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JPS5945249B2 - Filter using charge transfer device - Google Patents
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JPS5945249B2 - Filter using charge transfer device - Google Patents

Filter using charge transfer device

Info

Publication number
JPS5945249B2
JPS5945249B2 JP4688376A JP4688376A JPS5945249B2 JP S5945249 B2 JPS5945249 B2 JP S5945249B2 JP 4688376 A JP4688376 A JP 4688376A JP 4688376 A JP4688376 A JP 4688376A JP S5945249 B2 JPS5945249 B2 JP S5945249B2
Authority
JP
Japan
Prior art keywords
charge transfer
transfer device
channel
charge
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4688376A
Other languages
Japanese (ja)
Other versions
JPS52130263A (en
Inventor
宏 酒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4688376A priority Critical patent/JPS5945249B2/en
Publication of JPS52130263A publication Critical patent/JPS52130263A/en
Publication of JPS5945249B2 publication Critical patent/JPS5945249B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H15/00Transversal filters
    • H03H15/02Transversal filters using analogue shift registers

Landscapes

  • Filters That Use Time-Delay Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Description

【発明の詳細な説明】 本発明は、電荷転送装置を用いたフィルタとくにトラン
スバーサルフィルタに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a filter using a charge transfer device, particularly a transversal filter.

電荷転送装置(ChargeTransferDevi
ce)を用いた従来のトランスバーサルフィルタは、一
般に第1図に示すように構成される。
Charge Transfer Device (ChargeTransferDevi)
A conventional transversal filter using CE) is generally configured as shown in FIG.

この図でSBは半導体基板、CTDは電荷転送装置であ
つて転送電極TE、該転送電極下の基板内に形成される
直線状の電荷転送チャネル、電極への配線11、12等
からなる。本例では電荷転送装置は2相駆動方式をとり
、従つて転送電圧を供給する配線は11、12の2本で
あり、これらに第1相転送電極TEIおよび第2相転送
電極TE2がそれぞれ接続される。図では電極TEI、
TE2はそれぞれ2つの部分からなるように図示してい
るが、これは既知のように電荷転送方向を定めるため電
極下部絶縁膜の厚みを異ならせ、従つて電極は段差を持
つことを示している。電荷転送装置の両端の入出部には
入力ゲート電極IGE、ソース用拡散領域SDR、およ
び出力ゲート電極OGE)ドレイン拡散領域DDRが設
けられる。また線状電荷転送装置に沿つて多数の電界効
果トランジスタ(FET)が基板SBに形成され、これ
らのFETのゲート電極はチャネル内に1ビット毎に設
けられた電荷感知用拡散領域SDに接続される。更に矩
形状基板SBの主として非電荷転送装置側の3辺に多数
のボンディングパッドBPが設けられ、これらのパッド
はFETの全ドレイン電極に共通に、また個々のトラン
ジスタのソースに、また電荷転送装置のソース、ドレイ
ン、入出力ゲート電極、第1、2相電極配線に長いリー
ド線RDを介して接続される。この装置の動作は既知の
通りであり、人力ゲートIGEを開いてソースからチャ
ネルに電荷を注入するとこの電荷は、転送電圧が印加さ
れる電極TEI、TE2の交互に作る深い空乏層に引か
れて入力端から出力端へと転送され、その間に電荷感知
用の各拡散領域SDにより検知され、これはFET、リ
ード線RD、ボンディングパッドBPを介して取出され
、重み付けおよび合成がなされてトランスバーサルフィ
ルタとしての機能が発揮される。
In this figure, SB is a semiconductor substrate, and CTD is a charge transfer device, which includes a transfer electrode TE, a linear charge transfer channel formed in the substrate under the transfer electrode, wirings 11 and 12 to the electrode, and the like. In this example, the charge transfer device uses a two-phase drive system, and therefore there are two wires 11 and 12 that supply the transfer voltage, and the first phase transfer electrode TEI and the second phase transfer electrode TE2 are connected to these, respectively. be done. In the figure, electrode TEI,
TE2 is shown as consisting of two parts, but this indicates that the thickness of the insulating film under the electrode is different in order to determine the direction of charge transfer as is known, and therefore the electrode has a step. . An input gate electrode IGE, a source diffusion region SDR, and an output gate electrode OGE) and a drain diffusion region DDR are provided at input/output portions at both ends of the charge transfer device. Also, a number of field effect transistors (FETs) are formed on the substrate SB along the linear charge transfer device, and the gate electrodes of these FETs are connected to charge sensing diffusion regions SD provided for each bit in the channel. Ru. Furthermore, a large number of bonding pads BP are provided mainly on the three sides of the rectangular substrate SB on the non-charge transfer device side, and these pads are commonly used for all the drain electrodes of FETs, the sources of individual transistors, and the charge transfer device side. It is connected to the source, drain, input/output gate electrodes, and first and second phase electrode wiring via long lead wires RD. The operation of this device is as known. When the gate IGE is manually opened and charge is injected from the source to the channel, this charge is attracted to the deep depletion layer alternately formed by the electrodes TEI and TE2 to which the transfer voltage is applied. The charge is transferred from the input end to the output end, during which it is detected by each diffusion region SD for charge sensing, taken out via the FET, lead wire RD, and bonding pad BP, weighted and combined, and sent to the transversal filter. functions as.

