JPS5932057B2 - mask cleaning equipment - Google Patents
mask cleaning equipmentInfo
- Publication number
- JPS5932057B2 JPS5932057B2 JP54108943A JP10894379A JPS5932057B2 JP S5932057 B2 JPS5932057 B2 JP S5932057B2 JP 54108943 A JP54108943 A JP 54108943A JP 10894379 A JP10894379 A JP 10894379A JP S5932057 B2 JPS5932057 B2 JP S5932057B2
- Authority
- JP
- Japan
- Prior art keywords
- pair
- line
- carrier
- photomask
- brushes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Volume Flow (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
【発明の詳細な説明】
本発明は、フォトマスクの洗浄に用いるに好適なマスク
洗浄装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a mask cleaning apparatus suitable for use in cleaning photomasks.
従来、フォトマスクの洗浄は、マスク1枚1枚について
手作業で行なつていたが、このような方5法では作業能
率が低く、しかも作業者によつて洗浄の程度に不均一を
生じる欠点があつた。Conventionally, photomask cleaning has been done manually for each mask, but these methods have the drawback of low work efficiency and the degree of cleaning being uneven depending on the operator. It was hot.
しかも、通常フォトマスクはガラス等の材料から出来て
いるために、作業中に手指等を誤まつて傷つけてしまう
事態も多々生じており、安全上問題が多かつoた。そこ
で、本発明は、フォトマスクを搬送ラインに沿つて搬送
し得る搬送手段を有し、前記搬送ラインに沿つて洗浄手
段及び乾燥手段を順次設置し、フォトマスクの洗浄及び
乾燥を自動的に行ない得5 るように構成し、もつて前
述の欠点を解消したマスク洗浄装置を提供することを目
的とするものである。Moreover, since photomasks are usually made of materials such as glass, there are many situations in which hands and fingers are accidentally touched and injured during operation, which poses many safety problems. Therefore, the present invention has a conveyance means capable of conveying a photomask along a conveyance line, and a cleaning means and a drying means are sequentially installed along the conveyance line to automatically clean and dry the photomask. It is an object of the present invention to provide a mask cleaning device which is configured to obtain the following advantages and which eliminates the above-mentioned drawbacks.
以下、図面に示す一実施例に基き、本発明を具体的に説
明する。Hereinafter, the present invention will be specifically explained based on an embodiment shown in the drawings.
マスク洗浄装置1は、第1図に示すように、直線状の搬
送ライン2を有しており、搬送ライン2は、第2図に示
すように、回転自在に支持されたプーリ−3,3′に巻
き掛けられた無端状のワイヤー5を有している。The mask cleaning apparatus 1 has a linear conveyance line 2, as shown in FIG. 1, and the conveyance line 2 includes rotatably supported pulleys 3, 3, as shown in FIG. ' has an endless wire 5 wound around the wire 5.
