JPS5930791B2 - Electrode manufacturing method - Google Patents
Electrode manufacturing methodInfo
- Publication number
- JPS5930791B2 JPS5930791B2 JP57161537A JP16153782A JPS5930791B2 JP S5930791 B2 JPS5930791 B2 JP S5930791B2 JP 57161537 A JP57161537 A JP 57161537A JP 16153782 A JP16153782 A JP 16153782A JP S5930791 B2 JPS5930791 B2 JP S5930791B2
- Authority
- JP
- Japan
- Prior art keywords
- tin
- coating
- electrode
- compound
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 238000000576 coating method Methods 0.000 claims description 45
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 42
- 239000011248 coating agent Substances 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 37
- 150000003606 tin compounds Chemical class 0.000 claims description 15
- 150000001875 compounds Chemical class 0.000 claims description 8
- 230000001590 oxidative effect Effects 0.000 claims description 6
- -1 tin sulfate compound Chemical class 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- 150000001463 antimony compounds Chemical class 0.000 claims 4
- 150000002697 manganese compounds Chemical class 0.000 claims 2
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 150000002611 lead compounds Chemical class 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 16
- 239000010936 titanium Substances 0.000 description 14
- 239000008199 coating composition Substances 0.000 description 13
- 229910052719 titanium Inorganic materials 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 10
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 10
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 8
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 8
- 229910052707 ruthenium Inorganic materials 0.000 description 8
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 8
- YADSGOSSYOOKMP-UHFFFAOYSA-N lead dioxide Inorganic materials O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- 229910001887 tin oxide Inorganic materials 0.000 description 4
- FAKFSJNVVCGEEI-UHFFFAOYSA-J tin(4+);disulfate Chemical compound [Sn+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O FAKFSJNVVCGEEI-UHFFFAOYSA-J 0.000 description 4
- 229910000978 Pb alloy Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000003908 quality control method Methods 0.000 description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000003915 air pollution Methods 0.000 description 2
- 229910000410 antimony oxide Inorganic materials 0.000 description 2
- DAMJCWMGELCIMI-UHFFFAOYSA-N benzyl n-(2-oxopyrrolidin-3-yl)carbamate Chemical compound C=1C=CC=CC=1COC(=O)NC1CCNC1=O DAMJCWMGELCIMI-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical class [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 150000003304 ruthenium compounds Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000004584 weight gain Effects 0.000 description 2
- 235000019786 weight gain Nutrition 0.000 description 2
- 229910001339 C alloy Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005363 electrowinning Methods 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- DEIVNMVWRDMSMJ-UHFFFAOYSA-N hydrogen peroxide;oxotitanium Chemical compound OO.[Ti]=O DEIVNMVWRDMSMJ-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- XMFOQHDPRMAJNU-UHFFFAOYSA-N lead(II,IV) oxide Inorganic materials O1[Pb]O[Pb]11O[Pb]O1 XMFOQHDPRMAJNU-UHFFFAOYSA-N 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- AMWRITDGCCNYAT-UHFFFAOYSA-L manganese oxide Inorganic materials [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 1
- 239000012803 melt mixture Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(IV) oxide Inorganic materials O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 description 1
- ALHBQZRUBQFZQV-UHFFFAOYSA-N tin;tetrahydrate Chemical compound O.O.O.O.[Sn] ALHBQZRUBQFZQV-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Metals (AREA)
- Inert Electrodes (AREA)
- Battery Electrode And Active Subsutance (AREA)
Description
【発明の詳細な説明】
本発明は、コーティング材料を一般にバルブ金属の電極
支持体へ施こす方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of applying coating materials to generally valve metal electrode supports.
この方法において、コーティング組成物はすず化合物を
含み、この化合物は後でその酸化物の形態に変えられて
製造法の再現性が有意に増大した電極を生成し、この方
法によるとすず金属をより完全に利用できるため製造経
費が節減され、かつコーティング過程中のすず化合物の
揮発により引き起こされる大気汚染が減少する。さらに
詳しくは、本発明は、コーティング組成物混合物中に硫
酸塩の形態のすず化合物を使用することにより、一成分
としてすずを有する電極コーティング組成物を支持する
バルブ金属、たとえばチタンの支持体を有する電極の非
常に改良された製造法に関する。電気化学的製造法は、
生態学的受容性がより大きく、エネルギー保存が可能で
あわ、そして製品コストを軽減できるため、化学工業に
おいて重要性が増大しつつある。In this method, the coating composition includes a tin compound, which is later converted to its oxide form to produce an electrode with significantly increased reproducibility of the manufacturing process, and this method makes it possible to make tin metal more Full utilization saves manufacturing costs and reduces air pollution caused by volatilization of tin compounds during the coating process. More particularly, the present invention provides a method of having a support of a valve metal, e.g. titanium, support an electrode coating composition having tin as one component by using a tin compound in the form of a sulfate in the coating composition mixture. Concerning a greatly improved method of manufacturing electrodes. The electrochemical manufacturing method is
It is gaining importance in the chemical industry due to its greater ecological acceptability, potential for energy conservation, and reduced product costs.
