JPS597089B2 - Plate making method for lithographic printing plates - Google Patents
Plate making method for lithographic printing platesInfo
- Publication number
- JPS597089B2 JPS597089B2 JP9146276A JP9146276A JPS597089B2 JP S597089 B2 JPS597089 B2 JP S597089B2 JP 9146276 A JP9146276 A JP 9146276A JP 9146276 A JP9146276 A JP 9146276A JP S597089 B2 JPS597089 B2 JP S597089B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- photosensitive layer
- lipophilic
- meth
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 13
- 239000000463 material Substances 0.000 claims description 43
- 150000001875 compounds Chemical class 0.000 claims description 20
- 229920005989 resin Polymers 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- 239000000203 mixture Substances 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 13
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 7
- -1 () polyptadiene Polymers 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 150000001336 alkenes Chemical class 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000003504 photosensitizing agent Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000005062 Polybutadiene Substances 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 4
- 229920002857 polybutadiene Polymers 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- ROWKJAVDOGWPAT-UHFFFAOYSA-N Acetoin Chemical compound CC(O)C(C)=O ROWKJAVDOGWPAT-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 206010016807 Fluid retention Diseases 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000008365 aromatic ketones Chemical class 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 231100000053 low toxicity Toxicity 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000013008 thixotropic agent Substances 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- JWTGRKUQJXIWCV-UHFFFAOYSA-N 1,2,3-trihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(O)C(O)CO JWTGRKUQJXIWCV-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- JWYVGKFDLWWQJX-UHFFFAOYSA-N 1-ethenylazepan-2-one Chemical compound C=CN1CCCCCC1=O JWYVGKFDLWWQJX-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- PBGPBHYPCGDFEZ-UHFFFAOYSA-N 1-ethenylpiperidin-2-one Chemical compound C=CN1CCCCC1=O PBGPBHYPCGDFEZ-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- MZGMQAMKOBOIDR-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCO MZGMQAMKOBOIDR-UHFFFAOYSA-N 0.000 description 1
- 125000003006 2-dimethylaminoethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- LRRQSCPPOIUNGX-UHFFFAOYSA-N 2-hydroxy-1,2-bis(4-methoxyphenyl)ethanone Chemical compound C1=CC(OC)=CC=C1C(O)C(=O)C1=CC=C(OC)C=C1 LRRQSCPPOIUNGX-UHFFFAOYSA-N 0.000 description 1
- DIVXVZXROTWKIH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(C)C(=O)C1=CC=CC=C1 DIVXVZXROTWKIH-UHFFFAOYSA-N 0.000 description 1
- IVDGXLVAYRCQRS-UHFFFAOYSA-N 2-hydroxy-2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(O)(OC)C(=O)C1=CC=CC=C1 IVDGXLVAYRCQRS-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical class OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- ZEZCIYUGDCQCOK-UHFFFAOYSA-N 3-chloroprop-1-ene phosphoric acid Chemical group ClCC=C.P(O)(O)(O)=O ZEZCIYUGDCQCOK-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- ZLPORNPZJNRGCO-UHFFFAOYSA-N 3-methylpyrrole-2,5-dione Chemical compound CC1=CC(=O)NC1=O ZLPORNPZJNRGCO-UHFFFAOYSA-N 0.000 description 1
- IYMZEPRSPLASMS-UHFFFAOYSA-N 3-phenylpyrrole-2,5-dione Chemical class O=C1NC(=O)C(C=2C=CC=CC=2)=C1 IYMZEPRSPLASMS-UHFFFAOYSA-N 0.000 description 1
- YMRDPCUYKKPMFC-UHFFFAOYSA-N 4-hydroxy-2,2,5,5-tetramethylhexan-3-one Chemical compound CC(C)(C)C(O)C(=O)C(C)(C)C YMRDPCUYKKPMFC-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- IDCBOTIENDVCBQ-UHFFFAOYSA-N TEPP Chemical compound CCOP(=O)(OCC)OP(=O)(OCC)OCC IDCBOTIENDVCBQ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
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- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
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- 238000004132 cross linking Methods 0.000 description 1
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- 230000007423 decrease Effects 0.000 description 1
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- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
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- 238000006735 epoxidation reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UIONFLFYBWNLOJ-UHFFFAOYSA-N ethene;2-methylprop-2-enoic acid;phosphoric acid Chemical compound C=C.OP(O)(O)=O.CC(=C)C(O)=O UIONFLFYBWNLOJ-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
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- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
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- 150000002689 maleic acids Chemical class 0.000 description 1
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- 238000000465 moulding Methods 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- CYTJMBLSQUBVMS-UHFFFAOYSA-N n-[[2-cyanopropan-2-yl(formyl)amino]hydrazinylidene]formamide Chemical compound N#CC(C)(C)N(C=O)NN=NC=O CYTJMBLSQUBVMS-UHFFFAOYSA-N 0.000 description 1
- NBNOFTFGLDFVLA-UHFFFAOYSA-N n-[[butyl(formyl)amino]hydrazinylidene]formamide Chemical class CCCCN(C=O)NN=NC=O NBNOFTFGLDFVLA-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- GSGDTSDELPUTKU-UHFFFAOYSA-N nonoxybenzene Chemical compound CCCCCCCCCOC1=CC=CC=C1 GSGDTSDELPUTKU-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 239000001814 pectin Substances 0.000 description 1
- 229920001277 pectin Polymers 0.000 description 1
- 235000010987 pectin Nutrition 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 229910002007 uranyl nitrate Inorganic materials 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
【発明の詳細な説明】
本発明は光化学的方法による平版印刷用版の製版方法に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for making a lithographic printing plate by a photochemical method.