しかしながらこの装置は図面から明らかなように細長く
なる傾向があり、また電荷転送装置CTDの電極配線1
1、12側にはタップを取出しにくゝ、このため図示の
ようにトランジスタFETは電荷転送装置の片側にのみ
配設され、ボンデイングパツドBPは主として電荷転送
装置のある側を除いた3辺に設けられて該当部分へは長
く張り渡したリード線RDにより接続される。
However, as is clear from the drawings, this device tends to be long and thin, and the electrode wiring 1 of the charge transfer device CTD
It is difficult to take out the taps on the 1 and 12 sides, so the transistor FET is arranged only on one side of the charge transfer device as shown in the figure, and the bonding pad BP is mainly placed on the three sides excluding the side where the charge transfer device is located. It is connected to the corresponding part by a long lead wire RD.

従つてこの方式では集積度が低く、リード線が長くなり
、それ故遅延、相互干渉、ノイズピツクアツプなどが目
立つ。これを防止するには例えば電荷転送装置を丸めて
長さを短くすることが考えられるが、従来の電荷転送装
置では転送方向の変更は厄介であり、か\る処理はとり
にくい。ところでチャネルが直線状の従来のCTDに対
し、電極が直線状で且つ屈曲した形のチヤネルを持つC
TDを本発明者は先に提案した。
Therefore, this method has a low degree of integration, requires long lead wires, and is therefore prone to delays, mutual interference, noise pickup, etc. To prevent this, for example, the charge transfer device may be rounded to shorten its length, but with conventional charge transfer devices, changing the transfer direction is troublesome and such a process is difficult to take. By the way, unlike the conventional CTD in which the channel is straight, the CTD has a channel in which the electrode is straight and curved.
The inventor previously proposed TD.

