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JPS5932428B2 - Silicon nitride jig for pulling single crystal silicon - Google Patents
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JPS5932428B2 - Silicon nitride jig for pulling single crystal silicon - Google Patents

Silicon nitride jig for pulling single crystal silicon

Info

Publication number
JPS5932428B2
JPS5932428B2 JP57065102A JP6510282A JPS5932428B2 JP S5932428 B2 JPS5932428 B2 JP S5932428B2 JP 57065102 A JP57065102 A JP 57065102A JP 6510282 A JP6510282 A JP 6510282A JP S5932428 B2 JPS5932428 B2 JP S5932428B2
Authority
JP
Japan
Prior art keywords
silicon
silicon nitride
jig
single crystal
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57065102A
Other languages
Japanese (ja)
Other versions
JPS58181793A (en
Inventor
秀逸 松尾
秀夫 長島
正晴 渡辺
俊郎 宇佐美
久志 村岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd, Toshiba Ceramics Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57065102A priority Critical patent/JPS5932428B2/en
Publication of JPS58181793A publication Critical patent/JPS58181793A/en
Publication of JPS5932428B2 publication Critical patent/JPS5932428B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Products (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【発明の詳細な説明】 本発明は円柱状もしくは板状の単結晶シリコンを引上げ
る際に用いられる窒化珪素製の治具に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a silicon nitride jig used for pulling columnar or plate-shaped single crystal silicon.

半導体ウェハを切出すために用いられる円柱状単結晶シ
リコンの製造方法としてはチョクラルスキー法(CZ法
)が知られている。
The Czochralski method (CZ method) is known as a method for manufacturing columnar single crystal silicon used to cut out semiconductor wafers.

この方法はシリコン原料をルツボ内で溶融し、この溶融
シリコンに種結晶を浸し、この種結晶を引上げることに
より円柱状単結晶シリコンを製造するものである。
In this method, a silicon raw material is melted in a crucible, a seed crystal is immersed in the molten silicon, and the seed crystal is pulled up to produce cylindrical single crystal silicon.

上述したCZ法においては、従来、ルツボとして石英ガ
ラス製のものが用いられている。
In the CZ method described above, a crucible made of quartz glass has conventionally been used.

しかしながら、石英ガラス製のルツボは溶融シリコンと
反応するため、反応生成物が酸素不純物としてシリコン
結晶インゴットに取り込まれる。
However, since the quartz glass crucible reacts with molten silicon, reaction products are incorporated into the silicon crystal ingot as oxygen impurities.

シリコン結晶中の酸素不純物は結晶欠陥の原因となるた
め、製造される集積回路の特性を悪化させるという欠点
がある。
Since oxygen impurities in silicon crystal cause crystal defects, they have the disadvantage of deteriorating the characteristics of manufactured integrated circuits.

また、板状単結晶シリコンの製造方法としてはEFG法
(edge defined film feed g
rowth法)が知られている。
In addition, as a method for manufacturing plate-shaped single crystal silicon, the EFG method (edge defined film feed g) is used.
rowth method) is known.

この方法はルツボ内でシリコン原料を溶融し、この溶融
シリコンに中空枠状のダイの一端側を浸し、ダイの中空
部を毛管現象により上昇してきた溶融シリコンに板状種
結晶を浸し、この種結晶を引上げることにより板状単結
晶シリコンを製造するものである。
This method involves melting a silicon raw material in a crucible, immersing one end of a hollow frame-shaped die in the molten silicon, and immersing a plate-shaped seed crystal in the molten silicon that has risen through the hollow part of the die due to capillary action. This method produces plate-shaped single crystal silicon by pulling the crystal.

上述したEFG法においては、従来、ルツボとして石英
ガラス製のもの、ダイとしてカーボン製のものが夫々用
いられている。
In the EFG method described above, a crucible made of quartz glass and a die made of carbon have conventionally been used.

しかしながら、石英ガラス製のルツボはCZ法の場合と
同様な欠点を有するうえ、カーボン製のダイについては
、カーボンが溶融シリコンと反応して炭化珪素を生じ易
いため、こうした炭化珪素がダイの中空部周辺lこ形成
されるとシリコン結晶の引上げが困難となるたけでなく
、シリコン結晶が多結晶化するという欠点がある。
However, quartz glass crucibles have the same drawbacks as the CZ method, and carbon dies tend to react with molten silicon to form silicon carbide, so silicon carbide is trapped in the hollow part of the die. If a thin layer is formed around the periphery, it not only becomes difficult to pull up the silicon crystal, but also causes the disadvantage that the silicon crystal becomes polycrystalline.

