JPS6027754B2 - Manufacturing method of metal anode for electrolytically producing manganese dioxide - Google Patents
Manufacturing method of metal anode for electrolytically producing manganese dioxideInfo
- Publication number
- JPS6027754B2 JPS6027754B2 JP52120802A JP12080277A JPS6027754B2 JP S6027754 B2 JPS6027754 B2 JP S6027754B2 JP 52120802 A JP52120802 A JP 52120802A JP 12080277 A JP12080277 A JP 12080277A JP S6027754 B2 JPS6027754 B2 JP S6027754B2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- metal
- manufacturing
- substrate
- noble metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 29
- 239000002184 metal Substances 0.000 title claims description 29
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 229910000510 noble metal Inorganic materials 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 28
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 21
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 14
- 239000010936 titanium Substances 0.000 claims description 12
- 229910052697 platinum Inorganic materials 0.000 claims description 11
- 229910052719 titanium Inorganic materials 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 9
- 239000003792 electrolyte Substances 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 9
- 229910052707 ruthenium Inorganic materials 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 8
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 7
- 208000017587 Polyrrhinia Diseases 0.000 claims description 4
- 239000012266 salt solution Substances 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 238000001556 precipitation Methods 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 3
- 239000011247 coating layer Substances 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 238000000137 annealing Methods 0.000 claims 2
- 239000010410 layer Substances 0.000 description 11
- 238000005868 electrolysis reaction Methods 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000010970 precious metal Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 229910052756 noble gas Inorganic materials 0.000 description 2
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 101100086117 Ixodes scapularis Qptc gene Proteins 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 210000001520 comb Anatomy 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000005088 metallography Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- -1 platinum metals Chemical class 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 210000000689 upper leg Anatomy 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
- C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Description
【発明の詳細な説明】
本発明は基板が不動態化可能の金属よりなり、その表面
が少なくとも1部貴金属の析出によって製造した活性被
覆層で蔽われている、電解による2酸化マンガン製造の
ための金属陽極とくにチタン陽極の製造に関する。DETAILED DESCRIPTION OF THE INVENTION The invention relates to a method for producing manganese dioxide by electrolysis, in which the substrate consists of a passivatable metal, the surface of which is covered at least in part with an active coating layer produced by precipitation of a noble metal. The present invention relates to the production of metal anodes, particularly titanium anodes.
電解法に活性化した金属陽極を使用することは公知であ
る。The use of activated metal anodes in electrolytic processes is known.
とくにクロルアルカリ電解には貴金属によって活性化し
たチタン電極がすでに使用されている。実験室規模の2
酸化マンガンの電解的製造にもこのようなチタン陽極の
使用はすでに研究された。この種の金属陽極たとえばチ
タン陽極は現在まで約550qoの温度の空気中で陽極
基板として使用する金属の表面で貴金属塩を熱分解し、
またはこの基板に貴金属を電解析出させて活性化した。In particular, titanium electrodes activated with noble metals are already used in chlor-alkali electrolysis. Laboratory scale 2
The use of such titanium anodes has also been investigated for the electrolytic production of manganese oxide. Metal anodes of this type, for example titanium anodes, have so far been produced by thermally decomposing noble metal salts on the surface of the metal used as the anode substrate in air at a temperature of about 550 qo.
Alternatively, precious metals were electrolytically deposited on this substrate to activate it.
この方法で活性化した陽極はガス状または電解液潟性電
機生成物が発生する場合には有効であることが実証され
た。しかし生成物が周知のように固体の形で陽極に析出
し、電解終了後陽極から除去しなければならない2酸化
マンガン製造の際には困難が生ずる。Anodes activated in this manner have been demonstrated to be effective where gaseous or electrolyte lagoonal electrical products are generated. However, difficulties arise in the production of manganese dioxide, in which the product is deposited in solid form on the anode, as is known, and must be removed from the anode after the electrolysis has ended.
というのはあまり固く付着しない貴金属層がこの機会に
基板表面から少なくとも1部剥離されるからである。そ
の結果陽極を電解液格へ再挿入した後、もはや完全な活
性が得られず、短い作業時間後、陽極が不均一に成長し
、平均ターミナル電圧が上昇するので、作業可能のター
ミナル電圧を短時間で超える。とくに貴金属メッキした
陽極の経済的使用には長い作業時間がきわめて重要であ
る。This is because the noble metal layer, which is not very tightly adhered, takes this opportunity to be at least partially peeled off from the substrate surface. As a result, after reinserting the anode into the electrolyte, it is no longer fully active, and after a short working time, the anode grows unevenly and the average terminal voltage increases, reducing the working terminal voltage. exceed in time. Long working times are particularly important for the economical use of precious metal plated anodes.
