JPS6016010B2 - Manufacturing method of high recording density magnetic disk - Google Patents
Manufacturing method of high recording density magnetic diskInfo
- Publication number
- JPS6016010B2 JPS6016010B2 JP4793277A JP4793277A JPS6016010B2 JP S6016010 B2 JPS6016010 B2 JP S6016010B2 JP 4793277 A JP4793277 A JP 4793277A JP 4793277 A JP4793277 A JP 4793277A JP S6016010 B2 JPS6016010 B2 JP S6016010B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic disk
- magnetic
- plating
- manufacturing
- recording density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は記録媒体とした磁性めつき膜を用いる高記録密
度の磁気ディスクを製造するに当って、機械的寸法精度
ならびに磁気特性の安定性がすぐれた高記録密度磁気デ
ィスクの製造方法に関するものである。Detailed Description of the Invention The present invention provides a high recording density magnetic disk with excellent mechanical dimensional accuracy and stability of magnetic properties when manufacturing a high recording density magnetic disk using a magnetic plated film as a recording medium. The present invention relates to a method of manufacturing a disc.
高記録密度磁気ディスクはいわゆるめつきディスクが最
も有望とされている。The most promising high-density magnetic disk is a so-called plated disk.
このめつきディスクは図に示すごとく磁気ディスク素材
1(この場合はAI素材)上に前処理層2を形成し、次
いでこの上にストラィクめつき層3を形成し、この上に
さらに下地めつき層4を形成し、この下地めつき層を平
滑になるように荒加工と仕上げ加工を施こし次いでその
上に磁性めつき層5を形成し、この上に保護皮膜6を形
成して得たものである。磁性めつき層としては現在Co
−Ni合金皮膜やCo−Ni一P合金皮膜が多く用いら
れている。また保護皮膜に要求される特性としてはヘッ
ドのディスクとの衝突に対する耐ヘッドクラッシュ性、
ヘッドがContactStaれStop(CSS)方
式の場合は耐CSS性、滋性めつき媒体を水分、ガス等
から保護するための耐食性、無欠陥性、平滑性などが要
求される。As shown in the figure, this plated disk is made by forming a pretreatment layer 2 on a magnetic disk material 1 (in this case, an AI material), then forming a strike plating layer 3 on this, and further forming a base plating layer on top of this. A layer 4 was formed, this base plating layer was subjected to rough processing and finishing to make it smooth, a magnetic plating layer 5 was formed thereon, and a protective film 6 was formed on this. It is something. Co is currently used as the magnetic plating layer.
-Ni alloy coatings and Co-Ni-P alloy coatings are often used. In addition, the properties required for the protective film include head crush resistance against collision between the head and the disk;
If the head is of the Contact Staple Stop (CSS) type, CSS resistance, corrosion resistance to protect the plating medium from moisture, gas, etc., defect-free property, smoothness, etc. are required.
