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JPS5935879B2 - Method for manufacturing compound semiconductor single crystal - Google Patents
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JPS5935879B2 - Method for manufacturing compound semiconductor single crystal - Google Patents

Method for manufacturing compound semiconductor single crystal

Info

Publication number
JPS5935879B2
JPS5935879B2 JP21237781A JP21237781A JPS5935879B2 JP S5935879 B2 JPS5935879 B2 JP S5935879B2 JP 21237781 A JP21237781 A JP 21237781A JP 21237781 A JP21237781 A JP 21237781A JP S5935879 B2 JPS5935879 B2 JP S5935879B2
Authority
JP
Japan
Prior art keywords
single crystal
crystal
rotation speed
diameter
compound semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP21237781A
Other languages
Japanese (ja)
Other versions
JPS58115086A (en
Inventor
章一 鷲塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP21237781A priority Critical patent/JPS5935879B2/en
Publication of JPS58115086A publication Critical patent/JPS58115086A/en
Publication of JPS5935879B2 publication Critical patent/JPS5935879B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/20Controlling or regulating
    • C30B15/22Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
    • C30B15/28Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using weight changes of the crystal or the melt, e.g. flotation methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【発明の詳細な説明】 発明の技術分野 本発明はGaP、GaAs、InPなどの高(扮解圧を
有する■−V族化合物半導体単結晶を所定の形状に制御
して液体カプセル引上げ法により製造する方法に関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to the production of semiconductor single crystals of ■-V group compounds such as GaP, GaAs, and InP, which have high melting pressures, by controlling them into a predetermined shape and by a liquid capsule pulling method. It's about how to do it.

発明の技術的背景およびその問題点 揮発性物質を含む化合物半導体単結晶であるGaP単結
晶は、可視発光ダイオード用基板として重要な材料であ
り通常高圧中で液体カプセル法(LEC法)によつて作
られている。
Technical Background of the Invention and Its Problems GaP single crystal, which is a compound semiconductor single crystal containing volatile substances, is an important material as a substrate for visible light emitting diodes, and is usually produced under high pressure by the liquid encapsulation method (LEC method). It is made.

この方法は化合物の原料融液の表面をB2O3などの不
活性液体で覆い、さらにその上から化合物の分解圧以上
の不活性ガスで加圧しながら単結晶引上げを行うもので
ある。LEC法においても結晶直径の制御は重要な問題
であるが、通常のチヨコラルスキー法で引上げられるシ
リコンや酸化物結晶と較べると直径変動要因が複雑で、
径制御が非常にむずかしいという問題がある。直径の検
出方法としては光学法および重量法が〒般的であり、シ
リコンや酸化物単結晶に適用されている。LEC法にお
いてはさらにX線法も提案されている。そして通常これ
らの方法により検出した直径偏差は、ルツボの加熱電力
にフィードバックされ、融液温度を調節して、直径制御
が行なわれている。ところで、近年、■−V族化合物半
導体単結晶においても2.5インチから3インチ以上の
大口径高品質単結晶が要求されるようになつてきており
、そのためには、ルツボ内の温度勾配を従来よりできる
だけゆるくして単結晶の製造を行なうことが必要となつ
てきた。
In this method, the surface of a raw material melt of a compound is covered with an inert liquid such as B2O3, and then a single crystal is pulled while pressurizing the surface with an inert gas higher than the decomposition pressure of the compound. Controlling the crystal diameter is also an important issue in the LEC method, but the factors that vary the diameter are more complex than those for silicon and oxide crystals that are pulled using the regular Czyochoralski method.
The problem is that diameter control is extremely difficult. Optical methods and gravimetric methods are commonly used to detect diameters, and are applied to silicon and oxide single crystals. In addition to the LEC method, an X-ray method has also been proposed. The diameter deviation detected by these methods is usually fed back to the heating power of the crucible, and the melt temperature is adjusted to control the diameter. Incidentally, in recent years, there has been a demand for large-diameter, high-quality single crystals of 2.5 inches to 3 inches or more for ■-V group compound semiconductor single crystals. It has become necessary to manufacture single crystals by making them as loose as possible.

