JPS597649B2 - Manufacturing method of optical fiber material - Google Patents
Manufacturing method of optical fiber materialInfo
- Publication number
- JPS597649B2 JPS597649B2 JP7969976A JP7969976A JPS597649B2 JP S597649 B2 JPS597649 B2 JP S597649B2 JP 7969976 A JP7969976 A JP 7969976A JP 7969976 A JP7969976 A JP 7969976A JP S597649 B2 JPS597649 B2 JP S597649B2
- Authority
- JP
- Japan
- Prior art keywords
- optical fiber
- manufacturing
- cvd
- heating
- fiber material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma- or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】
この発明は通信に用いられる低損失光ファイバの素材の
製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a material for a low-loss optical fiber used in communications.
光ファイバを用いる通信は光ファイバの伝送損失の低減
および光半導体の性能の向上によりきわめて有望視され
ている。Communication using optical fibers is viewed as extremely promising due to the reduction in transmission loss of optical fibers and the improvement in the performance of optical semiconductors.
このような光ファイバ通信に用いられる光ファイバの製
造法にはガラス材料をポットで溶融し紡糸するポット法
と、ガラス5 材料を棒状に成形ししかる後に棒状のガ
ラス材料を紡糸するロッド法がある。高純度ガラス材料
が比較的容易に得られる化学蒸着法(Chemlcal
VapourDeposition)略してCVD法)
は後者の製造法に属する。CVD法で最も一般的な方法
10は内付けCVD法と呼ばれる方法で、これは石英管
の内部で四塩化シリコン、四塩化ゲルマニウ、等を外部
から加熱することにより反応せしめ、二酸化シリコン、
二酸化ゲルマニウム、等の反応生成物を石英管内壁に蒸
着させ、しかる後加熱し、15空隙のない棒状ガラス材
料を得る方法である。上記方法において、蒸着されるガ
ラス層の厚みは第1図のように変化する。これは一定流
量のガスの流れが一方向に向いているため、ガス流によ
つて飛ばされたスズ状ガラスが下流に運ばれ、かつ下2
0流で蒸着されるためである。このように軸方向に不均
一な棒状ガラス原料を紡糸して得られた光ファイバは、
やはり軸方向に不均一である。また光ファイバのコア径
が不均一であるために光ファイバ同志の接続損失の増大
、散乱損失の増大、等を25招く。従来、上記のような
軸方向の不均一性があるため、第1図のような場合は原
料入口側約20訓の部分を捨て、残りのほぼ均一になつ
た部分を使用した。上記のような方法では、CVDをほ
どこした全区間の中で有効な部分が少なく棒状ガラ30
ス材料の利用効率が非常に悪い。軸方向に均一なCVD
膜を得る試みとしては1回のCVDで蒸着する膜厚が数
μm程度の場合に限つて、石英管のガス流の方向を交互
に変化させる方法があるが、この方法でも原理的に1〜
2%35以内の軸方向の不均一性を取り去ることは出来
ない。Methods for manufacturing optical fibers used in such optical fiber communications include the pot method, in which glass material is melted in a pot and spun, and the rod method, in which the glass material is formed into a rod shape and then the rod-shaped glass material is spun. . Chemical vapor deposition method (Chemical vapor deposition method), which allows high-purity glass materials to be obtained relatively easily.
VaporDeposition) (abbreviated as CVD method)
belongs to the latter manufacturing method. The most common CVD method 10 is a method called internal CVD method, in which silicon tetrachloride, germanium tetrachloride, etc. are reacted inside a quartz tube by heating from the outside, and silicon dioxide,
This is a method in which a reaction product such as germanium dioxide is deposited on the inner wall of a quartz tube, and then heated to obtain a rod-shaped glass material with no voids. In the above method, the thickness of the glass layer deposited varies as shown in FIG. This is because the gas flow with a constant flow is oriented in one direction, so the tin-shaped glass blown by the gas flow is carried downstream and
This is because it is deposited with zero flow. The optical fiber obtained by spinning this axially non-uniform rod-shaped glass raw material is
Again, it is non-uniform in the axial direction. Furthermore, the non-uniformity of the core diameter of the optical fibers causes an increase in connection loss between the optical fibers, an increase in scattering loss, etc.25. Conventionally, due to the above-mentioned non-uniformity in the axial direction, in the case shown in FIG. 1, about 20 portions on the raw material inlet side were discarded and the remaining approximately uniform portion was used. In the above method, the effective part of the entire area subjected to CVD is small and the bar-shaped glass 30
The utilization efficiency of space materials is very poor. Axially uniform CVD
As an attempt to obtain a film, there is a method in which the direction of the gas flow in a quartz tube is alternately changed only when the film thickness to be deposited in one CVD is several μm, but even with this method, in principle,
Axial nonuniformities within 2%35 cannot be removed.
