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JPS5933073B2 - Laser removal equipment - Google Patents
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JPS5933073B2 - Laser removal equipment - Google Patents

Laser removal equipment

Info

Publication number
JPS5933073B2
JPS5933073B2 JP52034575A JP3457577A JPS5933073B2 JP S5933073 B2 JPS5933073 B2 JP S5933073B2 JP 52034575 A JP52034575 A JP 52034575A JP 3457577 A JP3457577 A JP 3457577A JP S5933073 B2 JPS5933073 B2 JP S5933073B2
Authority
JP
Japan
Prior art keywords
workpiece
laser
transparent plate
movable body
wiper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52034575A
Other languages
Japanese (ja)
Other versions
JPS53121296A (en
Inventor
建興 宮内
幹雄 本郷
正男 三谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP52034575A priority Critical patent/JPS5933073B2/en
Publication of JPS53121296A publication Critical patent/JPS53121296A/en
Publication of JPS5933073B2 publication Critical patent/JPS5933073B2/en
Expired legal-status Critical Current

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  • Laser Beam Processing (AREA)

Description

【発明の詳細な説明】 本発明はレーザ光を物質上に集光加熱して物質を除去す
るレーザ除去装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a laser removal device that removes a substance by condensing and heating a laser beam onto the substance.

レーザ除去装置においては、レンズヘの除去物の付着、
除去部の盛上りの発生などの問題点があり、応用の分野
によつてはこれらが重大な障害となることがある。第1
図は従来のレーザ加工機の例である。レーザ装置1より
出たレーザ光2は集光レンズ3によつて被加工物5の加
工部6に集光照射され加工が行われる。その際溶融飛散
蒸発などが起り、飛散蒸発物4はレンズ3の表面に付着
物7として残るものもある。このためレンズのレーザ光
透過率が低下し、以後の加工に悪影響を与える。特に真
空中の加工の場合&基若が行われるため大きな問題とな
る。これを解決する従来技術として第2図に示す技術が
知られている。集光レンズ3と被加工物5との間に真空
を保つための容器の窓11と、可動な透明板9と、1個
または複数個冴Lを有する固定またば可動な平板10を
設けている。飛散蒸発物4は一部ば平板10に7で示す
ように付着し、孔を通つた一部は透明板9に8で示すよ
うに付着する。加工に影響が出るほど付着する前に透明
板9を移動させることにより、連続的に作業を行うこと
ができる。第3図I用口をもつた平板12を運動させ、
開口がレーザ光軸に一致した時レーザ光が出るようにし
たものである。
In the laser removal device, the removal material adheres to the lens,
There are problems such as the occurrence of bulges in the removed portion, which may become a serious hindrance depending on the field of application. 1st
The figure shows an example of a conventional laser processing machine. A laser beam 2 emitted from a laser device 1 is condensed and irradiated onto a processing portion 6 of a workpiece 5 by a condenser lens 3 to perform processing. At this time, melting, scattering, and evaporation occur, and some of the scattered evaporates 4 remain as deposits 7 on the surface of the lens 3. As a result, the laser light transmittance of the lens decreases, which adversely affects subsequent processing. This is especially a big problem when processing in a vacuum because the process is performed in a vacuum. As a conventional technique for solving this problem, a technique shown in FIG. 2 is known. A container window 11 for maintaining a vacuum between the condenser lens 3 and the workpiece 5, a movable transparent plate 9, and a fixed or movable flat plate 10 having one or more plates L are provided. There is. A portion of the scattered evaporated matter 4 adheres to the flat plate 10 as shown at 7, and a portion that passed through the holes adheres to the transparent plate 9 as shown at 8. By moving the transparent plate 9 before it adheres to the extent that it affects processing, work can be carried out continuously. FIG. 3 Moving the flat plate 12 with the I opening,
Laser light is emitted when the aperture matches the laser optical axis.

