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JPS5939852B2 - Ion generation and focusing device - Google Patents
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JPS5939852B2 - Ion generation and focusing device - Google Patents

Ion generation and focusing device

Info

Publication number
JPS5939852B2
JPS5939852B2 JP57081641A JP8164182A JPS5939852B2 JP S5939852 B2 JPS5939852 B2 JP S5939852B2 JP 57081641 A JP57081641 A JP 57081641A JP 8164182 A JP8164182 A JP 8164182A JP S5939852 B2 JPS5939852 B2 JP S5939852B2
Authority
JP
Japan
Prior art keywords
magnetic field
electrode
period
electron beam
reference plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57081641A
Other languages
Japanese (ja)
Other versions
JPS58198844A (en
Inventor
梧楼 宮本
賀都鴻 影山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57081641A priority Critical patent/JPS5939852B2/en
Publication of JPS58198844A publication Critical patent/JPS58198844A/en
Publication of JPS5939852B2 publication Critical patent/JPS5939852B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/14Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Description

【発明の詳細な説明】 〔発明の属する技術分野〕 本発明はイオン発生収束装置に係り、就中質量分析装置
及び一定の質量の粒子の密度の測定装置として使用する
に適するイオン発生収束装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical field to which the invention pertains] The present invention relates to an ion generation and focusing device, and more particularly to an ion generation and focusing device suitable for use as a mass spectrometer and a device for measuring the density of particles of a constant mass. .

〔従来技術及びその問題点〕[Prior art and its problems]

真空装置内の気体、蒸気の構成は質量分析装置で測定さ
れるが、一定の質量の粒子の密度の測定にはこの質量分
析装置を用いて着目する質量の粒子だけについて行われ
ることが多かつた。
The composition of gas and vapor in a vacuum device is measured using a mass spectrometer, but this mass spectrometer is often used to measure the density of particles of a certain mass. Ta.

質量分析装置の代表的なものとして、四極子マスフィル
タ及び磁場偏向形のものがある。四極子マスフィルタは
微小な直流電流を増幅して測定しているが増幅率がドリ
フトし易く、定量分析には熟練を要し、しかも磁場が存
在する場所では使用できないという欠点がある。磁場偏
向形は生成されるイオンビームが偏向されるので設置に
大きな空間が必要であること、また強い磁場が存在する
場所では使用が困難である、という欠点があつた。〔発
明の目的〕 この発明の主たる目的は第一に、小形で取扱いに熟練を
要しない質量分析装置を提供すること、第二に強い磁場
が存在する場所で使用できる質量分析装置を提供するこ
と、にある。
Typical mass spectrometers include a quadrupole mass filter and a magnetic field deflection type. Quadrupole mass filters amplify and measure minute direct currents, but have the disadvantage that the amplification factor tends to drift, that quantitative analysis requires skill, and that they cannot be used in locations where a magnetic field is present. The magnetic field deflection type has the disadvantage that the generated ion beam is deflected, requiring a large space for installation, and that it is difficult to use in places where a strong magnetic field exists. [Objects of the Invention] The main objects of this invention are, first, to provide a mass spectrometer that is small and does not require skill to handle, and second, to provide a mass spectrometer that can be used in places where strong magnetic fields exist. ,It is in.

この質量分析装置として使用するイオン発生収束装置は
一定の質量の粒子の密度の測定装置として用いることも
できるだけでなく、イオンを発生させそれを一定の場所
へ収束させることによつてもたらされる効果を利用する
全ての装置に適用できることはいうまでもなく、かかる
広範囲の応用を可能にすることも本発明の目的である。
〔発明の概要〕 電子ビームを短時間入射して空間に存在する中性粒子を
イオン化し、発生したイオンを収束部電極内で時間的、
空間的に収束できるようにしてイオン発生収束装置を実
現し、電子ビーム電流のパルスの周期Tにあわせて、そ
の整数分の一の周期信号の大きさを検出できるようにし
、周期Tを変化させて質量分析を行えるようにし、周期
Tを一定にして一定の質量の粒子の密度測定を行えるよ
うにし、もつて発明の目的を達成した。
This ion generation and focusing device used as a mass spectrometer can not only be used as a device to measure the density of particles of a certain mass, but also to measure the effect brought about by generating ions and focusing them on a certain place. Needless to say, it is an object of the present invention to be applicable to all the devices used, and to enable such a wide range of applications.
[Summary of the invention] Neutral particles existing in space are ionized by entering an electron beam for a short time, and the generated ions are temporally and
An ion generation and focusing device is realized by enabling spatial focusing, and the magnitude of a periodic signal that is an integer fraction of the pulse period T of the electron beam current can be detected, and the period T is changed. The object of the invention has been achieved by making it possible to perform mass spectrometry using a constant period T and measuring the density of particles of a constant mass.

