Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS5933560B2 - Bi↓4Ge↓3O↓1↓2 single crystal manufacturing method - Google Patents
[go: Go Back, main page]

JPS5933560B2 - Bi↓4Ge↓3O↓1↓2 single crystal manufacturing method - Google Patents

Bi↓4Ge↓3O↓1↓2 single crystal manufacturing method

Info

Publication number
JPS5933560B2
JPS5933560B2 JP56009325A JP932581A JPS5933560B2 JP S5933560 B2 JPS5933560 B2 JP S5933560B2 JP 56009325 A JP56009325 A JP 56009325A JP 932581 A JP932581 A JP 932581A JP S5933560 B2 JPS5933560 B2 JP S5933560B2
Authority
JP
Japan
Prior art keywords
single crystal
crucible
crystal
melt
bgo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56009325A
Other languages
Japanese (ja)
Other versions
JPS57123896A (en
Inventor
清吉 秋山
満 石井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP56009325A priority Critical patent/JPS5933560B2/en
Publication of JPS57123896A publication Critical patent/JPS57123896A/en
Publication of JPS5933560B2 publication Critical patent/JPS5933560B2/en
Expired legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Light Receiving Elements (AREA)
  • Measurement Of Radiation (AREA)

Description

【発明の詳細な説明】 本発明は放射線検出用のB14Ge30,2単結晶の製
造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a B14Ge30,2 single crystal for radiation detection.

13i4Ge30+2単結晶はX線やγ線検出用材料と
してすぐれた特性を有していることはネスター(Ne5
ter)らによって明らかにされている。
Nester (Ne5) has shown that 13i4Ge30+2 single crystal has excellent properties as a material for detecting
ter) et al.

Bi4Ge3O12(以下BGOと略す)単結晶は引上
げ法によって製造する。
Bi4Ge3O12 (hereinafter abbreviated as BGO) single crystal is manufactured by a pulling method.

引上げは高周波加熱法により、白金るつぼ中に原料を充
填して融解し、種結晶を融液に浸し、回転しつつゆるや
かに引上げて単結晶とする。
For pulling, raw materials are filled into a platinum crucible and melted using a high-frequency heating method, and a seed crystal is immersed in the melt and gently pulled up while rotating to form a single crystal.

得られた単結晶は不純物が少なく、気泡(ボイド)など
が少ない場合には良好なシンチレータとなる。
The obtained single crystal contains few impurities and becomes a good scintillator when there are few air bubbles (voids).

しかしながらBGOは融液では粘度が高(、ボイドが発
生しやすい。
However, BGO has a high viscosity (and voids are likely to occur) in the form of a melt.

ボイドは、(1)不純物が多い場合、(2)急激な温度
変化が生じた場合、などに発生しやすい。
Voids are likely to occur (1) when there are many impurities, (2) when a sudden temperature change occurs, and so on.

加えて、(3)引上げの末期にも発生しやすい。In addition, (3) it is likely to occur at the end of the hike.

この中、前記(1)、(2)の条件は通常の結晶引上げ
技術によって防止できるが、(3)の場合には防止する
ことが困難である。
Among these conditions, conditions (1) and (2) can be prevented by ordinary crystal pulling techniques, but it is difficult to prevent conditions (3).

本発明者らは(3)に関係するボイドの発生は、BGO
が融液状態で極めて高い粘度をもっているためにおこる
材料固有の現象であることを見出し、一回の引上げによ
ってボイドのない良質結晶を高い歩留りで製造する方法
を発明した。
The present inventors believe that the occurrence of voids related to (3) is caused by BGO
They discovered that this phenomenon is unique to the material because it has an extremely high viscosity in the melt state, and invented a method for producing void-free, high-quality crystals at a high yield through a single pulling process.

引上げ法によって単結晶を製造する場合、用いるるつぼ
は通常、直径と高さく深さ)が等しい形状のものを用い
る。
When producing a single crystal by the pulling method, the crucible used is usually of the same shape as the diameter (height and depth).

これはるつぼの大きさに対する内容積をできるだけ大き
くするためであり、高さが低いるつぼでは効率が悪く、
高さが2倍、3倍と高いるつぼは結晶引上げが困難にな
るためである。
This is to make the internal volume as large as possible for the size of the crucible, and a crucible with a low height will be inefficient.
This is because a crucible that is two or three times as high as the crucible makes it difficult to pull crystals.

引上げ法により単結晶を製造する場合、るつぼ直径と等
しい高さのるつぼを使用すると、通常はるつぼ内の原料
の約80%を単結晶化出来、そのすべてが良質な結晶と
なる。
When producing a single crystal by the pulling method, if a crucible with a height equal to the diameter of the crucible is used, usually about 80% of the raw material in the crucible can be made into a single crystal, all of which will be high quality crystals.