レーザ光2は集光レンズ3で被加工物5の上に集光照射
され加工が行われるが、レーザの照射に開口位置が同期
するように平板12が回転しており、これに付けられた
ヒレ13によつて空気の流れが生じ、加工時の飛散蒸発
物4が流され、レンズの方へは上つてこない。第4図は
従来の加工法による加工を行つた場合の→lである。レ
ーザ光2は集光レンズ3によつて被加工物5の加工物6
(−集光照射され、除去が行われるが、このとき飛び出
した溶融物が周辺部に不都合な盛上り14として残る。
この対策としては第5図に示すダブルレンズ方式などが
知られている。レーザ光2の中心部15はレンズAl7
とレンズBl8で被加工物5の加工部6に集光照射され
、その周辺に盛り上り14が生じる。周辺部のレーザ光
16はレンズ17だけで集光され、レンズAの焦点19
に集まるように集光するため、盛り上り14に照射され
、盛上り14は除去される。以上のように、除去物の付
着、盛上りの発生は個々に対策が考えられているが、こ
れらの両問題点を同時に解決できるものは知られておら
ず、これらを組合せるど複雑な装置になることは容易に
想像できる。
The laser beam 2 is condensed and irradiated onto the workpiece 5 by a condenser lens 3, and processing is performed.A flat plate 12 is rotated so that the aperture position is synchronized with the laser irradiation, and a An air flow is generated by the fins 13, and the scattered evaporated matter 4 during processing is swept away and does not rise toward the lens. FIG. 4 shows →l when processing is performed using the conventional processing method. The laser beam 2 is directed to the workpiece 6 of the workpiece 5 by the condensing lens 3.
(- Condensed light is irradiated and removal is performed, but the molten material that pops out at this time remains as an undesirable bulge 14 in the peripheral area.
As a countermeasure against this problem, a double lens system shown in FIG. 5 is known. The center part 15 of the laser beam 2 is a lens Al7
The processed portion 6 of the workpiece 5 is irradiated with condensed light by the lens Bl8, and a bulge 14 is generated around it. The peripheral laser beam 16 is focused only by the lens 17, and the focal point 19 of the lens A
In order to condense the light so that it converges, the bulge 14 is irradiated and the bulge 14 is removed. As mentioned above, individual countermeasures have been considered for the occurrence of adhesion and build-up of removed materials, but there is no known solution that can solve both of these problems at the same time, and complex equipment that combines these two problems is not known. It is easy to imagine what will happen.

本発明の目的は、上記従来技術の欠点をなくし、飛散蒸
発物の付着がなく、同時に不都合な加工部周辺の盛上り
を生じないようなレーザ除去装置を提供するにあ?即ち
本発明は1つまたは複数の開口とこれに隣接し、同数の
必要な厚さをもつた透明板を備えた可動の平板を被加工
物と集光レンズの間におき、開口と透明板をレーザ照射
時に順次光軸内に入れ、加工部の同一ケ所を両方の状態
で加工することにより、透明板を通して加工する場合は
焦点のピットが合つた状態で加工が行われ、その時生じ
る飛散蒸発物は透明板で遮られ、、開口を通して加工す
る場合は透明板がない分だけピット外れとなり、このた
め加工レーザ密度が低いために飛散蒸発物はわずかで、
すでに生じている不都合な盛り上りを溶融安定化し、平
板の移動によつて、透明板1枚への飛散蒸発物の付着は
少なく、連続作業を行うことが出来るようにしたもので
ある。
SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the prior art described above, and to provide a laser removal device that does not cause adhesion of scattered evaporated matter and at the same time does not cause undesirable swelling around the processed area. That is, in the present invention, a movable flat plate having one or more apertures and adjacent transparent plates having the same number of necessary thicknesses is placed between the workpiece and the condenser lens, and the apertures and the transparent plate By sequentially bringing the laser into the optical axis during laser irradiation and processing the same part of the processing part in both conditions, when processing through a transparent plate, processing is performed with the focused pit aligned, and the scattering and evaporation that occurs at that time is avoided. The object is blocked by a transparent plate, and when processing through an aperture, the pit is missed due to the absence of the transparent plate.As a result, the processing laser density is low, so there is only a small amount of evaporated matter.
By melting and stabilizing the unfavorable bulges that have already occurred, by moving the flat plate, there is less adhesion of scattered evaporated matter to a single transparent plate, and continuous work can be performed.

