JPS6023998B2 - recording material - Google Patents
recording materialInfo
- Publication number
- JPS6023998B2 JPS6023998B2 JP58036904A JP3690483A JPS6023998B2 JP S6023998 B2 JPS6023998 B2 JP S6023998B2 JP 58036904 A JP58036904 A JP 58036904A JP 3690483 A JP3690483 A JP 3690483A JP S6023998 B2 JPS6023998 B2 JP S6023998B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- recording
- metal
- sample
- halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title claims description 63
- 239000010410 layer Substances 0.000 claims description 111
- 229910052751 metal Inorganic materials 0.000 claims description 89
- 239000002184 metal Substances 0.000 claims description 89
- 150000004820 halides Chemical class 0.000 claims description 52
- 239000011241 protective layer Substances 0.000 claims description 23
- 238000001704 evaporation Methods 0.000 claims description 17
- 230000008020 evaporation Effects 0.000 claims description 17
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 15
- 239000000194 fatty acid Substances 0.000 claims description 15
- 229930195729 fatty acid Natural products 0.000 claims description 15
- 150000004665 fatty acids Chemical class 0.000 claims description 15
- 230000008018 melting Effects 0.000 claims description 12
- 238000002844 melting Methods 0.000 claims description 12
- 238000004220 aggregation Methods 0.000 claims description 9
- 230000002776 aggregation Effects 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 229920000620 organic polymer Polymers 0.000 claims description 5
- 230000035945 sensitivity Effects 0.000 description 34
- 239000010408 film Substances 0.000 description 25
- 229910052797 bismuth Inorganic materials 0.000 description 15
- 150000002739 metals Chemical class 0.000 description 14
- -1 polyethylene terephthalate Polymers 0.000 description 13
- 229910052718 tin Inorganic materials 0.000 description 13
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 11
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 239000004709 Chlorinated polyethylene Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 235000021355 Stearic acid Nutrition 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 6
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 6
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000008117 stearic acid Substances 0.000 description 6
- 150000001408 amides Chemical class 0.000 description 5
- 239000012528 membrane Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 235000021357 Behenic acid Nutrition 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910008066 SnC12 Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 229940116226 behenic acid Drugs 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- FPHIOHCCQGUGKU-UHFFFAOYSA-L difluorolead Chemical compound F[Pb]F FPHIOHCCQGUGKU-UHFFFAOYSA-L 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 229910052745 lead Inorganic materials 0.000 description 3
- 231100000053 low toxicity Toxicity 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- LYQFWZFBNBDLEO-UHFFFAOYSA-M caesium bromide Chemical compound [Br-].[Cs+] LYQFWZFBNBDLEO-UHFFFAOYSA-M 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- ZASWJUOMEGBQCQ-UHFFFAOYSA-L dibromolead Chemical compound Br[Pb]Br ZASWJUOMEGBQCQ-UHFFFAOYSA-L 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000001454 recorded image Methods 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910021562 Chromium(II) fluoride Inorganic materials 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 101100520660 Drosophila melanogaster Poc1 gene Proteins 0.000 description 1
- 101100284769 Drosophila melanogaster hemo gene Proteins 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000001293 FEMA 3089 Substances 0.000 description 1
- 229910015475 FeF 2 Inorganic materials 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 101000800055 Homo sapiens Testican-1 Proteins 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910021587 Nickel(II) fluoride Inorganic materials 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 108091006629 SLC13A2 Proteins 0.000 description 1
- 101100520662 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) PBA1 gene Proteins 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- 102100033390 Testican-1 Human genes 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 229910007998 ZrF4 Inorganic materials 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- OSWRVYBYIGOAEZ-UHFFFAOYSA-N acetic acid;2-hydroxypropanoic acid Chemical compound CC(O)=O.CC(O)C(O)=O OSWRVYBYIGOAEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000004931 aggregating effect Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 description 1
- RPJGYLSSECYURW-UHFFFAOYSA-K antimony(3+);tribromide Chemical compound Br[Sb](Br)Br RPJGYLSSECYURW-UHFFFAOYSA-K 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- RNFYGEKNFJULJY-UHFFFAOYSA-L chromium(ii) fluoride Chemical compound [F-].[F-].[Cr+2] RNFYGEKNFJULJY-UHFFFAOYSA-L 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229920005994 diacetyl cellulose Polymers 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- SHXXPRJOPFJRHA-UHFFFAOYSA-K iron(iii) fluoride Chemical compound F[Fe](F)F SHXXPRJOPFJRHA-UHFFFAOYSA-K 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001509 metal bromide Inorganic materials 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910001511 metal iodide Inorganic materials 0.000 description 1
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 231100000956 nontoxicity Toxicity 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000007540 photo-reduction reaction Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000205 poly(isobutyl methacrylate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229940037312 stearamide Drugs 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【発明の詳細な説明】
本発明は高エネルギー密度の光ビームを用いて情報を記
録するための記録材料に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a recording material for recording information using a high energy density light beam.
従来よりレーザ等の高エネルギー密度の光ビームを用い
る記録材料としては、銀塩等の感光材料の他に次のよう
な熱的記録材料がある。Conventionally, as recording materials using a high energy density light beam such as a laser, there are the following thermal recording materials in addition to photosensitive materials such as silver salts.
この熱的記録材料に於いては、記録層は高い光学濃度を
有し、照射される高エネルギー密度の光ビームを吸収し
局所的な温度上昇を生じ、融解、蒸発、凝集等の熱的変
形をして、その光照射された部分が除去されることによ
って、非照射部分に対して光学的濃度差を生じることに
より情報が記録されるものである。このような熱的記録
材料は一般に現像、定着等の処理を必要としないこと、
通常の室内光では記録されないため暗室操作が不要であ
ること、高コントラストの画像が得られること、情報の
追加記録(アドオン)が可能であること等の利点を有す
る。一般にこのような熱的記録材料への記録方法は、記
録すべき情報を電気的な時系列信号に変換し、その信号
に応じて強度変調されたレーザビームで、その記録材料
上を走査させて行なう場合が多い。In this thermal recording material, the recording layer has a high optical density and absorbs the irradiated high-energy density light beam, causing a local temperature rise and thermal deformation such as melting, evaporation, and aggregation. Then, the irradiated portion is removed, thereby creating an optical density difference with respect to the non-irradiated portion, thereby recording information. Such thermal recording materials generally do not require processing such as development or fixing;
It has the advantages of not requiring darkroom operations because it is not recorded under normal room light, that high-contrast images can be obtained, and that additional information can be recorded (add-on). Generally, the recording method on such thermal recording materials converts the information to be recorded into an electrical time-series signal, and scans the recording material with a laser beam whose intensity is modulated according to the signal. It is often done.
この場合、リアルタイムで記録画像が得られるという利
点を有する。このような熱的記録材料の記録層としては
、金属、染料、プラスチック等が適しており、一般に安
価な材料を用いることが出来る。This case has the advantage that recorded images can be obtained in real time. Metals, dyes, plastics, etc. are suitable for the recording layer of such thermal recording materials, and generally inexpensive materials can be used.