ところが、温度勾配をゆるくするにつれて、結晶成長が
不規則になり、結晶直径は均一に変化せず、さらに多結
晶や双晶が発生しやすく結晶形状、品質が劣化するとい
う問題がある。
However, as the temperature gradient is made gentler, the crystal growth becomes irregular, the crystal diameter does not change uniformly, and polycrystals and twins are more likely to occur, leading to deterioration in crystal shape and quality.

そのため低温度勾配下では従来の温度だけにより直径希
リ御する方法で、高品質単結晶を歩留り良く得ることは
困難であり、上記要求に対応できない欠点があつた。発
明の目的本発明は上記した点に鑑みなされたもので、L
EC法により化合物半導体単結晶を製造する際に、上記
欠点を取り除き、直径制御された高品質単結晶を製造す
る方法を提供するものである。
Therefore, under a low temperature gradient, it is difficult to obtain high-quality single crystals with a good yield using the conventional method of controlling the diameter using only temperature, which has the drawback of not being able to meet the above requirements. Purpose of the Invention The present invention has been made in view of the above points, and
The object of the present invention is to provide a method for manufacturing a high-quality single crystal with a controlled diameter by eliminating the above-mentioned drawbacks when manufacturing a compound semiconductor single crystal by the EC method.

発明の概要本発明者は前記問題点の原因を種々調査検討
した結果、低温度勾配下で単結晶を引上げる場合、融液
の減少に伴つてルツボ内の熱環境が大きく変化し、温度
勾配がゆるくなりすぎるためであると考えた。
Summary of the Invention As a result of various investigations into the causes of the above-mentioned problems, the present inventor found that when pulling a single crystal under a low temperature gradient, the thermal environment inside the crucible changes significantly as the melt decreases, and the temperature gradient I thought that this was because it became too loose.

さらに研究を進めた結果、結晶の回転数と結晶の不規則
な径変化および温度勾配との間には強い相関があること
が明らかになつた。
Further research revealed that there is a strong correlation between the rotational speed of the crystal, the irregular diameter change of the crystal, and the temperature gradient.

第1図はその様子を示すものであり、1は引上げ単結晶
で、矢印Aは結晶回転方向、矢印Bはルツボ回転方向を
示している。第1図bは単結晶回転が適正な状態である
。いま、ルツボ回転方向と結晶回転方向が同じ場合を正
方向とすると、結晶の回転数を正方向に増加させると第
1図cのように結晶1の径は太くなり、逆に負方向に増
加させると第1図aのように結晶1の径は細くなる、と
いう応答を示す。第2図はその応答特性を示している。
このことから、前記直径偏差を結晶回転数にフイードバ
ツクするようにしたところ、低温度勾配下でもGaP結
晶の不規則な径変化や多結晶、双晶の発生などが著しく
減少し安定した直径制御ができ十分効果があることが分
つた。そこで本発明の単結晶の製造方法では、実質的に
引上げられた結晶の所定値からの直径偏差を検出する検
出回路と、前記直径偏差からあらかじめ定められた式に
より結晶回転数を求める演算回路と、結晶回転数を制御
する回転数制偶回路を備え、直径偏差を種結晶の回転数
にフイードバツクして単結晶引上げを行なうことを特徴
とするものである。
FIG. 1 shows this situation, where 1 is a pulled single crystal, arrow A indicates the crystal rotation direction, and arrow B indicates the crucible rotation direction. FIG. 1b shows a state in which the single crystal rotation is proper. Now, assuming that the case where the crucible rotation direction and the crystal rotation direction are the same is considered to be a positive direction, when the rotation speed of the crystal increases in the positive direction, the diameter of crystal 1 becomes thicker as shown in Figure 1 c, and conversely increases in the negative direction. When this happens, the diameter of the crystal 1 becomes thinner as shown in FIG. 1a. FIG. 2 shows its response characteristics.
Based on this, when the diameter deviation was fed back to the crystal rotation speed, irregular diameter changes, polycrystals, and twin crystals in the GaP crystal were significantly reduced, and stable diameter control was achieved even under low temperature gradients. It turned out to be quite effective. Therefore, the single crystal manufacturing method of the present invention includes a detection circuit that detects the diameter deviation of the pulled crystal from a predetermined value, and an arithmetic circuit that calculates the crystal rotation speed from the diameter deviation using a predetermined formula. The present invention is characterized in that it is equipped with a rotation speed control circuit for controlling the crystal rotation speed, and pulls a single crystal by feeding back the diameter deviation to the rotation speed of the seed crystal.

