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JPS5936256B2 - developer composition - Google Patents
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JPS5936256B2 - developer composition - Google Patents

developer composition

Info

Publication number
JPS5936256B2
JPS5936256B2 JP52154111A JP15411177A JPS5936256B2 JP S5936256 B2 JPS5936256 B2 JP S5936256B2 JP 52154111 A JP52154111 A JP 52154111A JP 15411177 A JP15411177 A JP 15411177A JP S5936256 B2 JPS5936256 B2 JP S5936256B2
Authority
JP
Japan
Prior art keywords
developer
photosensitive
developer composition
ether
photosensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52154111A
Other languages
Japanese (ja)
Other versions
JPS5486328A (en
Inventor
高敏 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okamoto Chemical Industry Co Ltd
Original Assignee
Okamoto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Okamoto Chemical Industry Co Ltd filed Critical Okamoto Chemical Industry Co Ltd
Priority to JP52154111A priority Critical patent/JPS5936256B2/en
Publication of JPS5486328A publication Critical patent/JPS5486328A/en
Publication of JPS5936256B2 publication Critical patent/JPS5936256B2/en
Expired legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)

Description

【発明の詳細な説明】 本発明は、親水性基をもつ水不溶性高分子物を含有する
感光層、とくに印刷版用感光層に用いられる現像液組成
物に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a developer composition used in a photosensitive layer, particularly a photosensitive layer for a printing plate, containing a water-insoluble polymer having a hydrophilic group.

周知な様に、光架橋剤と高分子物からなる感光層が種々
なる用途に用いられている。
As is well known, photosensitive layers made of photocrosslinking agents and polymers are used for various purposes.

例えば角田著「感光性樹脂」 (印刷学会出版部、昭和
48年発行)に記載の様に親水性基をもつ水不溶性高分
子物と光架橋剤(例えば、ジアゾ系感光剤、アジド系感
光剤あるいはエチレン状不飽和化合物等)からなる感光
層は、実用性のある事が示されている。中でも、ジアゾ
系感光剤と、前述の高分子物からなる感光層は、より実
用的で、特公昭35一16157号、特公昭47−11
67号、特公昭49−3961号、特公昭51−656
6号、特開昭50−30604号、米国特許第3、65
2、272号、米国特許第3、660、097号等に開
示されているものはその代表例である。この種の感光層
は、フォトレジストあるいは印刷版に使用されており、
とくに平版印刷版用においては必要欠くべからざる要素
となつている。感光層に紫外線を照射すると、照射部は
硬化あるいは分解し、現像液に対して溶解度が変化する
For example, as described in "Photosensitive Resin" by Tsunoda (Printing Society Publishing Department, published in 1972), water-insoluble polymers with hydrophilic groups and photocrosslinking agents (e.g., diazo photosensitizers, azide photosensitizers) It has been shown that a photosensitive layer made of an ethylenically unsaturated compound (or an ethylenically unsaturated compound, etc.) is practical. Among them, a photosensitive layer consisting of a diazo photosensitive agent and the above-mentioned polymer is more practical and is disclosed in Japanese Patent Publications No. 35-16157 and No. 47-11.
No. 67, Special Publication No. 49-3961, Special Publication No. 51-656
No. 6, JP-A No. 50-30604, U.S. Patent No. 3, 65
2,272, US Pat. No. 3,660,097, etc. are typical examples. This type of photosensitive layer is used in photoresists or printing plates,
In particular, it is an indispensable element for lithographic printing plates. When the photosensitive layer is irradiated with ultraviolet rays, the irradiated portions harden or decompose, and the solubility in the developer changes.

ネガティブフィルムからポジ画像を形成する上記の様な
感光層は、紫外線の照射により現像液に対する溶解性あ
るいは膨潤性が低下するために未照射部は除去され、照
射部は画像層として支持体上に残る。このような現像処
理を行つた後の画像層を印刷版として用いると、画像層
中に現像液が若干でも含まれるため、極端に印刷適正(
特に耐刷性)が低下する場合がある。従つて、印刷版と
しての感光層の印刷適性は、画像形成時に用いられる現
像液の組成に大きく左右される。
The above-mentioned photosensitive layer, which forms a positive image from a negative film, becomes less soluble or swellable in a developing solution when irradiated with ultraviolet rays, so the unirradiated areas are removed, and the irradiated areas are placed on the support as an image layer. remain. If the image layer after such development processing is used as a printing plate, the image layer will contain even a small amount of developer, resulting in extremely poor printing suitability (
In particular, printing durability) may be reduced. Therefore, the printability of the photosensitive layer as a printing plate is largely influenced by the composition of the developer used during image formation.