又1回のCVDで蒸着する膜厚が10μm程度の場合の
CVDにおいては、反応し生成したガラスのスズが多量
に発生し、上記のように交互に流れの方向を変える方法
においては、スズが原料ガス供給系の方に戻り、配管系
の流れの状態を阻害する。したがつて、この発明の目的
は、石英管の内壁に高純度ガラス物質を蒸着させる内付
けCVD法による光フアイバ素材の製造方法において反
応し生成したガラスのスズが原料ガス供給系の方に戻る
ことによつて配管系の流れの状態を阻害することなく、
従来の方法に比して軸方向に均一なCVD膜を石英管内
壁に蒸着することが出来る光フアイバ素材の製造方法を
提供することにある。In addition, in CVD where the film thickness deposited in one CVD is about 10 μm, a large amount of tin is generated in the reacted glass, and in the method of alternating the flow direction as described above, tin is It returns to the raw material gas supply system and obstructs the flow state of the piping system. Therefore, an object of the present invention is to prevent the glass tin produced by reaction from returning to the raw material gas supply system in the method for manufacturing optical fiber material by the internal CVD method in which a high-purity glass substance is vapor-deposited on the inner wall of a quartz tube. without interfering with the flow of the piping system.
It is an object of the present invention to provide a method for manufacturing an optical fiber material that can deposit a CVD film that is more uniform in the axial direction on the inner wall of a quartz tube than in conventional methods.
この発明によれば、中空のガラス管の内壁にガラス状薄
膜を多数回蒸着する工程を含む光フアイバ素材の製造方
法において、1層のガラス状薄膜を蒸着する間にガス状
のガラス原料を加熱するための加熱体の掃引速度を徐々
に増大させながらガラス状薄膜を蒸着することを特徴と
する光フアイバ素材方法が得られ、またこの発明によれ
ばガス状のガラス原料を加熱するための加熱体の掃引速
度を指数関数的に増大させる上記の光フアィバ素材の製
造方法が得られ、またこの発明によればガス状のガラス
原料を加熱するための加熱体の掃引速度を階段的に増大
させる上記の光フアイバ素材の製造方法が得られ、さら
にこの発明によればガス状のガラス原料の流量を直線的
に増大させる上記の光フアイバ素材の製造方法が得られ
る。次に図面を参照してこの発明を詳細に説明する。第
2図は本発明の第一の実施例を説明する図である。第2
図の上図は中空石英管内を流れるガラス原料ガスを加熱
するための火炎の掃引速度を示し、下図は前記火炎が移
動して中空石英管に蒸着した1回のCVDの膜厚の軸方
向変化を示している。第2図土図に示した如く、火炎の
掃引速度をCVD位置0crfLのところではO(1V
7!/―とし、CVD位置が右へ移るとともに火炎の掃
引速度を指数関数で増大させた。このときの火炎の掃引
速度(v)とCVD位置(x)の関係は(1)式に従つ
て制御した。下図に示した如く、CVD位置の0CTL
から5CTrLの区間を除いて45Cr1Lの区間で一
定となつた。According to the present invention, in a method for manufacturing an optical fiber material that includes a step of depositing a glassy thin film multiple times on the inner wall of a hollow glass tube, a gaseous glass raw material is heated while depositing one layer of the glassy thin film. According to the present invention, there is provided a method for depositing a glassy thin film while gradually increasing the sweeping speed of a heating element for heating a gaseous glass raw material. The method for manufacturing the above-mentioned optical fiber material exponentially increases the sweeping speed of the heating body, and according to the present invention, the sweeping speed of the heating body for heating the gaseous glass raw material is increased stepwise. The method for manufacturing the optical fiber material described above is obtained, and furthermore, according to the present invention, the method for manufacturing the optical fiber material described above in which the flow rate of the gaseous glass raw material is linearly increased is obtained. Next, the present invention will be explained in detail with reference to the drawings. FIG. 2 is a diagram illustrating a first embodiment of the present invention. Second
The upper part of the figure shows the sweep speed of the flame for heating the frit gas flowing inside the hollow quartz tube, and the lower part shows the axial change in the film thickness of one CVD film deposited on the hollow quartz tube as the flame moves. It shows. As shown in Figure 2, the flame sweep speed is O(1V) at the CVD position 0crfL.
7! /-, and the flame sweep speed was increased exponentially as the CVD position moved to the right. The relationship between the flame sweep speed (v) and the CVD position (x) at this time was controlled according to equation (1). As shown in the figure below, 0CTL at CVD position
Except for the section of 5CTrL, it remained constant in the section of 45Cr1L.
