JPS6029213B2 - Manufacturing method of semiconductor ceramic capacitor - Google Patents
Manufacturing method of semiconductor ceramic capacitorInfo
- Publication number
- JPS6029213B2 JPS6029213B2 JP50148687A JP14868775A JPS6029213B2 JP S6029213 B2 JPS6029213 B2 JP S6029213B2 JP 50148687 A JP50148687 A JP 50148687A JP 14868775 A JP14868775 A JP 14868775A JP S6029213 B2 JPS6029213 B2 JP S6029213B2
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- Japan
- Prior art keywords
- component
- weight
- parts
- temperature
- semiconductor ceramic
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims description 36
- 239000003985 ceramic capacitor Substances 0.000 title claims description 19
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000919 ceramic Substances 0.000 claims description 23
- 229910052573 porcelain Inorganic materials 0.000 claims description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 16
- 239000012212 insulator Substances 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 239000003990 capacitor Substances 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000007789 gas Substances 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 229910052797 bismuth Inorganic materials 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- 238000009413 insulation Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 230000007423 decrease Effects 0.000 description 8
- 238000010304 firing Methods 0.000 description 6
- 229910052712 strontium Inorganic materials 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 238000007751 thermal spraying Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Description
【発明の詳細な説明】
本発明は半導体磁器コンデンサの製造方法にかかり、大
容量、低損失にして静電容量の温度変化率が広い温度範
囲にわたって小さく、かつその抵抗値の大きな半導体磁
器コンデンサを製造することのできる方法を提供しよう
とするものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a semiconductor ceramic capacitor, and provides a semiconductor ceramic capacitor having a large capacity, low loss, a small temperature change rate of capacitance over a wide temperature range, and a large resistance value. The purpose is to provide a method for manufacturing the same.
従来から磁器コンデンサには、歌Ti03系磁器または
SrTi03系磁器が使用されている。これらの磁器は
譲露率が大きく、かつ絶縁性の高いものである。かかる
磁器をコンデンサに使用する場合、その容量は磁器の譲
亀率の大小に依存するものであり、たとえば磁器素子の
厚さや、その銀電極付与面の面積を加減することによっ
て、多少容量を制御することができるものである。本発
明における半導体磁器コンデンサは、上記のように磁器
素子が絶縁物であるものとは異なり、比較的、その比抵
抗の低い半導体磁器素子を使用している。Traditionally, Ti03 series porcelain or SrTi03 series porcelain has been used for ceramic capacitors. These porcelains have a high yield rate and high insulation properties. When such porcelain is used in a capacitor, the capacitance depends on the yield rate of the porcelain. For example, the capacitance can be controlled to some extent by adjusting the thickness of the porcelain element or the area of its silver electrode-applied surface. It is something that can be done. The semiconductor ceramic capacitor of the present invention uses a semiconductor ceramic element having a relatively low resistivity, unlike the above-described ceramic element in which the ceramic element is an insulator.
半導体磁器コンデンサを一言でいうと、半導体磁器の通
常の外表面、または内表面にある粒界に、容量性の絶縁
層を形成させてなるものである。このような半導体磁器
コンデンサにおいて、前者は表面層型とよばれ、後者は
粒界層型といわれている。To put it simply, a semiconductor ceramic capacitor is one in which a capacitive insulating layer is formed at grain boundaries on the normal outer or inner surface of a semiconductor ceramic. In such semiconductor ceramic capacitors, the former is called a surface layer type, and the latter is called a grain boundary layer type.
これまで知られている半導体磁器コンデンサの種類は多
いが、それらは上記のふたつのタイプのいずれかにほと
んど分類される。表面層型半導体磁器コソデンサは、そ
の磁器素子の表面に薄い絶縁層を形成し、それによる容
量を利用したものである。There are many types of semiconductor ceramic capacitors known so far, but most of them can be classified into one of the above two types. A surface layer type semiconductor ceramic capacitor has a thin insulating layer formed on the surface of its ceramic element, and utilizes the capacitance created by the thin insulating layer.