例えば未照射部の感光層を除去する場合に、感光層の膨
潤性の少ない現像液を用いると、画像層は強じんなもの
が得られるが、未照射部の感光層の除去に必要以上の時
間を要したり、除去物の画像層への付着、さらには版面
にスカムの発生等が起りやすい。また膨潤あるいは溶解
性が大なる現像液を用いた場合、未照射部の除去速度は
向上するが、現像あるいは現像後の水洗処理、ゴム処理
等で得られた画像層内に、印刷適性上好ましくない異物
が混入しやすい。従つて、前者の現像方法については、
上記の対策がなされねばならず、後者の方法においては
、画像層が現像処理によつて膨潤あるいは湿潤状態であ
つても、満足な印刷適性を得ることができる画像を形成
する様な現像液あるいは現像液組成物の開発が必要とな
る。一般的には、高沸点溶剤、例えばベンジルアルコー
ル、フルフリルアルコール、フエニルエチルア、ルコー
ル、DL−α−フェニルエチルアルコール等の高沸点ア
ルコール類が現像液組成物中に含有されていると上記の
効果が出ると云われているが、思つたより満足な印刷適
性が得られない。また、DOP,DBPあるいはリン化
合物の様な可塑剤は、版面上に汚れが生起する。本発明
者等は、上記の効果をもつ湿潤剤を種々検討した結果、
下記一般式に示した様なこの種の化合物が、現像液組成
物として好ましい事を見出し本発明に至つた。
For example, when removing the photosensitive layer in the unirradiated areas, if a developer with low swelling property of the photosensitive layer is used, a strong image layer can be obtained. It takes time, and the removed material tends to adhere to the image layer, and furthermore, scum is likely to occur on the plate surface. In addition, when a developer with high swelling or solubility is used, the removal rate of unirradiated areas is improved, but it is preferable for printing suitability in the image layer obtained by development or post-development water washing treatment, rubber treatment, etc. It is easy for foreign substances to get mixed in. Therefore, regarding the former developing method,
The above-mentioned measures must be taken, and in the latter method, a developer or Development of a developer composition is required. Generally, the above effects are achieved when a high boiling point solvent, for example, a high boiling point alcohol such as benzyl alcohol, furfuryl alcohol, phenylethyl alcohol, alcohol, or DL-α-phenylethyl alcohol is contained in the developer composition. It is said that it will be possible to print, but the printability is not as satisfactory as expected. Furthermore, plasticizers such as DOP, DBP, or phosphorus compounds cause stains on the plate surface. As a result of various studies on wetting agents having the above-mentioned effects, the present inventors found that
The present inventors discovered that this type of compound as shown in the general formula below is preferable as a developer composition, leading to the present invention.

すなわち本発明は、 一般式 〔式中、Rl,R2は水素または炭素数1〜2のアルキ
ル基;nは1〜3の整数〕を湿潤剤として含む現像液組
成物に関するものである。
That is, the present invention relates to a developer composition containing the general formula (wherein Rl and R2 are hydrogen or an alkyl group having 1 to 2 carbon atoms; n is an integer of 1 to 3) as a wetting agent.

本発明を代表する化合物は、一般式においてR,,R2
= H,n= 1.5〜 3の化合物(例えば、日本乳
化剤製;商品名フエニルグリコールPGH)である。
The compounds representing the present invention have the general formula R,,R2
= H, n = 1.5 to 3 (for example, Nippon Nyukazai; trade name: phenyl glycol PGH).

それ以外に、エチレングリコールモノフエニル(あるい
はトリル)エーテル、プロピレングリコールモノフエニ
ル(あるいはトリル)エーテル、ジエチレングリコール
モノフエニル(あるいはトリル)エーテル、ジプロピレ
ングリコールモノフエニル(あるいはトリル)エーテル
、トリエチレングリコールモノフエニル(あるいはトリ
ル)エーテル、トリプロピレングリコールモノフエニル
(あるいはトリル)エーテル等を挙げる事ができる。こ
れらの湿潤剤を配合する現像液組成としては、従来慣用
の組成を用いることができる。
In addition, ethylene glycol monophenyl (or tolyl) ether, propylene glycol monophenyl (or tolyl) ether, diethylene glycol monophenyl (or tolyl) ether, dipropylene glycol monophenyl (or tolyl) ether, triethylene glycol monophenyl (or tolyl) ether, Alternatively, tolyl ether, tripropylene glycol monophenyl (or tolyl) ether, etc. can be mentioned. As a developer composition containing these wetting agents, conventionally used compositions can be used.

すなわちこれらの湿潤剤を含む本発明の現像液組成物の
うち、酸性あるいは中性現像液としては、下記組成(単
位;重量%)またアルカリ性現像液としては、(単位:
重量%)) 等を主成物としてなる組成物が好ましい。
That is, among the developer compositions of the present invention containing these wetting agents, the acidic or neutral developer has the following composition (unit: weight %), and the alkaline developer has the following composition (unit:
% by weight)) etc. is preferred.

これらの現像液組成物は、親水性基(例えばヒドロキシ
基、エーテル基、アミド基、カルボン酸基、ウレタン基
、ユレア基等を例として挙げる事ができる。
These developer compositions contain hydrophilic groups (for example, hydroxyl groups, ether groups, amide groups, carboxylic acid groups, urethane groups, urea groups, etc.).