そこで、本発明者らはルツボ、グイ等の治具として溶融
シリコンと反応しにくい窒化珪素製のものを用いること
を考え、先に特願昭56−70474において単結晶シ
リコン引上げ用窒化珪素製治具について開示した。
Therefore, the present inventors thought of using silicon nitride jigs, such as crucibles and gouers, which are less likely to react with molten silicon, and previously proposed a silicon nitride jig for pulling single crystal silicon in Japanese Patent Application No. 56-70474. Disclosed about the ingredients.

このような窒化珪素製治具を用いれば、多くの場合、酸
素濃度が低く、良質な単結晶シリコンを引上げることが
できる。
If such a silicon nitride jig is used, in many cases, high-quality single crystal silicon with a low oxygen concentration can be pulled up.

しかし、窒化珪素製治具を用いた場合でも治具の性状に
よってはシリコン結晶が単結晶とならず多結晶化するこ
とが判明した。
However, it has been found that even when a silicon nitride jig is used, the silicon crystal does not become a single crystal but becomes polycrystalline depending on the properties of the jig.

本発明者らはシリコン結晶が多結晶化する原因について
種々検討した結果、以下のことを究明した。
The present inventors investigated various causes of polycrystallization of silicon crystals, and as a result, discovered the following.

すなわち、窒化珪素製治具の鉄含有量が多い場合、この
治具を用いてシリコン結晶を引上げると、溶融シリコン
に治具の窒化珪素が溶解するとともに鉄が溶解し、結晶
シリコンインゴットに取り込まれてシリコン結晶を多結
晶化する。
In other words, when a silicon nitride jig has a high iron content, when this jig is used to pull up a silicon crystal, the silicon nitride in the jig dissolves into the molten silicon, and the iron also dissolves and is incorporated into the crystalline silicon ingot. The silicon crystal is then polycrystalized.

したがって、窒化珪素製治具の鉄含有量を減少させれば
よいと考えられるが、鉄含有量をかなり低くしてもシリ
コン結晶が多結晶化する場合がある。
Therefore, it may be possible to reduce the iron content of the silicon nitride jig, but even if the iron content is considerably reduced, silicon crystals may become polycrystalline.

これは、治具の窒化珪素が溶融シリコンに溶解するのを
助長するような不純物があり、窒化珪素製治具の鉄含有
量が少なくてもこれらの不純物が多いと、治具の窒化珪
素の溶融シリコンへの溶解量、つまり治具中に含まれる
鉄の溶解量が多くなるため鉄含有量が多いのと同様な結
晶を生じると考えられる。
This is because there are impurities that promote the dissolution of silicon nitride in the jig into molten silicon, and even if the silicon nitride jig has a low iron content, if these impurities are large, the silicon nitride in the jig will dissolve It is thought that because the amount of iron dissolved in the molten silicon, that is, the amount of iron contained in the jig increases, crystals similar to those with a high iron content are produced.

そこで、本発明者らは更に研究を重ねた結果、上述した
治具の窒化珪素が溶融シリコンに溶解するのを助長する
作用を有する不純物が硼素あるいはアルミニウムである
ことを究明し、鉄の含有量のみならずこれらの不純物の
含有量を限定することにより、単結晶シリコンを引上げ
得る窒化珪素製治具を見出した。
Therefore, as a result of further research, the present inventors discovered that the impurities that promote the dissolution of silicon nitride in the jig mentioned above into molten silicon are boron or aluminum. Furthermore, by limiting the content of these impurities, we have discovered a silicon nitride jig that can pull up single crystal silicon.

すなわち、本発明の単結晶シリコン引上げ用窒化珪素製
治具は、硼素含有量が3 ppm以下、アルミニウム含
有量が59I)m以下、鉄含有量が10p p m 、
IJ下である結晶質窒化珪素からなることを特徴とする
ものである。
That is, the silicon nitride jig for pulling single crystal silicon of the present invention has a boron content of 3 ppm or less, an aluminum content of 59I)m or less, an iron content of 10 ppm,
It is characterized by being made of crystalline silicon nitride which is under IJ.