構造的には磁器素子の厚みのほとんどは導電体で占めら
れており、表面の薄い層が誘電体として働くものである
ため、低電圧用で大容量のコンデンサを得ることができ
る。一方、粒界層型半導体磁器コンデンサは、半導体磁
器素子の表面に、それを絶縁物化する働きのある金属、
たとえばCuまたはMnの酸化物を塗布し、熱処理する
ことによって、結晶粒界層を絶縁物化してなるものであ
る。このような粒界層を譲雷体化しているため、耐圧が
優れ、高電圧用に適した抵抗値と容量を得ることができ
る。絶縁層を半導体磁器素子の表面、または結晶の粒界
のいずれかに主として生成するかは、素子中への酸素の
拡散や不純物の局性に微妙に影響される。Structurally, most of the thickness of the ceramic element is occupied by the conductor, and the thin layer on the surface acts as a dielectric, making it possible to obtain a capacitor with a large capacity for low voltage use. On the other hand, grain boundary layer type semiconductor ceramic capacitors have a metal layer on the surface of the semiconductor ceramic element that acts as an insulator.
For example, the crystal grain boundary layer is made into an insulator by applying Cu or Mn oxide and heat treating it. Since such a grain boundary layer is made into a lightning conductor, it has excellent withstand voltage and can obtain resistance values and capacitances suitable for high voltage applications. Whether the insulating layer is mainly formed on the surface of the semiconductor ceramic element or at the grain boundaries of the crystal is subtly influenced by the diffusion of oxygen into the element and the locality of impurities.
またコンデンサとして半導体磁器を利用する場合、その
特性は半導体磁器を構成する組成物、さらにはその副成
分によっても大きく左右される。粒界型半導体磁器コン
デンサの磁器素子として従来より使用されているものに
、BaTi03にSr,Bi,ZrあるいはSnなどの
酸化物を固溶させたものがある。Furthermore, when semiconductor ceramics are used as capacitors, their characteristics are greatly influenced by the composition of the semiconductor ceramics and further by its subcomponents. BACKGROUND ART Conventionally used ceramic elements for grain boundary type semiconductor ceramic capacitors include BaTi03 in which oxides such as Sr, Bi, Zr, or Sn are dissolved as a solid solution.
これはみかけ上、実効誘電率が40000〜70000
と大きいけれども、容量温度変化率が大きく、2000
を基準とし、一2500から8500の温度範囲内にお
いて最大変化率が±50%前後である。そして誘電体損
失(tan6)も0.0球茎度と大きい。また等モルの
SrTi03にDy,Ce,Mn,Ta,W,Nb,S
iなどの酸化物を添加したもの、さらにはSrTi03
の一部をCaTi03で置換したものからなる半導体磁
器を使用したものがある。このS「Ti03系半導体磁
器は、上記欧Ti03系のものに比べて、容量温度変化
率が士15%程度と著しく小さくなり、またその誘電体
損失(ねn6)も0.007〜0.03と小さいものも
得られている。しかしながら、競結に要する温度が14
600C以上と高いため一般的でない。本発明は上記の
ような欠点を除去した磁器コンデンサを製造することが
できるもので、得られるコンデンサは粒界層型半導体磁
器コソデンサであり、見掛実効誘電率が大きいこと、誘
電体損失が小さいこと、特に静電容量の温度変化率が広
い温度範囲にわたって著しく小さいこと、抵抗値が大き
くかつ破壊電圧が高いこと、および寿命特性が良好であ
ることといった特長をもつものである。This apparently has an effective dielectric constant of 40,000 to 70,000.
