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JPS5935433B2 - Tin plating method - Google Patents
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JPS5935433B2 - Tin plating method - Google Patents

Tin plating method

Info

Publication number
JPS5935433B2
JPS5935433B2 JP56000319A JP31981A JPS5935433B2 JP S5935433 B2 JPS5935433 B2 JP S5935433B2 JP 56000319 A JP56000319 A JP 56000319A JP 31981 A JP31981 A JP 31981A JP S5935433 B2 JPS5935433 B2 JP S5935433B2
Authority
JP
Japan
Prior art keywords
plating
powder
tin
plated
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56000319A
Other languages
Japanese (ja)
Other versions
JPS57114652A (en
Inventor
巌 京野
良雄 川澄
Original Assignee
日本鉱業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本鉱業株式会社 filed Critical 日本鉱業株式会社
Priority to JP56000319A priority Critical patent/JPS5935433B2/en
Publication of JPS57114652A publication Critical patent/JPS57114652A/en
Publication of JPS5935433B2 publication Critical patent/JPS5935433B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)
  • Chemically Coating (AREA)

Description

【発明の詳細な説明】 本発明は全く新規な錫メッキ方法に関する。[Detailed description of the invention] The present invention relates to a completely new method of tin plating.

近年、メッキ粉体の需要増加に伴ない種々のメッキ方法
が提案されているが、これらのうち置換法によるメッキ
法はその操作の簡易性の故に広く利用されている。粉体
のメッキ方法として従来公知の置換メッキ法は、被メッ
キ粉体と還元用金属粉体との混合粉に対し又はこれらの
混合過程に対し該混合粉を撹拌しながらメッキ金属含有
溶液を添加するかもしくはメッキ金属含有溶液中に撹拌
下で被メッキ粉体と還元用金属粉体とを一緒に又は各別
に添加することにより行なわれている。
In recent years, various plating methods have been proposed as the demand for plating powder increases, and among these plating methods, the substitution plating method is widely used because of its ease of operation. The displacement plating method, which is conventionally known as a powder plating method, involves adding a plating metal-containing solution to a mixed powder of a powder to be plated and a metal powder for reduction, or to the mixing process of the mixed powder while stirring the mixed powder. Alternatively, the powder to be plated and the reducing metal powder are added together or separately into a solution containing the plating metal under stirring.

し力走ながら、上述した置換法によるメッキ法ではメッ
キしようとする金属をそれより卑な金属粉で還元するこ
とを反応上の基本とするものであるから金、白金、パラ
ジウム、銀のごとき標準電極電位が非常に貴な金属を対
象とする粉体のメッキにおいては、還元効率およびメッ
キ仕上りともに良好であるが、亜鉛、錫、ニッケル、コ
バルトのごとき標準電極電位が卑な金属粉をメッキする
場合においては還元効率、メッキ仕上りがともに悪く実
用的でない。
However, in the above-mentioned substitution plating method, the basis of the reaction is to reduce the metal to be plated with metal powder that is less noble, so standard metals such as gold, platinum, palladium, and silver cannot be used. Powder plating for metals with very noble electrode potentials has good reduction efficiency and plating finish, but it is difficult to plate metal powders with base electrode potentials such as zinc, tin, nickel, and cobalt. In some cases, both the reduction efficiency and the plating finish are poor, making it impractical.

しかして最近この対策としてニッケル、コバルト、亜鉛
等のメッキにおいてそれより卑なるマグネシウム、アル
ミニウムのごとき還元用金属粉と被メッキ体とを混合す
る過程もしくは両者の混合物にメッキ金属の塩化物結晶
粉末を添加し反応開始後若干の水および(又は)塩酸を
添加するメッキ方法が提案されている。
However, recently, as a countermeasure for this problem, when plating nickel, cobalt, zinc, etc., chloride crystal powder of the plating metal is added in the process of mixing the object to be plated with powder of a reducing metal such as magnesium or aluminum, or a mixture of both. A plating method has been proposed in which a small amount of water and/or hydrochloric acid is added after the reaction has started.

しかし上述したいずれのメッキ方法においても還元用金
属粉はメッキ金属よりも卑なものでなければならないの
で、両者の金属は必然的に異種のものであり従つてメッ
キ終了後の液の処理が問題となる。
However, in any of the above-mentioned plating methods, the reducing metal powder must be more base than the plating metal, so the two metals are necessarily different types, and the treatment of the liquid after plating is a problem. becomes.

