Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS5933551B2 - Single crystal manufacturing method - Google Patents
[go: Go Back, main page]

JPS5933551B2 - Single crystal manufacturing method - Google Patents

Single crystal manufacturing method

Info

Publication number
JPS5933551B2
JPS5933551B2 JP6342081A JP6342081A JPS5933551B2 JP S5933551 B2 JPS5933551 B2 JP S5933551B2 JP 6342081 A JP6342081 A JP 6342081A JP 6342081 A JP6342081 A JP 6342081A JP S5933551 B2 JPS5933551 B2 JP S5933551B2
Authority
JP
Japan
Prior art keywords
crystal
crystals
crucible
melt
pulling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6342081A
Other languages
Japanese (ja)
Other versions
JPS57179096A (en
Inventor
正徳 古後
彰 磯野
正太郎 大槻
賢吾 小野
隆 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tohoku Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tohoku Metal Industries Ltd filed Critical Tohoku Metal Industries Ltd
Priority to JP6342081A priority Critical patent/JPS5933551B2/en
Publication of JPS57179096A publication Critical patent/JPS57179096A/en
Publication of JPS5933551B2 publication Critical patent/JPS5933551B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)

Description

【発明の詳細な説明】 本発明は、回転引上法による単結晶の引上げに関し、と
くに長い結晶を作ること、および連続して結晶を製造す
ることに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the pulling of single crystals by rotary pulling, and in particular to the production of long crystals and the production of crystals in succession.

回転引上法とは、るつぼの中に溶融した結晶原料に種結
晶を浸し、所定の回転を与えつつ、所定の速度で種結晶
を引上げることによって、その先端に成長した結晶をさ
らに大きく成長させる単結晶の育成方法である。
The rotational pulling method is a method in which a seed crystal is immersed in molten crystal raw material in a crucible, and the seed crystal is pulled up at a predetermined speed while applying a predetermined rotation, thereby growing the crystal that has grown at the tip even larger. This is a method for growing single crystals.

この方法によって得られる結晶は、シリコンをはじめ、
金属結晶、金属酸化物結晶など多種にわたっている。
The crystals obtained by this method include silicon,
There are many types including metal crystals and metal oxide crystals.

この方法は、良質の結晶を比較的短時間に育成できる点
ですぐれており、工業的にも重要視されている。
This method is excellent in that it can grow high-quality crystals in a relatively short time, and is regarded as important industrially.

前述したように、回転引上法はるつぼを使うため、大型
結晶を製造するためには、大型のるつぼを必要とするこ
とは当然であるが、長い結晶を引上げる場合には、端的
にはるつぼの容積によって制約を受けることになる。
As mentioned above, since the rotary pulling method uses a crucible, it is natural that a large crucible is required to produce large crystals, but when pulling long crystals, it is simply It will be limited by the volume of the crucible.

最近、シリコン単結晶の引上げにおいては、1回目の結
晶引上げを終えた後、るつぼの温度を下げることなく、
シリコン多結晶棒(原料)をるつぼに充填・溶解させ、
先に引上げを終えた結晶の終端部に続けて結晶を引上げ
、これを繰返して長い単結晶を得る方法が行なわれるよ
うになってきた。
Recently, when pulling silicon single crystals, after the first crystal pulling, without lowering the temperature of the crucible,
Fill a crucible with silicon polycrystalline rods (raw material) and melt them.
A method has come to be used in which a long single crystal is obtained by repeatedly pulling a crystal from the terminal end of the crystal that has already been pulled.

しかしながら、とくに酸化物結晶などの熱衝撃に弱い結
晶材料にこの方法を適用することは、多くの困難を伴な
う。
However, applying this method to crystalline materials that are particularly susceptible to thermal shock, such as oxide crystals, is accompanied by many difficulties.

また、結晶育成が進行するとともに、るつぼ中の融液の
液面が低下し、それにつれて、結晶成長の条件が変化し
、結晶の種類や引上条件によっては、単結晶の引上続行
が困難になったり、結晶が屈曲して成長する場合もあり
、長い結晶を得るための障害は少な(ない。
In addition, as crystal growth progresses, the liquid level of the melt in the crucible decreases, and the conditions for crystal growth change accordingly, making it difficult to continue pulling a single crystal depending on the type of crystal and pulling conditions. In some cases, the crystals may grow bent, and there are few (or no) obstacles to obtaining long crystals.