これらの要求特性を満たす保護皮膜は約300ooで加
熱することによって得られる。しかし、この加熱はめつ
きディスク表面の平坦度、平滑度ならびに無欠隅性を低
下させてしまうという欠点があった。すなわち、ディス
クのそりは増加し、真直度は大きくなる。又表面あらさ
も劣化し、うねりやふくれ、突起を生じる。このため下
地めつき加工面で達成した平坦度、平滑度がそこなわれ
、めつきディスク表面は目標の機械的仕様を満足できな
いという問題を生じた。上記問題の他に、磁性めつき層
の磁気特性の再現性が悪いことがある。磁気特性をコン
トロールするものとしては磁性めつき条件(めつき格組
成、電流密度、格温等)があるが、それ以外に下地の影
響がある。下地金属の結晶組織、組成等が滋性めつき層
の組織、組成に影響を与え磁気特性を変化させるのであ
る。従来技術ではこの下地の影響が大きく、コント。ー
ルが出来ないために得られる磁気特性の再現性、安定性
が悪かった。本発明の目的は記録媒体として磁性めつき
層を用いた高記録密度の磁気ディスク製造にあたり上記
の問題点を解決し、めつきディスク表面が高度に平坦か
つ平滑であり、そのうえ磁性めつき層の磁気特性が安定
で再現性のすぐれた高記録密度磁気ディスクの製造方法
を提供するにある。上記目的を達成するため発明者は高
記録密度磁気ディスクの製造方法を種々検討した結果、
磁気ディスク素材にストライクめつきを施こし、次いで
これに下地めつきを施し、次にこれを荒加工し、この荒
加工をしたものを仕上加工し、更に仕上げ加工したもの
に磯性めつきを施こし、次にこれに加熱により保護皮膜
を形成させる工程からなる高記録密度磁気ディスクの製
造方法において、下地めつき工程と仕上加工工程間で保
護皮膜を形成させる加熱温度以上で熱処理を行なえばよ
いことを見し・出した。A protective film satisfying these required properties can be obtained by heating at about 300 oo. However, this heat-fitted disk has a disadvantage in that the flatness, smoothness, and corner-perfectness of the surface of the disk are reduced. That is, the warpage of the disk increases and the straightness of the disk increases. The surface roughness also deteriorates, causing undulations, bulges, and protrusions. As a result, the flatness and smoothness achieved on the base plated surface was impaired, resulting in the problem that the surface of the plated disk could not meet the target mechanical specifications. In addition to the above problems, the reproducibility of the magnetic properties of the magnetic plated layer may be poor. The magnetic properties are controlled by the magnetic plating conditions (plating composition, current density, temperature, etc.), but there is also the influence of the substrate. The crystal structure and composition of the base metal affect the structure and composition of the nutritious plating layer, thereby changing the magnetic properties. In the conventional technology, the influence of this base is large, and it is difficult to control. The reproducibility and stability of the magnetic properties obtained were poor due to the inability to conduct a magnetic field. The purpose of the present invention is to solve the above-mentioned problems in manufacturing high-density magnetic disks using a magnetic plated layer as a recording medium, and to provide a plated disk surface that is highly flat and smooth, and in addition, the surface of the plated disk is highly flat and smooth. An object of the present invention is to provide a method for manufacturing a high recording density magnetic disk with stable magnetic properties and excellent reproducibility. In order to achieve the above object, the inventor investigated various methods of manufacturing high-density magnetic disks, and found that
Strike plating is applied to the magnetic disk material, then base plating is applied to this, then this is rough processed, the rough processed material is finished, and then the finished material is given rock-like plating. In a method for producing a high-density magnetic disk, which consists of a step of coating the magnetic disk, then heating it to form a protective film, if the heat treatment is performed at a temperature higher than the heating temperature at which the protective film is formed between the base plating step and the finishing step. I saw and brought out good things.
この熱処理により下地めつき層が安定化し、前処理層の
密着力が増加し、下地めつき層の内部応力が緩和される
ため、面あれ、ふくれ、そり等が生じにくくなり高度に
平坦かつ平滑な高言己録密度磁気ディスクを得ることが
できる。又、下地めつき層の組織が熱処理により安定化
するため、磁性めつき層に与える下地の影響を安定化し
、磁気特性の再現性がよくなる。This heat treatment stabilizes the base plating layer, increases the adhesion of the pre-treatment layer, and relieves the internal stress of the base plating layer, making it difficult for surface roughness, blistering, warping, etc. to occur, resulting in a highly flat and smooth surface. It is possible to obtain a magnetic disk with a high recording density. In addition, since the structure of the base plating layer is stabilized by heat treatment, the influence of the base on the magnetic plating layer is stabilized, and the reproducibility of magnetic properties is improved.
以下本発明を実施例によって説明する。14″M合金デ
ィスク素材上にスーパジンケート液(日本化学器材K.
K製)にて亜鉛置換膜を形成した。The present invention will be explained below with reference to Examples. Super zincate solution (Nippon Kagaku Kizai K.
A zinc-substituted film was formed using the following method.