例えば銅粉を錫メッキする際銅粉とアルミニウム粉の混
合物に塩化錫溶液を添加してメッキを行なうと下記反応
式により塩化アルミニウムと塩化錫を含む溶液がメツサ
処理後液として得られることになる。
For example, when tin plating copper powder, if a tin chloride solution is added to a mixture of copper powder and aluminum powder and plating is performed, a solution containing aluminum chloride and tin chloride will be obtained as a solution after Metsusa treatment according to the reaction formula below. .

Cu+Al+SnC12→Cu−Sn−l−AlCl3
+SnCl2すなわち上記メッキ処理後液はそのままで
は銅粉の錫メッキ溶液として再利用できないのでその処
理が問題となりまた錫の還元率が低い等の欠点がある。
Cu+Al+SnC12→Cu-Sn-l-AlCl3
+SnCl2, that is, the solution after the plating process cannot be reused as it is as a tin plating solution for copper powder, so its treatment becomes a problem, and there are also drawbacks such as a low reduction rate of tin.

本発明者は粉体のメッキについて種々検討を重ねた結果
従来の置換法とは異なる全く新規な方法を見いだした。
As a result of various studies on powder plating, the present inventors discovered a completely new method different from conventional substitution methods.

すなわち本発明は、メッキ媒体用金属粉(金属粉の添加
によつてメッキが進行するのでメッキ液中の金属イオン
成分と同種の金属粉を以下メッキ媒体用金属粉と称する
)としてメッキ金属と同一の金属を用いることにより全
く親規で有利な錫メツキ方法を提供することを目的とす
る。
That is, the present invention uses metal powder for plating media that is the same as the plating metal (metal powder of the same type as the metal ion component in the plating solution is hereinafter referred to as metal powder for plating media since plating progresses by adding metal powder). The object of the present invention is to provide a completely conventional and advantageous method of tinning using metals such as:

以下本発明を詳しく説明する。The present invention will be explained in detail below.

本発明でメツキの対象となる被メツキ体は錫よりも標準
電極電位が貴な金属を主成分とする合金、例えば鉛一亜
鉛,銅一錫,銀−ニツケル,パラジウム一錫,金一コバ
ルト,白金−パラジウム等の二元合金はもちろん、三元
ないし多元合金も用い得る。
The object to be plated in the present invention is an alloy whose main component is a metal whose standard electrode potential is nobler than that of tin, such as lead-zinc, copper-tin, silver-nickel, palladium-tin, gold-cobalt, etc. Not only binary alloys such as platinum-palladium, but also ternary and multi-component alloys can be used.

さらに上記合金のほかに炭素質物質,金属炭化物,金属
酸化物,金属硫化物,窒化物などを上記合金で予め被覆
処理したものも包含する。なお、この被覆処理には金属
薄層の蒸着、パラジウム析出のごとき公知の手法が適用
し得る。これらの被メツキ体の形状については特に制限
はなく目的、用途に応じて粉体、線体、板体等が適宜使
用される。本発明でメツキ媒体用金属粉として用いられ
る錫紛の粒度は被メツキ体の種類、大きさ、さらにはメ
ツキ厚さ等を考慮して選択し得る。
Furthermore, in addition to the above-mentioned alloys, it also includes those coated with carbonaceous substances, metal carbides, metal oxides, metal sulfides, nitrides, etc. with the above-mentioned alloys. Note that known techniques such as metal thin layer vapor deposition and palladium precipitation can be applied to this coating treatment. There are no particular restrictions on the shape of these objects to be plated, and powders, wires, plates, etc. may be used as appropriate depending on the purpose and use. The particle size of the tin powder used as the metal powder for the plating medium in the present invention can be selected in consideration of the type and size of the object to be plated, and further the thickness of the plated material.

例えば被メツキ体として平均粒径40μの黄銅粉を用い
、これに被覆量30重量パーセントのメツキを施す場合
には上記錫の粒度は数μ程度が適当である。
For example, when brass powder with an average particle size of 40 microns is used as the object to be plated, and the plated material is coated with a coating amount of 30% by weight, the appropriate particle size of the tin is approximately several microns.

