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JPS6034636B2 - Method and device for preventing plating from turning in electric plating - Google Patents
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JPS6034636B2 - Method and device for preventing plating from turning in electric plating - Google Patents

Method and device for preventing plating from turning in electric plating

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Publication number
JPS6034636B2
JPS6034636B2 JP4483281A JP4483281A JPS6034636B2 JP S6034636 B2 JPS6034636 B2 JP S6034636B2 JP 4483281 A JP4483281 A JP 4483281A JP 4483281 A JP4483281 A JP 4483281A JP S6034636 B2 JPS6034636 B2 JP S6034636B2
Authority
JP
Japan
Prior art keywords
plated
potential
plating
anode
electroplating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4483281A
Other languages
Japanese (ja)
Other versions
JPS57158395A (en
Inventor
眞一 岡本
憲一朗 二村
寛 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiho Kogyo Co Ltd
Original Assignee
Taiho Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiho Kogyo Co Ltd filed Critical Taiho Kogyo Co Ltd
Priority to JP4483281A priority Critical patent/JPS6034636B2/en
Publication of JPS57158395A publication Critical patent/JPS57158395A/en
Publication of JPS6034636B2 publication Critical patent/JPS6034636B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は電気メッキに関し、より詳しくは、電気メッキ
を行なうに際してメッキが被メッキ物の裏面に施されて
しまうことを防止するようにした電気メッキにおけるメ
ッキの裏回り防止方法と装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to electroplating, and more particularly, to prevention of plating from turning around in electroplating, which prevents plating from being applied to the back side of an object to be plated during electroplating. METHODS AND APPARATUS.

電気メッキは、被メッキ物を陰極として電解液中に配設
し、その電解液中に設けた陽極を上記被メッキ物にメッ
キすべき金属から構成して直流電流を流すことによって
行なっている。
Electroplating is carried out by placing the object to be plated as a cathode in an electrolytic solution, making an anode in the electrolytic solution made of the metal to be plated, and passing a direct current through the object.

従釆、例えば内燃機関の軸受として用いられる半割りす
べり軸受では、その内面の沼動面にオーバレィとして鉛
メッキ等を施しているが、そのメッキの際、メッキがす
べり軸受の裏面すなわち外周面に施されないように配慮
する必要がある。このため従来は、すべり軸受の内面と
陽極とを対向させてその内面にメッキが施され易くする
と同時に、すべり軸受の裏側に回った電解液を内面側の
電解液からできるだけ遮断して電流がすべり軸受の裏面
に回り込むことを防止し、もつてメッキがすべり軸受の
裏面に施されるのを防止するようにしていた。しかしな
がら、大量生産に通した工程や、すべり軸受によっては
内面と裏面とを貫通する油穴を有するものがある等の事
情を考慮すると、電解液がすべり軸受の裏側に回り込む
のを防止し、或し、は裏側に回り込んだ電解液とメッキ
面側の電解液とを完全に遮断するのは事実上不可能で、
このため裏面に施されたメッキをバフ作業等により取り
除く必要があった。本発明はこのような点に鑑み、被メ
ッキ物に通常の電気メッキを施すのと同機に電位を印加
した状態のまま、被メッキ物の裏面側に裏回り防止電極
を配置して被メッキ物とこの裏回り防止電極間には被メ
ッキの電位を基準電位としたときの析出電位と溶出電位
間の電位をかけることにより上記被メッキ物の裏面にメ
ッキが施されるのを防止するようにした方法と装置とを
提供するものである。
For example, in a half-split plain bearing used as a bearing for an internal combustion engine, lead plating is applied to the inner surface of the sliding bearing as an overlay. Care must be taken to ensure that this is not the case. For this reason, in the past, the inner surface of the slide bearing and the anode were made to face each other to facilitate plating on the inner surface, and at the same time, the electrolyte that had flowed to the back side of the slide bearing was blocked as much as possible from the electrolyte on the inner surface to prevent the current from sliding. This prevents the plating from going around to the back surface of the bearing, and prevents plating from being applied to the back surface of the sliding bearing. However, considering the process involved in mass production and the fact that some sliding bearings have oil holes that penetrate the inner and back surfaces, it is necessary to prevent the electrolyte from going around to the back side of the sliding bearing. However, it is virtually impossible to completely block the electrolyte that has gone around to the back side and the electrolyte on the plated side.
For this reason, it was necessary to remove the plating applied to the back surface by buffing or the like. In view of these points, the present invention is designed to perform normal electroplating on the object to be plated, by placing a back-turn prevention electrode on the back side of the object while applying a potential to the same machine. By applying a potential between the deposition potential and the elution potential when the potential of the plated object is taken as a reference potential between the back-turn prevention electrode and the reverse side prevention electrode, plating is prevented from being applied to the back surface of the object to be plated. The present invention provides a method and apparatus for achieving the same.