次に密着性向上のために銅ストラィクめつきを5仏形成
し後に、下地めつきとして銅−スズ合金めつきを3山形
成した。次いで熱処理を行なった。熱処理条件は以下の
通りである。熱処理条件
温 度…320qo(昇温10q0/min、冷却2
℃/min)保持時間・・・6び片
方 法・・・荷重(40k9)を加えながら行なった
、空気中この熱処理を行なってから下地めつき面を研摩
加工した。Next, five copper strike platings were formed to improve adhesion, and then three copper-tin alloy platings were formed as a base plating. Next, heat treatment was performed. The heat treatment conditions are as follows. Heat treatment conditions Temperature...320qo (heating 10q0/min, cooling 2
C/min) Holding time: 6 and 1 Method: This heat treatment was carried out in air while applying a load (40k9), and then the base plated surface was polished.
次にで媒体としてCo−Ni−P合金の磁性めつき層を
0.1仏の厚さに形成し、その上に特殊な高分子保護皮
膜を形成した。その後、磁性めつき層と保護皮膜強化の
ために300qoの気中加熱処理を行なった。最後に電
気特性の測定を行なったところ、出力、分解能が従釆よ
り改善されェンベロープ(面内での出力の均一性)も良
くなった。そして目標の記録特性15 00肥P1,5
00TPIを達成できた。なお、下地めつき後の熱処理
温度は以下の実験結果をもとにして決めた。Next, a magnetic plating layer of Co--Ni--P alloy was formed as a medium to a thickness of 0.1 mm, and a special polymeric protective film was formed thereon. Thereafter, an air heat treatment of 300 qo was performed to strengthen the magnetic plating layer and the protective film. Finally, when we measured the electrical characteristics, we found that the output and resolution were improved over the previous model, and the envelope (uniformity of output within the plane) was also improved. And target record characteristics 15 00 fertilizer P1,5
I was able to achieve 00TPI. The heat treatment temperature after base plating was determined based on the following experimental results.
表には表面あらさとそり変化量に関して熱処理温度の影
響を観察した結果を示す。表中1のサンプルのように位
上加工前の熱処理を行なわないものでは表面あらさが0
.078仏mRmaxと大きくなり目標値(0.04仏
m以下)を満足できない。又、1のサンプルでは仕上加
工後と最終工程の熱処理後でディスクのそりが32仏と
大きく変化して目標値(5r以下)を満足しない。しか
し、表中2.3,4に示すように熱処理温度を増加する
につれて、表面あらさの変化、そりの変化は小さくなり
熱処理温度300℃以上では目標値を満足するようにな
る。磁性めつき層の抵磁力(Hc)は下地の影響を受け
てディスク面内でばらつく。目標値1,000十2瓜e
に対し表中の2のサンプルではバラッキ幅が大きいが熱
処理温度の増加につれてバラッキ幅は小さくなり目標値
を達成し安定化し、再現性がよくなる。これらの事から
最終工程の熱処理温度が30び0の場合には、下地めつ
き後に行なう熱処理温度は300℃以上が必要であるこ
とがわかる。熱処理温度の影響
以上述べたごと〈本発明によれば以下の効果のあること
が明らかになった。The table shows the results of observing the effect of heat treatment temperature on surface roughness and amount of warpage change. For samples that are not heat treated before top processing, such as the sample in 1 in the table, the surface roughness is 0.
.. The target value (below 0.04 French m) cannot be satisfied because the value becomes 0.078 French mRmax. In addition, in sample 1, the warp of the disk changed significantly by 32 degrees after the finishing process and the heat treatment in the final process, and did not satisfy the target value (5r or less). However, as shown in 2.3 and 4 in the table, as the heat treatment temperature is increased, the changes in surface roughness and warpage become smaller, and at heat treatment temperatures of 300° C. or higher, the target values are satisfied. The magnetic reluctance (Hc) of the magnetic plating layer varies within the disk surface due to the influence of the underlying layer. Target value 1,000 12 melons
On the other hand, in sample 2 in the table, the variation width is large, but as the heat treatment temperature increases, the variation width becomes smaller and the target value is achieved and stabilized, and the reproducibility is improved. From these facts, it can be seen that when the heat treatment temperature in the final step is 30 to 0, the heat treatment temperature performed after base plating must be 300°C or higher. Effects of Heat Treatment Temperature As stated above, it has been revealed that the present invention has the following effects.
