JPS5953524B2 - Shearing information - Google Patents
Shearing informationInfo
- Publication number
- JPS5953524B2 JPS5953524B2 JP50133677A JP13367775A JPS5953524B2 JP S5953524 B2 JPS5953524 B2 JP S5953524B2 JP 50133677 A JP50133677 A JP 50133677A JP 13367775 A JP13367775 A JP 13367775A JP S5953524 B2 JPS5953524 B2 JP S5953524B2
- Authority
- JP
- Japan
- Prior art keywords
- optical path
- beam splitter
- common optical
- wavefront
- reflecting mirrors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
- G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Description
【発明の詳細な説明】
本門明は共通光路型シヤリング干渉法の改良に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in common path type shearing interferometry.
シヤリング干渉法とは被検波面を振幅分割し、それぞれ
の波面に相対的変位を与えて干渉縞を得るものであり、
この方法は主にレンズの収差測定やガラス材質の均一性
テスト等に用いられている。Shearing interferometry is a method that divides the amplitude of the wavefront to be measured and applies relative displacement to each wavefront to obtain interference fringes.
This method is mainly used for measuring lens aberrations and testing the uniformity of glass materials.
この方法の利点は干渉用の基準波面なしで被検波面の干
渉縞が得られる点にある。又、レンズ収差測定に際して
は微小横方向ズレ(以後、横方向シャーと呼ぶ)の干渉
縞から直接レンズの横収差を読み取る事ができる。従来
のシヤリング干渉法は大別してサバールプレート等の光
学結晶を用いる方法と反射鏡を用いる方法とがある。The advantage of this method is that interference fringes of the tested wavefront can be obtained without a reference wavefront for interference. Furthermore, when measuring lens aberration, the lateral aberration of the lens can be directly read from the interference fringes of minute lateral deviations (hereinafter referred to as lateral shears). Conventional shearing interferometry can be roughly divided into methods using optical crystals such as Savart plates and methods using reflective mirrors.
第1図は従来の光学結晶を用いたシヤリング干渉法の一
実施例を示す図である。FIG. 1 is a diagram showing an example of a conventional shearing interference method using an optical crystal.
1はサバール板、2は偏光子、3は検光子で、この組合
わせにより同一方向の偏光成分を有する二本の平行光束
4、5が得られる。1 is a Savart plate, 2 is a polarizer, and 3 is an analyzer. By this combination, two parallel light beams 4 and 5 having polarization components in the same direction are obtained.
この光学結晶によりシャー量を得る方法は分離した2本
の光束、即ち基準光束と試験光束の間に光路長の差が生
じない為に可干渉距離の短い白色光源を用いる事が可能
であるが、結晶の大きさに限度があるので、長焦点、大
口径レンズ等の収差測定には不向きである。またに収差
測定の際には被検波面に応じてシャー量を選び、かつ微
小角度を二波面間に加える事は有利であるが、光学結晶
を用いる場合微小角度をつけるためにウオラストンプリ
ズム等を用いる場合が多く従つて生ずる角度やシャー量
は一定となることが多い。反射鏡を用いるシヤリング干
渉法は大別してマ、ハツエンダー干渉計を応用したもの
、平行平面板の表面及び裏面の反射を利用したもの、及
び本発明に係る様に共通光路干渉計を用いたものに大別
される。In this method of obtaining the shear amount using an optical crystal, it is possible to use a white light source with a short coherence distance because there is no difference in optical path length between two separate light beams, that is, the reference light beam and the test light beam. Since there is a limit to the size of the crystal, it is not suitable for measuring aberrations of long focal points, large aperture lenses, etc. Furthermore, when measuring aberrations, it is advantageous to select the shear amount according to the wavefront to be measured and to add a small angle between the two wavefronts, but when using an optical crystal, a Wollaston prism is used to create a small angle. etc., and the resulting angle and shear amount are often constant. Shearing interferometry using a reflecting mirror can be roughly divided into those that apply a Hatsender interferometer, those that utilize reflections on the front and back surfaces of a plane-parallel plate, and those that use a common optical path interferometer as in the present invention. Broadly classified.
第2図はマハツエンダー干渉計を応用した従来丁のシヤ
リング干渉計の一実施例を示すものである。FIG. 2 shows an example of a conventional shearing interferometer to which a Mach-Zender interferometer is applied.
