JPS5948862B2 - Equipment for hardening metal surfaces using glow discharge - Google Patents
Equipment for hardening metal surfaces using glow dischargeInfo
- Publication number
- JPS5948862B2 JPS5948862B2 JP7585477A JP7585477A JPS5948862B2 JP S5948862 B2 JPS5948862 B2 JP S5948862B2 JP 7585477 A JP7585477 A JP 7585477A JP 7585477 A JP7585477 A JP 7585477A JP S5948862 B2 JPS5948862 B2 JP S5948862B2
- Authority
- JP
- Japan
- Prior art keywords
- objects
- processed
- treated
- container
- glow discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Discharge Heating (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Description
【発明の詳細な説明】
本発明は所望ガス雰囲気中でのグロー放電によつて鉄鋼
材等の表面硬化を行うための装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for surface hardening of steel materials and the like by glow discharge in a desired gas atmosphere.
近時、グロー放電を応用したイオン窒化法は優れた表面
硬化の一手法として注目され、広く利用され始めている
。Recently, the ion nitriding method using glow discharge has been attracting attention as an excellent surface hardening method and is beginning to be widely used.
所が、工業用のイオン窒化炉は実験炉と異なり、長物の
処理やチャージ当りの量が増加した場合炉内温度のバラ
ツキ、不均一性によつて窒化ムラや歪が発生し、品質の
バラツキが多いという問題を生ずる。斯る不具合を解消
するためにダミーを使用したり、治具を工夫したり、更
には処理中に電流密度の手動調整を行い炉内温度の均一
化を図るべ<努力はしているものの特に炉体が大きくな
つたり、連続炉になつたり、被処理物体の形状が複雑化
したり長尺化した場合には、充分な炉内温度均一性は得
られず品質のバラツキは免れ得ない。第1図は従来の装
置を示す概略図で、1は気密容器を示す。However, industrial ion nitriding furnaces differ from experimental furnaces in that when processing long materials or increasing the amount of charge per charge, uneven nitriding and distortion occur due to variations and non-uniformities in the temperature inside the furnace, leading to variations in quality. This results in the problem that there are many In order to eliminate such problems, it is necessary to use dummies, devise jigs, and even manually adjust the current density during processing to equalize the temperature inside the furnace. When the furnace body becomes larger, when the furnace becomes a continuous furnace, or when the shape of the object to be processed becomes complicated or long, sufficient temperature uniformity within the furnace cannot be obtained and variations in quality are inevitable. FIG. 1 is a schematic diagram showing a conventional device, and 1 indicates an airtight container.
この容器内には絶縁体2により該容器から絶縁されたス
テージ3が置かれ、この上に例えば直径10mm長さ2
400mmの被処理物体4a、4b、4C、・・・・・
・を十数本直立、支持せしめる。この被処理物体の配置
例を第2図に示してある。前記容器にはパイプ5及び6
が接続しており、該パイプ5はバルブ7を介して図示外
の真空ポンプに連結され、容器内を排気する為に利用さ
れる。又、パイプ6はバルブ8を介して所望ガス(例え
ば水素と窒素の混合ガス)が貯蔵されたタンクに接続さ
れている。9は直流電源であり、容器1(アース電位)
と前記被処理物体4a、4b、4c、・・・・・・との
間に接続され該被処理物体を負の電位(一数百V〜千V
程度)に保持する。A stage 3 insulated from the container by an insulator 2 is placed in this container, and a stage 3 with a diameter of 10 mm and a length of 2
400mm objects to be processed 4a, 4b, 4C, etc.
・Stand up and support more than a dozen of them. An example of the arrangement of the objects to be processed is shown in FIG. The container has pipes 5 and 6.
The pipe 5 is connected to a vacuum pump (not shown) via a valve 7, and is used to evacuate the inside of the container. Further, the pipe 6 is connected via a valve 8 to a tank storing a desired gas (for example, a mixed gas of hydrogen and nitrogen). 9 is a DC power supply, and container 1 (earth potential)
and the objects to be processed 4a, 4b, 4c, .
degree).