このような記録材料は、例えばM.L.Leveneら
の著による‘‘Electron,ion and L
aser Beam Technology”第11回
シンポジウムの記録(1969年)、Electron
ics誌(1968年3月18日)第50頁、D.他y
船n 著 “ 爪e 氏11 Systm Techn
icalJom雌1”誌第50巻(1971年)第17
61頁、C.0.Carlson著“Science”
誌第154巻(1966年)第1550頁等に記載され
ている。それらのうち記録層に金属層を用いたものとし
てはたとえば支持体上にBi,Sn,ln,等の金属薄
膜を用いたものがあり、それらは高解像力の画像が記録
出来ること、高コントラストであること等のため熱的記
録材料として優れた性質を有している。しかしながら一
股に金属薄膜を用いた記録材料では、記録に用いるレー
ザ光に対する光反射率が50%以上のものが多く、レー
ザ光のエネルギーを有効に利用することが出釆ないため
、記録に要する光エネルギーが大きく、従って高速走査
で記録するには大出力レーザ光源が必要となり、そのた
め記録装置が大型且つ高価なものになるという欠点を有
している。そこで記録感度の高い記録材料がいくつか探
究されており、その1例としては特公昭46一4047
9号公報にSe,Bi,戊から成る3層構成の記録材料
が記載されている。即ちSeとBiより成る薄膜の光反
射率を下げるため騒く薄い蛇の膜を積層したものである
。しかしながら、Se等を用いることは、公害発生の危
険があるため好ましくなく、また記録された画質も満足
出釆るものではない。反射防止層を設けた記録材料の他
の例としては、特開昭51−74632号公報に、金属
層上に記録に用いるレーザ光の波長城で光吸収を有する
反射防止層を設けることが記録されている。しかしなが
ら反射防止層を設けたとしても、光反射を全くなくすこ
とは極めて困難であるし、またたとえ光反射を全くなく
したとしても金属薄膜をレーザ光照射によって融解、蒸
発、凝集等の熱的変形を生じさせるためには大きなレー
ザ光源を必要とするため、より高感度な記録材料が要望
される。本発明の目的はしーザ等の高エネルギー密度の
光ビームで記録するための感度の高い記録材料を提供す
ることである。また本発明の目的は記録画質の優れたか
つ耐傷性の高い高感度記録材料を提供することである。Such recording materials are known, for example, from M. L. ``Electron, ion and L'' by Levene et al.
"aser Beam Technology" 11th Symposium Record (1969), Electron
ics magazine (March 18, 1968), p. 50, D. Others
Written by Fune “ Tsume e Mr. 11 System Techn
icalJom Female 1” Magazine Volume 50 (1971) No. 17
Page 61, C. 0. “Science” by Carlson
It is described in vol. 154 (1966), p. 1550, etc. Among them, there are those that use a metal layer as a recording layer, for example, those that use a thin metal film of Bi, Sn, In, etc. on a support, and these can record images with high resolution and have high contrast. It has excellent properties as a thermal recording material. However, with recording materials that use a single metal thin film, the reflectance of the laser beam used for recording is often over 50%, making it impossible to effectively utilize the energy of the laser beam. The light energy is large, and therefore a high-output laser light source is required to record with high-speed scanning, which has the disadvantage that the recording apparatus becomes large and expensive. Therefore, some recording materials with high recording sensitivity are being explored, and one example is the Special Publication No. 46-4047.
No. 9 describes a recording material having a three-layer structure consisting of Se, Bi, and Bo. That is, it is a lamination of thin serpentine films that make noise in order to lower the light reflectance of the thin film made of Se and Bi. However, it is not preferable to use Se or the like because there is a risk of pollution, and the recorded image quality is also not satisfactory. As another example of a recording material provided with an anti-reflection layer, Japanese Patent Application Laid-Open No. 74632/1984 discloses that an anti-reflection layer that absorbs light at the wavelength of the laser beam used for recording is provided on a metal layer. has been done. However, even if an anti-reflection layer is provided, it is extremely difficult to completely eliminate light reflection, and even if light reflection is completely eliminated, laser light irradiation will cause thermal deformation such as melting, evaporation, and aggregation of the metal thin film. Since a large laser light source is required to generate this, a recording material with higher sensitivity is required. An object of the present invention is to provide a highly sensitive recording material for recording with a high energy density light beam such as a laser beam. Another object of the present invention is to provide a highly sensitive recording material with excellent recording image quality and high scratch resistance.
本発明によれば、支持体上に金属と光照射により熱的又
は光化学的に活性化され、金属の融解、蒸発又は凝集を
促進しうるハロゲン化物とを含む記録層を有する高感度
記録材料が提供される。本発明の高感度記録材料の構成
は、支持体上に金属とハロゲン化物との積層又は混合物
を設け更にその上に有機物質から成る保護層を設けたも
のである。本発明に用いられる支持体としては、ポリエ
チレンテレフタレート等のプラスチック、ガラス、紙、
板状又は箔状の金属等の一般の記録材料の支持体でよい
。According to the present invention, there is provided a high-sensitivity recording material having a recording layer on a support that includes a metal and a halide that is thermally or photochemically activated by light irradiation and can promote melting, evaporation, or aggregation of the metal. provided. The high-sensitivity recording material of the present invention has a structure in which a laminate or a mixture of a metal and a halide is provided on a support, and a protective layer made of an organic substance is further provided thereon. Supports used in the present invention include plastics such as polyethylene terephthalate, glass, paper,
A general recording material support such as a plate-shaped or foil-shaped metal support may be used.
本発明に用いられる金属としては、Mg,Sc,Y,T
i,Zr,Hf,V,Nb,Ta,Cr,Mo,VV,
Mn,Re,Fe,Co,Ni,Ru,Rh,Pb,l
r,Pt,Cu,Ag,Au,Zn,Cd,AI,Ga
,ln,Si,Ce,m,Pb,Po,Sn,As,S
b,Bi,Se,Te等から選ばれる一つ又は二つ以上
の組合せであるが、本発明に用いられる金属として特に
望ましい条件は、毒性の少ないこと、融解又は蒸発に要
するエネルギーが小さいこと、光反射率が低いこと、保
存時の光学濃度の低下等の経時劣化が少ないこと、ハロ
ゲン化物の熱的又は光化学的活性化に伴なつて融解、蒸
発又は凝集等の熱的変形を起し易いこと、膜の製造が容
易であること等である。The metals used in the present invention include Mg, Sc, Y, T
i, Zr, Hf, V, Nb, Ta, Cr, Mo, VV,
Mn, Re, Fe, Co, Ni, Ru, Rh, Pb, l
r, Pt, Cu, Ag, Au, Zn, Cd, AI, Ga
, ln, Si, Ce, m, Pb, Po, Sn, As, S
b, Bi, Se, Te, etc., but particularly desirable conditions for the metal used in the present invention are low toxicity, low energy required for melting or evaporation, Low light reflectance, little deterioration over time such as a decrease in optical density during storage, and easy thermal deformation such as melting, evaporation, or aggregation due to thermal or photochemical activation of halides. and that the membrane is easy to manufacture.
本発明を最も有効に実施しうる金属としてはMg,Zn
,N,ln,Sn,Biが好ましい。これらの金属は単
体として後述するがごとき各種の層を構成してもよく、
また合金の状態で各種の層を構成してもよい。The metals that can most effectively carry out the present invention include Mg and Zn.
, N, ln, Sn, and Bi are preferred. These metals may be used alone to form various layers as described below.
Further, various layers may be formed in an alloy state.
更に合金の場合はNa,K,Caを含むものであっても
よい。Furthermore, in the case of an alloy, it may contain Na, K, and Ca.
これらの金属は真空蒸着、スパッタリング、イオンプレ
ーティング、電気メッキ、無電解〆ッキ等の種々の方法
を用いて後述するような層構成として支持体上に設ける
ことができる。二種以上の金属から成る層を形成する方
法としては、合金を真空蒸着してもよいし、また二種以
上の金属を別々の蒸発源を用いて同時或いは別々に蒸着
してもよい。金属層の膜厚は、画像として必要な光学濃
度を与える厚さであればよく、例えば透過濃度2を得る
ためには300A〜1500Aの金属層を必要とするが
、用いる金属の種類によって異なるのは当然である。These metals can be provided on the support in a layered structure as described below using various methods such as vacuum evaporation, sputtering, ion plating, electroplating, and electroless plating. As a method for forming a layer consisting of two or more metals, an alloy may be vacuum evaporated, or two or more metals may be evaporated simultaneously or separately using separate evaporation sources. The thickness of the metal layer may be any thickness that provides the optical density required for the image.For example, to obtain a transmission density of 2, a metal layer of 300A to 1500A is required, but it may vary depending on the type of metal used. Of course.