しかしながらBGOの場合、密度が大きく、特に粘度が
高いため、結晶の下部にボイドが発生し、良質結晶は充
填した原料の約60%程度となる。
However, in the case of BGO, since it has a high density and especially a high viscosity, voids occur in the lower part of the crystal, and the amount of good quality crystals is about 60% of the filled raw material.

BGO単結晶の製造方法はまず第1図に示す如く白金る
つぼ1にBGO原料2を充填し、加熱して融液にしたも
のを融液表面水準3まで満し、種結晶4を第2図に示す
ように引上げると長い単結晶5が成長し、降下した融液
水準(良質結晶ができる限界位置)6となる。
The method for manufacturing a BGO single crystal is as shown in Fig. 1. First, a platinum crucible 1 is filled with BGO raw material 2, heated to form a melt, and the melt is filled to a surface level 3, and a seed crystal 4 is placed in a platinum crucible 1 as shown in Fig. 2. As shown in FIG. 2, when the crystal is pulled up, a long single crystal 5 grows, and the melt level 6 falls (the limit position at which a high-quality crystal can be formed).

すなわち融液水準6に達すると結晶中にボイドIが発生
する。
That is, when the melt level reaches 6, voids I are generated in the crystal.

ボイド7の発生は液面の深さが結晶の直径よりも小さく
なるとおこることが特徴である。
The void 7 is characterized in that it occurs when the depth of the liquid surface becomes smaller than the diameter of the crystal.

引上中、融液面を注意深く観察していると、融液水準が
6以上では融液の対流は結晶の回転による強制対流がる
つぼ壁まで達しているのに対して、融液水準6未満では
強制対流が結晶の周辺のみに限られ、るつぼ壁に達して
いない。
Carefully observing the melt surface during pulling, we found that when the melt level was 6 or higher, the forced convection of the melt due to the rotation of the crystals reached the crucible wall, but when the melt level was below 6. In this case, forced convection is limited to the periphery of the crystal and does not reach the crucible wall.

本発明者らは高さの低いるつぼを使用して上記の実験を
行なった結果ボイドが発生するのはるつぼ中の融液水準
が結晶直径以下になったときであることを確認した。
The present inventors conducted the above experiment using a low-height crucible and found that voids occur when the melt level in the crucible becomes less than the crystal diameter.

すなわち高さの低いるつぼを使用した場合にはボイドの
ない良質結晶のできる歩留りが悪く、他方、高さの高い
るつぼを用いた場合には歩留りが向上することを見出し
た。
In other words, it has been found that when a crucible with a low height is used, the yield of good quality crystals without voids is poor, whereas when a crucible with a high height is used, the yield is improved.

第3図は単結晶引上末期の状態を示し、8は残留メルト
で原料の約20%に相当する。
FIG. 3 shows the state at the final stage of single crystal pulling, and 8 represents residual melt, which corresponds to about 20% of the raw material.

本発明の目的は高い歩留りで良質結晶、いわゆるボイド
の少ないBGO単結晶の製造方法を提供することにある
An object of the present invention is to provide a method for producing a BGO single crystal with a high yield and good quality, that is, a BGO single crystal with few voids.

本発明はBGO単結晶の引上げにおいて、少なくともる
つぼの直径よりも高さの高いるつぼを使用して引上げる
ことを特徴とするBGO単結晶の製造方法に関する。
The present invention relates to a method for producing a BGO single crystal, which is characterized in that the BGO single crystal is pulled using a crucible whose height is at least higher than the diameter of the crucible.

以下本発明の詳細な説明する。The present invention will be explained in detail below.

内径が70朋で高さが50,70.105.140.1
.75mmの白金るつぼを使用し、これらのそれぞれの
高さのるつぼについて、単結晶の直径が30.35.4
0羽の3種類について結晶育成を行なった。
Inner diameter is 70 mm and height is 50,70.105.140.1
.. A 75 mm platinum crucible is used, and for each of these height crucibles, the diameter of the single crystal is 30.35.4
Crystal growth was performed on three types of 0 birds.

引上げは高周波加熱法により行ない、引上げ速度は3m
m1時間とした。
The pulling is done by high frequency heating method and the pulling speed is 3m.
It was set as m1 hour.

第1表に各種の条件での良質結晶の歩留りを示した。Table 1 shows the yield of good quality crystals under various conditions.

第1表から明らかなように、るつぼの高さが高い場合お
よび結晶直径が小さい場合は良質結晶を歩留りよく作る
ことができた。
As is clear from Table 1, when the height of the crucible was high and when the crystal diameter was small, high-quality crystals could be produced with a high yield.

本発明によればるつぼの直径より高さの高いるつぼ中に
BGO原料を充填して、単結晶の引上げを行なうように
したので高い歩留りで良質結晶を作ることができ、工業
的効果が高い。
According to the present invention, since the BGO raw material is filled in a crucible whose height is higher than the diameter of the crucible and the single crystal is pulled, high quality crystals can be produced with a high yield, and the industrial effect is high.

