JPS6016361B2 - Manufacturing method of sulfur tetrafluoride - Google Patents
Manufacturing method of sulfur tetrafluorideInfo
- Publication number
- JPS6016361B2 JPS6016361B2 JP10511580A JP10511580A JPS6016361B2 JP S6016361 B2 JPS6016361 B2 JP S6016361B2 JP 10511580 A JP10511580 A JP 10511580A JP 10511580 A JP10511580 A JP 10511580A JP S6016361 B2 JPS6016361 B2 JP S6016361B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- sulfur
- solvent
- sulfur dichloride
- yield
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Pyridine Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】
本発明は四発化硫黄の製造法、特に高価な電力を用いて
弗酸を略解して得た弗素ガスを用いることなく、比較的
安価な弗素源を用い高純度、高収率で四弗化硫黄(SF
4)を製造する方法に係るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing sulfur tetrahydride, and in particular, a method for producing sulfur tetrahydride using a relatively inexpensive fluorine source without using fluorine gas obtained by abbreviation of hydrofluoric acid using expensive electricity. , sulfur tetrafluoride (SF) in high yield
4).
従来SF4を製造する手段としては、例えば二塩化硫黄
と弗化ソーダをァセトニトリル等の有機溶煤中で反応せ
しめる方法(USP2992073号明細書参照)、こ
塩化硫黄と塩素と弗化水素とを−50℃において反応せ
しめ、反応生成物をアミン類で処理してSF4を分離せ
しめる方法(OLS238679号公報参照)、二塩化
硫黄をNOF・細Fと反応せしめる方法(USP4雌2
総計号明細書参照)等が知られている。Conventional methods for producing SF4 include, for example, a method in which sulfur dichloride and sodium fluoride are reacted in an organic solution such as acetonitrile (see US Pat. No. 2,992,073); ℃ reaction and treatment of the reaction product with amines to separate SF4 (see OLS No. 238679); method of reacting sulfur dichloride with NOF/fine F (USP 4 Female 2);
(See total number specification) etc. are known.
これら方法のうち、前記USP29舵073号明細書に
代表される方法は、二塩化硫黄と反応させる弗化ソーダ
及び創生物である食塩が固体である為、スラリー状で反
応を行なわねばならず、反応操作が行ないにくく、又弗
化ソーダの粒度によりSF4の収率が大きく変動する等
反応操作面であまり好ましくない欠点を有する。Among these methods, the method typified by the above-mentioned US Pat. No. 29, No. 073 requires the reaction to be carried out in the form of a slurry, since the sodium fluoride reacted with sulfur dichloride and the salt used as the creation material are solids. It has drawbacks that are not very favorable in terms of reaction operation, such as the reaction operation being difficult to carry out and the yield of SF4 varying greatly depending on the particle size of the sodium fluoride.
又、CLS23隙679号公報に代表される方法は、−
5ぴ○というかなり低温が要求され、又、アミン類での
処理を要し、操作が煩雑であると共にコストが高い欠点
を有する。In addition, the method typified by CLS23 Gap No. 679 is -
It requires a fairly low temperature of 5 pi, and also requires treatment with amines, resulting in complicated operations and high costs.
又、USP4雌283計号に代表される方法は、NOF
が腐食性であり、袋贋に0特殊材質を用いる必要があり
しかもSF4の収率が低く、創生物として硫黄が析出し
、操作が煩雑となる欠点を有する。更にPy(HF)9
.2(Py:ピリジン)と二塩化硫黄を反応せしめ、S
F4を聡%という低い収率で得た旨の報告がある。(G
.A夕。lahet,al,I皿rg,Chem,I6
2637(仰77)Shortcommunicat
ion参照)しかしながら、本発明者等の追試によると
、この方法では収率が斑%どころかSF4の生成は認め
られなかった。In addition, the method typified by USP4 female number 283 is NOF
However, it is corrosive, requires the use of special materials for counterfeiting, has a low yield of SF4, precipitates sulfur as a creation product, and has the drawbacks of complicated operations. Furthermore, Py(HF)9
.. 2 (Py: pyridine) and sulfur dichloride are reacted to form S
There is a report that F4 was obtained in a low yield of Satoshi%. (G
.. A evening. lahet, al, I dish rg, Chem, I6
2637 (77) Shortcommunicat
ion) However, according to additional tests by the present inventors, in this method, not only the yield was uneven, but no production of SF4 was observed.
