JPS5947455B2 - Method for manufacturing a photo etching mask - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a mask used in photoetching, which is a processing method for processing predetermined grooves, patterns, shapes, etc.

In this photo-etching process, in the normal process, the mask used is made of film, but since this film is easily damaged, the image of this film is copied onto glass, metal, etc. so that it is hard to be scratched and deformed. We are using masks that are difficult to make for mass production.

However, when making masks for mass production, the above method can be applied when making a flat mask, but when the workpiece is a curved surface and the mask used for it has a curved surface, such a mask can be applied. It is difficult to make. The purpose of the present invention is to provide a relatively easy and accurate method for manufacturing a mask for mass production, which includes: - manufacturing a metal model with recesses of predetermined grooves, patterns, shapes, etc.; Prepare the finished product itself as a model in which the recesses described above are formed, and form an opaque resin layer or an opaque glass layer in the recesses of the predetermined grooves, patterns, shapes, etc. formed on this model. A photo-etching mask that forms a transparent resin layer or transparent glass layer on the entire surface of the model, including the layer or glass layer, so as to bond with the opaque resin layer or opaque glass layer in the previous process, and then removes the model. This manufacturing method is particularly suitable for masks with a j-curved surface.

Next, a first embodiment of the present invention will be described with reference to the drawings.

First, in the first step, a metal model 1 similar to the finished product having recesses of predetermined grooves, patterns, shapes, etc. is made by an appropriate method. In some cases, the finished product itself may be used as a model. This model 1 has a groove 11 as a recess, and in the second step, an opaque resin 2 that does not transmit ultraviolet rays is filled into this groove 11.
Alternatively, a resin layer or a glass layer is formed by embedding glass as shown in FIG. At this time, care must be taken to ensure that the resin 2 or glass does not adhere to the surface other than the groove 11, and if it does, it is removed. In the next step, as shown in FIG. 3, a transparent resin 3 or glass that transmits ultraviolet light is coated on the opaque resin 2 or glass layer and the surface 12 of the model 1. In the next step, the metal model 1 is removed to obtain a mask 4 for photoetching.
Model 1 may be removed by machining such as grinding or turning, but in order to prevent the mask from being deformed or damaged, the metal is melted while the resin or glass remains attached to the model. Good results can be obtained by placing it in a strong acid solution to dissolve only the metal. Mask 4 obtained in this example
Although it is sufficiently useful as a normal mask, it may be unsuitable in cases where particularly precise processing is required. In other words, because a gap is created between the workpiece and the mask by the thickness of the opaque film, the transmitted light is scattered due to diffraction etc. during exposure, and parts that should not be exposed may be exposed. It is. In order to prevent this, a mask manufactured in accordance with the second embodiment shown below may be used. In this second embodiment, similar to the first embodiment, a metal model 1 (see Fig. 1) is used, and opaque resin 2 or opaque glass is poured into the grooves 11 on the model surface (5th embodiment). (See figure) The process is the same until it is hardened, but in the next step, it is the same depth as the groove 11 that was originally formed.
For example, the metal surface other than the resin 2 or glass coating layer is
It is removed by corrosion or the like, and an opaque resin layer or glass layer appears on the surface of the model 1 as a convex portion. From the next step, as shown in FIG. 7, a coating layer of transparent resin 3 or glass is formed on the metal surface 12 including opaque resin 2 or glass, as in the first embodiment. This is cured, and in the next step, the metal model 1 is removed and the 8th
A mask 5 for photoetching as shown in the figure can be obtained. This mask 5 is the contact surface 5 with the workpiece.
Since the mask 1 has a uniform finish, it comes into perfect contact with the workpiece, and this mask can be used to perform highly accurate photoetching. In the above embodiments, for convenience of explanation, a flat plate was selected as the workpiece, but this invention is particularly suitable for manufacturing a photoetching mask for a workpiece whose surface has a three-dimensional shape, such as a spherical, conical, or cylindrical surface. According to the preferred manufacturing method of the present invention, it is possible to relatively easily make a mask for photo etching not only when the surface of the workpiece is flat, but also when the surface is conical or spherical. A metal body that has been corroded and removed using a strong acid that easily dissolves metal is not subjected to any processing during the manufacturing process, so it is possible to obtain a mask that has an accurate shape with almost no deformation.

In addition, the durability of the mask is much better than that of conventional film masks, and there is no unevenness of particles, which can be a problem with film masks, so it is easy to clean the workpiece. This results in a mask that allows extremely accurate projection.

[Brief explanation of the drawing]

1 to 4 show the manufacturing process of a photo-etching mask according to a first embodiment of the present invention.
The figure is a cross-sectional view of a model with grooves, the second figure is a cross-sectional view with an opaque resin layer or glass layer formed in the grooves of the model, and the third figure is a cross-sectional view of a model with grooves.
The figure is a cross-sectional view of the transparent resin or glass layer formed on the top surface of the model and the opaque resin or glass surface.
The figure is a cross-sectional view of the completed mask, Figures 5 to 8 also show the second embodiment, Figure 5 is a cross-sectional view with an opaque resin layer or glass layer formed in the grooves of the model, and Figure 6 is a cross-sectional view of the completed mask. Figure 7 is a cross-sectional view of a model in which a part of the model has been removed to reveal an opaque resin layer or glass layer as a convex portion. FIG. 8 shows a cross-sectional view of the completed mask. Explanation of symbols: 1 is model, 2 is opaque resin or glass, 3 is transparent resin or glass, 4 is mask, 5 is mask.

Claims (1)

[Claims] 1. A metal model in which recesses such as predetermined grooves, patterns, shapes, etc. are formed is prepared, and an opaque resin layer or forming an opaque glass layer, and forming a transparent resin layer or a transparent glass layer on the entire surface of the model including the resin layer or glass layer so as to be bonded to the opaque resin layer or opaque glass layer in the previous step; Next, a method for manufacturing a photo-etching mask that removes the model. 2. In the method for manufacturing a photo-etching mask as set forth in claim 1, the model is removed by placing the resin or glass and the model in a strong acid solution that dissolves metal, and dissolving and removing only the model. A method of manufacturing a mask for photoetching. 3. In the method for manufacturing a photoetching mask according to claim 1, the metal surface other than the opaque resin layer or the opaque glass layer is removed until the depth is equal to the depth of the recess originally formed. The resin layer or glass layer is made to appear as a convex part, and the transparent resin layer or transparent glass layer is applied to the model surface including the resin layer or glass layer, and the opaque resin layer or opaque glass layer in the previous process is A method for manufacturing a photo-etching mask in which the model is formed so as to be bonded to the model, and then the model is removed.