したがつて、研究および開発の大きな努力が電気化学的
方法とその・・ −トウエアにはられれている。ハード
ウェアの1つの主要な要素は電極である。その目的は次
のような電極を提供することである:電解槽内の腐食性
ふん囲気に耐える電極;所望の電気化学的反応に対して
最小の過電圧を有する電極:そして商業的に可能な範囲
内のコストで高い品質の管理で製造できる電極。ほんの
わずかの材料のみが電極、ことに陽極を有効に構成でき
るにすげない。なぜなら、ほとんどの他の物質は電解槽
の陽極室内に存在する強い腐食性条件に感受性であるか
らである。これらの材料には、グラフアイト、ニツケル
、鉛、鉛合金、白金または白金化チタンがある。この型
の電極は、寸法安定性に欠け、コストが高く、摩耗速度
が高く、電解液を汚染し、陰極を析出汚染し、不純物に
対して感受性であり、または所望反応に対する過電圧が
高いため、応用が制限される。過電圧とは、所望の反応
が一定の電流密度で起こる理論的電位より高い電位をい
う。電極の歴史は電解槽内の電極に関連する問題のいく
つかを克服するための試みおよび提案の繰り返しであり
、それらのいずれも電解槽に使用する電極の特性の最適
化に成功していない。Therefore, significant research and development efforts are being devoted to electrochemical methods and their... -ware. One major element of the hardware is the electrode. The objective is to provide an electrode that: withstands the corrosive atmosphere in the electrolytic cell; has the lowest overvoltage for the desired electrochemical reaction; and within the commercially possible range. Electrodes that can be manufactured with high quality control at a low cost. It is amazing that only a few materials can effectively form electrodes, especially anodes. This is because most other materials are sensitive to the highly corrosive conditions that exist within the anode chamber of an electrolytic cell. These materials include graphite, nickel, lead, lead alloys, platinum or platinized titanium. This type of electrode lacks dimensional stability, is expensive, has a high wear rate, contaminates the electrolyte, precipitates contaminates the cathode, is sensitive to impurities, or has a high overpotential for the desired reaction. Applications are limited. Overpotential refers to a potential above the theoretical potential at which the desired reaction would occur at a constant current density. The history of electrodes has been filled with repeated attempts and proposals to overcome some of the problems associated with electrodes in electrolytic cells, none of which have been successful in optimizing the properties of electrodes for use in electrolytic cells.
問題は前述の望ましくない性質の多くを克服し、さらに
よシ高い電流密度に訃いて低い過電圧をもつてエネルギ
ーを保存できる電極を見出すことである。たとえば、白
金は電解採取法に卦ける陽極として使用するのにきわめ
てすぐれた材料であり、前述の基準の多くを満足するこ
とは知られている。しかし、白金は高価であるため、現
在まで工業的に適当であるとまだわかつていない。炭素
と鉛合金は商業的に使用されてきているが、炭素陽極は
摩耗がはやく、電解液を大きく汚染し、電気抵抗を増加
させ、半電解摺電位を増加させる。半電解摺電位が高い
と、電解槽は電気エネルギーをより多く消費するので、
望ましくない。鉛合金の陽極の欠点は、鉛が電解液中に
溶けて陰極上の鉛析出物を形成し、これは所望の得られ
る析出物を汚染するということである。また、PbO2
は導電性に劣るPb3O4に変化する。酸素はこの層の
下に浸透でき、このフイルムをはがし、その結果粒子が
生成して陰極上の析出銅中に捕捉されるようになる。こ
れにより銅めつきは劣化し、これは非常に望ましくない
ことである。白金または他の貴金属をチタン支持体上に
適用してそれらの魅力的な電気的特性を保持させ、さら
に製造コストを低下させることが提案された。The problem is to find an electrode that overcomes many of the undesirable properties mentioned above and can still sustain energy at higher current densities and store energy with low overpotentials. For example, platinum is an excellent material for use as an anode in electrowinning processes and is known to meet many of the aforementioned criteria. However, since platinum is expensive, it has not yet been found to be industrially suitable. Carbon and lead alloys have been used commercially, but carbon anodes wear quickly, significantly contaminate the electrolyte, increase electrical resistance, and increase semi-electrolytic sliding potential. When the semi-electrolytic sliding potential is high, the electrolytic cell consumes more electrical energy, so
Undesirable. A disadvantage of lead alloy anodes is that the lead dissolves in the electrolyte and forms a lead deposit on the cathode, which contaminates the desired resulting deposit. Also, PbO2
changes to Pb3O4, which has poor conductivity. Oxygen can penetrate beneath this layer and strip this film, resulting in particles forming and becoming trapped in the deposited copper on the cathode. This degrades the copper plating, which is highly undesirable. It has been proposed to apply platinum or other noble metals onto titanium supports to retain their attractive electrical properties and further reduce manufacturing costs.
しかし、白金のような貴金属を制限して使用しても、電
極表面積1平方フイート当B3O.OOドル(323.
