JPS5940308B2 - pressure sensitive element - Google Patents
pressure sensitive elementInfo
- Publication number
- JPS5940308B2 JPS5940308B2 JP6510177A JP6510177A JPS5940308B2 JP S5940308 B2 JPS5940308 B2 JP S5940308B2 JP 6510177 A JP6510177 A JP 6510177A JP 6510177 A JP6510177 A JP 6510177A JP S5940308 B2 JPS5940308 B2 JP S5940308B2
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- single crystal
- sensitive element
- semiconductor strain
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
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- Pressure Sensors (AREA)
- Measuring Fluid Pressure (AREA)
Description
【発明の詳細な説明】
本発明は例えばSi、Geなどの単結晶に不純物を拡散
した半導体ストレンゲージの出力直線性の改善を図つた
感圧素子に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a pressure-sensitive element that improves the output linearity of a semiconductor strain gauge in which impurities are diffused into a single crystal such as Si or Ge.
第1図は従来の感圧素子を示し、1は基板2に保持され
たSi、Geなどの半導体で形成された異方向性単結晶
であつて、これの受圧面の一部がエッチングにより切り
欠かれて円形凹部1aを形成している。FIG. 1 shows a conventional pressure-sensitive element, in which 1 is an anisotropic single crystal made of a semiconductor such as Si or Ge held on a substrate 2, and a part of the pressure-receiving surface of this is cut out by etching. It is cut out to form a circular recess 1a.
これは所定の感度を得る点と、圧力Poを加えた時の出
力抵抗変化の直線性を良くする点を考慮して薄くしたも
のである。さらに、異方向性単結晶1の上側には半導体
スト1ノンゲージ3、τがIC製造技術の手法によつて
拡散され拡散抵抗層を形成している。而して、例えばn
形Siの異方向性単結晶1の<100(結晶方向)>結
晶面に拡散抵抗層を形成した場合、その各抵抗層の圧力
変化に対する抵抗変化率△R/Rは、
△Rp/Rp■一(1−ν)←「)−4(−)2
△Rn/Rn■−に(1−ν)(プπ44(−2)2と
なる。This is made thin in consideration of obtaining a predetermined sensitivity and improving the linearity of output resistance change when pressure Po is applied. Further, on the upper side of the anisotropic single crystal 1, a semiconductor layer 1, non-gauge 3, and τ are diffused by a method of IC manufacturing technology to form a diffused resistance layer. For example, n
When a diffused resistance layer is formed on the <100 (crystal direction)> crystal plane of the anisotropic single crystal 1 of type Si, the resistance change rate △R/R with respect to pressure change of each resistance layer is as follows: △Rp/Rp■ 1(1-ν)←')-4(-)2 ΔRn/Rn■- becomes (1-ν)(pπ44(-2)2.
ここで、π44はSiのピエゾ抵抗係数、νはポアソン
比、れは受圧面の板厚、aは半径である。△R
従つて、上式を見る限り、抵抗変化率−は圧力Poに比
例するので、半導体ストレンゲージ3、3’の拡散抵抗
層は非直線性を生じないように思われる。Here, π44 is the piezoresistance coefficient of Si, ν is Poisson's ratio, is the thickness of the pressure receiving surface, and a is the radius. ΔR Therefore, as far as we can see from the above equation, the rate of change in resistance - is proportional to the pressure Po, so it seems that the diffusion resistance layers of the semiconductor strain gauges 3 and 3' do not exhibit nonlinearity.
しかし、この種の異方向性単結晶1の薄肉凹部1aには
バルーン効果と呼ぶ出力非直線性の現象を生ずるのが常
である。However, in the thin recesses 1a of this type of anisotropic single crystal 1, a phenomenon of output nonlinearity called a balloon effect usually occurs.
