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JPS5952554B2 - Manufacturing method of printed wiring board - Google Patents
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JPS5952554B2 - Manufacturing method of printed wiring board - Google Patents

Manufacturing method of printed wiring board

Info

Publication number
JPS5952554B2
JPS5952554B2 JP6594981A JP6594981A JPS5952554B2 JP S5952554 B2 JPS5952554 B2 JP S5952554B2 JP 6594981 A JP6594981 A JP 6594981A JP 6594981 A JP6594981 A JP 6594981A JP S5952554 B2 JPS5952554 B2 JP S5952554B2
Authority
JP
Japan
Prior art keywords
ceramic layer
layer
printed wiring
resin
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6594981A
Other languages
Japanese (ja)
Other versions
JPS57181192A (en
Inventor
洋 大平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP6594981A priority Critical patent/JPS5952554B2/en
Publication of JPS57181192A publication Critical patent/JPS57181192A/en
Publication of JPS5952554B2 publication Critical patent/JPS5952554B2/en
Expired legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 本発明は、プリント配線板の製造方法の改良に関する。[Detailed description of the invention] The present invention relates to improvements in a method for manufacturing printed wiring boards.

従来、プリント配線板としては樹脂製の絶縁基板表面に
導体層からなる回路パターンを形成したものが広く用い
られている。
BACKGROUND ART Conventionally, printed wiring boards in which a circuit pattern made of a conductor layer is formed on the surface of an insulating substrate made of resin have been widely used.

ところが、この種のプリント配線板にあつては熱抵抗が
大きく放熱性が悪いと言う問題があり、小型化をはかる
のに大きな制約を受けていた。すなわち、上記樹脂製基
板は、樹脂材料を主成分として構成されているため熱伝
導率が低く、発熱量の多い抵抗、トランジスタ或いはI
C等の電気素子を搭載した場合、この電気素子からの熱
を有効に除去し得ない。このため、発熱量の多い電気素
子を搭載するプリント配線板にあつては、その小型化を
はかることが困難である等の問題があつた。また、樹脂
製基板に無電解メッキ法を用いて導体層を形成する方法
、即ちアデイテツブ方式においては導体層との密着性を
上げるために樹脂基板の粗面化を行う際特殊な化学処理
を必要とした。本発明は上記事情を考慮してなされたも
ので、その目的とするところは、プリント配線板を製造
するに際し、その放熱性を良くし小型化を実現できると
共に、樹脂製基板と導体層との密着性を化学処理を要さ
ずに強固にすることのできるプリント配線板の製造方法
を提供することにある。
However, this type of printed wiring board has the problem of high thermal resistance and poor heat dissipation, and has been subject to significant restrictions on miniaturization. In other words, since the resin substrate is mainly composed of resin material, it has low thermal conductivity and does not contain resistors, transistors, or I/O devices that generate a large amount of heat.
When an electric element such as C is mounted, heat from this electric element cannot be effectively removed. For this reason, there have been problems such as difficulty in reducing the size of printed wiring boards on which electric elements that generate a large amount of heat are mounted. In addition, the method of forming a conductor layer on a resin substrate using an electroless plating method, that is, the aditetsubu method, requires special chemical treatment when roughening the surface of the resin substrate in order to increase the adhesion with the conductor layer. And so. The present invention has been made in consideration of the above circumstances, and its purpose is to improve the heat dissipation properties and realize miniaturization when manufacturing printed wiring boards, as well as to improve the heat dissipation properties of the printed wiring boards and to realize the miniaturization of the printed wiring boards. It is an object of the present invention to provide a method for manufacturing a printed wiring board that can strengthen the adhesion without requiring chemical treatment.