斯る構成において、先ず容器1内に被処理物体4a、4
b、4c、・・・・・・を配列し、バルブ7を開いて内
部の空気を排気する。In such a configuration, first, the objects to be treated 4a, 4 are placed in the container 1.
b, 4c, . . . are arranged, and the valve 7 is opened to exhaust the air inside.
次にバルブ8を開けタンクより所望のガス(水素と窒素
の混合ガス)を導入し、被処理物体と容器との間に一定
の電圧を印加すると内部にグロー放電が生ずる。このグ
ロー放電により生じた正イオンは加速され被処理物体4
a、4b、4c、・・・・・・の表面に衝突し、その表
面部分を加熱すると共に、該イオンの一部は表皮部分に
付着或いは内部に拡散して窒素化合物を生成する。従つ
てこの放電状態を一定時間経続すれば所定厚さの窒化層
が形成される。所で斯る装置でイオン窒化を行つた場合
の被処理物体の温度を測定した場合、第4図に曲線aで
示す如く中心部と端部とでは極めて大きな差を生じてい
る。又、上端と下端との間にもかなりの温度差があり温
度一様性の欠如していることが判る。そこで本発明者は
種々実験を行い検討を行つた結果、温度バラツキの主な
原因はガス圧と電流密度の関係、ガスの流れとガス濃度
及びアーク放電の発生など,であることがわかつた。そ
して、定位置にある被処理物体の各々が上記項目につい
て同一の条件を与えられるチヤンスに恵まれておらず、
更に炉体と被処理物体との間の熱輻射による影響が加わ
り温度の不均一性は非常に大きくなる。而して本発明は
、上記の問題点を解決するもので局部的なアーク放電を
断ち切ること、炉内でのガス密度を均一にし、被処理物
体表面各部が略同一の条件下にさらされるようにするも
ので、その特徴は被処理物体を炉内で澗歇的に又は連続
的に冫移動させることにある。Next, the valve 8 is opened, a desired gas (mixed gas of hydrogen and nitrogen) is introduced from the tank, and a constant voltage is applied between the object to be treated and the container, causing a glow discharge inside. The positive ions generated by this glow discharge are accelerated and
a, 4b, 4c, . . . , and heat the surface portion, and some of the ions adhere to the skin portion or diffuse inside to generate nitrogen compounds. Therefore, if this discharge state continues for a certain period of time, a nitride layer of a certain thickness is formed. When the temperature of the object to be treated is measured when ion nitriding is carried out using such an apparatus, there is a very large difference between the center and the ends, as shown by curve a in FIG. It can also be seen that there is a considerable temperature difference between the upper end and the lower end, indicating a lack of temperature uniformity. As a result of various experiments and studies, the inventors of the present invention found that the main causes of temperature variations are the relationship between gas pressure and current density, gas flow and gas concentration, and the occurrence of arc discharge. And, each of the objects to be processed in a fixed position does not have a chance to be given the same conditions regarding the above items,
Furthermore, the influence of thermal radiation between the furnace body and the object to be treated is added, and the non-uniformity of temperature becomes very large. The present invention solves the above-mentioned problems by cutting off local arc discharge, making the gas density uniform in the furnace, and ensuring that each part of the surface of the object to be treated is exposed to substantially the same conditions. The feature is that the object to be treated is moved intermittently or continuously within the furnace.
以下図面に基づいて本発明を詳述する。The present invention will be explained in detail below based on the drawings.
第3図は本発明の一実施例を示す概略図で第1図と同符
号は同様な構成物体を示してある。FIG. 3 is a schematic diagram showing an embodiment of the present invention, and the same reference numerals as in FIG. 1 indicate the same constituent objects.