〔発明の実施例〕[Embodiments of the invention]

本発明のイオン発生収束装置の構成を、質量分析装置と
して実施した例をもとに説明する。
The configuration of the ion generation and focusing device of the present invention will be explained based on an example implemented as a mass spectrometer.

第1図は本発明の一実施例である質量分析装置主要部構
成説明図で、一部を断面図で示してある。Z軸は図示さ
れない磁場発生装置が発生する磁場の方向と平行で、こ
のZ軸上の点′O(Z−0)では磁場は強い。1はZ軸
と一致する軸を有する貫通孔2を有する収束部電極で、
該貫通孔2の中心はZ軸上の点0に一致している。
FIG. 1 is an explanatory diagram of the configuration of the main parts of a mass spectrometer which is an embodiment of the present invention, and a part thereof is shown in a sectional view. The Z-axis is parallel to the direction of a magnetic field generated by a magnetic field generator (not shown), and the magnetic field is strong at a point 'O (Z-0) on this Z-axis. 1 is a converging part electrode having a through hole 2 having an axis that coincides with the Z axis;
The center of the through hole 2 coincides with point 0 on the Z axis.

平面Z=0は基準面で磁場に垂直であり後述の電位分布
の基準となる。3は電子ビーム入射電極で、その貫通孔
の直径の小さい部分のZ軸に垂直な平面A(Z=Za)
は空間を画定する面の一部をなし、4はイオン反射電極
で、入射したイオンを電極8内にため込みその大きさを
増加させるもので、点0側の表面に近いZ軸に垂直な平
面B(Z=Zb)は空間を画定する面の他の一部を為す
The plane Z=0 is a reference plane, which is perpendicular to the magnetic field, and serves as a reference for the potential distribution described later. 3 is an electron beam incidence electrode, and the plane A (Z=Za) perpendicular to the Z axis of the small diameter part of the through hole
is a part of the surface that defines the space, and 4 is an ion reflecting electrode that traps incident ions in the electrode 8 and increases its size. Plane B (Z=Zb) forms another part of the plane that defines the space.

電子ビーム入射電極3の貫通孔の直径の小さい部分の直
径を2Rとしたとき、Z軸から距離Rの点はZ軸を軸と
する半径Rの円筒を構成し、半径Rの円筒と二つの平面
A及びBで包囲される円柱状空間が、本発明で利用され
る画定された空間である。5及び6は遮蔽電極でそれぞ
れZ軸に一致する軸を有する貫通孔を有し、この遮蔽電
極5,6の貫通孔の直径は本実施例では収束部電極1の
貫通孔2の直径と等しく、該画定された円柱状空間の直
径2Rより大きい。
When the diameter of the small diameter portion of the through hole of the electron beam incidence electrode 3 is 2R, a point at a distance R from the Z axis constitutes a cylinder with a radius R centered on the Z axis, and a cylinder with a radius R and two The cylindrical space surrounded by planes A and B is the defined space utilized in the present invention. 5 and 6 are shield electrodes each having a through hole having an axis that coincides with the Z axis, and the diameter of the through hole of the shield electrodes 5 and 6 is equal to the diameter of the through hole 2 of the convergence electrode 1 in this embodiment. , is larger than the diameter 2R of the defined cylindrical space.

