JPS6022080B2 - Mold manufacturing method for high-density recording replica disk - Google Patents
Mold manufacturing method for high-density recording replica diskInfo
- Publication number
- JPS6022080B2 JPS6022080B2 JP3959678A JP3959678A JPS6022080B2 JP S6022080 B2 JPS6022080 B2 JP S6022080B2 JP 3959678 A JP3959678 A JP 3959678A JP 3959678 A JP3959678 A JP 3959678A JP S6022080 B2 JPS6022080 B2 JP S6022080B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- mold
- metal
- density recording
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Manufacturing Optical Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【発明の詳細な説明】
この発明は、金属膜にレーザ加工により情報を記録した
記録盤からしプリカディスクを製造するための金型に関
する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a mold for manufacturing a Precadisk from a recording disk in which information is recorded on a metal film by laser processing.
超高密度記録が可能な記録方法として、ガラス盤に金属
膜を被覆し、この金属膜の一部をレーザ加工により選択
的に除去して情報を記録する方法がある。As a recording method capable of ultra-high density recording, there is a method in which a glass disk is coated with a metal film and a portion of this metal film is selectively removed by laser processing to record information.
第1図においてこれを説明する。第1図Aは禾記録盤の
一部断面を示す図で、第1図B‘ま記録盤の金属膜の表
面の一部を拡大して示した図、第1図Cは記録盤の一部
断面を拡大して示した図である。1は基盤であるガラス
盤、2はガラス盤に被着され、情報が記録される記録媒
体用の金属膜、3はしーザ光線によって信号を記録した
加工孔(以下、ビットと称す)、4は金属膜2の表面で
ある記録面、1川まビットがない金属膜2とガラス盤1
から成る未記録盤、11はビットが記録された金属膜2
とガラス盤1から成る記録盤である。This will be explained in FIG. Figure 1A is a partial cross-sectional view of the recording disk, Figure 1B' is an enlarged view of a part of the surface of the metal film of the recording disk, and Figure 1C is a partial cross-sectional view of the recording disk. FIG. 3 is an enlarged view of a partial cross section. 1 is a glass disk as a base; 2 is a metal film for a recording medium on which information is recorded; 3 is a processed hole (hereinafter referred to as a bit) in which a signal is recorded by a laser beam; 4 is the recording surface which is the surface of the metal film 2, 1 is the metal film 2 and the glass disk 1 without a bit.
11 is a metal film 2 on which bits are recorded.
This is a record disc consisting of a glass disc and a glass disc.
次に、未記録盤10への記録について説明する。Next, recording on the unrecorded disc 10 will be explained.
レーザ光線を記録する信号に応じて適当な方法で強度変
調し、これを集光して、回転する未記録盤10の金属膜
2に照射する。レーザ光線が集光されて金属膜2に当た
ると、金属膜2のその部分は、瞬時に加熱されて蒸発あ
るいは溶解飛散してビット3が刻まれる。変調の方法に
よってそれぞれ異なるが、ビット3の長手方向の形状ま
たは間隔などの位置関係で情報を記録することができる
。このように記録した金属膜2の記録面4には、第1図
Bに示すようにビットが刻まれていて、また×−Yなる
線に沿った断面は第1図Cに示すようになる。第1図C
において、ビット3部は蒸発あるいは溶解飛散により金
属が除去されたため凹型となっている。このように記録
された記録盤11から特性劣化の少ないプロセスにより
、レプリカレコードを大量に製造できることが、特性が
良く、そして安価なしプリカレコードを実現するために
必要な条件である。これは、この種のレコード普及およ
び発展に係る大きな問題である。次に、上記記録盤11
から、レプリカレコードを作るために必要な金型の製造
法を第2図によって説明する。The intensity of the laser beam is modulated in an appropriate manner according to the recording signal, and the laser beam is focused and irradiated onto the metal film 2 of the rotating unrecorded disc 10. When the laser beam is focused and hits the metal film 2, that part of the metal film 2 is instantaneously heated and evaporated or melted and scattered, thereby carving the bit 3. Although this varies depending on the modulation method, information can be recorded based on the shape of the bits 3 in the longitudinal direction or the positional relationship such as the interval. On the recording surface 4 of the metal film 2 recorded in this way, bits are engraved as shown in FIG. 1B, and a cross section along the line x-Y is as shown in FIG. 1C. . Figure 1C
In this case, the third part of the bit has a concave shape because the metal has been removed by evaporation or melting and scattering. A necessary condition for realizing replica records with good characteristics and low cost is that replica records can be produced in large quantities from the record disc 11 recorded in this manner by a process with little deterioration of characteristics. This is a major problem with the spread and development of this type of record. Next, the record board 11
The method for manufacturing the mold necessary for making a replica record will now be explained with reference to FIG.