同図においてステージ3は導電体で形成されており、ノ
この上に被処理物体4a,4b,4c,・・・・・・が
電気的に接続するように配置される。ステージ3を支え
る絶縁体2は容器1の底板を貫通して外部に取り出され
、その端部に歯車10が固定される。この歯車はモータ
ー等の駆動装置11に連結され.た歯車12に噛合つて
おり、従つてモーター11を駆動すれば歯車12、歯車
10、絶縁体2を介してステージ3に回転が与えられ、
被処理物体4a,4b,4c,・・・・・・は絶縁体2
の軸心を中心にして回転する。一方前記絶縁体2の中心
部には前記ステージ3に接続した電極13が埋め込まれ
ており、該電極の端部は電源9の負側に接続されている
。その結果ステージ3及び被処理物体4a,4b,4C
,・・・・・・は容器1に対し、負の電位に保たれる。
斯る構成において、第1図と同様容器1内にグロー放電
を生ぜしめれば被処理物体の表面はイオン窒化されてい
くわけであるが、本発明ではグロー放電を生ぜしめると
同時に被処理物体4a,4b,4C,・・・・・・を連
続的に又は間歇的に回転させるのでパイプ6から導入さ
れたガスが容器内で攪拌され、容器内ガス濃度が極めて
均一になる。In the figure, a stage 3 is made of a conductive material, and objects to be processed 4a, 4b, 4c, . . . are arranged on the stage 3 so as to be electrically connected to each other. The insulator 2 supporting the stage 3 is taken out to the outside through the bottom plate of the container 1, and a gear 10 is fixed to the end thereof. This gear is connected to a drive device 11 such as a motor. Therefore, when the motor 11 is driven, rotation is applied to the stage 3 via the gear 12, the gear 10, and the insulator 2.
The objects to be processed 4a, 4b, 4c, ... are insulators 2
rotates around its axis. On the other hand, an electrode 13 connected to the stage 3 is embedded in the center of the insulator 2, and the end of the electrode is connected to the negative side of the power source 9. As a result, stage 3 and objects to be processed 4a, 4b, 4C
, . . . are kept at a negative potential with respect to the container 1.
In such a configuration, if a glow discharge is generated in the container 1 as shown in FIG. 1, the surface of the object to be treated will be ion-nitrided. 4a, 4b, 4C, . . . are rotated continuously or intermittently, the gas introduced from the pipe 6 is stirred in the container, and the gas concentration in the container becomes extremely uniform.
しかも局部的にアーク放電が生じた場合、従来はこれを
防止できなかつたわけであるが、本発明ではアーク放電
が生じそうになつても容器と被処理物体とが相対的に移
動するため、アーク放電の原因が断ちきられるので、ア
ーク放電の発生を極めて少くできる。この様なことから
、容器1内のグロー放電は極めて均質となり、従つて被
処理物体4a,4b,4c,・・・・・・の温度は第4
図bに示す如く極めて均一となる。又、アーク放電への
移行が防止され且つガス濃度を均一にできるため、従来
に比し、被処理物体を密に配置することが可能であり、
従つて作業能率が著じるしく改善される。第5図は本発
明の他の実施例を示すもので、ステージ部の平面図であ
る。この実施例においてはステージ3上に小ステージ3
a,3b,3c,3dを載せ、この小ステージ上に被処
理物体4a,4b,4C,4d・・・・・・を保持して
いる。ステージ3は矢印Aの方向に、又小ステージ3a
,3b,3C,3dは矢印Bの方向に、そして被処理物
体4a,4b,4c・・・・・・は矢印Cの方向に回転
される。即ち、小ステージの回転は被処理物体4a,4
b,4C,・・・・・・を群として回転させており、又
、被処理物体4a,4b,4c・・・・・・の回転は自
転である。この様な回転の組合せを行えば極めて均一度
の高いグロー放電が実現できる。第6図の実施例は連続
炉に関するものであり、14は放電室、]5は被処理物
体の予熱や放電室14との圧力平衡を保つための前処理
室、16は放電室14との圧力平衡を保ち、又加熱され
た被処理物体の焼入等を行う後処理室を示してある。1
7a,17b,17C,17d及び17eはステージで
あり、このステージは前処理室15から放電室へそして
後処理室へと間歇的に直線移動せられる。Moreover, if arc discharge occurs locally, it has not been possible to prevent this in the past, but in the present invention, even if arc discharge is about to occur, the container and the object to be treated move relative to each other, so the arc can be prevented. Since the cause of the discharge is completely eliminated, the occurrence of arc discharge can be extremely reduced. Because of this, the glow discharge inside the container 1 becomes extremely homogeneous, and therefore the temperature of the objects to be treated 4a, 4b, 4c, . . .