また真空蒸着、スパッタリング、イオンプレーティング
等の方法で支持体上に金属層を形成する場合、支持体の
種類、温度、真空度、蒸着速度等によって金属層の膜構
造が変化するため所望の光学濃度を得るために必要な膜
厚も当然異なることは明らかである。Furthermore, when forming a metal layer on a support using methods such as vacuum evaporation, sputtering, and ion plating, the film structure of the metal layer changes depending on the type of support, temperature, degree of vacuum, deposition rate, etc. It is obvious that the film thickness required to obtain the concentration also differs.
一方本発明に用いられる前述のハロゲン化物としては、
Zn12,Sb12,Sb15,Cd12,K1,Ag
1,ZrL,Sn12,Sn14,Sr12,Csl,
TI1,W12,TiL,CM,ThL,Pb12,B
i13等の金属沃化物、SbBr3,AgBr,S正B
r2,CsBr,TIBr,CUBr,NaBr,Pb
Br2,NbBr5,母Br2等の金属臭化物、CdC
!2,KC1,AgC1,SnC12,TIC1,Fe
C13,TaC15,C山CI,NaC1,PbC12
,NbC13,BaC12等の金属塩化物、Z岬2,A
IF3,CrF2,ZrF4,S岬2,TIF,FeF
2,FeF3,CuF,Nap,PbF2,NbF2,
NiF2,BaF2,BiF2,M中2,LiF等の金
属弗化物から選ばれるが、これらの化合物を単一或いは
二つ以上組み合せて用いてもよい。On the other hand, the aforementioned halides used in the present invention include:
Zn12, Sb12, Sb15, Cd12, K1, Ag
1, ZrL, Sn12, Sn14, Sr12, Csl,
TI1, W12, TiL, CM, ThL, Pb12, B
Metal iodides such as i13, SbBr3, AgBr, S positive B
r2, CsBr, TIBr, CUBr, NaBr, Pb
Metal bromides such as Br2, NbBr5, mother Br2, CdC
! 2, KC1, AgC1, SnC12, TIC1, Fe
C13, TaC15, C mountain CI, NaC1, PbC12
, NbC13, BaC12 and other metal chlorides, Z cape 2, A
IF3, CrF2, ZrF4, S Misaki 2, TIF, FeF
2, FeF3, CuF, Nap, PbF2, NbF2,
The compound is selected from metal fluorides such as NiF2, BaF2, BiF2, M2, LiF, etc., and these compounds may be used singly or in combination of two or more.
本発明に用いられるハロゲン化物として特に望ましい材
料は、毒性の少ないこと、、相変化、分解、光還元等の
熱的又は、光化学的活性化を起し易く、前述の金属の融
解蒸発又は凝集等の熱的変形を促進し易いこと、吸湿又
は潮解又は金属との階反応等による蓬雑劣化の少ないこ
と、膜の製造が容易であること等である。Particularly desirable materials as halides used in the present invention are those that have low toxicity, are easily susceptible to thermal or photochemical activation such as phase change, decomposition, and photoreduction, and are capable of melting, vaporizing, or aggregating the metals mentioned above. It is easy to promote thermal deformation of the membrane, there is little deterioration due to moisture absorption, deliquescence, or reaction with metals, and the membrane is easy to manufacture.
本発明の記録材料としてのハロゲン化物は高エネルギー
密度の光ビームが照射された場合にのみ、熱的又は光化
学的に活性化されることにより、前述の金属の融解、蒸
発又は凝集等の熱的変形を促進する作用を有するものと
考えられ、単なる反射防止層として作用するものではな
いが、光エネルギーを有効に利用するためには光反射率
は小さい方がより望ましいことは明らかである。The halide used as the recording material of the present invention is thermally or photochemically activated only when irradiated with a high-energy density light beam, thereby causing thermal effects such as melting, evaporation, or aggregation of the metals mentioned above. Although it is thought to have the effect of promoting deformation and does not act simply as an antireflection layer, it is clear that a lower light reflectance is more desirable in order to utilize light energy effectively.
本発明を最も有効に実施しうるハロゲン化物としてはA
g,Aがr,Aや1,Pb12,PbBr2,POC1
2,PbF2,Sn12,SnC12,C山,CUBr
,CuC1,K1,KCI等が好ましい。これらのハロ
ゲン化物は単独で後述するような各種の層緩成を形成し
てもよく、二種以上のハロゲン化物を絹合せて用いても
よい。The halide that can most effectively carry out the present invention is A.
g, A is r, A and 1, Pb12, PbBr2, POC1
2, PbF2, Sn12, SnC12, C mountain, CUBr
, CuC1, K1, KCI, etc. are preferred. These halides may be used alone to form various types of layer relaxation as described below, or two or more halides may be used in combination.
これらのハロゲン化物は前述の金属を支持体上に設ける
方法と同様の方法によって支持体上にハロゲン化物層と
して設けても良いし或いは金属との混合層として設けて
も良い。ハロゲン化物層の膜厚は、高エネルギー密度の
光ビームの照射により、前述の金属の融解、、蒸発又は
凝集等の熱的変形を最も容易に行なわせるに最適の厚さ
に選べばよい。These halides may be provided as a halide layer on the support by the same method as the above-mentioned method for providing the metal on the support, or may be provided as a mixed layer with the metal. The thickness of the halide layer may be selected to be the optimum thickness to most easily cause the metal to undergo thermal deformation such as melting, evaporation, or aggregation by irradiation with a high-energy-density light beam.
ハロゲン化物層の最適膜厚は金属の種類、膜厚、等によ
って異なるが通常50A〜1000A程度が好ましい。
本発明に於いて、支持体上に設けられる金属とハロゲン
化物とを含む記録層の構成は種々の形態をとることが出
来る。The optimum film thickness of the halide layer varies depending on the type of metal, film thickness, etc., but is usually preferably about 50A to 1000A.
In the present invention, the structure of the recording layer containing metal and halide provided on the support can take various forms.
本発明によれば、記録層は金属層とハロゲン化物層との
二層或いは三層以上の多層膜から構成されても良いし、
また金属とハロゲン化物とが物理的に混在した混合層と
して糠成されても良い。According to the present invention, the recording layer may be composed of a multilayer film of two layers or three or more layers including a metal layer and a halide layer,
Alternatively, a mixed layer in which a metal and a halide physically coexist may be formed.
また金属とハロゲン化物層との混合物と金属層あるいは
ハロゲン化物層とを組合せた記録層を構成しても良い。
金属とハロゲン化物層との混合層の膜厚は記録材料とし
て必要な光学濃度を得るに十分な厚さであれば良いが、
金属とハロゲン化物の種類及び割合によって当然異なる
。Further, the recording layer may be formed by combining a mixture of a metal and a halide layer with a metal layer or a halide layer.
The thickness of the mixed layer of metal and halide layer may be sufficient as long as it is thick enough to obtain the optical density required as a recording material.
Naturally, it varies depending on the type and ratio of metal and halide.
例えば透過濃度2を得るためには、金属とハロゲン化物
の割合を7対3の重量比で混合した場合400〜200
0A程度の膜厚の混合層を設ければ良い。混合層中の金
属とハロゲン化物との割合は金属及びハロゲン化物の種
類、混合物の膜厚によって異なるが、通常金属とハロゲ
ン化物との重量比はlm封1から1対1程度が好ましい
。支持体上に金属とハロゲン化物より成る混合層を設け
る方法としては、真空蒸着、スパッタリング、イオンプ
レーティング等が用いられる。For example, in order to obtain a transmission density of 2, if the metal and halide are mixed at a weight ratio of 7:3,
A mixed layer with a thickness of about 0A may be provided. The ratio of metal to halide in the mixed layer varies depending on the types of metal and halide and the film thickness of the mixture, but it is usually preferable that the weight ratio of metal to halide is about 1 to 1. Vacuum deposition, sputtering, ion plating, etc. are used as a method for providing a mixed layer of metal and halide on the support.