ます、本発明の概要を説明する。本発明は、樹脂製基板
の表面に絶縁性のセラミック材料を溶射してセラミック
層を形成したのち、上記セラミック層上の導体パターン
を形成するようにした方法である。したがつて、本発明
によれば導体パターンをなす導体層が熱伝導性の優れた
セラミック層に接することになり、放熱性の大幅な向上
をはかり得る。このため、発熱を伴う電気素子を搭載す
・る場合にあつても小型化をはかることができる。また
、溶射により形成されたセラミック層が樹脂製基板およ
び導体層に強固に密着するため、樹脂製基板と導体層と
の密着性の向上をはかり得る等の効果を奏する。以下、
本発明の詳細を図示の実施例によつて説明する。
First, an overview of the present invention will be explained. The present invention is a method in which a ceramic layer is formed by spraying an insulating ceramic material onto the surface of a resin substrate, and then a conductor pattern is formed on the ceramic layer. Therefore, according to the present invention, the conductor layer forming the conductor pattern comes into contact with the ceramic layer having excellent thermal conductivity, and it is possible to significantly improve heat dissipation. Therefore, even when an electric element that generates heat is mounted, the device can be made smaller. Further, since the ceramic layer formed by thermal spraying firmly adheres to the resin substrate and the conductor layer, it is possible to improve the adhesion between the resin substrate and the conductor layer. below,
The details of the invention will be explained by means of illustrated embodiments.

第1図a−eは本発明の一実施例に係わるプリント配線
板の製造工程を示す図である。
FIGS. 1a to 1e are diagrams showing the manufacturing process of a printed wiring board according to an embodiment of the present invention.

まず゛、第1図aに示す如くガラス−エポキシ基板等の
樹脂製基板1を準備し、この基板1の上面(表面)を粗
化する。そして、基板1の上面に絶縁性および熱伝導性
の優れたセラミツク材料を溶射し、第1図bに示す如く
セラミツク層2を形成する。ここで、溶射の条件を適切
に選定すれば、第2図に第1図bを一部拡大して示す如
く溶射セラミツク材料の一部を樹脂製基板1にくい込ま
せることができ、これにより基板1とセラミツク層2と
の強固な密着が確保される。溶射するセラミツク材料と
,しては、アルミナ、ジルコニア、マグネシア、チタニ
ア、窒化ホウ素、窒化ケイ素、窒化アルミニウム等の単
独或いはこれらを主成分とする複合物が適用できる。溶
射によるセラミツク層2の厚みは10〔μm〕以上で2
00〔μm〕以下が好ましい。これは、セラミツク層2
の厚みが10〔μm〕以下であると熱を放散する効果お
よび導体層を形成した場合の密着性の確保において不十
分となる。また、セラミツク層2の厚みが200〔μm
〕以上であると、樹脂製基板1とセラミツク層2との熱
膨張差によりこれらの密着性が低下する等の問題が生じ
るためである。次に、前記溶射セラミツク層2上に導体
パターンを形成する方法として二つの方法を用いた。
First, as shown in FIG. 1A, a resin substrate 1 such as a glass-epoxy substrate is prepared, and the upper surface (surface) of this substrate 1 is roughened. Then, a ceramic material having excellent insulation and thermal conductivity is thermally sprayed onto the upper surface of the substrate 1 to form a ceramic layer 2 as shown in FIG. 1B. Here, if the thermal spraying conditions are appropriately selected, a part of the thermal sprayed ceramic material can be embedded into the resin substrate 1, as shown in FIG. 2, which is a partially enlarged view of FIG. Strong adhesion between ceramic layer 1 and ceramic layer 2 is ensured. As the ceramic material to be thermally sprayed, alumina, zirconia, magnesia, titania, boron nitride, silicon nitride, aluminum nitride, etc. may be used alone or a composite material containing these as main components can be used. The thickness of the ceramic layer 2 by thermal spraying is 10 [μm] or more.
00 [μm] or less is preferable. This is ceramic layer 2
If the thickness is less than 10 [μm], the effect of dissipating heat and ensuring adhesion when a conductive layer is formed will be insufficient. In addition, the thickness of the ceramic layer 2 is 200 [μm]
] If this is the case, problems such as a decrease in adhesion between the resin substrate 1 and the ceramic layer 2 due to the difference in thermal expansion between the resin substrate 1 and the ceramic layer 2 occur. Next, two methods were used to form a conductive pattern on the thermally sprayed ceramic layer 2.