00ドル/Rrl′)の経費を必要とし、そのため工業
的使用には望ましくない。さらに、チタンの表面に白金
を電気めつきし、これに二酸化鉛または二酸化マンガン
の他の電析物を適用することが提案された。二酸化鉛の
コーテイングをもつ電極は酸素過電圧が比較的高いとい
う欠点をもち、両方の型のコーテイングは電解的に析出
されるとき高い内部応力をもち、工業的使用の間表面か
らはがれやすく、電解液と陰極表面上に析出する生成物
を汚染する。したがつて、このような陽極の電流密度は
制限さ江このような陽極の取り扱いはきわめて注意して
なされなければならない。他の試みられた改良はチタン
支持体表面上に二酸化マンガンの層を形成することであ
り、この層は比較的多孔性であり、多数の二酸化マンガ
ンの層からなつていて一体的コーテイングを形成してい
る。これは電流密度が0.5アンペア/平方インチ(7
7.5ミリアンペア/肩)以下にとどまるかぎり比較的
低い過電圧を生ずるが、電流密度が1アンペア/平方イ
ンチ(155ミリアンペア/肩)付近に増加するにつれ
て必要な過電圧はかなり急速に上昇し、より高い電流密
度に卦いて相当な不利益を生ずる。最近、多数のコーテ
イングにはチタン、ルテニウム訃よびすずの二酸化物、
またはすず訃よびアンチモンの酸化物が使用さ江 その
上にマンガンまたは鉛の酸化物のトツプコーテイングが
めっきされている。However, even with limited use of precious metals such as platinum, B3O per square foot of electrode surface area. OO dollars (323.
00/Rrl'), making it undesirable for industrial use. Furthermore, it has been proposed to electroplate platinum on the surface of titanium, to which other deposits of lead dioxide or manganese dioxide can be applied. Electrodes with lead dioxide coatings have the disadvantage of relatively high oxygen overpotentials, and both types of coatings have high internal stresses when deposited electrolytically, are susceptible to flaking from the surface during industrial use, and are and contaminate products deposited on the cathode surface. Therefore, the current density of such anodes is limited and must be handled with great care. Another improvement attempted is to form a layer of manganese dioxide on the surface of the titanium support, which is relatively porous and consists of multiple layers of manganese dioxide to form an integral coating. ing. This has a current density of 0.5 amps/in2 (7
As long as the current density remains below 7.5 milliamps per square inch (155 milliamps per shoulder), the required overvoltage increases fairly rapidly and becomes higher. This results in considerable disadvantages in terms of current density. Recently, a number of coatings have been developed using titanium, ruthenium and tin dioxide,
Or tin and antimony oxides are used, on which a top coating of manganese or lead oxides is plated.
これらのコーテイングはその区域に卦いて過電圧を低下
させ、かつ電解槽内の腐食性条件に卦ける使用寿命を長
くすることに卦いて実質的に有望であることを示した。
これらの材料の主要な欠点は、ことにすずの酸化物を適
用する方法に訃いてコーティングをベーキングしてすず
酸化物とするとき実質量のすずが揮発するということで
ある。その理由は、すず化合物、たとえば塩化第二すず
五水和物がベーキングの際水酸化第二すずに変わb1次
いで一定の電極コーテイングに望まれる酸化第二すずに
変わることにある。この方法の実施の際、すずそれ自体
の多くは、コーテイング中に残留しないで、大気中に揮
発する。これが起こるのは少なくとも一部分は塩化第二
すずが114℃付近に卦いて沸とうするためであり1そ
してすず化合物のそれぞれの酸化物への転移はそれより
非常に高い温度で起こるので、これらの物質のほとんど
は大気中に失なわれ、その結果すず材料の50(fl)
より少ない量が実際のコーテイングに利用されるにすぎ
ない。これは大きくかつ大量の電極の製造の際品質の管
理においてきびしい問題を生ずる。コーテイング組成物
の再現性は、普通のコーテイングを支持体材料へ適用す
る方法によつてはすずの揮発が起こるため、ほとんど不
可能である。したがつて、理論的なすずの計算だけでは
、一定の電極の可能な使用寿命を計算することに関して
問題を起こすことがある。こんにちまでコーテイング組
成物にすずを使用することは商業的に成功して}らず、
その理由はすずの揮発性が再現性の問題を生じさせ、現
在厳格な規準下にある汚染を増大させ、そして一定の電
極の製造コストをすずの損失のため増加していることに
ある。したがつて、本発明の目的は、所望の品質管理特
性をもちかつ商業的に可能な範囲内の製造経費の電極を
製造する方法を提供することである。These coatings have shown substantial promise in reducing overvoltage in the area and increasing service life in the corrosive conditions within the electrolytic cell.
A major drawback of these materials is that substantial amounts of tin are volatilized when the coating is baked to the tin oxide, especially due to the method of applying the tin oxide. The reason is that tin compounds, such as stannic chloride pentahydrate, convert during baking to stannic hydroxide b1 and then to stannic oxide, which is desired for certain electrode coatings. When carrying out this method, much of the tin itself does not remain in the coating, but evaporates into the atmosphere. This occurs at least in part because stannic chloride boils at temperatures around 114°C,1 and because the transformation of tin compounds to their respective oxides occurs at much higher temperatures, these materials Most of the tin material is lost to the atmosphere, resulting in 50 (fl) of the tin material.