なお、プーリ−3は適宜な1駆動手段により回転駆動さ
れ、ワイヤー5を図中矢印A方向に移動させることがで
きる。ワイヤー5には一定の間隔を置いて板状のキヤリ
ア6が複数個、第3図に示すように、その設置角αが垂
直方向VVC対して約20度になるように立て形に設置
されており、キヤリア6vcは四角形の窓6aが貫通穿
設され、更に窓6aには集積回路製造用のフオトマスク
7を嵌入係合させることができる。一方、搬送ライン2
の左右両端には、第1図に示すように、内部に多数のフ
オトマスク7を収納することができるローター9及びア
ンローター10が設置されており、ローター9はロータ
ー9内のフオトマスク7を一枚ずつキヤリア6の窓6a
に嵌入係合させることができ、アンローター10はキヤ
リア6に係合しているフオトマスク7を一枚ずつ取り外
してアンローター10内部に収納することができる。ま
た、搬送ライン2にはライン2を両側から挟み込む形で
洗浄手段を構成する円盤状のスポンジブラシ11,1「
,12,12″が2対設置されており、各ブラシ11,
1「,12,125はモーター等の駆動手段を介して回
転,駆動される。ブラシ11,115の両側には4個の
噴射ノズル13,135,15,15′が対向した形で
設けられており、ノズル13,13゛ ,15,155
はその先端から洗剤を噴射することができる。ブラシ1
2,12″の右方には同様に2個のノズル16,165
が設置されており、ノズル16,16゛はその先端から
温水を噴射することができる。ノズル16,165の図
中右方には2対の渦巻きノズル17,175,19,1
92が設けられており、ノズル1r,1uからは高圧温
水を膜状に噴出することができ、ノズル19,19′か
らは空気又は窒素ガス等の高圧温風を同様に膜状に噴出
することができる。更に、ノズル19,195の図中右
方には静電気除去用イオナイザ一20,2『が設置され
ており、また搬送ライン2VCは、第2図及び第3図に
示すように、ブラシ11,1「 ,12,12′の設置
個所以外の個所に棒状のガイドバー21,215が平行
に設けられている。本発明は、以上のような構成を有す
るので、マスク洗浄装置1を用いて集積回路製造用のフ
オトマスク7を洗浄する場合には、第1図に示すように
、ローター9に洗浄すべきフオトマスクrを装填し、ロ
ーター9を1駆動すると共に、プーリ−3を回転させて
ワイヤー5を第2図における矢印A方向に移動させる。The pulley 3 is rotatably driven by a suitable driving means to move the wire 5 in the direction of arrow A in the figure. A plurality of plate-shaped carriers 6 are installed on the wire 5 at regular intervals, as shown in FIG. A rectangular window 6a is formed through the carrier 6vc, and a photomask 7 for manufacturing an integrated circuit can be fitted into the window 6a. On the other hand, conveyance line 2
As shown in FIG. 1, a rotor 9 and an unrotor 10, which can store a large number of photomasks 7 inside, are installed at both left and right ends of the rotor 9. Window 6a of carrier 6
The unrotor 10 can remove the photo masks 7 that are engaged with the carrier 6 one by one and store them inside the unrotor 10. Further, the conveyance line 2 is provided with disk-shaped sponge brushes 11, 1'' that sandwich the line 2 from both sides and constitute a cleaning means.
, 12, 12'' are installed, and each brush 11,
1'', 12, 125 are rotated and driven by a driving means such as a motor.Four injection nozzles 13, 135, 15, 15' are provided on both sides of the brushes 11, 115 in an opposed manner. Nozzle 13, 13゛, 15, 155
can spray detergent from its tip. brush 1
Similarly, there are two nozzles 16,165 on the right side of 2,12''.
are installed, and the nozzles 16, 16' can spray hot water from their tips. To the right of the nozzles 16, 165 in the figure are two pairs of spiral nozzles 17, 175, 19, 1.
92, high pressure hot water can be jetted out in a film form from the nozzles 1r and 1u, and high pressure hot air such as air or nitrogen gas can be jetted out in a film shape from the nozzles 19 and 19'. Can be done. Furthermore, ionizers 20 and 2'' for removing static electricity are installed on the right side of the nozzles 19 and 195 in the figure, and the conveyance line 2VC is equipped with brushes 11 and 1 as shown in FIGS. Rod-shaped guide bars 21, 215 are provided in parallel at locations other than the installation locations of , 12, 12'. When cleaning the photomask 7 for production, as shown in FIG. It is moved in the direction of arrow A in FIG.