Although it is large, the capacitance temperature change rate is large and 2000
is the standard, and the maximum rate of change is around ±50% within the temperature range of -2500 to 8500 °C. The dielectric loss (tan6) is also as large as 0.0 cormness. In addition, Dy, Ce, Mn, Ta, W, Nb, S
Added oxides such as i, and even SrTi03
There is one using semiconductor porcelain made of CaTi03 partially substituted with CaTi03. This S'Ti03-based semiconductor porcelain has a significantly smaller capacitance temperature change rate of about 15% compared to the European Ti03-based one, and its dielectric loss (n6) is also 0.007 to 0.03. However, the temperature required for binding is 14
It is not common because it is high at 600C or more. The present invention makes it possible to manufacture a ceramic capacitor that eliminates the above-mentioned drawbacks, and the resulting capacitor is a grain boundary layer type semiconductor ceramic capacitor that has a large apparent effective dielectric constant and a small dielectric loss. In particular, it has the following characteristics: the temperature change rate of capacitance is extremely small over a wide temperature range, the resistance value is large and the breakdown voltage is high, and the life characteristics are good.
本発明の方法を特徴とするところは、Ti02成分が5
0.02〜52.00モル%およびSr○成分が49.
98〜48.00モル%からなる主成分10の重量部に
対して、Bi203成分を0.1〜8.5重量%、およ
びTa205成分、NQ05成分、Sb2Q成分のうち
少なくとも1種を0.04〜2.2重量部添加した組成
物を、窒素と水素との混合ガス雰囲気中で焼結して、半
導体磁器の粒界層を絶縁物化することにある。さらにま
た必要に応じてそれにAI,CuおよびZnのうちの少
なくとも1種、またはその合金を用いて、溶射法により
、金属電極を形成することにある。この方法によれば、
成分の割合を変化させることにより、見掛誘電率の大き
さや容量温度変化率を自由に選定することができるもの
であり、その製造も容易である。The method of the present invention is characterized in that the Ti02 component is 5
0.02 to 52.00 mol% and Sr○ component is 49.
With respect to the weight part of the main component 10 consisting of 98 to 48.00 mol%, 0.1 to 8.5 weight% of Bi203 component and 0.04% of at least one of Ta205 component, NQ05 component, and Sb2Q component. The purpose is to sinter the composition to which ~2.2 parts by weight has been added in a mixed gas atmosphere of nitrogen and hydrogen, thereby converting the grain boundary layer of semiconductor ceramic into an insulator. Furthermore, if necessary, a metal electrode is formed by thermal spraying using at least one of AI, Cu, and Zn, or an alloy thereof. According to this method,
By changing the proportions of the components, the magnitude of the apparent dielectric constant and the rate of change in capacitance with temperature can be freely selected, and manufacturing is also easy.
さらに暁結して得た磁器素子は、はんだ付けにより容易
にリード線を接続することができるものである。ここで
半導体磁器の組成を定めた理由について述べる。Furthermore, the ceramic element obtained by this process can be easily connected with lead wires by soldering. Here we will discuss the reasons for determining the composition of semiconductor porcelain.
主成分において、Tj02成分が多くなると誘電率が減
少し、誘電体損失と容量温度変化率が大きくなり、かつ
磁器素子の抵抗が減少する。また、その量が少なくなる
と誘電率が小さくなり、容量温度変化率が大きくなる。
このため、その組成比率は主成分において50.02〜
52.00モル%の範囲内であることが望ましい。Sr
○成分が多くなると誘電率や容量温度変化率、絶縁抵抗
が悪くなり、かつ磁器素子が半導体化しにくくなる。In the main components, when the Tj02 component increases, the dielectric constant decreases, the dielectric loss and the capacitance temperature change rate increase, and the resistance of the ceramic element decreases. Furthermore, when the amount decreases, the dielectric constant decreases and the capacitance temperature change rate increases.
Therefore, the composition ratio of the main components is 50.02~
It is desirable that the content be within the range of 52.00 mol%. Sr.
○If the amount of the component increases, the dielectric constant, capacitance temperature change rate, and insulation resistance will deteriorate, and it will be difficult to convert the ceramic element into a semiconductor.