以下図示実施例について本発明を説明すると、第1図お
よび第2図において、1はメッキ槽、2は電解液、3は
陽極、4は被メッキ物としての半割りすべり軸受6を収
納した架台で、この架台4は箱形の本体6とその本体内
に収納された支持台7とを備えている。
The present invention will be described below with reference to the illustrated embodiments. In FIGS. 1 and 2, 1 is a plating tank, 2 is an electrolytic solution, 3 is an anode, and 4 is a frame housing a half-split plain bearing 6 as an object to be plated. The pedestal 4 includes a box-shaped main body 6 and a support base 7 housed within the main body.

支持台7は、第2図の左側面に紙面と垂直方向に延びる
略台形状の溝8を有し、この溝8の底部両側に、互いに
平行かつ溝8に沿って延びるステンレス製のパイプ9を
取付けている。そしてこのパイプ9内にそれぞれ棒状の
永久磁石10を挿入固定し、この磁石10によって上記
すべり軸受5を一対のパイプ9に吸着できるようにして
いる。上記支持台7は、複数のすべり軸受5を上下に車
積させてパイプ9に吸着させた状態で、ばね11によっ
て第2図方向に附勢され、各すべり軸受5の両端部を本
体6の前面板6a内面に弾援保持している。
The support stand 7 has a substantially trapezoidal groove 8 extending perpendicularly to the plane of the drawing on the left side surface of FIG. is installed. Rod-shaped permanent magnets 10 are inserted and fixed into each of the pipes 9, so that the slide bearings 5 can be attracted to the pair of pipes 9 by the magnets 10. The support stand 7 is biased in the direction of FIG. It is held on the inner surface of the front plate 6a.

この前面板6aには、外側が拡関したブーパ状の開口1
2を上記溝8の長手方向に沿って形成し、この関口12
を上記陽極3に対向させ、これによりこの閉口12を介
して本体6内に保持されたすべり軸受5のメッキ面であ
る内面5aを上記陽極3に対向させている。さらに上記
開ロー2の支持台7側緑部12aはその開口12の輪郭
形状に沿って若干内側に突出させ、陰極としてのすべり
軸受5の内面5aと上記陽極3との間の電流経路の各距
離がその内面5aの各部分において略等しくなるように
し、これにより均一なメッキ槽を形成できるようにして
いる。さらに、上記ステンレス製の一対のパイプ9は導
電線13を介して第1の直流電源14の負側に接続し、
かつその直流電源14の正側は導電線15を介して陽極
3に接続している。
This front plate 6a has a boopa-shaped opening 1 whose outside is widened.
2 is formed along the longitudinal direction of the groove 8, and this gate 12 is formed along the longitudinal direction of the groove 8.
is opposed to the anode 3, so that the inner surface 5a, which is the plated surface of the sliding bearing 5 held in the main body 6 via the closure 12, is opposed to the anode 3. Further, the green portion 12a of the open row 2 on the support stand 7 side is made to protrude slightly inward along the contour of the opening 12, so that each of the current paths between the inner surface 5a of the sliding bearing 5 as a cathode and the anode 3 is The distances are made approximately equal in each portion of the inner surface 5a, thereby making it possible to form a uniform plating tank. Further, the pair of stainless steel pipes 9 are connected to the negative side of the first DC power source 14 via a conductive wire 13,
The positive side of the DC power supply 14 is connected to the anode 3 via a conductive wire 15.

