Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS593021B2 - Electron beam deflection device for scanning electron microscopes, etc. - Google Patents
[go: Go Back, main page]

JPS593021B2 - Electron beam deflection device for scanning electron microscopes, etc. - Google Patents

Electron beam deflection device for scanning electron microscopes, etc.

Info

Publication number
JPS593021B2
JPS593021B2 JP53130251A JP13025178A JPS593021B2 JP S593021 B2 JPS593021 B2 JP S593021B2 JP 53130251 A JP53130251 A JP 53130251A JP 13025178 A JP13025178 A JP 13025178A JP S593021 B2 JPS593021 B2 JP S593021B2
Authority
JP
Japan
Prior art keywords
deflection
electron beam
scanning
beam deflection
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53130251A
Other languages
Japanese (ja)
Other versions
JPS5557247A (en
Inventor
秀一 斎藤
進 高嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP53130251A priority Critical patent/JPS593021B2/en
Publication of JPS5557247A publication Critical patent/JPS5557247A/en
Publication of JPS593021B2 publication Critical patent/JPS593021B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Description

【発明の詳細な説明】 本発明は走査電子顕微鏡等に使用される電子線偏向装置
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam deflection device used in a scanning electron microscope or the like.

走査電子顕微鏡やX線マイクロアナライザー等 、の装
置では、試料を照射する電子線を走査偏向し、該走査と
同期したブラウン管の輝度変調信号に前記試料から得ら
れる検出信号を用いることによつて、ブラウン管画面上
に輝度変調走査像を表示している。
In devices such as scanning electron microscopes and X-ray microanalyzers, by scanning and deflecting an electron beam that irradiates a sample, and using a detection signal obtained from the sample as a brightness modulation signal of a cathode ray tube synchronized with the scanning, A brightness modulated scanned image is displayed on the cathode ray tube screen.

該走査像の倍率は試料照射電子線の走査。偏向強度を制
御することによつて切り換えられる。この場合、フェラ
イト等の強磁性体コアに巻回された偏向コイルに供給す
る励磁偏向電流の強度が像倍率に正確に対応するものと
仮定しているが、実際には強磁性体コアの磁化曲線にヒ
ステリシスが存在するため、強磁性体コアの磁化の強さ
がコj イルヘ供給する励磁電流強度だけでは一義的に
定まらず、それ以前の磁化状態に関係し同じ強度の励磁
電流を供給しても実際に得られる像倍率には僅かではあ
るが誤差が生じたり、観察視野が異なつたりする現像が
特に高倍率で著じるしくなる。0 このような現像を避
けるため、偏向コイルの強磁性体コアを取り去ろうとす
ると走査偏向電源の出力パワーを格段に大きくしなけれ
ばならず、又電子線経路近傍に設けられる偏向コイルが
占めるスペースや発熱量の増大など新たな問題を生じる
The magnification of the scanning image is the scanning of the electron beam irradiating the sample. It can be switched by controlling the deflection strength. In this case, it is assumed that the intensity of the excitation deflection current supplied to the deflection coil wound around a ferrite or other ferromagnetic core corresponds precisely to the image magnification, but in reality the magnetization of the ferromagnetic core Because there is hysteresis in the curve, the strength of the magnetization of the ferromagnetic core is not uniquely determined by the strength of the excitation current supplied to the coil, but is related to the previous magnetization state and is determined by the strength of the excitation current supplied to the coil. However, there may be a slight error in the actually obtained image magnification, and the development of a different observation field of view becomes particularly noticeable at high magnifications. 0 In order to avoid such development, if the ferromagnetic core of the deflection coil is removed, the output power of the scanning deflection power supply must be significantly increased, and the space occupied by the deflection coil installed near the electron beam path must be increased. This creates new problems such as increased heat generation and increased heat generation.

5 本発明は、強度磁性体コアに巻回された偏向コイル
を用いたままそのヒステリシスによる高倍率走査像への
影響を除去することを目的とするものである。
5. The object of the present invention is to eliminate the influence of hysteresis on high-magnification scanning images while using a deflection coil wound around a strong magnetic core.

第1図は本発明の一実施例走査の要部を示す略り 図で
あり、光軸zに沿つた電子線経路を中心軸とするリング
状フェライトコア1、2に巻回されたY方向偏向コイル
3とX方向偏向コイル4に供給する電流制御系が表わさ
れている。
FIG. 1 is a simplified diagram showing the main part of scanning according to an embodiment of the present invention. A current control system that supplies the deflection coil 3 and the X-direction deflection coil 4 is shown.