特に遮蔽電極6は入射したイオンが貫通孔2を通過する
ときの収束部電極1に生じる信号を鋭くし、さらに電源
等から入るノイズを抑制するものである。7,8は電位
分布形成電極で、それぞれ互に相等しい直径のZ軸に一
致する軸を有する貫通孔を有する要素電極7a〜71,
8a〜81で構成される。
In particular, the shielding electrode 6 sharpens the signal generated at the convergence electrode 1 when the incident ions pass through the through hole 2, and further suppresses noise coming from a power source or the like. Reference numerals 7 and 8 denote potential distribution forming electrodes, and element electrodes 7a to 71 each have through holes having mutually equal diameters and having axes that coincide with the Z axis.
Consists of 8a to 81.

この要素電極7a〜71,8a〜81の貫通孔の直径は
遮蔽電極5,6の貫通孔の直径より大きい。5は分圧器
で、それぞれコンデンサと抵抗器の並列接続で構成され
る分圧要素9a〜92を直列接続して構成される。
The diameters of the through holes of the element electrodes 7a to 71 and 8a to 81 are larger than the diameters of the through holes of the shield electrodes 5 and 6. Reference numeral 5 denotes a voltage divider, which is constructed by connecting voltage dividing elements 9a to 92 in series, each consisting of a capacitor and a resistor connected in parallel.

分圧器の両端すなわち分圧要素9a,91のそれぞれ他
の分圧要素9b,9kに接続されない側の一端は、それ
ぞれ端子10の接点10a及び101に接続され、この
端子10には図示されない電源から直流電圧が印加され
る。イオン反射電極4、電子ビーム入射電極3、電位分
布形成電極7,8の各要素電極7a〜71,8a〜81
、及び遮蔽電極5,6はそれぞれ通電された分圧器丑の
各点に接続されて定まつた電位を与えられ、収束部電極
1はトランス11の一次捲線を介して分圧器の一端すな
わち端子10の接点101に接続され、直流的に定まつ
た電位を与えられる。各電極1,3,4,5,6,L,
旦は、この画定された空間内の各点に、基準面から磁場
の方向に測つた距離の自乗に実質的に比例する電位差を
、収束部電極との間に形成する。すなわち、画定された
規間の任意の点の電位Vは、その点のZ座標で定まり、
=(z)とあられすことができて、かつ、各電極の電位
を適切に定めることにより、とあられせるようになされ
ている。
Both ends of the voltage divider, that is, one end of the voltage dividing elements 9a, 91 that are not connected to the other voltage dividing elements 9b, 9k, are connected to contacts 10a and 101 of a terminal 10, respectively, and this terminal 10 is connected to a power source (not shown). A DC voltage is applied. Elemental electrodes 7a to 71, 8a to 81 of the ion reflection electrode 4, the electron beam incidence electrode 3, and the potential distribution forming electrodes 7 and 8
, and shield electrodes 5 and 6 are connected to each point of the energized voltage divider and given a fixed potential, and the convergence electrode 1 is connected to one end of the voltage divider, that is, the terminal 10, through the primary winding of the transformer 11. It is connected to the contact point 101 of , and is given a fixed potential in direct current. Each electrode 1, 3, 4, 5, 6, L,
At each point within this defined space, a potential difference is created between the converging part electrode and the converging part electrode, which is substantially proportional to the square of the distance measured from the reference plane in the direction of the magnetic field. In other words, the potential V at any point in the defined interval is determined by the Z coordinate of that point,
= (z), and can be made to occur by appropriately setting the potential of each electrode.

kは正の定数である。この第1式に示されるような電位
分布が電位分布形成電極1,旦によつて作られるのであ
る。12は電子銃で、画定された空間の磁場方向の一つ
の端部である平面Aを形成する電子ビーム入射電極3の
近傍に配設され、この画定された空間内に磁場と平行な
パルス電子ビームを入射するものである。
k is a positive constant. A potential distribution as shown in the first equation is created by the potential distribution forming electrode 1. Reference numeral 12 denotes an electron gun, which is disposed near the electron beam incidence electrode 3 forming a plane A, which is one end in the magnetic field direction of a defined space, and emits pulsed electrons parallel to the magnetic field within this defined space. The beam is incident on the beam.