従来、平版印刷用版材料として、たとえば砂目立または
陽極酸化法などにより保水性を付与した金属板にジアゾ
ニウム塩などの親油性樹脂を塗布した版材料(PS板)
が一般的であつた。Conventionally, plate materials for lithographic printing have been used, such as plate materials (PS plates), which are made by applying lipophilic resins such as diazonium salts to metal plates that have been given water-retention properties by graining or anodic oxidation.
was common.
このような版材料には種々の欠陥があり、その改良が当
業者間において強く望まれていた。すなわち通常用いら
れるAl板は高価なばかりでなく保水性を付与するため
に行なつている砂目立または陽極酸化に多大の労力と時
間を要し経済性に乏しかつた。また感光液に用いるジア
ゾニウム塩などが有害物質であり、作業者の安全衛生面
での管理に多大の努力と注意が必要であつた。本発明者
らは、上述の欠陥をすべて解消し、安価であり、毒性が
少なく、かつ画像の再現性および印刷適性のすぐれた平
版印刷用版を提供することを目的として鋭意研究を重ね
た結果、本発明を完成するに至つたものである。Such plate materials have various defects, and improvements thereto have been strongly desired by those skilled in the art. That is, the commonly used Al plates are not only expensive, but also require a great deal of labor and time to perform graining or anodic oxidation to impart water retention properties, making them uneconomical. Furthermore, the diazonium salts used in the photosensitive liquid are hazardous substances, and great efforts and care were required to manage the health and safety of workers. The present inventors have conducted extensive research with the aim of eliminating all of the above-mentioned defects and providing a lithographic printing plate that is inexpensive, has low toxicity, and has excellent image reproducibility and printability. , which led to the completion of the present invention.
すなわち、本発明は、炭素一炭素2重結合および(また
は)第3級炭素に結合した水素基との総量をO、05m
ol/kg以上有する親油性樹脂を主成分とする親油性
基材面上に、5重量%以上の親水性ラジカル重合性化合
物を必須成分とする感光層を設け、ついで該感光層の上
に置いたポジフィルムを通して活性光線を照射して非画
線部に親水性ラジカル重合性化合物を付与させたのち水
を主体とする洗浄液で現像せしめることを特徴とする平
版印刷用版の製版方法に係わるものである。That is, in the present invention, the total amount of carbon-carbon double bonds and/or hydrogen groups bonded to tertiary carbon is O, 05m
A photosensitive layer containing 5% by weight or more of a hydrophilic radically polymerizable compound as an essential component is provided on the surface of a lipophilic base material whose main component is a lipophilic resin having a weight of 5% by weight or more, and then placed on the photosensitive layer. A process for making a lithographic printing plate, which is characterized by applying actinic rays through a positive film to impart a hydrophilic radically polymerizable compound to non-image areas, and then developing with a cleaning solution mainly containing water. It is.
本発明は、入手が容易で安価な親油性基材上に保持され
た感光層中の親水性ラジカル重合性化合物を、ポジのリ
スフイルムを通して活性光線により該親油性基材表面に
付加せしめて非画線部である親水性表面を形成させ、該
親油性基材表面に未露光のために付加し得なかつた親水
性ラジカル重合性化合物を水を主体とする洗浄液で除去
して、画線部である親油性基材自体の表面を露出させる
ことからなる製版方法である。従来、親水性基材上に光
化学的方法により親油性画線部を付着させる方法が一般
的であるが本発明は上述したように従来法とは根本的に
思想を異にしたものであり、安価であり、毒性が少なく
、かつ画像の再現性および印刷適性のすぐれた版を容易
に製版し得ることを可能ならしめたものである。本発明
において用いられる親油性樹脂としては、印刷時に使用
する平版印刷用インキに対して充分な感脂性を有し、か
つ親水性ラジカル重合性化合物が活性光線の照射により
付加し得るものが用いられる。In the present invention, a hydrophilic radically polymerizable compound in a photosensitive layer supported on an easily available and inexpensive lipophilic base material is added to the surface of the lipophilic base material using actinic rays through a positive lithium film. A hydrophilic surface, which is the image area, is formed, and the hydrophilic radically polymerizable compound that could not be added to the surface of the lipophilic base material due to unexposed light is removed with a cleaning solution mainly composed of water. This is a plate-making method that consists of exposing the surface of the lipophilic base material itself. Conventionally, a method of attaching a lipophilic image area to a hydrophilic substrate by a photochemical method has been common, but as described above, the present invention is fundamentally different in concept from the conventional method. This makes it possible to easily produce plates that are inexpensive, have little toxicity, and have excellent image reproducibility and printability. The lipophilic resin used in the present invention is one that has sufficient liposensitivity to the lithographic printing ink used during printing and to which a hydrophilic radically polymerizable compound can be added by irradiation with actinic rays. .