したがって電流は直流電源14の正側から導電線15、
陽極3、電解液2、すべり軸受5、パイプ9および導電
線13を介して直流電源14の負側に流れ、従来周知の
ように、上記すべり軸受5の内面5aにメッキを施す。
然して、本実施例においては、上記すべり軸受5の裏面
5bにメッキが施されるのを防止するために、その裏面
5bに対向させて裏回り防止電極としての導電線16を
配設している。
Therefore, the current flows from the positive side of the DC power supply 14 to the conductive wire 15,
It flows to the negative side of the DC power supply 14 via the anode 3, the electrolytic solution 2, the sliding bearing 5, the pipe 9 and the conductive wire 13, and the inner surface 5a of the sliding bearing 5 is plated as is conventionally known.
However, in this embodiment, in order to prevent the back surface 5b of the slide bearing 5 from being plated, a conductive wire 16 is provided as an electrode to prevent reverse rotation, facing the back surface 5b. .

この導電線16は支持台7に形成した溝8の底部中央お
よび両側部にその溝8に沿って配設固定してあり、かつ
、導電線17を介して第2の直流電源18の負側に接続
している。またこの直流電源18の正側は上記導電線1
3に接続している。以上の構成において、直流電源18
を考慮した上で、直流電源14により最適な値の電流を
流せば、すべり軸受5の内面5aに電気メッキが施せる
ことは明らかである。
This conductive wire 16 is arranged and fixed along the bottom center and both sides of a groove 8 formed in the support base 7, and is connected to the negative side of the second DC power supply 18 via the conductive wire 17. is connected to. Further, the positive side of this DC power supply 18 is connected to the conductive wire 1
Connected to 3. In the above configuration, the DC power supply 18
It is clear that electroplating can be applied to the inner surface 5a of the sliding bearing 5 if an optimum value of current is caused to flow from the DC power supply 14 in consideration of the above.