逆にその量が少なくなると、その容量温度変化率や絶縁
抵抗を改善するという効果が乏しくなり、謙露体損失も
大きくなるごそのため、この組成比率は主成分において
49.98〜48.00モル%の範囲内であることが望
ましい。Bi203成分は、磁器の高周波誘電体損失を
減少させるのに特に有用なものである。ところが、それ
が多すぎると、磁器が粗くなり、高周波での誘電体損失
が増大するばかりでなく、絶縁抵抗の寿命特性も劣化す
る。また少なすぎると、磁器がその拡散温度に対して不
安定なものとなり、それとともに高周波での誘電体損失
も悪化する。このため、Bi203成分は、主成分10
0重量部に対して、0.1〜8.5重量部であることが
望ましい。Ta2Q、Nb205、SQ03といった成
分は、SrTi03系磁器の半導体化に効果のあるもの
であるが、これのみでは再現性が悪くなるとともに、高
周波での誘電体損失も大きくなり、好ましくない。ころ
が、Bi203成分とともにSの−Ti02系磁器に含
ませることによって、半導体磁器の比抵抗が安定し、再
現性がよくなる。そして、高周波での誘電体損失や容量
温度変化率も改善される。ところが、それが多すぎると
、誘電率が低下し、繊密な磁器素子を焼結することが困
難になり、また誘電体損失も悪くなる。そして、それが
少なくなると誘電率が著しく低下するとともに、容量温
度変化率が大きくなる。このため、上記成分の合計量は
、上記組成の主成分100重量部に対して、0.04〜
2.2重量部の範囲内にあることが望ましい。さらに、
本発明において、焼成雰囲気を窒素と水素との混合ガス
としているのは、磁器の比抵抗を低下させ、かつその後
に粒界に絶縁物を生成させる過程で、結晶粒子そのもの
が絶縁物化することを防止するためである。On the other hand, if the amount decreases, the effect of improving the capacitance-temperature change rate and insulation resistance will be poor, and the loss of insulation will also increase. It is desirable that it be within the range of %. The Bi203 component is particularly useful in reducing high frequency dielectric losses in porcelain. However, if there is too much of it, not only will the porcelain become rough and the dielectric loss at high frequencies increase, but also the life characteristics of the insulation resistance will deteriorate. On the other hand, if the amount is too small, the porcelain becomes unstable with respect to its diffusion temperature, and dielectric loss at high frequencies also worsens. Therefore, the Bi203 component has a main component of 10
It is desirable that the amount is 0.1 to 8.5 parts by weight relative to 0 parts by weight. Components such as Ta2Q, Nb205, and SQ03 are effective in converting SrTi03-based ceramics into semiconductors, but using only these components causes poor reproducibility and increases dielectric loss at high frequencies, which is not preferable. By including the rollers together with the Bi203 component in the S-Ti02 based porcelain, the specific resistance of the semiconductor porcelain is stabilized and reproducibility is improved. In addition, dielectric loss and capacitance temperature change rate at high frequencies are also improved. However, if there is too much of it, the dielectric constant decreases, making it difficult to sinter a delicate ceramic element, and dielectric loss also worsens. When it decreases, the dielectric constant decreases significantly and the capacitance temperature change rate increases. Therefore, the total amount of the above components is 0.04 to 100 parts by weight of the main component of the above composition.
It is desirable that the amount is within the range of 2.2 parts by weight. moreover,
In the present invention, the reason why the firing atmosphere is a mixed gas of nitrogen and hydrogen is to reduce the specific resistance of the porcelain and to prevent the crystal grains themselves from becoming insulators in the process of generating insulators at the grain boundaries. This is to prevent this.
上記組成物においては、この混合ガス雰囲気を使用する
ことが必須の要件である。次に本発明の方法について、
実施例にもとづいて説明する。In the above composition, it is essential to use this mixed gas atmosphere. Next, regarding the method of the present invention,
An explanation will be given based on an example.