具体的には、たとえば()ポリプタジエン、ポリイソプ
レン、ポリペンタジエンなどのジエン系単独重合体;ブ
タジエン、イソプレン、ペンタジエンなどのジエン系単
量体を一成分系とするスチレン、(メタ)アクリル酸エ
ステルあるいは(メタ)アクリロニトリルなどとの二元
または多元共重合体;不飽和ポリエステル;不飽和ポリ
エポキシド:不飽和ポリアクリル:高密度ポリエチレン
などの分子中に炭素一炭素2重結合を有する線状高分子
または三次元高分子類、(11)スチレン、プロピレン
、塩化ビニル、アクリロニトリル、アクリル酸、アクリ
ル酸エステル、アルキルビニルエステル、ビニルカルバ
ゾールなどの1置換オレフインおよびマレイン酸、フマ
ル酸、クロトン酸などの1・2−ジ置換オレフインの単
独あるいは共重合体;該1置換オレフインおよび(また
は)該1・2−ジ置換オレフインとメタクリル酸、メタ
クリル酸エステル、メタクリロニトリル、イソブチンな
どの1・1−ジ置換オレフインとの共重合体;ポリエポ
キシド、ポリウレタン、ポリアミド、などの縮合系重合
体;セルロース誘導体などの天然高分子などの分子中に
第3級炭素に結合する水素基を有する線状高分子または
三次元高分子類などがあげられる。これらの樹脂は単独
また2種以上混合して用いることができる。この際、分
子中に含まれる炭素一炭素2重結合および(または)第
3級炭素に結合した水素基との総量が0.05m01A
9以上、望ましくは0.1m01/Kg以上である必要
がある。分子中に炭素一炭素2重結合および(または)
第3級炭素に結合する水素基の総量を0.05m01A
g未満しか含まない親油性樹脂では、親水性ラジカル重
合性化合物の活性光線の照射による付加量が不足し、表
面の親水性が不充分である。これらの親油性樹脂類には
、顔料、染料、充てん剤、硬化剤、可塑剤、光増感剤な
どを添加し分散して親油性基材とすることができる。Specifically, for example, diene homopolymers such as () polyptadiene, polyisoprene, and polypentadiene; styrene, (meth)acrylic acid esters, etc. containing diene monomers such as butadiene, isoprene, and pentadiene as one component; Binary or multicomponent copolymers with (meth)acrylonitrile, etc.; Unsaturated polyester; Unsaturated polyepoxide: Unsaturated polyacrylic: Linear or tertiary polymers with one carbon-carbon double bond in the molecule, such as high-density polyethylene (11) 1-substituted olefins such as styrene, propylene, vinyl chloride, acrylonitrile, acrylic acid, acrylic esters, alkyl vinyl esters, and vinyl carbazole, and 1-2- such as maleic acid, fumaric acid, and crotonic acid. A homopolymer or a copolymer of a di-substituted olefin; a combination of the 1-substituted olefin and/or the 1,2-disubstituted olefin with a 1,1-disubstituted olefin such as methacrylic acid, methacrylic acid ester, methacrylonitrile, isobutyne, etc. Copolymers; condensation polymers such as polyepoxides, polyurethanes, and polyamides; linear or three-dimensional polymers that have hydrogen groups bonded to tertiary carbons in their molecules, such as natural polymers such as cellulose derivatives etc. can be mentioned. These resins can be used alone or in a mixture of two or more. At this time, the total amount of carbon-carbon double bonds and/or hydrogen groups bonded to tertiary carbon contained in the molecule is 0.05m01A
It needs to be 9 or more, preferably 0.1 m01/Kg or more. Carbon-carbon double bond and/or
The total amount of hydrogen groups bonded to tertiary carbon is 0.05m01A
If the lipophilic resin contains less than 100 g, the amount of the hydrophilic radically polymerizable compound added by irradiation with actinic rays is insufficient, and the surface hydrophilicity is insufficient. Pigments, dyes, fillers, curing agents, plasticizers, photosensitizers, and the like can be added and dispersed to these lipophilic resins to form lipophilic base materials.
親油性樹脂類を用いて定形の親油性基材を製造するには
、通常それらをシート状に成形する。To produce a regular lipophilic substrate using lipophilic resins, they are usually formed into a sheet.
シート状に成形するには、加熱して軟化、溶融せしめた
状態で押出し法などで製膜する方法を用いることもでき
るが、適当な溶媒もしくは分散媒に溶解もしくは分散せ
しめられた液状の親油性樹脂類をシート状支持体の表面
に塗布あるいは散布し必要ならば硬化架橋処理を施して
被膜を形成させることもできる。親油性基材の1部を構
成する親油性樹脂類の支持体としては、たとえば紙、プ
ラスチツクスフイルム、布、金属箔などが用いられる。In order to form a sheet, it is also possible to use a method such as extrusion of the heated, softened and melted film, but it is also possible to form a film by extrusion or other methods. A film can also be formed by coating or scattering a resin on the surface of a sheet-like support and, if necessary, subjecting it to a curing and crosslinking treatment. Examples of the support for the lipophilic resin constituting a part of the lipophilic base material include paper, plastic film, cloth, and metal foil.
皮膜状とするときの親油性樹脂の厚さは通常5〜200
0μとし、好ましくは塗布もしくは散布により支持体を
用いる場合には8〜40μ、支持体を用いないで製膜す
る場合は50〜1000μの範囲とする。製膜後にシー
ト状の支持体を積層することもできる。本発明における
親油性基材面上の感光層は、5重量%以上の親水性ラジ
カル重合性化合物を必須成分とし、さらに必要ならば9
6重量%以下の溶媒、10重量%以下の光増感剤、5重
量%以下のラジカル重合禁止剤、40重量%以下のラジ
カル重合性化合物、40重量%以下の高分子固形化剤、
5重量%以下のチクソトロピ一化剤、5重量%以下の界
面活性剤などを併用してなる組成物(以下「感光層組成
物」という)から形成される。The thickness of the lipophilic resin when formed into a film is usually 5 to 200 mm.
The thickness is preferably 0μ, preferably 8 to 40μ when using a support by coating or spraying, and 50 to 1000μ when forming a film without using a support. A sheet-like support can also be laminated after film formation. In the present invention, the photosensitive layer on the surface of the lipophilic base material contains a hydrophilic radically polymerizable compound of 5% by weight or more as an essential component, and if necessary,
6% by weight or less of solvent, 10% by weight or less of photosensitizer, 5% by weight or less of radical polymerization inhibitor, 40% by weight or less of radical polymerizable compound, 40% by weight or less of polymer solidifying agent,
It is formed from a composition (hereinafter referred to as "photosensitive layer composition") which contains a thixotropic agent of 5% by weight or less, a surfactant of 5% by weight or less, and the like.