錫粉の使用量はメツキ所要量の1.0〜1.05倍(重
量)でよい。また本発明で用いる錫イオンを含む水溶液
としては塩酸、硫酸もしくは硝酸水溶液であつてPHが
0.2〜3のものが好ましく、その使用量は該水溶液中
の錫量がメツキ所要量より過剰になるごとく調整すると
よい。
The amount of tin powder used may be 1.0 to 1.05 times (by weight) the amount required for plating. The aqueous solution containing tin ions used in the present invention is preferably an aqueous solution of hydrochloric acid, sulfuric acid or nitric acid with a pH of 0.2 to 3, and the amount used is such that the amount of tin in the aqueous solution is in excess of the required amount for plating. You may want to adjust it as you see fit.

本発明では上述したごとき被メツキ体を錫粉および錫イ
オンを含む水溶液の存在下で加熱処理することにより錫
メツキを行なうものであるが、例えば被メツキ体として
粉体を使用する場合には被メツキ体に錫粉を混合する過
程もしくは被メツキ体に錫粉を混合した後、上記水溶液
を添加しメツキ反応を均一に遂行するべく撹拌下に加熱
するとよい。
In the present invention, tin plating is carried out by heating the object to be plated as described above in the presence of an aqueous solution containing tin powder and tin ions. For example, when using powder as the object to be plated, During the process of mixing the tin powder into the plating body or after mixing the tin powder with the plated body, it is preferable to add the above aqueous solution and heat it with stirring in order to uniformly perform the plating reaction.

メツキ反応は錫イオンを含む水溶液を添加し数分間加熱
することにより完遂する。
The plating reaction is completed by adding an aqueous solution containing tin ions and heating for several minutes.

なお加熱温度は80〜100℃程度でよい。反応が終了
したメツキ生成物は淵過して液分を除去した後洗浄して
、錫メツキ粉体を回収する。
Note that the heating temperature may be about 80 to 100°C. The plating product after the reaction is filtered to remove the liquid and then washed to recover the tin plating powder.

上記済過で得られる液分は金5属イオンとしては錫イオ
ンのみを含む水溶液であるからそのままメツキ工程へ循
環して再利用できる。本発明により上述したごとくして
得られる錫メツキ粉体においては被メツキ粉体への錫の
析着が粒子状とならずほぼ均一な厚さを有する被覆が形
成する。
Since the liquid obtained in the above-mentioned filtration is an aqueous solution containing only tin ions as metal 5 metal ions, it can be directly recycled to the plating process and reused. In the tin plating powder obtained as described above according to the present invention, tin is not deposited on the powder to be plated in the form of particles, and a coating having a substantially uniform thickness is formed.

以上被メツキ体としてその形状が粉体の場合を説明した
が、その形状が線体あるいは板体のものについても全く
同様のことがいえる。
Although the case where the object to be plated has the shape of powder has been described above, the same can be said of the object to be plated which has the shape of a wire or a plate.

ただし板状の場合は加熱処理前に被メツキ板体を錫粉が
懸濁した、錫イオンを含む水溶液中に浸漬する点、およ
び反応終了後の淵過が不要な点が粉体の場合と異なる。
本発明のメツキ方法における反応機構は未だ明らかでは
ないが反応過程で錫粉が一旦溶解し水溶液中の錫イオン
が被メツキ体の表面に析出するものと推定される。
However, in the case of a plate, the plate to be plated is immersed in an aqueous solution containing tin ions in which tin powder is suspended before the heat treatment, and in the case of a powder, there is no need to pass through the plate after the reaction is completed. different.
Although the reaction mechanism in the plating method of the present invention is not yet clear, it is presumed that the tin powder is once dissolved during the reaction process, and tin ions in the aqueous solution are precipitated on the surface of the object to be plated.

以上述べたごとく本発明によるとメツキ処理後液をその
ままメツキ工程へ循環して再利用し得るので従来法にみ
られる前述した問題点は解消される。
As described above, according to the present invention, the liquid after the plating process can be directly recycled to the plating process and reused, so the above-mentioned problems found in the conventional method can be solved.

以下実施例を例示して本発明をさらに具体的に説明する
The present invention will be described in more detail below by way of examples.