発明の実施例 以下本発明の一実施例を図面にもとづき説明する。Examples of the invention An embodiment of the present invention will be described below based on the drawings.

第3図は本発明による機能を具備したGaP単結晶製造
装置の一例である。図中、11はGaP融液、12は液
体カプセル、13は種結晶、14はGaP結晶、15は
ルツボ、16は加熱ヒーター、ITは結晶回転軸、18
は結晶回転モータ、19は結晶重量検出器、20は結晶
回転数制御回路、21は結晶回転数演算回路、22は結
晶直径偏差検出回路、23は加熱装置である。内径10
0慕麗φのルツボ15にGaP原料を900yと液体カ
プセル(B2O3)を200yチャージしたのち窒素ガ
スにて加圧( 〜 60k9/Cd)し融解させたのち
、固液界面の初期温度勾配を80℃/CTrL、結晶回
転数を3rpm、ルツボ回転数を20rpm、引上げ速
度を12mwL/ hに設定して結晶引上げを開始した
。結晶が所定径になつたのち結晶重量検出器19と結晶
直径偏差検出回路22とにより求めた偏差を、結晶回転
数演算回路21に入力し、結晶回転数Rsを次式により
算出した。これにより求めた回転数を結晶回転数制御回
路20に入力し、結晶回転モーター18の回転数を変化
させて、直径偏差を結晶回転数にフイードバツクしなが
ら、結晶引上げを続行したところ、得られた結晶は、不
規則な突起などの細かい直径変動は生ぜず、結晶表面も
滑らかで直径変化は±1n以下であつた。
FIG. 3 is an example of a GaP single crystal manufacturing apparatus equipped with the functions according to the present invention. In the figure, 11 is a GaP melt, 12 is a liquid capsule, 13 is a seed crystal, 14 is a GaP crystal, 15 is a crucible, 16 is a heating heater, IT is a crystal rotation axis, 18
19 is a crystal rotation motor, 19 is a crystal weight detector, 20 is a crystal rotation speed control circuit, 21 is a crystal rotation speed calculation circuit, 22 is a crystal diameter deviation detection circuit, and 23 is a heating device. Inner diameter 10
After charging 900 y of GaP raw material and 200 y of liquid capsule (B2O3) into crucible 15 of 0 Murei φ, pressurizing with nitrogen gas (~ 60 k9/Cd) and melting, the initial temperature gradient at the solid-liquid interface was set to 80 y. C/CTrL, the crystal rotation speed was set to 3 rpm, the crucible rotation speed was set to 20 rpm, and the pulling speed was set to 12 mwL/h to start crystal pulling. After the crystal reached a predetermined diameter, the deviation determined by the crystal weight detector 19 and the crystal diameter deviation detection circuit 22 was input to the crystal rotation speed calculation circuit 21, and the crystal rotation speed Rs was calculated by the following formula. The rotation speed thus obtained was input to the crystal rotation speed control circuit 20, and the rotation speed of the crystal rotation motor 18 was changed to feed back the diameter deviation to the crystal rotation speed while continuing crystal pulling. The crystal did not have small diameter variations such as irregular protrusions, the crystal surface was smooth, and the diameter variation was ±1n or less.

