JPS6021373B2 - Photosensitive resin composition with excellent storage stability - Google Patents
Photosensitive resin composition with excellent storage stabilityInfo
- Publication number
- JPS6021373B2 JPS6021373B2 JP9749977A JP9749977A JPS6021373B2 JP S6021373 B2 JPS6021373 B2 JP S6021373B2 JP 9749977 A JP9749977 A JP 9749977A JP 9749977 A JP9749977 A JP 9749977A JP S6021373 B2 JPS6021373 B2 JP S6021373B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- resin composition
- group
- stabilizer
- storage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011342 resin composition Substances 0.000 title claims description 29
- 238000003860 storage Methods 0.000 title description 42
- 239000003381 stabilizer Substances 0.000 claims description 24
- 229920000642 polymer Polymers 0.000 claims description 14
- 239000000178 monomer Substances 0.000 claims description 13
- 239000003504 photosensitizing agent Substances 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 230000000737 periodic effect Effects 0.000 claims description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- DAHPIMYBWVSMKQ-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide Chemical class O=NN(O)C1=CC=CC=C1 DAHPIMYBWVSMKQ-UHFFFAOYSA-N 0.000 claims description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- 239000012990 dithiocarbamate Substances 0.000 claims description 3
- 150000004659 dithiocarbamates Chemical class 0.000 claims description 3
- 239000003125 aqueous solvent Substances 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 239000011347 resin Substances 0.000 description 38
- 229920005989 resin Polymers 0.000 description 38
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- 238000007639 printing Methods 0.000 description 23
- 239000000203 mixture Substances 0.000 description 19
- 239000007788 liquid Substances 0.000 description 15
- -1 penzoquinone Chemical class 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- BUZICZZQJDLXJN-UHFFFAOYSA-N 3-azaniumyl-4-hydroxybutanoate Chemical compound OCC(N)CC(O)=O BUZICZZQJDLXJN-UHFFFAOYSA-N 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 238000000016 photochemical curing Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 239000003112 inhibitor Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000001723 curing Methods 0.000 description 5
- 229920006267 polyester film Polymers 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 230000000087 stabilizing effect Effects 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000012456 homogeneous solution Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- PTPLXVHPKMTVIW-FPLPWBNLSA-N (Z)-hydroxyimino-oxido-phenylazanium Chemical compound O\N=[N+](/[O-])c1ccccc1 PTPLXVHPKMTVIW-FPLPWBNLSA-N 0.000 description 2
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- MYKLQMNSFPAPLZ-UHFFFAOYSA-N 2,5-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C(C)=CC1=O MYKLQMNSFPAPLZ-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- HXKCUQDTMDYZJD-UHFFFAOYSA-N Methyl selenac Chemical compound CN(C)C(=S)S[Se](SC(=S)N(C)C)(SC(=S)N(C)C)SC(=S)N(C)C HXKCUQDTMDYZJD-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- USBHFGNOYVOTON-UHFFFAOYSA-K bis(dimethylcarbamothioylsulfanyl)bismuthanyl n,n-dimethylcarbamodithioate Chemical compound [Bi+3].CN(C)C([S-])=S.CN(C)C([S-])=S.CN(C)C([S-])=S USBHFGNOYVOTON-UHFFFAOYSA-K 0.000 description 2
- HCXZJUCLTQLEBI-UHFFFAOYSA-L cadmium(2+);n,n-dimethylcarbamodithioate Chemical compound [Cd+2].CN(C)C([S-])=S.CN(C)C([S-])=S HCXZJUCLTQLEBI-UHFFFAOYSA-L 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 238000007922 dissolution test Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- XLYMOEINVGRTEX-UHFFFAOYSA-N fumaric acid monoethyl ester Natural products CCOC(=O)C=CC(O)=O XLYMOEINVGRTEX-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- AZHYTXUTACODCW-UHFFFAOYSA-L n,n-dimethylcarbamodithioate;iron(2+) Chemical compound [Fe+2].CN(C)C([S-])=S.CN(C)C([S-])=S AZHYTXUTACODCW-UHFFFAOYSA-L 0.000 description 2
- QGTHALAWFUFVCU-UHFFFAOYSA-L n,n-dimethylcarbamodithioate;lead(2+) Chemical compound [Pb+2].CN(C)C([S-])=S.CN(C)C([S-])=S QGTHALAWFUFVCU-UHFFFAOYSA-L 0.000 description 2
- BLCKKNLGFULNRC-UHFFFAOYSA-L n,n-dimethylcarbamodithioate;nickel(2+) Chemical compound [Ni+2].CN(C)C([S-])=S.CN(C)C([S-])=S BLCKKNLGFULNRC-UHFFFAOYSA-L 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 150000004053 quinones Chemical class 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- ILLKMACMBHTSHP-UHFFFAOYSA-N tetradecaethylene glycol Chemical compound OCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCO ILLKMACMBHTSHP-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000003911 water pollution Methods 0.000 description 2
- SVAISWVPYVSCJE-UHFFFAOYSA-L zinc;n,n-diethylcarbamate Chemical compound [Zn+2].CCN(CC)C([O-])=O.CCN(CC)C([O-])=O SVAISWVPYVSCJE-UHFFFAOYSA-L 0.000 description 2
- UTOVMEACOLCUCK-SNAWJCMRSA-N (e)-4-butoxy-4-oxobut-2-enoic acid Chemical compound CCCCOC(=O)\C=C\C(O)=O UTOVMEACOLCUCK-SNAWJCMRSA-N 0.000 description 1
- XLYMOEINVGRTEX-ONEGZZNKSA-N (e)-4-ethoxy-4-oxobut-2-enoic acid Chemical compound CCOC(=O)\C=C\C(O)=O XLYMOEINVGRTEX-ONEGZZNKSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- HLGNMOUJXWELKK-UHFFFAOYSA-N 2-[2-[2-[2-[2-[2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOCCOCCOCCOCCOCCOC(=O)C(C)=C HLGNMOUJXWELKK-UHFFFAOYSA-N 0.000 description 1
- SFPNZPQIIAJXGL-UHFFFAOYSA-N 2-ethoxyethyl 2-methylprop-2-enoate Chemical compound CCOCCOC(=O)C(C)=C SFPNZPQIIAJXGL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 1
- LKJTVGPNIFDNOA-UHFFFAOYSA-N 3-[4-[2-[4-(3-prop-2-enoyloxypropoxy)phenyl]propan-2-yl]phenoxy]propyl prop-2-enoate Chemical compound C=1C=C(OCCCOC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OCCCOC(=O)C=C)C=C1 LKJTVGPNIFDNOA-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- RTTAGBVNSDJDTE-UHFFFAOYSA-N 4-ethoxy-2-methylidene-4-oxobutanoic acid Chemical compound CCOC(=O)CC(=C)C(O)=O RTTAGBVNSDJDTE-UHFFFAOYSA-N 0.000 description 1
- YMRDPCUYKKPMFC-UHFFFAOYSA-N 4-hydroxy-2,2,5,5-tetramethylhexan-3-one Chemical compound CC(C)(C)C(O)C(=O)C(C)(C)C YMRDPCUYKKPMFC-UHFFFAOYSA-N 0.000 description 1
- UXKQNCDDHDBAPD-UHFFFAOYSA-N 4-n,4-n-diphenylbenzene-1,4-diamine Chemical compound C1=CC(N)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 UXKQNCDDHDBAPD-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- QSJXEFYPDANLFS-UHFFFAOYSA-N Diacetyl Chemical group CC(=O)C(C)=O QSJXEFYPDANLFS-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- XLYMOEINVGRTEX-ARJAWSKDSA-N Ethyl hydrogen fumarate Chemical compound CCOC(=O)\C=C/C(O)=O XLYMOEINVGRTEX-ARJAWSKDSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 208000008930 Low Back Pain Diseases 0.000 description 1
- 206010027439 Metal poisoning Diseases 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- VFZUJQITOLLTQU-UHFFFAOYSA-N N(=O)N(O)C1=CC=CC=C1.[Sn] Chemical compound N(=O)N(O)C1=CC=CC=C1.[Sn] VFZUJQITOLLTQU-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 241001125046 Sardina pilchardus Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- YSKCRYMJUCLQDG-UHFFFAOYSA-N [4-[2-(2,3-diethoxy-4-prop-2-enoyloxyphenyl)propan-2-yl]-2,3-diethoxyphenyl] prop-2-enoate Chemical compound CCOC1=C(OC(=O)C=C)C=CC(C(C)(C)C=2C(=C(OCC)C(OC(=O)C=C)=CC=2)OCC)=C1OCC YSKCRYMJUCLQDG-UHFFFAOYSA-N 0.000 description 1