〔実施例 1〕
まず、純度98%以上の工業用原料のTi02とSrC
03,Bj203、および純度99%以上のTa205
,NQ05,SQ03の粉末を準備し、第1表の組成比
率になるよう、それぞれ調合した。[Example 1] First, Ti02 and SrC, which are industrial raw materials with a purity of 98% or more,
03, Bj203, and Ta205 with a purity of 99% or more
, NQ05, and SQ03 were prepared and mixed to have the composition ratios shown in Table 1.
なお、TiおよびSrの両成分は焼成の過程で酸化物の
形になるものであれば、特にその種類を問わない。所定
の組成比率になるよう調合した原料粉末をウレタン内張
ポケットに入れ、ウレタンボールを用いて湿式混合して
から、混合物の水分を蒸発させた。そして、1160o
oで2時間、仮焼成してから微粉砕し、これを約700
k9/のの圧力で直径15側、厚さ0.8肋の円板状に
成型した。この成型体を窒素と水素との混合ガス雰囲気
中で、1360〜1450002時間保持して焼成した
。なお焼成はアルミナ燃焼管中で、SIC発熱体を使用
して実施した。得られた半導体磁器素子の表面に、Cu
20,Cび○,Bj203などのうち少なくとも一種を
拡散物質として0.1〜3の9塗布し、大気中において
1100〜1300午0で熱処理し、拡散させた。Note that the types of both Ti and Sr are not particularly limited as long as they become oxides during the firing process. Raw material powders prepared to have a predetermined composition ratio were placed in a urethane-lined pocket, wet-mixed using a urethane ball, and then water in the mixture was evaporated. And 1160o
Temporarily calcined at o for 2 hours and then finely ground to approximately 700
It was molded into a disk shape with a diameter of 15 sides and a thickness of 0.8 ribs at a pressure of 9/8 k. This molded body was held and fired in a mixed gas atmosphere of nitrogen and hydrogen for 1,360 to 1,450,002 hours. The firing was carried out in an alumina combustion tube using an SIC heating element. On the surface of the obtained semiconductor ceramic element, Cu
At least one of No. 20, Cbi○, Bj203, etc. was applied as a diffusing substance at a rate of 0.1 to 3, and heat treated at 1100 to 1300 o'clock in the atmosphere to diffuse it.
このようにして得た磁器素体をX線マイクロアナラィザ
で調べ、粒界に拡散物質のイオンが存在していることを
確認した。The thus obtained porcelain body was examined using an X-ray microanalyzer, and it was confirmed that ions of a diffusive substance were present in the grain boundaries.
さらに、半導体磁器素子の両面に銀ペーストを焼き付け
てAg電極を形成した。Further, silver paste was baked on both sides of the semiconductor ceramic element to form Ag electrodes.
比較のため、磁器素子を窒素中、水素中、および空気中
でそれぞれ焼成した(試料29,30,31)。第1表
第2表に、上記各試料の特性を示す。For comparison, ceramic elements were fired in nitrogen, hydrogen, and air, respectively (Samples 29, 30, and 31). Tables 1 and 2 show the characteristics of each sample.
同表において、誘電率(ご)は温度を20ooとし、周
波数IKH2で測定した値である。誘電体損失(tan
6)は温度20qCにおいて、IKHZとIMHZの周
波数で測定した値である。また容量温度変化率は謙電率
どの温度変化率、すなわち20℃における値を基準とし
、一55午Cと8500のときの値の変化率で評価した
。また絶縁抵抗は印加電圧を50Vの直流電圧として温
度20℃において測定したときの値である。耐湿負荷寿
命特性は、素子にリード線をはんだづけし、絶縁被覆を
施して完成品としたものについて、温度40oo、湿度
95%の雰囲気中において、直流電圧100Vを200
畑時間印加した後の絶縁抵抗値で評価したo第2表
第1表の試料1〜9は主成分のみの組成比率を変化させ
たもので、これから明らかなように、主成分が本発明の
範囲内の組成比率であるとき、誘電特性と絶縁抵抗にお
いて優れている。In the same table, the dielectric constant (g) is a value measured at a temperature of 20 oo and a frequency of IKH2. Dielectric loss (tan
6) is the value measured at the frequencies of IKHZ and IMHZ at a temperature of 20 qC. The rate of change in capacitance with temperature was evaluated by the rate of change in temperature at 155 o'clock C and 8,500 o'clock, using the rate of change in temperature at 20° C. as a standard. Further, the insulation resistance is a value measured at a temperature of 20° C. with an applied voltage of 50 V DC voltage. The humidity resistance load life characteristics are as follows for a completed product with lead wires soldered to the element and an insulating coating applied, under a DC voltage of 100 V at 200 V in an atmosphere of a temperature of 40 oo and a humidity of 95%.