さらに5回の結晶引上げを連続して行つたところ、特に
多結晶や双晶の発生は見られず、ほぼ100%の歩留り
で引上げることができた。ここで、通常の方法により加
熱電力を変化させる直径制御も同時に行つている。これ
に対して、結晶回転数を一定にし、温度だけにより直径
制御を行つて引上げたところ、結晶の肩部から前半まで
は良好であつたが、後半になると細かい周期で直径が変
化し、結晶の一部に角のような突起が生じていた。
When the crystal was pulled five times in succession, no occurrence of polycrystals or twins was observed, and the crystal could be pulled with a yield of almost 100%. Here, diameter control is also performed at the same time by changing the heating power using a normal method. On the other hand, when we pulled the crystal by keeping the rotational speed constant and controlling the diameter using only the temperature, the crystal was good from the shoulder to the first half, but in the second half, the diameter changed at small intervals and the crystal was pulled. There were horn-like protrusions on some parts.

この時の直径変化は±3mmもあり、良好な結果を得る
ことはできなかつた。以上説明した方法によれば低温度
勾配下でもGaP単結晶を安定に再現性良く製造するこ
とができた。
At this time, the diameter change was as much as ±3 mm, and good results could not be obtained. According to the method described above, a GaP single crystal could be produced stably and with good reproducibility even under a low temperature gradient.

なお、上記( 1)式による結晶回転数Rsの計算はコ
ンピユータ、計算器または他の計算方法のいずれによつ
ても良い。
Note that the calculation of the crystal rotation speed Rs using the above equation (1) may be performed using a computer, a calculator, or any other calculation method.

又結晶回転数Rsの計算に用いる計算式は必ずしも(
1)式に限定されるものではなく、他の制御式や実験式
によつても何等差支えない。また、本発明の方法は液体
カプセル引上げ法を適用できる他の単結晶、例えばGa
As,Inp、GaSb等においても同様に適用できる
ものであり、その得る効果も大きい。
Also, the formula used to calculate the crystal rotation speed Rs is not necessarily (
1) It is not limited to the formula, and other control formulas or experimental formulas may also be used. The method of the present invention also applies to other single crystals to which the liquid capsule pulling method can be applied, such as Ga
It can be similarly applied to As, Inp, GaSb, etc., and the effects obtained are also great.

発明の効果 以上説明したように本発明によれば液体カプセル引上げ
法において次のような効果が得られる。
Effects of the Invention As explained above, according to the present invention, the following effects can be obtained in the liquid capsule pulling method.

( 1)通常の加熱電力を変化させる直径制御方法と併
用することにより、低温度勾配下でもきわめて高精度な
直径制御を安定に再現性良く行なうことができる。(2
)直径精度が向上したことにより原料からのウエハ一の
収率が高くなり、従来の方法に較べて約10%以上向上
する。
(1) By using this method in combination with a diameter control method that changes the heating power, highly accurate diameter control can be performed stably and with good reproducibility even under low temperature gradients. (2
) The improved diameter accuracy increases the yield of wafers from raw materials, which is about 10% or more better than conventional methods.

(3)多結晶や双晶の発生はほとんどみられず、結晶作
成歩留りが従来の方法に較べて約20%向上する。
(3) Almost no polycrystals or twins are observed, and the crystal production yield is improved by about 20% compared to conventional methods.

(4)本発明を工業的に適用することにより生産性が向
上する。
(4) Productivity is improved by industrially applying the present invention.

本発明は特に低温度勾配下での直径制御高品質単結晶の
製造において大きな効果を有するものである。
The present invention is particularly effective in producing high-quality single crystals with controlled diameters under low temperature gradients.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、結晶回転数の変化と結晶形状との相関を説明
するための図、第2図は同じく結晶回転数変化による直
径偏差の応答特性を示す図、第3図は本発明の一実施例
を説明するための構成図である。 11・・・・・・GaP融液、12・・・・・・液体カ
プセル、13・・・・・・種結晶、14・・・・・・G
aP結晶、15・・・・・・ルツボ、16・・・・・・
加熱ヒータ、17・・・・・・結晶回転軸、18・・・
・・・結晶回転モーター、19・・・・・・結晶重量検
出器、20・・・・・・結扁回転数制御回路、21・・
・・・・結晶回転数演算回路、22・・・・・・結晶直
径偏差検出回路、23・・・・・・加熱装置。
FIG. 1 is a diagram for explaining the correlation between changes in crystal rotation speed and crystal shape, FIG. 2 is a diagram also showing the response characteristics of diameter deviation due to changes in crystal rotation speed, and FIG. FIG. 2 is a configuration diagram for explaining an example. 11...GaP melt, 12...Liquid capsule, 13...Seed crystal, 14...G
aP crystal, 15... Crucible, 16...
Heater, 17...Crystal rotation axis, 18...
... Crystal rotation motor, 19 ... Crystal weight detector, 20 ... Connection rotation speed control circuit, 21 ...
. . . Crystal rotation speed calculation circuit, 22 . . . Crystal diameter deviation detection circuit, 23 . . . Heating device.