- SJSXBTSSSQCODU-UHFFFAOYSA-N [4-[2-[2,3-diethoxy-4-(2-methylprop-2-enoyloxy)phenyl]propan-2-yl]-2,3-diethoxyphenyl] 2-methylprop-2-enoate Chemical compound CCOC1=C(OC(=O)C(C)=C)C=CC(C(C)(C)C=2C(=C(OCC)C(OC(=O)C(C)=C)=CC=2)OCC)=C1OCC SJSXBTSSSQCODU-UHFFFAOYSA-N 0.000 description 1
- VVHJPYPXQKWGKO-UHFFFAOYSA-N [methyl(phenyl)carbamothioyl] n-methyl-n-phenylcarbamodithioate Chemical compound C=1C=CC=CC=1N(C)C(=S)SC(=S)N(C)C1=CC=CC=C1 VVHJPYPXQKWGKO-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- MKSISPKJEMTIGI-LWTKGLMZSA-K aluminum (Z)-oxido-oxidoimino-phenylazanium Chemical compound [Al+3].[O-]\N=[N+](/[O-])c1ccccc1.[O-]\N=[N+](/[O-])c1ccccc1.[O-]\N=[N+](/[O-])c1ccccc1 MKSISPKJEMTIGI-LWTKGLMZSA-K 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- GXCSNALCLRPEAS-CFYXSCKTSA-N azane (Z)-hydroxyimino-oxido-phenylazanium Chemical compound N.O\N=[N+](/[O-])c1ccccc1 GXCSNALCLRPEAS-CFYXSCKTSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CGNRQCGWXXLTIA-UHFFFAOYSA-N bis(2-ethylhexyl) 2-methylidenebutanedioate Chemical compound CCCCC(CC)COC(=O)CC(=C)C(=O)OCC(CC)CCCC CGNRQCGWXXLTIA-UHFFFAOYSA-N 0.000 description 1
- UTOVMEACOLCUCK-PLNGDYQASA-N butyl maleate Chemical compound CCCCOC(=O)\C=C/C(O)=O UTOVMEACOLCUCK-PLNGDYQASA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- OBBCYCYCTJQCCK-UHFFFAOYSA-L copper;n,n-diethylcarbamodithioate Chemical compound [Cu+2].CCN(CC)C([S-])=S.CCN(CC)C([S-])=S OBBCYCYCTJQCCK-UHFFFAOYSA-L 0.000 description 1
- ZOUQIAGHKFLHIA-UHFFFAOYSA-L copper;n,n-dimethylcarbamodithioate Chemical compound [Cu+2].CN(C)C([S-])=S.CN(C)C([S-])=S ZOUQIAGHKFLHIA-UHFFFAOYSA-L 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- ZWWQRMFIZFPUAA-UHFFFAOYSA-N dimethyl 2-methylidenebutanedioate Chemical group COC(=O)CC(=C)C(=O)OC ZWWQRMFIZFPUAA-UHFFFAOYSA-N 0.000 description 1
- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 1
- MZGNSEAPZQGJRB-UHFFFAOYSA-N dimethyldithiocarbamic acid Chemical compound CN(C)C(S)=S MZGNSEAPZQGJRB-UHFFFAOYSA-N 0.000 description 1
- TVWTZAGVNBPXHU-FOCLMDBBSA-N dioctyl (e)-but-2-enedioate Chemical compound CCCCCCCCOC(=O)\C=C\C(=O)OCCCCCCCC TVWTZAGVNBPXHU-FOCLMDBBSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000000687 hydroquinonyl group Chemical group C1(O)=C(C=C(O)C=C1)* 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 208000008127 lead poisoning Diseases 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- REOJLIXKJWXUGB-UHFFFAOYSA-N mofebutazone Chemical group O=C1C(CCCC)C(=O)NN1C1=CC=CC=C1 REOJLIXKJWXUGB-UHFFFAOYSA-N 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 229940074369 monoethyl fumarate Drugs 0.000 description 1
- NNGNSXBJQWYLLZ-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide;magnesium Chemical compound [Mg].O=NN(O)C1=CC=CC=C1 NNGNSXBJQWYLLZ-UHFFFAOYSA-N 0.000 description 1
- DINHQDIWPYHLFM-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide;manganese Chemical compound [Mn].O=NN(O)C1=CC=CC=C1 DINHQDIWPYHLFM-UHFFFAOYSA-N 0.000 description 1
- NXTSNOIHVARFON-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide;sodium Chemical compound [Na].O=NN(O)C1=CC=CC=C1 NXTSNOIHVARFON-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920002589 poly(vinylethylene) polymer Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000019512 sardine Nutrition 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- CTPKSRZFJSJGML-UHFFFAOYSA-N sulfiram Chemical compound CCN(CC)C(=S)SC(=S)N(CC)CC CTPKSRZFJSJGML-UHFFFAOYSA-N 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
- KMNUDJAXRXUZQS-UHFFFAOYSA-L zinc;n-ethyl-n-phenylcarbamodithioate Chemical compound [Zn+2].CCN(C([S-])=S)C1=CC=CC=C1.CCN(C([S-])=S)C1=CC=CC=C1 KMNUDJAXRXUZQS-UHFFFAOYSA-L 0.000 description 1
- DUBNHZYBDBBJHD-UHFFFAOYSA-L ziram Chemical compound [Zn+2].CN(C)C([S-])=S.CN(C)C([S-])=S DUBNHZYBDBBJHD-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Polymerisation Methods In General (AREA)
Description
【発明の詳細な説明】
本発明は貯蔵安定性が高く且つ感度低下のない感光性樹
脂組成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive resin composition that has high storage stability and does not cause a decrease in sensitivity.
従来、印刷に使用する版材は活字凸版や金属腐食凸版が
王であったが、鉛中毒とか重量物運搬による作業従事者
の腰痛の問題や、金属腐食版作業時に使用されるエッチ
ング液による河川の水質汚濁、さらに職場環境不備の問
題等が顕現化することにより、これらの問題を悉く解決
した感光性樹脂を版材とした印刷が主流となってきた。Traditionally, letterpress printing and metal-corrosion letterpress were the most commonly used printing plates, but these problems caused problems such as lead poisoning and lower back pain for workers due to transporting heavy objects, and water pollution caused by the etching solution used when working with metal-corrosion plates. As problems such as water pollution and poor workplace environments have become more apparent, printing using photosensitive resin as a plate material has become mainstream, as it has solved all of these problems.
今後もこの複向は変らず、近い将釆印刷版の大部分が感
光性樹脂版で占められるものと予想されている。−対史
の感光性樹脂組成物には総て光増感剤が添加されている
。この光増感剤は感光性樹脂中にあって、紫外線を含む
活性光線の照射を受けると一重頃状態に励起して三重項
状鎚塾こ変化した後、感光性樹脂へエネルギーを移動し
光硬化反応を誘起するか、活性光線により、自らが分解
して重合体あるいは後述する光重合性不飽和単量体を活
性化するかのいずれかの反応によって感光性樹脂を溶媒
不落化に導く前駆的役割を果している。従って、ここに
根本的問題が提起される。即ち、上記したように感光性
樹脂組成物は光増感剤を含むためにそれを励起させる活
性光線下では活性光線の照度がたとえ小さくとも、徐々
に光陵化反応が起り、液体状感光性樹脂では組成物粘度
が増加し、脱泡しにくいぱりか版厚を一定にできなくな
る欠点に繋がる。または部分的にゲル分が生じ現像性が
悪化するばかりか、解像力が減少することになる。また
、感光性樹脂に含まれている光重合性不飽和単量体は熱
せられたり長期間保存されているような場合、添加され
ている熱連重合禁止剤が消交されてしまうとすぐに重合
を始め粘度が上昇し遂には固化する程重合の進行が速い
。It is predicted that this bidirectional printing will continue in the future, and that in the near future the majority of printing plates will be made up of photosensitive resin plates. - All of Taishi's photosensitive resin compositions contain a photosensitizer. This photosensitizer is present in the photosensitive resin, and when it is irradiated with actinic rays including ultraviolet rays, it is excited to a singlet state and changes into a triplet state, and then transfers energy to the photosensitive resin and emits light. Leads the photosensitive resin to become solvent-proof by either inducing a curing reaction or by decomposing itself with active light and activating the polymer or the photopolymerizable unsaturated monomer described below. It plays a pioneering role. Therefore, a fundamental question is raised here. That is, as mentioned above, since the photosensitive resin composition contains a photosensitizer, when exposed to actinic light that excites it, even if the illuminance of the actinic light is small, a photoresist reaction gradually occurs, resulting in liquid photosensitivity. With resin, the viscosity of the composition increases, leading to the disadvantage that defoaming is difficult and the thickness of the paper plate cannot be kept constant. Alternatively, gel components may be generated in some areas, resulting in not only poor developability but also a decrease in resolution. In addition, if the photopolymerizable unsaturated monomer contained in the photosensitive resin is heated or stored for a long period of time, the heat-linked polymerization inhibitor added will be decomposed and the photopolymerizable unsaturated monomer will react quickly. The polymerization progresses so quickly that the viscosity increases and finally solidifies.