第2図A〜Eは、いずれも一部断面の拡大図で、記録盤
11の内周部については記載していない。2A to 2E are partially enlarged cross-sectional views, and the inner peripheral portion of the recording disk 11 is not shown.
第2図Aに示すのが記録盤11で、第1図Cと同じ過程
の記録盤11である。The recorder 11 shown in FIG. 2A is the recorder 11 in the same process as FIG. 1C.
第2図Bは記録盤11の内周および外周において金属膜
2を荒した面荒し後の記録盤11、第2図Cは面荒し後
に金属膜2の表面に銀鏡を施した記録盤11、第2図D
は銀鏡を施した後に銀鏡膜の表面にニッケルメッキした
記録盤11、第2図E‘まメッキ後の記録盤11から剥
離した一体型の銀鏡膜とニッケル層からなる金型である
。ガラス盤1に金属膜2を被着させた未記録盤10を定
速回転させ、記録信号に応じて強度変調されたレーザ光
線を金属膜2に集光して当てることにより記録盤11が
できる。FIG. 2B shows a record disk 11 after the surface has been roughened by roughening the metal film 2 on the inner and outer peripheries of the record disk 11, FIG. Figure 2D
Figure 2 shows a recording disk 11 in which the surface of the silver mirror film is plated with nickel after a silver mirror has been applied, and a mold consisting of an integral silver mirror film and a nickel layer is peeled off from the recording disk 11 after plating. A recording disc 11 is produced by rotating an unrecorded disc 10, which has a metal film 2 adhered to a glass disc 1, at a constant speed, and focusing a laser beam whose intensity is modulated according to the recording signal on the metal film 2. .
そして第2図Aに示すこの記録盤11の内周および外周
の記録のない部分において、所定幅(例えば3肌程度)
に渡り金属膜2を荒す。この部分は第2図Bにおいて面
荒し部21として表わしている。これは、例えば記録盤
11を回転させておき、サンドペーパーにより摩擦する
ことにより形成できる。これは後述するデッケル層23
が記録盤11から剥離するのを防ぐために行なうもので
ある。この面荒しを行なった記録盤11は第2図Bに示
す。この第2図Bの記録盤11の金属膜2のビット3で
は、記録により金属が蒸発あるいは溶解飛散によりなく
なつている。このためビット3にはガラス盤1が露出し
ていて、メッキに必要な被メッキ部に電極がないことに
なる。Then, in the unrecorded portions of the inner and outer circumferences of this record disc 11 shown in FIG. 2A, a predetermined width (for example, about 3 skins)
The metal film 2 is roughened over a period of time. This portion is shown as a surface roughening portion 21 in FIG. 2B. This can be formed, for example, by rotating the recording disk 11 and rubbing it with sandpaper. This is the deckle layer 23 which will be described later.
This is done to prevent the disc from peeling off from the recording disc 11. The record disc 11 subjected to this surface roughening is shown in FIG. 2B. In bit 3 of the metal film 2 of the recording disk 11 in FIG. 2B, the metal has disappeared due to evaporation or dissolution and scattering during recording. Therefore, the glass disk 1 is exposed in the bit 3, and there is no electrode on the plated part necessary for plating.
これは後述するニッケルのメッキにおいて問題となる。
このために、金属膜2の表面に、記録盤11全面に渡り
銀鏡を行なう。銀鏡法を説明すると、まず銀鏡膜の付着
を容易にする為に塩化スズ溶液を記録盤11全面に塗布
し、次に、アンモニア性硝酸銀溶液と還元剤であるブド
ウ糖溶液を同時に塗布する事により記録盤11の面に銀
鏡膜が形成される。この銀鏡を行なった記録盤11を第
2図Cに示す。22は銀鏡膜である。This becomes a problem in nickel plating, which will be described later.
