Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS6025835B2 - semiconductor memory circuit - Google Patents
[go: Go Back, main page]

JPS6025835B2 - semiconductor memory circuit - Google Patents

semiconductor memory circuit

Info

Publication number
JPS6025835B2
JPS6025835B2 JP54010872A JP1087279A JPS6025835B2 JP S6025835 B2 JPS6025835 B2 JP S6025835B2 JP 54010872 A JP54010872 A JP 54010872A JP 1087279 A JP1087279 A JP 1087279A JP S6025835 B2 JPS6025835 B2 JP S6025835B2
Authority
JP
Japan
Prior art keywords
voltage
capacitor
circuit
semiconductor memory
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54010872A
Other languages
Japanese (ja)
Other versions
JPS55105892A (en
Inventor
洋一 飛田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP54010872A priority Critical patent/JPS6025835B2/en
Publication of JPS55105892A publication Critical patent/JPS55105892A/en
Publication of JPS6025835B2 publication Critical patent/JPS6025835B2/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/4063Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
    • G11C11/407Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
    • G11C11/409Read-write [R-W] circuits 
    • G11C11/4099Dummy cell treatment; Reference voltage generators

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)

Description

【発明の詳細な説明】 この発明は1個のトランジスタと1個の容量によって構
成されたメモリセルを複数個用いた半導体記憶回路に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor memory circuit using a plurality of memory cells each composed of one transistor and one capacitor.

従来の回路を第1図に示す。A conventional circuit is shown in FIG.

図において1は“1”あるいは“0”のデータを記憶す
るための記憶容量、2は記憶容量1のデータを読み出し
あるいは書き込み、または記憶容量1に蓄えられたデー
タを保持しておくためのスイッチングトランジスタ、1
0は記憶容量1トランジスタ2からなるメモリセル、3
はメモリセル10‘こデータを伝達するビット線に付髄
する寄生容量、4は記憶容量を形成するのに必要な外部
電源である。一般的に4は半導体記憶回路に使われてい
る電源の中で最も高いレベルのものが使われる。第1図
の回路においてワード線に電圧が印加されたときにビッ
ト線上に読み出される電圧振幅は記憶容量1とビット線
の容量3のそれぞれの電圧と容量で決まり、この関係は
次式で表わされることが一般に知られている(例えば、
K.U.Steinand 日,FriendriCh
;“A 1−MiI2Singe‐Transist
or Memory cell in n Sili
con−GateTech皿logy”in lEEE
JOURNAL 。
In the figure, 1 is the storage capacity for storing "1" or "0" data, and 2 is the switching for reading or writing data in storage capacity 1, or for holding the data stored in storage capacity 1. transistor, 1
0 is a memory cell consisting of storage capacity 1 transistor 2, 3
4 is a parasitic capacitance attached to a bit line that transmits data to the memory cell 10', and 4 is an external power supply necessary to form a storage capacitor. Generally, 4 is the highest level power supply used in semiconductor memory circuits. In the circuit shown in Figure 1, the voltage amplitude read on the bit line when a voltage is applied to the word line is determined by the voltage and capacitance of storage capacitor 1 and bit line capacitor 3, and this relationship is expressed by the following equation. It is generally known that (for example,
K. U. Steinand Day, FriendriCh
; “A 1-MiI2Singe-Transist
or Memory cell in n Sili
con-GateTech plateology”in LEEE
JOURNAL.

F SOLID−STATE CIRCUITS VO
L SC− 8 NO.50Ct.197が.81露
参照)。△VB=吉事学費 ここでCsはメモリセルの記憶容量、CBはビット線の
容量、△VBはセルを読み出したときのビット線の電圧
変動分である。
F SOLID-STATE CIRCUITS VO
LSC-8 NO. 50Ct. 197 is. 81 Dew). ΔVB=Kichiji Tuition Fee Here, Cs is the storage capacity of the memory cell, CB is the capacitance of the bit line, and ΔVB is the voltage fluctuation of the bit line when reading the cell.

VsoとVBoはそれぞれ容量CsとCBの読み出し前
の各ノードの電圧である。上式によると読み出された電
圧振幅△VBを増やすには、記憶電圧Vs。
Vso and VBo are the voltages at each node of the capacitances Cs and CB before reading, respectively. According to the above formula, in order to increase the read voltage amplitude ΔVB, the storage voltage Vs.