通常の動作状態においては、互いに同期したX軸(水平
)方向フ5 走査電源5とY軸(垂直)方向走査電源6
の出力から発生する各鋸歯状波電流が倍率調整手段とし
て用いられる互いに連動した可変増幅器7X、7Yとス
イッチング回路8、9を経て偏向コイル3、4に供給さ
れる。り 該実施例装置では倍率可変操作を可変増幅器
TYにおいて検出し、該検出信号に基づいて動作する消
磁制御回路10が設けられている。
In normal operating conditions, an X-axis (horizontal) scanning power supply 5 and a Y-axis (vertical) scanning power supply 6 are synchronized with each other.
The sawtooth wave currents generated from the outputs of are supplied to the deflection coils 3 and 4 via interlocking variable amplifiers 7X and 7Y used as magnification adjustment means and switching circuits 8 and 9, respectively. The device of this embodiment is provided with a degaussing control circuit 10 which detects the variable magnification operation in the variable amplifier TY and operates based on the detection signal.

該制御回路10lfCはタイマーが内蔵されており、倍
率切換操作が行われたときから極めて短い時間Tの間?
5 だけ消磁電源11とスイッチング回路8、9に制御
信号を印加して、それまで可変増幅器TY、7Xからの
出力とコイル3、4を接続していた状態から消磁電源1
1の出力がコイル3,4へ接続されるへ切り換えると共
に、ブラウン管(図示せず)の輝度変調入力にブランキ
ング信号を与える。第2図は第1図の装置におけるコイ
ル3へ供給される励磁電流の波形を示すもので、時刻t
1とT2vcおいて倍率切換操作が行われた状態を表わ
し.ている。図中W,,W2,W3で表わされる鋸歯波
は夫々倍率Ml,M2,M3(M1くM2くM3に相当
する可変増幅回路7Yの出力を表わしており、時刻t1
〜T2の切換時からT時間に表1われる交流波形W。は
消磁電源11の出力を表わしている。該交流波形W。と
しては図に示すように初期の振幅H。が鋸歯状波の最大
振幅の1.5倍程度に大きく、次第に振幅が減衰してい
くものが用いられる。このような装置を用いれば高倍率
像1を観祭する前の観祭倍率がどのような値であつても
常に一定の状態から高倍率が設定されることになり、偏
向コイルのコアの有するヒステリシスの影響をうけなく
なる。以上に詳説した如く、本発明によれば、高倍率観
察時に生じる偏向コイルのコアのヒステリシスによる影
響を除去することが可能となるので、走査電子顕微鏡に
よる精確な試料観祭に大きな効果が得られる。
The control circuit 10lfC has a built-in timer for an extremely short period of time T after the magnification switching operation.
5, the control signal is applied to the degaussing power supply 11 and the switching circuits 8 and 9, and the degaussing power supply 1
The output of No. 1 is switched to be connected to coils 3 and 4, and a blanking signal is applied to the brightness modulation input of a cathode ray tube (not shown). FIG. 2 shows the waveform of the excitation current supplied to the coil 3 in the device shown in FIG.
1 and T2vc, the magnification switching operation is performed. ing. The sawtooth waves represented by W, , W2, and W3 in the figure represent the outputs of the variable amplifier circuit 7Y corresponding to the magnifications M1, M2, and M3 (M1, M2, and M3, respectively, and the time t1
AC waveform W shown at time T from the switching time of ~T2. represents the output of the degaussing power supply 11. The AC waveform W. is the initial amplitude H as shown in the figure. is about 1.5 times as large as the maximum amplitude of the sawtooth wave, and the amplitude is gradually attenuated. If such a device is used, the high magnification will always be set from a constant state regardless of the value of the viewing magnification before viewing the high magnification image 1, and the high magnification will be set from a constant state. No longer affected by hysteresis. As explained in detail above, according to the present invention, it is possible to eliminate the influence of hysteresis of the core of the deflection coil that occurs during high-magnification observation, and therefore, a great effect can be obtained in accurately observing samples using a scanning electron microscope. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例装置の要部を示す略図、第2
図は第1図の装置の出力波形を示す略図である。 1,2・・・・・・強磁性体コア、3,4・・・・・・
偏向コイル、5・・・・・・X軸走査信号発生回路、6
・・・・・・Y軸走査信号発生回路、7X,7Y・・・
・・・可変増幅器、8,9・・・・・・スイツチング回
路、10・・・・・・消磁制御回路、11・・・・・・
消磁電源。
FIG. 1 is a schematic diagram showing the main parts of an apparatus according to an embodiment of the present invention, and FIG.
The figure is a schematic diagram showing the output waveforms of the apparatus of FIG. 1, 2...Ferromagnetic core, 3, 4...
Deflection coil, 5...X-axis scanning signal generation circuit, 6
...Y-axis scanning signal generation circuit, 7X, 7Y...
...Variable amplifier, 8,9... Switching circuit, 10... Demagnetization control circuit, 11...
Demagnetizing power supply.