いったん単結晶の引上げを終えると、これを融液から離
し、徐々に降温した後に結晶を回収するこれまでの回転
引上法では、全工程の中に占める降温に要する時間的割
合が少なくなく、これが結晶コストの高騰の一原因にも
なっている。
In the conventional rotary pulling method, in which once the single crystal has been pulled, it is separated from the melt and the crystal is recovered after the temperature is gradually lowered, the time required for cooling down takes up a considerable proportion of the entire process. This is also one of the reasons for the rise in crystal costs.

本発明は、前述のような従来の回転引上法がもつ欠点を
解消し、つぎの目的の実現をねらってなされたものであ
る。
The present invention has been made to eliminate the drawbacks of the conventional rotary pulling method as described above, and to achieve the following objects.

(1)長尺結晶を得るためには、るつぼの容積に依存せ
ず、かつ融液の液面の位置が常に一定の範囲内にあるこ
とが望ましく、そのために結晶引上げを行ないつつ、同
時にるつぼに原料を供給することを可能にすること。
(1) In order to obtain long crystals, it is desirable that the position of the melt surface is always within a certain range, regardless of the volume of the crucible. To make it possible to supply raw materials to

(2)るつぼの降温の機会をできるだけ少なくし、効率
的に単結晶をつくるために、単結晶体を順次連結して引
上げることを可能にすること。
(2) To make it possible to sequentially connect and pull single crystals in order to minimize the chance of temperature drop in the crucible and to efficiently produce single crystals.

(3)順次降温した結晶を回収すること、および引上装
置系内に残存する結晶を支持し、回転と引上げとを引続
き行なうこと。
(3) Collecting the crystals whose temperature has gradually decreased, and supporting the crystals remaining in the pulling device system to continue rotating and pulling the crystals.

以下、本発明の実施例について図面を参照して説明する
Embodiments of the present invention will be described below with reference to the drawings.

第1図は、前記(1)の目的を達成するための、単結晶
の引上げを行ないつつ原料を供給する方法を示す。
FIG. 1 shows a method for supplying raw materials while pulling a single crystal, in order to achieve the above object (1).

単結晶1は引上軸4に固定された種結晶の先端に成長す
る。
A single crystal 1 grows at the tip of a seed crystal fixed to a pulling shaft 4.

その重量変化は荷重検出器17′によって検知される。The weight change is detected by the load detector 17'.

この検出器7′の出力電気信号を使って、結晶が予定の
形状になるように電気炉5のヒータ6の温度を制御する
Using the output electric signal of this detector 7', the temperature of the heater 6 of the electric furnace 5 is controlled so that the crystal has a predetermined shape.

他方、も5 一つの荷重検出器■7は、るつぼ3の中の
融液2の量の変化を検出する。
On the other hand, one load detector 7 detects a change in the amount of melt 2 in the crucible 3.

該検出器7の出力信号をもとに、融液2の量が常に一定
範囲内にあるようにホッパ8から供給する原料9の量を
、シャンク8aの開閉によって制御する。
Based on the output signal of the detector 7, the amount of raw material 9 supplied from the hopper 8 is controlled by opening and closing the shank 8a so that the amount of the melt 2 is always within a certain range.

この結果、単結晶1の引上げが進行しても、融液2の液
面位置はほぼ一定しており、結晶体の長さがるつぼの容
積によって制約されたり、結晶1が屈曲して成長するな
どの問題は解消され、安定した条件のもとで長尺結晶を
引上げることが可能となった。
As a result, even as the pulling of the single crystal 1 progresses, the liquid level position of the melt 2 remains almost constant, and the length of the crystal is restricted by the volume of the crucible, or the crystal 1 grows bent. These problems have been resolved, and it has become possible to pull long crystals under stable conditions.

なお、第1図に示した原料9の形態は粉末、顆粒状、塊
状を予測しているが、棒状でもよ(、また液状であって
も差支えない。
The shape of the raw material 9 shown in FIG. 1 is expected to be powder, granule, or block, but it may also be rod-shaped (or liquid).

第3図ないし第6図は、単結晶を連続して引上げ、単結
晶体を連結させ、降温した単結晶体を順次回収する、本
発明の実施例を示した図であり、前記2)及び(3)の
目的を達成する。
FIGS. 3 to 6 are diagrams showing an embodiment of the present invention in which a single crystal is continuously pulled, the single crystals are connected, and the single crystals whose temperature has been lowered are sequentially recovered. Achieve the purpose of (3).