従来法のように、火炎の速度を増大させないで一定の速
度で堆積した場合、第1図下図で小されているように、
CVD膜厚は指数関数的に増加しており、CVD膜厚が
一定な部分はCVD全域にわたつて得られず、10%の
変化を許容しても25CTILの長さ(全体に体して半
分)の区間しか使用出来ない。これに対し、本実施例に
よれば、CVDの膜厚が均一の領域がCVDを行なつた
領域の90%にわたつて得られるようになつた。前記方
法においては、ガラス原料の流れは一方向なため、反応
して生成したガラスのスズが原料ガス供給系の方に戻る
ことによる配管系の流れの状態の阻害が生じない。ここ
では加熱のための熱源として火炎を用いているが、本発
明の熱源としては1000℃以上の高温状態を提供する
熱源なら火炎に限定されない〜
第3図は本発明の第二の実施例を説明する図である。When the flame is deposited at a constant speed without increasing the flame speed as in the conventional method, as shown in the lower part of Figure 1,
The CVD film thickness is increasing exponentially, and it is not possible to obtain a constant CVD film thickness over the entire CVD area, and even if a 10% change is allowed, the thickness will be 25 ) can only be used. On the other hand, according to the present example, a region having a uniform CVD film thickness can be obtained over 90% of the CVD region. In the above method, since the glass raw material flows in one direction, the flow state of the piping system is not inhibited due to the glass tin produced by the reaction returning to the raw material gas supply system. Here, a flame is used as a heat source for heating, but the heat source of the present invention is not limited to flame as long as it provides a high temperature state of 1000°C or more. Figure 3 shows a second embodiment of the present invention. FIG.
第3図の上図は中空石英管内を流れるガラス原料ガスを
加熱するための火炎の掃引速度を示し、下図は前記火炎
が移動して中空石英管に蒸着した1回のCVDの膜厚の
軸方向変化を示している。第3図上図に示した如く、火
災の掃引速度をCVD位置がO?〜5?の区間で10?
/Mmとし、5?の所で階段的に増犬させ、5?〜50
?の区間で20CrIL/Mmとした。このような条件
で堆積したCVD膜厚は第3図下図に示した如く、CV
Dの位置の0CTnから5CT!Lの区間を除いて45
?の区間で一定となつた。この場合火炎の掃引速度の階
段的変化は多数回にわたつて行なわれてもよいことは明
らかである。第4図は本発明の第三の実施例を説明する
図である。The upper diagram in Figure 3 shows the sweep speed of the flame for heating the frit gas flowing inside the hollow quartz tube, and the lower diagram shows the axis of the film thickness of one CVD film deposited on the hollow quartz tube as the flame moves. It shows a change in direction. As shown in the upper part of Figure 3, the sweep speed of the fire is determined by whether the CVD position is O? ~5? 10 in the section?
/Mm, 5? I increased the number of dogs step by step at 5? ~50
? It was set as 20CrIL/Mm in the interval. The thickness of the CVD film deposited under these conditions is as shown in the lower part of Figure 3.
5CT from 0CTn at position D! 45 excluding section L
? It became constant in the interval. It is clear that in this case stepwise changes in the flame sweep speed may be carried out many times. FIG. 4 is a diagram illustrating a third embodiment of the present invention.
第4図の上図は中空石英管内を流れるガラス原料ガスを
加熱するための火炎の掃引速度を示し、下図は前記火炎
が移動して中空石英管に蒸着した1回のCVDの膜厚の
軸方向変化を示している。第4図上図にした如く、火炎
の掃引速度をCVD位置0cmのところで15(177
1/Mxとし、CVD位置が右へ移るとともに火炎の掃
引速度を直線状に増大させた。このときの火炎の掃引速
度(v)とCVD位置(x)の関係は(2)式に従つて
制御した。このような条件で堆積したCVD膜厚は第3
図下図に示した如く、CVD位置の0cmから15Cr
!lの区間を除いて35cmの区間で一定となつた。The upper diagram in Figure 4 shows the sweep speed of the flame for heating the frit gas flowing inside the hollow quartz tube, and the lower diagram shows the axis of the film thickness of one CVD film deposited on the hollow quartz tube as the flame moves. It shows a change in direction. As shown in the upper diagram of Figure 4, the flame sweep speed was set at 15 (177
1/Mx, and the flame sweep speed was linearly increased as the CVD position moved to the right. The relationship between the flame sweep speed (v) and the CVD position (x) at this time was controlled according to equation (2). The thickness of the CVD film deposited under these conditions is the third
As shown in the figure below, 15Cr from 0cm of CVD position
! It became constant in the 35 cm section except for the 1 section.