例えば金属とハロゲン化物をそれぞれ別々の蒸発源を用
いて、支持体上に同時に真空蒸着することによって混合
層を設けることが出釆る。金属とハロゲン化物層の各々
の蒸発源の温度、仕込量を制御することによって各々の
蒸発速度を制御し、任意の割合の金属とハロゲン化物の
混合層を支持体上に設けることが出来る。前述の金属と
ハロゲン化物から成る記録層上に保護層を設けると記録
材料としての耐久性、機械的強度、経時安定性が飛躍的
に改善される。For example, a mixed layer can be provided by simultaneously vacuum-depositing a metal and a halide onto a support using separate evaporation sources. By controlling the temperature and charge amount of each evaporation source for the metal and halide layer, the evaporation rate of each layer can be controlled, and a mixed layer of metal and halide in an arbitrary ratio can be provided on the support. When a protective layer is provided on the recording layer made of the metal and halide described above, the durability, mechanical strength, and stability over time of the recording material are dramatically improved.
保護層としては使用する高エネルギー密度の光ビームに
対して透過性であること、機械的強度が大であること、
記録層と反応いこくいこと、被膜性の良いこと、製造が
容易なこと等が要求される。本発明の保護層として用い
られる樹脂は種々のものが可能であるが例えばポリスチ
レン、スチレン−無水マレィン酸樹脂のごときスチレン
系樹脂、ポリ酢酸ビニル、ポリビニルアルコール・フチ
ラール、ポリビニルホルマールの如き酢酸ビニル系樹脂
、ポリメタクリル酸ィソブチル、ポリメタクリル酸メチ
ルのごときメタクリル酸ヱネテル系樹脂、ポリダィアセ
トンアクリルアミド、ポリアクリルアミドのごときアミ
ド系樹脂、エチルセルロース、酢酸ラク酸セルロース、
硝酸セルロ−ス、ジアセチルセルロースのごときセルロ
ース系樹脂、ポリ塩化ビニル、塩素化ポIJエチレンの
ごときポリハロゲン化オレフィン、フェノール樹脂、可
溶性ポリエステル、可溶性ナイロン、ゼラチン等及びこ
れらの共重合物等から選ばれる。これらの樹脂は種々の
溶剤に溶かして既知の塗布方法により塗布することが出
来る。用いられる溶剤としては各種の溶剤があるが、例
えばアセトン、メチルエチルケトン、メチルイソブチル
ケトン、メチルセロソルブ、エチルセロソルブ、プチル
セロソルブ、メチルセロソルプアセテート、エチルセロ
ソルブアセテート、ブチルセロソルブアセテート、ヘキ
サン、シクロヘキサン、ヱチクロ、メチクロ、ベンゼン
、クロルベンゼン、メタノール、エタノール、ブタノー
ル、石油エーテル、ジメチルホルムアミド、シンナー等
の中から、使用する樹脂に応じて選べば良い。The protective layer must be transparent to the high energy density light beam used and have high mechanical strength.
It is required to react well with the recording layer, have good coating properties, and be easy to manufacture. Various resins can be used as the protective layer of the present invention, including styrene resins such as polystyrene, styrene-maleic anhydride resin, vinyl acetate resins such as polyvinyl acetate, polyvinyl alcohol phtyral, and polyvinyl formal. , enether methacrylate resins such as polyisobutyl methacrylate and polymethyl methacrylate, amide resins such as polydiacetone acrylamide and polyacrylamide, ethyl cellulose, cellulose acetate lactate,
Selected from cellulose resins such as cellulose nitrate and diacetylcellulose, polyvinyl chloride, polyhalogenated olefins such as chlorinated polyethylene, phenolic resins, soluble polyesters, soluble nylons, gelatin, etc., and copolymers thereof, etc. . These resins can be dissolved in various solvents and applied by known coating methods. There are various solvents that can be used, such as acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, butyl cellosolve acetate, hexane, cyclohexane, ethyl cellosolve, methiclo , benzene, chlorobenzene, methanol, ethanol, butanol, petroleum ether, dimethylformamide, thinner, etc., depending on the resin used.
これらの樹脂の中には、顔料、マット化剤、可塑剤、滑
剤などの各種添加物を目的に応じて添加することが可能
であり、特に炭素原子数が11以上の高級脂肪酸、或い
は酸ァミドを0.1〜1肌t%程度添加することは記録
材料の腰面強度を向上させる点で効果がある。またこれ
らの高級脂肪酸或いは酸アミドのごとき滑剤は保護層上
に通常の方法で0.001〜1仏の厚さに塗布すること
も可能である。Various additives such as pigments, matting agents, plasticizers, and lubricants can be added to these resins depending on the purpose. In particular, higher fatty acids having 11 or more carbon atoms, or acid amides Adding about 0.1 to 1 skin t% of is effective in improving the lumbar strength of the recording material. Further, these lubricants such as higher fatty acids or acid amides can be applied to a thickness of 0.001 to 1 mm on the protective layer by a conventional method.
本発明に用いられる保護層の膜厚は記録材料として要望
される膜面強度、経時安定性、記録感度等から最適の厚
さに選ばれるが、特に0.01仏〜5仏の膜厚が好まし
い。本発明において支持体上に設けられる金属とハロゲ
ン化物とを含む記録材料の層構成は種々の形態をとるこ
とが出来る。The thickness of the protective layer used in the present invention is selected to be the optimum thickness in consideration of the surface strength, stability over time, recording sensitivity, etc. required for the recording material. preferable. In the present invention, the layer structure of the recording material containing metal and halide provided on the support can take various forms.
本発明による熱的記録材料は、記録感度を低下すること
なく、記録層の保護が向上したことが特長であり、保存
性が向上し、取扱い中の擦り傷の軽減も著しいとの効果
がある。The thermal recording material according to the present invention is characterized by improved protection of the recording layer without reducing recording sensitivity, and has the advantage of improved storage stability and significant reduction in scratches during handling.
特に本発明のごとくハロゲン化物を記録層に含有する場
合は、記録レーザの照射により発生したガスが保護層と
記録部の間にたまるため、保護層が突出し、傷がつき易
い。In particular, when a halide is contained in the recording layer as in the present invention, gas generated by recording laser irradiation accumulates between the protective layer and the recording section, so that the protective layer protrudes and is easily scratched.
このため特にハロゲン化物を含有する記録層との組み合
わせに於いて高級脂肪酸あるいは酸アミドの添加は効果
が大きい。以下に各種の層構成を図面を用いて説明する
。For this reason, the addition of higher fatty acids or acid amides is particularly effective in combination with a recording layer containing a halide. Various layer configurations will be explained below using drawings.
第1図〜第2図は記録材料の断面図であり、各図を通し
て、同じ参照番号が附されているものは同じ材料を示す
。第1図は最も典型的な記録材料の構成であり、支持体
1の上に金属層3をはさんでハロゲン化物層2を設けた
ものを示している。1 and 2 are cross-sectional views of recording materials, and throughout each figure, the same reference numerals refer to the same materials. FIG. 1 shows the most typical configuration of a recording material, in which a halide layer 2 is provided on a support 1 with a metal layer 3 sandwiched therebetween.
また第2図は金属層3とハロゲン化物層2とを多層構成
にしたものを示している。一方第3図に示すように、金
属とハロゲン化物を混合した混合層4を支持体1の上に
設けたものでも良い。Further, FIG. 2 shows a multilayer structure including a metal layer 3 and a halide layer 2. On the other hand, as shown in FIG. 3, a mixed layer 4 containing a metal and a halide may be provided on the support 1.
あるいは記録感度を上昇させるために他の物質を金属の
単体あるいは2種以上のものとを組み合せと共に混合し
た層をも含む。Alternatively, it may include a layer in which other substances are mixed with a single metal or a combination of two or more metals in order to increase the recording sensitivity.
これらの金属として特に望ましい条件は、毒性の少ない
こと、融解または蒸発に要するエネルギーが小さいこと
、膜の製造が容易であることなどで、最も好ましいもの
はSn,Bi,lnである。更に第4図に示すように支
持体1の上に金属層3とハロゲン化物層2をそれぞれ一
層だレナ設けた単純な構成のものでもよい。Particularly desirable conditions for these metals include low toxicity, low energy required for melting or evaporation, and ease of film production, and the most preferred are Sn, Bi, and In. Furthermore, as shown in FIG. 4, it may be of a simple structure in which a metal layer 3 and a halide layer 2 are each provided on the support 1 in a single layer.