一方、バルーン効果は異方向性単結晶1(受圧ダイヤフ
ラム)の板厚れと圧力Poの変位ωoに関し、ωo/れ
がある値に以下である限り生じてこない。しかも、にの
値は圧力Poの加圧方向により異なつた値を示す。従っ
て、感圧素子自体に以上のようなバルーン効果を生じた
場合、第2図に示寸ように正圧力Poを加えていくと、
その端末効果は異なつて現われてくる。また、第1図に
示す方向の圧力Poを加えた場合、半導体ストレンゲー
ジ3では抵抗増加、半導体ストレンゲージ3’では抵抗
減少を呈するように設定したとすると、圧力Poに対す
る抵抗変化率△R/Rは+Po側と−Po側とでその直
線性のモードが異なつて〈る。On the other hand, regarding the plate thickness of the anisotropic single crystal 1 (pressure-receiving diaphragm) and the displacement ωo of the pressure Po, the balloon effect does not occur as long as ωo/ is below a certain value. Furthermore, the value of 2 varies depending on the direction in which the pressure Po is applied. Therefore, if the above-mentioned balloon effect occurs in the pressure-sensitive element itself, if a positive pressure Po is applied as shown in Fig. 2,
The terminal effects appear differently. Furthermore, when pressure Po in the direction shown in FIG. 1 is applied, the semiconductor strain gauge 3 is set so that the resistance increases and the semiconductor strain gauge 3' is set so that the resistance decreases.The rate of change in resistance with respect to the pressure Po is ΔR/ The mode of linearity of R is different between the +Po side and the -Po side.
この非直線性は測定レンジによつても異なるが、0.5
〜2.0%程度にも及ぶ。従つて、測定範囲が正圧から
負圧に及ぶ広範囲測定の連成計の場合には特に問題とな
る。なお、第3図は第1図に示す半導体ストレンゲージ
3,3′の抵抗Rp,Rnを用いてブリッジ回路を構成
した場合の出力特性図である。これは、△Rp,−ΔR
nの抵抗差に起因する出力電圧VOとなる。本発明は以
上のような点に着目してなされたもので、構造簡単で安
価に実現でき、耐食性、耐絶縁性にすぐれ、しかも正圧
から負圧にわたつて広範囲の圧力測定において良好な直
線性が得られる感圧素子を提供することにある。以下、
図面を参照して本発明の実施例を説明する。This nonlinearity varies depending on the measurement range, but is 0.5
It reaches about 2.0%. Therefore, this is a particular problem in the case of a coupled meter that measures a wide range, with a measurement range ranging from positive pressure to negative pressure. Note that FIG. 3 is an output characteristic diagram when a bridge circuit is constructed using the resistors Rp and Rn of the semiconductor strain gauges 3 and 3' shown in FIG. 1. This is △Rp, −ΔR
The output voltage VO is caused by the resistance difference of n. The present invention has been developed with the above points in mind. It has a simple structure, can be realized at low cost, has excellent corrosion resistance and insulation resistance, and has good straight line performance in a wide range of pressure measurements from positive pressure to negative pressure. The object of the present invention is to provide a pressure-sensitive element that provides high performance. below,
Embodiments of the present invention will be described with reference to the drawings.
第4図に卦いて11はSi,Geなどの半導体で形成し
た異方向性単結晶であつて、第1図と同様にその単結晶
11土にIC製造技術の手法によつて拡散抵抗層、つま
り半導体ストレンゲージ12,17が形成されている。
一方、単結晶11の一方面部つまり半導体ストレンゲー
ジ12,17の位置する面部側に、単結晶11とほぼ対
称的で同材質の保持板13が配置されている。In FIG. 4, reference numeral 11 is an anisotropic single crystal formed of a semiconductor such as Si or Ge, and as in FIG. In other words, semiconductor strain gauges 12 and 17 are formed.
On the other hand, on one side of the single crystal 11, that is, on the side where the semiconductor strain gauges 12 and 17 are located, a holding plate 13 that is substantially symmetrical with the single crystal 11 and made of the same material is arranged.