この感光層組成物には、さらに顔料、染料、充てん剤な
ども併用可能である。ここで、親水性ラジカル重合性化
合物が5重量%未満であると、感光層中の親水性ラジカ
ル重合性化合物の濃度が低いために親油性基材への平版
印刷に必要な親水性の付与が困難である。本発明で用い
られる親水性ラジカル重合性化合物とは、単独重合物が
水または電解質水溶液に溶解および(または)水または
電解質水溶液にて少なくとも10%以上の膨潤性を示す
化合物であり、さらに単独でまたは光増感剤と共存する
ことによつてその吸収波長領域の光照射により親油性基
材に付加し得るものである。Pigments, dyes, fillers, etc. can also be used in combination with this photosensitive layer composition. Here, if the hydrophilic radically polymerizable compound is less than 5% by weight, the concentration of the hydrophilic radically polymerizable compound in the photosensitive layer is low, making it difficult to impart hydrophilicity necessary for lithographic printing to the lipophilic base material. Have difficulty. The hydrophilic radically polymerizable compound used in the present invention is a compound whose homopolymer is soluble in water or an electrolyte aqueous solution and/or exhibits swelling property of at least 10% or more in water or an electrolyte aqueous solution, and which Alternatively, by coexisting with a photosensitizer, it can be added to a lipophilic base material by irradiation with light in the absorption wavelength region.
たとえば、(メタ)アクリル酸類;2−ヒドロキシエチ
ル(メタ)アクリレート、ジエチレングリコールモノ(
メタ)アクリレート、トリエチレングリコールモノ(メ
タ)アクリレート、ポリエチレングリコールモノ(メタ
)アクリレート、2−ヒドロキシプロピル(メタ)アク
リレート、3−ヒドロキシプロピル(メタ)アクリレー
ト、グリセロールモノ(メタ)アクリレート、ポリエチ
レングリコールジ(メタ)アクリレート(ポリエチレン
グリコールの分子量は300以上)、2−ジメチルアミ
ノエチル(メタ)アクリレート、2−ジメチルアミノプ
ロピル(メタ)アクリレート、2−スルホエチル(メタ
)アクリレート、3−スルホプロピル(メタ)アクリレ
ート、2−りん酸エチレン(メタ)アクリレート、2−
りん酸−1−クロロメチルエチレン(メタ)アクリレー
トなどの(メタ)アクリル酸エステル類;N−ビニルイ
ミダゾール、ビニルピリジン、N−ビニルピペリドン、
N−ビニルカプロラクタム、N−ビニルピロリドンなど
のビニル化合物類;スチレンスルホン酸類;(無水)マ
レイン酸、メチル(無水)マレイン酸、フエニル(無水
)マレイン酸などのマレイン酸類;マレイミド、メチル
マレイミド、フエニルマレイミドなどのマレイミド類;
(メタ)アクリルアミド、N−メチル(メタ)アクリル
アミド、N−エチル(メタ)アクリルアミド、N−プロ
ピル(メタ)アクリルアミド、N−ブチル(メタ)アク
リルアミド、N・2−ヒドロキシエチル(メタ)アクリ
ルアミド、N−N−メチレンビス(メタ)アクリルアミ
ド、N−メチロール(メタ)アクリルアミド、(メタ)
アクリルモルホリン、N−プロピルオキシ(メタ)アク
リルアミド、N−N−ジメチル(メタ)アクリルアミド
、N−N−ジエチル(メタ)アクリルアミド、ジアセト
ンアクリルアミドなどの(メタ)アクリルアミド類があ
げられ、このうちの1種または2種以上を併用して用い
られる。本発明で用いられる光増感剤は、三重項エネル
ギーが50Kca1/MOl以上の三重項増感剤または
活性光線によつて遊離ラジカルを生成するものであり、
公知のものが用いられる。For example, (meth)acrylic acids; 2-hydroxyethyl (meth)acrylate, diethylene glycol mono(
meth)acrylate, triethylene glycol mono(meth)acrylate, polyethylene glycol mono(meth)acrylate, 2-hydroxypropyl(meth)acrylate, 3-hydroxypropyl(meth)acrylate, glycerol mono(meth)acrylate, polyethylene glycol di( meth)acrylate (the molecular weight of polyethylene glycol is 300 or more), 2-dimethylaminoethyl (meth)acrylate, 2-dimethylaminopropyl (meth)acrylate, 2-sulfoethyl (meth)acrylate, 3-sulfopropyl (meth)acrylate, 2-phosphoric acid ethylene (meth)acrylate, 2-
(Meth)acrylic acid esters such as phosphoric acid-1-chloromethylethylene (meth)acrylate; N-vinylimidazole, vinylpyridine, N-vinylpiperidone,
Vinyl compounds such as N-vinylcaprolactam and N-vinylpyrrolidone; Styrene sulfonic acids; Maleic acids such as (anhydrous) maleic acid, methyl (anhydrous) maleic acid, and phenyl (anhydrous) maleic acid; maleimide, methylmaleimide, phenyl Maleimides such as maleimide;
(meth)acrylamide, N-methyl (meth)acrylamide, N-ethyl (meth)acrylamide, N-propyl (meth)acrylamide, N-butyl (meth)acrylamide, N-2-hydroxyethyl (meth)acrylamide, N- N-methylenebis(meth)acrylamide, N-methylol(meth)acrylamide, (meth)
Examples include (meth)acrylamides such as acrylmorpholine, N-propyloxy(meth)acrylamide, N-N-dimethyl(meth)acrylamide, N-N-diethyl(meth)acrylamide, and diacetone acrylamide; one of these A species or a combination of two or more species may be used. The photosensitizer used in the present invention is a triplet sensitizer with a triplet energy of 50 Kca1/MOl or more or one that generates free radicals by actinic rays,
A known one is used.