また本発明は上記レーザ除去装置において、透明板の被
加工物側の表面に油状の膜をつけ、この透明板表面に付
着した飛散物を払拭うワイパーを設置し、透明板の交換
を不要にしたレ一明余去装置である。以下本発明を第6
図〜第8図に示す一実施例にもとづいて具体的に説明す
る。第6図でレーザ光2は集光レンズ3を通り真空容器
の窓11可動板20に取付けられた透明板21を通つて
被加工物5の加工部6に焦点を結び除去が行われる。除
去の際生じる飛散蒸発物4は透明板21の表面に付着す
る。このため窓11には飛散蒸発物4は付着しない。こ
の加工の際、第7図aに示したような加工部の盛上り1
4が生じる。この除去加工が終ると次に、可動平板20
を動かし、薄い透明板22をレーザ光軸に一致させる。
こうすることにより、レーザ光1は被加工物5の手前で
焦点23を結び被加工物5の盛上り部14(第7図a)
に低いパワー密度で集光照射されるため、加工はほとん
ど行われず、盛り上り14を溶融し、基材に安定に溶着
する(第7図Bl4)。このとき生ずるわずかな飛散蒸
発物は薄い透明板23に付着する。どちらの場合も、光
路中以外の透明板に付着しないようにじやま板24をお
くと著しい効果がある。以上のようにすることにより平
板20f1C交互に取付けられた透明板21と薄い透明
板22を順次光軸に一致させるように、平板20を円板
(第8図)にしておいてこれを回転させ、飛散蒸発物が
急速に光透過率を低下させることなく、連続して真空中
で除去加を行うことができる。
In addition, the present invention provides the above-mentioned laser removal device by applying an oily film to the surface of the transparent plate on the workpiece side and installing a wiper to wipe off the scattered particles attached to the surface of the transparent plate, thereby eliminating the need to replace the transparent plate. This is a device that left the rest of the world. Hereinafter, the present invention will be described in the sixth section.
A detailed description will be given based on an embodiment shown in FIGS. In FIG. 6, the laser beam 2 passes through a condensing lens 3, passes through a transparent plate 21 attached to a movable plate 20 of a window 11 of a vacuum container, and focuses on a processed portion 6 of a workpiece 5, thereby performing removal. The scattered evaporated matter 4 generated during removal adheres to the surface of the transparent plate 21. Therefore, the scattered evaporated matter 4 does not adhere to the window 11. During this machining, the bulge 1 of the machined part as shown in Figure 7a
4 occurs. After this removal process is completed, the movable flat plate 20
to align the thin transparent plate 22 with the laser optical axis.
By doing this, the laser beam 1 focuses 23 in front of the workpiece 5, and the bulge 14 of the workpiece 5 (FIG. 7a)
Since the laser beam is irradiated with focused light at a low power density, almost no processing is performed, and the bulge 14 is melted and stably welded to the base material (FIG. 7 B14). A small amount of scattered evaporation material generated at this time adheres to the thin transparent plate 23. In either case, it is extremely effective to place a cutting board 24 to prevent the film from adhering to transparent plates other than those in the optical path. By doing the above, the flat plate 20 is made into a disk (Fig. 8) and rotated so that the transparent plates 21 and thin transparent plates 22 attached alternately to the flat plate 20f1C are aligned with the optical axis one after another. Therefore, the removal and addition can be carried out continuously in a vacuum without causing the scattered evaporated matter to rapidly reduce the light transmittance.