第4図においては通常、光照射は記録層のある側から行
なうが、もし支持体側から照射した場合は第5図に示す
構成のものが望ましい。In FIG. 4, the light irradiation is normally performed from the side where the recording layer is located, but if the light is irradiated from the support side, the structure shown in FIG. 5 is preferable.
更に第6図及び第7図は、本発明の記録材料でありそれ
ぞれ第3図、第4図に示した層構成の上に更に保護層5
を設けたものである。Further, FIGS. 6 and 7 show the recording material of the present invention, which further includes a protective layer 5 on the layer structure shown in FIGS. 3 and 4, respectively.
It has been established.
本発明により、耐傷性が高く、記録感度が高く、画質が
よく、無毒性の、高エネルギー密度の光ビームに対する
優れた記録材料が得られた。According to the present invention, a recording material with high scratch resistance, high recording sensitivity, good image quality, non-toxicity, and excellent resistance to high energy density light beams was obtained.
以下実施例によって本発明を具体的に説明する。実施例
1
厚さ100仏のポリエチレンテレフタレート支持体上に
真空度5×10‐5Tonの条件下でSnと各種ハロゲ
ン化物を第4図の如き層構成に真空蒸着し、第1表に示
されるごとき構成からなる記録材料を作成した。EXAMPLES The present invention will be specifically explained below with reference to Examples. Example 1 On a polyethylene terephthalate support with a thickness of 100 mm, Sn and various halides were vacuum-deposited under vacuum conditions of 5 x 10-5 tons in a layer configuration as shown in Figure 4, and as shown in Table 1. A recording material consisting of the following composition was created.
各層の膜厚は透過濃度が1〜2の範囲に入るようにSn
を350A、ハロゲン化物200〜400Aに選んだ。
これらの記録材料に、記録層側から最大出力2Wのアル
ゴンイオンレーザビーム(波長5145A)をレンズで
約25仏のビーム径に集光させて、働け/secの走査
速度で走査させて記録を行なった。The film thickness of each layer is set so that the transmission density is in the range of 1 to 2.
was selected to be 350A, and 200 to 400A for the halide.
Recording was performed on these recording materials by scanning an argon ion laser beam (wavelength 5145A) with a maximum output of 2W from the recording layer side with a lens at a scanning speed of about 25mm/sec. Ta.
上記の記録材料上に照射するレーザ出力強度を変化させ
て照射し、10仏座の記録スポットが得られるレーザ出
力強度を求め、この値の大小で記録材料の相対的な感度
評価を行なった。第1表にハロゲン化物の種類、膜厚、
記録に要したレーザ出力強度の値を記載した。第1表
この表から明らかな如く、金属(Sn)単層の場合より
も前述の如きハロゲン化物を粗合せた記録材料の方が約
2〜4倍も感度が高い。The above-mentioned recording material was irradiated with varying laser output intensity, and the laser output intensity at which 10 recording spots were obtained was determined, and the relative sensitivity of the recording material was evaluated based on the magnitude of this value. Table 1 shows the type of halide, film thickness,
The value of the laser output intensity required for recording is listed. Table 1 As is clear from this table, the sensitivity of the recording material containing a coarse mixture of halides as described above is about 2 to 4 times higher than that of a single layer of metal (Sn).
一般に熱的記録材料に於いては、高ェネルギ密度で短時
間照射した場合と、低ェネルギ密度で長時間照射した場
合とを比較すると、明らかに前者の方が、記録に要する
全エネルギーは少なく、いわゆる相反則不軌が生ずる。In general, with thermal recording materials, if you compare short-time irradiation with high energy density and long-time irradiation with low energy density, it is clear that the former requires less total energy for recording; A so-called reciprocity failure occurs.
本実施例に示される記録に要するエネルギーはしーザビ
ームのスポット径及び走査速度を一定にしてレーザビー
ムの出力強度を変化させて、記録に要する最4・ェネル
ギを求めたものであるが、例えば、レーザビームの出力
強度を一定にし、且つレーザビームのスポット蓬を一定
にし、走査速度を変化させて記録可能な最大走査速度の
大小から記録材料としての相対感度を比較することも可
能である。このような方法で相対感度を比較すれば、第
1表に記載のハロゲン化物の有る場合とない場合とでは
、相対感度差は前述の2〜4倍という値よりもずつ大き
な値になることは明らかである。The energy required for recording shown in this example was determined by changing the laser beam output intensity while keeping the laser beam spot diameter and scanning speed constant, and the maximum energy required for recording, for example, It is also possible to compare the relative sensitivity of the recording material based on the magnitude of the maximum recordable scanning speed by keeping the output intensity of the laser beam constant and the spot size of the laser beam constant, and changing the scanning speed. If we compare the relative sensitivities using this method, we can see that the difference in relative sensitivity between the cases with and without the halides listed in Table 1 is larger than the 2 to 4 times the value mentioned above. it is obvious.
例えば、第1表における試料番号1と2、を35肌Wの
レーザ出力強度で、25ム径のレーザビームで、走査速
度を変えて記録感度を比較したところ、試料番号2の方
が試料番号1よりも8倍以上の高感度であることがわか
った。 また支持体側からしーザビームを照射した場合
も、ハロゲン化物を用いた方が金属単層よりも高感度で
あった。以下に述べる実施例においては、相対記録感度
は第1表に示したごとき記録に要する最小のレーザ出力
強度の大小で評価したものである。For example, when we compared the recording sensitivities of sample numbers 1 and 2 in Table 1 with a laser output intensity of 35 skin W and a laser beam with a diameter of 25 mm, we found that sample number 2 was better than sample number 2. It was found that the sensitivity was 8 times or more higher than that of 1. Also, when the laser beam was irradiated from the support side, the sensitivity was higher when using a halide than when using a single metal layer. In the examples described below, the relative recording sensitivity was evaluated based on the minimum laser output intensity required for recording as shown in Table 1.
実施例 2
実施例1の場合と同様に、支持体上に各種金属とハロゲ
ン化物(Pb12)とを積層し、実施例1と同様の方法
で相対感度の評価を行なった。Example 2 As in Example 1, various metals and halides (Pb12) were laminated on a support, and the relative sensitivity was evaluated in the same manner as in Example 1.
その結果を第2表に示す。The results are shown in Table 2.
第2表
表から明らかな如く、金属単層の場合よりもハロゲン化
物(Pb12)を用いた記録材料の方が感度が高い。As is clear from Table 2, the sensitivity of the recording material using a halide (Pb12) is higher than that of a single metal layer.
組合せによっては約1M音も高感度になるものがある。
この表に示した金属の他にも、Tj,Cr,Fe,Co
,Ni,Cu,Ag,Ce,Zn,Mn,Mg,Sb,
等に、Pb12及びこれ以外のハロゲン化物を組合せた
場合も、金属単層の場合に比べて同様に感度が高かった
。実施例 3厚さ100一のポリエチレンテレフタレー
ト支持体上に、真空度5×lo‐5Tonの条件下で金
属(Sn又はBi)Pb12を第3図の如き構成で真空
蒸着した。Depending on the combination, there are some that have a high sensitivity of about 1M sound.
In addition to the metals shown in this table, Tj, Cr, Fe, Co
, Ni, Cu, Ag, Ce, Zn, Mn, Mg, Sb,
Similarly, when Pb12 and other halides were combined, the sensitivity was similarly high compared to the case of a single metal layer. Example 3 On a polyethylene terephthalate support having a thickness of 100 mm, metal (Sn or Bi) Pb12 was vacuum-deposited in a configuration as shown in FIG. 3 under conditions of a degree of vacuum of 5×lo-5 Ton.