Table 2 Samples 1 to 9 in Table 1, which were evaluated by the insulation resistance value after applying field time, were samples in which only the composition ratio of the main component was changed, and as is clear from this, the main component was the same as that of the present invention. When the composition ratio is within this range, the dielectric properties and insulation resistance are excellent.
すなわち、譲亀率が40000以上、誘電体損失がIM
HZで1.0%以下、容量温度変化率はほぼ±13%以
内であり絶縁抵抗が1ぴMQ−肌オーダー以上である。
特に試料4は全般的に特性の優れたものであり、コンデ
ンサとしてきわめて優れた特性をもつものである。試料
10〜18はBj203成分の添加量のみを変化させた
ものであり、これらから誘電体損失と絶縁抵抗が本発明
の範囲内の試料11〜17についてはきわめて良好なも
のである。In other words, the concession factor is 40,000 or more, and the dielectric loss is IM.
The HZ is 1.0% or less, the capacitance temperature change rate is approximately within ±13%, and the insulation resistance is on the order of 1 piMQ-skin or more.
In particular, sample 4 has excellent characteristics overall, and has extremely excellent characteristics as a capacitor. Samples 10 to 18 are samples in which only the amount of Bj203 component added is changed, and samples 11 to 17 have very good dielectric loss and insulation resistance within the range of the present invention.
試料19〜25は、Ta2QやNb2QやSb203の
各成分の添加量を変化させたものである。Samples 19 to 25 are samples in which the amounts of each component of Ta2Q, Nb2Q, and Sb203 were varied.
また、試料26〜30は焼成雰囲気が特性に及ぼす影響
を示すもので、空気中において照成した試料31は、誘
電率および容量温度変化率のいずれもきわめて悪いもの
であった。Further, Samples 26 to 30 show the influence of the firing atmosphere on the characteristics, and Sample 31, which was irradiated in air, had extremely poor dielectric constant and capacitance temperature change rate.
また、窒素中のみで焼成した試料29および水素中のみ
で焼成した試料30は、譲雷体損失と容量温度変化率の
悪いものであった。これから、焼成雰囲気としては、窒
素と水素との混合ガスであることが望ましいことがわか
る。〔実施例 2〕
Ti02成分が50.12%、Sr○成分が49.88
モル%である主成分100重量部に対して、Bj203
成分が3.0重量部、Ta205成分が0.15重量部
、およびNQ05成分が0.05重量部となるよう原料
を配合し、実施例1の試料4と同じ条件で焼成してから
、第3表に示すような拡散物質をそれぞれ拡散させた。In addition, Sample 29 fired only in nitrogen and Sample 30 fired only in hydrogen had poor transfer body loss and capacity temperature change rate. From this, it can be seen that the firing atmosphere is preferably a mixed gas of nitrogen and hydrogen. [Example 2] Ti02 component is 50.12%, Sr○ component is 49.88%
Bj203 to 100 parts by weight of the main component which is mol%
The raw materials were mixed so that the components were 3.0 parts by weight, the Ta205 component was 0.15 parts by weight, and the NQ05 component was 0.05 parts by weight, and fired under the same conditions as Sample 4 of Example 1. Diffusion substances shown in Table 3 were diffused.
