photoinsolubilize a thick film, light must penetrate sufficiently into the film. For this purpose, the extinction coefficient of the photosensitive group plays an important role.
If a photosensitive group has an excessively large extinction coefficient, the irradiated light will be sufficiently absorbed at the film surface, making it unsuitable for sufficiently photo-insolubilizing a thick film. The extinction coefficient of a stilbazolium group or its analogous group is on the order of tens of thousands, which is relatively large. For this reason, when polymers with photosensitive groups of this type are photo-insolubilized with a film thickness of several microns or more, light does not penetrate sufficiently to the bottom, which prevents sufficient resolution during image formation. I can't do it. As a result of extensive research aimed at improving this point, the present inventors discovered that the objective could be achieved by introducing a chalcone-type photosensitive group with a further reduced absorption coefficient into polyvinyl alcohol, and based on this knowledge, As a result, the present invention has been completed.

すなわち本発明は、70モル%以上けん化されたポリ酢
酸ビニルにおいて、その構成単位に含まれる0.5〜1
0モル%のビニルアルコール単位を一般式(1)(式中
のmは1から6までの整数、nは1または2を示し、A
はフエニル基、置換フエニル基、ピリジル基、ピリジニ
ウム基を示す)で表わされる感光性構成単位により置換
されてなることを特徴とする光不溶性高分子材料および
その製造法を提供するものである。
That is, in the present invention, in polyvinyl acetate saponified with 70 mol% or more, 0.5 to 1
0 mol% of vinyl alcohol units are represented by the general formula (1) (m in the formula is an integer from 1 to 6, n represents 1 or 2, A
The present invention provides a photo-insoluble polymer material which is substituted with a photosensitive structural unit represented by a phenyl group, a substituted phenyl group, a pyridyl group, or a pyridinium group, and a method for producing the same.

本発明の光不溶性高分子材料においては、前記の構成単
位と、それ以外の構成単位、すなわち、単なるビニルア
ルコール単位もしくは酢酸ビニル単位などとの比は、0
.5:99.5〜10:90の l範囲が好適である。
In the photo-insoluble polymer material of the present invention, the ratio of the above-mentioned structural units to other structural units, such as simple vinyl alcohol units or vinyl acetate units, is 0.
.. A l range of 5:99.5 to 10:90 is preferred.

本発明の前記の感光性の構成単位は、完全に水溶性とは
云えないために、この範囲を外れて過剰にその構成単位
を導入すると水溶性が著しく低下し、水に不溶となつて
しまう。しかし、溶媒として含水アルコール、ジメチル
ホルムアミド、ホルムアミドなどの極性溶媒や、それの
水との混合溶媒を用いれば、その感光性の構成単位の導
入率をさらに高めることが出来る。本発明の光不溶性高
分子材料は、水に可溶な新規光架橋性物質であり、約4
60nm付近までの光に感じて不溶化する。このものは
、70モル%以上けん化されたポリ酢酸ビニルに、一般
式()などのフエニル基や、置換フエニル基、あるいは
、などのピリジル基や、水溶性に富んだなどのピリジニ
ウム基をあげることが出来る。
The photosensitive structural units of the present invention cannot be said to be completely water-soluble, so if an excessive amount of the structural units is introduced outside of this range, the water solubility will be significantly reduced and the product will become insoluble in water. . However, if a polar solvent such as hydrous alcohol, dimethylformamide, or formamide, or a mixed solvent thereof with water is used as the solvent, the rate of introduction of the photosensitive structural unit can be further increased. The photoinsoluble polymer material of the present invention is a new photocrosslinkable substance that is soluble in water, and has approximately 40%
It is sensitive to light up to around 60 nm and becomes insoluble. This product is made by adding a phenyl group such as the general formula (), a substituted phenyl group, a pyridyl group such as , or a pyridinium group with high water solubility to polyvinyl acetate that has been saponified by 70 mol% or more. I can do it.