この型のCTD(以下ミアンダチヤネル型CTDという
)は転送方向の変更が極めて容易である。本発明はか\
る点に着目し、ミアンダチヤネル型CTDを利用して環
状CTDを構成し、その外側にFET群、更にその外側
にボンデイングパツド部を形成し、こうして集積度が向
上した、そして正方形に近いので基板の機械的強度も高
いフイルタを提供するものである。本発明の電荷転送装
置を用いたフイルタは半導体基板の中央にほ丈環状にミ
アンダ型電荷転送チヤネルを形成し、該チヤネル上に一
対のほマ同心環状の転送電極を設け、これらのチヤネル
および電極により構成される環状電荷転送装置の全外周
の前記基板部分に重み付け用の複数個の電界効果トラン
ジスタを配設し、更に前記基板の端縁部各辺に複数個の
ボンデイングパツドを設け、前記トランジスタのゲート
は前記チヤネル内に形成された電荷感知用拡散領域へま
たソース、ドレインは前記パツドへ接続してなることを
特徴とするが、次に実施例を参照しながらこれを詳細に
説明する。
In this type of CTD (hereinafter referred to as a meander channel type CTD), changing the transfer direction is extremely easy. What about this invention?
Focusing on this point, we constructed an annular CTD using a meander channel CTD, formed an FET group on the outside of it, and formed a bonding pad section on the outside of it.In this way, the degree of integration was improved, and since it is close to square, The present invention provides a filter whose substrate also has high mechanical strength. A filter using the charge transfer device of the present invention has a meandering charge transfer channel formed in a long annular shape in the center of a semiconductor substrate, a pair of semi-concentric annular transfer electrodes provided on the channel, and these channels and electrodes A plurality of field effect transistors for weighting are arranged on the entire outer periphery of the substrate portion of the annular charge transfer device constituted by, and a plurality of bonding pads are further provided on each side of the edge portion of the substrate. The gate of the transistor is connected to a charge sensing diffusion region formed in the channel, and the source and drain are connected to the pad, which will be explained in detail below with reference to embodiments. .

第2図は本発明の実施例を示し、第1図と同じ部分には
同じ符号を付してある。この図に示すように本実施例で
は半導体基板SBのほゾ中央部に角環状に電荷転送装置
CTDを形成し、この電荷転送装置の外周に電界効果ト
ランジスタFETを同様にほマ角環状に配列形成し、基
板周辺にボンデイングパツドBPを同様に角環状に配列
する。この電荷転送装置は本発明者が先に提案したミア
ンダチヤネル型の電荷転送装置で、両側の平行なチヤネ
ルストツパCS,,CS,と交互に突出すチネルストツ
パCS3,CS4により形成される点線で示す如きミア
ンダ状のチヤネルCHと、このチヤネル上に絶縁膜る介
して形成される一対の平行な転送電極TEa,TEbを
備える。これらの帯状転送電極は第3図に示す如く角環
状、かつ同心状をなしており、外側の転送電極TEbは
基板外周のボンデイングパツドBPlにリード線RDに
より接続され、内側の転送電極TEaは環状CTDの中
央空所を利用してこ\に設けたボンデイングパツドBP
2に接続する。このボンデイングパツドと外部回路との
接続は、CTDおよびトランジスタ群等をジアップする
ワイヤにより行なう。もちろんボンデイングパツドBP
2を環外に設けることも可能である。チヤネルCH内に
設けた電荷検出用の拡散領域SDはトランジスタFET
のゲート電極に接続し、各トランジスタのドレインは一
括して基板周辺のボンデイングパツドBP3に接続し、
以下同様で、各トランジスタのソースはパツドBP4,
BP,・・・に、CTDのソース拡散領域SDRはパツ
ドBP,Oに、入力ゲート電極1GEはパツドBPl,
眠ドレイン拡散領域DDRはパツドBPl2に、出力ゲ
ート電極0GEはパツドBPl3に接続する。
FIG. 2 shows an embodiment of the present invention, in which the same parts as in FIG. 1 are given the same reference numerals. As shown in this figure, in this embodiment, a charge transfer device CTD is formed in a rectangular ring shape at the center of the tenon of the semiconductor substrate SB, and field effect transistors FET are similarly arranged in a rectangular ring shape around the outer periphery of this charge transfer device. The bonding pads BP are similarly arranged in a rectangular ring shape around the substrate. This charge transfer device is a meander channel type charge transfer device previously proposed by the present inventor, and is formed by parallel channel stops CS, , CS on both sides and alternately protruding channel stops CS3, CS4 as shown by dotted lines. It includes a shaped channel CH and a pair of parallel transfer electrodes TEa and TEb formed on this channel with an insulating film interposed therebetween. These band-shaped transfer electrodes have a rectangular ring shape and a concentric shape as shown in FIG. Bonding pad BP installed here using the central void of the annular CTD
Connect to 2. Connection between this bonding pad and an external circuit is made by a wire that connects the CTD, transistor group, etc. Of course bonding pad BP
2 can also be provided outside the ring. The charge detection diffusion region SD provided in the channel CH is a transistor FET.
The drains of each transistor are collectively connected to the bonding pad BP3 around the substrate,
Similarly, the source of each transistor is padded BP4,
BP,..., the source diffusion region SDR of the CTD is connected to the pad BP,O, and the input gate electrode 1GE is connected to the pad BP1,
The drain diffusion region DDR is connected to the pad BPl2, and the output gate electrode 0GE is connected to the pad BPl3.