金属とPb12との混合層は、金属(Sn又はBi)用
の蒸発源と、Pb12用の蒸発源との2種類の蒸発源を
用い、それぞれを所望の蒸発速度になるように温度制御
を行ない、同時に支持体に付着するようにして作成した
。混合層の膜厚は、透過温度1〜2を得るため550A
とした。混合層中の金属(Sn又はBi)とPb12の
割合は、重量比で7対3に選んだ。このようにして得ら
れた記録材料は、実施例1及び2で述べたような金属と
ハロゲン化物との2層構成の場合と異なり、干渉色を示
さない。The mixed layer of metal and Pb12 is created by using two types of evaporation sources, one for the metal (Sn or Bi) and the other for Pb12, and controlling the temperature of each to achieve the desired evaporation rate. At the same time, they were made so as to be attached to a support. The thickness of the mixed layer is 550A to obtain a transmission temperature of 1 to 2.
And so. The ratio of metal (Sn or Bi) to Pb12 in the mixed layer was selected to be 7:3 by weight. The recording material thus obtained does not exhibit interference colors, unlike the two-layer structure of metal and halide described in Examples 1 and 2.
実施例1と同様の方法で記録材料の相対感度評価を行な
った。SnとPb12との浪合層の場合も、BiとPb
12との混合層の場合も、100〜125hWのレーザ
出力強度で十分記録出来た。また、支持体側から光ビー
ムを照射した場合も、記録層側から光ビームを照射した
場合も、ほとんど同じ感度を示した。The relative sensitivity of the recording material was evaluated in the same manner as in Example 1. In the case of a mixture layer of Sn and Pb12, Bi and Pb
In the case of a mixed layer with 12, sufficient recording was possible with a laser output intensity of 100 to 125 hW. Furthermore, almost the same sensitivity was exhibited whether the light beam was irradiated from the support side or the recording layer side.
即ち混合層を用いることにより金属単体の場合に比べて
2〜4倍感度が向上した。またこのようにして作成した
混合層上に更にPb12を200A積層した場合も同時
に10皿Wで十分記録出来た。実施例 4
実施例1と同じ支持体上に真空度5×
10‐5Torrの条件下で、金属(Sn又はBi)と
Pb12を第1図の如き構成で真空蒸着した。That is, by using the mixed layer, the sensitivity was improved by 2 to 4 times compared to the case of a single metal. Furthermore, even when Pb12 was further laminated at 200A on the mixed layer thus prepared, sufficient recording was possible with 10 plates W at the same time. Example 4 On the same support as in Example 1, metal (Sn or Bi) and Pb12 were vacuum-deposited in the configuration shown in FIG. 1 under a vacuum condition of 5 x 10-5 Torr.
支持体側から順にPb1250A、金属350A、Pb
12150Aに選んだ3層構成の記録材料を作成した。
実施例1と同様の方法で相対感度の評価を行なった。S
nの場合も、Biの場合も、100〜125hWのレー
ザ出力強度で十分記録することが出来た。また第2図に
示される如く、Pb1250Aと金属(Sn又はBi)
200Aを交互に支持体上に設けた場合も、同様に10
0〜125hWのレーザ出力強度で記録することが出来
た。実施例 5
実施例1と同様の方法で、第5図のように支持体上にP
b12を200A、金属(Sn又はBi)を350A、
順次横層した記録材料を作成した。From the support side: Pb1250A, metal 350A, Pb
A recording material having a three-layer structure selected as 12150A was prepared.
Relative sensitivity was evaluated in the same manner as in Example 1. S
In both cases of n and Bi, sufficient recording was possible with a laser output intensity of 100 to 125 hW. Also, as shown in Figure 2, Pb1250A and metal (Sn or Bi)
Similarly, when 200 A is provided alternately on the support, 10
It was possible to record with a laser output intensity of 0 to 125 hW. Example 5 In the same manner as in Example 1, P was deposited on the support as shown in Figure 5.
b12 at 200A, metal (Sn or Bi) at 350A,
A recording material with sequential horizontal layers was prepared.
実施例1と同様の方法で感度の評価を行なったところ、
支持体側からしーザ光を照射した場合100〜125m
Wで記録出来た。また、記録層側からしーザ光を照射し
た場合も、金属単層に比べて高感度であった。実施例
6
実施例1と同様の支持体上に、真空度5×10‐5To
nの条件下で、Bi,Sn,Pb12の順で真空蒸着し
た。When sensitivity was evaluated in the same manner as in Example 1,
100 to 125 m when Caesar light is irradiated from the support side
I was able to record it with W. Also, when laser light was irradiated from the recording layer side, the sensitivity was higher than that of a single metal layer. Example
6 On the same support as in Example 1, vacuum degree 5 × 10-5 To
Bi, Sn, and Pb12 were vacuum-deposited in this order under conditions of n.
得られた記録材料は実施例1と同様の方法で相対感度の
評価を行なった。結果を第3表に示す。The relative sensitivity of the obtained recording material was evaluated in the same manner as in Example 1. The results are shown in Table 3.
第3表
この表から明らかな如く「金属層の腹層を厚くして、透
過濃度を2以上とした場合にも、金属単層の場合に比べ
て高感度であることがわかった。Table 3 As is clear from this table, it was found that even when the thickness of the metal layer was increased to increase the transmission density to 2 or more, the sensitivity was higher than in the case of a single metal layer.
即ち、透過濃度の高いことが要求される場合は、金属単
層では非常に大きなレーザ出力強度を必要とするが、本
発明によれば、著しく感度が高い記録材料が得られる。
実施例 7
実施例1に記載した各種記録層上に、塩素化ポリェチレ
ン(山陽国策パルプ製LPA)1g、トリフェニルフオ
スフエイト0.1後、ステアリン酸アミド30の9をト
ルヱン10雌に溶かした後、約0.2一の厚さに塗布し
、更にステアリン酸1g、べへン酸0.巡をnーヘキサ
ン10腿に溶かした後、約0.02ムの厚さに塗布し保
護層を形成した。That is, when a high transmission density is required, a single metal layer requires a very high laser output intensity, but according to the present invention, a recording material with extremely high sensitivity can be obtained.
Example 7 On the various recording layers described in Example 1, 1 g of chlorinated polyethylene (LPA manufactured by Sanyo Kokusaku Pulp), 0.1 g of triphenyl phosphate, and 9 parts of stearic acid amide dissolved in 10 parts of toluene were added. After that, apply it to a thickness of about 0.2 mm, and then add 1 g of stearic acid and 0.0 g of behenic acid. A protective layer was formed by dissolving the solution in 10 μm of n-hexane and applying it to a thickness of about 0.02 μm.
このようにして得た各種記録材料について、実施例1と
同様の方法で相対感度の評価をした。結果は、第1表に
示した記録に要するレーザ出力強度が25〜5肌W増大
するだけで、金属(Sn)単層に比べて十分高感度であ
った。またこのような保護層を記録層上に設けることに
より、表面の腰面強度が著しく向上した。実施例 8
厚さ100山mのポリエチレンテレフタレートフィルム
上に真空度5×10‐5Tonの条件下でSnを350
A蒸着して金属層を形成せしめ、さらにその上に第4表
に示されているごとく各試料ごとに各々の化合物を蒸着
して2層からなる記録層を形成せしめた。The relative sensitivities of the various recording materials thus obtained were evaluated in the same manner as in Example 1. As a result, the laser output intensity required for recording shown in Table 1 increased by only 25 to 5 W, and the sensitivity was sufficiently high compared to a single metal (Sn) layer. Further, by providing such a protective layer on the recording layer, the surface strength of the surface was significantly improved. Example 8 350% Sn was deposited on a polyethylene terephthalate film with a thickness of 100 m under a vacuum degree of 5 x 10-5 Ton.
A metal layer was formed by vapor deposition of A, and each compound was further vapor-deposited for each sample as shown in Table 4 on top of the metal layer to form a recording layer consisting of two layers.