For this purpose, a silver mirror is formed on the surface of the metal film 2 over the entire surface of the recording disk 11. To explain the silver mirror method, first, a tin chloride solution is applied to the entire surface of the recording disk 11 in order to facilitate the adhesion of the silver mirror film, and then an ammoniacal silver nitrate solution and a glucose solution, which is a reducing agent, are simultaneously applied to record. A silver mirror film is formed on the surface of the disc 11. The recording disk 11 on which this silver mirror was applied is shown in FIG. 2C. 22 is a silver mirror film.
この銀灘膜の厚さは例えば1000Aから2000Aで
ある。この銀鏡膜22を電極として、ニッケルをメッキ
する。このメッキは、銀鏡膜22に十分な機械的強度を
得るために行なうもので、このメッキ後の記録盤11を
第2図Dに示す。このメッキ層の厚さは例えば0.1豚
である。23はニッケルメッキ層である。The thickness of this silver nada film is, for example, 1000A to 2000A. Using this silver mirror film 22 as an electrode, nickel is plated. This plating is performed to obtain sufficient mechanical strength for the silver mirror film 22, and the record disc 11 after this plating is shown in FIG. 2D. The thickness of this plating layer is, for example, 0.1 mm. 23 is a nickel plating layer.
このメッキ作業において、前述した記録盤11の内周お
よび外周における所定幅に渡り施こした面荒しの効果に
より、メッキ中にニッケルメッキ層23が記録盤11か
らはく隣することがない。これにより、凹型ビットを有
する第2図Aの記録盤11から、特性劣化の少ない凸型
ビット3の記録面が、銭鏡膜22とニッケルメッキ層2
3からなる一体型に形成され、ニッケル層23により強
度は十分に得られている。この銀鏡膜22とニッケル層
23からなる一体型を、記録盤11からはがすことによ
り、凸型ビット3をもつ金型30が作られる。この金型
30を第2図Eに示す。さて、以上述べた金型を作る過
程において、ビット3のある記録盤11上にニッケルメ
ッキする場合の電極として、銀鏡膜22は容易に形成出
来て有効であるが、反面、銀粒子が大きいため表面性が
金属膜2のそれよりも劣ること、銀が柔らかく剥離時に
ビットの変形が生じ転写の忠実度がやや悪いこと、取扱
いに注意を要すること、さらに金属膜がアルミニウム等
の耐薬品性の悪いものには銀鏡工程で金属膜の腐蝕が生
じ特性を劣化させるなどの欠点もあった。In this plating operation, the nickel plating layer 23 does not peel off from the recording disk 11 during plating due to the effect of surface roughening performed over a predetermined width on the inner and outer peripheries of the recording disk 11 described above. As a result, from the recording disk 11 shown in FIG. 2A having a concave bit, the recording surface of the convex bit 3 with little characteristic deterioration is changed from the mirror film 22 and the nickel plating layer 2.
3, and the nickel layer 23 provides sufficient strength. A mold 30 having a convex bit 3 is produced by peeling off the integrated mold made of the silver mirror film 22 and the nickel layer 23 from the recording disk 11. This mold 30 is shown in FIG. 2E. Now, in the process of making the mold described above, the silver mirror film 22 can be easily formed and is effective as an electrode when nickel plating the recording disk 11 with the bit 3, but on the other hand, since the silver particles are large, The surface properties are inferior to that of metal film 2, the silver is soft and the bits are deformed when peeled off, resulting in slightly poor transfer fidelity, care must be taken in handling, and the metal film is made of chemically resistant materials such as aluminum. The bad ones also had drawbacks such as corrosion of the metal film during the silver mirror process and deterioration of characteristics.
この発明は上記のような欠点を除去するためなされたも
ので、記録盤の上に銀鏡を施す工程のかわりに、金属保
護膜を附着させる工程を導入したことにより、強度的に
堅牢で、ニッケルメッキ工程の耐薬品性にも優れ、表面
の粒状性も狼鏡面に比べて優れた記録盤が出来、以後の
ニッケルメッキ工程が容易になり、良質の金型を製造す
る方法を提供するものである。This invention was made to eliminate the above-mentioned drawbacks.Instead of the process of applying a silver mirror on the recording disk, a process of attaching a metal protective film was introduced, which made it strong and robust, and made it possible to improve the strength of the nickel. It has excellent chemical resistance in the plating process, and the surface graininess is better than that of the mirror surface, making it easier to perform the subsequent nickel plating process and providing a method for manufacturing high-quality molds. be.