動作は既提案のミアンダチヤネルCTDおよびトランス
バーサルフイルタのそれと同じであり、ソース、ドレイ
ン電圧S,D、入、出力ゲート電圧1G,0G1第1,
2相転送電圧φ1,φ2を印加すると、ソース拡散領域
から電荷が入力ゲートを通つてチヤネルCH内に注入さ
れ、該チヤネルに沿つて電荷はミアンダ状に転送され、
この間に各ビツト毎に設けられた電荷感知用拡散領域お
よびそれに接続されたトランジスタにより検知され重み
を付けられたのち合成され、既知のトランスバーサルフ
イルタの機能を行なう。第2図と第1図を比べれば明ら
かなように、本発明では細長いCTD5−環状に折曲げ
たのでこの外周にトランジスタ群およびボンデイングパ
ツド群を同様に環状に配置することができ、全体をコン
パクトにまとめることができる。
The operation is the same as that of the previously proposed meander channel CTD and transversal filter, with source and drain voltages S, D, input and output gate voltages 1G, 0G1 first,
When two-phase transfer voltages φ1 and φ2 are applied, charges are injected from the source diffusion region into the channel CH through the input gate, and the charges are transferred in a meandering manner along the channel.
During this time, each bit is detected by a charge sensing diffusion region provided for each bit and a transistor connected thereto, weighted, and then combined to perform the function of a known transversal filter. As is clear from a comparison between FIG. 2 and FIG. 1, in the present invention, the elongated CTD 5 is bent into an annular shape, so that transistor groups and bonding pad groups can be similarly arranged annularly around the outer periphery of the CTD 5. Can be summarized compactly.

か\る装置ではボンデイングパツドが大きな面積を必要
とするものの筆頭格にあり、最低でも100×100μ
m程度を必要とする。しかし本発明のようにこれを基板
全周に配置すれば、図示の如き31段のCTDでパツド
数は38、これを等間隔で縦に10個、横に11個配置
すれば基板は2X2.211の矩形板で済み、第1図の
場合に比べて基板面積をほゾ半減することができる。ま
たリード線RDは図示の如くほマ放射状に、つまり最短
距離で配線することができ、第1図のように大きく折曲
させて遠く離れた基板周辺のパツド部まで引出す必要が
ない。また各素子および配線は全面に均等に分散するの
で、各タツプへの重み係数を付ける抵抗を基板に設ける
場合も充分スペースがとれて処理が容易になる。この点
第1図のものではCTDの片側(図面上方)は転送電圧
を供給する配線11,12で占められ、他の片側にのみ
トランジスタ群が集中し、これに重み付け抵抗などを配
置するとこの部分が一層複雑化する。また基板を正方形
状にすることができるので細長い場合より折れにくく、
機械的強度が高まる。以上詳細に説明したように本発明
によれば素子の集積度を上げ、素子配置の自由度が高い
フイルタが得られる。
In such equipment, the bonding pad is the most important thing that requires a large area, at least 100 x 100μ.
It requires about 100 m. However, if they are arranged around the entire circumference of the board as in the present invention, the number of pads is 38 in a 31-stage CTD as shown in the figure, and if these are arranged at equal intervals, 10 vertically and 11 horizontally, the board will be 2x2. 211 rectangular plates are sufficient, and the substrate area can be halved compared to the case of FIG. Further, the lead wires RD can be wired in a radial pattern as shown in the figure, that is, over the shortest distance, and there is no need to make a large bend as shown in FIG. Further, since each element and wiring are evenly distributed over the entire surface, sufficient space is available even when a resistor for assigning a weighting coefficient to each tap is provided on the substrate, which facilitates processing. In this respect, in the one in Fig. 1, one side of the CTD (the upper part of the drawing) is occupied by the wiring 11 and 12 that supplies the transfer voltage, and the transistor group is concentrated only on the other side, and if a weighting resistor etc. is placed in this area, becomes even more complex. Also, since the board can be made into a square shape, it is less likely to break than if it were long and thin.
Mechanical strength increases. As described above in detail, according to the present invention, it is possible to obtain a filter with an increased degree of element integration and a high degree of freedom in element arrangement.