ワイヤー5がA方向に移動するとキヤリア6もワイヤー
5と共FlCA方向に移動し、キヤリア6の窓6aには
ローター9がローター9内のマスク7を一枚ずつ嵌入係
合させてゆく。キヤリア6f1C係合したマスクrはキ
ヤリア6と共に第1図及び第2図における矢印A方向に
搬送される。この際キヤリア6は、第3図に示すように
、垂直方向Vより設置角αだけ傾いた形で移動するが、
マスク7ぱガイドバー21,21′により上下両端部を
支持されることから、マスクrがキヤリア6の窓6aか
ら下方に脱落することはない。キヤリア6が搬送ライン
2に沿つてA方向へ移動して回転するブラシ11,11
′間に入ると噴射ノズル13,13゛ ,15,15′
から洗剤が−斉に噴射され、第3図に示すように、マス
ク7は両面から同時にブラシ11,111IICより洗
浄される。この際、マスク7はブラシ11,1「により
両側から押圧される形で挟持されるので、ガイドレール
21,2「が無くてもキヤリア6から脱落することはな
い。キヤリア6がブラシ11,115間を通過して洗剤
による洗浄が終了すると、次はブラシ12,12′間に
入る。キヤリア6がブラシ12,125間に入ると、第
1図に示すように、ノズル16,16゛から温水が噴射
され、マスク7の両表面に付着した洗剤がブラシ12,
125により洗い落される。キヤリア6がブラシ12,
12′から更にA方向に搬送されると、渦巻きノズル1
7,172から高圧温水がマスク7の両表面に沿つて膜
状に噴射され、マスク1の表面は十分に清浄化される。
更にマスク7はノズル19,19fから噴射される高圧
膜状温風により乾燥され、次いでイオナイザ一20,2
0′間を通過することにより静電気を除去され、最後に
アンローター10によりキヤリア6から取り外し収納さ
れて洗浄作業は終了する。なお、フオトマスク1の搬送
ライン2中における搬送は、立てた形でも水平方向に寝
せた形でもどちらでもよいが、ブラシ11,115等に
よる洗浄効果を十分発揮させるためには、第3図矢印B
,B′で示すように、洗浄後の排水がマスク7の両表面
について独立した形で下方に落下する立て形の搬送形式
の方が望ましい。When the wire 5 moves in the A direction, the carrier 6 also moves together with the wire 5 in the FlCA direction, and the rotor 9 fits and engages the masks 7 in the rotor 9 one by one into the window 6a of the carrier 6. The mask r engaged with the carrier 6f1C is conveyed together with the carrier 6 in the direction of arrow A in FIGS. 1 and 2. At this time, the carrier 6 moves at an angle of installation angle α with respect to the vertical direction V, as shown in FIG.
Since the upper and lower ends of the mask 7 are supported by the guide bars 21 and 21', the mask r will not fall down from the window 6a of the carrier 6. The brushes 11, 11 rotate as the carrier 6 moves in the direction A along the conveyance line 2.
′, the injection nozzles 13, 13゛, 15, 15′
As shown in FIG. 3, the mask 7 is simultaneously cleaned from both sides by the brushes 11 and 111IIC. At this time, the mask 7 is held by the brushes 11, 1'' while being pressed from both sides, so it will not fall off the carrier 6 even if the guide rails 21, 2'' are not provided. When the carrier 6 passes between the brushes 12 and 125 and the washing with the detergent is completed, the carrier 6 enters between the brushes 12 and 125. As shown in FIG. is sprayed, and the detergent that adheres to both surfaces of the mask 7 is washed away by the brushes 12,
125. Carrier 6 is brush 12,
When further conveyed in the A direction from 12', the spiral nozzle 1
7, 172 spray high-pressure hot water in a film along both surfaces of the mask 7, and the surface of the mask 1 is sufficiently cleaned.
Furthermore, the mask 7 is dried by high-pressure film-like warm air jetted from nozzles 19 and 19f, and then dried by ionizers 20 and 2.
By passing between 0' and 0', static electricity is removed, and finally the cleaning work is completed by being removed from the carrier 6 by the unrotor 10 and stored. Note that the photomask 1 may be transported in the transport line 2 either in an upright position or in a horizontally lying position, but in order to fully demonstrate the cleaning effect of the brushes 11, 115, etc., it is necessary to B
, B', it is preferable to use a vertical conveyance system in which the drained water after washing falls down independently on both surfaces of the mask 7.