したがって、活性光線が全く照射されない場所に感光性
樹脂組成物を貯蔵しておいても増粘したり、固化する現
象が見られるのである。このような場合、品質が著しく
低下するばかりか商品としての価値を失う。感光性樹脂
組成物もしくは感光性樹脂原版をメーカーで製造し、各
ユーザーに配送するまでにかなりの時間が経過し、さら
にユーザーにあっては一定量を確保して印刷版を作るの
であるが、使用し切る迄には長期に亘ることもあり、こ
の間品質に変動があってはならない。また、配送時、保
存時、感光性樹脂にとっては冷燈所環境が望ましいので
あるが、気温が上昇したり、湿度が変化する情況下にあ
っても常に品質が一定の感光性樹脂が望まれるのである
。固体状感光性樹脂原版はアルミニウム、鉄、亜鉛板の
上に予じめ一定厚の感光性樹脂層が塗布された状態で供
給されるので、液体状感光性樹脂ほど顕著な状態変化を
示さないが、やはり貯蔵安定性が悪いと、現像時かなり
激しい現像操作を施してもショルダー部に現像残りが発
生し、この版を使って印刷したとき文字の太りの原因と
なったり、切れの思い印刷物とならざるをえない。Therefore, even if a photosensitive resin composition is stored in a place where it is not irradiated with actinic rays, the phenomenon of thickening or solidification is observed. In such a case, not only the quality deteriorates significantly but also the product loses its value as a product. A considerable amount of time passes from the time a manufacturer produces a photosensitive resin composition or a photosensitive resin master plate to the time it is delivered to each user, and the user also has to secure a certain amount to make printing plates. It may take a long time until it is used up, so there should be no change in quality during this time. Furthermore, while a cold light station environment is preferable for photosensitive resins during shipping and storage, it is desirable for photosensitive resins to maintain constant quality even under conditions of rising temperature and changing humidity. It is. Solid photosensitive resin master plates are supplied with a photosensitive resin layer of a certain thickness coated on aluminum, iron, or zinc plates, so they do not exhibit as noticeable changes in state as liquid photosensitive resins. However, if the storage stability is poor, there will be residual development on the shoulder area even if the development process is done quite vigorously, which may cause the characters to become thick when printed using this plate, or the prints may not be cut properly. I have no choice but to do so.
貯蔵時の三次元架橋反応がさらに進むと、ネガフィルム
を当てて露光した後、現像を試みても全く現像できず商
品としえなくなる。通常、感光性樹脂には一般のラジカ
ル禁止剤であるペンゾキノン、pートルキノン、pーキ
シロキノン等のキ/ン化合物、ヒドロキノン、pーメト
キシフエノール、p−te比ープチルカテコール等のヒ
ドロキシ芳香族化合物、フェニル−Q−ナフチルアミン
、N.N′ージフエニル−p−フエニレンジアミン等の
アミン類が添加されている。If the three-dimensional crosslinking reaction during storage progresses further, even if you try to develop it after applying a negative film and exposing it to light, it will not be able to be developed at all and will no longer be commercially viable. Usually, photosensitive resins include general radical inhibitors such as quinone compounds such as penzoquinone, p-toluquinone, and p-xyloquinone, hydroxyaromatic compounds such as hydroquinone, p-methoxyphenol, and p-te-butylcatechol, and phenyl -Q-naphthylamine, N. Amines such as N'-diphenyl-p-phenylenediamine are added.
しかし、これらの化合物は感光性樹脂を長期間貯蔵する
ための貯蔵安定化能力が十分でないことを確認した。ま
た、活性光線の賭鮒によりいずれにせよ活性中間休が生
成し、それにより重合反応、架橋反応を誘起するのであ
るが、安定剤として添加した薬剤が光照射により感光性
樹脂が硬化して行く過程で活性中間体を捕獲し、光重合
反応を妨げたり、汚染性を有する安定剤を添加してなる
感光性樹脂では着色が激しく、光照射時の硬化速度が全
く低下することもある。これらの点に関し鋭意研究した
結果本発明を達成した。However, it was confirmed that these compounds do not have sufficient storage stabilization ability for long-term storage of photosensitive resins. In addition, in any case, active intermediates are generated by the exposure to active light, which induces polymerization and crosslinking reactions, but the chemicals added as stabilizers harden the photosensitive resin due to light irradiation. Photosensitive resins that contain stabilizers that capture active intermediates during the process, hinder the photopolymerization reaction, or have staining properties may be severely colored, and the curing speed upon irradiation with light may be completely reduced. As a result of intensive research on these points, the present invention has been achieved.
即ち本発明は、水系溶剤に可溶な重合体A、光重合性不
飽和単量体B、光増感剤Cおよび安定剤○からなる感光
性樹脂組成物において、安定剤Dが一般式(R,,R2
は炭素数1〜4のアルキル基またはフェニル基を表わす
。That is, the present invention provides a photosensitive resin composition comprising a polymer A soluble in an aqueous solvent, a photopolymerizable unsaturated monomer B, a photosensitizer C, and a stabilizer ○, in which the stabilizer D has the general formula ( R,,R2
represents an alkyl group having 1 to 4 carbon atoms or a phenyl group.
)(R3,R4は炭素数1〜4のアルキル基またはフェ
ニル基、M,は周期律表第1,0,町,風族第4,5周
期の多価金属と鉛、ビスマス、1は2〜4の整数を表わ
す。) (R3 and R4 are alkyl groups or phenyl groups having 1 to 4 carbon atoms, M is a polyvalent metal of periods 1 and 0 of the periodic table, Machi and Wind groups, periods 4 and 5, lead, bismuth, 1 is 2 Represents an integer from ~4.
)(M2はアンモニウム、周期律表第1〜畑族第3〜6
周期の金属、mは1〜4の整数を表わす。) (M2 is ammonium, periodic table 1~Hata group 3~6
Periodic metal, m represents an integer from 1 to 4.
)で表わされる(1)チウラム類、(0)ジチオカルバ
ミン酸塩類および(m)N−ニトロソフェニルヒドロキ
シルアミン塩類からなる群から選ばれた少なくとも1つ
の化合物であって、該安定剤が重合体Aに対して0.0
01〜5重童%を占めるように添加されていることを特
徴とする感光性樹脂成物である。) at least one compound selected from the group consisting of (1) thiurams, (0) dithiocarbamates, and (m) N-nitrosophenylhydroxylamine salts, wherein the stabilizer is added to polymer A. 0.0 against
It is a photosensitive resin composition characterized in that it is added in an amount of 0.01 to 5%.
本発鰯で使用される重合体Aは水もしくは希アルカリ水
溶液に可溶なものであればよく、例示すると本出願人が
先に出願した粘度平均分子量10000以上の1,2−
ポリプタジヱンの鰭水マレイン酸付加物やこの付加物を
水酸化ナトリウム、水酸化カリウム、水酸化リチウム等
で関毅した重合体(椿関昭51−1似903)、共役ジ
オレフィン系炭化水素EとQ,8ーニチレン性不飽和カ
ルボン酸Fとを必須とし、これにモノオレフィン系不飽
和化合物GとをE:10〜聡モル%、F:2〜90モル
%、G:0〜85モル%の割合で含む共重合体や核英重
合体中のQ, 3−エチレン性不飽和カルポン酸の一部
がアルカリ金屋m塩、アンモウム塩またはアミン塩であ
る共重合体(椿糠昭51‐50959,51一8518
0 52一11241)が好適に用いられる。The polymer A used in the present sardine may be any polymer that is soluble in water or a dilute alkali aqueous solution.
Maleic acid adducts of fin water of polyptadiene, polymers obtained by treating these adducts with sodium hydroxide, potassium hydroxide, lithium hydroxide, etc. (Tsubaki Sekisho 51-1 similar to 903), conjugated diolefin hydrocarbons E and Q,8 nitylenically unsaturated carboxylic acid F is essential, and a monoolefinically unsaturated compound G is added thereto in an amount of E: 10 to 90 mol%, F: 2 to 90 mol%, G: 0 to 85 mol%. A copolymer in which a portion of the Q, 3-ethylenically unsaturated carboxylic acid in the copolymer or nuclear polymer is an alkali Kanaya m salt, ammonium salt, or amine salt (Tsubaki Nuka Sho 51-50959, 51-8518
0 52-11241) is preferably used.