本発明の目的は活性化した貴金属層が大きい機械的負荷
にも耐える貴金属で活性化した金属陽極の製法を得るこ
とである。The object of the invention is to obtain a method for producing a metal anode activated with a noble metal, in which the activated noble metal layer resists even high mechanical loads.
意外にもこの目的は貴金属を陽極基板の表面に被覆した
後、陽極基板を700〜1100℃とくに800〜10
0ぴ0の温度で燐鈍することにより解決される。Surprisingly, this purpose was achieved by coating the surface of the anode substrate with a noble metal, and then heating the anode substrate to 700-1100℃, especially 800-100℃.
This can be solved by phosphorous dulling at a temperature of zero.
700℃以下および1100午0以上は場合により活性
層が陽極基板上に製造されるけれど、この場合生ずる反
応速度は不適当であり、この方法で得られる層は工業的
に満足でない。Below 700° C. and above 1100° C., an active layer may optionally be produced on the anode substrate, but the reaction rates that occur in this case are unsuitable and the layers obtained in this way are not industrially satisfactory.
貴金属はその塩溶液から陰極析出によって基板へ被覆さ
れ、または基板を貴金属の塩溶液で処理し、続いて65
000までの温度に加熱し、貴金属塩を分解することに
よって被覆される。陽極の暁鋼を希ガス雰囲気下または
10‐6バール以下とくに10‐7〜10‐8バールの
減圧下に行うのが有利である。The noble metal is coated onto the substrate by cathodic deposition from its salt solution, or by treating the substrate with a salt solution of the noble metal followed by 65
Coated by heating to temperatures up to 0.000C and decomposing the noble metal salts. It is advantageous to prepare the anode under a noble gas atmosphere or under reduced pressure of less than 10-6 bar, in particular from 10-7 to 10-8 bar.
希ガスとしてはとくにアルゴン、貴金属としては金また
は白金属の金属たとえば白金もしくはルテニウムが適当
である。2酸化マンガンの付着を良くするため、基板と
して板の両面に析出した2酸化マンガンがいつしよに成
長しうるように離れた孔を多数有する金属板が有利に使
用される。Argon is particularly suitable as the noble gas, and gold or platinum metals, such as platinum or ruthenium, are suitable as the noble metal. In order to improve the adhesion of the manganese dioxide, a metal plate is advantageously used as a substrate, which has a large number of holes spaced apart so that the manganese dioxide deposited on both sides of the plate can grow in unison.
そのためにとくにェクスパンドメタル、ダブルノーズ板
またはスリット板(第la,bおよびc図参照)の形の
基板が提案される。プレスして真空燐結した金属スポン
ジよりなる成形体も使用することができる。陽極の電解
液格へ浸潰する部分のみを貴金属で活性化するのが望ま
しい。Substrates in the form of expanded metal, double-nose plates or slotted plates (see FIGS. la, b and c) are proposed for this purpose. It is also possible to use molded bodies made of pressed and vacuum-phosphorized metal sponges. It is desirable to activate only the part of the anode that is immersed into the electrolyte with the noble metal.
さもなければ電解の際発生する水素が浴より上にある貴
金属層によって吸収され、それによって陽極は早期に腕
化および破壊する。陽極の本発明による処里によって貴
金属原子は金属基板へ拡散し、その際陽極表面にそれぞ
れの金属の貴金属含有合金が形成される。Otherwise, the hydrogen generated during electrolysis will be absorbed by the noble metal layer above the bath, thereby prematurely arming and destroying the anode. Due to the inventive treatment of the anode, the noble metal atoms diffuse into the metal substrate, forming a noble metal-containing alloy of the respective metal on the anode surface.