電子ビーム入射電極3は電子銃12の陽極を兼ねる。1
2aはヒータ12bに加熱される陰極、12cは電子ビ
ームをオンオフする制御電極で、図示されない電子ビー
ム制御電源の出力は端子13に供給されて、陰極12a
と制御電極12cの間に印加される。
The electron beam incidence electrode 3 also serves as an anode of the electron gun 12. 1
2a is a cathode heated by a heater 12b, 12c is a control electrode that turns on and off the electron beam, and the output of an electron beam control power source (not shown) is supplied to a terminal 13, and the cathode 12a is heated by a heater 12b.
and the control electrode 12c.

かくして構成された本発明のイオン発生収束装置の作用
効果をその実施例である第1図に示す質量分析装置を参
照して説明する。磁場は画定された空間内で実質的に一
様で、強さは約0.1Tである。
The effects of the ion generation and focusing device of the present invention thus constructed will be explained with reference to the mass spectrometer shown in FIG. 1, which is an embodiment thereof. The magnetic field is substantially uniform within the defined space and has a strength of approximately 0.1T.

電子は時刻t=0からtτoの間で画定された空間に入
射する。電子銃の陰極12aの電位は収束部電極1の電
位より高くとられており、電子ビーム入射電極3から入
射した電子は収束部電極1の手前で反射されて電子銃1
2へ逆戻りする。電子はその運動の過程で空間に存在す
る気体分子等の中性粒子をイオン化する。生成されたイ
オンは入射電子が存在する短い時間(約2τo)ではほ
とんど加速されず、その速度は実質的に零であるから、
同時刻t−0に全てのイオンが作られたと考えてよい。
磁場に垂直な方向の運動は磁場により抑制される。イオ
ンの運動の磁場方向成分は、第(1)式で与えられる電
場、E=−d/DZ=−KZで定まり、その運動式程式
は、 D2Z/Dt2−EE/m=(−Ek/m)・Z・・・
(2)である。
Electrons enter a space defined between time t=0 and tτo. The potential of the cathode 12a of the electron gun is set higher than the potential of the converging part electrode 1, and the electrons incident from the electron beam incidence electrode 3 are reflected in front of the converging part electrode 1, and the electrons enter the electron gun 1.
Go back to 2. In the process of their movement, electrons ionize neutral particles such as gas molecules existing in space. The generated ions are hardly accelerated during the short period of time when the incident electrons exist (approximately 2τo), and their velocity is essentially zero, so
It can be considered that all the ions are created at the same time t-0.
Motion perpendicular to the magnetic field is suppressed by the magnetic field. The magnetic field direction component of the ion's motion is determined by the electric field given by equation (1), E=-d/DZ=-KZ, and the motion equation is: D2Z/Dt2-EE/m=(-Ek/m )・Z...
(2).