得られた半導体磁器素子にAIを溶射法によって付着さ
せ、さらにその上にCuを溶射して、電極を形成した。
このようにして作製した半導体磁器コンデンサについて
、実施例1と同じ条件で特性の測定をした。その結果を
第3表に示す。第3表
上表から明らかなように、CuまたはBi、またはその
両者の成分を拡散物質として使用した場合、特性の優れ
た半導体磁器コンデンサの得られることがわかる。AI was deposited on the obtained semiconductor ceramic element by thermal spraying, and Cu was further sprayed thereon to form electrodes.
The characteristics of the semiconductor ceramic capacitor thus produced were measured under the same conditions as in Example 1. The results are shown in Table 3. As is clear from the upper table of Table 3, it can be seen that semiconductor ceramic capacitors with excellent characteristics can be obtained when Cu, Bi, or both components are used as the diffusion material.
〔実施例 3〕
Ti02が50.12モル%、Sr○分が49.88モ
ル%となる主成分100重量部に対して、Bi203成
分が3.0重量部、Ta205成分が0.15重量部お
よびNQ05成分が0.05重量部となるより、原料を
配合し、実施例1の試料4と同じ条件で焼成した得た半
導体磁器素子に溶射法によって電極付けをした。[Example 3] 3.0 parts by weight of Bi203 component and 0.15 parts by weight of Ta205 component for 100 parts by weight of the main components with Ti02 being 50.12 mol% and Sr○ content being 49.88 mol%. The raw materials were blended so that the NQ05 component was 0.05 parts by weight, and electrodes were attached to the semiconductor ceramic element obtained by firing under the same conditions as Sample 4 of Example 1 by thermal spraying.
なおAI電極については、さらにその上にはんだづけの
可能なCuを溶射した。比較のため、A幻電極を高温焼
付けで形成した。このようにして作製した半導体磁器コ
ンデンサについて、実施例1と同じ条件で特性の測定を
した。Note that for the AI electrode, solderable Cu was further thermally sprayed on top of the AI electrode. For comparison, an A-phantom electrode was formed by high-temperature baking. The characteristics of the semiconductor ceramic capacitor thus produced were measured under the same conditions as in Example 1.
その結果を第4表に示す。第4表
※)AI−0r合金はAIが80原子紫,0rが20原
子紫の合金である。The results are shown in Table 4. Table 4 *) The AI-0r alloy is an alloy in which AI has 80 atoms purple and 0r has 20 atoms purple.
第4表から明らかなように、Ag競付電極であっても十
分優れた特性を得ることができる。しかし、熔射法で電
極付けをした方がさらに誘電率の大きい磁器コンデンサ
を作製できることがわかる。特に電極材料としてはAI
,Cu,Znといった金属材料の入手の容易さ、安価、
および取扱いの容易さから量産に通したものである。以
上説明したように、本発明の方法によれば、各種の特性
に優れている半導体磁器コンデンサを容易に量産するこ
とができ、電子部品として有用なコンデンサを提供する
ことができる。As is clear from Table 4, sufficiently excellent characteristics can be obtained even with Ag competitive electrodes. However, it is clear that a ceramic capacitor with an even higher dielectric constant can be produced by attaching electrodes using the blasting method. In particular, AI is used as an electrode material.
, Cu, Zn and other metal materials are readily available and inexpensive;
It was put into mass production because of its ease of handling. As explained above, according to the method of the present invention, it is possible to easily mass-produce semiconductor ceramic capacitors having excellent various characteristics, and it is possible to provide capacitors useful as electronic components.