この合金層は前記機械的応力がもはや貴金属層を剥離し
得ないようにほぼ金属基板の1成分を形成する。X線金
相学的にこのように処理した表面にMe=Pt,Ruま
たは1【、および基板金属としてのTiよりなるたとえ
ばMeTiおよびMeTi3型の金属間化合物相を検知
することができる。貴金属としては金および白金属の金
属が通し、後者は混合物としても被覆することができる
。基板金属としてはチタンのほかにタンタル、ジルコニ
ウムおよびニオブも適する。熱処理は拡散過程が始まる
ように行わねばならないけれど、被覆した貴金属の大部
分が金属基板の内部へ深く拡散するほど続けてはならな
い。This alloy layer essentially forms a component of the metal substrate so that the mechanical stress can no longer peel off the noble metal layer. X-ray metallography can detect intermetallic phases of Me=Pt, Ru or 1 and Ti as substrate metal, for example of the MeTi and MeTi3 type, on surfaces treated in this way. Suitable noble metals include gold and platinum; the latter can also be coated as a mixture. In addition to titanium, tantalum, zirconium and niobium are also suitable as substrate metals. The heat treatment must be carried out so that the diffusion process begins, but not so long as to cause most of the coated precious metal to diffuse deeply into the interior of the metal substrate.
この場合表面の貴金属は著しく不足し、このような合金
はその電気化学的挙動が純粋の基板金属にだんだん近づ
く。貴金属の量は少なくとも10‐2脚の厚さの陽極表
面層で少なくとも1〜2モル%である。In this case, there is a significant lack of noble metals on the surface, and such alloys have an electrochemical behavior that increasingly approaches that of the pure substrate metal. The amount of noble metal is at least 1-2 mole % in an anode surface layer that is at least 10-2 feet thick.
拡散に最適の条件は使用する炉の種類、選ばれた温度、
処理時間および使用貴金属に関係し、場合に応じて経験
的にたとえばマイクロゾンデにより決定しなければなら
ない。貴金属層を被覆する前に陽極表面を前処理するこ
とが望ましく、たとえば脂肪溶解剤(アルコール、ハロ
ゲン化した炭火水素、洗浄活性物質など)により、場合
によりサンドブラストにより処理する。The optimal conditions for diffusion depend on the type of furnace used, the selected temperature,
It depends on the treatment time and the noble metal used and has to be determined empirically, for example by microsonde, as the case may be. It is advisable to pre-treat the anode surface before applying the noble metal layer, for example with fat-dissolving agents (alcohols, halogenated hydrocarbons, cleaning actives, etc.), optionally by sandblasting.
本発明による活性貴金属層の支持体として既述の形のほ
か基板金属の他の加工形たとえば管、榛、ネットなどを
使用することができる。In addition to the shapes already mentioned, other processed forms of the substrate metal, such as tubes, combs, nets, etc., can be used as supports for the active noble metal layer according to the invention.
これはセル形成の特殊な要求によってさまる。しかしス
リッ孔板(第lc図参照)のほかにダブルノーズ板(第
lb図参照)として公知の加工形が有利なことが実証さ
れた。析出物の良好な付着が保証されることが重要であ
る。電極の品質はこの電極によって電解を行い、所望の
時間後にその上に析出した2酸化マンガンを曲げのよう
な機械的手段または一般には衝撃によって電極極から離
し、これを再び同じ電解に使用することによって試験さ
れる。This is limited by the special requirements of cell formation. However, in addition to the slotted plate (see FIG. 1c), a design known as a double-nose plate (see FIG. 1b) has proved advantageous. It is important that good adhesion of the precipitate is ensured. The quality of the electrode is determined by the fact that electrolysis is carried out by this electrode and after a desired period of time the manganese dioxide deposited on it is separated from the electrode by mechanical means such as bending or generally by impact and used again for the same electrolysis. tested by
サイクルと称するこの過程を電解の間のセル電圧が経済
的作業を不可能にする値を示すかもし〈は超えるまで、
または2酸化マンガン析出が与えられたセル容量の経済
的利用を不可能にするように不均一になるまで繰返す。
本本発明の電極を下記条件により試験した:電解液の温
度 95q0電解液のマンガン
濃度 0.7モル/〆電解液の硫酸濃度
0.7モル/そ電流密度 外面に関し
1.泌/d〆外面とは浴へ浸贋する陽極の幾何学的寸法
の2倍を表わす。This process, called cycling, continues until the cell voltage during electrolysis exceeds a value that makes economical operation impossible.
or repeat until the manganese dioxide precipitation becomes so non-uniform as to preclude economical utilization of a given cell capacity.
The electrode of the present invention was tested under the following conditions: Electrolyte temperature Manganese concentration of 95q0 electrolyte 0.7 mol/Sulfuric acid concentration of electrolyte
0.7 mol/so current density Regarding the outer surface: 1. The external surface represents twice the geometrical dimension of the anode that immerses into the bath.