ここでe及びmはそれぞれイオンの電荷及び質量である
。t−0でZ=ZO,dZ/Dt=0であるイオンの運
動は、第(2)式を解いて、Z=ZOcOs(ωt),
ω=/『じて『・・・・・・ (3)で表わされる。イ
オンは、電(3)式より、t=τ1、τ,=π/2ω
・・・・・・・・・・山・・・・・・・・ (
4)で全てZ−0となることがわかる。すなわちt一O
に生成されたイオンは、画定された空間内であればその
生成された位置に無関係にZ=Oすなわち基準面の収束
部電極1の内部に第(4)式で与えられる時刻τ,に於
て集束する。イオンは時刻τ1以後も引続いて運動し、
第(3),(4)式より明らかな如く時刻t=2τ1に
於て、位置は−ZOとなり、速度は零となる。以後イオ
ンは気体分子等との衝突により、運動の規束性は徐々に
乱されるが、それまでの間に時刻t=3τ1,5τ1,
・・・に於てZ−0すなわち基準面の収束部電極1の内
部に集束される。収束電極1には、Ti=2τ1−π/
ωの周期で、イオンの作る空間電荷に誘起された電位が
生じ、トランス11の一次捲線には周期Tiの交流電圧
が印加される。トランス11の三次捲線には端子14が
接続され、この端子14に周期Tiにあわせて、その整
数分の一(1/1を含む)の周期の信号の大きさを検出
する手段を接続することにより、信号の大きさに比例す
るイオンの量を知ることができる。電子ビームを入射す
る時間をt−0〜τ0,Ti〜Ti+τ0,2Ti〜2
Ti+τ0,・・・と、周期Tiのパルスにすることに
よつて、時刻τ1,Ti+τ1,2Ti+τ1,・・・
に於て収束部電極1の内部に集束されるイオンの量を増
加させることができ、その結果端子14にあられれる周
期Tlの信号の大きさを増加させることができる。
Here, e and m are the charge and mass of the ion, respectively. The motion of an ion with Z=ZO and dZ/Dt=0 at t-0 can be determined by solving equation (2) and calculating Z=ZOcOs(ωt),
ω=/'... It is expressed as (3). From equation (3), t=τ1, τ,=π/2ω
··········Mountain········ (
It can be seen that all the values are Z-0 in 4). That is, t1O
As long as the ions generated in and focus. The ions continue to move after time τ1,
As is clear from equations (3) and (4), at time t=2τ1, the position becomes -ZO and the velocity becomes zero. After that, the regularity of the motion of the ions is gradually disturbed due to collisions with gas molecules, etc., but until then, the ions change at times t=3τ1, 5τ1,
. . . is focused inside the convergence electrode 1 at Z-0, that is, the reference plane. The focusing electrode 1 has Ti=2τ1−π/
A potential induced in the space charge created by the ions is generated with a period of ω, and an alternating current voltage with a period Ti is applied to the primary winding of the transformer 11. A terminal 14 is connected to the tertiary winding of the transformer 11, and to this terminal 14, a means for detecting the magnitude of a signal with a period that is an integer fraction (including 1/1) of the period Ti is connected. Therefore, it is possible to know the amount of ions that is proportional to the magnitude of the signal. The electron beam input time is t-0~τ0, Ti~Ti+τ0, 2Ti~2
By making pulses with period Ti such as Ti+τ0,..., time τ1, Ti+τ1, 2Ti+τ1,...
In this case, the amount of ions focused inside the focusing section electrode 1 can be increased, and as a result, the magnitude of the signal with the period Tl appearing at the terminal 14 can be increased.

Ti=π/ωであり、ωは第(3)式で与えられるから
、Ti=πV?77「 ・・・・・・・・・・・
・・・・ (5)である。
Since Ti=π/ω and ω is given by equation (3), Ti=πV? 77 “・・・・・・・・・・・・
...(5).