即ち、本発明者等がその後検討を進めた結果によると、
HF/Pyのモル比を種々探って二塩化硫黄と反応せし
めた処、HF/Py=5〜6を超えると弗素化能が著し
く低下するか全くなくなることが見出された。そして本
発明者は、HF/Py=4以下に限って二塩化硫黄との
反応により、SF4を高純度且つ収率90%以上で容易
に得られることを見出し、既に袴磯昭弘一13雌紙号(
椿関昭56一鼠209号)として提案した。That is, according to the results of subsequent studies by the present inventors,
After investigating various molar ratios of HF/Py and reacting with sulfur dichloride, it was found that when HF/Py exceeds 5 to 6, the fluorination ability is significantly reduced or completely eliminated. The present inventor has discovered that SF4 can be easily obtained with high purity and a yield of 90% or more by reaction with sulfur dichloride only when HF/Py=4 or less, and has already reported that issue(
It was proposed as Tsubaki Seki Sho 56 Ichizu No. 209).
本発明者等は、その後更に検討を進めた処、ピリジンに
限らずピコリンやキノリン等の他のアミンを用いても、
ピリジンの場合とほぼ同様な結果を得られることが見出
された。After further investigation, the present inventors discovered that not only pyridine but also other amines such as picoline and quinoline can be used.
It was found that almost the same results as in the case of pyridine can be obtained.
このような弗酸のアミソ化合物としては、一般式Am(
HF),〜4(Am:ピリジンを除くアミン)で表わさ
れ、Amはピコリン、キノリン等のピリジン譲導体およ
びトリェチルアミン、トリメチルアミン等の第3級アミ
ン等であり、これらは必ずしも純粋に単独である必要は
なく、適宜二種類以上が混合されていて差し支えない。
本発明において、このよう様な弗酸のァミン化合物はH
F/Amのモル比が1〜4であることが必要である。Such an amiso compound of hydrofluoric acid has the general formula Am (
HF), ~4 (Am: amine excluding pyridine), where Am is a pyridine derivative such as picoline or quinoline, or a tertiary amine such as triethylamine or trimethylamine, and these are not necessarily pure alone. It is not necessary, and two or more types may be mixed as appropriate.
In the present invention, such an amine compound of hydrofluoric acid is
It is necessary that the molar ratio of F/Am is 1-4.
モル比が前記範囲を逸脱する場合には、SF4の生成が
不十分若しくは反応が進行しないので不適当である。本
発明において、夫々用いられる二塩化硫黄と弗酸のアミ
ン化合物の使用割合は、厳密には使用するAm(HF)
nのnの数によって決定される、通常二塩化硫黄1モル
に対しAm(HF),〜4化合物1〜10モルを使用す
るのが適当であり、nの数が大きくなると共に前記範囲
内においてAm(HF)nの使用量は多くなる。If the molar ratio is outside the above range, it is unsuitable because the production of SF4 is insufficient or the reaction does not proceed. In the present invention, strictly speaking, the ratio of the amine compounds of sulfur dichloride and hydrofluoric acid used is
It is usually appropriate to use 1 to 10 moles of Am(HF), ~4 compound per mole of sulfur dichloride, which is determined by the number of n in n, and as the number of n increases, within the above range. The amount of Am(HF)n used increases.