以下、この発明の一実施例を第3図について説明する。An embodiment of the present invention will be described below with reference to FIG.
第3図Aは前述した方法でレーザ加工によってビットの
形成された記録盤を示し、同図Bは金属保護膜が附着さ
れた状態を示す図、同図Cはさらにニッケルメッキが施
された状態を示す図、同図Dはニッケルメッキ層が剥離
されて形成された金型を示す図である。第3図Aは前述
した方法によってガラス盤1上にビット3の形成された
金属膜2がある記録盤11である。Figure 3A shows a recording disk with bits formed by laser processing using the method described above, Figure 3B shows a state in which a metal protective film has been attached, and Figure 3C shows a state in which nickel plating has been further applied. Figure D is a diagram showing a mold formed by peeling off the nickel plating layer. FIG. 3A shows a recording disk 11 having a metal film 2 on which bits 3 are formed on a glass disk 1 by the method described above.
次に同図Bのごとく上記記録盤11の上に蒸着によって
金属保護膜31を形成し、その表面の凹凸が新たな信号
転写面となる。次に金属保護膜31と金属膜2を(一)
電極とし、ニッケル金属を(十)電極としニッケルメッ
キを施すと同図Cのニッケルメッキ層23が形成される
。これを同図Dのごとくニッケルメッキ層のみ剥離した
ものがこの方式による金型50である。第2図で述べた
金型30が、銀鏡膜とニッケルメッキ層の一体型になっ
ているのに比べ、第3図に示すようにこの発明の金型は
ニッケルメッキ層23のみで成り立っている。なお、金
属膜2の材料は例えばクロム薄膜、クロム−金一クロム
積層膜など耐薬品性の強いものから、後述する理由によ
り例えばアルミニウム等のメッキ液に弱いものでもよい
。Next, as shown in FIG. 1B, a metal protective film 31 is formed by vapor deposition on the recording disk 11, and the unevenness of the surface becomes a new signal transfer surface. Next, the metal protective film 31 and the metal film 2 (1)
When nickel metal is used as an electrode (10) and nickel plating is applied, a nickel plating layer 23 as shown in FIG. A mold 50 made by this method is obtained by peeling off only the nickel plating layer as shown in FIG. In contrast to the mold 30 described in FIG. 2, which is an integrated type of silver mirror film and nickel plating layer, the mold of the present invention consists only of the nickel plating layer 23, as shown in FIG. 3. . The material of the metal film 2 may be a material with strong chemical resistance, such as a chromium thin film or a chromium-gold-monochromium laminated film, or a material that is weak against plating solutions, such as aluminum, for reasons described later.
その膜厚は例えば数100A〜2000Aである。前述
した方法と異なる点は銭鏡のかわりに金属保護膜を附着
する工程以降であり、これについてさらに詳述する。The film thickness is, for example, several 100A to 2000A. The difference from the method described above lies in the step of attaching a metal protective film instead of the coin mirror, which will be described in more detail.
第3図B‘こおいて金属保護膜31は蒸着等によって金
属を附着させるが、その材料は記録盤11への蒸着が容
易で基板1、金属膜2との密着力が強く元のビット形状
を忠実に残し、ニッケルメッキに先だった洗浄にも耐え
うる強度、耐薬品性を持ち、表面の粒状性が良好なもの
が適している。In FIG. 3B', metal is attached to the metal protective film 31 by vapor deposition, etc., and the material is easy to vapor deposit onto the recording disk 11, has strong adhesion to the substrate 1 and the metal film 2, and retains the original bit shape. A suitable material is one that retains the original properties faithfully, has strength and chemical resistance that can withstand cleaning prior to nickel plating, and has good surface granularity.