を増やすかビット線の容量CBの記憶容量Csに対する
比率を小さくするかのいずれかの方法である。このうち
後者の方法は従釆から種々の方法が考えられてきたが前
者の方法は以下に述べる様に充分といえなかった。1ト
ランジスタ1容量のメモリセルを用いた半導体記憶回路
において記憶容量は高い集積度が得られるという理由か
ら、チャネル容量を用いており、そのため記憶容量の一
方の電極はチャネル形成のために、その半導体記憶回路
に使用している最も高い電源に接続されるのが一般的で
ある。
There are two methods: increasing the bit line capacitance CB or decreasing the ratio of the bit line capacitance CB to the storage capacitance Cs. Among these, various methods have been considered for the latter method, but the former method has not been sufficient as described below. In a semiconductor memory circuit using a memory cell with one transistor and one capacity, a channel capacitor is used as the memory capacitor because a high degree of integration can be obtained. Therefore, one electrode of the memory capacitor is connected to the semiconductor to form a channel. It is generally connected to the highest power supply used in the memory circuit.

第2に具体的な1トランジスタと1容量からなるメモリ
セルの断面構造の概略図を示す。第2図において、50
はP型半導体基板、51,52はN型半導体領域、53
,54は酸化膜,55,56は電極、であり、N型半導
体領域52と合体するチャネル部52a、酸化膜54a
及び電極55とから記憶容量1を構成しており、P型半
導体50、N型半導体領域51,52、酸化膜53及び
電極56とからトランジスタ2を構成している。
Second, a schematic diagram of a cross-sectional structure of a memory cell consisting of one transistor and one capacitor is shown. In Figure 2, 50
is a P-type semiconductor substrate, 51 and 52 are N-type semiconductor regions, and 53 is a P-type semiconductor substrate.
, 54 are oxide films, and 55 and 56 are electrodes, which include a channel portion 52a that is combined with the N-type semiconductor region 52, and an oxide film 54a.
and an electrode 55 constitute a storage capacitor 1, and a P-type semiconductor 50, N-type semiconductor regions 51 and 52, an oxide film 53, and an electrode 56 constitute a transistor 2.

ワード線は電極56に接続され、ビット線はN型半導体
領域51に接続される。第2図から明らかな様に記憶容
量部の構造はMOSトランジスタと非常によく似ており
いわばドレインのないMOSトランジスタということが
できる。つまり記憶容量の特性はMOSトランジスタの
特性と同一の特性を示すであろうということが容易に推
察できる。いまここでチャネルのできる領域52aをト
ランジスタ2のソース、電源の印加される電極55をト
ランジスタ2のゲートに対応づけると、ゲート電極55
にVDoの電圧が印加されているときチャネルのできる
領域すなわちソースの電圧Vsoの最高のレベルは次式
で与えられる。Vs。
The word line is connected to electrode 56 and the bit line is connected to N type semiconductor region 51. As is clear from FIG. 2, the structure of the storage capacitor section is very similar to that of a MOS transistor, and can be said to be a MOS transistor without a drain. In other words, it can be easily inferred that the characteristics of the storage capacity will be the same as those of the MOS transistor. Now, if we associate the region 52a where the channel is formed with the source of the transistor 2 and the electrode 55 to which power is applied with the gate of the transistor 2, the gate electrode 55
When the voltage VDo is applied to , the highest level of the voltage Vso of the region where a channel is formed, that is, the source, is given by the following equation. Vs.

=V。D−VTここでVTはチャネルを形成するのに要
する電圧で、絶縁膜の厚さ、誘電率等によって決められ
る。
=V. D-VT Here, VT is the voltage required to form a channel, and is determined by the thickness of the insulating film, dielectric constant, etc.

すなわち記憶電圧はゲート電圧(電源電圧)からしきし
・電圧を減じた大きさになる。
In other words, the storage voltage is equal to the gate voltage (power supply voltage) minus the threshold voltage.

本発明は従来の半導体記憶回路の上記欠点を改良するた
めになされたものであり記憶容量のゲ−トに与えられる
電圧をこの半導体記憶回路に用いられている電源電圧よ
りも高くして記憶電圧を高めることを目的としている。
The present invention has been made in order to improve the above-mentioned drawbacks of conventional semiconductor memory circuits, and the voltage applied to the gate of the memory capacitor is made higher than the power supply voltage used in this semiconductor memory circuit. The purpose is to increase the