マハツエンダー干渉計を応用したものはビームスプリッ
ター6で振巾分割された波面が異なる光路を通るため反
射鏡7、8、9の面精度の影響を受けやすい。θ 第3
図は平行平面板10又は光学くさびを用いる従来のシヤ
リング干渉計の一実施例である。In the case where the Mach-Zehnder interferometer is applied, the wavefronts whose amplitudes are split by the beam splitter 6 pass through different optical paths, so they are easily affected by the surface accuracy of the reflecting mirrors 7, 8, and 9. θ 3rd
The figure shows an example of a conventional shearing interferometer using a plane parallel plate 10 or an optical wedge.
この様に平行平面板又は光学くさびの表面及び裏面の反
射を用いるものはその光路差が大きいため、レーザ等の
可干渉距離の長い光源を用いなければ5干渉パターンを
得る事ができない。又測定精度を上げる為に、被検物又
はレンズ瞳に観測系のピットを合わせる必要があるが、
この場合は光路差が大きいため正確にピットを合わせる
ことが不可能であり、従つて高精度な測定には不向きで
ある。第4図は共通光路干渉計を用いた従来のシヤリン
グ千渉計の一実施例を示す図である。共通光路千渉計を
用いたものは横方向シヤ一及び角度方向シヤ一が可能で
ある。第4図に示す如く従来の方法では入射光束15に
対して横方向シヤ一を与える為に、ビームスプリツタ一
11を反射鏡12,13,14と垂直なX−Y面に対し
て、垂直方向から角度を成す様に傾ける。その結果ビー
ムスプリツタ一で分割される光束16及び17は光路長
に違いを生じていた。In this way, when using reflection from the front and back surfaces of a parallel plane plate or an optical wedge, the optical path difference is large, so it is impossible to obtain five interference patterns unless a light source with a long coherence length, such as a laser, is used. In addition, in order to improve measurement accuracy, it is necessary to align the pit of the observation system with the object to be measured or the lens pupil.
In this case, since the optical path difference is large, it is impossible to accurately align the pits, and therefore it is unsuitable for highly accurate measurement. FIG. 4 is a diagram showing an embodiment of a conventional shearing interferometer using a common optical path interferometer. Those using a common optical path shear meter are capable of lateral shearing and angular shearing. As shown in FIG. 4, in the conventional method, in order to give lateral shear to the incident light beam 15, the beam splitter 11 is placed perpendicularly to the X-Y plane perpendicular to the reflecting mirrors 12, 13, and 14. Tilt it so that it forms an angle from the direction. As a result, the light beams 16 and 17 split by the beam splitter 1 had different optical path lengths.
第5図は第4図に示したビームスプリツタ一11及び反
射鏡12,13,14で形成される光学系を等価的に展
開し、正面方向から前記光束16,17の振舞いを観祭
した図である。ビームスプリツタ一11を通過し、反射
鏡12,13,14の順で反射され再度ビームスプリツ
タ一11を通過する光束16はビームスプリツタ一11
の傾きによる影響を受けない。一方、ビームスプリツタ
一11で反射され反射鏡を]4,13,12の順で反射
され再度ビームスプリツタ一11で反射される光束17
は、ビームスプリツタ一11の傾きの影響を受ける。光
束17は二度ビームスプリツタ一で反射される為に、最
終的には光束16と光束17は平行な光束になる。この
光束16と17の光路長の相違により、千渉縞を生ぜし
めるには可干渉距離の長い光源が必要となる。又被検面
又はレンズ瞳面に観測系の焦点を結ばせることができな
いので、精密な測定は困難である。この現象は横方向シ
ヤ一を大きくすればする程、即ちビームスプリツタ一1
1の傾斜を大きくすればする程顕著なものとなる。本発
明の目的は上記共通光路型のシヤリング千渉計の欠陥で
あつた分割された光束の光路長の相違をなくすることに
あり、従来の共通光路シヤリング千渉装置に比してごく
簡単な装置により測定範囲が広く、白色光源でも使用可
能なシヤリング干渉装置を提供するものである。FIG. 5 shows an equivalent development of the optical system formed by the beam splitter 11 and reflecting mirrors 12, 13, and 14 shown in FIG. 4, and the behavior of the light beams 16 and 17 is observed from the front direction. It is a diagram. The light beam 16 passes through the beam splitter 11, is reflected by the reflecting mirrors 12, 13, and 14 in this order, and passes through the beam splitter 11 again.