本発明による製法の効果は第2〜4図の実験結果に示さ
れる。The effects of the manufacturing method according to the present invention are shown in the experimental results shown in FIGS. 2-4.
第2図はプレスしたチタンスポンジから製造した電極に
おけるルテニウム被覆の場合の貴金属被覆の効果を示す
。この場合真空加熱のため、塩素製造用に工業的に製造
した寸法安定性チタン陽極に認められるような青黒色を
特徴とする2酸化ルテニウムが適用した温度で存在しな
いことが強調される。本発明の電極は白金を使用する場
合は銀白色である。第2図は被覆した貴金属量と電極寿
命の関係を示す。寿命はルテニウム量にほぼ比例する(
種々のルテニウム量を含む次の例2による)。第3図に
は550午0の空気中でへキサクロロ白金酸の分解によ
って白金被覆した電極のターミナル電圧の時間的経過を
例3によるチタンェクスパンドメタル上の本発明による
電極のそれと対比して示す。FIG. 2 shows the effect of a noble metal coating in the case of a ruthenium coating on an electrode made from pressed titanium sponge. Due to the vacuum heating in this case, it is emphasized that ruthenium dioxide, characterized by a blue-black color, as observed in industrially produced dimensionally stable titanium anodes for chlorine production, is not present at the temperatures applied. The electrode of the present invention is silvery white when platinum is used. Figure 2 shows the relationship between the amount of noble metal coated and the life of the electrode. The lifespan is approximately proportional to the amount of ruthenium (
According to the following example 2 containing various amounts of ruthenium). FIG. 3 shows the time course of the terminal voltage of an electrode coated with platinum by decomposition of hexachloroplatinic acid in air at 550 pm, in comparison with that of an electrode according to the invention on titanium expanded metal according to Example 3. show.
種々の貴金属の効果はもちろん不同であり、比較可能の
寿命には種々の被覆量が必要である。The effectiveness of different precious metals is of course different, and different coverages are required for comparable lifetimes.
これはルテニウムおよび白金被覆を有するダブルノーズ
板基板よりなる電極に関して第4図に示される。次に本
発明の方法を例により説明する。This is illustrated in FIG. 4 for an electrode consisting of a double nose plate substrate with ruthenium and platinum coatings. The method of the invention will now be explained by way of example.
例1
白金ーィリジウム(70一30)合金1雌/あの被覆数
肋間隔で長さ2仇舷、幅1.82側の縦スリットを打抜
いた厚さ1.5側のチタン板(スリット孔板)公知法に
より脱脂洗浄し、サンドプラストする。Example 1 Platinum-iridium (70-30) alloy 1 female/that coating A titanium plate with a thickness of 1.5 mm (slit hole plate ) Degrease, wash and sandplast using a known method.
次に刷毛により次の組成の溶液を塗布する:比1にそ6
・班20 14雌比PtC〆6・4,
知日20 341g濃塩酸
80雌エタノール
80雌次に電極を120qoで乾燥し、10‐
7〜10‐8バールの真空炉で700qo、4時間加熱
する。陽極の溶液塗布、乾燥および真空加熱の過程を5
回繰返す。貴金属塗布量は全部で1雌/めになる。貴金
属量は厚さ5・10‐3帆の陽極層の最上層で11モル
%である。例2:ルテニウム滋ノあの被覆
凝結チタンスポンジ板を脱脂し、下記組成の溶液を塗る
。Then apply with a brush a solution of the following composition: ratio 1 to 6
・Group 20 14 female ratio PtC〆6.4,
Chihito 20 341g concentrated hydrochloric acid
80 female ethanol
After 80 minutes, the electrode was dried at 120 qo,
Heat in a vacuum oven at 7-10-8 bar at 700 qo for 4 hours. The process of applying solution, drying and vacuum heating of the anode is performed in 5 steps.
Repeat several times. The total amount of precious metal applied is 1 female/female. The amount of precious metal is 11 mol% in the top layer of the anode layer with a thickness of 5.10-3. Example 2: A ruthenium-coated precipitated titanium sponge board is degreased and coated with a solution having the following composition.
RびCそ3・4日20 14鍵
濃塩酸 43雌工タノ−
ル 430g次に板
を120qoで乾燥し、続いて55000で45分間空
気流下に加熱する。RbiC So 3rd and 4th Days 20 14 Keys Concentrated Hydrochloric Acid 43 Female Worker Tanoh
The board is then dried at 120 qo, followed by heating at 55,000 for 45 minutes under a stream of air.