1 磁気ディスク表面が高度に平滑化される。1. The magnetic disk surface is highly smoothed.
2 磁気ディスク表面が高度に平坦化される。2. The magnetic disk surface is highly flattened.
3 磁気ディスク素材へのほどこした下地処理に欠陥が
生じなくなるので生産の歩止まりが向上する。3. Since defects will not occur in the surface treatment applied to the magnetic disk material, the production yield will be improved.
4 磁性めつき層の磁気特性が安定化し、再現性がよく
なる。4. The magnetic properties of the magnetic plating layer are stabilized and reproducibility is improved.
図は高記録密度磁気ディスクの断面である。
1・・・・・・磁気ディスク素材、2・・・・・・前処
理層、3…・・・ストラィクめつき層、4・・・…下地
めつき層、5・…・・磁性めつき層、6・・・・・・保
護皮膜。The figure shows a cross section of a high recording density magnetic disk. 1... Magnetic disk material, 2... Pretreatment layer, 3... Strike plating layer, 4... Base plating layer, 5... Magnetic plating Layer 6...Protective film.
Claims (1)
こす第1工程と、第1工程で前処理を施こした磁気デイ
スク材料にストライクめつきを施こす第2工程と、第2
工程でストライクめつきを施こした磁気デイスク材料に
下地めつきを施こす第3工程と、第3工程で下地めつき
を施こした磁気デイスク材料に荒加工を施こす第4工程
と、第4工程で荒加工を施こした材料に仕上げ加工を施
こす第5工程と、第5工程で仕上げ加工を施こした磁気
デイスク材料に磁性めつきを施こす第6工程と、第6工
程で磁性めつきを施こした磁気デイスク材料に保護皮膜
を形成させる第7工程とからなる高記録密度磁気デイス
クの製造方法において、下地めつきを施こす第3工程と
仕上げ加工を施こす第5工程との間で第7工程の保護皮
膜形成のための加熱温度以上で熱処理を行なうことを特
徴とする高記録密度磁気デイスクの製造方法。1. A first step of pre-treating the magnetic disk material for strike plating, a second step of applying strike plating to the magnetic disk material pre-treated in the first step, and a second step of pre-treating the magnetic disk material for strike plating.
A third step of applying base plating to the magnetic disk material that has been subjected to strike plating in the process, a fourth step of performing rough processing to the magnetic disk material that has been subjected to base plating in the third step, and The fifth step is to apply finishing to the material that has been rough processed in the fourth step, and the sixth step is to apply magnetic plating to the magnetic disk material that has been finished in the fifth step. A method for manufacturing a high recording density magnetic disk comprising a seventh step of forming a protective film on a magnetic disk material subjected to magnetic plating, a third step of applying base plating and a fifth step of performing finishing processing. A method for manufacturing a high recording density magnetic disk, characterized in that heat treatment is performed at a temperature higher than the heating temperature for forming a protective film in the seventh step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4793277A JPS6016010B2 (en) | 1977-04-27 | 1977-04-27 | Manufacturing method of high recording density magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4793277A JPS6016010B2 (en) | 1977-04-27 | 1977-04-27 | Manufacturing method of high recording density magnetic disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53133407A JPS53133407A (en) | 1978-11-21 |
| JPS6016010B2 true JPS6016010B2 (en) | 1985-04-23 |
Family
ID=12789136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4793277A Expired JPS6016010B2 (en) | 1977-04-27 | 1977-04-27 | Manufacturing method of high recording density magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6016010B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63140091A (en) * | 1986-12-02 | 1988-06-11 | Kobe Steel Ltd | Improvement of corrosion resistance in electroless ni-p plating substrate for magnetic disk |
-
1977
- 1977-04-27 JP JP4793277A patent/JPS6016010B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53133407A (en) | 1978-11-21 |
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