即ち、単結晶11は保持板13に対してガラス溶着、A
U−Si接合又は接着等の手段にて固定される。この場
合も単結晶11及び保持板13はそれぞれエツチングに
より凹部11a,13aを形成しているこのため、ダイ
ヤフラムとしての単結晶11は完全な対称性となつてバ
ルーン現象がなくなるとともに、保持板13を単結晶1
1の抵抗拡散面側に接合しているために、単結晶11の
面部の耐食性はもとより、絶縁材の塗布等により絶縁性
をも保持できる。That is, the single crystal 11 is glass-welded to the holding plate 13, and A
It is fixed by means such as U-Si bonding or adhesive. In this case as well, the single crystal 11 and the holding plate 13 have recesses 11a and 13a formed by etching, respectively. Therefore, the single crystal 11 as a diaphragm has perfect symmetry, eliminating the balloon phenomenon, and the holding plate 13 Single crystal 1
Since it is bonded to the resistance diffusion surface side of the single crystal 11, not only the corrosion resistance of the surface portion of the single crystal 11 but also the insulation property can be maintained by applying an insulating material or the like.
また、単結晶11と保持板13の凹部11a,13aは
両者の接合後にエツチングにより行なつてもよい。故に
、本発明感圧素子の構造は、半導体ストレンゲージ12
,17に対して完全に対称形となり、正圧および負圧に
際しても端末効果の差による非線形性をなくすることが
できる。Further, the recesses 11a and 13a of the single crystal 11 and the holding plate 13 may be formed by etching after joining the two. Therefore, the structure of the pressure sensitive element of the present invention is based on the semiconductor strain gauge 12.
, 17, and it is possible to eliminate nonlinearity due to the difference in terminal effects even in the case of positive pressure and negative pressure.
第5図は圧力変圧に対する半導体ストレンゲージ12,
17の抵抗変化率を示すものであり、この図より零点近
傍は完全な直線であり、かつ正圧が上昇しても非常に良
好な直線性が得られる。FIG. 5 shows the semiconductor strain gauge 12 for pressure change,
This figure shows a perfect straight line near the zero point, and very good linearity can be obtained even when the positive pressure increases.
次に、第6図は本発明感圧素子の他の実施例であつて、
これは単結晶11と同材質の保持板13にも拡散抵抗層
つまり半導体ストレンゲージ14,14′を形成したも
のである。この構造にあつては、単結晶11と保持板1
3は完全な対称性をなして接合されている而して、第6
図に示す構造の感圧素子に訃いて半導体ストレンゲージ
12を抵抗Rpl,l7をRnl,l4をRp2,l4
′をRn2とすれば、正負圧力に対してその半導体スト
レンゲージ12.17,14,11の抵抗変化率は第7
図に示すような特性となる而して、ブリッジ回路を構成
する場合、第8図に示すようにその2辺に第6図のP側
の半導体ストレンゲージ12,12′の拡散抵抗層を使
用した場合(半導体ストレンゲージ14,11の拡散抵
抗層を使用しない)、その圧力変化に対する抵抗差(△
RPl−△R2)によつて出力特性は第9図のようにな
る従つて、同図から明らかなように、零点近傍は完全な
直線となり、また端末での傾斜も極端に緩かに飽和して
いる。Next, FIG. 6 shows another embodiment of the pressure-sensitive element of the present invention, in which
In this case, a diffusion resistance layer, that is, a semiconductor strain gauge 14, 14' is also formed on a holding plate 13 made of the same material as the single crystal 11. In this structure, the single crystal 11 and the holding plate 1
3 are joined with perfect symmetry, so the 6th
In addition to the pressure sensitive element having the structure shown in the figure, the semiconductor strain gauge 12 is resistor Rpl, l7 is Rnl, l4 is Rp2, l4.
' is Rn2, the rate of resistance change of the semiconductor strain gauges 12.17, 14, and 11 with respect to positive and negative pressure is the seventh
With the characteristics shown in the figure, when configuring a bridge circuit, the diffused resistance layers of the semiconductor strain gauges 12 and 12' on the P side in Figure 6 are used on the two sides as shown in Figure 8. (the diffusion resistance layer of the semiconductor strain gauges 14 and 11 is not used), the resistance difference (△
RPl-△R2), the output characteristic becomes as shown in Figure 9. Therefore, as is clear from the figure, the vicinity of the zero point becomes a perfect straight line, and the slope at the terminal is extremely gentle and saturated. ing.