Only a smaller amount is used for the actual coating. This creates severe problems in quality control when manufacturing large, large quantities of electrodes. Reproducibility of coating compositions is almost impossible because of the volatilization of tin that occurs with the way conventional coatings are applied to support materials. Therefore, theoretical tin calculations alone can pose problems in calculating the possible service life of a given electrode. To date, the use of tin in coating compositions has not been commercially successful.
The reason is that the volatility of tin creates reproducibility problems, increases contamination, which is currently subject to strict standards, and increases the manufacturing cost of certain electrodes due to the loss of tin. It is therefore an object of the present invention to provide a method for manufacturing electrodes with desirable quality control characteristics and manufacturing costs within commercially viable ranges.
本発明の他の目的は、すずの大気中への揮発を有意に減
少させ、かくしてこの製造に関連する大気汚染の問題を
軽減する電極の製法を提供することである。本発明のこ
れらの目的卦よび他の目的、ならびに現在訃よび従来の
技術よ)すぐれた利点は、以下の説明から明らかである
ように、ここに記載しかつ特許請求する改良によつて達
成される。Another object of the present invention is to provide a process for making an electrode that significantly reduces the volatilization of tin into the atmosphere, thus alleviating the air pollution problems associated with its manufacture. These and other objects of the present invention, as well as advantages over the present and prior art, are achieved by the improvements described and claimed herein, as will be apparent from the following description. Ru.
コーテイング組成物は、支持体をえらび、該支持体の表
面の少なくとも一部分に硫酸すず化合物を含有するコー
テイング材料を塗布し、該コーテイング材料を乾燥し、
そして該コーテイング材料を酸化性ふん囲気中でベーキ
ングしてすず化合物をその酸化物の形態にすることから
なる方法によつて製造できることがわかつた。本発明の
電極コーテイング組成物の改良された製造法は、すずの
揮発が現在問題となつている任意のすず化合物を代替物
として有する任意のコーテイングの製造に用いることが
できる。The coating composition includes selecting a support, applying a coating material containing a tin sulfate compound to at least a portion of the surface of the support, and drying the coating material.
It has now been found that the coating material can be prepared by a process consisting of baking the coating material in an oxidizing atmosphere to convert the tin compound into its oxide form. The improved method of making electrode coating compositions of the present invention can be used to make any coating having as a substitute any tin compound for which tin volatilization is currently a problem.
過去に}いて、すずを使用する電極コーテイング組成物
は、沸点が低くそのため揮発の問題を生ずる塩化物の形
態の熱分解性化合物を利用してきた。本発明は、硫酸塩
の形態のすずを使用するか、または硫酸塩の形態のすず
を生成するところの塩化物化合物と硫酸とを使用する。
この硫酸塩の形態のすずは簡単な分解機構により最終の
電極コーテイング組成物中で酸化物の形態となるので、
ベーキングの際のすずの揮発は猛烈に減少する。このよ
うな電極コーテイング組成物に対して使用する支持体材
料は、十分な機械的強さをもつていてコーテイングの支
持体として役立つ任意の導電性金属であることができ、
典型的な金属の例は、アルミニウム、モリブデン、ニオ
ブ、タンタル、チタン、タングステン、ジルコニウム、
ニツケル、鋼、ステンレス鋼およびそれらの合金である
。コスト、入手性、電気的卦よび化学的性質に基づいて
好ましいバルブ金属はチタンである。チタン支持体が電
極の製造に訃いてとることができる多数の形態が存在し
、その例は、丈夫なシート材料、高比率の開口面積をも
つエキスパンドした金属メツシユ材料、}よびチタン粉
末の冷間圧縮により製造できる純粋チタンの30〜70
%の密度をもつ多孔質チタンである。本発明を利用でき
る1つの型のコーテイングは、前述のような支持体材料
がすず卦よびアンチモンの酸化物の半導電性中間コーテ
イングでコーテイングされているものである。In the past, electrode coating compositions using tin have utilized thermally decomposable compounds in the form of chlorides, which have low boiling points and therefore create volatilization problems. The present invention uses tin in the sulfate form, or chloride compounds and sulfuric acid which produce tin in the sulfate form.
This sulfate form of tin becomes the oxide form in the final electrode coating composition by a simple decomposition mechanism.
Tin volatilization during baking is drastically reduced. The support material used for such electrode coating compositions can be any electrically conductive metal with sufficient mechanical strength to serve as a support for the coating;
Typical examples of metals are aluminum, molybdenum, niobium, tantalum, titanium, tungsten, zirconium,
Nickel, steel, stainless steel and their alloys. The preferred valve metal is titanium based on cost, availability, electrical properties and chemical properties. There are a number of forms that titanium supports can take for electrode manufacture, examples being tough sheet materials, expanded metal mesh materials with a high percentage of open area, and cold forming of titanium powder. 30 to 70 of pure titanium that can be produced by compression
% porous titanium. One type of coating that can utilize the present invention is one in which a support material as described above is coated with a semiconducting intermediate coating of tin and antimony oxides.