【図面の簡単な説明】[Brief explanation of drawings]

第1図から第3図までは本発明を説明するためのBGO
単結晶の結晶化の進行状態を示す図で、第1図は単結晶
引上げ初期の断面図、第2図は単結晶引上げ中期の断面
図、第3図は単結晶引上げ末期の断面図である。 符号の説明、1・・・・・・白金ルツボ、2・・・・・
・BGO原料、3・・・・・・融液表面水準、4・・曲
種結晶、5・・・・・・単結晶、6・・・・・・融液水
準、7・・・・・・ボイド、8・・・・・・残留メルト
FIG. 1 to FIG. 3 are BGO for explaining the present invention.
These diagrams show the progress of crystallization of a single crystal. Figure 1 is a cross-sectional view at the early stage of single crystal pulling, Figure 2 is a cross-sectional view at the middle stage of single crystal pulling, and Figure 3 is a cross-sectional view at the final stage of single crystal pulling. . Explanation of symbols, 1...Platinum crucible, 2...
・BGO raw material, 3... Melt surface level, 4... Curved seed crystal, 5... Single crystal, 6... Melt level, 7...・Void, 8...Residual melt.

Claims (1)

【特許請求の範囲】[Claims] 1 B14Ge30.2単結晶の引上げにおいて、少な
くともるつぼの直径よりも高さの高いるつぼを使用して
引上げることを特徴とするB 14 Ge 3012単
結晶の製造方法。
1. A method for producing a B 14 Ge 3012 single crystal, which comprises pulling the B 14 Ge 30.2 single crystal using a crucible whose height is at least higher than the diameter of the crucible.
JP56009325A 1981-01-23 1981-01-23 Bi↓4Ge↓3O↓1↓2 single crystal manufacturing method Expired JPS5933560B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56009325A JPS5933560B2 (en) 1981-01-23 1981-01-23 Bi↓4Ge↓3O↓1↓2 single crystal manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56009325A JPS5933560B2 (en) 1981-01-23 1981-01-23 Bi↓4Ge↓3O↓1↓2 single crystal manufacturing method

Publications (2)

Publication Number Publication Date
JPS57123896A JPS57123896A (en) 1982-08-02
JPS5933560B2 true JPS5933560B2 (en) 1984-08-16

Family

ID=11717316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56009325A Expired JPS5933560B2 (en) 1981-01-23 1981-01-23 Bi↓4Ge↓3O↓1↓2 single crystal manufacturing method

Country Status (1)

Country Link
JP (1) JPS5933560B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2548689B1 (en) * 1983-07-07 1985-11-08 Crismatec PROCESS FOR PRODUCING BISMUTH GERMANATE MONOCRYSTALS WITH HIGH SCINTILLATION YIELD
JP3840683B2 (en) * 1996-01-12 2006-11-01 株式会社Sumco Single crystal pulling method
JP3183192B2 (en) * 1996-10-02 2001-07-03 株式会社村田製作所 Method for producing oxide single crystal and oxide single crystal

Also Published As

Publication number Publication date
JPS57123896A (en) 1982-08-02

Similar Documents

Publication Publication Date Title
JP2973917B2 (en) Single crystal pulling method
JP3598634B2 (en) Method for producing silicon single crystal
JPS5933560B2 (en) Bi↓4Ge↓3O↓1↓2 single crystal manufacturing method
JPS59213697A (en) Pulling device for single crystal semiconductor
US3261722A (en) Process for preparing semiconductor ingots within a depression
JPH1149597A (en) Quartz crucible for pulling silicon single crystal
JPH0788269B2 (en) Crucible for pulling silicon single crystal
JP2602442B2 (en) Quartz crucible for pulling silicon single crystal
JP2864066B2 (en) Quartz crucible for pulling silicon single crystal and its manufacturing method
JPH0631200B2 (en) Single crystal growth method
KR101494527B1 (en) Method for optimizing crucible rotation for high quality silicon single crystal growing and high durability crucible
JPS589800B2 (en) Manufacturing method of oxide single crystal
JP2813150B2 (en) Single crystal manufacturing method
JPH0825835B2 (en) Single crystal pulling device
JP3011085B2 (en) Single crystal growth method
RU2193079C1 (en) Method of production of monocrystalline silicon
JPH0312385A (en) Method for pulling up single crystal of silicone
JPH04357191A (en) Single crystal production apparatus
JP2007277024A (en) Method for producing silicon single crystal
JP2700145B2 (en) Method for manufacturing compound semiconductor single crystal
JPS5938189B2 (en) Single crystal manufacturing method
KR101962175B1 (en) A method for forming a molten liquid for growing a crystal ingot
JPH051236B2 (en)
RU2560402C1 (en) Method for monocrystal growing from molten metal
JPS60195082A (en) Apparatus for producing semiconductor crystal