薄い透明板に付着する量が十分少ない場合は薄い透明板
22の代りに開口のみとしてよい。真空蒸着は、蒸着膜
をつけられる表面が清浄でないと膜がうまく着かないこ
とはよく知られている。これを逆に利用することにより
、窓材の真空側をわざと汚しておくと、窓に付着した飛
散蒸発物は容易に取ることができる。第9図は本発明の
他の実施例の一つである。
If the amount attached to the thin transparent plate is sufficiently small, only the opening may be used instead of the thin transparent plate 22. It is well known that vacuum deposition does not adhere well unless the surface to which it is applied is clean. By using this in reverse, if the vacuum side of the window material is intentionally dirty, the scattered evaporated matter that has adhered to the window can be easily removed. FIG. 9 shows one of the other embodiments of the present invention.

レーザ光2は集光レンズ3を通つて真空容器25の窓1
1を経て被加工物5の加工部6に集光照射され除去が行
われる。そして飛散蒸発物が窓11に付着する。窓11
の近くに設けられたワイパー26は真空オイルのように
蒸発性の低い油で湿らされており、加工前に窓11をこ
のワイパー26で拭つてお,く。但し27はワイパーの
運動[TJを示す。、従つて飛散蒸発物は油膜を介して
窓面に付着することになる。付着物が加工に影響を与え
るだけの厚さになる前にこのワイパー26で窓11を拭
うと付当物は容易に取り除くことができる。第10図(
l埋9図の実施例を第6図の実施例に応用した一つの実
施例である。平板20に取付けられた透明板21と薄い
透明板21の付着物のつく面を、予め油などで汚してお
くための油塗布用ワイパー26aと加工後付着面を払拭
するための払拭用ワイパー26bを備えておいてやる。
これを設けることにより、透明板21,22は毎回ワイ
パーで付着物を除去されるため、交換の必要がなくなり
、作業性は著しく向上した。実用上は、ワイパー26a
,26bは油などの塗布と、付着物の除去を同時に行う
ようにして一つにしても問題はない。第11図は第10
図の実施例において、平板20の回転をワイパーの払拭
にも利用した別の実施例である。
The laser beam 2 passes through the condenser lens 3 and enters the window 1 of the vacuum container 25.
1, the processed portion 6 of the workpiece 5 is irradiated with focused light and removed. Then, the scattered evaporated matter adheres to the window 11. window 11
A wiper 26 installed near the window 11 is moistened with low-evaporation oil such as vacuum oil, and the window 11 is wiped with this wiper 26 before processing. However, 27 indicates the wiper movement [TJ. Therefore, the scattered evaporated matter will adhere to the window surface via the oil film. By wiping the window 11 with the wiper 26 before the deposit becomes thick enough to affect processing, the deposit can be easily removed. Figure 10 (
This is an example in which the embodiment shown in Fig. 9 is applied to the embodiment shown in Fig. 6. An oil application wiper 26a is used to stain the surfaces of the transparent plate 21 attached to the flat plate 20 and the thin transparent plate 21 with oil etc. in advance, and a wiping wiper 26b is used to wipe off the adhered surfaces after processing. I'll prepare it for you.
By providing this, deposits on the transparent plates 21 and 22 are removed by a wiper every time, so there is no need to replace them, and work efficiency is significantly improved. In practice, the wiper 26a
, 26b may be used to apply oil or the like and remove deposits at the same time without any problem. Figure 11 is the 10th
The illustrated embodiment is another embodiment in which the rotation of the flat plate 20 is also used for wiping with a wiper.

