JPS5943233B2 - Wastewater treatment equipment containing residual chlorine - Google Patents
Wastewater treatment equipment containing residual chlorineInfo
- Publication number
- JPS5943233B2 JPS5943233B2 JP9103076A JP9103076A JPS5943233B2 JP S5943233 B2 JPS5943233 B2 JP S5943233B2 JP 9103076 A JP9103076 A JP 9103076A JP 9103076 A JP9103076 A JP 9103076A JP S5943233 B2 JPS5943233 B2 JP S5943233B2
- Authority
- JP
- Japan
- Prior art keywords
- residual chlorine
- wastewater treatment
- wastewater
- tank
- treatment equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims description 23
- 239000000460 chlorine Substances 0.000 title claims description 23
- 229910052801 chlorine Inorganic materials 0.000 title claims description 23
- 238000004065 wastewater treatment Methods 0.000 title claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- 239000003054 catalyst Substances 0.000 claims description 6
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 6
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical group [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 6
- 150000002736 metal compounds Chemical class 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 2
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 239000002351 wastewater Substances 0.000 description 13
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 102000001999 Transcription Factor Pit-1 Human genes 0.000 description 2
- 108010040742 Transcription Factor Pit-1 Proteins 0.000 description 2
- 239000008235 industrial water Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Landscapes
- Water Treatment By Sorption (AREA)
- Removal Of Specific Substances (AREA)
Description
【発明の詳細な説明】 本発明は残留塩素分含有廃水処理装置に関する。[Detailed description of the invention] The present invention relates to a residual chlorine-containing wastewater treatment device.
更に詳しくは、本発明は活性炭充填槽の前段に、金属化
合物触媒を充填した前処理槽を付設したことを特徴とす
る残留塩素分含有廃水処理装置に関する。More specifically, the present invention relates to a residual chlorine-containing wastewater treatment apparatus characterized in that a pre-treatment tank filled with a metal compound catalyst is provided upstream of an activated carbon-filled tank.
残留塩素分を含有する廃水の処理方法の一つとして活性
炭による直接濾過法が好適に用いられている。Direct filtration using activated carbon is preferably used as a method for treating wastewater containing residual chlorine.
しかしながら、残留塩素分が高濃度である場合は、濾過
槽の活性炭表面の酸化に基因する処理水の着色（褐色）
現象が見られ問題となっている。However, if the residual chlorine content is high, the treated water will become colored (brown) due to oxidation of the activated carbon surface in the filter tank.
This phenomenon has become a problem.
本発明者らは以上のような問題点に鑑み鋭意研究を重ね
て、廃水を活性炭充填槽に通す前に触媒作用を持つ金属
化合物で処理すると著しい効果が得られることを見出し
、ここにその具体的装置を提供するものである。In view of the above-mentioned problems, the inventors of the present invention have conducted extensive research and found that significant effects can be obtained by treating wastewater with a metal compound that has a catalytic action before passing it through an activated carbon-filled tank. This is a device that provides a
本発明の主要な目的の一つは、高濃度残留塩素分を含有
していても高度処理できる残留塩素分含有廃水処理装置
の提供にある。One of the main objects of the present invention is to provide a residual chlorine-containing wastewater treatment device that can perform advanced treatment even if it contains a high concentration of residual chlorine.
本発明の他の目的の一つは、構造が非常に簡単な残留塩
素分含有廃水処理装置の提供にある。Another object of the present invention is to provide a residual chlorine-containing wastewater treatment device that has a very simple structure.
本発明に係る廃水処理装置で好適に処理できる廃水とし
ては、残留塩素分、例えば次亜塩素酸ナトリウム、次亜
塩素酸等を１０ｐｐ［Ｉｌ含有する一般の残留塩素分含
有廃水に加えて特にそれらを数１００卿含有する高濃度
残留塩素分含有廃水が挙げられる。The wastewater that can be suitably treated with the wastewater treatment apparatus according to the present invention includes general residual chlorine-containing wastewater containing 10 pp [Il] of residual chlorine, such as sodium hypochlorite, hypochlorous acid, etc. An example of this is wastewater containing a high concentration of residual chlorine, which contains several hundred chlorine.
