JPS6013162B2 - Manufacturing method of electrochromic display element - Google Patents
Manufacturing method of electrochromic display elementInfo
- Publication number
- JPS6013162B2 JPS6013162B2 JP52154536A JP15453677A JPS6013162B2 JP S6013162 B2 JPS6013162 B2 JP S6013162B2 JP 52154536 A JP52154536 A JP 52154536A JP 15453677 A JP15453677 A JP 15453677A JP S6013162 B2 JPS6013162 B2 JP S6013162B2
- Authority
- JP
- Japan
- Prior art keywords
- transition metal
- oxide layer
- display element
- electrochromic display
- metal oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Description
【発明の詳細な説明】
本発明はェレクトロクロミズムを示す遷移金属酸化物層
を一対の電極基板間に挟持してなる電気発色表示素子の
製造法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an electrochromic display element in which a transition metal oxide layer exhibiting electrochromism is sandwiched between a pair of electrode substrates.
例えば酸化タングステン、酸化モリブデン、酸化チタン
、酸化バナジウム、酸化ニオピゥム、酸化タンタル、酸
化ジルコニウム、酸化ハフニウム、酸化ランタニウムな
どの遷移金属酸化物はェレクトロクロミズムを示す材料
として知られている。For example, transition metal oxides such as tungsten oxide, molybdenum oxide, titanium oxide, vanadium oxide, niopium oxide, tantalum oxide, zirconium oxide, hafnium oxide, and lanthanum oxide are known as materials exhibiting electrochromism.
しかしてこの遷移金属酸化物のェレクトロクロミズムを
利用した電気発色表示素子も知られている。この電気発
色表示素子の基本的構成は、少なくとも一方が透明であ
る対向電極間に上記遷移金属酸化物層が挟持された形態
をとっている。この基本的構成に対し、表示のコントラ
スト、レスポンス、或いは寿命などの改善を目的として
、例えば液状もしくは固体状の電解質を前記遷移金属酸
化物層に隣接して電極基板間に挟持させたり、遷移金属
酸化物層二層としこれら二層間に電解質層を介在させた
構成も知られている。ところでこれら電気発色表示素子
においてその主要部をなす遷移金属酸化物層は次のよう
にして形成されている。即ち前記遷移金属酸化物の粉末
を成形、暁結するが、真空蒸着法もしくはスパッタ一法
などにより電極基板上に層状に彼着することによって形
成していた。しかしながら上記方法による遷移金属酸化
物層の形成には次のような不都合さがある。先ず粉末治
金法では、この種表示素子が良好な表示性能を発揮する
ため必要な遷移金属酸化物層の厚さ0.1〜数10山程
度の均質な薄い層を形成し縫いことである。従ってこの
場合の表示素子についてみると、表示レスポンスが遅く
、表示に要する動作電圧も数100ボルトと可成り高く
なることもあり、また上記厚みの不均一さ‘こ基づく表
示コントラストのむらも避けられない。次に蒸着もしく
はスパッタ一法による場合は「遷移金属酸化物層の必要
厚みについて小面積ならほぼ問題ないが或る程度大きい
面に全体的に厚さの均一な薄い層は形成し難い。従って
構成しうる表示素子の大きさにも自ずから限度があり、
しかも煩雑な操作や高価な装置を必要とするなど経済的
にも不利である。従って本発明は簡易な手段で、任意の
大きさの電極基板面上に所望される任意の薄さで且つ全
体的に均一な厚さの遷移金属酸化物層を形成しうる手段
を含む電気発色表示素子の製造法を提供しようとするも
のである。However, electrochromic display elements that utilize electrochromism of transition metal oxides are also known. The basic structure of this electrochromic display element is such that the transition metal oxide layer is sandwiched between opposing electrodes, at least one of which is transparent. In order to improve the display contrast, response, or lifespan of this basic configuration, for example, a liquid or solid electrolyte may be sandwiched between the electrode substrates adjacent to the transition metal oxide layer, or a transition metal oxide layer may be sandwiched between the electrode substrates. A structure in which two oxide layers are provided and an electrolyte layer is interposed between these two layers is also known. Incidentally, the transition metal oxide layer which forms the main part of these electrochromic display elements is formed in the following manner. That is, the transition metal oxide powder is molded and solidified, and it is formed by depositing it in a layer on an electrode substrate using a vacuum evaporation method or a sputtering method. However, the formation of a transition metal oxide layer by the above method has the following disadvantages. First, the powder metallurgy method involves forming and sewing a thin homogeneous transition metal oxide layer with a thickness of about 0.1 to several tens of peaks, which is necessary for this type of display element to exhibit good display performance. . Therefore, regarding the display element in this case, the display response is slow, the operating voltage required for display is quite high, several hundred volts, and uneven display contrast due to the above-mentioned uneven thickness is unavoidable. . Next, when vapor deposition or sputtering is used, ``the required thickness of the transition metal oxide layer is almost no problem if it is a small area, but it is difficult to form a thin layer with a uniform thickness over a fairly large area. There is a natural limit to the size of display elements that can be displayed.
