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JPS594826B2 - field emission electron gun - Google Patents
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JPS594826B2 - field emission electron gun - Google Patents

field emission electron gun

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Publication number
JPS594826B2
JPS594826B2 JP51057851A JP5785176A JPS594826B2 JP S594826 B2 JPS594826 B2 JP S594826B2 JP 51057851 A JP51057851 A JP 51057851A JP 5785176 A JP5785176 A JP 5785176A JP S594826 B2 JPS594826 B2 JP S594826B2
Authority
JP
Japan
Prior art keywords
electron
electron gun
field emission
vacuum
degree
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51057851A
Other languages
Japanese (ja)
Other versions
JPS52141558A (en
Inventor
尚武 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP51057851A priority Critical patent/JPS594826B2/en
Publication of JPS52141558A publication Critical patent/JPS52141558A/en
Publication of JPS594826B2 publication Critical patent/JPS594826B2/en
Expired legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【発明の詳細な説明】 本発明は電界放射形電子銃に係り、特に電界放射電子流
発生時の安全回路を備えた電子銃に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a field emission type electron gun, and more particularly to an electron gun equipped with a safety circuit when a field emission electron flow is generated.

電界放射形電子銃は、従来の熱電子放出形電子銃に比較
し1000倍以上の輝度を有し、かつ光源が極めて小さ
いことから、電子顕微鏡等に用いられて分解能の飛躍的
な向上に役立ち、非常に注目されている電子銃である。
Field-emission electron guns have more than 1,000 times the brightness than conventional thermionic-emission electron guns, and their light source is extremely small, so they are used in electron microscopes and other devices, helping to dramatically improve resolution. , is an electron gun that is attracting a lot of attention.

しかし安定な電界放射電流を得るためには電子銃室を超
高真空に保つ必要があり、特に放射電流の衝撃を受ける
陽極や陰極近傍の部材は放出ガスの少ない材質または処
理を施こさなければならない。
However, in order to obtain a stable field emission current, it is necessary to maintain the electron gun chamber in an ultra-high vacuum, and in particular, the parts near the anode and cathode, which are subjected to the impact of the emission current, must be made of materials with low emission gas or treated. No.

これは放出ガスが陰極表面に付着して放出電流を乱すこ
とや、放出ガスが電界放射電子流に衝撃されてイオン化
し、それが陰極表面を衝撃して放射電子流を乱すことと
、時においては真空放電を誘発し陰極を破損する結果と
なるからである。
This is because the emitted gas adheres to the cathode surface and disturbs the emitted current, or the emitted gas is bombarded by the field emission electron flow and becomes ionized, which impacts the cathode surface and disturbs the emitted electron flow. This is because it induces vacuum discharge and results in damage to the cathode.

従来技術においては前記の放出ガスやイオンの発生に対
して陰極を保護する手段が無いため、陰極の破損又は消
耗がはげしいという欠点を有していた。
In the prior art, there is no means to protect the cathode from the generation of the emitted gas and ions, so the cathode has the drawback of being easily damaged or worn out.

本発明の目的は、上記した従来技術の欠点を無くし、放
出ガス等に対する保護手段を有し、安全な電界放射を可
能とした電界放射電子銃を提供するにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a field emission electron gun which eliminates the above-mentioned drawbacks of the prior art, has means for protecting against emitted gas, etc., and enables safe field emission.

本発明は上記の目的を達成するために、電界放射電子流
(以下icと記す)放出時の真空度の変化(、Δp)を
測定し、Δp / i cがある定められた値以上にな
った場合には、陰極および陽極に印加している電圧を遮
断するような保護回路を設け、陰極がイオン衝撃や真空
放電等により破損することを防止した構造のものである
In order to achieve the above object, the present invention measures the change in the degree of vacuum (, Δp) during emission of field emission electron current (hereinafter referred to as ic), and determines when Δp/ic exceeds a certain predetermined value. In such a case, a protection circuit is provided to cut off the voltage applied to the cathode and anode to prevent the cathode from being damaged by ion bombardment, vacuum discharge, etc.

第1図に本発明の実施例を示す。FIG. 1 shows an embodiment of the present invention.

電子銃室5内に陰極1と・対向して第1陽極3及び第2
陽極4を配置した構造が電界放射形電子銃である。
Inside the electron gun chamber 5, a first anode 3 and a second anode are arranged opposite to the cathode 1.
The structure in which the anode 4 is arranged is a field emission type electron gun.