第一の導体パターン形成方法は、無電解メツキによる方
法であり、まずセラミツク層2上に無電解メツキの核と
なるパラジウムコロイドを析出させ、次いで第1図Cに
示す如く所要回路の逆パターン状にメツキレジスト3を
印刷する。次いで、第1図dに示す如く無電解メツキ浴
中で所要パターン状に金属層(導体層)4を析出させ、
その後レジスト3を除去することによつて同図eに示す
如きプリント配線板が製造される。なお、電解メツキを
併用する公知の手法によつても導体パターン形・成がで
きるのは勿論である。この第1の導体パターン形成方法
の特徴は樹脂製基板1上に形成した溶射セラミツク層2
が良好な無電解メツキ層の下地層になることを見い出し
たことであり、この機構を説明すると、高温度のプラズ
ムガス中を飛んだセラミツク材料は溶融状態で基板1に
衝突する。
The first conductor pattern forming method is a method using electroless plating. First, palladium colloid, which will become the nucleus of electroless plating, is deposited on the ceramic layer 2, and then a reverse pattern of the required circuit is formed as shown in FIG. 1C. Print Messuki Resist 3 on the surface. Next, as shown in FIG. 1d, a metal layer (conductor layer) 4 is deposited in a desired pattern in an electroless plating bath.
Thereafter, the resist 3 is removed to produce a printed wiring board as shown in FIG. It goes without saying that the conductor pattern can also be formed by a known method that uses electrolytic plating in combination. The feature of this first conductor pattern forming method is that the thermal sprayed ceramic layer 2 is formed on the resin substrate 1.
It has been found that the ceramic material serves as a good base layer for the electroless plating layer. To explain this mechanism, the ceramic material flying through the high-temperature plasma gas collides with the substrate 1 in a molten state.

この保有熱と運動量で樹脂製基板1にセラミツク粒子が
つきささつた状態になる。次いで、飛来したセラミツク
粉末が前記セラミツク上に堆積する。この場合、完全に
前のセラミツクと融合せず、空間部を残した形でくつつ
き非常に複雑な形状をしたまま順次堆積するためセラミ
ツク層2の表面は前記第2図に示した如く非常に入り組
んだ構造となる。この面に無電解メツキにより金属を析
出させると第3図に示す如くセラミツク層2の入り組ん
だ細孔迄メツキの足が生長し、結果的に導体層3とセラ
ミツク層2との密着及びセラミツク層2と基板1との間
の密着が強固に確保される。つまり、樹脂製基板1と導
体層3とが強固に密着されることになる。一方、第二の
導体パターン形成方法は、前記溶射セラミツク層2を有
する樹脂製基板1上に所要パターンの逆パターン状に溶
射レジストを印刷形成し、次いで溶射条件を選定して導
体金属を溶射することによつて選択的に導体パターンを
形成する方法である。
This retained heat and momentum cause the ceramic particles to stick to the resin substrate 1. Then, the flying ceramic powder is deposited on the ceramic. In this case, the ceramic layer 2 does not completely fuse with the previous ceramic layer, but instead leaves a space and is deposited one after another in a very complex shape, so the surface of the ceramic layer 2 becomes extremely rough as shown in Figure 2 above. It has a complicated structure. When metal is deposited on this surface by electroless plating, the legs of the plating grow into the intricate pores of the ceramic layer 2, as shown in FIG. 2 and the substrate 1 is firmly secured. In other words, the resin substrate 1 and the conductor layer 3 are firmly attached. On the other hand, the second conductor pattern forming method involves printing and forming a thermal spray resist in a reverse pattern of the desired pattern on the resin substrate 1 having the thermal sprayed ceramic layer 2, and then thermal spraying a conductive metal by selecting thermal spraying conditions. This is a method of selectively forming conductor patterns.

上記導体金属には銅、アルミ、ニツケル、銀、金等いず
れも可能であるが、電気伝導性、ハンダ付け性および経
済的観点から銅もしくはニツケルが好ましい。また、溶
射レジストは通常の樹脂製レジストで充分である。
The conductive metal may be copper, aluminum, nickel, silver, gold, etc., but copper or nickel is preferred from the viewpoints of electrical conductivity, solderability, and economy. Moreover, a normal resin resist is sufficient as the thermal spray resist.