例えば、ベンゾイン、アセトインなどのアシロイン類;
ベンゾインメチルエーテル、ベンゾインエチルエーテル
、ベンゾインイソプロピルエーテル、アニソインエチル
エーテル、ピバロインエチルエーテルなどのアシロイン
エーテル類;α−メチルベンゾイン、α−メトキシベン
ゾインなどのα一置換アシロイン類;ナフトキノン、ア
ントラキノンなどのキノン類、ベンゾフエノン、アセト
フエノンなどの芳香族ケトン類;ミヒラーズケトン、ヒ
ドロキシベンゾフエノンなどの置換芳香族ケトン類;ア
ゾビスイソブチロニトリル、2−シアノ−2−プロピル
アゾホルムアミド、2−シアノ−2−ブチルアゾホルム
アミドなどのアゾ化合物類;硝酸ウラニル、塩化第2鉄
などの金属塩類などが好適であり、その他メルカプタン
類、ジスルフイド類、ハロゲン化合物類、染料類なども
使用できる。本発明において、暗反応特に感光層におけ
る暗反応を阻止するために、公知のラジカル重合禁止剤
が用いられる。For example, acyloins such as benzoin and acetoin;
Acilloin ethers such as benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, anisoin ethyl ether, pivaloin ethyl ether; α-monosubstituted acyloins such as α-methylbenzoin and α-methoxybenzoin; naphthoquinone, anthraquinone, etc. quinones, aromatic ketones such as benzophenone and acetophenone; substituted aromatic ketones such as Michler's ketone and hydroxybenzophenone; azobisisobutyronitrile, 2-cyano-2-propylazoformamide, 2-cyano-2 - Azo compounds such as butylazoformamide; metal salts such as uranyl nitrate and ferric chloride are suitable, and mercaptans, disulfides, halogen compounds, dyes, etc. can also be used. In the present invention, a known radical polymerization inhibitor is used to inhibit dark reactions, particularly dark reactions in the photosensitive layer.
例えば、ハイドロキノン、2・4−Tert−ブチルヒ
ドロキシトルエン、N−Nジフエニルニトロソアミンな
どがあげられる。本発明で用いられるラジカル重合性化
合物は、スチレン、ビニルトルエン、(メタ)アクリル
酸エステルなど通常一般に用いられるものである。本発
明において、感光層が固形状を保持する目的あるいは感
光層組成物が液状である場合、すなわち感光液として用
いられる場合の粘度調節の目的で、公知の高分子固形化
剤が用いられる。たとえば、ポリビニルアルコール、ポ
リ酢酸ビニル、セルロース誘導体、ゼラチン、ペクチン
、アクリル共重合体、ポリビニルピロリドン、ポリエチ
レンイミンなどがあげられる。同様の目的で、多価アル
コールとベンズアルデヒドとの縮合物または金属石けん
などのチクソトロピ一化剤を用いることもできる。本発
明において、溶媒は、感光層組成物が液状の状態、いわ
ゆる感光液として用いられるときに主に使用される。Examples include hydroquinone, 2,4-tert-butylhydroxytoluene, N-N diphenylnitrosamine, and the like. The radically polymerizable compounds used in the present invention are commonly used compounds such as styrene, vinyltoluene, and (meth)acrylic acid esters. In the present invention, a known polymer solidifying agent is used for the purpose of maintaining the solid state of the photosensitive layer or for the purpose of adjusting the viscosity when the photosensitive layer composition is liquid, that is, when used as a photosensitive liquid. Examples include polyvinyl alcohol, polyvinyl acetate, cellulose derivatives, gelatin, pectin, acrylic copolymers, polyvinylpyrrolidone, polyethyleneimine, and the like. For the same purpose, thixotropic agents such as condensates of polyhydric alcohols and benzaldehyde or metal soaps can also be used. In the present invention, the solvent is mainly used when the photosensitive layer composition is used in a liquid state, that is, as a so-called photosensitive liquid.