is not affected by the slope of On the other hand, the beam 17 is reflected by the beam splitter 11, reflected in the order of 4, 13, 12, and reflected by the beam splitter 11 again.
is affected by the inclination of the beam splitter 11. Since the light beam 17 is reflected twice by the beam splitter, the light beams 16 and 17 eventually become parallel light beams. Due to the difference in the optical path lengths of the light beams 16 and 17, a light source with a long coherence distance is required to produce variegated fringes. Furthermore, since the observation system cannot be focused on the surface to be inspected or the pupil plane of the lens, precise measurements are difficult. This phenomenon becomes more pronounced as the lateral shear increases.
The larger the slope of 1 is, the more noticeable it becomes. The purpose of the present invention is to eliminate the difference in the optical path length of the divided light beams, which is a defect of the common optical path type shearing beam meter, and to eliminate the difference in optical path length of the divided light beams, which is a defect of the common optical path type shearing beam meter. The present invention provides a shearing interference device that has a wide measurement range and can be used with a white light source.
本発明が共通光路型のシヤリング干渉装置の改良を目指
した理由は、上述したことから明白な様に共通光路型の
干渉計に於いては反射鏡を用いる為被検波面の面積を大
きく取る事が出来、又微小角度をつける場合は反射鏡の
回転により行うので角度は任意に取ることができ従つて
シヤ一量も可変にすることができる。The reason why the present invention aims to improve a common optical path type shearing interferometer is that, as is clear from the above, in a common optical path type interferometer, since a reflecting mirror is used, the area of the wavefront to be detected is large. Furthermore, since a minute angle is created by rotating the reflecting mirror, the angle can be set arbitrarily, and the amount of shear can also be made variable.
更には光路が共通である為に、反射鏡の面精度に欠陥あ
る場合は分割された光束が同様に影響を受けるので、反
射鏡の面精・度の影響を受けにくいという利点があるた
めである。本発明の原理は一枚のビームスプリツタ一と
複数枚の反射鏡を用い、前記ビームスプリツタ一で反射
された波面と透過した波面が共通の光路を互フいに逆方
向に進行する様に光路を構成し、前記複数枚の反射鏡の
内少なくとも二枚以上に前記共通光路を含む面に垂直な
方向に対して、ほぼ同一方向にほぼ同一角度の傾角を与
えることにより、横方向シヤ一を生じた際に光路長に相
違を生じさせ・ないようにしたものである。Furthermore, since the optical path is common, if there is a defect in the surface precision of the reflecting mirror, the divided luminous flux will be affected in the same way, so it has the advantage of being less affected by the surface precision and precision of the reflecting mirror. be. The principle of the present invention is to use one beam splitter and a plurality of reflecting mirrors so that the wavefront reflected by the beam splitter and the wavefront transmitted through the beam splitter travel in opposite directions along a common optical path. The lateral shear can be reduced by configuring an optical path in the same direction and giving at least two of the plurality of reflecting mirrors an angle of inclination in substantially the same direction and at substantially the same angle with respect to the direction perpendicular to the plane containing the common optical path. This is to prevent a difference in optical path length from occurring when one occurs.
以下、実施例を用いて本発明を詳述する。第6図は本発
明に係るシヤリング干渉計の一実施例の斜視図で一枚の
ビームスプリツタ一と3枚の反射鏡で共通光路を構成す
るものである。Hereinafter, the present invention will be explained in detail using Examples. FIG. 6 is a perspective view of an embodiment of a shearing interferometer according to the present invention, in which a common optical path is constructed by one beam splitter and three reflecting mirrors.
第7”図は第6図に示した光学系の平面図である。図中
18は、被検物体がレンズである様な場合は光源(不図
示)にその一方の焦点位置を有する様な被検レンズ自身
を、被検物体が物の場合にはその被検物体上に焦点位置
を有する様な対物レンズである。又例えば被検物体が直
径の大きなレンズの場合は、後述の共通光路に入射する
平行光束の幅が大きくなる為に共通光路は大型化する。
この大型化を防ぐには上記平行光束の光束径を小さくす
る為に一対の凸レンズより成るアフオーカルレンズ系(
コリメータレンズ)を設ける。従つて斯様な場合は上述
の18はコリメーターレンズの一部となる。従つて以後
18はこの様な意味を含めた上で単にレンズと呼ぶ。1
9はビームスプリツタ一、20,21,22はそれぞれ
反射鏡で、ビームスプリツタ一19と反射鏡20,21
,22で共通光路を構成する。7'' is a plan view of the optical system shown in FIG. If the test object is an object, the test lens itself is an objective lens that has a focal point on the test object.For example, if the test object is a lens with a large diameter, the common optical path described below is used. Since the width of the parallel light beam incident on the beam increases, the common optical path becomes larger.