これらの化合物は、対応する一般式() (式中のR.mは前記と同じ意味を持つ)で表わされる
アセトフエノン誘導体と芳香族アルデヒドとの脱水反応
により容易に得られる。
These compounds can be easily obtained by a dehydration reaction between an acetophenone derivative represented by the corresponding general formula (2) (R.m in the formula has the same meaning as above) and an aromatic aldehyde.

一方、70モル%以上けん化されたポリ酢酸ビニルの重
合度は300〜3000程度が好ましい。この場合、重
合度が低すぎると不溶化に要する照射時間が著しく長く
なり、またそれが高すぎると粘度が増大して実際の使用
に支障をきたすことがある。前記の一般式()で表示さ
れるアセタール化合物とポリビニルアルコールまたはポ
リ酢酸ビニルとの反応、すなわち高分子アセタール化反
応は、水中、もしくは水溶性有機溶媒含有の水溶液中で
、酸触媒反応により行うことができる。
On the other hand, the degree of polymerization of polyvinyl acetate saponified at 70 mol% or more is preferably about 300 to 3,000. In this case, if the degree of polymerization is too low, the irradiation time required for insolubilization will be significantly long, and if it is too high, the viscosity will increase, which may impede practical use. The reaction between the acetal compound represented by the above general formula () and polyvinyl alcohol or polyvinyl acetate, that is, the polymer acetalization reaction, is carried out by an acid-catalyzed reaction in water or in an aqueous solution containing a water-soluble organic solvent. I can do it.

この場合()で表わされるアセタール化合物はビニルア
ルコール単位当り0.5〜20モル%の割合で用いるの
が好ましい。触媒の酸としては無機有機のいずれのもの
が使用でき、たとえば、塩酸、硫酸、リン酸、p−トル
エンスルホン酸、クエン酸、グリコール酸などをあげる
ことが出来る。その添加量は多いほど反応時間が短縮さ
れるので好ましいが、通常水溶液もしくは含有機溶媒水
溶液のPHが約2以下であればよい。反応時間は5時間
〜3日間程度で、反応は室温〜100℃の範囲で行われ
る。また、この反応において、けん化ポリ酢酸ビニルの
濃度は2〜20wt%の範囲が最適である。この高分子
アセタール化反応の進行は、反応液自体を製膜し、その
感光速度を測定することにより簡便に追跡することが出
来る。
In this case, the acetal compound represented by () is preferably used in an amount of 0.5 to 20 mol % per vinyl alcohol unit. Any inorganic or organic acid can be used as the catalytic acid, and examples thereof include hydrochloric acid, sulfuric acid, phosphoric acid, p-toluenesulfonic acid, citric acid, and glycolic acid. The larger the amount added, the shorter the reaction time, so it is preferable, but it is sufficient that the pH of the aqueous solution or aqueous solution containing the organic solvent is about 2 or less. The reaction time is about 5 hours to 3 days, and the reaction is carried out at room temperature to 100°C. Further, in this reaction, the optimum concentration of saponified polyvinyl acetate is in the range of 2 to 20 wt%. The progress of this polymer acetalization reaction can be easily tracked by forming a film from the reaction solution itself and measuring its photosensitivity.