以上、第一、第二、第三の実施例を用いて本発明を説明
したが、本発明の目的から明らかなように火炎の掃引速
度は第2,3,4図に示される値に限定されないことは
当然である。最後に本発明が有する特徴を列挙すれば、
石英管の内壁に高純度ガラス物質を蒸着させる内付けC
VD法による光フアイバ素材の製造方法において、反応
し生成したガラスのスズが原料ガス供給系の方に戻るこ
とによる配管系の流れの状態を阻害することなく、軸方
向に均一なCVD膜を広い範囲にわたつて石英管内壁に
蒸着することが出来ることである。The present invention has been explained above using the first, second, and third embodiments, but as is clear from the purpose of the present invention, the flame sweep speed is limited to the values shown in Figures 2, 3, and 4. It is natural that it will not be done. Finally, the features of the present invention are listed as follows:
Internal attachment C that deposits high-purity glass material on the inner wall of the quartz tube
In the method for manufacturing optical fiber materials using the VD method, a uniform CVD film can be spread in the axial direction without disturbing the flow state of the piping system due to the tin of the reacted glass returning to the raw material gas supply system. It is possible to deposit on the inner wall of a quartz tube over a wide range.
第1図は、従来の製造方法におけるガラス原料を加熱す
るための火炎の掃引速度とCVD膜厚の石英管軸方向変
化を示す図であり、第2図、第3図、第4図はそれぞれ
本発明の第1、第2および第3の実施例を説明するガラ
ス原料を加熱するための火炎の掃引速度と、CVD膜厚
の石英管軸方向変化を示す図である。Fig. 1 is a diagram showing the sweep speed of the flame for heating the glass raw material in the conventional manufacturing method and the change in CVD film thickness in the axial direction of the quartz tube, and Fig. 2, Fig. 3, and Fig. 4, respectively. FIG. 3 is a diagram showing the sweep speed of a flame for heating a glass raw material and the change in CVD film thickness in the axial direction of a quartz tube, explaining the first, second, and third embodiments of the present invention.
Claims (1)
する工程を含む光ファイバ素材の製造方法において、1
層のガラス状薄膜を蒸着する間に、ガス状のガラス原料
を加熱するための加熱体の掃引速度を徐々に増大させな
がらガラス状薄膜を蒸着することを特徴とする光ファイ
バ素材の製造方法。 2 ガス状のガラス原料を加熱するための加熱体の掃引
速度を指数関数的に増大させる特許請求の範囲第1項記
載の光ファイバ素材の製造方法。 3 ガス状のガラス原料を加熱するための加熱体の掃引
速度を階段的に増大させる特許請求の範囲第1項記載の
光ファイバ素材の製造方法。 4 ガス状のガラス原料を加熱するための加熱体の掃引
速度を直線的に増大させる特許請求の範囲第1項記載の
光ファイバ素材の製造方法。[Scope of Claims] 1. A method for manufacturing an optical fiber material including the step of depositing a glassy thin film multiple times on the inner wall of a hollow glass tube, comprising: 1
1. A method for producing an optical fiber material, characterized in that the glassy thin film is deposited while gradually increasing the sweep speed of a heating element for heating a gaseous glass raw material during the deposition of the glassy thin film of the layer. 2. The method for manufacturing an optical fiber material according to claim 1, wherein the sweep speed of the heating element for heating the gaseous glass raw material is increased exponentially. 3. The method for manufacturing an optical fiber material according to claim 1, wherein the sweep speed of the heating element for heating the gaseous glass raw material is increased stepwise. 4. The method for manufacturing an optical fiber material according to claim 1, wherein the sweep speed of the heating element for heating the gaseous glass raw material is linearly increased.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7969976A JPS597649B2 (en) | 1976-07-05 | 1976-07-05 | Manufacturing method of optical fiber material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7969976A JPS597649B2 (en) | 1976-07-05 | 1976-07-05 | Manufacturing method of optical fiber material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS535642A JPS535642A (en) | 1978-01-19 |
| JPS597649B2 true JPS597649B2 (en) | 1984-02-20 |
Family
ID=13697445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7969976A Expired JPS597649B2 (en) | 1976-07-05 | 1976-07-05 | Manufacturing method of optical fiber material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS597649B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53108445A (en) * | 1977-03-03 | 1978-09-21 | Fujitsu Ltd | Preparation of glass for optical transmission wire |
| AU1477783A (en) * | 1982-04-12 | 1983-11-04 | Western Electric Co. Inc. | Improved manufacture of optical fibers |
-
1976
- 1976-07-05 JP JP7969976A patent/JPS597649B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS535642A (en) | 1978-01-19 |
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