これらの図に第2図をも加えて説明すると、結晶1は、
引上軸4に固定された種結晶の先端に成長している。
Adding Figure 2 to these figures and explaining, crystal 1 is as follows:
It grows on the tip of a seed crystal fixed to the pulling shaft 4.

必要な長さだけ成長が終えると、従来は第2図のように
融液2から離されたが、本発明においては、結晶1aを
融液かも離すことな(、融液温度を制御して(または/
および引上速度を大きくして)、結晶1a終端部の形状
を細くし、この部分をそのまま2番目の結晶体1bのた
めの種結晶とする。
Conventionally, when the required length has been grown, the crystal 1a is separated from the melt 2 as shown in FIG. (or/
(and the pulling speed is increased), the shape of the end portion of the crystal 1a is made thin, and this portion is used as it is as a seed crystal for the second crystal body 1b.

この繰返しを行なうことによって、結晶体が連続して引
上げられる(第3図)。
By repeating this process, the crystal is continuously pulled up (FIG. 3).

これら連結した結晶体の温度は、るつぼから遠ざかるに
つれて降下する。
The temperature of these connected crystals decreases as they move away from the crucible.

室温またはこの近くまで降温した結晶体1aを、引上軸
4と同期してかつ中心軸が一致して回転し、かつ同一速
度で移動する機構に組込まれた支持装置14aによって
、その側面を支持する(第4図)。
The crystal body 1a, whose temperature has cooled to room temperature or close to it, is supported on its side by a support device 14a incorporated in a mechanism that rotates in synchronization with the pulling shaft 4, with its central axis coincident, and moves at the same speed. (Figure 4).

この支持装置14aは、結晶体1bと、それ以降の連結
した結晶体1cの重量をも担い得る強度が必要である。
This support device 14a needs to be strong enough to support the weight of the crystal body 1b and the subsequent crystal body 1c connected thereto.

つぎに結晶体1aと結晶体1bとの間の細径部を、レー
ザ・ビーム16によって切断し、結晶体1aを引上軸4
からはずして回収する。
Next, the narrow diameter part between the crystal body 1a and the crystal body 1b is cut by the laser beam 16, and the crystal body 1a is pulled up by the pulling shaft 4.
Remove and collect.

結晶の引上げがさらに所定の距離だけ進んだ後、第5図
に示すように、結晶体1cの側面を前述と同様の支持装
置14bによって支持すれば、前述と同様の操作によっ
て、結晶体1bを回収できる。
After the crystal has been pulled a predetermined distance further, as shown in FIG. 5, if the side surface of the crystal 1c is supported by the same supporting device 14b as described above, the crystal 1b is lifted by the same operation as described above. It can be recovered.

つぎに、第6図に示すように、支持装置14bが支持し
ていた結晶体1cを、先刻まで結晶体1bを担っていた
支持装置14aに持替えて回転引上げを続け、先に切断
したと同じ状況(第6図)になったところで、前回と同
様に支持装置14bで下の結晶体1dを支持する。
Next, as shown in FIG. 6, the crystal body 1c supported by the support device 14b is transferred to the support device 14a, which had been supporting the crystal body 1b up until now, and continues to be rotated and pulled up. When the same situation (FIG. 6) is reached, the lower crystal body 1d is supported by the support device 14b as in the previous case.

以下前述の操作を繰返すことによって、結晶体を順次回
収できる。
By repeating the above-described operations, the crystals can be recovered one by one.

ここで、結晶体間の細径部の切断は、レーザ・ビームや
赤外線ビームによる局部加熱による方法が簡単であるが
、電流を通じて赤熱させたワイヤを使う方法、ダイヤモ
ンド・カッタなどの回転砥石による機械的方法などがあ
り、その選択は結晶材料の性質、結晶引」−装置の状況
、結晶引上げ系の雰囲気などを考慮してなされる。
Here, cutting the narrow diameter part between the crystals is easy by using local heating with a laser beam or infrared beam, but it is also possible to cut by using a wire heated to red by passing an electric current, or by using a machine using a rotating grindstone such as a diamond cutter. There are various methods, and the selection is made taking into account the properties of the crystal material, the conditions of the crystal pulling apparatus, the atmosphere of the crystal pulling system, etc.

前述の説明で明らかなように、1個の結晶体を引上げる
ことに昇温・降温を縮退していた従来の結晶育成法から
脱却した本発明は多(の利点をもっている。
As is clear from the above description, the present invention, which departs from the conventional crystal growth method in which heating and cooling are reduced to pulling a single crystal, has many advantages.