これらの組成物は一般に二酸化すずと少量のアンチモン
「ドープ剤」との混合物であり1ドープ剤はSnO2お
よびSb2O3の合計重量に基づいて計算して0.1〜
30重量%の量で存在する。これらの場合のほとんどに
}いて三酸化チタンの好ましい量は3〜15重量%であ
る。過去に}いて、これらの中間コーテイングは一般に
支持体へ塗装または塗布すべき混合物の材料の1つとし
て塩化第二すず五水和物を使用した。本発明はすず硫酸
塩物質または塩化第二すず五水和物と硫酸とを使用して
すずの硫酸塩形態を得る。この硫酸塩形態は320℃付
近の温度に卦いて簡単な分解機構をもつので、これらの
材料をベーキングしてそれぞれの酸化物にする温度に卦
いてすずの大気中への揮発は非常に少ない。このため半
導電性中間コーテイングは塗布回数を非常に少なくして
形成できる。この半導電性中間コーテイングの上に、二
酸化マンガンまたは二酸化鉛のトツプコーテイングを施
して、すぐれた電流効率とすぐれた使用寿命とをもつ電
極をつくることができる。These compositions are generally mixtures of tin dioxide and a small amount of antimony "dopant", with 1 dopant ranging from 0.1 to 1, calculated based on the combined weight of SnO2 and Sb2O3.
Present in an amount of 30% by weight. In most of these cases, the preferred amount of titanium trioxide is from 3 to 15% by weight. In the past, these intermediate coatings generally used stannic chloride pentahydrate as one of the materials in the mixture to be painted or applied to the support. The present invention uses a tin sulfate material or stannic chloride pentahydrate and sulfuric acid to obtain the tin sulfate form. Since this sulfate form has a simple decomposition mechanism at temperatures around 320°C, there is very little volatilization of tin into the atmosphere at the temperatures at which these materials are baked into their respective oxides. Therefore, the semiconductive intermediate coating can be formed with very few applications. A top coating of manganese dioxide or lead dioxide can be applied over this semiconductive intermediate coating to create an electrode with excellent current efficiency and service life.
使用できる電極コーテイング組成物を生成するために、
すず化合物を利用する電極コーテイング組成物の他の例
は多数ある。To produce electrode coating compositions that can be used,
There are many other examples of electrode coating compositions that utilize tin compounds.
硫酸すず含有コーテイング組成物を塗布する前に、多数
の他の組成物で支持体材料を予備コーテイングできる。
次の実施例によつて、本発明をさらに説明する。Prior to applying the tin sulfate-containing coating composition, the support material can be precoated with a number of other compositions.
The invention is further illustrated by the following examples.
参考例 1三塩化アンチモン、三塩化ルテニウム卦よび
種種のすず含有化合物を、これらすべてが最終のすず/
ルテニウムの比の分析値に計算されかつこれに匹適する
初期のすず/ルテニウムの比を与えるような量で、含有
する溶液を用いて支持体金属、この場合チタンをコーテ
イングすることによつて、一連の電極をつくつた。Reference Example 1 Antimony trichloride, ruthenium trichloride and various tin-containing compounds are all combined into the final tin/
by coating the support metal, in this case titanium, with a solution containing an amount such as to give an initial tin/ruthenium ratio calculated and comparable to the analytical value of the ruthenium ratio. I made an electrode for this.
これは各場合に訃いて起こるすずの揮発の量を示す。初
期のすず/ルテニウムの比は、コーテイング溶液中の出
発物質の重量から決定した。ルテニウム化合物は水をあ
る程度吸収して水和物を形成するので、この比に訃いて
ルテニウムの初期量の計算でほぼ5(Ff)の不正確さ
が多少存在する。これらの種々の材料を支持体材料に塗
布したのち、これを酸化性ふん囲気中で475〜625
℃の温度に訃いて5〜10分間ベーキングして、各化合
物をそれぞれの酸化物に変えた。この方法を数回繰り返
して、所望重量増加の量を形成した。コーテイング材料
の量は、生じたすず/ルテニウムの比に対して、観測さ
れる影響を及ぼさなかつた。したがつて、任意の都合の
よい重量のコーテイング材料を使用できた。これがいつ
たん達成されたとき、溶融塩により触媒層をチタン支持
体からストリッピングし、次いでこれを水に溶かして金
属を沈殿させ、生じた溶液を原子吸収により分析してコ
ーテイング材料中の最C終のすず/ルテニウムの比を確
立することによつて、最終のすず/ルテニウムの比を決
定した。これらの比と使用したすず化合物を、下表1に
報告する。塩化第二すず五水和物を使用するとき10対
1程度のすずの揮発損失が存在するが、これに対して使
用した化合物が硫酸と反応した塩化第二すず五水和物で
あるとき、すずの損失は無視できることがわかる。This indicates the amount of tin volatilization that occurs in each case. The initial tin/ruthenium ratio was determined from the weight of starting material in the coating solution. Because ruthenium compounds absorb some water to form hydrates, there is some inaccuracy in calculating the initial amount of ruthenium due to this ratio, approximately 5 (Ff). After applying these various materials to a support material, this is heated to 475-625% in an oxidizing atmosphere.