レーザ光2は集光レンズ3と真空容器25の窓11を通
つて回転板20に取付けられた1つまたは複数の透明板
21のうちの1つを経て被加工物5に集光照射され、除
去加工が行われる。次に駆動部からの回転力によつて回
転板28は回転する。そして薄い透明板22がレーザ光
軸に一致したとき回転を停止し、焦点外れの状態でレー
ザ光が照射され、盛上りが溶融安定化される。以上が次
々と繰返されて回転板20は回転していくが、一周のあ
る所にワイパー26cが設けられていて、すべての透明
板は必ず一周に一回はこのワイパー26cで払拭される
。円板20が回転する際回転トルクが傘歯車29,30
を介して軸31に伝えられ、回転式ワイパー26cが回
転する。ワイパー26cには蒸発性の低い油がしみ込ま
されていて、払拭の際除去による付着物を取ると同時に
油膜を透明板に塗る。払拭面での円板20の周速と、ワ
イパー26cの周速は異なるように設定してあり、互い
にころがりではなく、周速差分だけ摺動を起すようにし
て払拭の効果を保つている。また、払拭の際の圧力を最
適に保つため、一定圧力に調整するバネ32と圧力調整
ネジ33でワイパー26cの軸の―端の軸受けをおさえ
るようにしている。このように除去、払拭を繰返すこと
により、部品交換をほとんど行うことなく作業を続ける
ことができる。透明板21,22の位相は駆動部28で
検出し、これをレーザ制御部へ送り、光軸に透明板が入
つたことを確認してレーザを発射するようになつている
。被加工物5が回転している場合は、被加工物回転位相
信号を回転板制御部34に入れてやり、ここから被力旺
物と透明板が同時にレーザ光軸に一致するように、駆動
位相信号を1駆動部へ送つてやることにより、被加工物
の回転に同期して連続的に自動的に加工を行うことがで
きる。
The laser beam 2 passes through the condensing lens 3 and the window 11 of the vacuum container 25, passes through one of the one or more transparent plates 21 attached to the rotary plate 20, and is condensed and irradiated onto the workpiece 5. Removal processing is performed. Next, the rotating plate 28 is rotated by the rotational force from the drive section. Then, when the thin transparent plate 22 coincides with the laser optical axis, the rotation is stopped, and the laser beam is irradiated in an out-of-focus state, thereby melting and stabilizing the bulge. The above steps are repeated one after another to rotate the rotary plate 20, but a wiper 26c is provided at a certain point in one rotation, and all the transparent plates are always wiped by this wiper 26c once in one rotation. When the disc 20 rotates, the rotational torque is generated by the bevel gears 29, 30.
is transmitted to the shaft 31 via the rotary wiper 26c, thereby rotating the rotary wiper 26c. The wiper 26c is impregnated with oil with low evaporability, and when wiping the wiper 26c, it removes deposits and at the same time coats the transparent plate with an oil film. The circumferential speed of the disk 20 on the wiping surface and the circumferential speed of the wiper 26c are set to be different, and the wiping effect is maintained by causing sliding by the difference in circumferential speed rather than rolling relative to each other. Further, in order to keep the pressure at the optimum level during wiping, a spring 32 that adjusts the pressure to a constant level and a pressure adjustment screw 33 are used to hold down the bearing at the end of the shaft of the wiper 26c. By repeating removal and wiping in this way, work can be continued without having to replace many parts. The phases of the transparent plates 21 and 22 are detected by a drive unit 28 and sent to a laser control unit, and the laser is emitted after confirming that the transparent plates are placed on the optical axis. When the workpiece 5 is rotating, a workpiece rotation phase signal is input to the rotary plate control unit 34, which drives the object and the transparent plate so that they coincide with the laser optical axis at the same time. By sending a phase signal to one drive unit, it is possible to continuously and automatically perform processing in synchronization with the rotation of the workpiece.