上記共控役ジオレフイン系炭化水素Eは1.3ーブタジ
ヱン、、イソブレン、クロロプレン、ジメチルプタジェ
ン等が好適で、Q,8ーェチレン性不飽和‐カルボン酸
Fとしてはアクリル酸、メタクリル酸等のモノカルボン
酸、マレイン酸、フマル酸、ィタコン酸等のジカルポン
酸、無水マレィン酸、無水ィタコン酸等の酸無水物、マ
レィン酸モノェチル、マレイン酸モノブチル、フマル酸
モノェチル、フマル酸モノプチル、ィタコン酸モノエチ
ル、イタコン酸モノブチル等のジカルボン酸のモノェス
テル類が好適であり、モノオレフイン系化合物としては
スチレン、Qーメチルスチレン、アクリロニトリル、メ
タクリロニトリル、アクリルアミド、メタクリルアミド
、−般式(式中R5は水素またはメチル基で&は炭素原
子1〜18のアルキル基を表わす。)であるアクリル酸
ェステルまたはメタクリル酸ェステル、ベンジルアクリ
レート、グリシジルアクリレート、シクロヘキシルアク
リレート、テトラヒドロフルフリルアクリレートまたは
それらのメタクリレート、マレィン酸ジメチル、マレイ
ン酸ジオクチル、イタコン酸ジメチル、イタコン酸ジオ
クチル等のけ 3ーェチレン性不飽和ジカルボン酸のジ
ェステル類、2ーヒドロキシェチルアクリレートまたは
メタクリレート等のヒドロキシアルキルアルコール類、
一般式(式中R7,R8は水素またはメチル基、R9は
炭素数1〜12アルキル基、nは1〜23の整数を表わ
す。The above-mentioned conjugated diolefin hydrocarbon E is preferably 1,3-butadiene, isobrene, chloroprene, dimethylptadiene, etc., and the Q,8-ethylenically unsaturated carboxylic acid F is a monocarboxylic acid such as acrylic acid, methacrylic acid, etc. Acid, dicarboxylic acid such as maleic acid, fumaric acid, itaconic acid, acid anhydride such as maleic anhydride, itaconic anhydride, monoethyl maleate, monobutyl maleate, monoethyl fumarate, monobutyl fumarate, monoethyl itaconate, itaconic acid Monoesters of dicarboxylic acids such as monobutyl are suitable, and examples of monoolefin compounds include styrene, Q-methylstyrene, acrylonitrile, methacrylonitrile, acrylamide, methacrylamide, and the general formula (wherein R5 is hydrogen or a methyl group and & is (representing an alkyl group having 1 to 18 carbon atoms), benzyl acrylate, glycidyl acrylate, cyclohexyl acrylate, tetrahydrofurfuryl acrylate or their methacrylates, dimethyl maleate, dioctyl maleate, itaconic acid Dimethyl, dioctyl itaconate, etc., esters of 3-ethylenically unsaturated dicarboxylic acids, hydroxyalkyl alcohols such as 2-hydroxyethyl acrylate or methacrylate,
General formula (wherein R7 and R8 are hydrogen or a methyl group, R9 is an alkyl group having 1 to 12 carbon atoms, and n is an integer of 1 to 23.
)であるアルコキシルアルキルアクリレートまたはタク
リレート、アルコキシポリアルキレングリコールアクリ
レートまたはメタクリレート等を好適に挙げることがで
きる。光重合性不飽和単豊体Bとしては上記のモノオレ
フイン系不飽和化合物の他にN,N′−メチレンピスア
クリルアミドまたはメタクリルアミド類、エチレングリ
コールジアクリレートまたはジメタクリレート、ポリア
ルキレングリール(アルキレングリール単位2〜23固
)のジアクリレートまたはジメタクリレート類、グリセ
リン、ベンタエリスリトール、トリメチロールアルカン
、テトラメチロールアルカン(アルカンとしてはエタン
、プロパン等)の多価アルコール類のジ−、トリー、テ
トラーアクリレートまたはジー、トリ−、テトラーメタ
クリレート類、2,2ービス(4ーメタクリロキシジエ
トキシフエニル)プロパン、2,2−ビス(4ーアクリ
ロキシジエトキシフエニル)プロパン、2,2−ビス(
4ーアクリロキシプロピロキシフエニル)プロパン、ジ
アリリデンベンタェリスリトール、東亜合成化学工業製
アロニツクスタィプモノマ−M‐5500,M−570
0 M−6100.M−6300.M−8030,M−
8060等を例示することができる。), alkoxylalkyl acrylate or tacrylate, alkoxypolyalkylene glycol acrylate or methacrylate, etc. can be preferably mentioned. In addition to the monoolefinic unsaturated compounds mentioned above, photopolymerizable unsaturated monomers B include N,N'-methylenepisacrylamide or methacrylamide, ethylene glycol diacrylate or dimethacrylate, polyalkylene glycol (alkylene glycol), etc. Di-, tri-, and tetra-acrylates of polyhydric alcohols such as diacrylates or dimethacrylates of reel units 2 to 23), glycerin, bentaerythritol, trimethylolalkanes, and tetramethylolalkanes (alkanes include ethane, propane, etc.) or di-, tri-, tetramethacrylates, 2,2-bis(4-methacryloxydiethoxyphenyl)propane, 2,2-bis(4-acryloxydiethoxyphenyl)propane, 2,2-bis(
4-Acryloxypropyloxyphenyl)propane, diarylidenebentaerythritol, Aronics type monomer M-5500, M-570 manufactured by Toagosei Chemical Industry Co., Ltd.
0 M-6100. M-6300. M-8030, M-
8060 etc. can be exemplified.
これら光重合性不飽和単量体は重合体Aに対して5〜2
0の重量%の範囲で使用され、好ましくは10〜10の
重量%の範囲で使用される。These photopolymerizable unsaturated monomers contain 5 to 2
It is used in a range of 0% by weight, preferably in a range of 10 to 10% by weight.
この範囲内であれば二種またはそれ以上を混合して使用
することができる。5重量%未満であると感光性樹脂層
を光山脇の射する際の硬化速度が遅く、製版時間が長く
なるばかりか十分なる硬化度を期待しえないため刷版の
機械的強度が低下する。Two or more types can be used in combination within this range. If it is less than 5% by weight, the curing speed when the photosensitive resin layer is exposed to light beams will be slow, and not only will the plate making time become longer, but a sufficient degree of curing cannot be expected, resulting in a decrease in the mechanical strength of the printing plate. .
200重量%を超えると感光性樹脂中の光重合性単量体
が多過ぎるため、光重合の体積収縮が大きく、刷版がネ
ガフィルムを忠実に再現しない匁点を伴う。If it exceeds 200% by weight, the photopolymerizable monomer in the photosensitive resin is too large, resulting in large volume shrinkage during photopolymerization and a momme point at which the printing plate does not faithfully reproduce a negative film.
本発明で使用される光増感剤Cとしては、通常光反応開
始剤として用いられる例えばジアセチル、ベンジル等の
Qージケトン類、ベンゾイン、ピバロィン等のアシロィ
ン類、ベンゾインメチルエーテル、ベンゾインエチルエ
ーテル、ベンゾイソィソプロピルェーテル等のアシロイ
ンェーテル類、アントラキ/ン、1,4ーナフトキノン
等の多核キノン類が挙げられる。Examples of the photosensitizer C used in the present invention include Q-diketones such as diacetyl and benzyl, which are commonly used as photoreaction initiators, acyloins such as benzoin and pivaloin, benzoin methyl ether, benzoin ethyl ether, and benzoin ethyl ether. Examples include acyloin ethers such as isopropyl ether, and polynuclear quinones such as anthraquinone and 1,4 naphthoquinone.
光増感剤の添加量は重合体Aに対して0.1〜10重量
%であり、好適には1〜5重量%である。The amount of the photosensitizer added is 0.1 to 10% by weight, preferably 1 to 5% by weight, based on the weight of the polymer A.
0.1重量%未満であると光硬化速度を十分なる値にし
えず、露光時間を長くしなければならないばかりか、架
橋密度が低くなるために刷版の機械的強度が低下する。If it is less than 0.1% by weight, the photocuring rate cannot be achieved to a sufficient value, and not only the exposure time must be increased, but also the crosslinking density becomes low, resulting in a decrease in the mechanical strength of the printing plate.
1の重量%を超えると添加した総ての光増感剤が光硬化
反応に寄与しないので不経済であるばかりか、未反応光
増感剤が印刷中インキビヒクルによって抽出され刷版の
機械的強度に悪影響を及ぼすことになる。本発明で使用
される安定剤Dは一般式(1)(R,,R2は炭素数1
〜4のアルカリ基またはフェニ基を表わす。If the amount exceeds 1% by weight, not only is it uneconomical because all the added photosensitizer does not contribute to the photocuring reaction, but also the unreacted photosensitizer is extracted by the ink vehicle during printing, causing mechanical damage to the printing plate. This will have a negative effect on strength. The stabilizer D used in the present invention has the general formula (1) (R, , R2 is carbon number 1
~4 alkali group or phenyl group.
)で表わされるチウラム類で例示すれば、テトラメチル
チウラムモノスルフイド、テトラエチルチウラムモノス
ルフイド、テトラ一nーブチルチウラムモノスルフイド
、N,N′ージメチルーN,N′−ジフェニルチウラム
モノスルフィド等が挙げられ、一般式(D)(R3,R
4は炭素数1〜4のアルキル基またはフェニル基、M.
は周期律表第1,0,W,虹族第4,5周期の多価金属
と鉛、ビスマス、1は2〜4の整数を表わす。Examples of thiurams represented by ) include tetramethylthiuram monosulfide, tetraethylthiuram monosulfide, tetra-n-butylthiuram monosulfide, and N,N'-dimethyl-N,N'-diphenylthiuram monosulfide. Examples include sulfide, etc., and general formula (D) (R3, R
4 is an alkyl group having 1 to 4 carbon atoms or a phenyl group, M.
represents polyvalent metals of periods 1, 0 and W of the periodic table, periods 4 and 5 of the rainbow group, lead and bismuth, and 1 represents an integer from 2 to 4.