In order to prevent this increase in size, an afocal lens system consisting of a pair of convex lenses (
A collimator lens) is provided. Therefore, in such a case, the above-mentioned 18 becomes a part of the collimator lens. Therefore, hereinafter, 18 will be simply referred to as a lens, including this meaning. 1
9 is a beam splitter 1, 20, 21, 22 are reflecting mirrors, and the beam splitter 19 and the reflecting mirrors 20, 21.
, 22 constitute a common optical path.
ビームスプリツタ一19に入射する光束RはX−Y平面
に平行な状態であり、ビームスプリツタ一19と反射鏡
21はこのX−Y平面に垂直な平面である。反射鏡20
と22はz軸に対し同一方向にほぼ同一角度だけ回転し
ている。The beam R entering the beam splitter 19 is parallel to the X-Y plane, and the beam splitter 19 and the reflecting mirror 21 are perpendicular to the X-Y plane. Reflector 20
and 22 are rotated by approximately the same angle in the same direction with respect to the z-axis.
即ち反射鏡20を矢印23の如くx方向に回転角を持た
せ、反射鏡22も矢印24の如くx方向にほぼ同一角度
だけ回転角を持たせている。光源(不図示)より出射さ
れ、レンズ18で平行にされた光束Rは、X−Y平面に
平行な状態でビームスプリツタ一19に入射する。That is, the reflecting mirror 20 has a rotation angle in the x direction as shown by arrow 23, and the reflecting mirror 22 also has a rotation angle in the x direction by approximately the same angle as shown by arrow 24. A light beam R emitted from a light source (not shown) and made parallel by a lens 18 enters a beam splitter 19 in a state parallel to the XY plane.
ビームスプリツタ一19で反射される光束Aは反射鏡2
0で反射される際にX−Y面に対して角度が与えられ反
射鏡21に入射する。反射鏡21からの光束Aは反射鏡
22で反射される際に再度X−Y平面に平行な光束に戻
されビームスプリツタ一19で反射され結像レンズ25
に入射する。この時ビームスプリツタ一19に入射する
光束Rの位置P1と反射鏡22から再度ビームスプリツ
タ一に入射する位置P2とはZ軸方向に位置のずれを生
じる。一方ビームスプリツタ一19に振幅分割を受け透
過した光束Bは反射鏡22でX−Y平面に対して前記光
束Aとは逆方向の角度が与えられ反射鏡21に入射する
。反射鏡21からの光束は反射鏡20で反射される際に
再度X−Y面に平行な光束に戻されビームスプリツタ一
のP3点を通過して結像レンズ25に向かう。光束Aが
Z軸方向に受ける変位量と光束Bが同じくZ軸方向に受
ける変位量PlP3は等しい。The light beam A reflected by the beam splitter 19 is reflected by the reflecting mirror 2.
When reflected at 0, an angle is given to the X-Y plane and the beam enters the reflecting mirror 21. When the light beam A from the reflector 21 is reflected by the reflector 22, it is returned to a light beam parallel to the X-Y plane, and is reflected by the beam splitter 19, which then passes through the imaging lens 25.
incident on . At this time, a position P1 of the light beam R entering the beam splitter 19 and a position P2 of the light flux R entering the beam splitter 1 again from the reflecting mirror 22 are shifted in the Z-axis direction. On the other hand, the beam B which has been amplitude-divided and transmitted by the beam splitter 19 is given an angle in the opposite direction to the beam A with respect to the X-Y plane by the reflecting mirror 22, and then enters the reflecting mirror 21. When the light beam from the reflecting mirror 21 is reflected by the reflecting mirror 20, it is returned to a light beam parallel to the X-Y plane, passes through point P3 of the beam splitter, and heads toward the imaging lens 25. The amount of displacement that the light beam A receives in the Z-axis direction and the amount of displacement PlP3 that the light beam B receives in the Z-axis direction are equal.