これら使用割合が前記範囲を逸脱する場合には、SF4
の収率が低下したり、弗酸のアミン化合物の利用率が低
下する等工業的に有利でない。そして、これら使用割合
のうち二塩化硫黄1モルに対し、発酸のアミン化合物を
2〜6モル使用する場合には、工業的に満足できる速度
でSF4が理論収率の90%以上で得られるので特に好
ましい。用いられる弗酸のアミン化合物の合成手段に特
に制限はなく、適宜公知の手段を採用し得る。If these usage ratios deviate from the above range, SF4
It is not industrially advantageous because the yield of hydrofluoric acid decreases and the utilization rate of the amine compound of hydrofluoric acid decreases. If 2 to 6 moles of the acid-generating amine compound are used per 1 mole of sulfur dichloride in these proportions, SF4 can be obtained at an industrially satisfactory rate with a yield of 90% or more of the theoretical yield. Therefore, it is particularly preferable. There are no particular limitations on the method for synthesizing the amine compound of hydrofluoric acid, and any known method may be employed as appropriate.
例えば弗酸のキノリン化合物を例に探ってその合成手段
の一例を説明すると、キノリンをポリエチレン等の耐フ
ツ酸性のある容器に入れ、外部から冷却しつつ所定量の
フッ化水素を導入する等の手段が用いられる。これら原
料を用いて実際SF4を合成する他の条件としては、温
度10〜6び0を採用し、圧力は通常常圧を採用し、所
望により5k9/仇Gの加圧条件を採用することも可能
である。For example, if we take the quinoline compound of hydrofluoric acid as an example and explain one example of its synthesis method, quinoline is placed in a hydrofluoric acid-resistant container such as polyethylene, and a predetermined amount of hydrogen fluoride is introduced while cooling from the outside. means are used. Other conditions for actually synthesizing SF4 using these raw materials include a temperature of 10 to 600, a pressure of usually normal pressure, and a pressurization of 5k9/g if desired. It is possible.
又、反応は溶媒の不存在下でも行ない得るが溶媒を用い
た方が取り扱い操作上及び反応を円滑に実施し得るので
好ましい。Further, although the reaction can be carried out in the absence of a solvent, it is preferable to use a solvent because handling and reaction can be carried out smoothly.
用いられる溶媒としては、原料や生成物に対しこれ自身
が不活性であることが好ましく、一般にハロゲン化炭化
水素類が適当である。そして、これらのうちトリクロロ
トリフルオロェタン、フロロトリクロロメタン、塩化メ
チレン、クロロホルム、四塩化炭素が好ましく、これら
は適宜一種或は二種以上を用いることができる。とりわ
け、トリクロロトリフルオロェタンを採用する場合には
、SF4の生成に伴なつて副生する塩化硫黄及び塩酸の
アミン化合物の両液体を溶媒中において夫々別の層に分
離せしめられ、これを回収して原料に再使用し得る利点
があるので特に好ましい。The solvent used is preferably one that is itself inert to the raw materials and products, and halogenated hydrocarbons are generally suitable. Among these, trichlorotrifluoroethane, fluorotrichloromethane, methylene chloride, chloroform, and carbon tetrachloride are preferred, and one or more of these can be used as appropriate. In particular, when trichlorotrifluoroethane is used, both liquids, sulfur chloride and an amine compound of hydrochloric acid, which are by-produced as a result of the production of SF4, are separated into separate layers in a solvent, and then collected. It is particularly preferred because it has the advantage of being reusable as a raw material.
又、前記反応原料と溶媒の使用割合は、これらの全量に
対し溶媒を10〜20畔容量%程度用いるのが適当であ
る。Further, as for the ratio of the reaction raw materials and the solvent used, it is appropriate to use the solvent in an amount of about 10 to 20% by volume based on the total amount thereof.
反応を実施する装置としては、例えば適宜な濃洋装置を
有する完全混合型の反応菱暦が好ましく、その材質はS
USや内面に弗素樹脂等の袴に耐塩素性の耐食材料を用
いるのが好ましい。次に本発明を実施例により説明する
。As the apparatus for carrying out the reaction, for example, a complete mixing type reaction model having an appropriate concentration apparatus is preferable, and the material thereof is S.
It is preferable to use a chlorine-resistant and corrosion-resistant material for the hakama, such as US or fluororesin on the inner surface. Next, the present invention will be explained by examples.