陰極1はフィラメント2に支えられ、電子銃室壁6の一
部に取付げられた絶縁碍子7を通して電源側と接続する
構造としである。
The cathode 1 is supported by a filament 2 and connected to a power source through an insulator 7 attached to a part of the electron gun chamber wall 6.

電源は、フィラメント加熱電源10、電子引出し電圧電
源(vt)11、電子加速電圧電源ffo)12及び放
射電子流測定回路13より構成されている。
The power source includes a filament heating power source 10, an electron extraction voltage power source (vt) 11, an electron acceleration voltage power source ffo) 12, and a radiation electron current measuring circuit 13.

電子銃室5は、超高真空ポンプ(一般にはスパッターイ
オンポンプ)で排気され、電子銃室壁6の一部に取付け
た真空計9で真空度測定を行なう。
The electron gun chamber 5 is evacuated by an ultra-high vacuum pump (generally a sputter ion pump), and the degree of vacuum is measured by a vacuum gauge 9 attached to a part of the electron gun chamber wall 6.

14は真空計用電源であり、20は真空ポンプ80制御
電源である。
14 is a vacuum gauge power source, and 20 is a vacuum pump 80 control power source.

以上の構造において、陰極1に電界放射電子引出電圧V
1を印加すると電界放射電子流23が陰極表面より放射
され、この電子流のうち第1陽極3の中心孔を通った電
子は第2陽極4で加速電位Voに加速される。
In the above structure, the field emission electron extraction voltage V
When 1 is applied, a field emission electron stream 23 is emitted from the cathode surface, and of this electron stream, electrons that have passed through the center hole of the first anode 3 are accelerated by the second anode 4 to an acceleration potential Vo.

その他の電子は第1陽極30表面を衝撃し、表面に付着
しているガス24をたたき出す。
Other electrons impact the surface of the first anode 30 and knock out the gas 24 attached to the surface.

た匁き出されたガスのうちの一部は放射電子に当ってイ
オン化され、このイオン25のうち一部は陰極表面を衝
撃する。
A portion of the ejected gas is ionized by radiation electrons, and a portion of these ions 25 bombards the surface of the cathode.

その他のガス分子の中にはポンプに排気されるもの24
a、真空計9に飛びこむもの24b、電子銃室壁に付着
しているガス分子をた〜き出すもの等がある。
Some other gas molecules are pumped out24
a, a part 24b that flies into the vacuum gauge 9, and a part that ejects gas molecules attached to the wall of the electron gun chamber.

また第1陽極30表面を衝撃した電子の一部は、反射電
子23aとなって電子銃室内の他の部品の表面や電子銃
室壁6をた〜き、そこに付着しているガスをた瓦き出す
働きをする。
In addition, some of the electrons that hit the surface of the first anode 30 become backscattered electrons 23a and hit the surfaces of other parts in the electron gun chamber and the electron gun chamber wall 6, removing gas attached thereto. It works to remove tiles.

以上説明した如く放射電子を放射することによって、電
子銃室内の真空度pはΔpだゆ悪るくなる。
As explained above, by emitting radiation electrons, the degree of vacuum p in the electron gun chamber becomes worse by Δp.

この真空度の悪化分Δpは、電子銃室内全部品のガスの
保有量と、放射電子流icの大きさで決まる値である。
This degree of vacuum deterioration Δp is a value determined by the amount of gas held in all parts of the electron gun chamber and the magnitude of the radiation electron current IC.

すなわち、icが一定でも、電子針内部品のガス保有量
が多ければΔpは大きくなり、ガス保有量が少なければ
Δpは小さい値となる。
That is, even if ic is constant, if the amount of gas held in the electronic needle internal component is large, Δp will be large, and if the amount of gas held is small, Δp will be a small value.

icが10μAの状態で実験的に求められたΔpの値は
一般に1〜2X10−9torr程度であるが、この値
はポンプの排気速度の大小、電子銃室の容積の大小でも
変わり、絶対値としては決められない。
The value of Δp experimentally determined when IC is 10 μA is generally about 1 to 2 x 10-9 torr, but this value varies depending on the pump pumping speed and the volume of the electron gun chamber, and as an absolute value. cannot be decided.