Moreover, it is economically disadvantageous as it requires complicated operations and expensive equipment. Therefore, the present invention provides an electrochromic method that includes means for forming a transition metal oxide layer of any desired thickness and overall uniform thickness on an electrode substrate surface of any size using simple means. The present invention aims to provide a method for manufacturing a display element.
以下本発明を詳細に説明すると、本発明は少なくとも一
方が透明である対向電極基板間に遷移金属酸化物層が挟
持されてなる電気発色表示素子の製造法において、少な
くとも一方の電極基板上に無機遷移金属化合物を含む溶
液を塗布し、焼成を施して前記遷移金属酸化物層を形成
、挟特せしめることを特徴とする電気発色表示素子の製
造法である。To explain the present invention in detail below, the present invention relates to a method for manufacturing an electrochromic display element in which a transition metal oxide layer is sandwiched between counter electrode substrates, at least one of which is transparent. This method of manufacturing an electrochromic display element is characterized in that a solution containing a transition metal compound is applied and baked to form and sandwich the transition metal oxide layer.
本発明において使用する無機遷移金属化合物としては例
えばタングステンハライド、モリブデンハライドなどの
ハロゲン化物、タングステン酸、モリブデン酸、メタタ
ングステン酸、パラタングステン酸などの酸素酸化合物
、ナトリウムタングステン酸、リチウムタングステン酸
など塩類化合物が挙げられ、これらは1種もしくは2種
以上の混合系で用いてもよい。Examples of inorganic transition metal compounds used in the present invention include halides such as tungsten halide and molybdenum halide, oxygen acid compounds such as tungstic acid, molybdic acid, metatungstic acid, and paratungstic acid, and salts such as sodium tungstic acid and lithium tungstic acid. These compounds may be used alone or in a mixed system of two or more.
また本発明においては上3詔無機遷移金属化合物のみを
用いてもよいが、例えばプチルチタネート、モリプデニ
ウムアセチルアセトネート、ヘキサフエノキシタングス
テン、ペンタェトキシタングステンなど有機遷移金属化
合物の1種以上を適宜添加配合してもよい。しか3して
これら遷移金属化合物を溶液化するために用いる溶媒と
しては、無機遷移金属化合物の場合には水やアルコール
類が好ましく、また有機遷移金属化合物を含む場合には
、アルコール類、セロソルブ類などが好ましい。
4本発明において上記無機遷移金属化合
物を含む溶液の濃度は、所望する遷移金属酸化物層の膜
厚さに応じて任意に選択、調製される。またこの遷移金
属化合物溶液の電極基板面上への塗布は浸積法、スプレ
ー法もしくはスピンナー法などによって行なわれ、さら
に上記塗布後の焼成は上記遷移金属化合物が熱分解など
し遷移金属酸化物層を生成乃至形成しうる程度の温度お
よび時間行なう。一般的には上記焼成は空気中もしくは
酸素雰囲気中350〜650qoで数1戊分〜数時間行
なうことによって達成される。尚上記遷移金属化合物溶
液の塗布に当り、塗布膜をよくするため(塗着性改良の
ため)例えばグ0リセリン、エチルセルローズなどを適
宜添加配合してもよいし、また形成する遷移金属酸化物
層の表示物性向上のため他の金属や金属化合物など添加
配合してもよい。Further, in the present invention, only the inorganic transition metal compounds mentioned in the above three edicts may be used, but for example, one or more organic transition metal compounds such as butyl titanate, molypdenium acetylacetonate, hexaphenoxytungsten, and pentaethoxytungsten. may be added and blended as appropriate. However, as the solvent used to make these transition metal compounds into a solution, water and alcohols are preferable in the case of inorganic transition metal compounds, and alcohols and cellosolves are preferable in the case of containing organic transition metal compounds. etc. are preferable.