また、上述の実施例では、洗浄手段として円盤状のスポ
ンジブラシ11,115,12,12′を用いた場合に
ついて述べたが、洗浄手段は円盤状のブラシに限らず例
えば円筒状のブラシや間歇高圧水流等適宜なものを用い
てもよいことは勿論である。Further, in the above embodiment, a case was described in which disc-shaped sponge brushes 11, 115, 12, and 12' were used as the cleaning means, but the cleaning means is not limited to disc-shaped brushes, and for example, a cylindrical brush or an intermittent brush can be used. Of course, an appropriate method such as a high-pressure water stream may be used.
更に第3図でぱキヤリア6が複数個設けられた例を示し
たが、アンローター10にマスクを格納する際にキヤリ
ア6の逃げを必要とするが、キヤリア6を1個のみの構
造として、この逃げ機構を簡単化することもできる。Furthermore, although FIG. 3 shows an example in which a plurality of carriers 6 are provided, the carriers 6 need to escape when storing the mask in the unrotor 10, but it is possible to have a structure with only one carrier 6. This escape mechanism can also be simplified.
以上説明したように、本発明によれば、フオトマスクT
を搬送ライン2VC沿つて移動させるだけで、マスク7
の洗浄から乾燥までを自動的に行なうことができるので
、従来の手作業による洗浄作業のように作業中に手指を
傷つけることもなく安全であり、作業能率を大幅に向上
させることが可能になるばかりか、洗浄程度にムラのな
い均一なフオトマスクrを得ることができる。As explained above, according to the present invention, the photomask T
By simply moving the mask along the conveyance line 2VC, the mask 7
The entire process from cleaning to drying can be carried out automatically, so it is safe and does not injure hands or fingers unlike traditional manual cleaning operations, and it is possible to significantly improve work efficiency. Moreover, it is possible to obtain a uniform photomask r with no unevenness in the degree of cleaning.
第1図は本発明によるマスク洗浄装置の一実施例を示す
平面図、第2図は搬送ラインを示す側面図、第3図は搬
送ラインのキヤリア部分の断面図である。
1・・・・・・マスク洗浄装置、2・・・・・・搬送ラ
イン、6・・・・・・搬送手段(キヤリア)、7・・・
・・・フオトマスク、11,115,12,12″・・
・・・・洗浄手段(ブラシ)、17,175・・・・・
・洗浄手段(渦巻きノズルXl9,l95・・・・・・
乾乾手段(渦巻きノズル)。FIG. 1 is a plan view showing an embodiment of a mask cleaning apparatus according to the present invention, FIG. 2 is a side view showing a transport line, and FIG. 3 is a sectional view of a carrier portion of the transport line. 1... Mask cleaning device, 2... Conveyance line, 6... Conveyance means (carrier), 7...
...Photomask, 11,115,12,12''...
...Cleaning means (brush), 17,175...
・Cleaning means (vortex nozzle Xl9, l95...
Drying means (vortex nozzle).
