JPS6010369B2 - Method for manufacturing magnetic recording media - Google Patents
Method for manufacturing magnetic recording mediaInfo
- Publication number
- JPS6010369B2 JPS6010369B2 JP15959276A JP15959276A JPS6010369B2 JP S6010369 B2 JPS6010369 B2 JP S6010369B2 JP 15959276 A JP15959276 A JP 15959276A JP 15959276 A JP15959276 A JP 15959276A JP S6010369 B2 JPS6010369 B2 JP S6010369B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- magnetic recording
- recording media
- film
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は、高密度記録に適する高抗磁力、高い飽和磁化
を有する金属薄膜形の磁気テープ等の磁気記録媒体の製
法の改良に係り、特に真空蒸着法、イオンプレーティン
グ法、亀界蒸着法等の真空内被膜生成法にて磁気記録媒
体の製造を行う場合の効率の低さに基ずく実用上の隆路
の排除を目的とするものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in the manufacturing method of magnetic recording media such as metal thin film magnetic tapes having high coercive force and high saturation magnetization suitable for high-density recording. The objective is to eliminate practical ridges due to the low efficiency when manufacturing magnetic recording media using in-vacuum film production methods such as the coating method and the Kame field deposition method.
従来の高抗磁力達成に必要な特公昭41一19総9号公
報に開示されている斜め蒸着技術の最大の欠点は蒸着効
率の低い点である。The biggest drawback of the oblique vapor deposition technique disclosed in Japanese Patent Publication No. 41-19-9, which is necessary for achieving a conventional high coercive force, is that the vapor deposition efficiency is low.
すなわち基材面にたてた法線と入射蒸気流のなす角が4
?以上であることを示しているが、鉄の1500Aの膜
で40のeの抗磁力を得るには前記した入射角が700
以上を必要とし、かかる入射角のみの蒸気流で強磁性膜
を形成した場合の蒸着効率は数%にも満たない低い値で
、実用には供し得ない。本発明は、かかる欠点をなくす
もので、第1図、第2図に実施するための装置を例とし
て示している。In other words, the angle between the normal to the base material surface and the incident vapor flow is 4
? The above shows that in order to obtain a coercive force of 40 e with a 1500 A iron film, the incident angle described above is 700
When a ferromagnetic film is formed using a vapor flow having only such an incident angle, the vapor deposition efficiency is as low as less than several percent, and cannot be put to practical use. The present invention eliminates this drawback, and FIGS. 1 and 2 show an example of an apparatus for implementing the invention.
本発明の要点は、斜め入射により薄膜の初期成長を行う
ことと、入射角を徐々に小さくし華直入射を経ることと
、そののち徐々に入射角を増大させて強磁性薄膜をうろ
ことと、膜の生成速度を平均化させることと、蒸発源よ
りの頚射熱の影響を平均化させることによって、高抗磁
力の強磁性膜をうろことにあり、従釆の斜め蒸着法に比
べて、1坊音近い蒸着効率をあげることの出来る工業的
有価値性の高い製法である。The main points of the present invention are to perform initial growth of a thin film by oblique incidence, to gradually reduce the incidence angle and pass through direct incidence, and then to gradually increase the incidence angle to grow a ferromagnetic thin film. By averaging the film formation rate and the effect of radiation heat from the evaporation source, it is possible to create a ferromagnetic film with high coercive force, compared to the conventional oblique evaporation method. This is a highly industrially valuable manufacturing method that can increase the deposition efficiency by nearly 1 degree.
以下図面とともに説明する。This will be explained below with reference to the drawings.
まず第1図において、真空槽1内部は真空排気系2によ
り、真空雰囲気に保たれる。真空度は1×10‐5〜5
×10‐5Torr程度がよく用いられるが、必要に応
じて酸素等の反応性気体の導入等も行えることは勿論で
ある。この真空槽1内に蒸発源3と基材4を対向させて
配設する。この場合、基材4とは、汎用のプラスチック
フィルムそのものを指すだけでなく必要に応じて、前記
基材に非磁性層を設けたものも指し、非磁性層と強磁性
層の多層構造体の場合は、目的の強磁性層蒸着前の状態
を含むものである。原反ロール5より基材4は金属ロー
ラ6等を介して円筒状の回転キヤン7の側面に沿って移
動し捲き取りロール8にて捲き取られる。本発明は、こ
れら搬送系を規定するものではなく適宜工夫される。回
転キャン7は必要に応じて加熱または冷却される。9は
防看板であるが、真空槽内を必ずしも2分する必要はな
い。First, in FIG. 1, the inside of a vacuum chamber 1 is maintained in a vacuum atmosphere by an evacuation system 2. Vacuum degree is 1×10-5~5
A pressure of about ×10-5 Torr is often used, but it is of course possible to introduce a reactive gas such as oxygen if necessary. In this vacuum chamber 1, an evaporation source 3 and a base material 4 are placed facing each other. In this case, the base material 4 refers not only to the general-purpose plastic film itself, but also to the base material provided with a non-magnetic layer as necessary, and is a multilayer structure of a non-magnetic layer and a ferromagnetic layer. The case includes the state before the deposition of the desired ferromagnetic layer. The base material 4 is moved from the raw roll 5 along the side surface of a cylindrical rotary can 7 via metal rollers 6 and the like, and is rolled up by a winding roll 8. The present invention does not specify these transport systems, but may be devised as appropriate. The rotating can 7 is heated or cooled as necessary. Although 9 is a signboard, it is not necessary to divide the inside of the vacuum chamber into two.