4 In the present invention, the concentration of the solution containing the inorganic transition metal compound is arbitrarily selected and adjusted depending on the desired thickness of the transition metal oxide layer. The transition metal compound solution is applied onto the electrode substrate surface by a dipping method, a spray method, or a spinner method.Furthermore, the baking after the application causes the transition metal compound to thermally decompose, forming a transition metal oxide layer. The temperature and time are such that they can be produced or formed. Generally, the above-mentioned firing is carried out in air or in an oxygen atmosphere at 350 to 650 qo for several minutes to several hours. When applying the above transition metal compound solution, for example, glycerin, ethyl cellulose, etc. may be added as appropriate to improve the coating film (to improve adhesion), and the transition metal oxide to be formed may also be added. Other metals or metal compounds may be added to improve the display properties of the layer.
次に本発明の実施例を記載する。Next, examples of the present invention will be described.
実施例 1
14%アンモニア水800のとにタングステン酸40夕
を溶解してなる溶液を30×25桝の透明電極基板(ネ
サガラス)の一面上に浸漬塗布法によって塗布、乾燥後
、480qoで60分間加熱焼成処理1膜厚約0.1仏
のタングステン酸化物層を前記基板面上に形成した。Example 1 A solution prepared by dissolving 40 g of tungstic acid in 800 g of 14% ammonia water was applied onto one surface of a 30 x 25 square transparent electrode substrate (Nesa Glass) by dip coating method, and after drying, it was coated at 480 qo for 60 minutes. A tungsten oxide layer having a thickness of about 0.1 mm per layer was formed on the substrate surface.
上記タングステン酸化物層を設けた電極基板2枚を、タ
ングステン酸化物層を互に対向させ厚さ1帆のガラスス
ベーサを介して重合して表示素子セルを組立てた。The two electrode substrates provided with the above tungsten oxide layer were superimposed with each other with the tungsten oxide layers facing each other via a glass substrate having a thickness of 1 layer to assemble a display element cell.
次いでこの表示素子セルのタングステン酸化物層間に硫
酸−グリセリン−二酸化チタ(混合比1対4対1)系電
解質を注入充てんして表示セルを得た。第1図はかくし
て機成した表示セルの構成例を断面的に示したもので1
,1′は透明電極2,2′を備えた透明電極基板を3,
3′はタングステン酸化物層を4はガラススべ−サを5
は電解質をそれぞれ示す。Next, a sulfuric acid-glycerin-titanium dioxide (mixing ratio 1:4:1) electrolyte was injected and filled between the tungsten oxide layers of this display element cell to obtain a display cell. Figure 1 is a cross-sectional view of an example of the structure of the display cell constructed in this way.
, 1' is a transparent electrode substrate equipped with transparent electrodes 2, 2';
3' is the tungsten oxide layer, 4 is the glass baser, and 5 is the tungsten oxide layer.
indicate electrolytes, respectively.
上記表示セルに交流短形波、0.5HZ±0.2Vの電
圧を印加したところ無色(白色)と青色との発消色が認
められ、また0.3HZ士3.5Vの印加電圧で充分な
濃音色の発色を示し、発消色レスポンスは0.5HZに
充分追従した。When an AC rectangular wave and a voltage of 0.5Hz ± 0.2V were applied to the above display cell, colorless (white) and blue color development and fading were observed, and an applied voltage of 0.3Hz and 3.5V was sufficient. It exhibited a deep tone color development, and the color development/decolorization response sufficiently followed 0.5 HZ.