As shown in Figure b, it becomes extremely uniform. In addition, since transition to arc discharge is prevented and the gas concentration can be made uniform, it is possible to arrange objects to be processed more closely than in the past.
Therefore, work efficiency is significantly improved. FIG. 5 shows another embodiment of the present invention, and is a plan view of the stage section. In this example, a small stage 3 is placed on stage 3.
The objects to be processed 4a, 4b, 4C, 4d, . . . are held on this small stage. Stage 3 moves in the direction of arrow A, and small stage 3a
, 3b, 3C, and 3d are rotated in the direction of arrow B, and the objects to be processed 4a, 4b, 4c, . . . are rotated in the direction of arrow C. That is, the rotation of the small stage rotates the objects to be processed 4a, 4.
b, 4C, . . . are rotated as a group, and the rotation of the objects to be processed 4a, 4b, 4c, . . . is rotation. By performing such a combination of rotations, extremely highly uniform glow discharge can be achieved. The embodiment shown in FIG. 6 relates to a continuous furnace, where 14 is a discharge chamber, 5 is a pretreatment chamber for preheating the object to be treated and maintaining pressure equilibrium with the discharge chamber 14, and 16 is a chamber for preheating the object to be treated and maintaining pressure equilibrium with the discharge chamber 14. A post-processing chamber is shown in which pressure equilibrium is maintained and the heated object to be processed is quenched. 1
7a, 17b, 17C, 17d and 17e are stages, which are intermittently linearly moved from the pre-treatment chamber 15 to the discharge chamber and then to the post-treatment chamber.
各ステージには複数個の被処理物体18が群として保持
されている。該ステージは放電室14内で回転され、又
必要に応じ被処理物体18を自転せしめる。この様な構
成では、連続炉にありがちな品質のバラツキが極めて少
くなる。以上詳述した如き構成となせば被処理物体表面
の温度の不均一を略完全に解決でき、又局部的なアーク
放電への移行も殆んど生じないので、ア一ク放電の痕跡
のない良質の製品を得ることができる。Each stage holds a plurality of objects 18 to be processed as a group. The stage is rotated within the discharge chamber 14 and rotates the object 18 to be treated if necessary. With such a configuration, the variation in quality that tends to occur in continuous furnaces is extremely reduced. With the configuration described in detail above, the non-uniformity of the temperature on the surface of the object to be processed can be almost completely resolved, and there is almost no transition to local arc discharge, so there is no trace of arc discharge. You can get good quality products.
更にアーク放電もなく、均質な処理が可能であるので、
従来に比し、被処理物体を炉内に密に配置でき、従つて
作業能率の向上が期待できる。尚、上記はイオン窒化を
例に説明したが、イオン浸炭にも同様に利用できる。Furthermore, there is no arc discharge and homogeneous processing is possible.
Compared to the conventional method, objects to be processed can be arranged more closely in the furnace, and therefore, it is expected that work efficiency will be improved. Although the above description has been made using ion nitriding as an example, it can be similarly utilized for ion carburizing.