該溶媒は、親水性ラジカル重合性化合物、高分子固形化
剤もしくは光増感剤などを溶解し、かつ親油性基材を溶
解せず、ラジカル重合を禁止または抑制しない公知の溶
媒が用いられる。特に制限はないが、感光液の望ましい
乾燥過程を保持するためには、沸点が60〜150℃の
溶媒が望ましい。例えば、アルコール類、エステル類、
ケトン類、エーテル類、芳香族化合物類、水などの単独
あるいは混合溶媒が用いられる。本発明において、親油
性基材面上に親水性ラジカル重合性化合物を含む感光層
を設けるには、感光層組成物が非液状の場合、融解して
親油性基材上に塗布冷却するか、感光層組成物を上述の
溶媒で溶解し、親油性基材上に塗布後、溶媒を蒸発させ
乾燥して感光層を形成させる。一方、感光層組成物が液
状のいわゆる感光液である場合には、そのまま塗布乾燥
して感光層が形成される。感光層組成物溶液を親油性基
材上に塗布する方法としては、デイツピング塗装、スプ
レー塗装、カーテンフローコーター塗装、ロールコータ
ー塗装などの他に、流し塗り、たんぽん塗り、はけ塗り
、ホウイラ一塗りなどの通常の方法がとられる。親油性
基材に感光層を設ける他の方法として、あらかじめ成形
した感光層を親油性基材にラミネーシヨンすることもで
きる。いずれの方法においても連続的に感光層を設ける
ことが望ましい。親油性基材面上に設けられる感光層の
厚さは特に限定はないが、乾燥膜厚で0.2〜2000
μ、望ましくは0.5〜500μである。As the solvent, a known solvent that dissolves the hydrophilic radical polymerizable compound, polymer solidifying agent, photosensitizer, etc., does not dissolve the lipophilic base material, and does not inhibit or suppress radical polymerization is used. Although there are no particular limitations, a solvent with a boiling point of 60 to 150° C. is desirable in order to maintain a desirable drying process of the photosensitive liquid. For example, alcohols, esters,
Single or mixed solvents such as ketones, ethers, aromatic compounds, and water are used. In the present invention, in order to provide a photosensitive layer containing a hydrophilic radically polymerizable compound on the surface of a lipophilic base material, if the photosensitive layer composition is non-liquid, it may be melted and applied onto the lipophilic base material and cooled; The photosensitive layer composition is dissolved in the above-mentioned solvent and applied onto a lipophilic base material, and then the solvent is evaporated and dried to form a photosensitive layer. On the other hand, when the photosensitive layer composition is a liquid so-called photosensitive liquid, the photosensitive layer is formed by coating and drying as is. Methods for applying the photosensitive layer composition solution onto the lipophilic substrate include dip coating, spray coating, curtain flow coating, roll coater coating, flow coating, tampon coating, brush coating, and foil coating. Conventional methods such as painting are used. Another method of providing a photosensitive layer on a lipophilic substrate is to laminate a preformed photosensitive layer onto the lipophilic substrate. In either method, it is desirable to provide a continuous photosensitive layer. The thickness of the photosensitive layer provided on the lipophilic base material surface is not particularly limited, but the dry film thickness is 0.2 to 2000.
μ, preferably 0.5 to 500 μ.
0.2μ以下だと親油性基材上に親水性の非画線部を付
与するのが困難であり、2000μをこえると、経済的
に得策でないばかりでなく光照射の効率が低下し望まし
くない。If it is less than 0.2μ, it is difficult to provide a hydrophilic non-image area on the lipophilic base material, and if it exceeds 2000μ, it is not only not economically advisable but also the efficiency of light irradiation decreases, which is undesirable. .
かくして得られた平版印刷用版材料を用いて製版するに
は、感光層の上にポジフイルムを密着後、ポジフイルム
を通して活性光線を照射し、ポジフイルムをはがした後
に親油性基材上を水を主体とした洗浄液で洗つて親油性
の画線部および親水性の非画線部を親油性基材上に形成
させて版とする。In order to make a plate using the lithographic printing plate material obtained in this way, a positive film is closely attached on the photosensitive layer, active light is irradiated through the positive film, and after the positive film is peeled off, a film is applied onto the lipophilic base material. A plate is prepared by washing with a water-based cleaning solution to form a lipophilic image area and a hydrophilic non-image area on the lipophilic base material.
また、親油性基材上に塗布された感光層組成物を液状の
状態のままで製版することも可能である。この場合、液
状感光層の上に透明フイルムをかぶせ、その上にポジフ
イルムを密着させてから活性光線を照射する。用いられ
る活性光線は250nm〜700nmの範囲の波長を用
いることが望ましく、親油性基材の劣化を伴なわない波
長領域であればさらに望ましい。Further, it is also possible to make a plate from the photosensitive layer composition coated on the lipophilic base material while it is in a liquid state. In this case, a transparent film is placed over the liquid photosensitive layer, a positive film is placed on top of the transparent film, and then active light is irradiated. The active light used preferably has a wavelength in the range of 250 nm to 700 nm, and more preferably a wavelength range that does not cause deterioration of the lipophilic base material.
その光源としては、例えば低圧水銀灯、高圧水銀灯、け
い光ランプ、キセノンランプ、カーボンアークランプ、
タングステン白熱灯、太陽光の中から選択されたものを
用いる。活性光線の照射時間は目的にもよるが、数秒か
ら10分間以内である。本発明によつて得られる平版印
刷用版は、非常に安価であり、毒性が少ないにもかかわ
らず、画像の再現性および印刷適性のすぐれたものであ
り、印刷業界、事務機器業界において多用できるもので
ある。Examples of the light source include low-pressure mercury lamps, high-pressure mercury lamps, fluorescent lamps, xenon lamps, carbon arc lamps,
Use a selection of tungsten incandescent lamps and sunlight. The irradiation time of actinic rays depends on the purpose, but is from several seconds to 10 minutes. Although the lithographic printing plate obtained by the present invention is very inexpensive and has low toxicity, it has excellent image reproducibility and printability, and can be widely used in the printing industry and office equipment industry. It is something.
つぎに実施例をかかげて、さらに具体的に本発明を説明
するが、これによつて本発明の特許範囲が制限されるも
のではない。Next, the present invention will be explained in more detail with reference to Examples, but the patent scope of the present invention is not limited thereby.
実施例 1
1・4−ポリブタジエン(日本ゼオン(株)製造、商品
名「LCB−150」、平均分子量5500)100重
量部をミネラノvスピリツト300重量部に溶解し、金
属コバルトとして0.15重量部相当のナフテン酸コバ
ルトを添加して親油性樹脂組成物を得た。Example 1 100 parts by weight of 1,4-polybutadiene (manufactured by Nippon Zeon Co., Ltd., trade name "LCB-150", average molecular weight 5500) was dissolved in 300 parts by weight of Minelano V Spirit, and 0.15 parts by weight as metal cobalt was dissolved. A lipophilic resin composition was obtained by adding a corresponding amount of cobalt naphthenate.