反応が完結した反応溶液は、それ自体が実用的感度を持
つているので感光液として用いることが出来る。あるい
は、触媒として用いた酸を除くためにアンモニアや水酸
化アルカリで中和しても良いし、あるいは塩基性イオン
交換樹脂を用いても良い。また、さらに樹脂を精製する
ためには、反応終了後、反応混合物を多量の非溶媒であ
るアセトン、ジオキサンなどに注ぐことにより、目的の
光不溶性高分子材料を沈殿させ、これを分離してアルコ
ールで洗う。本発明の光不溶性高分子材料は、水に可溶
であり、かつ感光基導入率が低いにもかかわらず、たと
えば、重クロム酸塩を含むポリビニルアルコールと同等
もしくはそれ以上の実用的感度を示す。しかも、感光基
の長波長における吸光係数は約数千程度であるので、膜
厚の大きな樹脂膜としても十分に光不溶することが出来
る。このため基盤に十分に密着した光不溶化膜が得られ
る。本発明の光不溶性高分子材料は、フオトレジストや
印刷用機のみならず、水性塗料基剤、印刷インキ用ビヒ
クルなどとしても有用である。
The reaction solution after the reaction has completed itself has practical sensitivity and can be used as a photosensitive solution. Alternatively, in order to remove the acid used as a catalyst, it may be neutralized with ammonia or an alkali hydroxide, or a basic ion exchange resin may be used. In addition, in order to further purify the resin, after the reaction is complete, the reaction mixture is poured into a large amount of a non-solvent such as acetone or dioxane to precipitate the desired photoinsoluble polymer material, which is then separated and added to the alcohol. wash with Although the photoinsoluble polymeric material of the present invention is soluble in water and has a low photosensitive group introduction rate, it exhibits practical sensitivity equivalent to or higher than, for example, polyvinyl alcohol containing dichromate. . Moreover, since the extinction coefficient of the photosensitive group at long wavelengths is about several thousand, even a thick resin film can be sufficiently photo-insoluble. Therefore, a photo-insolubilized film that adheres sufficiently to the substrate can be obtained. The photoinsoluble polymeric material of the present invention is useful not only as a photoresist or printing machine, but also as a water-based paint base, a vehicle for printing ink, and the like.

さらには、架橋部位が不飽和ケトンの二重結合の二量化
で達成されることから、架橋反応で特異的に進行するの
で、酵素生体細胞断片、微生物などの生体機能材料の固
定化担体としてきわめて有用である。一方、ポリビニル
アルコールの接着力などを考慮すれば、光照射による特
性向上を持つ接着剤やバインダーなどの用途にも供する
ことが出来る。次に本発明を実施例及び参考例に基づき
さらに詳細に説明する。参考例 14.77の水酸化ナトリウムを150へのメタノール
に溶解してから507のp−アセチルフエノールを溶解
し、減圧下で溶媒留去しp−アセチルフェノラードとし
た。
Furthermore, since the crosslinking site is achieved by dimerization of the double bonds of unsaturated ketones, the crosslinking reaction proceeds specifically, making it extremely useful as an immobilization carrier for biofunctional materials such as enzymes, living cell fragments, and microorganisms. Useful. On the other hand, if the adhesive strength of polyvinyl alcohol is considered, it can also be used as an adhesive or binder whose properties can be improved by light irradiation. Next, the present invention will be explained in more detail based on Examples and Reference Examples. Reference Example 14. Sodium hydroxide in 77 was dissolved in methanol in 150, p-acetylphenol in 507 was dissolved, and the solvent was distilled off under reduced pressure to obtain p-acetylphenol.

1晩50℃で乾燥してから100CTIIのジメチルホ
ルムアミドに添加し、55Vのクロルアセトアルデヒド
ジメチルアセタールとともに10時間還流した。
It was dried overnight at 50° C., then added to 100 CTII of dimethylformamide, and refluxed with 55 V of chloroacetaldehyde dimethyl acetal for 10 hours.