以上説明したように本発明によれば真空中で、飛散蒸発
物の窓への付着を防ぎ、加工盛り上りを安定化しながら
連続して除去加工を行うことができるようになり、真空
中での加工性が大『Dに向上するとともに、窓の付着物
を真空を破つて拭つたり、窓を交換したりする時間が不
要になり、作業性が著しくよくすることができる効果を
有する。
As explained above, according to the present invention, it is possible to prevent scattered evaporated matter from adhering to the window in a vacuum, and to perform continuous removal processing while stabilizing the processing buildup. Workability is improved to a large degree, and there is no need to spend time wiping off deposits on the window by breaking the vacuum or replacing the window, which has the effect of significantly improving workability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の一般的レーザ加工機を示した図、第2図
&.@真空中で被加工物にレーザ加工を施す従来のレー
ザ加工機を示した図、第3図は開口をもつた平板を回転
させて被加工物にレーザ加工を施す従来のレーザ加工機
を示した図、第4図は従来のレーザ加工方法で被加工物
に加工する状態を示す図、第5図は従来のダブルレンズ
方式によつて周囲の盛り上りも除去安定化させる状態を
示した図、第6図は本発明によるレーザ除去装置の一実
施例を示した図、第7図aぱ第6図に示す透明板で除去
加工した状態を示す図、第7図bは第6図に示す薄い透
明板によつて盛上り部を除去安定化する状態を示した図
、第8図aは第6図に示す可動平板を回転円板状に形成
した状態を示す図、第8図bは第8図Af)A−A矢視
断面図、第9図aは本発明に係り、透明板にワイパーを
設置したレーザ除去装置を示す正面図、第9図bは第9
図aの平面図、第10図は第9図に示すワイパーを第6
図に示すレーザ除去装置に適用した場合の装置を示した
図、第11図A,bは第10図に示すレーザ除去装置を
回転体で形成された被加工物に適用した場合の装置を示
した図である。 符号の説明 2・・・レーザ光、3・・・集光レンズ、
5・・・被加工物、6・・・加工部、14・・・盛上り
部、20・・・可動平板、21・・・透明板、22・・
・薄い透明板、24・・・じやま板、25・・・真空容
器、26・・・ワイパ一、28・・・駆動部、34・・
・回転板制御部。
Figure 1 shows a conventional general laser processing machine, Figure 2 &. Figure 3 shows a conventional laser processing machine that performs laser processing on a workpiece in a vacuum. Figure 3 shows a conventional laser processing machine that performs laser processing on a workpiece by rotating a flat plate with an opening. Figure 4 shows how a workpiece is processed using the conventional laser processing method, and Figure 5 shows how the surrounding bulges are also removed and stabilized using the conventional double lens method. , FIG. 6 is a diagram showing an embodiment of the laser removal device according to the present invention, FIG. 7 a is a diagram showing a state in which the transparent plate shown in FIG. 6 is removed, and FIG. FIG. 8a is a diagram showing a state in which the raised portion is removed and stabilized using a thin transparent plate, FIG. 8a is a diagram showing a state in which the movable flat plate shown in FIG. FIG. 8A is a sectional view taken along the line A-A in FIG. 8, FIG.
The plan view of Figure a, and Figure 10 show the wiper shown in Figure 9.
Figures 11A and 11b show the apparatus when the laser removal apparatus shown in Figure 10 is applied to a workpiece formed of a rotating body. This is a diagram. Explanation of symbols 2... Laser light, 3... Condenser lens,
5... Workpiece, 6... Processing part, 14... Embossed part, 20... Movable flat plate, 21... Transparent plate, 22...
・Thin transparent plate, 24... Control board, 25... Vacuum container, 26... Wiper, 28... Drive unit, 34...
・Rotary plate control section.