本発明は原料を供給しつつ結晶引上げを可能とし、長年
の長尺結晶引上げの夢を実現した。
The present invention makes it possible to pull crystals while supplying raw materials, realizing the long-held dream of pulling long crystals.

原料の供給は、単に長尺結晶の原料を補給するというの
みならず、るつぼ中の融液の量を常にほぼ一定に保つこ
とにより、結晶育成条件が変化するのをくい止め、結果
的に長尺化を容易にしている。
The supply of raw materials is not only to simply replenish raw materials for long crystals, but also to keep the amount of melt in the crucible almost constant at all times to prevent changes in crystal growth conditions and, as a result, to produce long crystals. It makes it easy to

さらに、1個の結晶引上げの都度、るつぼ降温過程をと
ることを余儀なくされていた従来の方法に対し、本発明
によれば、結晶体を連結して引」二げることにより、結
晶体はるつぼから遠ざかにつれて自然に冷却されたり、
るつぼから離れた位置で強制的に冷却できるため、装置
の稼動においてと(にるつぼ降温過程を必要としない。
Furthermore, in contrast to the conventional method in which a crucible temperature cooling process was required each time one crystal was pulled, the present invention enables the crystal to be pulled by connecting the crystals together. It naturally cools down as it moves away from the crucible,
Since forced cooling can be performed at a location away from the crucible, there is no need for a process to lower the temperature of the crucible during operation of the device.

このことは単結晶の製造コストを著しく低減させ、その
経済的効果は太きい。
This significantly reduces the manufacturing cost of single crystals, and has a significant economic effect.

そして、結晶体が所定の長さになったら細径部を形成し
て、切断して回収するのを容易にするとともに、次の結
晶体を連結するための種結晶とすることができる。
Then, when the crystal has reached a predetermined length, a narrow diameter portion is formed to facilitate cutting and recovery, and can be used as a seed crystal for connecting the next crystal.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明による、るつぼの中に原料を供給しつ
つ単結晶を引上げている様子を示す断面図である。 第2図は従来の公知の結晶引上げ法を示す断面図、第3
図ないし第6図は、本発明による結晶引上げ法を示した
断面図で、結晶体を細径部で連結させて連続して引上げ
、自然に冷却した結晶体を支持し、順次回収する方法を
あられしている。 第1図ないし第6図において、各番号に対応する名称は
、つぎのとおり、1は単結晶体(1a。 ・・・・・・・・・1dを含む)、2は融液、3はるつ
ぼ、4は引上軸、5は電気炉、6はヒータ、T、γ′は
荷重検出装置■、■、8はホッパ、8aはシャッタ、9
は原料、10は補助ヒータ、11は定量供給装置、14
a、14bは支持装置、15はレーザ光源、16はレー
ザ・ビーム。
FIG. 1 is a cross-sectional view showing how a single crystal is pulled while supplying raw materials into a crucible according to the present invention. Figure 2 is a cross-sectional view showing the conventional known crystal pulling method;
Figures 6 through 6 are cross-sectional views showing the crystal pulling method according to the present invention, in which the crystals are connected at their narrow diameter parts, pulled up continuously, the naturally cooled crystals are supported, and the crystals are sequentially recovered. It's raining. In Figures 1 to 6, the names corresponding to each number are as follows: 1 is single crystal (1a, including 1d), 2 is melt, and 3 is Crucible, 4 is a pulling shaft, 5 is an electric furnace, 6 is a heater, T, γ' is a load detection device ■, ■, 8 is a hopper, 8a is a shutter, 9
10 is a raw material, 10 is an auxiliary heater, 11 is a constant supply device, 14
a and 14b are support devices, 15 is a laser light source, and 16 is a laser beam.

Claims (1)