沈殿をろ別後ろ液に水を加え、油層をベンゼンで2回抽
出し、ベンゼン層をアルカリで洗つた。薄層クロマトグ
ラフイ一でアセチルフエノールの消失を確認してからさ
らに2回水洗し、無水炭酸カリウムで乾燥した。ベンゼ
ン留云後残油を減圧で蒸留することによりBpll48
〜149℃のp−(2・2−ジメトキシエトキシ)アセ
トフエノンを27.37得た。こうして得たp−(2・
2−ジメトキシエトキシ)アセトフエノン0.19yと
0.52クの2−ホルミルピリミジンを5?のエタノー
ルに溶解し、これに出来るだけ少量の水に溶解した0.
107の水酸化ナトリウムを加えて室温で攪拌した。7
時間後水を加えれば結晶が析出するから、これをろ過し
て集め、水で洗い、82%の収率で1−(2イ?−ピリ
ジル)−2−(4−ジメトキシエトキシベンゾイル)エ
チレンを得た。
The precipitate was filtered off, water was added to the liquid, the oil layer was extracted twice with benzene, and the benzene layer was washed with alkali. After confirming the disappearance of acetylphenol by thin layer chromatography, the mixture was further washed with water twice and dried over anhydrous potassium carbonate. By distilling the residual oil after benzene distillation under reduced pressure, Bpll48
27.37 of p-(2,2-dimethoxyethoxy)acetophenone at ˜149° C. was obtained. Thus obtained p-(2・
5? 0.19y of 2-dimethoxyethoxy)acetophenone and 0.52g of 2-formylpyrimidine? of ethanol, and in this as little water as possible.
107 of sodium hydroxide was added and stirred at room temperature. 7
If water is added after a period of time, crystals will precipitate out, which are collected by filtration and washed with water to produce 1-(2-pyridyl)-2-(4-dimethoxyethoxybenzoyl)ethylene with a yield of 82%. Obtained.

同様な方法により表Iに示した化合物を得た。ただし、
この表中の化合物、V1は11、を各々ジメチル硫酸で
処理して得たものである。
Compounds shown in Table I were obtained in a similar manner. however,
The compounds in this table, V1 is 11, were each obtained by treating with dimethyl sulfate.

実施例 1 参考例で得た表1中の化合物M97ηを5.00yの7
.7重量%の完全けん化ポリビニルアルコール(重合度
1800)の水溶液に溶解させてから、130〜の85
%リン酸を添加して24時間90℃で加熱した。
Example 1 Compound M97η in Table 1 obtained in Reference Example was converted to 5.00y of 7
.. After dissolving in an aqueous solution of 7% by weight completely saponified polyvinyl alcohol (degree of polymerization 1800),
% phosphoric acid was added and heated at 90° C. for 24 hours.

反応液に少量のエタノールを加えて透明な溶液とし、こ
れを大量のエタノールに再沈させて樹脂状物を分離し、
アンモニア含有エタノールで中和し、さらにエタノール
で洗浄して真空乾煙することにより− 4.50yの感
光性樹脂を得た。この樹脂を少量のメトキシエタノール
を含む水に熱時溶解させてアルミ板に塗布し、これをス
テツプタブレツト越しに露光し、温水で現像することに
より像を得た。この樹脂は、ポリ桂皮酸ビニル系感光性
樹脂(東京応化製TPR)の示す感度とほぼ同程度を示
した。また、化合物Mを194ワに増量して同条件で製
造した樹脂の感度は、TPRの約3倍を示した。実施例
2 部分けん化ポリビニルアルコール(重合度1700)の
10重量%溶液4,00yに1.007の酢酸を加え、
これに、少量の酢酸に溶解した18.6mクの表1中の
化合物を添加し、さらに、0.50yの85%リン酸を
加えて20時間85℃で加熱した。
A small amount of ethanol is added to the reaction solution to make a clear solution, which is reprecipitated in a large amount of ethanol to separate the resinous material.
A -4.50y photosensitive resin was obtained by neutralizing with ammonia-containing ethanol, washing with ethanol, and vacuum drying. This resin was hot-dissolved in water containing a small amount of methoxyethanol, applied to an aluminum plate, exposed through a step tablet, and developed with warm water to obtain an image. This resin exhibited a sensitivity that was approximately the same as that of a polyvinyl cinnamate photosensitive resin (TPR manufactured by Tokyo Ohka Co., Ltd.). Furthermore, the sensitivity of a resin produced under the same conditions with an increased amount of Compound M to 194 Wa was approximately three times that of TPR. Example 2 To 4,00y of a 10% by weight solution of partially saponified polyvinyl alcohol (degree of polymerization 1700) was added 1.007y of acetic acid,
To this was added 18.6m of the compound in Table 1 dissolved in a small amount of acetic acid, and further 0.50y of 85% phosphoric acid was added and heated at 85°C for 20 hours.