)で表わされるジチオカルバミン酸塩で例示すれば、ジ
メ‐チルジチオカルバミン酸亜鉛、ジェチルジチオカル
バミン酸亜鉛、シブチルジチオカルバミン酸亜鉛、エチ
ル・フェニルジチオカルバミン酸亜鉛、ジメチルジチオ
カルバミン酸銅、ジヱチルジチオカルバミン酸銅、ジメ
チルジチオカルバミン酸カドミウム、ジェチルジチオカ
ルバミン酸カドミウム、ジメチルジチオカルバミン酸鉛
、ジェチルジチオカルバミン酸鉛、ジメチルジチオカル
バミン酸ビスマス、ジェチルジチオカルバミン酸ビスマ
ス、ジメチルジチオカルバミン酸セレン、ジェチルジチ
オカルバミン酸セレン、ジメチルジチオカルバミン酸テ
ルル、ジェチルジチオカルバミン酸テルル、ジメチルジ
チオカルバミン酸鉄、ジェチルジチオカルバミン酸鉄、
ジメチルジチオカルバミン酸ニッケル、ジェチルジチオ
カルバミンニッケル、ジブチルジチオカルバミソ酸ニッ
ケル等が挙げられ、一般式(m)(M2はアンモニウム
、周期律表第1〜風族第3〜6周期の金属、mは1〜4
の整数を表わす。Examples of the dithiocarbamates represented by ) include zinc dimethyldithiocarbamate, zinc dietyldithiocarbamate, zinc sibutyldithiocarbamate, zinc ethyl phenyldithiocarbamate, copper dimethyldithiocarbamate, copper diethyldithiocarbamate, Cadmium dimethyldithiocarbamate, cadmium dimethyldithiocarbamate, lead dimethyldithiocarbamate, lead dimethyldithiocarbamate, bismuth dimethyldithiocarbamate, bismuth dimethyldithiocarbamate, selenium dimethyldithiocarbamate, selenium dimethyldithiocarbamate, tellurium dimethyldithiocarbamate, Tellurium tyldithiocarbamate, iron dimethyldithiocarbamate, iron dimethyldithiocarbamate,
Examples include nickel dimethyldithiocarbamate, nickel dimethyldithiocarbamate, nickel dibutyldithiocarbamate, and the general formula (m) (M2 is ammonium, a metal from period 1 to wind group 3 to 6 of the periodic table, m is 1 ~4
represents an integer.
)で表わされるN‐ニトロソフェニルヒドロキシルアミ
ン塩類で例示すれば、アンモニウム−N−ニトロソフエ
ニルヒドロキシルアミン、ナトリウム一Nーニトロソフ
エニルヒドロキシルアミン、マグネシウム−Nーニトロ
ソフエニルヒドロキシルアミン、アルミニウム一Nーニ
トロソフエニルヒドロキシルアミン、スズーN−ニトロ
ソフエニルヒドロキジルアミン、バナジウム一Nーニト
ロソフエニルヒドロキシルアミン、クロム一Nーニトロ
ソフエニルヒドロキシルアミン、マンガン一N−ニトロ
ソフェニルヒドロキシルアミン、鉄‐Nーニトロソフエ
ニルヒドロキシルアミン、ニッケル一Nーニトロソフェ
ニルヒドロキシルアミン等が挙げられる。) Examples of the N-nitrosophenylhydroxylamine salts represented by are ammonium-N-nitrosophenylhydroxylamine, sodium-N-nitrosophenylhydroxylamine, magnesium-N-nitrosophenylhydroxylamine, and aluminum-N-nitrosophenylhydroxylamine. Nitrosophenylhydroxylamine, tin-N-nitrosophenylhydroxylamine, vanadium-N-nitrosophenylhydroxylamine, chromium-N-nitrosophenylhydroxylamine, manganese-N-nitrosophenylhydroxylamine, iron-N-nitro Examples include sophenylhydroxylamine, nickel-N nitrosophenylhydroxylamine, and the like.
これらの安定剤の添加量は重合体Aに対して0.001
〜5重量%で好ましくは0.01〜2重量%であり、こ
の範囲内であれば同族化合物の中で数種類混合してもよ
いしまた(1)〜(m)の安定剤の中で数種類混合して
もさしつかえない。The amount of these stabilizers added is 0.001 to Polymer A.
-5% by weight, preferably 0.01-2% by weight, and within this range, several types of homologous compounds may be mixed, or several types of stabilizers (1) to (m) may be mixed. It is okay to mix them.
安定剤の添加量が0.皿1重量%未満であると感光性樹
脂に十分なる貯蔵安定化効果を与えることができず、5
重量%を超えると感光性樹脂層に十分安定剤が溶解され
ず、感度を低下せるばかりでなく刷版の機械的強度を低
下させるなどの弊害が顕著となる。The amount of stabilizer added is 0. If the amount is less than 1% by weight, it will not be possible to provide a sufficient storage stabilizing effect to the photosensitive resin;
If the amount exceeds % by weight, the stabilizer will not be sufficiently dissolved in the photosensitive resin layer, resulting in significant negative effects such as a decrease in sensitivity as well as a decrease in the mechanical strength of the printing plate.
上述した光重合性不飽和単童体の市販品の中には通常p
−メトキシフェノール等の熱重合禁止剤が少量添加され
ているが、本発明に用いるためにはこれら少量の熱重合
禁止剤は貯蔵安定性、感度等に全く影響しないので感光
性樹脂を製造するに際して、熱重合禁止剤を光重合性不
飽和単量体の中から除去せずにそのまま使用することが
できる。本発明による液体状感光性樹脂は、重合体Aを
合成し終えた溶液中に光重合性不飽和単量体、光増感剤
、安定剤を添加して、十分混合した後に重合時使用した
溶媒を除去するか、または予じめ重合溶媒が除去された
重合体に光重合性不飽和単量体、光増感剤、安定剤を均
一に混合するかして製造され、一方、固体状感光性樹脂
は、重合体溶液に各薬剤を添加し均一溶液とした後支持
体上にキャストするか、該均一溶液を加温減圧して溶媒
を除き、クラム状もしくはフレーク状になった感光性樹
脂組成物を一定厚のスベーサーを介して支持体上に加熱
プレス成形して製造されるのが通常である。Among the commercially available photopolymerizable unsaturated monomers mentioned above, p
- Although a small amount of thermal polymerization inhibitor such as methoxyphenol is added, in order to use it in the present invention, this small amount of thermal polymerization inhibitor does not affect storage stability, sensitivity, etc. at all, so it is necessary to , the thermal polymerization inhibitor can be used as it is without being removed from the photopolymerizable unsaturated monomer. The liquid photosensitive resin according to the present invention is prepared by adding a photopolymerizable unsaturated monomer, a photosensitizer, and a stabilizer to a solution in which Polymer A has been synthesized, and mixing thoroughly before using it during polymerization. It is produced by removing the solvent or uniformly mixing a photopolymerizable unsaturated monomer, a photosensitizer, and a stabilizer with a polymer from which the polymerization solvent has been removed in advance. The photosensitive resin is produced by adding each drug to a polymer solution to make a homogeneous solution, and then casting it on a support, or by heating and depressurizing the homogeneous solution to remove the solvent. It is usually manufactured by hot press molding a resin composition onto a support through a spacer of a constant thickness.
前述したように、液体状感光性樹脂を貯蔵すると、貯蔵
安定性が良い場合には組成物の粘度も変化せず、ゲルの
発生もないが、貯蔵安定性が悪い場合には粘度変化が顕
著で且つ部分的にゲルが発生し、さらに貯蔵すると遂に
全体が固化する状態に達する。As mentioned above, when storing a liquid photosensitive resin, if the storage stability is good, the viscosity of the composition will not change and no gel will occur, but if the storage stability is poor, the viscosity will change significantly. A gel is generated partially, and when stored further, the entire product finally solidifies.
したがって、貯蔵安定性を調べるためにY液体感光性樹
脂を製造した直後と一定期間貯蔵後の粘度をB型回転粘
度計を使用し30『0で測定して下式に従って粘度上昇
度を求め、貯蔵安定性の目安とした。半占度上服=ヱテ
ヱ
但し V,=製造直後の液体状感光性樹脂の粘度V2=
一定期間貯蔵後の液体状感光性樹
脂の粘度
を表わす。Therefore, in order to investigate the storage stability, the viscosity of the Y liquid photosensitive resin immediately after production and after storage for a certain period of time was measured using a B-type rotational viscometer at 30'0, and the degree of viscosity increase was determined according to the formula below. This was used as a guideline for storage stability. Half-occupancy jacket=V,=Viscosity of liquid photosensitive resin immediately after production V2=
It represents the viscosity of liquid photosensitive resin after storage for a certain period of time.