硼素アルミニウム及び鉄の含有量を上記数値以下tこ限
定したのは以下の理由lこよる。
The reason why the contents of boron, aluminum and iron are limited to below the above values is as follows.

すなわち、鉄含有量が10ppmを超えると、シリコン
結晶を引上げる際にインゴットに含まれる鉄が多くなり
、シリコン結晶が多結晶化する。
That is, when the iron content exceeds 10 ppm, more iron is contained in the ingot when pulling the silicon crystal, and the silicon crystal becomes polycrystalline.

また、硼素含有量が3ppmを超えるか、あるいはアル
ミニウム含有量が!5ppmを超えると、治具の窒化珪
素の溶融シリコンへの溶解量が増加するため、鉄含有量
が10ppm以下であってもシリコン結晶を引上ける際
にインゴットに含まれる鉄が多くなり、シリコン結晶が
多結晶化する。
Also, if the boron content exceeds 3 ppm or the aluminum content! If it exceeds 5 ppm, the amount of silicon nitride in the jig that dissolves into molten silicon will increase, so even if the iron content is 10 ppm or less, more iron will be included in the ingot when pulling the silicon crystal, and silicon Crystals become polycrystalline.

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

まず、純化処理を施した5種類のルツボ形状のシリコン
基材をCVD反応炉内に設置し、CVD反応炉外周に配
置されたヒータによりCVD反応炉内を所定温度まで上
昇させた、次に、S+C14ガス及びNH3ガスをH2
ガスをキャリアガスとしてCVD反応炉内に供給した。
First, five types of crucible-shaped silicon base materials subjected to purification treatment were placed in a CVD reactor, and the inside of the CVD reactor was raised to a predetermined temperature using a heater placed around the outer periphery of the CVD reactor.Next, S+C14 gas and NH3 gas to H2
The gas was supplied into the CVD reactor as a carrier gas.

CれらのガスはCVD反応炉内で反応し、各シリコン基
材の内表面に夫々結晶質窒化珪素が被着した(シリコン
基材の外表面はコーティングしているので窒化珪素は被
着しない。
These gases reacted in the CVD reactor, and crystalline silicon nitride was deposited on the inner surface of each silicon substrate (the outer surface of the silicon substrate was coated, so no silicon nitride was deposited). .

)所定時間経過後、ガスの供給を停止した。) After a predetermined period of time, the gas supply was stopped.

つづいて、HClガス雰囲気に曝し、各シリコン基材を
除去して下記に示す如く硼素、アルミニウム及び鉄の含
有量の異なる5種の窒化珪素製ルツボを製造した。
Subsequently, each silicon base material was removed by exposure to an HCl gas atmosphere to produce five types of silicon nitride crucibles having different contents of boron, aluminum, and iron as shown below.

得られた窒化珪素製ルツボを用いてCZ法により引上げ
られたシリコン結晶の結晶状態を下記表に併記する。
The crystalline state of the silicon crystal pulled by the CZ method using the obtained silicon nitride crucible is also shown in the table below.

なお、上記表中比較例1〜5は不純物含有量の多いシリ
コン基材を用いた以外、上記実施例と同様な方法で得ら
れた窒化珪素製ルツボである。
In addition, Comparative Examples 1 to 5 in the above table are silicon nitride crucibles obtained in the same manner as in the above Example except that a silicon base material with a high impurity content was used.

上記表から明らかなように、実施例1〜5の窒化珪素製
ルツボはいずれも硼素含有量が3 ppm以下、アルミ
ニウム含有量が5 pI)m以下、鉄含有量が10pp
m以下であり、これらのツノツボを用いてCZ法により
引上げられたシリコン結晶はいずれも単結晶であった。
As is clear from the above table, the silicon nitride crucibles of Examples 1 to 5 all have a boron content of 3 ppm or less, an aluminum content of 5 pI)m or less, and an iron content of 10 ppm.
m or less, and all silicon crystals pulled by the CZ method using these acupuncture points were single crystals.

これに対して比較例1の窒化珪素ルツボは鉄含有量が1
0ppmを超えているため、シリコン結晶が多結晶化し
た。
On the other hand, the silicon nitride crucible of Comparative Example 1 has an iron content of 1
Since it exceeds 0 ppm, the silicon crystal becomes polycrystalline.