Claims (1)

【特許請求の範囲】 1 液体カプセル法により化合物半導体単結晶を製造す
るに際し、引上げ単結晶の所定値からの直径偏差を検出
する検出回路と、得られた直径偏差から予め定められた
式により結晶回転数を求める演算回路と、結晶回転数を
制御する制御回路とを備え、前記直径偏差に応じて引上
げ単結晶の回転数を制御して所定形状の単結晶引上げを
行うようにしたことを特徴とする化合物半導体単結晶の
製造方法。 2 前記検出回路は、引上げ単結晶の重量変化に基づい
て直径偏差を求めるものである特許請求の範囲第1項記
載の化合物半導体単結晶の製造方法。 3 前記演算回路は、下記式に基づいて結晶回転数Rs
を求めるものである特許請求の範囲第1項記載の化合物
半導体単結晶の製造方法。 ▲数式、化学式、表等があります▼ ただし、Rso:予め設定された回転数 K:フィードバック・ゲイン ΔD_i:直径偏差 Δt:単位時間 4 前記単結晶引上のためのルツボ内の温度勾配を、2
.5〜3インチ以上の大口径高品質単結晶が得られる程
度の低温度勾配にしたことを特徴とする特許請求の範囲
第1項記載の化合物半導体単結晶の製造方法。
[Claims] 1. When manufacturing a compound semiconductor single crystal by the liquid capsule method, a detection circuit that detects a diameter deviation from a predetermined value of a pulled single crystal, and a detection circuit that detects a diameter deviation from a predetermined value of the pulled single crystal, and a It is characterized by comprising an arithmetic circuit that calculates the rotation speed and a control circuit that controls the crystal rotation speed, and pulls the single crystal in a predetermined shape by controlling the rotation speed of the pulled single crystal according to the diameter deviation. A method for manufacturing a compound semiconductor single crystal. 2. The method for manufacturing a compound semiconductor single crystal according to claim 1, wherein the detection circuit determines the diameter deviation based on a weight change of the pulled single crystal. 3 The arithmetic circuit calculates the crystal rotation speed Rs based on the following formula.
A method for manufacturing a compound semiconductor single crystal according to claim 1, which requires the following. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ However, Rso: Preset rotation speed K: Feedback gain ΔD_i: Diameter deviation Δt: Unit time 4 The temperature gradient inside the crucible for pulling the single crystal is 2
.. 2. The method for producing a compound semiconductor single crystal according to claim 1, wherein the temperature gradient is low enough to obtain a large-diameter, high-quality single crystal of 5 to 3 inches or more.
JP21237781A 1981-12-25 1981-12-25 Method for manufacturing compound semiconductor single crystal Expired JPS5935879B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21237781A JPS5935879B2 (en) 1981-12-25 1981-12-25 Method for manufacturing compound semiconductor single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21237781A JPS5935879B2 (en) 1981-12-25 1981-12-25 Method for manufacturing compound semiconductor single crystal

Publications (2)

Publication Number Publication Date
JPS58115086A JPS58115086A (en) 1983-07-08
JPS5935879B2 true JPS5935879B2 (en) 1984-08-31

Family

ID=16621554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21237781A Expired JPS5935879B2 (en) 1981-12-25 1981-12-25 Method for manufacturing compound semiconductor single crystal

Country Status (1)

Country Link
JP (1) JPS5935879B2 (en)

Also Published As

Publication number Publication date
JPS58115086A (en) 1983-07-08

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