ここで選択的に導体層が出来る理由について記述すると
、導体パターンを堆積すべき面は溶射セラミツク層2の
面であるので前述のごとく粗面化されており、金属の溶
射膜が容易に堆積する。一方溶射レジスト層の方は樹脂
の滑めらかな面を有しているので、金属の溶射の吹きつ
けるスピードを低下させることによつて、溶射金属粉を
セラミツク層上にのみ堆積させ、レジスト上には堆積さ
せない条件を選びだすことは容易に可能である。かくし
て、第1および第2のいずれの方法によつても所望の導
体パターンが形成される。次に、前記溶射セラミツク層
2の空隙部に耐熱性樹脂を含浸させる工程を施こす。
Here, the reason why a conductive layer is formed selectively is explained. Since the surface on which the conductive pattern is to be deposited is the surface of the thermally sprayed ceramic layer 2, the surface is roughened as mentioned above, and the thermally sprayed metal film is easily deposited. . On the other hand, since the sprayed resist layer has a smooth surface made of resin, by reducing the spray speed of the metal spray, the sprayed metal powder is deposited only on the ceramic layer, and the sprayed metal powder is deposited on the resist layer. It is easily possible to select conditions that do not allow deposition. In this way, a desired conductor pattern can be formed by both the first and second methods. Next, a step of impregnating the voids of the thermally sprayed ceramic layer 2 with a heat-resistant resin is performed.

この樹脂を含浸させる方法は、セラミツク層2を形成し
た後に含浸処理を施こしてもよいが、この場合セラミツ
ク層2の表面凸凹をなくしてはセラミツク層2と導体層
4との強固な密着性を確保できないので、表層に残余し
た樹脂を蒸気洗浄等によつて除去する処理が必要である
。また、別の方法として、導体パターンを形成した後、
表層から耐熱樹脂を真空含浸法等により含浸してセラミ
ツタ層2中に含浸させ硬化し、次いで導体層4が露出す
る迄研削5する方法によつてもよい。樹脂を含浸させた
場合は、セラミツク層2中で水分の吸着による絶縁抵抗
の低下を妨げること、また溶射膜の機械的もろさを改善
する効果がある。ここで使用できる含浸樹脂としては絶
縁性の良1好な熱硬化性樹脂が好適で、例えばエポキシ
樹脂、ジアリルフタレート樹脂、1,2ポリブタジニン
樹脂、ポリイミド樹脂、熱硬化アクリル樹脂、ポリエス
テル樹脂、ビスマレイミド樹脂或いはシリコーン樹脂等
が採用できる。
This method of impregnating the resin may be performed by performing an impregnation treatment after forming the ceramic layer 2, but in this case, it is necessary to eliminate the surface irregularities of the ceramic layer 2 to ensure strong adhesion between the ceramic layer 2 and the conductor layer 4. Since this cannot be ensured, it is necessary to remove the resin remaining on the surface layer by steam cleaning or the like. Alternatively, after forming the conductor pattern,
A method may also be used in which a heat-resistant resin is impregnated from the surface layer by a vacuum impregnation method or the like, impregnated into the ceramic vine layer 2, hardened, and then ground 5 until the conductor layer 4 is exposed. When impregnated with a resin, it has the effect of preventing a decrease in insulation resistance due to moisture adsorption in the ceramic layer 2 and improving the mechanical brittleness of the sprayed film. The impregnating resin that can be used here is preferably a thermosetting resin with good insulation properties, such as epoxy resin, diallyl phthalate resin, 1,2 polybutazinine resin, polyimide resin, thermosetting acrylic resin, polyester resin, bismaleimide. Resin, silicone resin, etc. can be used.

かくして、本実施例方法によれば従来のプリント配線板
に比して熱の放熱性を大幅に高めることができ、これに
より回路の小型化をはかり得る。
Thus, according to the method of this embodiment, heat dissipation performance can be greatly improved compared to conventional printed wiring boards, thereby making it possible to miniaturize the circuit.