Each compound was converted to its respective oxide by baking at a temperature of 10°C for 5-10 minutes. This process was repeated several times to create the desired amount of weight gain. The amount of coating material had no observed effect on the resulting tin/ruthenium ratio. Therefore, any convenient weight of coating material could be used. Once this has been achieved, the catalyst layer is stripped from the titanium support with a molten salt, which is then dissolved in water to precipitate the metal, and the resulting solution is analyzed by atomic absorption to determine the carbon content of the coating material. The final tin/ruthenium ratio was determined by establishing the final tin/ruthenium ratio. These ratios and the tin compounds used are reported in Table 1 below. When using stannic chloride pentahydrate, there is a volatilization loss of tin on the order of 10:1, whereas when the compound used is stannic chloride pentahydrate reacted with sulfuric acid, the loss of tin It turns out that the loss is negligible.
いくつかの場合に卦いて、硫酸塩の形態を使用したとき
、最終比は初期比より高いことさえある。この原因はル
テニウム化合物が水を含有し、多分ストリツピングの間
多少失なわれることによつて起きた実験誤差であると考
えられる。参考例 2実質的に増加量のすずがコーテイ
ング中に保持されることを示す第2の実験を行つた。In some cases, when the sulfate form is used, the final ratio may even be higher than the initial ratio. This is believed to be due to experimental error caused by the fact that the ruthenium compound contains water, which is probably lost to some extent during stripping. Reference Example 2 A second experiment was conducted showing that substantially increased amounts of tin were retained in the coating.
この場合に卦いて、種々のすず含有化合物を用い、参考
例1に従う既知量の溶夜混合物を、るつぼ中で焼成し、
原子吸収によ幻残留物を分析した。焼成温度とサイクル
は参考例1と同様であつた。この実験の結果を、このよ
うな焼成後コーテイング材料中に残る一定元素の百分率
として、下表に報告す表から、硫酸塩形態のすずを使用
すると、従来使用された塩化物形態のすずの使用に比べ
て、すずの保持率は有意に高いことがわかる。比較例
1
硫酸塩形態の化合物のコーテイング中のすず量に等しい
生成量を生ずるように大量の塩化物形態のすず化合物を
使用する電極と比較して、電極の半電解摺電位と使用寿
命を評価するため、一連の電極をつくつた。In this case, a known amount of a melt mixture according to Reference Example 1 using various tin-containing compounds is calcined in a crucible,
Phantom residues were analyzed by atomic absorption. The firing temperature and cycle were the same as in Reference Example 1. The results of this experiment, as a percentage of a constant element remaining in the coating material after such firing, are reported in the table below, from which it can be seen that the use of sulfate form of tin compares to the use of previously used chloride form of tin. In comparison, it can be seen that the retention rate of tin is significantly higher. Comparative example
1. To evaluate the semi-electrolytic sliding potential and service life of the electrode in comparison with electrodes that use large amounts of tin compounds in the chloride form to produce an amount equal to the amount of tin in the coating of the compound in the sulfate form. , created a series of electrodes.
25.1tの塩化第二すず五水和物は、硫酸と反応した
5.48yの塩化第二すず五水和物を含有する混合物と
ほぼ同じ量のすずを生ずることがわかつた。It was found that 25.1 t of stannic chloride pentahydrate yielded approximately the same amount of tin as a mixture containing 5.48 y of stannic chloride pentahydrate reacted with sulfuric acid.
この場合コーテイングに流酸塩形態を使用しないとほぼ
5倍量のすず化合物を必要とすることがわかる。また、
これらの2種の材料をルテニウムの量(t/平方フイー
ト)を同じにしてチタン上に塗布すると、得られた電極
は下表Iに報告されているようにほぼ同じ半電解摺電位
と使用寿命を与えることがわかつた。したがつて、得ら
れた電極から等しい使用寿命を生成するためには、硫酸
塩形態のすずの量に対してほぼ5倍量の塩化物形態のす
ずを必要とすることがわかる。このことは、かなb少な
い量の硫酸塩形態のすず化合物を使用でき、したがつて
一定の電極の使用寿命に対して正昧の製造経費が節約さ
れることを意味する。表1かられかるように、硫酸塩形
態のすず化合物の再現性は塩化物形態のすず化合物のそ
れよりかなb高いので、電極の製造を大規模にするのは
非常に容易となる。また、硫酸塩形態を使用すると、す
ずの大気中への揮発はかなり少なくなるので、先行技術
に関連する汚染の問題を排除できる。実施例 1
三塩化アンチモンと硫酸すずとを含有する溶液でチタン
メツシユ基体材料を被覆して試験電極を調製した。It can be seen that in this case, approximately five times as much tin compound is required if the sulfate form is not used in the coating. Also,
When these two materials are coated on titanium with the same amount of ruthenium (t/sq ft), the resulting electrodes have approximately the same half-electrolytic sliding potential and service life as reported in Table I below. I found out that it gives It can therefore be seen that approximately five times the amount of tin in chloride form is required relative to the amount of tin in sulfate form to produce an equal service life from the resulting electrode. This means that a much smaller amount of the tin compound in sulfate form can be used, thus saving significant manufacturing costs for a given electrode service life. As can be seen from Table 1, the reproducibility of the sulfate form of the tin compound is much higher than that of the chloride form of the tin compound, making it very easy to manufacture the electrode on a large scale. Also, the use of the sulfate form results in significantly less volatilization of tin into the atmosphere, thereby eliminating the contamination problems associated with the prior art. Example 1 A test electrode was prepared by coating a titanium mesh substrate material with a solution containing antimony trichloride and tin sulfate.