このとき各試料の透過光学濃度は1〜2の範囲内の値で
あった。この段階の試料をAとし、各試料をそれぞれ試
料A,〜試料A6とする。次いで、各試料について各々
の1片に塩素化ポリエチレン(山陽国策パルプ■製、“
LTA−305’’、塩素含有率が65〜6溝重量%、
2の重量%トルェン溶液の2500における粘度が4〜
7cps.)のトルェン溶液を乾燥膜厚が3rmになる
ように塗布した。At this time, the transmitted optical density of each sample was within the range of 1 to 2. The sample at this stage is designated as A, and the samples are designated as Sample A to Sample A6, respectively. Next, for each sample, one piece of chlorinated polyethylene (manufactured by Sanyo Kokusaku Pulp ■, "
LTA-305'', chlorine content 65-6 groove weight%,
The viscosity at 2500 of a wt% toluene solution of 2 is 4~
7cps. ) was applied so that the dry film thickness was 3rm.
この段階の試料をBとし、各試料を試料B〜試料B8と
する。他方、試料A,〜試料んの他の1片に上記の塩素
化ポリエチレン層を乾燥膜厚が0.6ムmになるように
塗設した。The sample at this stage is designated as B, and each sample is designated as Sample B to Sample B8. On the other hand, the above chlorinated polyethylene layer was coated on the other pieces of Sample A to Sample N so that the dry film thickness was 0.6 mm.
この段階の試料をCとし、各試料を試料C,〜試料C8
とする。さらにC試料の一片をとり、それぞれ、有機脂
肪酸としてステァリン酸1gおよびべへン酸0.※をへ
キサン2そに溶かし乾燥膜厚0.05一mになるように
塗布した。この段階での試料をDとし、各試料を試料D
.・〜試料D8とする。これらの各誌料に記録層側から
最大出力2Wのアルゴン・イオン・レーザビーム(波長
5145A)をレンズで25rmのビーム径に集光させ
て19m/secの走査速度で走査記録をおこない、各
試料に10rm径の記録跡が形成される最小のレーザ出
力強度を求めた。The sample at this stage is designated as C, and each sample is designated as sample C, ~ sample C8.
shall be. Furthermore, a piece of sample C was taken, and 1 g of stearic acid and 0.0 g of behenic acid were each taken as organic fatty acids. * was dissolved in 2 hexane and applied to a dry film thickness of 0.051 m. The sample at this stage is designated as D, and each sample is designated as sample D.
.. - Sample D8. An argon ion laser beam (wavelength 5145A) with a maximum output of 2W is focused on each of these journal materials from the recording layer side using a lens to a beam diameter of 25rm, and scanning recording is performed at a scanning speed of 19m/sec. The minimum laser output intensity at which a recording trace with a diameter of 10 rms was formed was determined.
またこれらの試料の膜厚強度を新東科学■製“HEmO
N−18”膜面強度計によりR球針(R=0.4柵)を
用いて荷重を加えながら表面にキスがつく最小荷重をも
って膜強度の指標とした。これらの測定の結果は、第4
表に示した通りである。In addition, the film thickness and strength of these samples were measured using “HEmO” manufactured by Shinto Kagaku.
While applying a load using an R ball needle (R = 0.4 fence) using an N-18" membrane surface strength meter, the minimum load that caused a kiss on the surface was taken as an index of membrane strength. The results of these measurements were 4
As shown in the table.
第4表
第4表に示されているように、記録層上に塩素化ポリエ
チレン層(3ムm)を設けた試料B〜試料B8は、それ
ぞれ記録層のみの試料A,〜教料んに対比すると膜面強
度はかなり向上するもののレーザーの最小所要出力は大
きい。Table 4 As shown in Table 4, samples B to B8 in which a chlorinated polyethylene layer (3 mm) was provided on the recording layer are different from sample A in which only the recording layer was provided, and sample A in which only the recording layer was provided. In comparison, although the film surface strength is considerably improved, the minimum required output of the laser is large.
つまり記録感度が著しく劣っている。そして塩素化ポリ
エチレン層を厚さ0.6一mと薄くした場合の試料C,
〜試料C8は、それぞれ試料A,〜試料A8に比べると
記録感度はほゞ同程度に保つことができたが、膜面強度
は試料B〜試料B3に及ばなかった。しかしながら本発
明による試料D,〜試料D2は記録感度は各試料Cの程
度を維持し、しかも膜面強度はきわめて高い値を示した
。実施例 9
実施例8の場合の記録層中の金属層の金属SnをBiに
代え、他は実施例8の場合と全く同様にして実施したと
ころ、それぞれほとんど同様な結果が得られた。In other words, the recording sensitivity is significantly inferior. Sample C, in which the chlorinated polyethylene layer was made as thin as 0.61 m,
~Sample C8 was able to maintain the recording sensitivity at approximately the same level as Sample A and ~Sample A8, respectively, but the film surface strength was not as high as Samples B~Samples B3. However, Samples D and D2 according to the present invention maintained the recording sensitivity at the same level as Sample C, and exhibited extremely high film surface strength. Example 9 Example 8 was carried out in exactly the same manner as in Example 8 except that the metal Sn in the metal layer in the recording layer was replaced with Bi, and almost the same results were obtained in each case.
実施例 10
厚さ100〃mのポリエチレンテレフタレートフィルム
上に真空度5×10‐5Torrの条件下で金属層とし
てSnを厚さ350Aに、化合物層としてGeSを厚さ
200Aにそれぞれ蒸着して記録層を形成せしめた。Example 10 A recording layer was prepared by depositing Sn as a metal layer to a thickness of 350A and GeS as a compound layer to a thickness of 200A on a polyethylene terephthalate film with a thickness of 100㎜ under vacuum conditions of 5 x 10-5 Torr. was formed.
この段階の試料を試料Aとする。次いで試料Aの二片の
上に有機高分子保護層としてそれぞれ下記の高分子物質
の溶液■及び溶液■を3ムm及び0.6山mに塗布して
形成せしめた。溶液■:ポリスチレンの10%トルェン
溶液溶液■:ポリウレタン(米国グッドリッチ社‘‘エ
スタン571r)の10%メチルエチルケトン溶液これ
らの試料を第5表の通りとする。The sample at this stage is referred to as sample A. Next, on the two pieces of Sample A, solutions 1 and 2 of the following polymeric substances were applied as organic polymer protective layers to 3 mm and 0.6 m, respectively, to form organic polymer protective layers. Solution ■: 10% toluene solution of polystyrene Solution ■: 10% methyl ethyl ketone solution of polyurethane (Estan 571r, Goodrich Co., USA) These samples are as shown in Table 5.
第6表
試料C,及び試料C2については、さらにステアリン酸
1gとべへン酸0.3gをへキサン2夕に溶解した溶液
を乾燥膜厚0.05Amになるように塗布した。For Samples C and C2 in Table 6, a solution of 1 g of stearic acid and 0.3 g of behenic acid dissolved in 20 ml of hexane was further applied to give a dry film thickness of 0.05 Am.
この段階の試料を試料D,及び試料D2とする。上記の
各試料について、実施例8の場合と同様にしてレーザー
記録に要する最小のレーザー出力強度及び膿面強度を測
定した。The samples at this stage are referred to as sample D and sample D2. For each of the above samples, the minimum laser output intensity and pus surface intensity required for laser recording were measured in the same manner as in Example 8.
その結果は第6表に示した通りである。第5表実施例
11
実施例10における試料B2の上に、テレピン油に溶か
したステァリン酸ァミドを乾燥膜厚が0.05仏になる
ように塗布した。The results are shown in Table 6. Table 5 Examples
11 Stearic acid amide dissolved in turpentine oil was applied onto sample B2 in Example 10 so that the dry film thickness was 0.05 mm.