【特許請求の範囲】[Claims] 1 回転引上法による単結晶の製造方法において原料を
連続的あるいは断続的にるつぼに供給して該るつぼに収
容された前記原料の溶融した融液の液面を実質上一定範
囲内に保つ第1の過程と、第1の結晶体の所定部分を育
成した後、該第1の結晶体を前記融液から引離すことな
く結晶の育成を続け、該第1の結晶体の後端部の直径を
細く制御し、この細径部に連結して第2の結晶体を引続
き育成させることを、順次繰返す第2の過程と、連続し
て結晶育成を行ないつつ融液から遠ざかった冷却された
結晶体を新たに支持し、新たに支持した該結晶体以降に
連結している他の結晶体をも担いつつ、所定の回転を与
え、所定の速度で引上げを続ける第3の過程と、結晶成
長を続けながら、前記新たに支持した結晶体よりも上の
、前記細径部を切断し、該切断箇所よりも上に位置する
結晶体を回収する第4の過程とを含むことを特徴とする
単結晶の製造方法。
1. In a method for producing a single crystal by a rotational pulling method, a step in which a raw material is continuously or intermittently supplied to a crucible to maintain the liquid level of the melt of the raw material contained in the crucible within a substantially constant range. After the process of step 1 and growing a predetermined portion of the first crystal body, the crystal growth is continued without separating the first crystal body from the melt, and the rear end of the first crystal body is grown. A second process in which the diameter is controlled to be thin and a second crystal body is successively grown by connecting to this narrow diameter part, and a cooled crystal body which is kept away from the melt while continuously growing the crystal. A third process of newly supporting the crystal, applying a predetermined rotation to the crystal while supporting other crystals connected to the newly supported crystal, and continuing to pull the crystal at a predetermined speed; A fourth step of cutting the thin diameter portion above the newly supported crystal while continuing to grow, and recovering the crystal located above the cut point. A method for producing single crystals.
JP6342081A 1981-04-28 1981-04-28 Single crystal manufacturing method Expired JPS5933551B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6342081A JPS5933551B2 (en) 1981-04-28 1981-04-28 Single crystal manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6342081A JPS5933551B2 (en) 1981-04-28 1981-04-28 Single crystal manufacturing method

Publications (2)

Publication Number Publication Date
JPS57179096A JPS57179096A (en) 1982-11-04
JPS5933551B2 true JPS5933551B2 (en) 1984-08-16

Family

ID=13228773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6342081A Expired JPS5933551B2 (en) 1981-04-28 1981-04-28 Single crystal manufacturing method

Country Status (1)

Country Link
JP (1) JPS5933551B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002029883A (en) * 2000-07-14 2002-01-29 Komatsu Electronic Metals Co Ltd Crystal taking-out device and method of taking-out crystal

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62288191A (en) * 1986-06-06 1987-12-15 Kyushu Denshi Kinzoku Kk Method for growing single crystal and device therefor
US5173270A (en) * 1987-04-09 1992-12-22 Mitsubishi Materials Corporation Monocrystal rod pulled from a melt
JPS63252991A (en) * 1987-04-09 1988-10-20 Mitsubishi Metal Corp Cz single crystal having holding part for preventing falling down

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002029883A (en) * 2000-07-14 2002-01-29 Komatsu Electronic Metals Co Ltd Crystal taking-out device and method of taking-out crystal

Also Published As

Publication number Publication date
JPS57179096A (en) 1982-11-04

Similar Documents

Publication Publication Date Title
JP2973917B2 (en) Single crystal pulling method
JPS5933551B2 (en) Single crystal manufacturing method
US5733368A (en) Method of manufacturing silicon monocrystal using continuous czochralski method
JPH09249486A (en) Single crystal pulling method
JPH04104988A (en) Growth of single crystal
JP2009013040A (en) Foreign matter removal method and crystal growth method
EP1259664A2 (en) Controlled neck growth process for single crystal silicon
JPH09235186A (en) Seed crystal for pulling single crystal and method for pulling single crystal using the seed crystal
US3765843A (en) Growth of tubular crystalline bodies
JP2990661B2 (en) Single crystal growth method
JP2622274B2 (en) Single crystal growth method
JPH09309791A (en) Method for producing semiconducting single crystal
JP2783624B2 (en) Single crystal manufacturing method
JP2542434B2 (en) Compound semiconductor crystal manufacturing method and manufacturing apparatus
JPH0699217B2 (en) Single crystal growth equipment
JP3669133B2 (en) Single crystal diameter control method
JPH0578115A (en) Method for producing granular silicon polycrystal
JP2810975B2 (en) Single crystal manufacturing method
JPS5938189B2 (en) Single crystal manufacturing method
JP2501797B2 (en) Method for growing semiconductor single crystal
JPH09227280A (en) Single crystal growth method
JPH09227268A (en) Method for producing solid solution single crystal
JPH09249495A (en) Seed crystal for pulling single crystal and method for pulling single crystal using the seed crystal
JPH0753294A (en) Method for growing silicon single crystal
JPH04270191A (en) Method for growing oxide single crystal