被覆溶液を該基体材料に施した後、該被覆物を酸化性ふ
ん囲気中で475゜〜600℃の温度範囲で5〜10分
間ベーキングして前記化合物をそれぞれの酸化物に転化
した。所望の重量増加をもつ層をうるために、このプロ
セスを数回繰り返した。その後、下記表に示す如く、抵
抗のある場合とない場合の両方に訃ける、酸素の単位電
極電位を知るために、50℃の温度で、リツトル当り1
507の硫酸電解液中で前記電極サンプルを試験した。After applying the coating solution to the substrate material, the coating was baked in an oxidizing atmosphere at a temperature ranging from 475 DEG to 600 DEG C. for 5 to 10 minutes to convert the compounds to their respective oxides. This process was repeated several times to obtain layers with the desired weight gain. Then, as shown in the table below, in order to find out the unit electrode potential of oxygen both with and without resistance, at a temperature of 50°C,
The electrode samples were tested in 507 sulfuric acid electrolyte.
次いで、下記表に示す如く、塩素の単位電極電位を知る
ために、75℃の温度で、添加した約4dの塩酸と30
0t/tの塩化ナトリウムを含む電解液中で、前記の同
一電極を試1験した。Next, as shown in the table below, in order to know the unit electrode potential of chlorine, about 4 d of hydrochloric acid added and 30
The same electrode was tested in an electrolytic solution containing 0 t/t of sodium chloride.
Claims (1)
に硫酸すず化合物およびアンチモン化合物を含有するコ
ーティング材料を施し、該コーティング材料を乾燥し、
酸化性ふん囲気中でベーキングし、それによつて該すず
化合物およびアンチモン化合物をそれぞれの酸化物の形
態に転化することを特徴とする電極の製造方法。 2 支持体を選び、該支持体の少なくとも一部分の表面
に硫酸すず化合物およびアンチモン化合物を含有するコ
ーティング材料を施し、該コーティング材料を乾燥し、
酸化性ふん囲気中でベーキングし、それによつて該すず
化合物およびアンチモン化合物をそれぞれの酸化物の形
態に転化することによつて第一被覆を形成し、次いで該
第一被覆上にマンガン化合物と鉛化合物からなる群より
選ばれたトップコーティング材料を施し、該トップコー
ティング材料を乾燥し、酸化性ふん囲気中でベーキング
し、それによつて該マンガン化合物と鉛化合物をそれぞ
れの酸化物の形態に転化することを特徴とする電極の製
造方法。[Claims] 1. Select a support, apply a coating material containing a tin sulfate compound and an antimony compound to the surface of at least a portion of the support, and dry the coating material,
A method for producing an electrode, characterized in that it is baked in an oxidizing atmosphere, thereby converting the tin and antimony compounds into their respective oxide forms. 2. Select a support, apply a coating material containing a tin sulfate compound and an antimony compound to the surface of at least a portion of the support, and dry the coating material,
forming a first coating by baking in an oxidizing atmosphere, thereby converting the tin compound and the antimony compound to their respective oxide forms; and then depositing the manganese compound and the lead on the first coating. applying a top coating material selected from the group consisting of compounds, drying the top coating material and baking in an oxidizing atmosphere, thereby converting the manganese compound and the lead compound to their respective oxide forms; A method of manufacturing an electrode, characterized by:
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66720276A | 1976-03-15 | 1976-03-15 | |
| US667202 | 1996-06-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5873782A JPS5873782A (en) | 1983-05-04 |
| JPS5930791B2 true JPS5930791B2 (en) | 1984-07-28 |
Family
ID=24677240
Family Applications (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52026870A Expired JPS586786B2 (en) | 1976-03-15 | 1977-03-11 | Improved electrode manufacturing method |
| JP54173857A Expired JPS5822551B2 (en) | 1976-03-15 | 1979-12-27 | Improved electrode manufacturing method |
| JP56148663A Pending JPS5782477A (en) | 1976-03-15 | 1981-09-19 | Production of electrode |
| JP56148662A Expired JPS5833313B2 (en) | 1976-03-15 | 1981-09-19 | Electrode coating composition |
| JP57161537A Expired JPS5930791B2 (en) | 1976-03-15 | 1982-09-16 | Electrode manufacturing method |
Family Applications Before (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52026870A Expired JPS586786B2 (en) | 1976-03-15 | 1977-03-11 | Improved electrode manufacturing method |
| JP54173857A Expired JPS5822551B2 (en) | 1976-03-15 | 1979-12-27 | Improved electrode manufacturing method |
| JP56148663A Pending JPS5782477A (en) | 1976-03-15 | 1981-09-19 | Production of electrode |
| JP56148662A Expired JPS5833313B2 (en) | 1976-03-15 | 1981-09-19 | Electrode coating composition |
Country Status (20)
| Country | Link |
|---|---|