ついでこの組成物を巾1m、長さ50m,厚さ0.15
mmのアルミニウム板の片面に、厚さ40μの塗膜を形
成するように10m/分の速度でロールコーター塗装し
、50℃、1分および200〜210℃で3分間加熱硬
化せしめて親油性基材Aを得た。ついで、無水マレイン
酸40重量部とスチレン−無水マレイン酸の共重合体(
分子量5000)3重量部をアセトン100重量部に溶
解した感光層組成物の溶液を親油性基材Aのポリブタジ
エン面に10m/分の速度でカーテンフローコーターで
塗布し、60℃で2分間乾燥し、2μの感光層を設けて
版材料を作成した。Then, this composition was applied to a width of 1 m, a length of 50 m, and a thickness of 0.15 m.
A film of 40μ thick was coated on one side of an aluminum plate with a roll coater at a speed of 10 m/min, and then heated and cured at 50°C for 1 minute and 200-210°C for 3 minutes to form a lipophilic group. Material A was obtained. Next, 40 parts by weight of maleic anhydride and a styrene-maleic anhydride copolymer (
A solution of the photosensitive layer composition in which 3 parts by weight (molecular weight 5000) was dissolved in 100 parts by weight of acetone was applied to the polybutadiene surface of the lipophilic base material A at a speed of 10 m/min using a curtain flow coater, and dried at 60°C for 2 minutes. A plate material was prepared by providing a photosensitive layer with a thickness of 2 μm.
得られた版材料をB4の大きさに切断し、印刷用解像力
テストチヤートのポジフイルムを密着させて、平版用露
光装置(富士写真フイルム(株)製造、商品名「PLA
NOPSPRINTERA3」ケミカルランプ装備、照
射光エネルギー密度15W/m”)を用いて5分間露光
して非画線部に親水性ラジカル重合性化合物を付与して
潜像を形成させた。この版材を5重量%のポリエチレン
グリコールノニルフエニルエーテルを含む水道水で5分
間洗浄し、未露光の親水性ラジカル重合性化合物を除去
した。版を熱風で乾燥後、卓上式オフセツト輪転印刷機
に装置後、2重量%のグリセリンを含む水を湿し水とし
て試刷した結果、解像性は6線/Mml耐刷性は5万枚
通し以上であつた。また得られた版材料を40′Cで1
ケ月間貯蔵しても、解像力、耐刷性に変化はなかつた。
実施例 2
エポキシ化ポリブタジエン(商品名「ニツソPB−BF
lOOO」、日本曹達(株)製造、1・2一重合型、平
均分子量1000、エポキシ化度約30%)100重量
部、無水トリメリツト酸30重量部およびベンゾフエノ
ン13重量部をジオキサン350重量部に溶解し、この
組成物を100μのポリエステルフイルム上の片面に厚
さ40μの塗膜を形成するように10m/分の速度でロ
ールコータ一塗装し、500C1分および140℃で2
分間加熱硬化せしめて親油性基材Bを得た。The obtained plate material was cut into a B4 size, and a positive film of a printing resolution test chart was placed in close contact with the plate material, and a lithographic exposure device (manufactured by Fuji Photo Film Co., Ltd., product name "PLA") was cut.
A latent image was formed by applying a hydrophilic radically polymerizable compound to the non-image area by exposing the plate material for 5 minutes using a NOPSPRINTERA3 chemical lamp equipped with an irradiation light energy density of 15 W/m''. The unexposed hydrophilic radically polymerizable compound was removed by washing with tap water containing % by weight of polyethylene glycol nonyl phenyl ether for 5 minutes.After drying the plate with hot air, it was placed on a tabletop offset rotary printing press and then placed on a tabletop offset rotary printing press for 2 minutes. As a result of trial printing using water containing % by weight of glycerin as dampening water, the resolution was 6 lines/Mml and the printing life was over 50,000 sheets.
Even after storage for several months, there was no change in resolution or printing durability.
Example 2 Epoxidized polybutadiene (trade name "Nitsso PB-BF")
100 parts by weight of "lOOO", manufactured by Nippon Soda Co., Ltd., 1/2 monopolymer type, average molecular weight 1000, degree of epoxidation approximately 30%), 30 parts by weight of trimellitic anhydride, and 13 parts by weight of benzophenone, dissolved in 350 parts by weight of dioxane. This composition was coated on one side of a 100 μm polyester film with a roll coater at a speed of 10 m/min to form a coating film with a thickness of 40 μm, and then coated at 500C for 1 minute and at 140°C for 2 hours.
A lipophilic base material B was obtained by heating and curing for a minute.
ついで、アクリルアミド20重量部、ジエタノールアミ
ン1重量部、ポリビニルピロリドン(分子量約1000
0)2重量部およびハイドロキノン0.01重量部をメ
タノール100重量部に溶解して親油性基材Bのポリブ
タジエン面に10m/分の速度でカーテンフローコータ
ー塗装し、60℃で2分乾燥し、2μの感光層を設けて
版材料を作成した。得られた版材料をB4の大きさに切
断し実施例1と同様に露光、洗い出し、試刷した結果、
解像性は10線/M77!.耐刷偏は5万枚通し以上で
あつた。また得られた版材料の貯蔵性は40℃で1ケ月
間以上であつた。実施例 3
ポリプロピレン(商品名「三菱ノーブレン5020」三
菱油化(株)製造)を表面温度240℃の熱ロールで熱
線しプレス装置により巾1m,長さ10m1厚さ100
μのシート状に成形し、親油性基材Cを得た。Next, 20 parts by weight of acrylamide, 1 part by weight of diethanolamine, and polyvinylpyrrolidone (with a molecular weight of about 1000
0) 2 parts by weight and 0.01 parts by weight of hydroquinone were dissolved in 100 parts by weight of methanol, and coated on the polybutadiene surface of lipophilic base material B at a speed of 10 m/min using a curtain flow coater, and dried at 60°C for 2 minutes. A plate material was prepared by providing a 2 μm photosensitive layer. The obtained plate material was cut into B4 size, exposed, washed out and trial printed in the same manner as in Example 1. As a result,
Resolution is 10 lines/M77! .. The printing life was more than 50,000 sheets. Furthermore, the obtained plate material had a shelf life of more than one month at 40°C. Example 3 Polypropylene (trade name: "Mitsubishi Noblen 5020" manufactured by Mitsubishi Yuka Co., Ltd.) was heated with a hot roll with a surface temperature of 240°C, and then pressed using a press machine to form a material with a width of 1 m, a length of 10 m, and a thickness of 100 m.