実施例 2
n−ブチルアルコール240夕に、タングステンヘキサ
クロライド60夕およびエチルセルローズ3夕を溶解し
てなる溶液を用い、実施例1の場合と同じ条件で、溶液
塗布焼成処理を施し膜厚約0.2ムのタングステン酸化
物層を透明電極基板面上に設けた。Example 2 Using a solution prepared by dissolving 60 parts of tungsten hexachloride and 3 parts of ethyl cellulose in 240 parts of n-butyl alcohol, solution coating and baking treatment was performed under the same conditions as in Example 1 to obtain a film with a film thickness of about 0. A tungsten oxide layer of .2 μm was provided on the surface of the transparent electrode substrate.
この電極基板を用い実施例の場合と同じ条件で構成した
表示セルについて発消色試験を行なったところ、交流矩
形波0.5HZ±1.別印加で青色の発消色がみられ、
また0.5日2±3V印加で青色の発消色濃度が向上し
そのレスポンスは0.5HZに充分追従することが確認
された。実施例 3
nーブチルアルコール1500の【にペンタエトキシタ
ングステート100夕、モリブデンベソタクロラィド6
.7夕およびアセチルアセトン25の【を溶解してなる
溶液を先ず調製した。When a color development/decolorization test was conducted on a display cell configured using this electrode substrate under the same conditions as in the example, an alternating current rectangular wave of 0.5Hz±1. When a separate voltage is applied, a blue color develops and disappears.
It was also confirmed that the blue color density improved by applying 2±3 V for 0.5 days, and that the response sufficiently followed 0.5 HZ. Example 3 1500% n-butyl alcohol, 100% pentaethoxytungstate, 6% molybdenum besotachloride
.. First, a solution was prepared by dissolving [25] and acetylacetone.
次いでこの溶液を30×25磯の透明電極基板(ネサガ
ラス)面上に浸糟塗布、乾燥後「 500COで60分
間焼成を施して厚さ0.4rのタングステン酸化物ーモ
リブデン酸化物混合物層を形成した。上記酸化物混合物
層を形成した2枚の電極基板を用い実施例1の場合と同
じ条件で表示セルを構成した。Next, this solution was coated on a 30 x 25 transparent electrode substrate (NESA glass) surface, dried, and then fired at 500 CO for 60 minutes to form a tungsten oxide-molybdenum oxide mixture layer with a thickness of 0.4 r. A display cell was constructed under the same conditions as in Example 1 using two electrode substrates on which the oxide mixture layer was formed.
この表示セルに交流短形波1.0日2、土1.5Vの電
圧を印加したところ、薄青色の発消色がみられ、また1
.0HZ、士2.0N印加で発色濃度が充分に向上した
。さらに上記発色の吸収スペクトルを測定したところ吸
収最大波長^は62mmで「 タン/グステン酸化物層
単独の場合の吸収最大波長入80皿仇に比較すると最大
吸収波長は可成り短波に移行しており鮮費色になってい
た。実施例 4nーブチルアルコール1500のこにペ
ンタブトキシタソグステート100夕、マンガンジクロ
ライドテトラハイドライド15夕およびアセチルアルセ
トン25凧‘を溶解してなる溶液を用いた他は実施例3
の場合と同じ条件で表示セルを構成した。When an AC rectangular wave of 1.0 V and 1.5 V was applied to this display cell, pale blue color development and fading were observed.
.. The color density was sufficiently improved by applying 0HZ and 2.0N. Furthermore, when we measured the absorption spectrum of the above color development, we found that the maximum absorption wavelength was 62 mm.Compared to the case of the tungsten oxide layer alone, which had a maximum absorption wavelength of 80 mm, the maximum absorption wavelength has shifted to a considerably shorter wavelength. Example 4 A solution prepared by dissolving 1500 parts of n-butyl alcohol, 100 parts of pentabutoxitasogstate, 15 parts of manganese dichloride tetrahydride and 25 parts of acetylarcetone was used. Example 3
The display cells were configured under the same conditions as in the case of .