勿論本発明は図示実施例に限定されず種々変形できる。
例えば電荷転送装置は四角の環状でなく、任意の多角形
、更には円形などにしてもよい。
Of course, the present invention is not limited to the illustrated embodiment and can be modified in various ways.
For example, the charge transfer device is not in the shape of a square ring, but may be in any polygonal shape, or even in a circular shape.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のトランスバーサルフイルタの構成を示す
平面図、第2図は本発明のトランスバーサルフイルタの
構成を示す平面図、第3図はその一部の電極形状を示す
平面図である。 図面でSBは基板、CHはチヤネル、TEa,TEbは
転送電極、FETは電界効果トランジスタ、SDは電荷
感知用拡散抵抗、BPはボンデイングパツドである。
FIG. 1 is a plan view showing the structure of a conventional transversal filter, FIG. 2 is a plan view showing the structure of the transversal filter of the present invention, and FIG. 3 is a plan view showing the shape of a part of the electrodes. In the drawing, SB is a substrate, CH is a channel, TEa and TEb are transfer electrodes, FET is a field effect transistor, SD is a charge sensing diffused resistor, and BP is a bonding pad.

Claims (1)

【特許請求の範囲】[Claims] 1 半導体基板の中央にほゞ環状にミアンダ型電荷転送
チャネルを形成し、該チャネル上に一対のほゞ同心環状
の転送電極を設け、これらのチャネルおよび電極により
構成される環状電荷転送装置の全外周の前記基板部分に
重み付け用の複数個の電界効果トランジスタを配設し、
更に前記基板の端縁部各辺に複数個のボンディングパッ
ドを設け、前記トランジスタのゲートは前記チャネル内
に形成された電荷感知用拡散領域へまたソース、ドレイ
ンは前記パツドへ接続してなることを特徴とする電荷転
送装置を用いたフィルタ。
1 A meander-shaped charge transfer channel is formed in the center of a semiconductor substrate, a pair of substantially concentric ring-shaped transfer electrodes are provided on the channel, and the entire annular charge transfer device constituted by these channels and electrodes is A plurality of field effect transistors for weighting are arranged on the substrate portion on the outer periphery,
Furthermore, a plurality of bonding pads are provided on each edge of the substrate, and the gate of the transistor is connected to a charge sensing diffusion region formed in the channel, and the source and drain are connected to the pads. A filter using a characteristic charge transfer device.
JP4688376A 1976-04-24 1976-04-24 Filter using charge transfer device Expired JPS5945249B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4688376A JPS5945249B2 (en) 1976-04-24 1976-04-24 Filter using charge transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4688376A JPS5945249B2 (en) 1976-04-24 1976-04-24 Filter using charge transfer device

Publications (2)

Publication Number Publication Date
JPS52130263A JPS52130263A (en) 1977-11-01
JPS5945249B2 true JPS5945249B2 (en) 1984-11-05

Family

ID=12759746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4688376A Expired JPS5945249B2 (en) 1976-04-24 1976-04-24 Filter using charge transfer device

Country Status (1)

Country Link
JP (1) JPS5945249B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4923972B2 (en) * 2006-11-20 2012-04-25 富士電機株式会社 Showcase

Also Published As

Publication number Publication date
JPS52130263A (en) 1977-11-01

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