反応物をエタノールに再沈させ、含アンモニアエタノー
ルで中和しエタノールで洗つてから真空乾燥した。この
樹脂の示す感度は 妹KTPRとほぼ同程度を示した
。実施例 3〜12 実施例1および2と同様にして、表1に示した他の化合
物をポリビニルアルコールもしくは部分けん化ポリビニ
ルアルコールと反応させることにより、表に示したよう
な樹脂を得た。
The reaction product was reprecipitated in ethanol, neutralized with ammonia-containing ethanol, washed with ethanol, and then vacuum-dried. The sensitivity of this resin was almost the same as that of its younger sister, KTPR. Examples 3 to 12 In the same manner as in Examples 1 and 2, the other compounds shown in Table 1 were reacted with polyvinyl alcohol or partially saponified polyvinyl alcohol to obtain resins as shown in the table.

Claims (1)

【特許請求の範囲】 1 重合度300から3000の範囲にある70モル%
以上けん化されたポリ酢酸ビニルにおいて、そのビニル
構成単位に含まれる0.5〜10モル%のビニルアルコ
ール単位を、一般式▲数式、化学式、表等があります▼ (式中のmは1から6までの整数、nは1または2を示
し、Aはフェニル基、置換フェニル基、ピリジル基また
はピリジニウム基を示す)で表わされる感光性構成単位
により置換されてなることを特徴とする光不溶性高分子
材料。 2 一般式 ▲数式、化学式、表等があります▼ 〔式中のmは1から6までの整数、nは1または2を示
し、Aはフェニル基、置換フェニル基、ピリジル基また
はピリジニウム基を示し、Rは低級アルキル基あるいは
アルキル基を示す)で表わされるアセタール化合物と、
70モル%以上けん化されたポリ酢酸ビニルと反応させ
ることを特徴とする、70モル%以上けん化されたポリ
酢酸ビニルにおいて、その構成単位に含まれる0.5〜
10モル%のビニルアルコール単位を、一般式▲数式、
化学式、表等があります▼ (式中のm、n、Aは前記と同じ意味をもつ)で表わさ
れる感光性構成単位で置換された光不溶性高分子材料の
製造方法。
[Claims] 1. 70 mol% with a degree of polymerization in the range of 300 to 3000
In the above saponified polyvinyl acetate, 0.5 to 10 mol% of vinyl alcohol units contained in the vinyl constituent units can be expressed by the general formula ▲ Numerical formula, chemical formula, table, etc. ▼ (m in the formula is 1 to 6 , n is 1 or 2, and A is a phenyl group, a substituted phenyl group, a pyridyl group, or a pyridinium group. material. 2 General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. , R represents a lower alkyl group or an alkyl group);
In polyvinyl acetate saponified at 70 mol% or more, which is characterized by reacting with polyvinyl acetate saponified at 70 mol% or more, 0.5 to
10 mol% of vinyl alcohol units are expressed by the general formula ▲mathematical formula,
There are chemical formulas, tables, etc. ▼ A method for producing a photo-insoluble polymer material substituted with a photosensitive structural unit represented by (m, n, A in the formula have the same meanings as above).
JP12278481A 1981-08-05 1981-08-05 Photoinsoluble polymer materials and their manufacturing method Expired JPS5928571B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12278481A JPS5928571B2 (en) 1981-08-05 1981-08-05 Photoinsoluble polymer materials and their manufacturing method

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Application Number Priority Date Filing Date Title
JP12278481A JPS5928571B2 (en) 1981-08-05 1981-08-05 Photoinsoluble polymer materials and their manufacturing method

Publications (2)

Publication Number Publication Date
JPS5825303A JPS5825303A (en) 1983-02-15
JPS5928571B2 true JPS5928571B2 (en) 1984-07-13

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Country Link
JP (1) JPS5928571B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59176303A (en) * 1983-03-26 1984-10-05 Agency Of Ind Science & Technol Purification method of photosensitive resin aqueous solution

Also Published As

Publication number Publication date
JPS5825303A (en) 1983-02-15

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