Claims (1)

【特許請求の範囲】[Claims] 1 強磁性体のコアに巻回された電子線偏向コイル、該
コイルへ可変増幅回路と切換回路を介して偏向電流を供
給する偏向電源、前記切換回路を介して減衰交流電流を
供給するための消磁電源、前記可変増幅回路の制御操作
と連動して前記切換回路と前記消磁電源を一定時間動作
させるための手段とを具備したことを特徴とする走査電
子顕微鏡等用電子線偏向装置。
1. An electron beam deflection coil wound around a ferromagnetic core, a deflection power source for supplying a deflection current to the coil via a variable amplifier circuit and a switching circuit, and a deflection power supply for supplying a damped alternating current via the switching circuit. An electron beam deflection device for a scanning electron microscope or the like, comprising a degaussing power source and means for operating the switching circuit and the degaussing power source for a certain period of time in conjunction with a control operation of the variable amplifier circuit.
JP53130251A 1978-10-23 1978-10-23 Electron beam deflection device for scanning electron microscopes, etc. Expired JPS593021B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53130251A JPS593021B2 (en) 1978-10-23 1978-10-23 Electron beam deflection device for scanning electron microscopes, etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53130251A JPS593021B2 (en) 1978-10-23 1978-10-23 Electron beam deflection device for scanning electron microscopes, etc.

Publications (2)

Publication Number Publication Date
JPS5557247A JPS5557247A (en) 1980-04-26
JPS593021B2 true JPS593021B2 (en) 1984-01-21

Family

ID=15029764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53130251A Expired JPS593021B2 (en) 1978-10-23 1978-10-23 Electron beam deflection device for scanning electron microscopes, etc.

Country Status (1)

Country Link
JP (1) JPS593021B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59211570A (en) * 1983-05-16 1984-11-30 Jeol Ltd Film formation

Also Published As

Publication number Publication date
JPS5557247A (en) 1980-04-26

Similar Documents

Publication Publication Date Title
US7847249B2 (en) Charged particle beam apparatus
US9595416B2 (en) Transmission electron microscope
JPS593021B2 (en) Electron beam deflection device for scanning electron microscopes, etc.
JPH02160350A (en) Electron beam irradiation positioning method and device
JPS5822854B2 (en) Kadenriyuushisousakenbikiyou
TW309623B (en)
JPH0343650Y2 (en)
JP3383175B2 (en) Image display method of scanning microscope and scanning microscope
JPH0425803Y2 (en)
JPS5914222B2 (en) Magnification control device for scanning electron microscopes, etc.
JP2003338259A (en) Electron beam device provided with electromagnetic lens having no remnant magnetizm
JPH0228601Y2 (en)
Luzzi On high‐resolution transmission electron microscopy in an unstable magnetic environment
JPS5811073B2 (en) Sample scanning type sample image display device using particle beam
JPS59201352A (en) Recording and displaying device of observation visual-field in electron microscope
JPS5816591B2 (en) scanning electron microscope
JPH0334184B2 (en)
JP2002319361A (en) Setting method of different magnification of scanning electron microscope
JPS5840758A (en) Astigmatism correction in sample-scanning-type sample- image displayer by means of particle rays
JPS6155735B2 (en)
JPS59181450A (en) Scan line type dynamic observation device
JPS6332220B2 (en)
JPH077647B2 (en) electronic microscope
JPH11122627A (en) Degaussing device
JPS61163548A (en) Electron beam system