A lipophilic base material C was obtained by molding it into a μ sheet shape.
ついで、N−メチロールアクリルアミド20重量部、N
−N′−メチレンピスアクリルアミド1重量部、ヒドロ
キシプロピルメチルセルロースフタレート(分子量約5
000)3重量部、ミヒラーズケトン1重量部およびN
−N−ジフエニルニトロソアミン0.05重量部をエチ
ルアルコール100重量部に溶解し、得られた溶液を親
油性基材Cにホワイラ一で塗装し、室温で30分間乾燥
し2μの感光層を設けて版材料を作成した。Then, 20 parts by weight of N-methylolacrylamide, N
-N'-methylenepisacrylamide 1 part by weight, hydroxypropyl methylcellulose phthalate (molecular weight approximately 5
000) 3 parts by weight, 1 part by weight of Michler's ketone and N
-N-diphenylnitrosamine (0.05 parts by weight) was dissolved in 100 parts by weight of ethyl alcohol, and the resulting solution was applied to the lipophilic base material C with a whiter coat, and dried at room temperature for 30 minutes to form a 2μ photosensitive layer. The plate material was created using
得られた版材料を実施例1と同様に露光、洗い出し、試
刷した結果、現像性は10線/Mml耐刷性は5万枚通
し以上であつた。また得られた版材料の貯蔵性は40℃
で1ケ月間以上であつた。実施例 4
トリエチレングリコールモノメタクリレート40ク、2
−りん酸エチレンメタクリレート407、ベンゾフエノ
ン37およびメチルセロソルブ207を混合溶解して得
られた溶液を実施例3で得られた親油性基材Cに厚さ約
1〜2μで塗布後、厚さ9μのテトロンフイルムをかぶ
せ、その上に平版印刷用解像力テストチヤートのポジフ
イルムを密着させて、実施例1と同様に露光、洗い出し
、試刷した結果、解像性は6線/MTL、耐刷性は5万
枚通し以上であつた。The obtained plate material was exposed, washed out, and trial printed in the same manner as in Example 1. As a result, the developability was 10 lines/Mml, and the printing durability was 50,000 sheets or more. In addition, the storage stability of the obtained plate material was 40°C.
It lasted for over a month. Example 4 Triethylene glycol monomethacrylate 40k, 2
- A solution obtained by mixing and dissolving phosphoric acid ethylene methacrylate 407, benzophenone 37 and methyl cellosolve 207 was applied to the lipophilic base material C obtained in Example 3 to a thickness of about 1 to 2 μm, and then a 9 μm thick solution was applied. A Tetron film was placed over the film, and a positive film of a resolution test chart for lithographic printing was placed on top of the film. Exposure, washing, and trial printing were performed in the same manner as in Example 1. As a result, the resolution was 6 lines/MTL, and the printing durability was as follows. It was over 50,000 pieces.
Claims (1)
結合した水素基との総量を0.05mol/kg以上有
する親油性樹脂を主成分とする親油性基材面上に、5重
量%以上の親水性ラジカル重合性化合物を必須成分とす
る感光層を設け、ついで該感光層の上に置いたポジフィ
ルムを通して活性光線を照射して非画線部に親水性ラジ
カル重合性化合物を付与させたのち、水を主体とする洗
浄液で現像せしめることを特徴とする平版印刷用版の製
版方法。1 5% by weight on the surface of a lipophilic base material whose main component is a lipophilic resin having a total amount of carbon-carbon double bonds and (or) hydrogen groups bonded to tertiary carbon of 0.05 mol/kg or more. A photosensitive layer containing the above hydrophilic radically polymerizable compound as an essential component is provided, and then active light is irradiated through a positive film placed on the photosensitive layer to impart the hydrophilic radically polymerizable compound to the non-image areas. A method for making a lithographic printing plate, which is then developed with a cleaning solution containing mainly water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9146276A JPS597089B2 (en) | 1976-07-30 | 1976-07-30 | Plate making method for lithographic printing plates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9146276A JPS597089B2 (en) | 1976-07-30 | 1976-07-30 | Plate making method for lithographic printing plates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5317406A JPS5317406A (en) | 1978-02-17 |
| JPS597089B2 true JPS597089B2 (en) | 1984-02-16 |
Family
ID=14027030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9146276A Expired JPS597089B2 (en) | 1976-07-30 | 1976-07-30 | Plate making method for lithographic printing plates |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS597089B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0767868B2 (en) * | 1984-10-23 | 1995-07-26 | 三菱化学株式会社 | Photosensitive lithographic printing plate |
| KR900700926A (en) * | 1987-12-23 | 1990-08-17 | 유우진 샘슨 | Copolymers of Maleimide and Aliphatic Vinyl Ethers and Esters Used as Photoresist |
-
1976
- 1976-07-30 JP JP9146276A patent/JPS597089B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5317406A (en) | 1978-02-17 |
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