JPS6025803B2 - Metal thin film magnetic tape - Google Patents
Metal thin film magnetic tapeInfo
- Publication number
- JPS6025803B2 JPS6025803B2 JP5053478A JP5053478A JPS6025803B2 JP S6025803 B2 JPS6025803 B2 JP S6025803B2 JP 5053478 A JP5053478 A JP 5053478A JP 5053478 A JP5053478 A JP 5053478A JP S6025803 B2 JPS6025803 B2 JP S6025803B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- metal thin
- magnetic tape
- metal
- film magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 title claims description 23
- 229910052751 metal Inorganic materials 0.000 title claims description 23
- 230000005291 magnetic effect Effects 0.000 title claims description 19
- 239000010409 thin film Substances 0.000 title claims description 12
- 239000000463 material Substances 0.000 claims description 15
- 239000002245 particle Substances 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- 239000010419 fine particle Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 6
- 239000002923 metal particle Substances 0.000 description 5
- 229910001111 Fine metal Inorganic materials 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】
本発明は、高密度磁気記録用の金属薄膜形磁気テープの
改良に関し、磁気録音、銭画に用いられる高分子成形物
を基材とした最尺の磁気テープとして優れた特性を与え
ることを目的としたものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the improvement of a metal thin film magnetic tape for high-density magnetic recording. The purpose is to provide certain characteristics.
従来のy−Fe203,Cr02等の強磁性粉末を結合
剤と共に混合,塗布,硬化させたいわゆる塗布形の磁気
テープにおいても短波長記録指向に応じた改良がなされ
、保持力の向上と共に均一分散技術の向上等をはかって
きた。Conventional so-called coated magnetic tapes, in which ferromagnetic powders such as y-Fe203 and Cr02 are mixed with a binder, coated, and cured, have also been improved to meet the needs for short wavelength recording, and uniform dispersion technology has been developed along with improved holding power. We have been working to improve this.
一方、塗布後の処理技術も改良がなされ、表面粗さを小
さくする努力がはらわれてきた。この表面粗さについて
は、金属薄膜形磁気テープの場合は基材の表面粗さに依
存するので基材の平滑化の努力が払われているが、薄膜
の付着強度が低下する欠点があった。On the other hand, post-coating treatment techniques have also been improved, and efforts have been made to reduce surface roughness. Regarding this surface roughness, in the case of metal thin film magnetic tapes, efforts are being made to smooth the base material since it depends on the surface roughness of the base material, but this has the disadvantage of reducing the adhesion strength of the thin film. .
本発明者はこの点に鑑み、注意深い検討を加えた結果、
従来いわれていた、単なる線平均粗さ、最大粗さを前記
した付着強度の面を勘案しながら改良するのみでは限界
があることをつきとめた。In view of this point, the inventor has made careful consideration and found that
It has been found that there is a limit to merely improving the conventionally known linear average roughness and maximum roughness while taking into account the above-mentioned adhesive strength aspect.
第2図に示したくり返し走行による出力レベルの低下現
象がそれである。これは汎用のポリエチレンテレフタレ
ート等の高分子成形物基材上に、電解メッキ,真空蒸着
,スパッタリング,イオンプレーテイングのいずれかの
方法により得た膜についても同一額向を有する現象であ
った。This is the phenomenon in which the output level decreases due to repeated running as shown in FIG. This phenomenon was the same for films obtained by electrolytic plating, vacuum evaporation, sputtering, or ion plating on polymer molded substrates such as general-purpose polyethylene terephthalate.
この点の改良に特に顕著な効果を有したのは、基材へ添
加する金属粒子の形状であり、球状又はそれに近い楕円
球(好ましくは、最鞠/短軸比が2′1以下)であり、
かつ、後述する記録波長との関連において、平均粒径を
選択することであった。What had a particularly remarkable effect on improving this point was the shape of the metal particles added to the base material, which were spherical or nearly ellipsoidal (preferably with a maximum/minor axis ratio of 2'1 or less). can be,
In addition, the average particle diameter was selected in relation to the recording wavelength, which will be described later.