しかも、樹脂製基板1と導体層3との密着性を強固にす
ることができ、信頼性の向上をはかり得2る。さらに、
その製造工程も比較的簡易である等の利点がある。また
、本発明方法を適用してプリント配線板を実際に製作し
たところ次のような結果が得られた。
Moreover, the adhesion between the resin substrate 1 and the conductor layer 3 can be strengthened, and reliability can be improved. moreover,
The manufacturing process also has advantages such as being relatively simple. Furthermore, when a printed wiring board was actually produced by applying the method of the present invention, the following results were obtained.

厚み1.6〔Mm〕のガラス基材エポキシ基板J(東芝
ケミカル株式会社製MEL−44)を100〔Mm〕×
100〔Mm〕に切り取り、この基板表面に80メツシ
ユのアルミナ粉をサンドブラストして表面を粗化した。
このとき表面の凸凹の山と谷の距離は10〜300〔μ
m〕になつた。次いで、プラズマ溶射機(第一メテコ社
製プラズマ7M)でアルゴン窒素ガスを用い10〜44
〔μm〕の粒度分布を持つ98〔%〕以上の純度を有す
るアルミナ粉を溶射した。この場合溶射機のノズルを基
板面全面に均一に塗布するように走査して平均50〔μ
m〕のアルミナ溶射量を得た。次いで、この基板上に無
電解メツキの核となるパラジウムコロイドを析出させる
ために無電解メツキプロセス(シツプレイジヤパン社製
P−T−Hプロセス2)によりパラジウムコロイドを析
出させた。さらに、この上に所要導体パターンの逆パタ
ーンをエポキシ樹脂から調整したスクリーンペーストを
印刷し加熱硬化させた。次いで、無電解銅メツキ浴(マ
クダミツドインコーポレイテツド社製メテツクス904
8)でメツキ厚さ20〔μm〕を得た。次いで、カーボ
ンブラツクとフエノール樹脂とから調整した500〔Ω
/?〕の印刷抵抗インクを5〔Mm〕×5〔Mm〕の大
きさになるように印刷形成した。次いで、160〔℃〕
1〔H〕焼成後、これを試料1とした。比較用試料とし
て同一基材からなる銅張りガラス−エポキシ基板からな
るものを同一パターン状に工ツチングし更に同一の抵抗
インクでの抵抗パターンした試料を調整して試料11と
した。次いで、両方の試料1,11に抵抗体の保護コー
ト及びソルダレジストを兼用してソルダーレジストを印
刷150〔℃〕30〔分〕焼成した。各々の抵抗値は5
00〔Ω〕±20〔%〕以内に調整できた。
A glass base epoxy substrate J (MEL-44 manufactured by Toshiba Chemical Corporation) with a thickness of 1.6 [Mm] was 100 [Mm]
The substrate was cut to a size of 100 [Mm], and 80 meshes of alumina powder was sandblasted on the surface of the substrate to roughen the surface.
At this time, the distance between the peaks and valleys of the surface unevenness is 10 to 300 [μ
m]. Next, using a plasma spraying machine (Plasma 7M manufactured by Daiichi Metco Co., Ltd.) using argon nitrogen gas,
Alumina powder having a purity of 98% or more and a particle size distribution of 100 μm was thermally sprayed. In this case, the nozzle of the thermal spraying machine is scanned so as to uniformly coat the entire surface of the substrate, and an average of 50 [μ
The amount of alumina sprayed was obtained. Next, palladium colloid was deposited on this substrate by an electroless plating process (P-T-H Process 2 manufactured by Shippray Japan Co., Ltd.) in order to deposit palladium colloid as a core of electroless plating. Furthermore, a screen paste prepared from epoxy resin with a reverse pattern of the required conductor pattern was printed on this and cured by heating. Next, an electroless copper plating bath (Metex 904 manufactured by MacDamide Inc.) was used.
8), a plating thickness of 20 [μm] was obtained. Next, 500 [Ω] prepared from carbon black and phenol resin.
/? ] The printing resistance ink was printed to have a size of 5 [Mm] x 5 [Mm]. Next, 160 [℃]
1 [H] After firing, this was designated as Sample 1. As a comparison sample, a copper-clad glass-epoxy substrate made of the same base material was patterned into the same pattern, and a resistance pattern was prepared using the same resistance ink, which was prepared as Sample 11. Next, a solder resist was printed on both samples 1 and 11, serving as both a protective coat for the resistor and a solder resist, and was baked at 150 [° C.] for 30 [minutes]. Each resistance value is 5
It was possible to adjust within 00 [Ω] ±20 [%].