また、比較例2及び3は硼素含有量が3 ppmを超え
ているため、鉄含有量がL Oppm以下であったにも
かかわらず、シリコン結晶が多結晶化した。
Further, in Comparative Examples 2 and 3, since the boron content exceeded 3 ppm, the silicon crystal became polycrystalline even though the iron content was less than L Oppm.

同様に、比較例4及び5はアルミニウム含有量が5pp
mヲ超えているため、鉄含有量が10ppmであったに
もか\わらず、シリコン結晶が多結晶化した。
Similarly, in Comparative Examples 4 and 5, the aluminum content was 5pp.
Since the iron content exceeds m, the silicon crystal becomes polycrystalline even though the iron content is 10 ppm.

なお、上記実施例1〜5の窒化珪素製ルツボを用いて製
造された単結晶シリコンは鉄含有量が低いので少数キャ
リアのライフタイムを大幅に向上することができた。
In addition, since the single crystal silicon manufactured using the silicon nitride crucibles of Examples 1 to 5 has a low iron content, the lifetime of minority carriers could be significantly improved.

また、ルツボから単結晶シリコンに混入する硼素及びア
ルミニウムの量が少ないので単結晶シリコンの抵抗値を
良好に制御することができた。
Furthermore, since the amounts of boron and aluminum mixed into the single crystal silicon from the crucible were small, the resistance value of the single crystal silicon could be well controlled.

また、硼素含有量を3 ppm以下、アルミニウム含有
量を5 ppm以下、鉄含有量をlOppm以■に規制
し、これらを指標として基材、原料等の精製を行えばよ
いので、著しいコスト高となる超高純度化処理を行わな
くとも上記効果を得ることができた。
In addition, boron content is regulated to 3 ppm or less, aluminum content is 5 ppm or less, and iron content is regulated to 10 ppm or less, and base materials, raw materials, etc. can be refined using these as indicators, so there is no significant cost increase. The above effects could be obtained without performing any ultra-high purification treatment.

以上詳述した如く本発明によれば、単結晶状態で少数キ
ャリアのライフタイムが長く、抵抗値が良好に制御され
たシリコン結晶を引上げ得る単結晶シリコン引上げ用窒
化珪素製治具を提供できるものである。
As detailed above, according to the present invention, it is possible to provide a silicon nitride jig for pulling single-crystal silicon, which can pull a silicon crystal in a single-crystal state with a long minority carrier lifetime and a well-controlled resistance value. It is.

Claims (1)

【特許請求の範囲】[Claims] 1 溶融シリコンから円柱状もしくは板状の単結晶シリ
コンを引上げる際に用いられる治具において、硼素含有
量が3 ppm以下、アルミニウム含有量が5 ppm
以下、鉄含有量が10ppm以下の結晶質窒化珪素から
なることを特徴とする単結晶シリコン引上げ用窒化珪素
製治具。
1 In the jig used when pulling columnar or plate-shaped single crystal silicon from molten silicon, the boron content is 3 ppm or less and the aluminum content is 5 ppm.
Hereinafter, a silicon nitride jig for pulling single crystal silicon is characterized in that it is made of crystalline silicon nitride with an iron content of 10 ppm or less.
JP57065102A 1982-04-19 1982-04-19 Silicon nitride jig for pulling single crystal silicon Expired JPS5932428B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57065102A JPS5932428B2 (en) 1982-04-19 1982-04-19 Silicon nitride jig for pulling single crystal silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57065102A JPS5932428B2 (en) 1982-04-19 1982-04-19 Silicon nitride jig for pulling single crystal silicon

Publications (2)

Publication Number Publication Date
JPS58181793A JPS58181793A (en) 1983-10-24
JPS5932428B2 true JPS5932428B2 (en) 1984-08-08

Family

ID=13277201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57065102A Expired JPS5932428B2 (en) 1982-04-19 1982-04-19 Silicon nitride jig for pulling single crystal silicon

Country Status (1)

Country Link
JP (1) JPS5932428B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO317080B1 (en) * 2002-08-15 2004-08-02 Crusin As Silicon nitride crucibles resistant to silicon melts and processes for making such crucibles

Also Published As

Publication number Publication date
JPS58181793A (en) 1983-10-24

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