また、固体状感光性樹脂の場合は感光性樹脂原版を製造
直後と一定期間貯蔵した後溶媒で溶解させ不溶部艮0ち
ゲルの重量%(ゲル率)を次式で求め貯蔵安定性の目安
とした。In addition, in the case of solid photosensitive resin, the photosensitive resin original plate is dissolved in a solvent immediately after production and after being stored for a certain period of time, and the weight percent of the gel (gel percentage) with no insoluble area is calculated using the following formula, which is a guideline for storage stability. And so.
秋率=ご忌とX・oo 但し、Wo=試料重量(の W,溶解した試料の重量(g)を表わ す。Autumn rate = death and X・oo However, Wo=sample weight (of W represents the weight (g) of the dissolved sample vinegar.
本発明の感光性樹脂組成物は貯蔵安定性に優れているば
かりでなく、感度も低下しないので、品質が長期間に亘
つて一定した優れた印刷用感光性材料を提供することが
できる。The photosensitive resin composition of the present invention not only has excellent storage stability, but also has no decrease in sensitivity, making it possible to provide an excellent photosensitive material for printing whose quality remains constant over a long period of time.
また、本発明の感光性樹脂組成物は印刷用感光性材料を
提供できるばかりでなく、ネームプレート用、プリント
配線用、ディスプレイ用、光接着剤用の感光性材料とし
ても広く利用できる。次に実施例を挙げて本発明を更に
具体的に説明するが、本発明はその要旨を超えない限り
以下の実施例に何ら制約されるものではない。Furthermore, the photosensitive resin composition of the present invention can not only provide a photosensitive material for printing, but also be widely used as a photosensitive material for name plates, printed wiring, displays, and photoadhesives. EXAMPLES Next, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to the following Examples as long as the gist thereof is not exceeded.
実施例 1
メタノールを溶媒とし2,2′−アゾビスィソブチロニ
トリルを触媒としてラジカル重合法により合成したブタ
ジェン/メタクリル酸メチルノァクリル酸=54/28
/18(モル比)共重合体の61重量%メタノール溶液
114.8夕を300の【セパラブルフラスコに入れそ
の中にテトラデカヱチレングリコ−ルジメタクリレート
49夕、ベンゾインイソプロピルエーテル1.4夕、テ
トラメチルチウラムモノスルフィド0.35夕を添加し
均一溶液となるまで蝿拝した。Example 1 Butadiene/methyl noacrylic acid methacrylate synthesized by radical polymerization using methanol as a solvent and 2,2'-azobisisobutyronitrile as a catalyst = 54/28
/18 (molar ratio) 114.8 methanol solution of 61% by weight copolymer was placed in a 300 [separable flask], and 49 molar of tetradecaethylene glycol dimethacrylate, 1.4 molar of benzoin isopropyl ether, 0.35 ml of tetramethylthiuram monosulfide was added and stirred until a homogeneous solution was obtained.
約40℃に制御されているウオーターバスにセパラプル
フラスコを浸し、縄拝しながら溶媒メタノールを完全に
留去すると液体状感光性樹脂組成物が作製できた。ポリ
エステルフィルム(8×8肌厚さ100仏)上に該組成
物を約9夕載せ、厚さ1.5肋のスベーサーを介して、
厚さ100ムのポリエステルフィルムを組成物上に置き
このポリエステルフィルムの上にさらに厚さ5肋のガラ
ス板を載せて圧着することにより組成物を1.5肋厚の
層とした。A liquid photosensitive resin composition was prepared by immersing a separate flask in a water bath controlled at about 40° C. and completely distilling off the solvent methanol while shaking the flask. The composition was placed on a polyester film (8 x 8 skin thickness 100 mm) for about 9 days, and passed through a 1.5 rib thick substrate.
A polyester film with a thickness of 100 µm was placed on the composition, and a glass plate with a thickness of 5 ribs was further placed on top of the polyester film and pressed to form a layer of the composition with a thickness of 1.5 ribs.
ガラス板の上面60狐の位置より250W超高圧水銀灯
の紫外線を5秒間照射した後、ガラス板、上部ポリエス
テルフィルムを外すと上部ポリエステルには光硬化した
感光性樹脂層が、下部ポリエステルには未硬化の粘鋼体
が残存した。硬化層の付いた上部ポリエステルフィルム
に0.5%水酸化ナトリウム水溶液を1分間スプレーし
て完全に未硬化部を除き、水洗後80qoでIQ分間乾
燥した。硬化層の厚みを測定したところ310山であっ
た。したがって、当該組成物の光陵化度は62仏/se
cである。該組成物を容量looの上の透明なガラス製
サンプルビンに入れて、3000で粘度を測定したとこ
ろ2500比psであった。感光性樹脂組成物の入った
サンプルピンを50瓜m以下の活性光線をカットした蛍
光灯灯下で30qoに制御された恒温槽に入れて貯蔵安
定性を調べた。6ケ月貯蔵した後、粘度を測定したとこ
ろ2500比psとなり全く変化がなく極めて貯蔵安定
性が高いことがわかった。After irradiating the glass plate with ultraviolet rays from a 250W ultra-high pressure mercury lamp for 5 seconds from the top surface of the glass plate, the glass plate and the upper polyester film are removed.The upper polyester is covered with a photocured photosensitive resin layer, while the lower polyester is uncured. A viscous steel body remained. The upper polyester film with the cured layer was sprayed with a 0.5% aqueous sodium hydroxide solution for 1 minute to completely remove uncured areas, washed with water, and then dried for IQ minutes at 80 qo. When the thickness of the hardened layer was measured, it was found to be 310 peaks. Therefore, the degree of phosphorescence of the composition is 62 f/s
It is c. The composition was placed in a clear glass sample bottle above the capacity loo, and the viscosity was measured at 3000 ps and found to be 2500 ps. The sample pin containing the photosensitive resin composition was placed in a constant temperature bath controlled at 30 qo under a fluorescent lamp that cut off active rays of 50 m or less to examine storage stability. After storage for 6 months, the viscosity was measured and found to be 2500 ps, with no change at all, indicating extremely high storage stability.
また、上述した光硬化速度の値も62r/secと全く
変化なく感度の低下が認められなかった。6カ月間貯蔵
した感光性樹脂組成物約5夕を砂自立したアルミニウム
板(8×8仇厚さ300ム)に載せ、厚さ0.8肌のス
ベーサーで組成物を囲んだ。Further, the above-mentioned photocuring speed value was 62 r/sec, with no change at all, and no decrease in sensitivity was observed. Approximately 5 days of the photosensitive resin composition, which had been stored for 6 months, was placed on a sand-supported aluminum plate (8 x 8 squares, 300 mm thick), and the composition was surrounded by a base plate with a thickness of 0.8 mm.
一方減圧にできるように工夫したガラス板にネガフィル
ムを置き、20山の厚さを持つ続品性1,2−ポリブタ
ジェンフィルムで覆い減圧にしてネガフィルムをガラス
面に密着した。このガラス板のネガフィルム側を先のア
ルミニウム支持体上の組成物に圧着して、0.8側の厚
みを持つ感光層を形成しガラス板の上面60伽の距離か
ら250W超高圧水銀灯の紫外線を1分間照射した。未
照射部を0.5%水酸化ナトリウム水溶液で1分間スプ
レーして除去すると原画に誠に忠実なしリーフが作製で
きた。この刷版を使い活版インキ、スミでも印刷すると
インキ転移性の優れた印刷物が得られた。したがって、
本感光性樹脂組成物は6カ月間3ぴ0で貯蔵しても極め
て安定性が高く、品質に全く変化のないことがわかった
。比較例 1
安定剤テトラメチルチウラムモノスルフィドをヒドロキ
ノンに替えた他は全く実施例1と同様にして液体状感光
性樹脂組成物を作製した。On the other hand, a negative film was placed on a glass plate designed to be able to be subjected to reduced pressure, and covered with a durable 1,2-polybutadiene film having a thickness of 20 peaks, the negative film was brought into close contact with the glass surface under reduced pressure. The negative film side of this glass plate was pressure-bonded to the composition on the aluminum support mentioned above to form a photosensitive layer having a thickness of 0.8. was irradiated for 1 minute. When the unirradiated areas were removed by spraying with a 0.5% aqueous sodium hydroxide solution for 1 minute, a leaf that was truly faithful to the original drawing could be produced. When printing with letterpress ink and ink using this printing plate, printed matter with excellent ink transfer properties was obtained. therefore,
It was found that this photosensitive resin composition has extremely high stability even when stored at 300° C. for 6 months, with no change in quality at all. Comparative Example 1 A liquid photosensitive resin composition was prepared in the same manner as in Example 1 except that the stabilizer tetramethylthiuram monosulfide was replaced with hydroquinone.