塗布およびく熱処理を3回繰返す。次に暁縞板を10‐
7バールの真空中で900℃4時間嘘鈍する。例1:白
金1雌ノ〆の被覆
チタンエクスパンドメタルを脱脂し、サンドブラストし
、次の組成の溶液に浸潰してぬらす:QPtC夕6・4
,9日20 22雌濃塩酸
44雛エタノール
445g次にェクスパンドメタル板を
120℃で乾燥し、550qoで3び分間空気中で加熱
する。The coating and heat treatment were repeated three times. Next, 10-
Blunt at 900° C. for 4 hours in a vacuum of 7 bar. Example 1: Degrease and sandblast coated titanium expanded metal with platinum 1 female end, and wet it by soaking it in a solution with the following composition: QPtC E6/4
,9 days 20 22 concentrated hydrochloric acid
44 Hina Ethanol
445 g The expanded metal plate is then dried at 120° C. and heated in air at 550 qo for 3 minutes.
浸糟、乾燥および空中加熱の過程をさらに2回線返す。
次にェクスパンドメタルを800qoでアルゴン下に5
時間蛾鈍する。例4:白金2雌/あの被覆
チタンスポンジから製造した暁給チタン板を脱脂し、下
記組成の電解液へ浸潰する:日2PtC夕6
20雌 水 102Na2HP04
100雌(N日)2HP04
20雌N比Cそ
5腿鰭機液の温度は68qo、電流密
度は0.虫/d〆(1.5V)である。The steps of soaking, drying and heating in air are repeated two more times.
Next, expand the expanded metal at 800qo under argon for 5 minutes.
Time moth dulls. Example 4: Degrease the Akatsuki titanium plate manufactured from the platinum 2 female/that coated titanium sponge and immerse it in an electrolyte with the following composition: Day 2 PtC Night 6
20 Female Water 102Na2HP04
100 females (N days) 2HP04
20 female N ratio C
The temperature of the fifth thigh fin liquid was 68 qo, and the current density was 0. Mushi/d〆 (1.5V).
120分後、板を電解液から取出し、乾燥し、続いて3
時間100000に加熱する。After 120 minutes, the plate was removed from the electrolyte, dried, and then
Heat to 100,000 hours.
第la図〜第lc図は電極基板の3つの実施例を示す図
、第2図〜第4図は本発明の電極による作業時間とター
ミナル電圧の関係を示すグラフであり、第2図はRu量
の効果、第3図はPt被覆の効果、第4図はRuおよび
Pt被覆の効果比較を示す。
第la図
第lb図
第lc図
第3図
第4図
図
N
船Figures 1A to 1C are diagrams showing three embodiments of the electrode substrate, and Figures 2 to 4 are graphs showing the relationship between working time and terminal voltage using the electrode of the present invention. Figure 3 shows the effect of the amount, Figure 3 shows the effect of Pt coating, and Figure 4 compares the effects of Ru and Pt coating. Figure la Figure lb Figure lc Figure 3 Figure 4 Figure N Ship
Claims (1)
を少なくとも1部蔽う、貴金属の析出によつてつくつた
活性被覆層を有する2酸化マンガンを電解的に製造する
ための金属陽極とくにチタン陽極の製法において、貴金
属を陽極基板の表面へ被覆した後、陽極基板を700〜
1100℃の温度で焼鈍することを特徴とする2酸酸化
マンガンを電解的に製造するための金属陽極の製法。 2 貴金属を陰極析出によつてその塩溶液から基板へ被
覆する特許請求の範囲第1項記載の製法。 3 基板を貴金属の塩溶液で処理し、続いて650℃ま
での温度に加熱し、貴金属塩を分解することによつて貴
金属を基板へ被覆する特許請求の範囲第1項記載の製法
。 4 陽極を800〜1000℃の温度で焼鈍する特許請
求の範囲第1項から第3項までのいずれか1項に記載の
製法。 5 焼鈍を減圧下または希ガス雰囲気中で行う特許請求
の範囲第1項から第4項まででのいずれか1項に記載の
製法。 6 陽極の焼鈍を10^−^6バールより低い圧力で行
う許請求の範囲第5項記載の製法。 7 陽極の焼鈍を10^−^7〜10^−^8バールの
圧力で行う特許請求の範囲第6項記載の製法。 8 貴金属として金または白金属の金属を使用する特許
請求の範囲第1項から第7項までのいずれか1項に記載
の製法。 9 白金またはルテニウムを使用する特許請求の範囲第
8項記載の製法。 10 板の表面に析出した2酸化マンガンがいつしよに
成長することを可能にする離れた孔を有する金属板を基
板として使用する特許請求の範囲第1項から第9項まで
のいずれか1項に記載の製法。 11 陽極をエクスパンドメタル、スリツト孔板または
ダブルノーズ板の形で使用する特許請求の範囲第10項
記載の製法。 12 陽極としてプレスして真空焼結した金属スポンジ
を使用する特許請求の範囲第1項から第9項までのいず
れか1項に記載の製法。 13 陽極の電解液へ浸漬する部分を貴金属で活性化す
る特許請求の範囲第1項から第12項までのいずれか1
項に記載の製法。[Scope of Claims] 1. A method for electrolytically producing manganese dioxide having a substrate made of a passivatable metal and an active coating layer formed by precipitation of a noble metal, covering at least a portion of the surface of the substrate. In the manufacturing method of metal anodes, especially titanium anodes, after coating the surface of the anode substrate with a noble metal, the anode substrate is