第1図は従来の装置を示す概略図、第2図はその一部平
面図、第3図は本発明の一実施例を示す概略図、第4図
は従来と本発明とによる温度分布の比較を示す図、第5
図及び第6図は夫々本発明の他の実施例を示す図である
。
1は気密容器、2は絶縁体、3はステージ、4a,4b
,4c,・・・・・・は被処理物体、5及び6はパイプ
、7及び8はバルブ、9は電源、10及び12は歯車、
11はモーターである。FIG. 1 is a schematic diagram showing a conventional device, FIG. 2 is a partial plan view thereof, FIG. 3 is a schematic diagram showing an embodiment of the present invention, and FIG. 4 is a diagram showing temperature distribution according to the conventional device and the present invention. Diagram showing comparison, 5th
6 and 6 are diagrams showing other embodiments of the present invention, respectively. 1 is an airtight container, 2 is an insulator, 3 is a stage, 4a, 4b
, 4c, ... are objects to be processed, 5 and 6 are pipes, 7 and 8 are valves, 9 is a power source, 10 and 12 are gears,
11 is a motor.
Claims (1)
望ガスの雰囲気にする手段及び前記被処理物体と容器と
の間にグロー放電を生ずるに適した電圧を印加する電源
を備え、該グロー放電により生じたイオンの衝撃を利用
して金属表面を硬化する装置において、前記複数の被処
理物体を容器に対しグロー放電中連続的又は間歇的に移
動する如く構成したことを特徴とする装置。 2 前記被処理物体の移動は直線的である特許請求の範
囲1に記載の金属表面を硬化する装置。 3 前記被処理物体の移動はある点を号心にした回転運
動である特許請求の範囲1に記載の金属表面を硬化する
装置。 4 前記被処理物体の移動は複数の被処理物体を群にし
て行うようにした特許請求の範囲1〜3のいずれかに記
載の金属表面を硬化する装置。 5 前記被処理物体の移動は該被処理物体の自転又は自
転を含む特許請求の範囲1〜4のいずれかに記載の金属
表面を硬化する装置。[Scope of Claims] 1. A container capable of storing a plurality of objects to be treated, means for creating a desired gas atmosphere in the container, and applying a voltage suitable for generating a glow discharge between the objects to be treated and the container. an apparatus for hardening a metal surface using ion bombardment generated by the glow discharge, wherein the plurality of objects to be treated are moved relative to the container continuously or intermittently during the glow discharge. A device characterized by: 2. The apparatus for hardening a metal surface according to claim 1, wherein the movement of the object to be treated is linear. 3. The apparatus for hardening a metal surface according to claim 1, wherein the movement of the object to be treated is a rotational movement centered around a certain point. 4. The apparatus for hardening a metal surface according to any one of claims 1 to 3, wherein the movement of the objects to be processed is performed by grouping a plurality of objects to be processed. 5. The apparatus for hardening a metal surface according to any one of claims 1 to 4, wherein the movement of the object to be processed includes rotation or rotation of the object to be processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7585477A JPS5948862B2 (en) | 1977-06-25 | 1977-06-25 | Equipment for hardening metal surfaces using glow discharge |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7585477A JPS5948862B2 (en) | 1977-06-25 | 1977-06-25 | Equipment for hardening metal surfaces using glow discharge |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5410240A JPS5410240A (en) | 1979-01-25 |
| JPS5948862B2 true JPS5948862B2 (en) | 1984-11-29 |
Family
ID=13588218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7585477A Expired JPS5948862B2 (en) | 1977-06-25 | 1977-06-25 | Equipment for hardening metal surfaces using glow discharge |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5948862B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58174569A (en) * | 1982-04-08 | 1983-10-13 | Toshiba Corp | Formation of film comprising metal compound |
| JPS5984680U (en) * | 1982-11-29 | 1984-06-07 | 芝浦メカトロニクス株式会社 | vending machine |
| JPH03115655U (en) * | 1990-03-02 | 1991-11-29 |
-
1977
- 1977-06-25 JP JP7585477A patent/JPS5948862B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5410240A (en) | 1979-01-25 |
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