そこで上記の種々の条件を考慮して、Δp / i c
−αを求め、これとポンプの排気速度と電子銃の構造に
よって定めた値βとを比較することにより、icなる放
射電流を流した時、電子銃が安全に動作するか否かの判
定が出来ることが判明した。
Therefore, considering the various conditions mentioned above, Δp / i c
By determining −α and comparing it with the value β determined by the pump pumping speed and the structure of the electron gun, it is possible to determine whether the electron gun operates safely when the radiation current ic is applied. It turns out it can be done.

すなわちα/β≦1であれば安全動作条件であり、■よ
り大きければ陰極破損や放射電流の不安定や真空放電の
危険率が高いことになる。
That is, if α/β≦1, it is a safe operating condition, and if it is larger than ①, there is a high risk of cathode damage, instability of radiation current, and vacuum discharge.

上記の条件を判定するために、第1図に示す如く、真空
度の変化Δpを判定する回路15と、icとΔpとを比
較する回路16と、基準値βの設定回路18と、αとβ
とを比較する回路17と、この結果により電界放射電子
引出し電源11(Vl)および電子加速電源12ffo
)のいずれか一方、又は両者を0N−OFF制御する回
路19とを設けた。
In order to determine the above conditions, as shown in FIG. β
A circuit 17 for comparing
), or a circuit 19 for ON-OFF control of one or both of them.

また真空ポンプ8にイオンポンプを用いる場合には、イ
オン電流ipが電子銃室の真空度に比例することから、
真空度の変化Δpはイオン電流の変化Δ1pC−測定す
ることが出来、真空計9の代りにΔi−u定回路21を
用いることが出来る。
Furthermore, when an ion pump is used as the vacuum pump 8, since the ion current ip is proportional to the degree of vacuum in the electron gun chamber,
The change Δp in the degree of vacuum can be measured by the change Δ1pC in the ion current, and the Δi-u constant circuit 21 can be used in place of the vacuum gauge 9.

Δp/icとΔi p/ i cの両者を用い、それぞ
れに対して定めた基準値を越すか否かを判定し、その判
定結果の論理和あるいは論理積によって前記電源の0N
−OFF制御を行なうことも出来る。
Using both Δp/ic and Δi p/ic, determine whether or not they exceed the predetermined reference values, and then determine whether the power supply is 0N by the logical sum or logical product of the determination results.
-OFF control can also be performed.

以上の構造において、実施例ではΔi叱用い、βを10
−2に定めた。
In the above structure, in the example, Δi is used and β is 10
-2.

以上説明した如く、本発明によれば、放射電子流icが
流れている状態における電子針内部品のガス放出量が真
空度変化Δpと排気速度torr・l/secとによっ
て求められ、これにより安全回路を働かせて、陰極の破
損を保護し、安定した電界放射形電子銃を提供すること
が出来る。
As explained above, according to the present invention, the amount of gas emitted from the internal parts of the electronic needle in the state where the radiation electron current IC is flowing is determined from the change in degree of vacuum Δp and the pumping speed torr·l/sec, thereby ensuring safety. By operating the circuit, it is possible to protect the cathode from damage and provide a stable field emission type electron gun.

また本発明によれば何等かの理由で電子銃の真空度が悪
化し、その後真空度のみが回復しても、電子針内部品の
ガス保有量が犬であれば放射電子流放出時の真空度低下
が大きくなって安全回路が動作するため、電子銃室の真
空的な経歴に対しても安全に働くことが出来る。
Furthermore, according to the present invention, even if the vacuum level of the electron gun deteriorates for some reason and only the vacuum level recovers thereafter, if the amount of gas retained in the electronic needle internal parts is small, the vacuum level at the time of emission of the radiation electron stream will be reduced. Since the temperature drop is large and the safety circuit is activated, it can work safely even in the vacuum environment of the electron gun chamber.