この廃水の具体例としては、含有廃水電解液塩素ガス製
造工程からの廃水等がある。Specific examples of this wastewater include wastewater from a process of producing chlorine gas containing wastewater electrolyte.
本発明において用いられる金属化合物触媒としては、ニ
ッケル、マンガン、その他の金属の化合物触媒の粒状物
が挙られ、特にこれらの酸化物、例えば酸化ニッケル（
Ｎｉ２０３）、酸化マンガン（Ｍｎ２０３）等の粒状物
が好ましいものとして挙げられている。Examples of the metal compound catalyst used in the present invention include granular compound catalysts of nickel, manganese, and other metals, and in particular oxides of these metals, such as nickel oxide (
Particulate materials such as Ni203) and manganese oxide (Mn203) are listed as preferred.
以下図に示す実施例に基づいて本発明の詳細な説明する
。The present invention will be described in detail below based on embodiments shown in the figures.
なおこれによって本発明が限定されるものではない。Note that the present invention is not limited to this.
１は残留塩素分含有廃水処理装置で、廃水（被処理水）
ピット２、バルブ３、ポンプ４、流量計５、バルブ６、
酸化ニッケル触媒（粒状物）を充填した前処理槽７、バ
ルブ８、活性炭充填槽９を順次連設してなる処理経路Ａ
と、１ｗｔ％程度の希硫酸ピット１０、バルブ１１、前
記ポンプ４、前記流量計５、バルブ１２、前・後段を逆
にした前記前処理槽７、バルブ１３、フィルタ１４、前
記希硫酸ピット１０を順次連設してなる再生循環経路Ｂ
と、バルブ１５、前記前処理槽７、バルブ１６、洗浄水
ピット１７を順次連設してなる工業用水による洗浄経路
Ｃとを主として備えて構成されている。1 is a wastewater treatment device containing residual chlorine, which handles wastewater (water to be treated).
Pit 2, valve 3, pump 4, flow meter 5, valve 6,
Processing route A consisting of a pretreatment tank 7 filled with a nickel oxide catalyst (granular material), a valve 8, and an activated carbon filling tank 9 installed in sequence.
and about 1 wt% dilute sulfuric acid pit 10, valve 11, the pump 4, the flow meter 5, the valve 12, the pretreatment tank 7 with the front and rear stages reversed, the valve 13, the filter 14, the dilute sulfuric acid pit 10. Regeneration circulation route B is formed by sequentially installing
and a cleaning path C using industrial water in which a valve 15, the pretreatment tank 7, a valve 16, and a cleaning water pit 17 are successively installed.
なお前記前処理槽７および活性炭充填槽９の前段部には
それぞれ気泡抜きバルブ１８・１９を付設している。Note that bubble removal valves 18 and 19 are attached to the front portions of the pretreatment tank 7 and the activated carbon filling tank 9, respectively.
続いて以上の構成からなる廃水処理装置１の動作を説明
する。Next, the operation of the wastewater treatment apparatus 1 having the above configuration will be explained.
まず高濃度の残留塩素分を含有する廃水は廃水ピット２
に流入される。First, wastewater containing a high concentration of residual chlorine should be removed from the wastewater pit 2.
is flowing into the country.
そしてそのピット中の廃水（被処理水）は処理経路Ａに
沿って処理される。The wastewater (water to be treated) in the pit is treated along the treatment path A.
つまり前処理槽７の酸化ニッケルによって一部分の残留
塩素分をまず除去し、次いで活性炭充填槽９にて他の残
留塩素分および固形成分を除去する。That is, a portion of the residual chlorine is first removed by nickel oxide in the pretreatment tank 7, and then other residual chlorine and solid components are removed in the activated carbon filling tank 9.
かくして高濃度の残留塩素分が処理できる。In this way, high concentrations of residual chlorine can be treated.
なお以上の処理中はバルブｌＬ１２，１３．＊＊１５
、１６は閉塞されている。Note that during the above process, the valves 1L12, 13. **15
, 16 are occluded.