実施例修 Am Am(HF)n(モル)SC1
2(モル) 溶 媒(Z) SF4収率孫1 キ
ノリン 2 1
0.5 94n=2
ト1’クロロトリフノレオロエタン2 キノリ
ン 6 1 〃 90n=4
〃3 o−ピコリン 4
1 0.4 91n=3
4 トリエチルアミン 4
1 0.5 92n=2
塩化メチレン尚、反応温度は何れも30
〜45qo、常圧で反応を行なった。Example modification Am Am (HF) n (mol) SC1
2 (mol) Solvent (Z) SF4 yield 1 Quinoline 2 1
0.5 94n=2
1'chlorotriphnoleoloethane 2 quinoline 6 1 〃 90n=4
〃3 o-picoline 4
1 0.4 91n=3
4 Triethylamine 4
1 0.5 92n=2
For methylene chloride, the reaction temperature was 30°C.
The reaction was carried out at ~45 qo and normal pressure.
Claims (1)
存在若しくは不存在下に反応せしめることを特徴とする
四弗化硫黄の製造方法。 但し、Amは、ピコリン、キノリン等のピリジンを除く
、ピリジン誘導体及びトリメチルアミン、トリエチルア
ミン等の第3級アミンから選ばれた少なくとも1種。 2 二塩化硫黄とAm(HF)_1_〜_4の反応割合
は、前者1モルに対し、後者1〜10モルである特許請
求の範囲1項の方法。 3 溶媒はハロゲン化炭化水素類である特許請求の範囲
1の方法。 4 ハロゲン化炭化水素類は、トリクロロトリフルオロ
エタン、フロロトリクロロメタン、塩化メチレン、クロ
ロホルム、四塩化炭素である特許請求の範囲3の方法。[Claims] 1. A method for producing sulfur tetrafluoride, which comprises reacting sulfur dichloride and Am(HF)_1_-_4 in the presence or absence of a solvent. However, Am is at least one selected from pyridine derivatives excluding pyridine such as picoline and quinoline, and tertiary amines such as trimethylamine and triethylamine. 2. The method according to claim 1, wherein the reaction ratio of sulfur dichloride and Am(HF)_1_-_4 is 1 to 10 mol of the latter to 1 mol of the former. 3. The method of claim 1, wherein the solvent is a halogenated hydrocarbon. 4. The method according to claim 3, wherein the halogenated hydrocarbons are trichlorotrifluoroethane, fluorotrichloromethane, methylene chloride, chloroform, and carbon tetrachloride.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10511580A JPS6016361B2 (en) | 1980-08-01 | 1980-08-01 | Manufacturing method of sulfur tetrafluoride |
| IT25261/80A IT1150046B (en) | 1979-10-12 | 1980-10-09 | PROCEDURE FOR THE PRODUCTION OF SULFUR THEATRAFLUORIDE |
| GB8032738A GB2061245B (en) | 1979-10-12 | 1980-10-10 | Process for producing sulphur tetrafluoride |
| FR8021759A FR2467176A1 (en) | 1979-10-12 | 1980-10-10 | PROCESS FOR THE PRODUCTION OF SULFUR TETRAFLUORIDE BY USING AN AMINE COMPLEX AND FLUORHYDRIC ACID |
| DE19803038404 DE3038404A1 (en) | 1979-10-12 | 1980-10-10 | METHOD FOR PRODUCING SULFUR TETRAFLUORIDE |
| US06/370,670 US4372938A (en) | 1979-10-12 | 1982-04-22 | Producing sulfur tetrafluoride using amine/hydrogen fluoride complex |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10511580A JPS6016361B2 (en) | 1980-08-01 | 1980-08-01 | Manufacturing method of sulfur tetrafluoride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5734002A JPS5734002A (en) | 1982-02-24 |
| JPS6016361B2 true JPS6016361B2 (en) | 1985-04-25 |
Family
ID=14398823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10511580A Expired JPS6016361B2 (en) | 1979-10-12 | 1980-08-01 | Manufacturing method of sulfur tetrafluoride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6016361B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6316681U (en) * | 1986-07-18 | 1988-02-03 |
-
1980
- 1980-08-01 JP JP10511580A patent/JPS6016361B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6316681U (en) * | 1986-07-18 | 1988-02-03 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5734002A (en) | 1982-02-24 |
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