蒸発源3は抵抗加熱方式を榛式的に示したが、公3知の
電子ビーム加熱方式等のいずれにも適用される。蒸発金
属3′は鉄、コバルト、ニッケル、またはそれらの合金
、または非磁性元素を添加したもので、ヒータ3″によ
り所定温度に加熱され、蒸気流となり、基材4に向けて
差し向けられる。10は加熱電源、11は導入端子であ
る。Although the evaporation source 3 is a resistance heating method, it can be applied to any of the well-known electron beam heating methods. The evaporated metal 3' is made of iron, cobalt, nickel, an alloy thereof, or a non-magnetic element added thereto, and is heated to a predetermined temperature by a heater 3'', becomes a vapor stream, and is directed toward the base material 4. 10 is a heating power source, and 11 is an introduction terminal.
本発明の要点は、基材4と蒸発源3との至近距離を結ぶ
線、第1図でg線上の近傍の蒸気を間歌的に基材4に差
し向ける点にある。The key point of the present invention is that vapor near the g-line in FIG. 1, which is a line connecting the close distance between the base material 4 and the evaporation source 3, is directed to the base material 4 in an intermittent manner.
これは、例えば回転可能な遮へい材12により達成され
る。遮へい材12は、図示せぬ軸(紙面と垂直方向)、
必要に応じてギャ、ベルト等を介してモーターに連結さ
れ回転を制御される。次に具体的実施例について詳述す
る。This is achieved, for example, by a rotatable shield 12. The shielding material 12 has an axis (not shown) (perpendicular to the page),
If necessary, it is connected to a motor via gears, belts, etc., and its rotation is controlled. Next, specific examples will be described in detail.
第1図の装置で、ポリエチレンテレフタレートフイルム
(厚さlow)にあらかじめTiを500A形成したも
のを基材とし、Fe合金を1500A形成する場合につ
いて説明する。A case will be described in which, using the apparatus shown in FIG. 1, a polyethylene terephthalate film (thickness low) on which Ti has been formed in advance at 500 A is used as a base material, and Fe alloy is formed at 1500 A.
基材の幅は15肌で回転キャンは直径50伽、蒸発源は
1斑Wの電子ビーム加熱方式で、蒸発面と基材の至近距
離は22伽、回転遮へい材は第2図イに示すように幅が
中央で6肌、端部で5肌のステンレス製の板で厚さ18
肌に形成したもので回転が10〜150比pmの範囲で
可変可能である。この形状は第2図イに限らず、第2図
口に示した板状のもの、または他の形状が可能である。
12′は回転軸である。The width of the base material is 15 mm, the diameter of the rotating can is 50 mm, the evaporation source is an electron beam heating method with 1 spot W, the close distance between the evaporation surface and the base material is 22 mm, and the rotating shield material is shown in Figure 2 A. A stainless steel plate with a width of 6 skins in the center and 5 skins at the edges and a thickness of 18 cm.
It is formed on the skin and the rotation can be varied within the range of 10 to 150 ratio pm. This shape is not limited to that shown in FIG. 2A, but may be the plate-like shape shown in the opening of FIG. 2, or other shapes.
12' is a rotation axis.
この位置はg線上で蒸発面より16c机に設定した。3
0仇pmの条件で酸素分圧5×10‐5Tonの真空雰
囲気で形成したFe合金膜の飽和磁化は17000ガウ
スで、抗磁力39比だ、角形比0.87と優れた特性を
示した上に、蒸着効率は46%と高いものであった。This position was set at 16c from the evaporation surface on the g-line. 3
The saturation magnetization of the Fe alloy film formed in a vacuum atmosphere with an oxygen partial pressure of 5 x 10-5 Ton under the condition of 0 pm was 17,000 Gauss, the coercive force ratio was 39, and the squareness ratio was 0.87, showing excellent characteristics. In addition, the vapor deposition efficiency was as high as 46%.
またCoについて、40は史、1500人を得る場合も
蒸着効率は43%で、従来1の音近い効率で本発明の工
業的有価値性の高さを示すものである。ここで回転可能
な遮へい材12と膜形成速度等との関連について説明す
る。Regarding Co, even when 40 was obtained and 1500 people were obtained, the vapor deposition efficiency was 43%, which is close to the conventional efficiency of 1, which shows the high industrial value of the present invention. Here, the relationship between the rotatable shielding material 12 and the film formation rate will be explained.