クロム、チタン、金、銀は基盤との密着性が良く、ニッ
ケルは表面性が特に優れていた。金属保護膜31の膜厚
はニッケルメッキを施す場合にビット3のガラス基盤露
出部も十分電極として使用出来る厚さがあれば良い。実
験によれば金属厚2の厚さ約0.1ム凧の約半分程度で
ビット部のニッケルメッキも良好に進み、ビットの忠実
度も良好であった。また、金属膜2がアルミニウム等の
耐薬品性の悪い場合には銀鏡に比べ特に有効でピンホー
ルの少し、蒸着により、ニッケルメッキ工程に耐えるこ
とが出釆る。この場合、金属保護膜31の厚さは金属膜
2の厚さ程度から2倍程度にすると効果的で金属膜の腐
蝕も少く、情報の欠落を防ぐことが出来た。この発明の
方法により金型を作り、レプリカデイスクを作った場合
、銀鏡処理を行ったものに比べ、ディスクの表面性が良
く表面から発生するノイズを再生信号において15〜2
比旧減らすことが出来た。また、第3図Bの状態で、ペ
ット部と非ビット部共に光反射面となっており、最終段
階でのレプリカディスクと類似の干渉の原理による光学
再生が出来るため、金型作成以降のプロセスを経る前に
記録盤の評価をすることが出来るためしプリカ作成の歩
留りが著しく向上した。Chromium, titanium, gold, and silver had good adhesion to the substrate, and nickel had particularly excellent surface properties. The thickness of the metal protective film 31 may be sufficient as long as the exposed portion of the glass base of the bit 3 can also be used as an electrode when nickel plating is applied. According to experiments, the nickel plating on the bit part progressed well with metal thickness 2, which was about half that of a kite with a thickness of about 0.1 mm, and the fidelity of the bit was also good. In addition, when the metal film 2 is made of aluminum or the like with poor chemical resistance, it is particularly effective compared to a silver mirror, and can withstand the nickel plating process with few pinholes and vapor deposition. In this case, it is effective to increase the thickness of the metal protective film 31 from about twice the thickness of the metal film 2, to lessen the corrosion of the metal film, and to prevent information from being lost. When a mold is made using the method of this invention and a replica disk is made, the surface quality of the disk is better than that with silver mirror treatment, and the noise generated from the surface is suppressed by 15 to 2
We were able to reduce it compared to the previous year. In addition, in the state shown in Figure 3B, both the pet part and the non-bit part are light-reflecting surfaces, and optical reproduction can be performed using the principle of interference similar to that of a replica disk at the final stage. Since it is possible to evaluate the record disc before it goes through the process, the yield of pre-recorder production has improved significantly.
なお、説明中、金属保護膜の製造法として蒸着について
説明したが、スパッタリング法によってもよいことは当
然である。In addition, although vapor deposition was explained as a manufacturing method of a metal protective film during description, it goes without saying that sputtering method may also be used.
また、この発明の説明中に面荒し工程を省いたが、必要
性は前述方法と同じである。Also, although the surface roughening step was omitted in the description of this invention, the necessity is the same as in the above-mentioned method.
以上のように、この発明によれば記録盤11に銀鏡を施
すかわりに金属保護膜を附着する工程を取り入れたこと
により、ニッケルメッキ工程での耐薬品性、剥離工程で
の耐強度性に優れ、より忠実度のよいビットの転写が可
能になり、転写面が、銀鏡より粒状性の良いものになり
、良好な金型を作ることが出来る。As described above, according to the present invention, by incorporating a process of attaching a metal protective film to the recording disc 11 instead of applying a silver mirror, it has excellent chemical resistance in the nickel plating process and strength resistance in the peeling process. , it is possible to transfer bits with better fidelity, the transfer surface has better graininess than a silver mirror, and it is possible to make a good mold.
この金型から複数のニッケルメッキ工程をへて作られる
金型、その金型から転写されるレプリカディスクの特性
もビットの忠実度のより高い、表面性のよいものが得ら
れる効果がある。A mold made from this mold through a plurality of nickel plating processes and a replica disk transferred from the mold have the advantage of having higher bit fidelity and better surface quality.