A method for producing a metal anode for electrolytically producing manganese dioxide oxide, which is characterized by annealing at a temperature of 1100°C. 2. The manufacturing method according to claim 1, wherein the noble metal is coated on the substrate from its salt solution by cathodic deposition. 3. The method of claim 1, wherein the substrate is coated with a noble metal by treating the substrate with a salt solution of the noble metal, followed by heating to a temperature of up to 650° C. to decompose the noble metal salt. 4. The manufacturing method according to any one of claims 1 to 3, wherein the anode is annealed at a temperature of 800 to 1000°C. 5. The manufacturing method according to any one of claims 1 to 4, wherein the annealing is performed under reduced pressure or in a rare gas atmosphere. 6. The method according to claim 5, wherein the anode is annealed at a pressure lower than 10-6 bar. 7. The method according to claim 6, wherein the anode is annealed at a pressure of 10^-^7 to 10^-^8 bar. 8. The manufacturing method according to any one of claims 1 to 7, wherein gold or platinum metal is used as the noble metal. 9. The manufacturing method according to claim 8, which uses platinum or ruthenium. 10. Any one of claims 1 to 9, in which a metal plate is used as a substrate, which has spaced holes that allow manganese dioxide deposited on the surface of the plate to grow in unison. The manufacturing method described in section. 11. The method according to claim 10, wherein the anode is used in the form of an expanded metal, slit plate or double nose plate. 12. The manufacturing method according to any one of claims 1 to 9, which uses a pressed and vacuum sintered metal sponge as the anode. 13 Any one of claims 1 to 12, in which the part of the anode that is immersed in the electrolyte is activated with a noble metal.
The manufacturing method described in section.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2645414.8 | 1976-10-08 | ||
| DE2645414A DE2645414C2 (en) | 1976-10-08 | 1976-10-08 | Titanium anodes for the electrolytic production of manganese dioxide, as well as a process for the production of these anodes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53108078A JPS53108078A (en) | 1978-09-20 |
| JPS6027754B2 true JPS6027754B2 (en) | 1985-07-01 |
Family
ID=5989976
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52120802A Expired JPS6027754B2 (en) | 1976-10-08 | 1977-10-07 | Manufacturing method of metal anode for electrolytically producing manganese dioxide |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS6027754B2 (en) |
| BR (1) | BR7706724A (en) |
| DE (1) | DE2645414C2 (en) |
| ES (1) | ES462891A1 (en) |
| GB (1) | GB1545360A (en) |
| IE (1) | IE46061B1 (en) |
| IN (1) | IN145674B (en) |
| SU (1) | SU1050573A3 (en) |
| ZA (1) | ZA776001B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2853820A1 (en) * | 1978-12-13 | 1980-06-19 | Conradty Nuernberg Gmbh & Co M | ANODE WITH A VALVE METAL CORE AND USE THEREOF |
| IT1150124B (en) * | 1982-01-21 | 1986-12-10 | Oronzio De Nora Impianti | ANODIC STRUCTURE FOR CATHODIC PROTECTION |
| DE3346093A1 (en) * | 1983-12-21 | 1985-09-05 | Hoechst Ag, 6230 Frankfurt | ACTIVATED METAL ANLANDS AND A METHOD FOR THE PRODUCTION THEREOF |
| DE3521827A1 (en) * | 1985-06-19 | 1987-01-02 | Hoechst Ag | ANODE SYSTEM FOR THE ELECTROLYTIC PRODUCTION OF BROWN STONE |
| GB8903321D0 (en) * | 1989-02-14 | 1989-04-05 | Ici Plc | Metal mesh and production thereof |