実施例に沿って更にこの点を詳述する。This point will be further explained in detail with reference to examples.
第1図において1は磁性金属層、2は下地層、3は平均
粒径が記録波長以下の金属粒子4を添加した高分子成形
物基材を示す構成を示したが、本発明はこれに固執する
ものでは勿論なく、保護層,磁性層の多層分割等の既に
提案されているいずれの構成をとっても良く、金属薄膜
形のいずれの構成についても基本的に効果を有するもの
である。In FIG. 1, 1 is a magnetic metal layer, 2 is an underlayer, and 3 is a polymer molded base material to which metal particles 4 having an average particle size smaller than the recording wavelength are added. Of course, it is not limited to this, and any structure that has already been proposed, such as a protective layer or a multi-layered magnetic layer, may be used, and basically any metal thin film structure will have an effect.
第1図に示した基材3が本発明の効果を引き出すもので
、金属微粒子4を基材3に添加し、猪性と帯電防止効果
を持たせると共に、特に粒径を記録波長以下にとること
で第2図に示すように従来のものに比べて出力レベルの
低下を防止できるものである。ここで金属微粒子の平均
粒蓬と記録波長との関係についてさらに述べる。The base material 3 shown in FIG. 1 brings out the effects of the present invention, and fine metal particles 4 are added to the base material 3 to give it a boar resistance and antistatic effect, and in particular to keep the particle size below the recording wavelength. As a result, as shown in FIG. 2, a decrease in the output level can be prevented compared to the conventional one. Here, the relationship between the average grain size of fine metal particles and the recording wavelength will be further described.
第3図は、記録波長入をパラメータとした時の金属微粒
子の平均粒径に対する出力特性図である。FIG. 3 is a graph showing output characteristics versus average particle diameter of metal fine particles when recording wavelength input is used as a parameter.
図より平均粒径が記録波長以下の場合において出力の低
下が見られないことがわかる。下地層2がCro.05
仏であり、磁性金属層1がCONi(Co班%Ni2%
)0.12一の例である。It can be seen from the figure that no decrease in output is observed when the average particle diameter is less than the recording wavelength. Base layer 2 is made of Cro. 05
The magnetic metal layer 1 is made of CONi (Co group%Ni2%
)0.121 is an example.
尚Cro.05叫まArl×10‐3Ton雰囲気で高
周波スパッタリング法にて得、CONi層は4×10‐
5Tonの酸素雰囲気中で電子ビーム蒸着法にて得たも
のである。尚、下地層2については、電子ビーム蒸着法
、イオンプレーティング法についても実施したが100
回くrり返し后も1凪以内であった。Nao Cro. The CONi layer was obtained by high-frequency sputtering method in an atmosphere of 0.05 yen Arl x 10-3 Ton, and the CONi layer was 4 x 10-
It was obtained by electron beam evaporation in a 5 ton oxygen atmosphere. Regarding the base layer 2, electron beam evaporation method and ion plating method were also performed, but 100%
Even after turning around, the temperature was within 1 lull.
又材料依存性についてもCrの他にAg,An,A〆,
Sj,Ti,W,Mo,ln,Sn等について検討した
が有位差のないことを確認している。磁性金属層1につ
いても同様であFe,Co,Niを主体として、非磁性
材料を加えたものについても同一傾向を有していること
を確かめている。Regarding material dependence, in addition to Cr, Ag, An, A〆,
We have investigated Sj, Ti, W, Mo, ln, Sn, etc., and have confirmed that there is no significant difference. The same is true for the magnetic metal layer 1, and it has been confirmed that the same tendency is observed for the magnetic metal layer 1, which is mainly composed of Fe, Co, and Ni, and in which non-magnetic materials are added.