Claims (1)

【特許請求の範囲】 1 レーザ光を被加工物上に集光して除去加工を行う装
置において、集光レンズと被加工物との間にレーザ光軸
に対して垂直なる方向に可動する可動体を設け、該可動
体に透明板と開口、または厚さの異なる2種類の透明板
を交互に配設したことを特徴とするレーザ除去装置。 2 レーザ光を被加工物上に集光して除去加工を行う装
置において、集光レンズと被加工物との間に光軸に対し
て垂直なる方向に可動する可動体を設け、該可動体に透
明板と開口または厚さの異なる2種類の透明板を交互に
配置し、該透明板の被加工物側の表面に付着した飛散物
を払拭うワイパーを設置したことを特徴とするレーザ除
去装置。 3 レーザ光を被加工物上に集光して除去加工を行う装
置において、集光レンズを被加工物との間に光軸と垂直
なる方向に回転可動な回転可動体を設け、該回転可動体
に透明板と開口または厚さの異なる2種類の透明板を交
互に配置し、該透明板の被加工物側の表面に付着した飛
散物を払拭うワイパーを設置し、被加工物と透明板とが
レーザ光軸に一致するように回転可動体または被加工物
の少くともいずれか一方を移動させてレーザ制御部へト
リガー信号を出力する駆動系を設けたことを特徴とする
レーザ除去装置。
[Claims] 1. In an apparatus that performs removal processing by focusing a laser beam onto a workpiece, a movable member that moves in a direction perpendicular to the laser optical axis is provided between the condenser lens and the workpiece. 1. A laser removal device characterized in that a movable body is provided with a transparent plate and an opening, or two types of transparent plates having different thicknesses are alternately disposed on the movable body. 2. In an apparatus that performs removal processing by focusing a laser beam onto a workpiece, a movable body that is movable in a direction perpendicular to the optical axis is provided between the condenser lens and the workpiece, and the movable body A laser removal method characterized in that two types of transparent plates with different openings or thicknesses are arranged alternately, and a wiper is installed to wipe away scattered objects attached to the surface of the transparent plate on the workpiece side. Device. 3. In an apparatus that performs removal processing by concentrating a laser beam onto a workpiece, a rotary movable body that is rotatable in a direction perpendicular to the optical axis is provided between the condenser lens and the workpiece, and the rotatable movable body is provided between the condenser lens and the workpiece. A transparent plate and two types of transparent plates with different openings or thicknesses are arranged alternately on the body, and a wiper is installed to wipe off the flying debris attached to the surface of the transparent plate on the workpiece side. A laser removal device comprising a drive system that moves at least one of the rotary movable body or the workpiece so that the plate coincides with the laser optical axis and outputs a trigger signal to a laser control unit. .
JP52034575A 1977-03-30 1977-03-30 Laser removal equipment Expired JPS5933073B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52034575A JPS5933073B2 (en) 1977-03-30 1977-03-30 Laser removal equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52034575A JPS5933073B2 (en) 1977-03-30 1977-03-30 Laser removal equipment

Publications (2)

Publication Number Publication Date
JPS53121296A JPS53121296A (en) 1978-10-23
JPS5933073B2 true JPS5933073B2 (en) 1984-08-13

Family

ID=12418112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52034575A Expired JPS5933073B2 (en) 1977-03-30 1977-03-30 Laser removal equipment

Country Status (1)

Country Link
JP (1) JPS5933073B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210154767A1 (en) * 2018-08-24 2021-05-27 Panasonic Intellectual Property Management Co., Ltd. Laser light emission head and laser processing apparatus using same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5992192A (en) * 1982-11-17 1984-05-28 Taiyo Sanso Kk Laser working device
JP2675332B2 (en) * 1988-05-21 1997-11-12 株式会社日立製作所 Excimer laser device
MY193805A (en) * 2018-11-13 2022-10-27 Honda Motor Co Ltd Laser machining apparatus
JP2023066215A (en) * 2021-10-28 2023-05-15 住友重機械工業株式会社 Laser transmission member cleaning device and laser processing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210154767A1 (en) * 2018-08-24 2021-05-27 Panasonic Intellectual Property Management Co., Ltd. Laser light emission head and laser processing apparatus using same

Also Published As

Publication number Publication date
JPS53121296A (en) 1978-10-23

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