電子ビーム電流のパルスの周期をTとし収束部電極から
トランス11を介して検出される周期Tの整数分の一の
周期の信号の大きさを検出すれば、T=Tiであるイオ
ン、すなわち、m/e=K(T/π)2 ・・・
・・・・・・・・・・・・ (6)の条件を満たすイオ
ンの量が検出できる。本発明は第(1)式のkの値を制
限するものではないが、一例としてk=1×106ボル
ト/平方メートルとしてよい。この時、例えばH+,H
2+,He+はm/eがそれぞれ1604×10−8,
2.09×10−84.17×10−8(単位はキログ
ラム/クーロン)であるから、対応する周期Tはそれぞ
れ、0.32μS9O.45μS,O.64μsとなる
。本発明のイオン発生収束装置の全体構成は、第2図に
示すように、真空容器15の中に各電極が収納配置され
、この容器15の外周にはイオンビームを保持する空心
コイル16が設けられ、その一端には質量分析用の気体
の取り入れ口のフランジ17および内部の各電極に給電
するための電気フイードスル一18が設けられ、他端は
真空ポンプ、電子銃電源などが設けられている。この容
器15の内部には、各電極を絶縁スペーサ19で間隔を
有して絶縁され電極支持棒20で各々保持され、各電極
に接続されているリード線21などで構成されている電
極構造体が、図示しない支持部で支持されている。〔発
明の効果〕 本発明の効果の一つは、パルス電子ビームを入射する手
段が入射する電子ビーム電流のパルスの周期Tを変化さ
せ、収束部電極には周期Tの整数分の一の周期の信号の
大きさを検出する手段を接続して、第(6)式によりT
の変化にともない、検出されるイオンのm/eが変化す
ることを利用して質量分析装置として使用できることで
ある。
If the pulse period of the electron beam current is T, and the magnitude of the signal with a period that is an integer fraction of the period T detected from the converging part electrode via the transformer 11 is detected, ions with T=Ti, that is, m/e=K(T/π)2...
・・・・・・・・・・・・ The amount of ions satisfying the condition (6) can be detected. Although the present invention does not limit the value of k in equation (1), it may be set to k=1×10 6 volts/square meter as an example. At this time, for example, H+, H
2+ and He+ have m/e of 1604×10−8, respectively.
2.09×10−84.17×10−8 (in kilograms/coulomb), so the corresponding period T is 0.32μS9O. 45 μS, O. It becomes 64 μs. As shown in FIG. 2, the overall configuration of the ion generation and focusing device of the present invention is such that each electrode is housed in a vacuum container 15, and an air-core coil 16 for holding the ion beam is provided around the outer periphery of the container 15. One end is provided with a flange 17 for a gas intake for mass spectrometry and an electric feedthrough 18 for supplying power to each electrode inside, and the other end is provided with a vacuum pump, an electron gun power source, etc. . Inside this container 15, there is an electrode structure including lead wires 21, etc., each of which is insulated with an insulating spacer 19 at intervals, held by an electrode support rod 20, and connected to each electrode. is supported by a support section (not shown). [Effects of the Invention] One of the effects of the present invention is that the means for injecting a pulsed electron beam changes the period T of the pulse of the incident electron beam current, and the converging part electrode has a period that is an integer fraction of the period T. By connecting a means for detecting the magnitude of the signal of T
It can be used as a mass spectrometer by taking advantage of the fact that the m/e of detected ions changes with the change in .

かかる質量分析装置は小形であり、取扱いに熟練を要し
ないものである。また強い磁場が存在する場所で使用で
きることは言うまでもなく、本発明では磁場はイオンの
散逸を防ぐ働きをしているので、強い磁場を発生する磁
場発生装置をそのまま本発明を構成する磁場発生装置と
して利用してよい。本発明の他の効果は、入射電子ビー
ムパルスの周期Tを一定とし、第(6)式で定まる一定
のm/eのイオンの量を検出できることである。このと
き、収束部電極の信号は一定とされた周期Tの整数分の
一の周期の信号の大きさを検出する。斯様な構成により
、例えば真空容器内の特定の種類の残留気体の密度の変
化を検出でき、それを応用して、プローブガスを用いた
真空容器のりークテストを行うことも可能である。
Such a mass spectrometer is small and requires no skill to handle. In addition, it goes without saying that it can be used in places where a strong magnetic field exists, and since the magnetic field in the present invention works to prevent ions from dissipating, the magnetic field generator that generates a strong magnetic field can be used as it is as a magnetic field generator that constitutes the present invention. You may use it. Another effect of the present invention is that the period T of the incident electron beam pulse is kept constant, and the amount of ions with a constant m/e determined by equation (6) can be detected. At this time, the magnitude of the signal of the convergence part electrode is detected at a period that is an integer fraction of the period T, which is kept constant. With such a configuration, it is possible to detect, for example, a change in the density of a specific type of residual gas in the vacuum container, and by applying this, it is also possible to perform a leak test of the vacuum container using a probe gas.