さらに、正負圧とも完全に均等かつ対称なものとするこ
とができる。即ち、単結晶11及び保持板13にそれぞ
れ半導体ストレンゲージ12,12′,14,14′を
設け、圧力POに対して完全に逆抵抗作用を行なう2個
のストレンゲージ12,14を用いてブリツジ回路を組
めば、第4図の構造の感圧素子より更に改善された直線
性が得られる。次に、第10図は単結晶11と保持板1
3のそれぞれの半導体ストレンゲージ12,17,14
,14′の拡散抵抗層を用いてブリツジ回路を構成した
もので、この場合も第8図と同様な効果が期待できる。Furthermore, both positive and negative pressures can be made completely equal and symmetrical. That is, semiconductor strain gauges 12, 12', 14, and 14' are provided on the single crystal 11 and the holding plate 13, respectively, and the bridge is constructed by using the two strain gauges 12 and 14 that have a completely opposite resistance action against the pressure PO. When the circuit is assembled, a linearity that is further improved than that of the pressure sensitive element having the structure shown in FIG. 4 can be obtained. Next, FIG. 10 shows the single crystal 11 and the holding plate 1.
3 respective semiconductor strain gauges 12, 17, 14
, 14' is used to construct a bridge circuit, and in this case as well, the same effect as in FIG. 8 can be expected.
な}、第4図及び第6図において15は感圧素子から出
力信号を取り出すリード線である。第11図は本発明感
圧素子の取付け状態を示す図であつて、支持筒体16の
上端部を内側に折り曲げてリターンさせ、その端部に感
圧素子の保持板13を溶接等して固着したものである。
17はターミ+ルであり、これにリード線15,15′
が接続されている。} In FIGS. 4 and 6, 15 is a lead wire for taking out an output signal from the pressure sensitive element. FIG. 11 is a diagram showing how the pressure-sensitive element of the present invention is installed, in which the upper end of the support cylinder 16 is bent inward and returned, and the holding plate 13 of the pressure-sensitive element is welded to the end. It is fixed.
17 is a terminal, to which lead wires 15, 15' are connected.
is connected.
18は外部取出し線である。18 is an external lead line.
以上詳記したように本発明によれば、異方向性単結晶と
同材質の保持板を対称にして接合するとともに、保持板
との接合面側の単結晶面に半導体ストレンゲージの拡散
抵抗層を形成したので、圧力変化に対する抵抗率を零点
近傍で完全な直線とすることができるばかりでな〈、圧
力を増加させた場合でもその端末での飽和傾斜を十分緩
かなものとすることができる〜
しかも、正負加圧に対し、その抵抗変化率、出力特性を
全範囲に亘つて均等かつ対称にすることができ、補償す
る場合でも非常に容易になる。As described in detail above, according to the present invention, an anisotropic single crystal and a holding plate made of the same material are joined symmetrically, and a diffused resistance layer of a semiconductor strain gauge is formed on the single crystal surface on the side of the joining surface with the holding plate. , it is possible to not only make the resistivity against pressure change a perfect straight line near the zero point, but also to make the saturation slope at that terminal sufficiently gentle even when the pressure is increased. Moreover, the rate of change in resistance and the output characteristics can be made uniform and symmetrical over the entire range with respect to positive and negative pressurization, making it very easy to compensate.
また、半導体ストレンゲージは大気並びに圧力から隔離
されるので、耐食性に十分すぐれたものであるAdditionally, since semiconductor strain gauges are isolated from the atmosphere and pressure, they have excellent corrosion resistance.