ビームスプリツタ一19及び反射鏡20,21,22で
構成される共通光路を模疑的に展開し、該光路内に於け
る光束A及び光束Bの様子を正面から観察したものが第
8図に示されている。FIG. 8 shows a simulated development of the common optical path consisting of the beam splitter 19 and the reflecting mirrors 20, 21, and 22, and a front view of the states of the luminous flux A and the luminous flux B in the optical path. is shown.
尚、第8図では光束Aと光束Bの光路長を比較しやすい
為に、前記光束Rがビームスプリツタ一に入射する位置
P1を光束A及び光束Bに関して違えて取つてある。第
8図に示す如く光束Aと光束Bは共通光路中を平行光束
として通過するので、相対光路差又は相対角度を持つこ
となく単にZ軸方向の横方向シヤ一を持つて重なり合う
。In FIG. 8, in order to easily compare the optical path lengths of the light beams A and B, the position P1 where the light beam R enters the beam splitter is set differently for the light beams A and B. As shown in FIG. 8, since the light beams A and B pass through a common optical path as parallel light beams, they simply overlap with a lateral shear in the Z-axis direction without having a relative optical path difference or relative angle.
このため可千渉距離の極めて短い白色光源を用いた場合
でも干渉縞を得ることが出来る。又干渉縞を正確に測定
又は撮影する際結像レンズ25によりビームスプリツタ
一19の前方に設けられた測定物又は被検レンズの瞳等
に正確にピットを合わせる事が必要であるが、本発明に
於いては上記の如く分割された二つの波面が結像レンズ
に到達するまでの間に光路差が生じない為に正確にピッ
トを合わせることが可能である。また横方向シヤ一の量
は反射鏡20及び22の回転角度だけに依る量なので任
意の量即ち可変にできるのである。更にレンズの収差測
定の際には横方向シヤ一に加えて該横方向シヤ一と直角
方向に微小角度を二波面間に加えることが有利であるが
、その場合にはビームスプリツタ一19又は反射鏡20
,21,22内のいずれか一枚をX−Y平面内で回転し
て行う。第6図に示した実施例に於いては反射鏡2]を
回転するのが最も有利と考えられる。それは光束A及び
光束Bに与える影響がほぼ等しいという事と反射鏡21
は独立に動かすことが可能である為である。上記の例は
シヤ一を行なう為に反射鏡20及び22を同量だけZ軸
に対して角度をつけた。Therefore, interference fringes can be obtained even when a white light source with an extremely short waving distance is used. In addition, when accurately measuring or photographing interference fringes, it is necessary to use the imaging lens 25 to accurately align the pits with the object to be measured or the pupil of the test lens provided in front of the beam splitter 19. In the invention, since no optical path difference occurs before the two wavefronts divided as described above reach the imaging lens, it is possible to accurately align the pits. Further, since the amount of lateral shear depends only on the rotation angles of the reflecting mirrors 20 and 22, it can be made arbitrary, that is, variable. Furthermore, when measuring lens aberrations, it is advantageous to add a small angle between the two wavefronts in a direction perpendicular to the lateral shear in addition to the lateral shear; in this case, the beam splitter 19 or Reflector 20
, 21, 22 is rotated within the X-Y plane. In the embodiment shown in FIG. 6, it is considered most advantageous to rotate the reflector 2. This is because the influence on the luminous flux A and the luminous flux B is almost equal, and the reflecting mirror 21
This is because they can be moved independently. In the above example, the reflecting mirrors 20 and 22 are angled by the same amount with respect to the Z axis in order to perform shearing.
