JPS5937760B2 - Surface treatment method using AC electrolytic plating - Google Patents
Surface treatment method using AC electrolytic platingInfo
- Publication number
- JPS5937760B2 JPS5937760B2 JP53130500A JP13050078A JPS5937760B2 JP S5937760 B2 JPS5937760 B2 JP S5937760B2 JP 53130500 A JP53130500 A JP 53130500A JP 13050078 A JP13050078 A JP 13050078A JP S5937760 B2 JPS5937760 B2 JP S5937760B2
- Authority
- JP
- Japan
- Prior art keywords
- plated
- surface treatment
- plating
- electrolytic plating
- objects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
【発明の詳細な説明】
この発明は、メッキ液中に浸漬した被メッキ物の少なく
とも一対に交流電流を通電し、両被メッキ物の表面で溶
解、電着を相互に繰り返させて表面を粗面化処理し、接
着性等を向上せしめた交流電解メッキによる表面処理方
法に関するものである。Detailed Description of the Invention This invention applies alternating current to at least one pair of objects to be plated immersed in a plating solution, and repeats melting and electrodeposition on the surfaces of both objects to roughen the surface. The present invention relates to a surface treatment method using AC electrolytic plating, which is subjected to surface treatment to improve adhesion and the like.
金属板例えば銅板等の接着性を向上させるにはその表面
が平滑であるよりはある程度粗面であることが必要とさ
れる。In order to improve the adhesion of a metal plate, such as a copper plate, the surface needs to be rough to some extent rather than smooth.
そこで、従来は金属の表面を粗面化する方法の一つとし
て、直流によるメッキ方法が提案されている。Therefore, a plating method using direct current has been proposed as one of the methods for roughening the surface of metal.
この方法によると、条件を最適に選ぶことで接着性の高
い表面処理が期待できるが、その反面、メッキを行うた
めに専用の電極を必要とすること、メッキの継続に伴な
つて電極の消耗がおこること、メッキの際の前処理とし
て脱脂等を完全にする必要があること、直流の高電流源
が印加されているため危険であること等の欠点がある。
また、メッキ方法としては、直流による場合の他に、最
近は交流を用いて、メッキ液中の金属イオンを活性化し
て析出を容易にした方法等が一部提案されているが、金
属表面の粗面化処理方法としては末だ全く試られていな
いのが現状である。本発明は、上述したような理由に鑑
み、金属表面を粗面化するにおいて、直流によるメッキ
方法に代えて交流電流を用いること、さらに電極をも不
用とする方法に関するものである。すなわち表面を粗面
化しようとする被メッキ物をメッキ液中に浸漬し、上記
被メッキ物の少なくとも一対に交流電流を通電し、両被
メッキ物の表面で溶解、電着を相互に繰り返させて表面
を粗面化処理し、もつて接着性を向上せしめた新規の表
面処理方法を提供せんとするものである。以下、本発明
方法を図面を参照して詳細に説明する。This method can be expected to produce a highly adhesive surface treatment by selecting the optimal conditions, but on the other hand, it requires a dedicated electrode for plating, and the electrode wears out as plating continues. There are disadvantages such as the need for complete degreasing as a pretreatment during plating, and the fact that it is dangerous because a high DC current source is applied.
In addition to direct current, some plating methods have recently been proposed in which alternating current is used to activate metal ions in the plating solution to facilitate deposition. At present, it has not been tried at all as a surface roughening treatment method. In view of the above-mentioned reasons, the present invention relates to a method of roughening a metal surface by using an alternating current instead of a direct current plating method, and which also eliminates the need for electrodes. That is, the object to be plated whose surface is to be roughened is immersed in a plating solution, an alternating current is applied to at least one pair of the objects to be plated, and melting and electrodeposition are repeated on the surfaces of both objects to be plated. The object of the present invention is to provide a new surface treatment method that roughens the surface and improves adhesiveness. Hereinafter, the method of the present invention will be explained in detail with reference to the drawings.
第1図は本発明方法により表面処理を行う装置の概略を
示す説明図であり、図において1はメッキ槽で、この槽
1内にメッキ液2が満してある。FIG. 1 is an explanatory diagram schematically showing an apparatus for surface treatment according to the method of the present invention. In the figure, 1 is a plating tank, and this tank 1 is filled with a plating solution 2.
このメッキ液2中にその表面を粗面化するための被メッ
キ物3a、3b例えば銅板等が所望間隔離間して設けて
あり、さらにこの被メッキ物3a、3bはトランス4を
介して交流電源に接続された構造をなしている。前記メ
ッキ液2は被メッキ物3a、3bの金属に対応して適宜
選定すればよい。Objects 3a and 3b to be plated, such as copper plates, for roughening the surface of the plating solution 2 are provided with a desired distance between the objects 3a and 3b. It forms a structure connected to the The plating solution 2 may be appropriately selected depending on the metal of the objects 3a, 3b to be plated.
また、上記被メツキ物3a,3bは一対の場合に限らず
、複数対のものを同時に行うようにしてもよい。その場
合はそれに対応した個数のトランス又は複数回路の有る
トランスを用いる必要がある。しかして、上記構造の表
面処理装置において、交流電流を両被メツキ物3a,3
bに通電しながらかかる被メツキ物3a.3bの表面の
粗面化処理を行うものである。Furthermore, the work to be plated is not limited to a single pair of objects 3a and 3b, but may be applied to a plurality of pairs at the same time. In that case, it is necessary to use a corresponding number of transformers or a transformer with multiple circuits. Therefore, in the surface treatment apparatus having the above structure, the alternating current is applied to both the objects to be plated 3a, 3.
The object to be plated 3a. 3b is subjected to surface roughening treatment.