いいかえれば、従来一般に行なわれていたような真空度
のみによる高圧電源回路の安全回路では達成出来なかっ
た安全性を付加出来たという意義は大きいのである。
In other words, it is significant that it has been able to add safety that could not be achieved with the conventional high-voltage power supply safety circuit based only on the degree of vacuum.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の1実施例を示す概略ブロック図である
。 1・・・・・・陰極、3・・・・・・第1陽極、4・・
・・・・第2陽極、5・・・・・・電子銃室、8・・・
・・・真空ポンプ、9・・・・・・真空計、11・・・
・・・電子引出電源、12・・・・・・電子加速電源、
13・・・・・・放射電子流測定回路、16・・・・・
・比較回路、18・・・・・・基準値設定回路。
FIG. 1 is a schematic block diagram showing one embodiment of the present invention. 1... cathode, 3... first anode, 4...
...Second anode, 5...Electron gun chamber, 8...
...Vacuum pump, 9...Vacuum gauge, 11...
...electronic extraction power supply, 12...electronic acceleration power supply,
13...Radiated electron current measurement circuit, 16...
- Comparison circuit, 18...Reference value setting circuit.

Claims (1)

【特許請求の範囲】 1 真空に排気された電子銃室内に電界放射陰極と、こ
れと対向配置された第1および第2陽極と、前記両陽極
にそれぞれ電子引出電圧および電子加速電圧を印加する
電源回路とを有する電界放射形電子銃において、放射電
子流を測定する回路と、前記電子流を放射したときの電
子銃室の真空度変化を測定する回路と、前記真空度変化
と放射電子流との比が予定値を越えたときに、電子引出
電圧および電子加速電圧の少な(とも一方を遮断する回
路とを具備したことを特徴とする電界放射形電子銃。 2 真空度変化の測定に真空計を用いたことを特徴とす
る特許請求の範囲第1項記載の電界放射形電子銃。 3 真空度変化の測定に、電子銃室の排気に用いるポン
プの動作電流の変化を用いたことを特徴とする特許請求
の範囲第1項記載の電界放射形電子銃。 4 真空度変化測定に真空計および電子銃室排気用ポン
プの動作電流変化の両者を用い、両者によって得られた
真空度変化と放射電子流との比のうち少なくともいずれ
か一方が予定値を越えたときに、電子引出電圧および電
子加速電圧の少なくとも一方を遮断することを特徴とす
る特許請求の範囲第1項記載の電界放射形電子銃。
[Scope of Claims] 1. An electron extraction voltage and an electron acceleration voltage are applied to a field emission cathode, first and second anodes disposed opposite to the field emission cathode, and both anodes, respectively, in an evacuated electron gun chamber. A field emission type electron gun having a power supply circuit, a circuit for measuring a radiation electron flow, a circuit for measuring a change in the degree of vacuum in the electron gun chamber when the electron flow is emitted, and a circuit for measuring the change in the degree of vacuum and the radiation electron flow. A field emission type electron gun characterized in that it is equipped with a circuit that cuts off both an electron extraction voltage and an electron acceleration voltage (one of which is cut off) when the ratio between The field emission type electron gun according to claim 1, characterized in that a vacuum gauge is used. 3. A change in the operating current of a pump used to evacuate the electron gun chamber is used to measure the change in the degree of vacuum. A field emission type electron gun according to claim 1, characterized in that: 4. Both a vacuum gauge and an operating current change of an electron gun chamber exhaust pump are used to measure changes in the degree of vacuum, and the degree of vacuum obtained by both is used. Claim 1, characterized in that at least one of the electron extraction voltage and the electron acceleration voltage is cut off when at least one of the ratios of the change and the emitted electron current exceeds a predetermined value. Field emission type electron gun.
JP51057851A 1976-05-21 1976-05-21 field emission electron gun Expired JPS594826B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51057851A JPS594826B2 (en) 1976-05-21 1976-05-21 field emission electron gun

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51057851A JPS594826B2 (en) 1976-05-21 1976-05-21 field emission electron gun

Publications (2)

Publication Number Publication Date
JPS52141558A JPS52141558A (en) 1977-11-25
JPS594826B2 true JPS594826B2 (en) 1984-02-01

Family

ID=13067476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51057851A Expired JPS594826B2 (en) 1976-05-21 1976-05-21 field emission electron gun

Country Status (1)

Country Link
JP (1) JPS594826B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023170738A (en) * 2022-05-20 2023-12-01 日本電子株式会社 Electron gun, 3D additive manufacturing device, and electron microscope

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8319193B2 (en) 2008-06-20 2012-11-27 Hitachi High-Technologies Corporation Charged particle beam apparatus, and method of controlling the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023170738A (en) * 2022-05-20 2023-12-01 日本電子株式会社 Electron gun, 3D additive manufacturing device, and electron microscope

Also Published As

Publication number Publication date
JPS52141558A (en) 1977-11-25

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