一方、直流電源18の電位は、次のようにして設定され
る。すなわち、第3図はある基準電極に対するすべり軸
受5の裏面5bの電位と、導電線16とすべり軸受5の
裏面5bの電流との関係を示したものであり、同図にお
いて、点Aは電位をそれ以下としたときにすべり軸受5
の裏面5bにメッキが施されてしまう点を、点Bはすべ
り軸受5の裏面5bの溶解が激しくなり、軸受性能に悪
影響を及ぼすようになる点をそれぞれ示している。した
がって上記髪回り防止電極16には、点AとBとの間の
電位を加えればよく、これによってすべり軸受5の裏面
にメッキが施されるのを良好に防止することができる。
なお、直流電源14と18との関係では、直流電線18
の電位差が直流電源14より小さくて、例えば1/5〜
1′15塁度となるのが好ましい。さらに、具体的に詳
述すると、第4図a〜dは陽極3、すべり軸受5、およ
び裏回り防止電極としての導電線16の電位の相対的関
係と、すべり軸受5と裏回り防止電極としての導電線1
6間の印加電位、つまり直流電源18の電位差の具体的
な設定方法について説明するものである。まず、第4図
aの如く、陽極3を直流電源14の正側に、すべり軸受
5の内面5aを陽極3に対向させて直流電源14の負側
に接続すれば、第4図bの如く電解液2の絶対電位OV
に対して上記陽極3は正例の電位V,、すべり軸受5の
内面5aは負側の電位V2となり、内面5aにメッキが
施される。
On the other hand, the potential of the DC power supply 18 is set as follows. That is, FIG. 3 shows the relationship between the potential of the back surface 5b of the plain bearing 5 with respect to a certain reference electrode and the current between the conductive wire 16 and the back surface 5b of the plain bearing 5. In the figure, point A is the potential If it is less than that, the sliding bearing 5
Point B indicates the point where the back surface 5b of the plain bearing 5 is plated, and point B indicates the point where the back surface 5b of the plain bearing 5 becomes severely melted, which adversely affects bearing performance. Therefore, it is sufficient to apply a potential between points A and B to the hair circumference prevention electrode 16, thereby effectively preventing the back surface of the sliding bearing 5 from being plated.
In addition, in the relationship between the DC power supplies 14 and 18, the DC electric wire 18
The potential difference is smaller than that of the DC power supply 14, for example, 1/5 to
It is preferable to have a base angle of 1'15. More specifically, FIGS. 4a to 4d show the relative relationship between the potentials of the anode 3, the sliding bearing 5, and the conductive wire 16 as an electrode for preventing backtracking, and the relationship between the potentials of the anode 3, the sliding bearing 5, and the conductive wire 16 as an electrode for preventing backtracking. conductive wire 1
6, that is, a specific method of setting the potential difference of the DC power supply 18. First, as shown in Fig. 4a, if the anode 3 is connected to the positive side of the DC power supply 14, and the inner surface 5a of the sliding bearing 5 is connected to the negative side of the DC power supply 14, facing the anode 3, as shown in Fig. 4b. Absolute potential OV of electrolyte 2
On the other hand, the anode 3 has a positive potential V, and the inner surface 5a of the sliding bearing 5 has a negative potential V2, and the inner surface 5a is plated.

しかして、すべり軸受5の裏面5bにメッキが施される
のを防止すべ〈、第4図aに示す如く、すべり軸受5の
裏面5bに裏回り防止電極としての導電線16を対向さ
せすべり軸受5に直流電源18の正側を、導電線16に
直流電源18の負側を接続してすべり軸受5に対して上
記内面5aのメッキ時印加電位とは逆電位を印加すれば
、第4図bの如く、導電線16の電位はすべり軸受5の
電位V2より低い電位V3となりすべり軸受5の裏面5
bにメッキが施されるのが防止できる。
Therefore, it is possible to prevent the back surface 5b of the slide bearing 5 from being plated. As shown in FIG. 5 to the positive side of the DC power source 18 and the conductive wire 16 to the negative side of the DC power source 18, and applying a potential opposite to the potential applied during plating of the inner surface 5a to the sliding bearing 5, as shown in FIG. As shown in b, the potential of the conductive wire 16 becomes a potential V3 lower than the potential V2 of the plain bearing 5, and the back surface 5 of the plain bearing 5
It is possible to prevent plating from being applied to b.