第3図は、本発明の一実施例を示す回路図である。第3
図において、本発明の回路動作は従来の回路と基本的に
は変わらないが、記憶容量のゲート電極がV。。よりも
高い電圧に設定される。第3図は発振回路と昇圧回路を
用いてVooよりも高い電圧を印加する場合の一実施例
を示している。第4図は第8図の回路をより具体化した
回路の一例を示すものである。第4図において、5は昇
氏のための電荷を供給する昇圧容量CP、6は上記電荷
の供給に方向性をもたせるための整流用のトランジスタ
、7は昇圧の最終レベルを高めるための電圧を供給する
トランジスタ、8は寄生容量Ct、9は各々のメモリセ
ルの記憶容量と寄寄生容量の総和を等価的に表わした容
量CNである。第4図の半導体記憶回路において、いま
Voo電源がしや断された状態から投入状態に移ったと
すると、ノードAとBはトランジスタ7によってそれぞ
れVoo−VTおよびVoD−2VTまで充電される。
このとき同時に発振回路の出力0も振動を始め昇圧が始
まるのであるが考えやすくするために上記各/ードが所
定のレベルになった後で◇が振動すると仮定して説明す
る。いま、上記ノードAとBがそれぞれVoo−VTお
よびVoo−2VTになったあとJが立ち上がるとノー
ドBにはトランジスタ6を通して電荷が供給されそのレ
ベルは次式の分だけ上昇する。
FIG. 3 is a circuit diagram showing one embodiment of the present invention. Third
In the figure, the circuit operation of the present invention is basically the same as that of the conventional circuit, but the gate electrode of the storage capacitor is at V. . is set to a higher voltage. FIG. 3 shows an embodiment in which a voltage higher than Voo is applied using an oscillation circuit and a booster circuit. FIG. 4 shows an example of a circuit that is a more specific version of the circuit shown in FIG. In FIG. 4, 5 is a boosting capacitor CP that supplies charge for boosting, 6 is a rectifying transistor to give directionality to the charge supply, and 7 is a voltage for increasing the final level of boosting. 8 is a parasitic capacitance Ct, and 9 is a capacitor CN which equivalently represents the sum of the storage capacitance and the parasitic capacitance of each memory cell. In the semiconductor memory circuit shown in FIG. 4, if the Voo power supply is now turned on from a momentary cut-off state, nodes A and B are charged by transistor 7 to Voo-VT and VoD-2VT, respectively.
At the same time, the output 0 of the oscillation circuit also begins to oscillate and the voltage starts to rise, but for ease of understanding, the explanation will be made assuming that ◇ oscillates after each of the above nodes reaches a predetermined level. Now, when J rises after the above-mentioned nodes A and B reach Voo-VT and Voo-2VT, respectively, charge is supplied to node B through transistor 6, and its level increases by the following equation.

△V=;章三V血 次に、信号◇が立ち下つたときは/一ドAの電圧は昇圧
容量7との結合によって低下するがノ−ドBの蝿圧はト
ランジスタ6のゲートとソースが短絡されているのでト
ランジスタ6は非導通となり低下しない。
Next, when the signal ◇ falls, the voltage at node A decreases due to the coupling with the boost capacitor 7, but the voltage at node B increases between the gate and source of transistor 6. Since the transistor 6 is short-circuited, the transistor 6 becomes non-conductive and does not drop.

従ってでの繰り返し‘こよってノ−ドBの電圧は徐々に
上昇していくことになる。そしてノードAの電圧が回路
的に最高レベルに達したときにノードBのレベルは上昇
が止まる。このときのノードAの最高レベルは次式の様
になる。V岬松=V血−VT+C;章句V皿また、この
ときのノードBのレベルはノードAからしきし、電圧分
だけ低下した値になる。
Therefore, the voltage at node B gradually increases as a result of the repetition of '. Then, when the voltage at node A reaches the highest level in terms of the circuit, the level at node B stops rising. The highest level of node A at this time is as shown in the following equation. V Misakimatsu = V Blood - VT + C; Verse V Plate Also, the level of node B at this time is higher than that of node A, and has a value lowered by the voltage.

従ってV肌凶=V血−VT+C;葦;V血となるが、上
式においてCP》Ctとすることは容易に実現できるの
でV′。
Therefore, V skin = V blood - VT + C; reed; V blood, but in the above formula, it can be easily realized that CP>>Ct, so V'.

。=2(V。。−V,)〉V。。ただし2V,〈Vo。. =2(V..-V,)〉V. . However, 2V, <Vo.

とする。となり記憶電圧を高めることが可能となる。shall be. Therefore, it becomes possible to increase the storage voltage.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の半導体記憶回路を示す回路図、第2図は
メモリセルの構造を示す断面図、第3図はこの発明の一
実施例を示す回路図、第4図は3図のより具体的な実施
例を示す回路図、第5図は第4図の回路動作を説明する
ための波形図である。 図において、1は容量、2は絶縁ゲート電界効果トラン
ジスタ、10はメモリセルである。 なお、図中同一符号は同一又は相当する部分を示す。第
1図 ※2図 第3図 第4図 第5凶
FIG. 1 is a circuit diagram showing a conventional semiconductor memory circuit, FIG. 2 is a cross-sectional view showing the structure of a memory cell, FIG. 3 is a circuit diagram showing an embodiment of the present invention, and FIG. 4 is a modification of FIG. 3. A circuit diagram showing a specific embodiment, FIG. 5 is a waveform diagram for explaining the circuit operation of FIG. 4. In the figure, 1 is a capacitor, 2 is an insulated gate field effect transistor, and 10 is a memory cell. Note that the same reference numerals in the figures indicate the same or corresponding parts. Figure 1 *2 Figure 3 Figure 4 Figure 5