この角度はほぼ゛同量であれば実用上さしつかえないの
である。上記の実施例に於いては二面の反射鏡に傾角を
設け、この二面で生じる光束のX−Y面への傾きが全体
として相殺される様に設けられている。このことより明
らかな様に、一枚のビームスプリツタ一ど複数枚の反射
鏡から成る共通光路に於いて、前記複数枚の反射鏡の内
少なくと二枚の反射鏡をX−Y面に対して垂直な方向か
らほぼ同一方向にほぼ同一角度の傾角を与えて波面分割
をした光束に横方向シヤ一を生ぜしめる時、該共通光路
に入射する光束及び同じく出射する光束が平行面内に在
り、又該共通光路を出射する波面分割された二本の光束
が平行であるようにすれば、該・共通光路内に於いて傾
斜させる各反射面の方向及び角度は任意で良く、又反射
面の面間隔も任意で良い。第9図は一枚のビームスプリ
ツタ一26と二枚の反射鏡27,28を用いた場合の一
実施例を示ノす斜視図、第10図は同図の平面図である
。As long as this angle is approximately the same amount, there is no practical problem. In the above-mentioned embodiment, the two reflecting mirrors are provided with inclination angles so that the inclinations of the light beams generated on these two surfaces toward the X-Y plane are canceled out as a whole. As is clear from this, in a common optical path consisting of one beam splitter and a plurality of reflecting mirrors, at least two of the plurality of reflecting mirrors are aligned in the X-Y plane. When a lateral shear is produced in a wavefront-split light beam by applying an inclination angle of substantially the same angle from a direction perpendicular to the same direction to the same direction, the light beam entering the common optical path and the light beam also exiting the common optical path are aligned in parallel planes. As long as the two wavefront-split beams exiting the common optical path are parallel, the direction and angle of each reflective surface tilted within the common optical path may be arbitrary. The spacing between the surfaces may also be arbitrary. FIG. 9 is a perspective view showing an embodiment using one beam splitter 26 and two reflecting mirrors 27 and 28, and FIG. 10 is a plan view of the same figure.
この場合横方向のシヤ一は矢印29の方向に倒した反射
鏡27及び同じく矢印30の方向に倒した反射鏡28に
より生ずる。レンズ18からの光束Rと共通光路26,
2・7,28から出射される光束A″とB″はX−Y平
面と平行な面内に在り、又前記光束A″とB″は互いに
平行である。In this case, the lateral shear is caused by the mirror 27 tilted in the direction of arrow 29 and the mirror 28 tilted also in the direction of arrow 30. The light flux R from the lens 18 and the common optical path 26,
The light beams A'' and B'' emitted from the light beams 2, 7, and 28 are in a plane parallel to the X-Y plane, and the light beams A'' and B'' are parallel to each other.
第11図は一枚のビームスプリツタ一31と四枚の反射
鏡32,33,34,35を用いた場合フの一実施例を
示す斜視図、第12図は同図の平面図である。FIG. 11 is a perspective view showing an example of a case in which one beam splitter 31 and four reflecting mirrors 32, 33, 34, and 35 are used, and FIG. 12 is a plan view of the same figure. .
この実施例に於いては、横方向シヤ一を生じる為に反射
鏡32を矢印36の方向に、反射鏡35を矢印37の方
向にそれぞれほぼ同一角度だけ傾けている。勿論、傾斜
させる反射鏡は4枚の反射鏡32,33,34,35の
内、任意の3枚、又は全部の反射鏡を傾斜させることが
できる。その場合に於いてもレンズ18からビームスプ
リツタ一31に入射する光束Rと共通光路31,32,
33,34,35から出射する光束A″,B″とが平行
平面内にあること、又、前記光束A″とB″が互いに平
行である様に前記共通光路を形成しなければならない。
以上本発明に於ける共通光路型シヤリング干渉法に於い
ては、ビームスプリツタ一及び複数枚の反射鏡で構成す
る共通光路に於いて、前記共通光路に入射する光束と該
共通光路から出射する分割された光束が平行平面内に存
しかつ該分割された光束が互いに平行である様に保持し
ながら、前記共通光路内の反射鏡の内少なくとも二枚以
上を傾斜させることにより、共通光路に入射する光束を
横方向にシヤ一を有する二本の光束に分離するものであ
る。In this embodiment, in order to produce lateral shear, the reflecting mirror 32 is inclined in the direction of arrow 36, and the reflecting mirror 35 is inclined in the direction of arrow 37 by substantially the same angle. Of course, any three of the four reflecting mirrors 32, 33, 34, 35, or all of the reflecting mirrors can be inclined. Even in that case, the light flux R entering the beam splitter 31 from the lens 18 and the common optical path 31, 32,
The common optical path must be formed so that the light beams A'' and B'' emitted from the light beams 33, 34, and 35 are in parallel planes, and the light beams A'' and B'' are parallel to each other.
As described above, in the common optical path type shearing interferometry according to the present invention, in a common optical path constituted by a beam splitter and a plurality of reflecting mirrors, a light beam incident on the common optical path and a beam exiting from the common optical path are separated. By tilting at least two or more of the reflecting mirrors in the common optical path, while maintaining the divided beams to be in parallel planes and parallel to each other, It separates the incident light beam into two light beams having a shear in the lateral direction.