この試料について実施例8と同様なテストをした結果、
レーザー記録のための最小所要出力が275mW、膜面
強度は1.5k9であった。すなわち実施例8における
試料D2の場合と比較すれば明らかなように、ステァリ
ン酸等に代えて高級脂肪酸アミドを用いた場合でも高級
脂肪酸と同様な結果があった。実施例 12
実施例8における試料C、及び試料C7について、保護
層たる塩素化ポリエチレン層に代えて下記の処方の組成
物を塗布し、他は上記試料C,及び試料C7の場合と同
様にして記録材料を作成した。As a result of testing similar to Example 8 on this sample,
The minimum required power for laser recording was 275 mW, and the film surface strength was 1.5k9. That is, as is clear from a comparison with the case of sample D2 in Example 8, even when higher fatty acid amide was used instead of stearic acid etc., the same results as with higher fatty acids were obtained. Example 12 For Sample C and Sample C7 in Example 8, a composition with the following formulation was applied in place of the chlorinated polyethylene layer serving as a protective layer, and the other conditions were the same as in the case of Sample C and Sample C7. Created recording materials.
処方
塩素化ポリエチレン 曙(実施例1に
同じ)
メチルエチルケトン 50gメチ
ルセロソルブアセテート 50gステアリン
酸 30mgこれらの試料について
実施例8の場合と同様なテストをした結果、それぞれ実
施例8の場合と同じ結果が得られた。Recipe Chlorinated polyethylene Akebono (same as Example 1) Methyl ethyl ketone 50 g Methyl cellosolve acetate 50 g Stearic acid 30 mg These samples were tested in the same manner as in Example 8, and the same results as in Example 8 were obtained. Ta.
すなわち試料C,に対応する本実施例の試料では記録レ
ーザ出力に12靴Wを要し、膜面強度は1.5k9であ
り、試料C7に対応する本実施例の試料では記録レーザ
出力に225hWを要し、膜面強度は1.5k9である
。このように高級脂肪酸に代えて高級脂肪酸アミドを用
いても、また保護層上に高級脂肪酸を塗布する代りに保
護層内に高級脂肪酸又は同アミドを含有せしめてもいず
れも同様な効果があることが認められた。実施例 13
実施例12で用いたステアリン酸の代りにステアリン酸
ァミドを用いた場合にも、実施例12とまったく同じ効
果が得られた。That is, in the sample of this example corresponding to sample C, the recording laser output requires 12 W and the film surface strength is 1.5k9, and in the sample of this example corresponding to sample C7, the recording laser output requires 225 hW. The film surface strength is 1.5k9. In this way, even if a higher fatty acid amide is used instead of a higher fatty acid, and even if a higher fatty acid or the same amide is contained in the protective layer instead of coating the higher fatty acid on the protective layer, the same effect can be obtained. was recognized. Example 13
Even when stearamide was used in place of the stearic acid used in Example 12, exactly the same effect as in Example 12 was obtained.
また実施例2〜6に記載した各種の記録材料の記録層上
に同様の保護層を設けた場合も記録に要するレーザ出力
強度は25〜5仇hW増大するだけで、金属単層の場合
に比べて十分高感度であった。Furthermore, when a similar protective layer is provided on the recording layer of the various recording materials described in Examples 2 to 6, the laser output intensity required for recording increases by only 25 to 5 hW, compared to the case of a single metal layer. The sensitivity was sufficiently high.
また本発明の記録材料の記録痕跡を走査型電子顕微鏡を
用いて拡大して観察したところ、レーザビーームスポッ
トが当った部分の記録層は、完全に除去されているが或
いは記録されたスポットの周辺に小さい粒子として凝集
していることが確認された。Furthermore, when the recording traces of the recording material of the present invention were observed under magnification using a scanning electron microscope, it was found that the recording layer in the area hit by the laser beam spot was completely removed, or that the recorded spot was completely removed. It was confirmed that small particles were agglomerated around the periphery.
このため本発明によりコントラストの高い、画質のすぐ
れた高感度記録材料が得られた。実施態様 1支持体上
にSn,Bi,lnから選ばれた金属と光照射により熱
的又は光化学的に活性化され前記金属の融解、蒸発又は
凝集等の熱的変形を促進しうるハロゲン化物とを含む記
録層が設けられ、その上に有機高分子を主成分とする保
護層が設けられている記録材料において、該保護中ある
いは該保護層上に炭素原子数11以上の高級脂肪酸ある
いは高級脂肪酸ァミドが存在することを特徴とする記録
材料。Therefore, according to the present invention, a high-sensitivity recording material with high contrast and excellent image quality was obtained. Embodiment 1 A metal selected from Sn, Bi, and ln and a halide that can be thermally or photochemically activated by light irradiation and promote thermal deformation such as melting, evaporation, or aggregation of the metal on a support. In a recording material in which a recording layer containing 11 or more carbon atoms or a higher fatty acid containing 11 or more carbon atoms is provided in or on the protective layer containing an organic polymer as a main component. A recording material characterized by the presence of amamide.
実施態様 2
支持体上に、Sn,Bi,lnから選ばれた金属と光照
射により熱的又は光化学的に活性化され前記金属の融解
、蒸発又は凝集等の熱的変形を促進しぅるハoゲン化物
で、Ag1,AgBr,Aや1,Pb12,PbBr2
,PbC12,PbF2,Sn12,SnC12,C山
,C燈r,CuC1,K1,KCI等から選ばれたもの
とを含む記録層が設けられ、その上に有機高分子を主成
分とする保護層が設けられている記録材料において、該
保護層中あるいは該保護層上に炭素原子数11以上の高
級脂肪酸あるいは高級脂肪酸アミドが存在することを特
徴とする記録材料。Embodiment 2 A metal selected from Sn, Bi, and ln and a metal that is thermally or photochemically activated by light irradiation to promote thermal deformation such as melting, evaporation, or aggregation of the metal are placed on a support. o Genide, Ag1, AgBr, A, 1, Pb12, PbBr2
, PbC12, PbF2, Sn12, SnC12, C mountain, C light, CuC1, K1, KCI, etc., and a protective layer containing an organic polymer as a main component is provided thereon. 1. A recording material comprising a higher fatty acid or a higher fatty acid amide having 11 or more carbon atoms in or on the protective layer.
第1図〜第5図は記録材料の構成を示した図、第6図及
び第7図は本発明により得られる記録材料の層構成を示
す断面図である。
図中、1は支持体、2はハロゲン化物層、3は金属層、
4は金属とハロゲン化物との混合層、5は保護層を示す
。
第1図
第2図
第3図
第4図
第5図
第6図
第7図1 to 5 are diagrams showing the structure of a recording material, and FIGS. 6 and 7 are sectional views showing the layer structure of the recording material obtained by the present invention. In the figure, 1 is a support, 2 is a halide layer, 3 is a metal layer,
4 represents a mixed layer of metal and halide, and 5 represents a protective layer. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 7
Claims (1)
活性化され前記金属の融解、蒸発又は凝集等の熱的変形
を促進しうるハロゲン化物とを含む記録層が設けられ、
その上に有機高分子を主成分とする保護層が設けられて
いる記録材料において、該保護層中あるいは該保護層上
に炭素原子数11以上に高級脂肪酸あるいは高級脂肪酸
アミドが存在することを特徴とする記録材料。1. A recording layer containing a metal and a halide that can be thermally or photochemically activated by light irradiation and promote thermal deformation such as melting, evaporation, or aggregation of the metal is provided on a support,
A recording material on which a protective layer mainly composed of an organic polymer is provided, characterized in that a higher fatty acid or a higher fatty acid amide having 11 or more carbon atoms is present in or on the protective layer. Recording materials.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58036904A JPS6023998B2 (en) | 1983-03-07 | 1983-03-07 | recording material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58036904A JPS6023998B2 (en) | 1983-03-07 | 1983-03-07 | recording material |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51158464A Division JPS595117B2 (en) | 1976-12-29 | 1976-12-29 | recording material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58222884A JPS58222884A (en) | 1983-12-24 |
| JPS6023998B2 true JPS6023998B2 (en) | 1985-06-10 |
Family
ID=12482758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58036904A Expired JPS6023998B2 (en) | 1983-03-07 | 1983-03-07 | recording material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6023998B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0619855B2 (en) * | 1984-02-06 | 1994-03-16 | 株式会社リコー | Optical information recording medium |
-
1983
- 1983-03-07 JP JP58036904A patent/JPS6023998B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58222884A (en) | 1983-12-24 |
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