Claims (1)

【特許請求の範囲】 1 一方の主電極がビツト線に、ゲート電極がワード線
にそれぞれ接続された絶縁ゲート電界効果トランジスタ
と、一方の電極が前記絶縁ゲート電界効果トランジスタ
の他方の主電極に、他方の電極が直流電圧にそれぞれ接
続された容量とから構成されるメモリセルを備えたもの
において、前記容量の他方の電極に印加される電圧を電
源電圧よりも高くする昇圧手段を設けたことを特徴とす
る半導体記憶回路。 2 昇圧手段は、発振回路及びコンデンサとスイツチン
グ素子を含み前記発振回路の出力を受けて昇圧する昇圧
回路からむることを特徴とする特許請求の範囲第1項記
載の半導体記憶回路。
[Claims] 1. An insulated gate field effect transistor having one main electrode connected to a bit line and a gate electrode connected to a word line, and one electrode connected to the other main electrode of the insulated gate field effect transistor, In a memory cell comprising a capacitor whose other electrode is connected to a DC voltage, the memory cell is provided with boosting means for making the voltage applied to the other electrode of the capacitor higher than the power supply voltage. Characteristic semiconductor memory circuit. 2. The semiconductor memory circuit according to claim 1, wherein the boosting means includes an oscillation circuit, a capacitor, and a switching element, and receives an output of the oscillation circuit and boosts the voltage.
JP54010872A 1979-01-31 1979-01-31 semiconductor memory circuit Expired JPS6025835B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54010872A JPS6025835B2 (en) 1979-01-31 1979-01-31 semiconductor memory circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54010872A JPS6025835B2 (en) 1979-01-31 1979-01-31 semiconductor memory circuit

Publications (2)

Publication Number Publication Date
JPS55105892A JPS55105892A (en) 1980-08-13
JPS6025835B2 true JPS6025835B2 (en) 1985-06-20

Family

ID=11762421

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54010872A Expired JPS6025835B2 (en) 1979-01-31 1979-01-31 semiconductor memory circuit

Country Status (1)

Country Link
JP (1) JPS6025835B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62155456A (en) * 1985-12-27 1987-07-10 Nobumi Yasuda Odor sucking exhausting device
JPS6331190U (en) * 1986-08-13 1988-02-29
JPH0464033U (en) * 1990-10-12 1992-06-01
JPH0490829U (en) * 1990-12-15 1992-08-07

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4805152A (en) * 1987-09-03 1989-02-14 National Semiconductor Corporation Refresh cell for a random access memory

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62155456A (en) * 1985-12-27 1987-07-10 Nobumi Yasuda Odor sucking exhausting device
JPS6331190U (en) * 1986-08-13 1988-02-29
JPH0464033U (en) * 1990-10-12 1992-06-01
JPH0490829U (en) * 1990-12-15 1992-08-07

Also Published As

Publication number Publication date
JPS55105892A (en) 1980-08-13

Similar Documents

Publication Publication Date Title
US4769784A (en) Capacitor-plate bias generator for CMOS DRAM memories
US5856918A (en) Internal power supply circuit
JP2851757B2 (en) Semiconductor device and semiconductor storage device
JP2805991B2 (en) Substrate bias generation circuit
JP3281984B2 (en) Substrate voltage generation circuit
JP2000148263A (en) Inner voltage generation circuit
KR100532765B1 (en) Semiconductor memory device
JPH0818408A (en) Oscillation circuit and nonvolatile semiconductor memory
US6608782B2 (en) Booster circuit capable of achieving a stable pump operation for nonvolatile semiconductor memory device
JP4413689B2 (en) Semiconductor integrated circuit device having power supply startup sequence
US4259729A (en) Dynamic memory
JPH0219558B2 (en)
JPS6025835B2 (en) semiconductor memory circuit
JP2820910B2 (en) Internal voltage booster circuit of semiconductor integrated circuit
JPH0127519B2 (en)
JPS6122396B2 (en)
JP2748733B2 (en) Semiconductor memory
US5638023A (en) Charge pump circuit
JPS6161293A (en) Dynamic memory
JPH10270988A (en) Delay circuit using body bias effect
JPH0458206B2 (en)
JPH0337240Y2 (en)
JP2569464B2 (en) Dynamic memory cell
JPS59114865A (en) Semiconductor memory cell
JP3408948B2 (en) High voltage generation circuit