上記構成した表示セルに直流を印加したところ負極例の
遷移金属酸化物層は約IVで赤色を示し、さらに印加電
圧を徐々に上昇させたところ約5Vで緑色を示した。When a direct current was applied to the display cell configured as described above, the transition metal oxide layer of the negative electrode example showed a red color at about IV, and when the applied voltage was further gradually increased, it showed a green color at about 5V.
この緑色を示している前記酸化物層の極性を反転して約
W印加すると梢色した。上記各実施例から明らかのよう
に本発明方法によれば簡便な操作で均一な任意の膜厚の
遷移金属酸化物層を形成しうる。When the polarity of the oxide layer showing this green color was reversed and approximately W was applied, a tree-like color was obtained. As is clear from the above examples, according to the method of the present invention, a uniform transition metal oxide layer of any desired thickness can be formed with a simple operation.
しかも上記遷移金属酸化物層は比較的大きい形状でも均
一な膜厚に形成しうるので、大きさにかかわらず所要の
電気発色表示素子を構成しうろことになる。かくして本
発明方法は、製造された電気発色表示素子(表示セル)
がコントラストの良好な表示能を有することと相俊つて
実用価値の高い表示素子の製造法と云える。Moreover, since the transition metal oxide layer can be formed to have a uniform thickness even in a relatively large shape, it can be used to construct a desired electrochromic display element regardless of the size. Thus, the method of the present invention can be applied to the produced electrochromic display element (display cell).
This method can be said to be a method of manufacturing display elements with high practical value, since it has a display ability with good contrast.
図面は本発明方法によって製造した電気発色表示素子の
構成例を示す断面図である。
1,1′・・・・・・透明電極基板、3,3′・・・・
・・タングステン酸化物層、4・・・・・−ガラススベ
ーサ、5..・..・電解質。The drawing is a sectional view showing an example of the structure of an electrochromic display element manufactured by the method of the present invention. 1, 1'...Transparent electrode substrate, 3, 3'...
...Tungsten oxide layer, 4...-Glass baser, 5. ..・.. .. ·Electrolytes.
Claims (1)
金属酸化物層が挟持されてなる電気発色表示素子の製造
法において、少なくとも一方の電極基板上に無機遷移金
属化合物溶液を塗布し焼成を施して前記遷移金属酸化物
層を形成、挟持せしめることを特徴とする電気発色表示
素子の製造法。 2 特許請求の範囲第1項において、電極基板上に塗布
する溶液が無機遷移金属化合物の他有機遷移金属化合物
を含有することを特徴とする電気発色表示素子の製造法
。[Claims] 1. A method for manufacturing an electrochromic display element in which a transition metal oxide layer is sandwiched between opposing electrode substrates, at least one of which is transparent, wherein an inorganic transition metal compound solution is placed on at least one of the electrode substrates. A method for manufacturing an electrochromic display element, comprising forming and sandwiching the transition metal oxide layer by coating and baking. 2. The method for producing an electrochromic display element according to claim 1, wherein the solution applied onto the electrode substrate contains an organic transition metal compound in addition to an inorganic transition metal compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52154536A JPS6013162B2 (en) | 1977-12-23 | 1977-12-23 | Manufacturing method of electrochromic display element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP52154536A JPS6013162B2 (en) | 1977-12-23 | 1977-12-23 | Manufacturing method of electrochromic display element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5487245A JPS5487245A (en) | 1979-07-11 |
| JPS6013162B2 true JPS6013162B2 (en) | 1985-04-05 |
Family
ID=15586393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52154536A Expired JPS6013162B2 (en) | 1977-12-23 | 1977-12-23 | Manufacturing method of electrochromic display element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6013162B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5638379A (en) * | 1979-09-05 | 1981-04-13 | Hitachi Ltd | Production of electrochromic display |
-
1977
- 1977-12-23 JP JP52154536A patent/JPS6013162B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5487245A (en) | 1979-07-11 |
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