これらの抵抗体に1/4〔W〕の電力を印荷して70〔
℃〕で、90〔分〕0n30〔分〕0ffのサイクルで
1000〔H〕通電した結果第4図に示すごとくデータ
が得られた。すなわち、試料1では第4図中曲線Aに示
す如く抵抗変化率が極めて小さく、1000〔H〕後で
も−6〔%〕程度であつた。一方、試料11では曲線B
に示す如く抵抗変化率が極めて大きく、100〔H〕後
で−30〔%〕程度であつた。また、抵抗インクの種類
及び抵抗体面積を種々変えて、許容電力量(上記印荷試
験で1000〔H〕後抵抗値の変化が±10〔%〕以内
の変化以内である最大の電力量)を求めたところ、次表
に示すような許容電力量と抵抗体面積との関係が得られ
た。この関係から明らかなごとく本発明を適用すること
により発熱素子を搭載する際にも基板を大幅に小型化で
きることが判明した。
By applying a power of 1/4 [W] to these resistors, 70 [
As a result of applying a current of 1000 [H] at a cycle of 90 [minutes] 0n30 [minutes] 0ff, data as shown in FIG. 4 was obtained. That is, in Sample 1, the rate of change in resistance was extremely small, as shown by curve A in FIG. 4, and was about -6% even after 1000H. On the other hand, in sample 11, curve B
As shown in Figure 2, the rate of change in resistance was extremely large, about -30% after 100H. In addition, by varying the type of resistor ink and the area of the resistor, the allowable power amount (maximum power amount for which the change in resistance value after 1000 [H] in the above loading test is within ±10 [%]) As a result, we obtained the relationship between allowable power amount and resistor area as shown in the following table. As is clear from this relationship, it has been found that by applying the present invention, the size of the substrate can be significantly reduced even when mounting a heating element.

また、導体の形成に関して本例のメツキ方式の代わりに
前記エポキシ樹脂からなるスクリーンペーストを印刷し
て溶射レジストとして窒素ガスと水素ガスを用いて銅粉
をプラズマ溶射して得られた銅導体を形成して本例と同
様に調整して得られたサンプルは本例と同様な結果を示
した。
Regarding the formation of the conductor, instead of the plating method of this example, a screen paste made of the epoxy resin is printed, and a copper conductor is formed by plasma spraying copper powder using nitrogen gas and hydrogen gas as a thermal spray resist. A sample prepared in the same manner as in this example showed the same results as in this example.

なお、本発明は上述した実施例に限定されるものではな
い。
Note that the present invention is not limited to the embodiments described above.

例えば、前記導体パターンを形成するには、前記無電解
メツキ法や溶射法に限定されるものではなく、各種の方
法を適用できる。また、前記セラミツク層に樹脂を含浸
する工程は必ずしも必要ではな・く、仕様に応じて適宜
省略してもよい。さらに、セラミツク層を形成する溶射
セラミツク材料および導体層を形成する金属材料は、仕
様に応じて適宜定めればよい。その他、本発明の要旨を
逸脱しない範囲で、種々変形して実施することができる
For example, the method for forming the conductive pattern is not limited to the electroless plating method or the thermal spraying method, and various methods can be applied. Further, the step of impregnating the ceramic layer with resin is not necessarily necessary, and may be omitted as appropriate depending on the specifications. Further, the sprayed ceramic material forming the ceramic layer and the metal material forming the conductor layer may be determined as appropriate depending on the specifications. In addition, various modifications can be made without departing from the gist of the present invention.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a−eは本発明の一実施例に係わるプリント配線
板の製造工程を示す図、第2図乃至第4図は上記実施例
の作用を説明するための図で第2図は第1図bの一部拡
大図、第3図は第1図eの一部拡大図、第4図は実験デ
ータを示す特性図である。 ]・・・・・・樹脂製基板、2・・・・・・セラミツク
層、3・・・・・ルジスト、4・・・・・・導体層。
1A to 1E are diagrams showing the manufacturing process of a printed wiring board according to an embodiment of the present invention, and FIGS. 2 to 4 are diagrams for explaining the operation of the above embodiment. FIG. 1B is a partially enlarged view of FIG. 1B, FIG. 3 is a partially enlarged view of FIG. 1E, and FIG. 4 is a characteristic diagram showing experimental data. ]... Resin substrate, 2... Ceramic layer, 3... Luggist, 4... Conductor layer.