第1図は先行技術による金型製造法に係る記録盤の説明
図、第2図は金型製造過程を示す工程図、第3図はこの
発明の金型製造法の一実施例を示す工程図である。
図中、1はガラス基盤、2は金属膜、3はビット、4は
記録面、10は未記録盤、11は記録盤、12は面荒し
部、22は銀鏡膜、23はニッケルメッキ層、30は金
型、31は金属保護膜、50は金型である。
なお図中、同一符号は同一又は相当部分を示す。第1図
第2図
第3図Fig. 1 is an explanatory diagram of a recording disk related to the mold manufacturing method according to the prior art, Fig. 2 is a process diagram showing the mold manufacturing process, and Fig. 3 is a process diagram showing an embodiment of the mold manufacturing method of the present invention. It is a diagram. In the figure, 1 is a glass substrate, 2 is a metal film, 3 is a bit, 4 is a recording surface, 10 is an unrecorded disc, 11 is a recording disc, 12 is a surface roughening part, 22 is a silver mirror film, 23 is a nickel plating layer, 30 is a mold, 31 is a metal protective film, and 50 is a mold. In the figures, the same reference numerals indicate the same or equivalent parts. Figure 1 Figure 2 Figure 3
Claims (1)
情報に対応したピツトを成する工程と、上記ピツトが形
成された金属膜上にその厚さより厚い金属保護膜を附着
する工程と、上記金属保護膜上へニツケルメツキ層を形
成する工程と、このニツケル・メツキ層を剥離する工程
とを備えてなる高密度記録レプリカデイスクの金型製造
法。 2 金属保護膜をクロム膜で形成したことを特徴とする
特許請求の範囲第1項記載の高密度記録レプリカデイス
クの金型製造方法。 3 金属保護膜をニツケル膜で形成したことを特徴とす
る特許請求の範囲第1項記載の高密度記録レプリカデイ
スクの金型製造方法。 4 金属保護膜をチタン膜で形成したことを特徴とする
特許請求の範囲第1項記載の高密度記録レプリカデイス
クの金型製造方法。 5 金属保護膜を金薄膜で形成したことを特徴とする特
許請求の範囲第1項記載の高密度記録レプリカデイスク
の金型製造方法。 6 金属保護膜を銀薄膜で形成したことを特徴とする特
許請求の範囲第1項記載の高密度記録レプリカデイスク
の金型製造方法。[Claims] 1. A step of forming pits corresponding to information by laser light on a metal film formed on one main surface of a substrate, and a metal protection layer thicker than the thickness of the metal film on which the pits are formed. A method for manufacturing a mold for a high-density recording replica disk, comprising the steps of attaching a film, forming a nickel plating layer on the metal protective film, and peeling off the nickel plating layer. 2. A mold manufacturing method for a high-density recording replica disk according to claim 1, wherein the metal protective film is formed of a chromium film. 3. The method for manufacturing a mold for a high-density recording replica disk according to claim 1, wherein the metal protective film is formed of a nickel film. 4. The method for manufacturing a mold for a high-density recording replica disk according to claim 1, wherein the metal protective film is formed of a titanium film. 5. The method for manufacturing a mold for a high-density recording replica disk according to claim 1, wherein the metal protective film is formed of a thin gold film. 6. The method for manufacturing a mold for a high-density recording replica disk according to claim 1, wherein the metal protective film is formed of a thin silver film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3959678A JPS6022080B2 (en) | 1978-04-04 | 1978-04-04 | Mold manufacturing method for high-density recording replica disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3959678A JPS6022080B2 (en) | 1978-04-04 | 1978-04-04 | Mold manufacturing method for high-density recording replica disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54131537A JPS54131537A (en) | 1979-10-12 |
| JPS6022080B2 true JPS6022080B2 (en) | 1985-05-30 |
Family
ID=12557482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3959678A Expired JPS6022080B2 (en) | 1978-04-04 | 1978-04-04 | Mold manufacturing method for high-density recording replica disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6022080B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6972244B1 (en) * | 2004-04-23 | 2005-12-06 | National Semiconductor Corporation | Marking semiconductor devices through a mount tape |
| US7135385B1 (en) | 2004-04-23 | 2006-11-14 | National Semiconductor Corporation | Semiconductor devices having a back surface protective coating |
| US7015064B1 (en) | 2004-04-23 | 2006-03-21 | National Semiconductor Corporation | Marking wafers using pigmentation in a mounting tape |
| US7101620B1 (en) | 2004-09-07 | 2006-09-05 | National Semiconductor Corporation | Thermal release wafer mount tape with B-stage adhesive |
| US8030138B1 (en) | 2006-07-10 | 2011-10-04 | National Semiconductor Corporation | Methods and systems of packaging integrated circuits |
| US7749809B2 (en) | 2007-12-17 | 2010-07-06 | National Semiconductor Corporation | Methods and systems for packaging integrated circuits |
| US8048781B2 (en) | 2008-01-24 | 2011-11-01 | National Semiconductor Corporation | Methods and systems for packaging integrated circuits |
-
1978
- 1978-04-04 JP JP3959678A patent/JPS6022080B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54131537A (en) | 1979-10-12 |
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