この場合、通電する交流電流の波形は正弦波、方形波、
三角波等、何れのものでもよい。例えば、第2図に示す
ように正弦波5を例にとると、被メツキ物3a,3bに
おける溶解、電着の相互サイクルはプラス電位部分(I
XI)では被メツキ物3aは溶解し、他方の被メツキ物
3bに電着し、逆に、マイナス電位部分(川X)では被
メツキ物3aに電着し、他方の被メツキ物3bは溶解し
て行なわれる。この際の初期の溶解時には金属表面の一
種の清浄化がスムーズに行なわれる。そして、この溶解
、電着が相互に行なわれる結果、金属表面の粗面化が次
第に粗く行なわれることになり、接着性のよい理想的な
粗面を得ることができる。また、このように溶解と電着
が相互に繰り返して行なわれるため、被メツキ物3a,
3bの金属自体の質量的な損耗、増加等は全くなく、外
部から何等補充する必要はない。また、通電゛−j【両
D4−?舒羨特に限定されない。しかし低周波数のもの
を選べば靜電容量による無効電力も少くなるため電力使
用効率を直流時の効率に近づけることができるので望ま
しい。尚、本発明においては、一般の交流電源を用いる
他に、交流発生器さらには増幅器を表面処理装置に接続
して行うようにしてもよい。In this case, the waveform of the alternating current applied is a sine wave, square wave,
Any waveform such as a triangular wave may be used. For example, if we take the sine wave 5 as shown in FIG.
In XI), the object to be plated 3a is melted and electrodeposited on the other object to be plated 3b, and conversely, in the negative potential part (river It is done as follows. During the initial melting, a kind of cleaning of the metal surface is carried out smoothly. As a result of this mutual dissolution and electrodeposition, the metal surface is gradually roughened, and an ideal rough surface with good adhesion can be obtained. Moreover, since melting and electrodeposition are performed repeatedly in this way, the object to be plated 3a,
There is no loss or increase in the mass of the metal 3b itself, and there is no need to replenish it from the outside. Also, energize ゛-j [both D4-? Shu Xian is not particularly limited. However, if a low frequency one is selected, the reactive power due to static capacitance will be reduced, and the power usage efficiency can be brought close to that of direct current, which is desirable. In addition, in the present invention, in addition to using a general AC power supply, an AC generator or even an amplifier may be connected to the surface treatment apparatus.
以上説明した如く本発明に係る交流電解メツキによつて
表面処理を行なえば、金属表面を粗面化して接着性を向
上させるにおいて、従来、直流電解によつていた方法に
比べて、専用の電極を必要とせず装置全体が簡単である
こと、被メツキ物自体の質量的損粍、増加等がなく経済
的であること、電解の初期における溶解作用が一種の清
浄作用として機能するため脱脂等の前処理が不要である
こと、交流の場合、高電流源を印加する必要がないため
危険性が少ないこと等の種々の利点があつて、しかも製
品表面の仕上りが均一に粗面化されるという利点もある
。As explained above, if surface treatment is performed by AC electrolytic plating according to the present invention, it is possible to roughen the metal surface and improve adhesion, compared to the conventional method using DC electrolysis. The entire device is simple as it does not require electrodes, it is economical as there is no loss or increase in the mass of the object to be plated, and the dissolution action at the initial stage of electrolysis functions as a kind of cleaning action, making it suitable for degreasing, etc. It has various advantages such as no pre-treatment is required, and in the case of AC, it is less dangerous because there is no need to apply a high current source, and the product surface is evenly roughened. There is also an advantage.
第1図は本発明方法を適用して有用な表面処理装置の概
略を示した説明図、第2図は上記装置における被メツキ
物表面での溶解、電着の相互サイクルを示した説明図で
ある。
1・・・・・・メツキ槽、2・・・・・・メツキ液、3
a,3b・・・・・・被メツキ物、4・・・・・・トラ
ンス。Fig. 1 is an explanatory diagram showing the outline of a useful surface treatment device applying the method of the present invention, and Fig. 2 is an explanatory diagram showing the mutual cycle of dissolution and electrodeposition on the surface of the object to be plated in the above device. be. 1...Plating tank, 2...Plating liquid, 3
a, 3b... object to be plated, 4... transformer.
Claims (1)
に浸漬し、上記被メッキ物の少なくとも一対に交流電流
を通電し、両被メッキ物の表面で溶解、電着を相互に繰
り返させて表面を粗面化処理するようにしたことを特徴
とする交流電解メッキによる表面処理方法。1. The object to be plated whose surface is to be roughened is immersed in a plating solution, an alternating current is applied to at least one pair of the objects to be plated, and melting and electrodeposition are repeated on the surfaces of both objects to be plated. A surface treatment method using AC electrolytic plating, characterized in that the surface is roughened using AC electrolytic plating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53130500A JPS5937760B2 (en) | 1978-10-25 | 1978-10-25 | Surface treatment method using AC electrolytic plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53130500A JPS5937760B2 (en) | 1978-10-25 | 1978-10-25 | Surface treatment method using AC electrolytic plating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5558389A JPS5558389A (en) | 1980-05-01 |
| JPS5937760B2 true JPS5937760B2 (en) | 1984-09-11 |
Family
ID=15035747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53130500A Expired JPS5937760B2 (en) | 1978-10-25 | 1978-10-25 | Surface treatment method using AC electrolytic plating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5937760B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3916586B2 (en) * | 2003-05-16 | 2007-05-16 | 株式会社三井ハイテック | Lead frame plating method |
| JP5323677B2 (en) * | 2007-03-02 | 2013-10-23 | 古河電気工業株式会社 | Method and apparatus for producing surface roughened copper plate, and surface roughened copper plate |
-
1978
- 1978-10-25 JP JP53130500A patent/JPS5937760B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5558389A (en) | 1980-05-01 |
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