本発明は上述のような目的に使用されるだけでなく、イ
オンを発生させそれを一定の場所へ収束させることによ
つてもたらされる効果を利用する全ての装置に適用でき
ることは言うまでもない。
It goes without saying that the present invention can be used not only for the above-mentioned purposes, but also for any device that utilizes the effect produced by generating ions and converging them onto a fixed location.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例である質量分析装置主要部構
成説明図、第2図は本願発明の一実施例を示す一部切欠
斜視図である。 1・・・・・・収束部電極、2・・・・・・収束部電極
1の貫通孔、3・・・・・・電子ビーム入射電極、4・
・・・・・イオン反射電極、5,6・・・・・・遮蔽電
極、I,8.・・・・・・電位分布形成電極、旦・・・
・・・分圧器、1』,1−3,1−4・・・・・・端子
、11・・・・・・トランス、12・・・・・・電子銃
FIG. 1 is an explanatory diagram of the main parts of a mass spectrometer according to an embodiment of the present invention, and FIG. 2 is a partially cutaway perspective view showing an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Convergence part electrode, 2... Through hole of convergence part electrode 1, 3... Electron beam incidence electrode, 4.
...Ion reflecting electrode, 5,6... Shielding electrode, I,8.・・・・・・Potential distribution forming electrode, dan...
... Voltage divider, 1'', 1-3, 1-4 ... terminal, 11 ... transformer, 12 ... electron gun.

Claims (1)

【特許請求の範囲】 1 磁場発生装置と、この磁場発生装置が発生する磁場
内に配設されかつ発生する磁場方向に貫通孔を有する収
束部電極と、この収束部電極の貫通孔内に磁場に垂直な
一平面を基準面とし、この基準面により画定された空間
内の各点に前記基準面から前記磁場の方向に測つた距離
の自乗に実質的に比例する電位差を前記収束部電極との
間に形成する手段と、前記画定された空間の前記磁場方
向の少なくとも一つの端部の近傍に配設され、前記基準
面として画定された空間内に前記磁場と平行なパルス電
子ビームを入射する手段とを具備してなることを特徴と
するイオン発生収束装置。 2 パルス電子ビームを入射する手段を入射する電子ビ
ーム電流のパルスの周期Tを変化させるよう構成し、収
束部電極に周期Tの整数分の一の周期の信号の大きさを
検出する手段を接続してなることを特徴とする特許請求
の範囲第1項記載のイオン発生収束装置。
[Scope of Claims] 1. A magnetic field generator, a convergence electrode disposed within a magnetic field generated by the magnetic field generation device and having a through hole in the direction of the generated magnetic field, and a convergence part electrode that has a magnetic field in the through hole of the convergence part electrode. A plane perpendicular to the reference plane is used as a reference plane, and a potential difference substantially proportional to the square of the distance measured from the reference plane in the direction of the magnetic field is applied to each point in the space defined by this reference plane with the converging part electrode. and a means for forming a pulsed electron beam parallel to the magnetic field into the space defined as the reference plane, which is disposed near at least one end of the defined space in the direction of the magnetic field. An ion generation and convergence device characterized by comprising means for. 2. The means for injecting a pulsed electron beam is configured to change the period T of the pulse of the incident electron beam current, and the means for detecting the magnitude of a signal with a period that is an integer fraction of the period T is connected to the converging part electrode. An ion generation and focusing device according to claim 1, characterized in that:
JP57081641A 1982-05-17 1982-05-17 Ion generation and focusing device Expired JPS5939852B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57081641A JPS5939852B2 (en) 1982-05-17 1982-05-17 Ion generation and focusing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57081641A JPS5939852B2 (en) 1982-05-17 1982-05-17 Ion generation and focusing device

Publications (2)

Publication Number Publication Date
JPS58198844A JPS58198844A (en) 1983-11-18
JPS5939852B2 true JPS5939852B2 (en) 1984-09-26

Family

ID=13751961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57081641A Expired JPS5939852B2 (en) 1982-05-17 1982-05-17 Ion generation and focusing device

Country Status (1)

Country Link
JP (1) JPS5939852B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123154A (en) * 1982-12-29 1984-07-16 Shimadzu Corp Time-of-flight mass spectrometer

Also Published As

Publication number Publication date
JPS58198844A (en) 1983-11-18

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