Claims (1)
よびSrO成分が49.98〜48.00モル%からな
る主成分100重量部に対して、Bi_2O_3成分を
0.1〜8.5重量部、およびTa_2O_5成分、N
b_2O_5成分、Sb_2O_3成分のうちの1種以
上を合計量で0.04〜2.2重量部添加して得られた
粉末を所望の形状に成形し、窒素と水素との混合ガスの
雰囲気中で1360℃から1450℃の度で焼結して、
得られた半導体磁器素体の結晶粒界層をCu,Biのい
ずれか一方または両方の酸化物を塗布し、1100℃か
ら1300℃の度で熱処理して絶縁物化することを特徴
とする半導体磁器コンデンサの製造方法。 2 TiO_2成分が50.02〜52.00モル%お
よびSrO成分が49.98〜48.00モル%からな
る主成分100重量部に対して、Bi_2O_3成分を
0.1〜8.5重量部、およびTa_2O_5成分、N
b_2O_5成分、Sb_2O_3成分のうちの1種以
上を合計量で0.04〜2.2重量部添加して得られた
粉末を所望の形状に成形して窒素と水素との混合ガスの
雰囲気中で1360℃から1450℃の度で焼結して、
得られた半導体磁器素体の表面にCu,Biのいずれか
一方または両方の酸化物を塗布し、1100℃から13
00℃の温度で熱処理して結晶粒界層を絶縁物化し、さ
らにこの絶縁物化した半導体磁器素体に、Al,Cuお
よびZnの金属群から選ばれた少なくとも1種、または
その合金を溶射して、電極を形成することを特徴とする
半導体磁器コンデンサの製造方法。[Claims] 1. Bi_2O_3 component is added in an amount of 0.1 to 100 parts by weight based on 100 parts by weight of the main component consisting of 50.02 to 52.00 mol% of TiO_2 component and 49.98 to 48.00 mol% of SrO component. 8.5 parts by weight, and Ta_2O_5 component, N
The powder obtained by adding one or more of the b_2O_5 component and the Sb_2O_3 component in a total amount of 0.04 to 2.2 parts by weight is molded into a desired shape, and then molded in an atmosphere of a mixed gas of nitrogen and hydrogen. Sintered at a temperature of 1360℃ to 1450℃,
A semiconductor porcelain characterized in that the crystal grain boundary layer of the obtained semiconductor porcelain body is coated with an oxide of one or both of Cu and Bi, and then heat-treated at a temperature of 1100°C to 1300°C to form an insulator. Method of manufacturing capacitors. 2 0.1 to 8.5 parts by weight of Bi_2O_3 component to 100 parts by weight of the main component consisting of 50.02 to 52.00 mol% of TiO_2 component and 49.98 to 48.00 mol% of SrO component, and Ta_2O_5 component, N
The powder obtained by adding one or more of the b_2O_5 component and the Sb_2O_3 component in a total amount of 0.04 to 2.2 parts by weight is molded into a desired shape in an atmosphere of a mixed gas of nitrogen and hydrogen. Sintered at a temperature of 1360℃ to 1450℃,
An oxide of one or both of Cu and Bi is applied to the surface of the obtained semiconductor ceramic body, and heated at 1100°C to 13°C.
The grain boundary layer is made into an insulator by heat treatment at a temperature of 00°C, and then at least one member selected from the metal group of Al, Cu, and Zn, or an alloy thereof is sprayed onto this insulator. A method of manufacturing a semiconductor ceramic capacitor, comprising: forming an electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50148687A JPS6029213B2 (en) | 1975-12-12 | 1975-12-12 | Manufacturing method of semiconductor ceramic capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50148687A JPS6029213B2 (en) | 1975-12-12 | 1975-12-12 | Manufacturing method of semiconductor ceramic capacitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5271665A JPS5271665A (en) | 1977-06-15 |
| JPS6029213B2 true JPS6029213B2 (en) | 1985-07-09 |
Family
ID=15458346
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50148687A Expired JPS6029213B2 (en) | 1975-12-12 | 1975-12-12 | Manufacturing method of semiconductor ceramic capacitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6029213B2 (en) |
-
1975
- 1975-12-12 JP JP50148687A patent/JPS6029213B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5271665A (en) | 1977-06-15 |
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