ここで、上記導電線16に印放する電位の説定、つまり
直流電源18の電位差の具体的設定ついて第3図に関連
して相対的な関係を詳述すると、第4図cの如く、直流
電源18を可変直流電源とした場合、すべり軸受5の電
位V2を基準として導電線16の電位を第3図のA点(
メッキ析出電位)、すなわち直流電源18の電位差をV
^以上に設定するとすべり軸受5の裏面5bにメッキが
施されてしまい、他方、第3図のB点(溶出電位)、す
なわち直流電源16の電位差をVB以上に設定するとそ
の裏面5bは溶解して悪影響を及ぼすことになるため、
したがって、直流電源18の電位差としてはすべり軸受
5の電位V2を基準として析出電位と溶出電位間の電位
差V^+V8に設定すれば良く、裏面5bにメッキが施
されるのを効果的に防止できる。本発明の効果を確認す
るのに各実施例と比較してみると、例えば具体的実施条
件として、第1図において、陽極3とすべり軸受5間の
直流電源14を十4Vとし、■ すべり軸受5と裏回り
防止電極16間の直流電源18がない状態で、直流電源
14の形成する回路の電流密度が弘/dm2である場合
(従来例の場合)には、すべり軸受5の裏面5bにメッ
キが施されてしまう。
Here, regarding the description of the potential applied to the conductive wire 16, that is, the specific setting of the potential difference of the DC power supply 18, the relative relationship will be explained in detail with reference to FIG. 3, as shown in FIG. 4c. When the DC power supply 18 is a variable DC power supply, the potential of the conductive wire 16 is set to point A in FIG.
Plating deposition potential), that is, the potential difference of the DC power supply 18 is V
If it is set above ^, the back surface 5b of the sliding bearing 5 will be plated, and on the other hand, if the point B (elution potential) in FIG. This will have a negative impact on
Therefore, the potential difference of the DC power supply 18 may be set to the potential difference V^+V8 between the deposition potential and the elution potential with reference to the potential V2 of the sliding bearing 5, and plating on the back surface 5b can be effectively prevented. . In order to confirm the effects of the present invention, a comparison is made with each embodiment. For example, as a specific implementation condition, in FIG. 5 and the counter-rotation prevention electrode 16, and when the current density of the circuit formed by the DC power source 14 is Hiroshi/dm2 (in the case of the conventional example), the back surface 5b of the sliding bearing 5 It will be plated.

■ 上記直流電源18を−0.5Vとし、該電源18が
形成する回路の電流密度を0.私/dm2とした場合(
電源18の電位を第3図での基準電位OVと溶出電位B
点間の電位に設定)、すべり軸受5の裏面5bにメッキ
が施されるのを完全に防止できる。
(2) The DC power supply 18 is set to -0.5V, and the current density of the circuit formed by the power supply 18 is set to 0.5V. If I/dm2 (
The potential of the power source 18 is set to the reference potential OV and the elution potential B in FIG.
(set to the potential between points), plating on the back surface 5b of the slide bearing 5 can be completely prevented.

■ 上記直流電源18を十0.1Vとし、該電源18が
形成する回路の電流密度を形成する回路の電流密度を0
.1A/dm2とした場合(第3図での基準電位OVと
析出電位A点間の電位に設定)には、■の場合と同様す
べり軸受5の裏面5bにメッキはされない。
■ The DC power supply 18 is set to 100.1V, and the current density of the circuit formed by the power supply 18 is 0.
.. In the case of 1 A/dm2 (set to a potential between the reference potential OV and the deposition potential point A in FIG. 3), the back surface 5b of the sliding bearing 5 is not plated, as in the case (2).

■ 上記直流電源1 8を−4Vとし、該電源1 8が
形成する回路の電流密度5A/dm2とした場合(第3
図において溶出点Bを越える場合)には、すべり軸受5
の裏面5bは溶出してしまつoまた、上記実施例では被
メッキ物としてすべり軸受5を用いているが、その他の
ものを用いることができることは勿論であり、さらに、
直流電流としては交流電源からの交流を整流器を介して
直流に変換して用いてもよい。
■ When the DC power supply 18 is -4V and the current density of the circuit formed by the power supply 18 is 5A/dm2 (the third
If the elution point B in the figure is exceeded), the sliding bearing 5
Also, although the slide bearing 5 is used as the object to be plated in the above embodiment, it goes without saying that other objects can be used.
As the direct current, alternating current from an alternating current power source may be converted into direct current via a rectifier.