Claims (1)
スク嵌入係合用窓を設けたフォトマスクの厚さとほぼ等
しい厚さの板状キャリアを有する搬送ラインと、キャリ
アの窓に嵌入係合されたフォトマスクを押圧挾持する形
で設置された回転駆動される一対の円板状ブラシからな
る洗浄手段と、該搬送ラインに沿い、少なくとも該ブラ
シ設置部を除き、設置された該キャリアの窓に嵌入係合
されたフォトマスクを支持するガイドバー部を有するこ
とを特徴とするマスク洗浄装置。 2 フォトマスクを1枚づつキャリアに係合させるロー
ダーと、無端状ワイヤに垂直方向より設置角α傾けて取
付けられたフォトマスク嵌入係合用窓を設けた板状キャ
リアを有する搬送ラインと、該搬送ラインを両側から挾
み込む形で設置された、回転駆動される1対のブラシか
ら成る第1の洗浄手段と、該ラインに対向配電され第1
の洗浄手段を構成する該1対のブラシに洗剤を噴射する
少なくとも1対の噴射ノズルと、該搬送ラインを両側か
ら挾み込む形で設置された、回転駆動される1対のブラ
シから成る第2の洗浄手段と、該ラインに対向配置され
第2の洗浄手段を構成する該1対のブラシに水を噴射す
る1対の噴射ノズルと、該ラインに対向配置される高圧
水を膜状に噴出する1対のノズルと、該ラインに対向配
置される高圧ガスを膜状に噴出する1対のノズルと、該
ラインに対向配置され静電気を除去するイオナイザーと
、該キャリアに嵌入係合したフォトマスクを1枚づつ取
り外し収納するアンローダとを、順次設置しフォトマス
クの洗浄及び乾燥を自動的に行ない得るように構成した
ことを特徴とするマスク洗浄装置。[Scope of Claims] 1. A transport line having a plate-shaped carrier having a thickness approximately equal to the thickness of a photomask, which is provided with a window for inserting and engaging a photomask installed at an angle of installation angle α from the vertical direction; A cleaning means consisting of a pair of rotationally driven disk-shaped brushes installed to press and hold the fitted photomask; A mask cleaning device comprising a guide bar portion that supports a photomask fitted into a window of a carrier. 2. A transport line having a loader that engages photomasks one by one with a carrier, a plate-shaped carrier provided with a window for inserting and engaging a photomask attached to an endless wire at an installation angle α from the vertical direction, and the transport line. A first cleaning means consisting of a pair of rotatably driven brushes installed to sandwich the line from both sides;
at least one pair of spray nozzles for spraying detergent onto the pair of brushes constituting the cleaning means; and a pair of rotatably driven brushes installed to sandwich the conveyance line from both sides. a second cleaning means, a pair of injection nozzles that inject water to the pair of brushes arranged opposite to the line and forming the second cleaning means, and a pair of injection nozzles arranged opposite to the line to spray high-pressure water into a film. A pair of nozzles that eject high-pressure gas in the form of a film, which are arranged opposite to each other in the line, an ionizer which removes static electricity and which are arranged opposite to each other, and a photo frame that is fitted and engaged with the carrier. A mask cleaning device characterized in that an unloader for removing and storing masks one by one is sequentially installed to automatically clean and dry photomasks.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54108943A JPS5932057B2 (en) | 1979-08-27 | 1979-08-27 | mask cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP54108943A JPS5932057B2 (en) | 1979-08-27 | 1979-08-27 | mask cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5632727A JPS5632727A (en) | 1981-04-02 |
| JPS5932057B2 true JPS5932057B2 (en) | 1984-08-06 |
Family
ID=14497573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54108943A Expired JPS5932057B2 (en) | 1979-08-27 | 1979-08-27 | mask cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5932057B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57207254A (en) * | 1981-06-15 | 1982-12-18 | Toshiba Corp | Mask storage system |
| JPS58112703U (en) * | 1982-01-28 | 1983-08-02 | 三菱電機株式会社 | hydraulic operating device |
| JPS6159837A (en) * | 1984-08-31 | 1986-03-27 | Toshiba Ceramics Co Ltd | Continuous washing device of wafer |
| JPS6260225A (en) * | 1985-09-10 | 1987-03-16 | Toshiba Ceramics Co Ltd | Cleaning silicon wafer |
| JPH0744015Y2 (en) * | 1987-04-03 | 1995-10-09 | 大日本スクリーン製造株式会社 | Substrate drainer |
| JPH02201926A (en) * | 1989-01-31 | 1990-08-10 | Fujitsu Ltd | Holder for and method of wet cleaning |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51135185A (en) * | 1975-05-20 | 1976-11-24 | Fujitsu Ltd | Washing device |
-
1979
- 1979-08-27 JP JP54108943A patent/JPS5932057B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5632727A (en) | 1981-04-02 |
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