| JP2011149044A (en) * | 2010-01-20 | 2011-08-04 | Tanaka Kikinzoku Kogyo Kk | Electrode for electrolytic oxidation reaction and method for producing the same |
| CN109385645B (en) * | 2018-12-06 | 2021-05-11 | 普瑞斯矿业(中国)有限公司 | Treatment method for improving conductivity of anode plate for electrolytic manganese dioxide |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3461058A (en) * | 1966-06-07 | 1969-08-12 | Engelhard Ind Inc | Method of producing a composite electrode |
| US3711385A (en) * | 1970-09-25 | 1973-01-16 | Chemnor Corp | Electrode having platinum metal oxide coating thereon,and method of use thereof |
-
1976
- 1976-10-08 DE DE2645414A patent/DE2645414C2/en not_active Expired
-
1977
- 1977-10-03 GB GB40977/77A patent/GB1545360A/en not_active Expired
- 1977-10-04 ES ES462891A patent/ES462891A1/en not_active Expired
- 1977-10-07 BR BR7706724A patent/BR7706724A/en unknown
- 1977-10-07 SU SU772533378A patent/SU1050573A3/en active
- 1977-10-07 IE IE2050/77A patent/IE46061B1/en unknown
- 1977-10-07 JP JP52120802A patent/JPS6027754B2/en not_active Expired
- 1977-10-07 ZA ZA00776001A patent/ZA776001B/en unknown
- 1977-10-07 IN IN1493/CAL/77A patent/IN145674B/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| ZA776001B (en) | 1978-06-28 |
| IE46061L (en) | 1978-04-08 |
| JPS53108078A (en) | 1978-09-20 |
| BR7706724A (en) | 1978-07-18 |
| SU1050573A3 (en) | 1983-10-23 |
| DE2645414C2 (en) | 1986-08-28 |
| DE2645414A1 (en) | 1978-04-13 |
| IN145674B (en) | 1978-11-25 |
| GB1545360A (en) | 1979-05-10 |
| IE46061B1 (en) | 1983-02-09 |
| ES462891A1 (en) | 1978-06-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3914162B2 (en) | Oxygen generating electrode | |
| US3926751A (en) | Method of electrowinning metals | |
| JPH0138875B2 (en) | ||
| JP2721739B2 (en) | Method for producing an improved anode | |
| JPH02247393A (en) | Electrolytic electrode with durability and its production | |
| US3117023A (en) | Method of making a non-corroding electrode | |
| JPS6027754B2 (en) | Manufacturing method of metal anode for electrolytically producing manganese dioxide | |
| US7201830B2 (en) | Anode for oxygen evolution and relevant substrate | |
| KR910000916B1 (en) | Metal electrolytic treatment method | |
| TW202206653A (en) | Method for the treatment of a metal substrate for the preparation of electrodes | |
| JPH0575840B2 (en) | ||
| US3357858A (en) | Platinizing process | |
| CN102165102B (en) | Cathode components and bipolar plates for hypochlorite electrolysis cells | |
| JP3430479B2 (en) | Anode for oxygen generation | |
| KR101742011B1 (en) | Electrode for electrolytic processes with controlled crystalline structure | |
| JP3868513B2 (en) | Electrode for seawater electrolysis and method for producing the same | |
| JP2722263B2 (en) | Electrode for electrolysis and method for producing the same | |
| JPH0885894A (en) | Electrode | |
| US20030116431A1 (en) | Electrode | |
| JPH04107282A (en) | Method for removing coating from metal electrode | |
| US4379723A (en) | Method of removing electrocatalytically active protective coatings from electrodes with metal cores, and the use of the method | |
| JPH03253590A (en) | Production of electrode for water electrolysis | |
| DE1812522A1 (en) | Anode for alkali chloride electrolysis | |
| US3899409A (en) | Bipolar electrode | |
| JP3048647B2 (en) | Electrode for electrolysis |