| JP (5) | JPS586786B2 (en) |
| AU (1) | AU516392B2 (en) |
| BE (1) | BE852419A (en) |
| BR (1) | BR7701546A (en) |
| CA (1) | CA1094891A (en) |
| CH (1) | CH619492A5 (en) |
| DD (1) | DD131043A5 (en) |
| DE (1) | DE2710802C3 (en) |
| DK (1) | DK110877A (en) |
| FI (1) | FI65284C (en) |
| FR (1) | FR2344644A1 (en) |
| GB (2) | GB1573173A (en) |
| IT (1) | IT1086682B (en) |
| MX (1) | MX145434A (en) |
| NL (1) | NL7702742A (en) |
| NO (1) | NO148751C (en) |
| PL (1) | PL110048B1 (en) |
| SE (1) | SE427192B (en) |
| TR (1) | TR20097A (en) |
| ZA (1) | ZA771521B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2710802C3 (en) * | 1976-03-15 | 1980-04-03 | Diamond Shamrock Corp., Cleveland, Ohio (V.St.A.) | Process for the production of electrodes for electrolytic cells |
| JPS60162787A (en) * | 1984-01-31 | 1985-08-24 | Tdk Corp | Electrode for electrolysis |
| JPS6254017U (en) * | 1985-09-25 | 1987-04-03 | ||
| JPS62274087A (en) * | 1986-05-22 | 1987-11-28 | Permelec Electrode Ltd | Durable electrode for electrolysis and its production |
| JPH0218722U (en) * | 1988-07-25 | 1990-02-07 | ||
| GB2301413B (en) * | 1995-05-31 | 1999-03-10 | Titus Int Plc | Joint forming devices |
| JP5309813B2 (en) * | 2008-09-05 | 2013-10-09 | アタカ大機株式会社 | Oxygen generating electrode |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1244650A (en) * | 1968-10-18 | 1971-09-02 | Ici Ltd | Electrodes for electrochemical processes |
| DE2113676C2 (en) * | 1971-03-20 | 1985-09-12 | Conradty GmbH & Co Metallelektroden KG, 8505 Röthenbach | Electrode for electrochemical processes |
| US3793164A (en) * | 1973-04-19 | 1974-02-19 | Diamond Shamrock Corp | High current density brine electrolysis |
| US3875043A (en) * | 1973-04-19 | 1975-04-01 | Electronor Corp | Electrodes with multicomponent coatings |
| US3882002A (en) * | 1974-08-02 | 1975-05-06 | Hooker Chemicals Plastics Corp | Anode for electrolytic processes |
| US4040939A (en) * | 1975-12-29 | 1977-08-09 | Diamond Shamrock Corporation | Lead dioxide electrode |
| US4028215A (en) * | 1975-12-29 | 1977-06-07 | Diamond Shamrock Corporation | Manganese dioxide electrode |
| DE2710802C3 (en) * | 1976-03-15 | 1980-04-03 | Diamond Shamrock Corp., Cleveland, Ohio (V.St.A.) | Process for the production of electrodes for electrolytic cells |
-
1977
- 1977-03-11 DE DE2710802A patent/DE2710802C3/en not_active Expired
- 1977-03-11 JP JP52026870A patent/JPS586786B2/en not_active Expired
- 1977-03-11 CA CA273,774A patent/CA1094891A/en not_active Expired
- 1977-03-14 NL NL7702742A patent/NL7702742A/en active Search and Examination
- 1977-03-14 BE BE175750A patent/BE852419A/en not_active IP Right Cessation
- 1977-03-14 GB GB10704/77A patent/GB1573173A/en not_active Expired
- 1977-03-14 ZA ZA00771521A patent/ZA771521B/en unknown
- 1977-03-14 MX MX168351A patent/MX145434A/en unknown
- 1977-03-14 DD DD7700197839A patent/DD131043A5/en unknown
- 1977-03-14 SE SE7702837A patent/SE427192B/en unknown
- 1977-03-14 BR BR7701546A patent/BR7701546A/en unknown
- 1977-03-14 PL PL1977196653A patent/PL110048B1/en unknown
- 1977-03-14 NO NO770908A patent/NO148751C/en unknown
- 1977-03-14 DK DK110877A patent/DK110877A/en not_active Application Discontinuation
- 1977-03-14 CH CH316177A patent/CH619492A5/en not_active IP Right Cessation
- 1977-03-14 GB GB23725/79A patent/GB1573297A/en not_active Expired
- 1977-03-14 FI FI770806A patent/FI65284C/en not_active IP Right Cessation
- 1977-03-14 IT IT48463/77A patent/IT1086682B/en active
- 1977-03-14 FR FR7707474A patent/FR2344644A1/en active Granted
- 1977-03-15 AU AU23212/77A patent/AU516392B2/en not_active Expired
- 1977-03-15 TR TR20097A patent/TR20097A/en unknown
-
1979
- 1979-12-27 JP JP54173857A patent/JPS5822551B2/en not_active Expired
-
1981
- 1981-09-19 JP JP56148663A patent/JPS5782477A/en active Pending
- 1981-09-19 JP JP56148662A patent/JPS5833313B2/en not_active Expired
-
1982
- 1982-09-16 JP JP57161537A patent/JPS5930791B2/en not_active Expired
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