従つて本発明の共通光路型シヤリング干渉法に於いては
この分割された光束には光路差が生じない為に従来の共
通光路型シヤリング干渉計に比してより精密な測定がで
き、更には可千渉距離の短い白色光源を使用できる等、
簡易な手段で優れた効果を有するものである。Therefore, in the common optical path type shearing interferometer of the present invention, since no optical path difference occurs in the divided light beams, more precise measurements can be made than with the conventional common optical path type shearing interferometer. It is possible to use a white light source with a short wading distance, etc.
It is a simple method with excellent effects.
第1図、第2図、第3図及び第4図は従来のシヤリング
干渉計の各装置を示す図、第5図は第4図図示の光学系
の一部を等価的に展開した図、第6図は本発明のシヤリ
ング千渉計の一実施例を示す斜視図、第7図は第6図に
示された光学系の平面図、第8図は第6図図示の光学系
の一部を等価的に展開した図、第9図は本発明のシヤリ
ング干渉計の他の実施例を示す斜視図、第10図は第9
図図示の光学系の平面図、第11図は本発明のシヤリン
グ干渉計の他の実施例を示す斜視図、第12図は第11
図図示の光学系の平面図。
18・・・・・ルンズ、19・・・・・・ビームスプリ
ツタ一、20,21,22・・・・・・反射鏡、25・
・・・・・結像レンズ、A,B,R・・・・・・光束。1, 2, 3, and 4 are diagrams showing each device of a conventional shearing interferometer, and FIG. 5 is an equivalent expanded view of a part of the optical system shown in FIG. 4, FIG. 6 is a perspective view showing an embodiment of the shearing angle meter of the present invention, FIG. 7 is a plan view of the optical system shown in FIG. 6, and FIG. 8 is an example of the optical system shown in FIG. 6. FIG. 9 is a perspective view showing another embodiment of the shearing interferometer of the present invention, and FIG.
FIG. 11 is a plan view of the illustrated optical system, FIG. 11 is a perspective view showing another embodiment of the shearing interferometer of the present invention, and FIG.
FIG. 3 is a plan view of the illustrated optical system. 18... Luns, 19... Beam splitter, 20, 21, 22... Reflector, 25.
...Imaging lens, A, B, R...Light flux.
Claims (1)
に横変位を持たせた後前記二波面を重ね合わせるシヤリ
ング干渉法において、一枚のビームスプリッターと複数
個の反射鏡で該ビームスプリッターにより反射された波
面と透過した波面が共通の光路を逆方向に進行する様な
光路を構成し、前記複数個の反射鏡の内少なくとも二枚
以上に、前記共通光路を含む面に垂直な方向に対して、
ほぼ同一方向にほぼ同一角度の傾角を与えたことを特徴
とするシヤリング干渉法。1 In shearing interferometry, in which a wavefront to be measured is divided into two wavefronts, a lateral displacement is given between the two wavefronts, and then the two wavefronts are superimposed, the beam is separated by a single beam splitter and multiple reflecting mirrors. The wavefront reflected by the splitter and the wavefront transmitted through the splitter constitute an optical path in which the wavefront propagates in opposite directions along a common optical path, and at least two of the plurality of reflecting mirrors are provided with an optical path perpendicular to the plane containing the common optical path. With respect to the direction
Shearing interferometry is characterized by giving almost the same angle of inclination in almost the same direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50133677A JPS5953524B2 (en) | 1975-11-07 | 1975-11-07 | Shearing information |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50133677A JPS5953524B2 (en) | 1975-11-07 | 1975-11-07 | Shearing information |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5257839A JPS5257839A (en) | 1977-05-12 |
| JPS5953524B2 true JPS5953524B2 (en) | 1984-12-25 |
Family
ID=15110297
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50133677A Expired JPS5953524B2 (en) | 1975-11-07 | 1975-11-07 | Shearing information |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5953524B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4629372B2 (en) * | 2004-06-29 | 2011-02-09 | パナソニック株式会社 | Lens wavefront aberration inspection method and lens wavefront aberration inspection apparatus used therefor |
-
1975
- 1975-11-07 JP JP50133677A patent/JPS5953524B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5257839A (en) | 1977-05-12 |
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