この組成物の粘度は2700比psであり、光陵化速度
は59〆/secで製造直後の性能は実施例1の組成物
のそれと殆んど差はなかった。,実施例1と全く同様に
貯蔵安定性を調べたところ、サンプルビンの底部にゲル
が堆積し、三次元架橋反応が進行したとことを示すと同
時に粘度が64800比psまで上昇し粘度上昇度は2
3となった。このもので製版を試みたが、粘度が高過ぎ
るため版厚を一定にできず、且つ現像性が悪化して満足
な刷版の作製は困難であった。したがって、ヒドロキノ
ンの貯蔵安定化効果はテトラメチルチウラムモノスルフ
イドのそれよりはるかに弱く、ヒドロキノンを含む組成
物を安定に貯蔵するためにはさりこ低温で貯蔵すること
が必要であった。実施例 2〜11
テトラメチルチウラムモノスルフィドを表1に示す安定
剤に替えた他は全く実施例1と同様にして液体状感光性
樹脂組成物を作製し、粘度上昇度、貯蔵前後の光硬化速
度を測定し表1の結果を得た。The viscosity of this composition was 2,700 specific ps, the optical rate was 59/sec, and the performance immediately after production was almost the same as that of the composition of Example 1. When the storage stability was investigated in the same manner as in Example 1, gel was deposited at the bottom of the sample bottle, indicating that the three-dimensional crosslinking reaction had proceeded, and at the same time the viscosity increased to 64,800 specific ps, indicating the degree of viscosity increase. is 2
It became 3. An attempt was made to make a plate using this material, but the viscosity was too high, making it impossible to maintain a constant plate thickness, and the developability deteriorated, making it difficult to produce a satisfactory printing plate. Therefore, the storage stabilizing effect of hydroquinone is much weaker than that of tetramethylthiuram monosulfide, and in order to stably store a composition containing hydroquinone, it has been necessary to store it at a very low temperature. Examples 2 to 11 Liquid photosensitive resin compositions were prepared in the same manner as in Example 1 except that tetramethylthiuram monosulfide was replaced with the stabilizer shown in Table 1, and the viscosity increase rate and photocuring before and after storage were determined. The speed was measured and the results shown in Table 1 were obtained.
表 1
実施例1で用いたテトラメチルチウラムより若干貯蔵安
定化効果が低下するが、この程度の粘度上昇度であれば
液体状感光性樹脂としての使用は全く問題がなく、これ
らの実施例の感光性樹脂組成物から製版したところ感度
、現像性よく刷版が作製され、この刷版から誠に良好な
印刷物が得られた。Table 1 Although the storage stabilizing effect is slightly lower than that of the tetramethylthiuram used in Example 1, there is no problem in using it as a liquid photosensitive resin at this level of viscosity increase. When a plate was made from the photosensitive resin composition, a printing plate with good sensitivity and developability was produced, and very good printed matter was obtained from this printing plate.
実施例 12〜10比較例 2,3
テトラメチルチウラムモノスルフィドの添加量を表2の
ように変えて実施例1と全く同様にして液体状感光性樹
脂組成物を作製し、粘度上昇、貯蔵前後の光硬化速度を
測定し表2の結果を得た。Examples 12 to 10 Comparative Examples 2, 3 A liquid photosensitive resin composition was prepared in exactly the same manner as in Example 1 except that the amount of tetramethylthiuram monosulfide added was changed as shown in Table 2, and the viscosity increased, before and after storage. The photocuring speed was measured and the results shown in Table 2 were obtained.
表 2実施例に示した感光性樹脂組成物はいずれも貯
蔵安定性がよく、6カ月貯蔵後の感光性樹脂組成物から
十分満足しうる版と印刷物の作製が可能であった。All of the photosensitive resin compositions shown in Table 2 Examples had good storage stability, and it was possible to produce sufficiently satisfactory plates and printed matter from the photosensitive resin compositions after storage for 6 months.
テトラメチルチウラムモノスルフイドの添加量が少ない
比較例2に示した組成物の貯蔵安定性は悪く、6力月貯
すると粘度上昇度が大きくなり、このものから十分な刷
版を作製することは困難であった。テトラメチルチウラ
ムモノスルフィドの添加量を増加した比較例3の組成物
は貯蔵安定化効果が高かったが、光硬化速度が遅く、こ
れからも十分実用化しうる刷版の作製は困難であった。The storage stability of the composition shown in Comparative Example 2, in which the amount of tetramethylthiuram monosulfide added was small, was poor, and the degree of increase in viscosity increased after storage for 6 months, making it difficult to prepare a sufficient printing plate from this composition. was difficult. The composition of Comparative Example 3 in which the added amount of tetramethylthiuram monosulfide was increased had a high storage stabilizing effect, but the photocuring speed was slow, making it difficult to produce a printing plate that could be put to practical use in the future.
実施例 17〜19
テトラメチルチウラムモノスルフィドを表3の安定剤に
、テトラデカェチレングリコールジメタクリレートを2
,2ービス(4−アクリロキシジエトキシフエニル)プ
ロパン/ヱトキシエチルメタクリレート=4/1(重量
)に替えた他は全く実施例1と同様にして液体状感光性
樹脂組成物を作製し、粘度上昇度、貯蔵前後の光硬化速
度を測定し表3の結果を得た。Examples 17-19 Tetramethylthiuram monosulfide was used as the stabilizer in Table 3, and tetradecaethylene glycol dimethacrylate was used as the stabilizer in Table 3.
, 2-bis(4-acryloxydiethoxyphenyl)propane/ethoxyethyl methacrylate = 4/1 (weight) except that a liquid photosensitive resin composition was prepared in the same manner as in Example 1, The degree of viscosity increase and the photocuring speed before and after storage were measured, and the results shown in Table 3 were obtained.
表 3
いずれも貯蔵安定性には全く問題なく、光硬化速度も貯
蔵前後でほとんど変化せず、これらの安定剤が有効であ
ることがわかった。Table 3 There was no problem with storage stability in any case, and the photocuring rate hardly changed before and after storage, indicating that these stabilizers are effective.
また、表3に示す実施例の感光性樹脂組成物からネガフ
ィルムを介さず全面露光して厚さ3側のべタ版を作製し
た。このべタ版の引張り強度をJISK6301に従っ
て測定したところ、表4の結果となった。表 4
引張り強度(&イ協)
実施例17 90
18 87
19 140
N−ニトロソフェニルヒドロキシルアミン塩類にテトラ
メチルチウラムモノスルフイドのごとき安定剤を添加す
ることで版の引張り強度を増加しうろこともわかった。Furthermore, a solid plate having a thickness of 3 was prepared from the photosensitive resin composition of the example shown in Table 3 by exposing the entire surface to light without using a negative film. The tensile strength of this solid plate was measured according to JIS K6301, and the results are shown in Table 4. Table 4 Tensile strength (&I) Example 17 90 18 87 19 140 The tensile strength of the plate can be increased by adding a stabilizer such as tetramethylthiuram monosulfide to N-nitrosophenylhydroxylamine salts. Understood.
実施例17〜19の感光性樹脂組成物の貯蔵後のものか
ら良好な刷版とインキ路移性の優れた印刷物が作製され
た。実施例 20
メタノールを溶媒とし、2,2′−アゾビスィソブチロ
ニトリルを触媒として合成したブタジェン/アクリロニ
トリル/メタクリル酸=45/33/22(モル比)共
重合体の5の重量%メタノール溶液100夕を300の
上セパラブルフラスコに入れ、水酸化IJチウム5夕を
含む水50の【を蝿辞しながら加えて共重合体に含まれ
るカルボキシル基の70%を中和した。Good printing plates and printed matter with excellent ink transfer properties were produced from the photosensitive resin compositions of Examples 17 to 19 after storage. Example 20 5% by weight methanol solution of butadiene/acrylonitrile/methacrylic acid = 45/33/22 (mole ratio) copolymer synthesized using methanol as a solvent and 2,2'-azobisisobutyronitrile as a catalyst. 100% of the copolymer was put into a 300ml upper separable flask, and 50ml of water containing 50% of IJ hydroxide was added thereto while stirring to neutralize 70% of the carboxyl groups contained in the copolymer.
次いで、ノナエチレングリコールジメタクリレート17
.5夕、2ーヒドロキシエチルメタクリレート7.5夕
、ベンゾインイソプロピルエーテル1夕、ジェチルカル
バミン酸亜鉛0.25夕を加え完全に混合するまで十分
に額拝した。40午0のウオータバスにセバラブルフラ
スコを浸し、減圧にてメタノール、水を除去すると固体
状感光性樹脂組成物が得られた。Next, nonaethylene glycol dimethacrylate 17
.. After 5 minutes, 7.5 minutes of 2-hydroxyethyl methacrylate, 1 night of benzoin isopropyl ether, and 0.25 minutes of zinc diethylcarbamate were added and thoroughly mixed until completely mixed. The separable flask was immersed in a water bath at 40:00, and methanol and water were removed under reduced pressure to obtain a solid photosensitive resin composition.