下表は各入射角に対する膜形成速度(遮へい材なし)と
膜の生成速度を均一化するための遮へい時間を示す表で
ある。The table below shows the film formation rate (without shielding material) for each incident angle and the shielding time to equalize the film formation rate.
表
※ 規格値
上表に示すように膜形成速度は遮へい材がなければ不均
一性が大きい。Table * Standard Values As shown in the table above, the film formation rate is highly non-uniform without a shielding material.
それを基材が蒸着を受ける時間の間に、例えば数十回の
回転数で角回転速度をかえるモード(一例が表のように
なる遮へい時間になるように)で間歌的に遮へい材を回
転させることでより均一化できる。鏡射熱の影響もほぼ
同様の考え方で均一化されるのである。それらにより強
磁性薄膜が一定速度で成長することになり、欠陥などが
減少して高抗磁力化が達成され、遮へいするとはいうも
のの、全入射角を積分することができるので蒸着効率も
あがることになる。次に他の実施例を第3図に示す。During the time when the base material undergoes vapor deposition, the shielding material is applied intermittently, for example, in a mode that changes the angular rotation speed by several tens of revolutions (an example is such that the shielding time is as shown in the table). You can make it more uniform by rotating it. The influence of reflected heat is also equalized using almost the same concept. These allow the ferromagnetic thin film to grow at a constant rate, reducing defects and achieving high coercive force.Although it is shielded, the entire incident angle can be integrated, which increases deposition efficiency. become. Next, another embodiment is shown in FIG.
なお、第1図と同ーケ所には同一符号を付す。図におい
て、基材4は蒸発源3よりの蒸発金属の蒸気に露呈され
る面が、回転キャン7の側面に沿った曲率部分と回転キ
ャン側面の接線方向に伸びた面13とからなる2面を有
している場合を示している。Note that the same parts as in FIG. 1 are given the same reference numerals. In the figure, the base material 4 has two surfaces that are exposed to the vapor of evaporated metal from the evaporation source 3, consisting of a curved part along the side surface of the rotary can 7 and a surface 13 extending in the tangential direction of the side surface of the rotary can. This shows the case where the
このような装置においても前述したような効果を有し、
高い蒸着効率を得ることができる。Such a device also has the effects described above,
High vapor deposition efficiency can be obtained.
以上のような本発明の製造方法によれば、高密度記録に
適する、高抗磁力、高い飽和磁化を有する金属薄膜形の
磁気記録媒体を効率よく得ることができるものである。According to the manufacturing method of the present invention as described above, it is possible to efficiently obtain a metal thin film type magnetic recording medium having high coercive force and high saturation magnetization and suitable for high-density recording.
第1図は本発明の製造方法を実施するために使用する装
置の一実施例の概略断面正面図、第2図イ,口は同装置
に使用する遮へい材の各例の断面図、第3図は本発明に
使用する装置の他の実施例の千脚略断面正面図である。
1・・…・真空槽、3・・・・・・蒸発源、3′・・・
…蒸発金属、4・・・・・・基材、12・・・・・・遮
へい材。第1図第2図
第3図Fig. 1 is a schematic cross-sectional front view of one embodiment of the apparatus used to carry out the manufacturing method of the present invention, Fig. 2 A is a sectional view of each example of shielding material used in the same apparatus, and Fig. 3 The figure is a schematic cross-sectional front view of a thousand legs of another embodiment of the apparatus used in the present invention. 1... Vacuum chamber, 3... Evaporation source, 3'...
... Evaporated metal, 4... Base material, 12... Shielding material. Figure 1 Figure 2 Figure 3
Claims (1)
と高分子成形物等の基材との至近距離線上の近傍に強磁
性金属蒸気を各入射角での膜形成速度が平均化されるよ
うに間歇的に遮断する遮へい材を配して前記基材上に強
磁性層の形成を行うことを特徴とする磁気記録体の製造
方法。1. In a vacuum atmosphere, ferromagnetic metal vapor is applied near the line of close distance between an evaporation source that uses ferromagnetic metal as the evaporation substance and a base material such as a polymer molded article, and the film formation rate at each incident angle is averaged. A method for manufacturing a magnetic recording material, characterized in that a ferromagnetic layer is formed on the base material by disposing a shielding material that intermittently blocks the light.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15959276A JPS6010369B2 (en) | 1976-12-29 | 1976-12-29 | Method for manufacturing magnetic recording media |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15959276A JPS6010369B2 (en) | 1976-12-29 | 1976-12-29 | Method for manufacturing magnetic recording media |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5383710A JPS5383710A (en) | 1978-07-24 |
| JPS6010369B2 true JPS6010369B2 (en) | 1985-03-16 |
Family
ID=15697062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15959276A Expired JPS6010369B2 (en) | 1976-12-29 | 1976-12-29 | Method for manufacturing magnetic recording media |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6010369B2 (en) |
-
1976
- 1976-12-29 JP JP15959276A patent/JPS6010369B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5383710A (en) | 1978-07-24 |
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