次いで、前処理槽７の酸化ニッケルの表面がよごれた場
合は、再生循環経路Ｂにてその前処理槽が再生処理に切
り換えられる。Next, when the surface of the nickel oxide in the pretreatment tank 7 becomes dirty, the pretreatment tank is switched to regeneration treatment in the regeneration circulation path B.
すなわち、バルブ３．６，８，１５，１６を閉塞状態に
して前処理槽７中の酸化ニッケルが希硫酸によって循環
再生洗浄される。That is, with the valves 3, 6, 8, 15, and 16 closed, the nickel oxide in the pretreatment tank 7 is circulated, regenerated, and cleaned by dilute sulfuric acid.
続いて、再生された前処理槽７は工業用水による洗浄経
路Ｃによって残った希硫酸を洗浄される。Subsequently, the regenerated pretreatment tank 7 is cleaned of remaining dilute sulfuric acid by a cleaning route C using industrial water.
この場合はバルブ６．８，１２，１３が閉塞状態、ポン
プ４が停止状態になっている。In this case, the valves 6.8, 12, and 13 are closed, and the pump 4 is stopped.
かくして再び処理経路Ａに切り換えることによって廃水
の残留塩素分の処理が可能になる。Thus, by switching to the treatment path A again, it becomes possible to treat the residual chlorine content in the wastewater.
以上のように廃水処理装置１は、長期間にわたって高濃
度の残留塩素分の処理を高効率で行なうことができる。As described above, the wastewater treatment apparatus 1 can treat high-concentration residual chlorine with high efficiency over a long period of time.
以下前記廃水処理装置１による実験例を挙げる。Experimental examples using the wastewater treatment apparatus 1 will be described below.
なお前処理槽での処理能力が４０１１ｐＩＩＩ？こなっ
た時点で希硫酸（１ｗｔ％）による再生を１０分行なっ
て２０ｐｐＩｎの処理能力まで回復できた。Furthermore, the processing capacity in the pre-treatment tank is 4011pIII? At this point, regeneration with dilute sulfuric acid (1 wt%) was performed for 10 minutes, and the processing capacity was restored to 20 ppIn.
図面は本発明に係る残留塩素分含有廃水処理装置の一実
施例を示す機能説明図である。
１・・・・・・残留塩素分含有廃水処理装置、７・・・
・・・前処理槽、９・・・・・・活性炭充填槽。The drawing is a functional explanatory diagram showing an embodiment of the residual chlorine-containing wastewater treatment apparatus according to the present invention. 1... Wastewater treatment device containing residual chlorine, 7...
...Pretreatment tank, 9...Activated carbon filling tank.
Claims (1)
前処理槽を付設したことを特徴とする残留塩素分含有廃
水処理装置。 ２ 金属化合物触媒が酸化ニッケルである特許請求の範
囲第１項記載の残留塩素分含有廃水処理装置。[Scope of Claims] 1. A wastewater treatment device containing residual chlorine, characterized in that a pretreatment tank filled with a metal compound catalyst is provided upstream of an activated carbon p-filtration tank. 2. The residual chlorine-containing wastewater treatment apparatus according to claim 1, wherein the metal compound catalyst is nickel oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9103076A JPS5943233B2 (en) | 1976-07-29 | 1976-07-29 | Wastewater treatment equipment containing residual chlorine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9103076A JPS5943233B2 (en) | 1976-07-29 | 1976-07-29 | Wastewater treatment equipment containing residual chlorine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5316460A JPS5316460A (en) | 1978-02-15 |
| JPS5943233B2 true JPS5943233B2 (en) | 1984-10-20 |
Family
ID=14015112
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9103076A Expired JPS5943233B2 (en) | 1976-07-29 | 1976-07-29 | Wastewater treatment equipment containing residual chlorine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5943233B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62176592A (en) * | 1986-01-30 | 1987-08-03 | Nitto Kikai Kk | Apparatus for treating waste liquid containing sodium hypochlorite |
| JP4805609B2 (en) * | 2005-05-26 | 2011-11-02 | 株式会社東芝 | High temperature underwater cladding or ion removal method and removal apparatus |
-
1976
- 1976-07-29 JP JP9103076A patent/JPS5943233B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5316460A (en) | 1978-02-15 |
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