実施例 1 平均粒径40μを有する黄銅粉(Cu8O%,Zn2O
%)109、平均粒径数μを有する錫粉49および錫濃
度509/lの塩化錫水溶液200m1をメツキ槽に仕
込み(仕込液のPHO.4)、撹拌下に90℃で5分間
加熱して反応させる。
Example 1 Brass powder (Cu8O%, Zn2O
%) 109, tin powder with an average particle size of several microns, and 200 ml of a tin chloride aqueous solution with a tin concentration of 509/l were charged into a plating tank (PHO.4 of the charging solution), and heated at 90°C for 5 minutes with stirring. Make it react.

得られた反応生成物を沢別しPH2〜3の希薄硫酸で塩
素イオンの存在が認められなくなるまで洗浄し水洗した
のち乾燥する。その結果13.989の錫メツキ粉が得
られた。
The obtained reaction product is separated, washed with dilute sulfuric acid of pH 2 to 3 until the presence of chloride ions is no longer recognized, washed with water, and then dried. As a result, 13.989 tin plating powder was obtained.

この錫メツキ粉は錫の白色光沢を有し、顕微鏡下の観察
ではメツキ前の黄銅粉の粉形に相似しており、錫粉その
ものと思われる微小粉体は認められなかつた。上記沢過
により得られる済液は塩化錫水溶液であるので上記メツ
キ槽へ循環してメツキ反応に再利用する。
This tin-plated powder had the white luster of tin, and when observed under a microscope, it resembled the powder shape of unplated brass powder, and no fine powder that was thought to be tin powder itself was observed. Since the waste liquid obtained by the above-mentioned filtration is an aqueous tin chloride solution, it is circulated to the plating tank and reused for the plating reaction.

実施例 2 濃度2009/lの硝酸錫水溶液200wL1と平均粒
径数μの錫粉5g、および被メツキ体として直径2m7
1L長さ4mmの青銅線(Cu85%,Snl5(f)
)20本をメツキ槽に入れ撹拌下で85℃に加熱し5分
間メツキを行なつた。
Example 2 200wL1 of tin nitrate aqueous solution with a concentration of 2009/L, 5g of tin powder with an average particle size of several micrometers, and a diameter of 2m7 as the object to be plated.
1L length 4mm bronze wire (Cu85%, Snl5(f)
) 20 pieces were placed in a plating tank, heated to 85° C. with stirring, and plated for 5 minutes.

Claims (1)

【特許請求の範囲】[Claims] 1 錫よりも貴な金属を主成分とする合金よりなる被メ
ッキ体を銀粉および錫イオンを含む水溶液の存在下で加
熱処理することを特徴とする錫メッキ方法。
1. A tin plating method characterized by heat-treating an object to be plated made of an alloy whose main component is a metal nobler than tin in the presence of an aqueous solution containing silver powder and tin ions.
JP56000319A 1981-01-07 1981-01-07 Tin plating method Expired JPS5935433B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56000319A JPS5935433B2 (en) 1981-01-07 1981-01-07 Tin plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56000319A JPS5935433B2 (en) 1981-01-07 1981-01-07 Tin plating method

Publications (2)

Publication Number Publication Date
JPS57114652A JPS57114652A (en) 1982-07-16
JPS5935433B2 true JPS5935433B2 (en) 1984-08-28

Family

ID=11470582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56000319A Expired JPS5935433B2 (en) 1981-01-07 1981-01-07 Tin plating method

Country Status (1)

Country Link
JP (1) JPS5935433B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016121558A1 (en) * 2015-01-28 2016-08-04 三菱マテリアル株式会社 Silver-coated particles and method for producing same
JP2016146319A (en) * 2015-01-28 2016-08-12 三菱マテリアル株式会社 Silver coated particle and manufacturing method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016121558A1 (en) * 2015-01-28 2016-08-04 三菱マテリアル株式会社 Silver-coated particles and method for producing same
JP2016146319A (en) * 2015-01-28 2016-08-12 三菱マテリアル株式会社 Silver coated particle and manufacturing method thereof
US10590540B2 (en) 2015-01-28 2020-03-17 Mitsubishi Materials Corporation Silver-coated particle and method of producing same

Also Published As

Publication number Publication date
JPS57114652A (en) 1982-07-16

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