Claims (1)

【特許請求の範囲】 1 樹脂製基板の表面に絶縁性のセラミック材料を溶射
してセラミック層を形成したのち、上記セラミック層上
に所望の導体パターンを形成するようにしたことを特徴
とするプリント配線板の製造方法。 2 前記導体パターンを形成する手段は、前記セラミッ
ク層上に所望パターンの導体層を無電解メッキにより析
出させるものであることを特徴とする特許請求の範囲第
1項記載のプリント配線板の製造方法。 3 前記導体パターンを形成する手段は、前記セラミッ
ク層上に所望の導体パターンと逆パターンに溶射レジス
トを印刷したのち、導電性金属材料を溶射して所望パタ
ーンに導体層を形成するものであることを特徴とする特
許請求の範囲第1項記載のプリント配線板の製造方法。 4 前記セラミック層を、前記樹脂製基板の表面の所望
部位のみに形成することを特徴とする特許請求の範囲第
1項記載のプリント配線板の製造方法。 5 前記セラミック層は、耐熱性樹脂を含浸されたもの
であることを特徴とする特許請求の範囲第1項記載のプ
リント配線板の製造方法。
[Claims] 1. A print characterized in that a ceramic layer is formed by spraying an insulating ceramic material on the surface of a resin substrate, and then a desired conductive pattern is formed on the ceramic layer. Method of manufacturing wiring boards. 2. The method for manufacturing a printed wiring board according to claim 1, wherein the means for forming the conductor pattern is to deposit a conductor layer in a desired pattern on the ceramic layer by electroless plating. . 3. The means for forming the conductor pattern is to print a thermal spray resist on the ceramic layer in a pattern opposite to the desired conductor pattern, and then thermally spray a conductive metal material to form a conductor layer in the desired pattern. A method for manufacturing a printed wiring board according to claim 1, characterized in that: 4. The method of manufacturing a printed wiring board according to claim 1, wherein the ceramic layer is formed only on a desired portion of the surface of the resin substrate. 5. The method of manufacturing a printed wiring board according to claim 1, wherein the ceramic layer is impregnated with a heat-resistant resin.
JP6594981A 1981-04-30 1981-04-30 Manufacturing method of printed wiring board Expired JPS5952554B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6594981A JPS5952554B2 (en) 1981-04-30 1981-04-30 Manufacturing method of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6594981A JPS5952554B2 (en) 1981-04-30 1981-04-30 Manufacturing method of printed wiring board

Publications (2)

Publication Number Publication Date
JPS57181192A JPS57181192A (en) 1982-11-08
JPS5952554B2 true JPS5952554B2 (en) 1984-12-20

Family

ID=13301730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6594981A Expired JPS5952554B2 (en) 1981-04-30 1981-04-30 Manufacturing method of printed wiring board

Country Status (1)

Country Link
JP (1) JPS5952554B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59117190A (en) * 1982-12-23 1984-07-06 松下電器産業株式会社 Circuit board
JPS60102794A (en) * 1983-11-09 1985-06-06 ブラザー工業株式会社 Circuit board for electroless plating
JPS6187387A (en) * 1984-07-31 1986-05-02 今井 宏 Flexible printed circuit board

Also Published As

Publication number Publication date
JPS57181192A (en) 1982-11-08

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