尚本発明の基材3は下表に示したように、添加する金属
微粒子4と同一材料の下地層2を配設することで、高密
度記録に不可欠の保持力増大の効果も併せ有するととも
に、Aそ203,Si02等の汎用の添加剤を有するポ
リエチレンテレフタレートに比較して下地の有無にかか
わらず高密度化用基材として有望である。尚An,Ag
の糟性の優れた金属微粒子4の他、W,Mo,等につい
ても勿論効果を有するし、安定化のために表面にわずか
に酸化したものについても適用できるとともに、ポリカ
ーボネィト、ポリイミド、ポリアミド等についても同様
である。As shown in the table below, the base material 3 of the present invention has the effect of increasing the holding power, which is essential for high-density recording, by providing the base layer 2 of the same material as the metal fine particles 4 to be added. Compared to polyethylene terephthalate containing general-purpose additives such as , Aso203, Si02, etc., it is promising as a base material for densification regardless of the presence or absence of a base. Sho An, Ag
In addition to metal fine particles 4 with excellent tenacity, it is of course effective for W, Mo, etc., and can also be applied to those whose surfaces are slightly oxidized for stabilization, as well as polycarbonate, polyimide, polyamide, etc. The same applies to
いずれについても本発明の効果は、大きく、特に応力に
敏感な特性を有する金属薄膜の本質的欠陥をカバーでき
るもので、その工業的価値は大きいものである。In any case, the effects of the present invention are large, and can cover the essential defects of metal thin films, which have particularly stress-sensitive characteristics, and have great industrial value.
第1図は本発明の金属薄膜形磁気テープの一実施例を示
す断面図、第2図は同本発明と従来の金属薄膜形磁気記
録媒体の走行回数に対する相対出力レベル特性図、第3
図は高分子成形物基村中の金属微粒子の平均粒蚤に対す
る相対出力レベル特性図である。
1・・・・・・磁性金属届、2・・・・・・下地層、3
・・・・・・高分子成形物基材、4・・・・・・金属微
粒子。
第1図第2図
第3図FIG. 1 is a sectional view showing an embodiment of the metal thin film magnetic tape of the present invention, FIG. 2 is a relative output level characteristic diagram with respect to the number of runs of the metal thin film magnetic recording medium of the present invention and the conventional metal thin film magnetic recording medium.
The figure is a relative output level characteristic diagram with respect to the average particle size of fine metal particles in the polymer molded material. 1...Magnetic metal notification, 2...Underlayer, 3
... Polymer molded product base material, 4 ... Metal fine particles. Figure 1 Figure 2 Figure 3
Claims (1)
層を設けてなる金属薄膜形磁気テープにおいて、高分子
成形物基材に添加される金属微粒子の平均粒径が記録波
長以下であることを特徴とする金属薄膜形磁気テープ。 2 高分子成形物基材に添加される金属微粒子の主材と
同一の非磁性層を下地層とした特許請求の範囲第1項記
載の金属薄膜形磁気テープ。[Scope of Claims] 1. In a metal thin film magnetic tape formed by providing at least one magnetic metal layer on a polymer molded base material, the average particle size of metal fine particles added to the polymer molded base material is recorded. Metal thin film type magnetic tape characterized by being below the wavelength. 2. The metal thin film magnetic tape according to claim 1, wherein the base layer is a non-magnetic layer that is the same as the main material of the metal fine particles added to the polymer molded substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5053478A JPS6025803B2 (en) | 1978-04-26 | 1978-04-26 | Metal thin film magnetic tape |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5053478A JPS6025803B2 (en) | 1978-04-26 | 1978-04-26 | Metal thin film magnetic tape |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54141607A JPS54141607A (en) | 1979-11-05 |
| JPS6025803B2 true JPS6025803B2 (en) | 1985-06-20 |
Family
ID=12861656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5053478A Expired JPS6025803B2 (en) | 1978-04-26 | 1978-04-26 | Metal thin film magnetic tape |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6025803B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62171703U (en) * | 1986-04-23 | 1987-10-31 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5965928A (en) * | 1982-10-06 | 1984-04-14 | Matsushita Electric Ind Co Ltd | magnetic recording medium |
-
1978
- 1978-04-26 JP JP5053478A patent/JPS6025803B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62171703U (en) * | 1986-04-23 | 1987-10-31 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54141607A (en) | 1979-11-05 |
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