第1図は従来の感圧素子の断面図、第2図は第1図に示
す感圧素子の半導体ストレンゲージに}ける抵抗変化率
の特性図、第3図は第1図の半導体ストレンゲージをブ
リツジ回路に組み込んだ場合の出力特性図、第4図は本
発明に係る感圧素子を示し、同図Aは断面図、同図Bは
斜視図、第5図は第4図に示す感圧素子の半導体ストレ
ンゲージにおける抵抗変化率の特性図、第6図は本発明
感圧素子の他の実施例を説明する断面図、第7図は第6
図に示す感圧素子の半導体ストレンゲージにおける抵抗
変化率の特性図、第8図は第6図に示す2個の半導体ス
トレンゲージを用いて組んだブリツジ回路の構成図、第
9図は第8図に示すブリツジ回路の出力特性図、第10
図は第6図の4個の半導体ストレンゲージを用いて組ん
だブリッジ回路の出力特性図、第11図は感圧素子の取
付け状態を示す断面図である。
11・・・単結晶、12,17・・・半導体ストレンゲ
ージ、13・・・保持板、14,14t・・半導体スト
レンゲージ、16・・・支持筒体、17・・・ターミナ
ル。Figure 1 is a cross-sectional view of a conventional pressure-sensitive element, Figure 2 is a characteristic diagram of the rate of change in resistance of the semiconductor strain gauge of the pressure-sensitive element shown in Figure 1, and Figure 3 is the semiconductor strain gauge of Figure 1. FIG. 4 shows the pressure-sensitive element according to the present invention, where A is a cross-sectional view, B is a perspective view, and FIG. A characteristic diagram of the resistance change rate in a semiconductor strain gauge of a pressure element, FIG. 6 is a sectional view explaining another embodiment of the pressure sensitive element of the present invention, and FIG.
The characteristic diagram of the resistance change rate in the semiconductor strain gauge of the pressure-sensitive element shown in the figure, Figure 8 is the configuration diagram of the bridge circuit assembled using the two semiconductor strain gauges shown in Figure 6, Output characteristic diagram of the bridge circuit shown in Fig. 10
This figure is an output characteristic diagram of a bridge circuit assembled using the four semiconductor strain gauges shown in FIG. 6, and FIG. 11 is a sectional view showing the state in which the pressure-sensitive element is attached. DESCRIPTION OF SYMBOLS 11... Single crystal, 12, 17... Semiconductor strain gauge, 13... Holding plate, 14, 14t... Semiconductor strain gauge, 16... Support cylinder, 17... Terminal.
Claims (1)
を上げるために凹部を形成してなる単結晶の他方面部に
、該単結晶と同材質でほぼ同形状の保持板を該保持板に
形成された凹部を外側にしかつ対称となるように絶縁性
接合材料を介して直接接合するとともに、その接合部に
位置する前記単結晶面部又は前記単結晶と前記保持板の
両面部に半導体ストレンゲージの抵抗拡散層を形成し、
正圧から負圧にわたる広範囲の変化圧力を直線性よく検
出することを特徴とする感圧素子。1. A holding plate made of the same material and having approximately the same shape as the single crystal is attached to the other side of the single crystal, which has a concave portion formed on one side in order to increase a predetermined sensitivity and linearity of output resistance change. They are directly bonded via an insulating bonding material with the concave portion formed on the outside facing outward and symmetrically, and a semiconductor strain is placed on the single crystal face portion or both surfaces of the single crystal and the holding plate located at the bonded portion. Form the resistance diffusion layer of the gauge,
A pressure-sensitive element that is characterized by detecting a wide range of varying pressures, from positive pressure to negative pressure, with good linearity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6510177A JPS5940308B2 (en) | 1977-06-02 | 1977-06-02 | pressure sensitive element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6510177A JPS5940308B2 (en) | 1977-06-02 | 1977-06-02 | pressure sensitive element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53149778A JPS53149778A (en) | 1978-12-27 |
| JPS5940308B2 true JPS5940308B2 (en) | 1984-09-29 |
Family
ID=13277169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6510177A Expired JPS5940308B2 (en) | 1977-06-02 | 1977-06-02 | pressure sensitive element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5940308B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0640042B2 (en) * | 1985-04-16 | 1994-05-25 | 横河電機株式会社 | Pressure detector |
-
1977
- 1977-06-02 JP JP6510177A patent/JPS5940308B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53149778A (en) | 1978-12-27 |
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