)をもつ水不溶性高分子物を含有する感光層に適用する
事ができる。この種の高分子物としては、エポキシ樹脂
、フエノール樹脂、ポリウレタン、親水性基を有するア
クリル樹脂あるいはその共重合体、スチレンと無水マレ
イン酸あるいはその部分エステル等の共重合体、ポリア
ミド、メチルビニルエーテルと無水マレイン酸の共重合
体、ポリユレア、ポリヒドロキシスチレン、ポリビニル
ブチラール、セラツク等を代表例として挙げる事ができ
る。実施例 1 2Sのアルミ板を苛性ソーダ100g、フツ化ソーダ1
yを溶解した80℃の水で洗浄後、硫酸電解液において
1分間陽極酸化した(電流密度2A/Dm2、電圧IO
V)。
) can be applied to photosensitive layers containing water-insoluble polymers. Examples of this type of polymer include epoxy resin, phenolic resin, polyurethane, acrylic resin having a hydrophilic group or its copolymer, copolymer of styrene and maleic anhydride or its partial ester, polyamide, methyl vinyl ether, etc. Representative examples include copolymers of maleic anhydride, polyurea, polyhydroxystyrene, polyvinyl butyral, and shellac. Example 1 A 2S aluminum plate was mixed with 100g of caustic soda and 1 of sodium fluoride.
After washing with water at 80°C in which y was dissolved, anodization was performed for 1 minute in a sulfuric acid electrolyte (current density 2A/Dm2, voltage IO
V).

よく水洗後、5%−メタケイ酸ソーダ水溶液(70℃)
に10秒間浸漬し、水洗して熱風乾燥した。得られたア
ルミ板に下記配合の感光液をホワイラ一を用いて塗布後
、80℃で3分間乾燥し、感光性印刷版を得た。
After washing well with water, add 5% sodium metasilicate aqueous solution (70℃)
The sample was immersed in water for 10 seconds, washed with water, and dried with hot air. A photosensitive liquid having the following composition was applied to the obtained aluminum plate using a whiter, and then dried at 80° C. for 3 minutes to obtain a photosensitive printing plate.

乾燥後の塗布量は、0.951/m”であつた。The coating amount after drying was 0.951/m''.

得られた感光性印刷版の感光層上にネガフイルムを真空
密着し、30A(アンペア)の単相カーボンマーク燈、
距離60CWLで1分間紫外線を照射後、下記配合の現
像液に室温で30秒間浸漬後水洗して印刷版を得た。、 この印刷版を印刷機にかけて印刷したところ画線部の感
脂性も良く、再現性の優れた印刷物5000枚が得られ
た。
A negative film was vacuum-adhered onto the photosensitive layer of the obtained photosensitive printing plate, and a 30A (ampere) single-phase carbon mark lamp was used.
After irradiating with ultraviolet rays at a distance of 60 CWL for 1 minute, the plate was immersed in a developer having the following composition at room temperature for 30 seconds and washed with water to obtain a printing plate. When this printing plate was printed using a printing press, 5,000 prints with good oil sensitivity in the image area and excellent reproducibility were obtained.

実施例 2〜9 実施例1と同様な方法を用いて、種々なる現像液を用い
比較検討した。
Examples 2 to 9 Using the same method as in Example 1, comparative studies were conducted using various developers.

Claims (1)

【特許請求の範囲】 1 一般式 ▲数式、化学式、表等があります▼ 〔式中、R_1、R_2は水素または炭素数1〜2のア
ルキル基;nは1〜3の整数〕を湿潤剤として含む現像
液組成物。
[Claims] 1 General formula▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, R_1 and R_2 are hydrogen or an alkyl group having 1 to 2 carbon atoms; n is an integer of 1 to 3] as a wetting agent. A developer composition comprising:
JP52154111A 1977-12-21 1977-12-21 developer composition Expired JPS5936256B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52154111A JPS5936256B2 (en) 1977-12-21 1977-12-21 developer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52154111A JPS5936256B2 (en) 1977-12-21 1977-12-21 developer composition

Publications (2)

Publication Number Publication Date
JPS5486328A JPS5486328A (en) 1979-07-09
JPS5936256B2 true JPS5936256B2 (en) 1984-09-03

Family

ID=15577156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52154111A Expired JPS5936256B2 (en) 1977-12-21 1977-12-21 developer composition

Country Status (1)

Country Link
JP (1) JPS5936256B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60237442A (en) * 1984-05-09 1985-11-26 Nippon Seihaku Kk Developer for photosensitive lithographic plate
CN103293881B (en) * 2013-05-24 2015-11-25 京东方科技集团股份有限公司 A kind of developer solution component is preparing the application in colored filter
CN104808436B (en) * 2014-01-27 2017-11-24 太阳油墨(苏州)有限公司 Alkali development-type photosensitive resin composition, dry film and solidfied material and printed circuit board (PCB)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6603058A (en) * 1966-03-09 1967-09-11
US3929489A (en) * 1973-09-14 1975-12-30 Eastman Kodak Co Lithographic plates having radiation sensitive elements developable with aqueous alcohol

Also Published As

Publication number Publication date
JPS5486328A (en) 1979-07-09

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