砂目立てアルミニウム板(8×8肌厚さ300一)上に
約3夕の該組成物を載せ厚さ0.5肌のスベーサーを介
して100℃、100k9/洲の条件で3鼠砂間プレス
成形して固体状感光性樹脂原版を作製した。原版の樹脂
層を剥離し、その2.0夕を25の‘のニ角フラスコに
入れ〆タノール/水=50/50(重量比)混合溶媒を
18タ添加してよく鷹拝し、室温で2岬馬間放置した後
、さらによく縄梓して孔径1仏のミリポアフィルターで
炉過し炉液の固体舎量を測定したところ、1の重量%の
値が得られ原版の感光性樹脂組成物にはゲル分がないこ
とを示した。The composition was placed on a grained aluminum plate (8 x 8, 300 mm thick) for about 3 days and pressed through a 0.5 mm thick surfacer at 100°C and 100 k9/sha for 3 days. A solid photosensitive resin original plate was produced by molding. Peel off the resin layer of the original plate, put 2.0 liters of it into a 25-inch square flask, add 18 liters of a mixed solvent of 50/50 (weight ratio) of ethanol/water, mix well, and let it stand at room temperature. After leaving it for 2 minutes, it was further filtered and filtered through a Millipore filter with a pore diameter of 1 mm.The amount of solids in the furnace liquid was measured, and a value of 1% by weight was obtained, indicating the composition of the photosensitive resin of the original plate. The material showed no gel content.
この原版をガラス製容器に入れ、雰囲気を30qoにコ
ントロールして50仇m以下の光をカットした室内に置
き、6カ月間貯蔵した。貯蔵後、上記したように樹脂層
の溶解テストを行なったところ、やはり1の重量%とな
って、メタノール/水の混合溶媒に完全に溶解し、ゲル
生成がなく貯蔵安定性にすぐれていることがわかった。
貯蔵前後の原版にネガフィルムを減圧密着させて、原版
の上部60肌の距離より250W超高圧水銀灯の紫外線
を1分間照射し、40qoの温水でスプレー現像すると
原画に全く忠実な刷版が得られ、貯蔵前後の版に差はな
く、感度低下のないことがわかった。比較例 4
ジェチルカルバミン酸亜鉛の替りに通常熱重合防止剤と
して使用されているp−メトキシフェノールを用いた他
は全く実施例20と同様にして固体状感光性樹脂原版を
作製した。This original plate was placed in a glass container, placed in a room where the atmosphere was controlled to 30 qo and light of 50 m or less was cut off, and stored for 6 months. After storage, the dissolution test of the resin layer was performed as described above, and the result was 1% by weight, indicating that it was completely dissolved in the methanol/water mixed solvent and had excellent storage stability without gel formation. I understand.
By attaching a negative film to the original plate under reduced pressure before and after storage, irradiating it with ultraviolet rays from a 250W ultra-high pressure mercury lamp for 1 minute from a distance of 60 skins above the original plate, and spray developing it with 40qo warm water, a printing plate that is completely faithful to the original image can be obtained. It was found that there was no difference between the plates before and after storage, and there was no decrease in sensitivity. Comparative Example 4 A solid photosensitive resin original plate was prepared in the same manner as in Example 20, except that p-methoxyphenol, which is commonly used as a thermal polymerization inhibitor, was used instead of zinc diethylcarbamate.
貯蔵前の原版の樹脂層は完全メタノール/水混合溶媒に
溶解したが、6カ月貯蔵後の樹脂層の溶解テストではミ
リポア−フィルターで炉過する以前に既にメタノール/
水温合溶媒不溶部を認められ、ゲル率を測定したところ
、原版の65重量%がゲル化していることがわかった。
またこの原版を試みたが、現像性が悪く満足できる刷版
の作製は困難であった。比較例 5〜7テトラメチルチ
ウラムモノスルフイドを表5に示す安定剤に替えた他は
全く実施例1と同様にして液体感光性樹脂組成物を作製
し、粘度上昇度、貯蔵前後の光硬化速度を測定し表5の
結果を得た。The resin layer of the original plate before storage was completely dissolved in the methanol/water mixed solvent, but in the dissolution test of the resin layer after 6 months of storage, it was already dissolved in methanol/water before being filtered through the Millipore filter.
An insoluble area in the mixed solvent at water temperature was observed, and when the gel rate was measured, it was found that 65% by weight of the original plate had been gelled.
Although attempts were made to use this original plate, it was difficult to produce a satisfactory printing plate due to its poor developability. Comparative Examples 5 to 7 A liquid photosensitive resin composition was prepared in the same manner as in Example 1 except that tetramethylthiuram monosulfide was replaced with the stabilizer shown in Table 5. The curing speed was measured and the results shown in Table 5 were obtained.
.表 5
光硬化速度
粘 度 〃/sec
比較例 安 定 剤 上昇度 貯蔵前 貯蔵後5
2ご無上に念 48 51トリメチルベン
6 ジルアンモニウ 36 57ムクロリド
7 ジメチルニトロ 45 65ソアミン
いずれの組成物とも粘度上昇度が高く製版不能であり、
表5に示す各安定剤は安定化効果を持たないことがわか
った。.. Table 5 Photo-curing rate viscosity 〃/sec Comparative example Stabilizer Rise rate Before storage After storage 5
2 We apologize for the inconvenience. 48 51 Trimethylben 6 Dilammonium 36 57 Muchloride 7 Dimethylnitro 45 65 Soamine All compositions have a high viscosity increase and cannot be used for plate making.
It was found that each of the stabilizers shown in Table 5 had no stabilizing effect.
Claims (1)
B、光増感剤Cおよび安定剤Dからなる感光性樹脂組成
物において、安定剤Dが一般式▲数式、化学式、表等が
あります▼(R_1,R_2は炭素数1〜4のアルキル
基またはフエニル基を表わす。 )▲数式、化学式、表等があります▼ (R_3,R_4は炭素数1〜4のアルキル基またはフ
エニル基、M_1は周期律表第I,II,VI,VIII族第4
,5周期の多価金属と鉛、ビスマス、1は2〜4の整数
を表わす。 )▲数式、化学式、表等があります▼ (M_2はアンモニウム、周期律表第1〜VIII族第3〜
6周期の金属、mは1〜4の整数を表わす。 )で表わされる(I)チウラム類、(II)ジチオカルバ
ミン酸塩類および(III)N−ニトロソフエニルヒドロ
キシルアミン塩類からなる群から選ばれた少なくとも1
つの化合物であつて、該安定剤が重合体Aに対して0.
001〜5重量%を占めるように添加されていることを
特徴とする感光性樹脂組成物。[Claims] 1. In a photosensitive resin composition comprising a polymer A soluble in an aqueous solvent, a photopolymerizable unsaturated monomer B, a photosensitizer C and a stabilizer D, the stabilizer D is generally Formulas ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (R_1 and R_2 represent an alkyl group or phenyl group with 1 to 4 carbon atoms.) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (R_3 and R_4 are 4 alkyl group or phenyl group, M_1 is group I, II, VI, VIII group 4 of the periodic table
, 5 periods of polyvalent metals and lead, bismuth, 1 represents an integer from 2 to 4. ) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (M_2 is ammonium, periodic table 1 ~ VIII group 3 ~
6 periods of metal, m represents an integer from 1 to 4. ) at least one selected from the group consisting of (I) thiurams, (II) dithiocarbamates, and (III) N-nitrosophenylhydroxylamine salts.
a compound in which the stabilizer is 0.0% relative to Polymer A;
A photosensitive resin composition characterized in that the content of the photosensitive resin composition is 0.001 to 5% by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9749977A JPS6021373B2 (en) | 1977-08-16 | 1977-08-16 | Photosensitive resin composition with excellent storage stability |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9749977A JPS6021373B2 (en) | 1977-08-16 | 1977-08-16 | Photosensitive resin composition with excellent storage stability |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5431727A JPS5431727A (en) | 1979-03-08 |
| JPS6021373B2 true JPS6021373B2 (en) | 1985-05-27 |
Family
ID=14193947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9749977A Expired JPS6021373B2 (en) | 1977-08-16 | 1977-08-16 | Photosensitive resin composition with excellent storage stability |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6021373B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5732304A (en) * | 1980-07-31 | 1982-02-22 | Showa Denko Kk | Production of glass grinding sheet |
| JPS61103150A (en) * | 1984-10-26 | 1986-05-21 | Toray Ind Inc | Photosensitive resin composition |
| JPH01146664A (en) * | 1987-11-30 | 1989-06-08 | Nippon Gureen Kenkyusho:Kk | Bridge-type metal bonded diamond grinding wheel and its manufacturing method |
| JPH01182845A (en) * | 1988-01-13 | 1989-07-20 | Toyobo Co Ltd | Photosensitive resin composition |
| JP3960473B2 (en) * | 2001-08-23 | 2007-08-15 | 日本化薬株式会社 | Negative coloring photosensitive composition |
| TWI242103B (en) * | 2001-08-23 | 2005-10-21 | Nippon Kayaku Kk | Negative type colored photosensitive composition |
| JP7604811B2 (en) * | 2020-05-15 | 2024-12-24 | Toppanホールディングス株式会社 | Quantum dot-containing composition, and quantum dot-containing member, backlight device, display device, and liquid crystal display element using said quantum dot-containing composition |
-
1977
- 1977-08-16 JP JP9749977A patent/JPS6021373B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5431727A (en) | 1979-03-08 |
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