以上のように、本発明によれば被メッキ物を陰極とし、
この被メッキ物の表面メッキ面側に陽極を配置するとと
もに被メッキ物の裏面側に裏回り防止電極を配置して、
上記被メッキ物と陽極間に電位を印加しつつ、被メッキ
物と裏回り防止電極間には被メッキ物の電位を基準電位
としたときの析出電位と溶出電位間の電位を印加して、
被メッキ物の裏面に施されようとするメッキを効果的に
防止できるので、従来のように電気メッキ後に上記裏面
に施されたメッキをバフ作業によって取り除く作業を省
略することができるという効果が得られる。
As described above, according to the present invention, the object to be plated is used as a cathode,
An anode is placed on the surface plating side of the object to be plated, and an electrode to prevent reverse rotation is placed on the back side of the object to be plated.
While applying a potential between the object to be plated and the anode, a potential between the deposition potential and the elution potential when the potential of the object to be plated is taken as a reference potential is applied between the object to be plated and the anti-backflow electrode,
Since it is possible to effectively prevent plating from being applied to the back side of the object to be plated, it is possible to omit the conventional work of removing the plating applied to the back side by buffing after electroplating. It will be done.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す要部を断面とした接続
図、第2図は第1図のローロ線に沿う断面図、第3図は
裏回り防止電極に印加する電圧の範囲を説明するための
説明図、第4図a〜dは第1図における各部の電位の相
対的関係と直流電源18の電位差の具体的設定方法を示
す説明図である。 1・・・・・・メッキ槽、2・・…・電解液、3・・・
・・・陽極、4…・・・架台、5……すべり軸受、5a
……内面(メッキ面)、5b・…・・裏面、7・・・・
・・支持台、8・・・…溝、9・・・・・・パイプ、1
0・・・・・・永久磁石、14,18・・・・・・直流
電源、16・・・・・・導電線(裏回り防止電極)。 第1図 第2図 第3図 第4図
Fig. 1 is a connection diagram showing an embodiment of the present invention with main parts in cross section, Fig. 2 is a sectional view taken along the Rolo line in Fig. 1, and Fig. 3 is the range of voltage applied to the reverse rotation prevention electrode. FIGS. 4a to 4d are explanatory diagrams showing the relative relationship of the potentials of each part in FIG. 1 and a specific method of setting the potential difference of the DC power supply 18. 1...Plating bath, 2...Electrolyte, 3...
・・・Anode, 4... Frame, 5... Sliding bearing, 5a
...Inner surface (plated surface), 5b... Back surface, 7...
...Support stand, 8...Groove, 9...Pipe, 1
0... Permanent magnet, 14, 18... DC power supply, 16... Conductive wire (reverse rotation prevention electrode). Figure 1 Figure 2 Figure 3 Figure 4

Claims (1)

【特許請求の範囲】 1 被メツキ物を陰極とし、この被メツキ物の表面メツ
キ面側に陽極を配置し、上記被メツキ物と陽極間に電位
を印加して上記表面メツキ面に電気メツキを施す電気メ
ツキ法において、上記被メツキ物の裏面側に裏回り防止
電極を配置して、上記被メツキ物と陽極間に上記電位を
印加しつつ、被メツキ物と裏回り防止電極間には被メツ
キ物の電位を基準電位としたときの析出電位と溶出電位
間の電位を印加してその被メツキ物の裏面にメツキが施
されるのを防止した電気メツキにおけるメツキの裏回り
防止方法。 2 電解液を貯溜するメツキ槽と、電解液に浸漬した陽
極と、電解液に浸漬した陰極としての被メツキ物と、上
記陽極と被メツキ物との間に直流電流を通電する電源と
を備え、上記被メツキ物の表面メツキ面を陽極に対向さ
せて電気メツキを施す電気メツキ装置において、上記被
メツキ物の裏面側に裏回り防止電極を配設し、被メツキ
物と裏回り防止電極との間に被メツキ物側を正側として
直流電流を通電する電源を設けたことを特徴とする電気
メツキにおけるメツキの裏回り防止装置。 3 被メツキ物が内側摺動面をメツキ面とした半割りす
べり軸受であつて、このすべり軸受は支持台に設けた永
久磁石によつてその裏面側が吸着保持され、かつその支
持台に裏回り防止電極が配設固定されていることを特徴
とする特許請求の範囲第2項記載の電気メツキにおける
メツキの裏回り防止装置。
[Claims] 1. An object to be plated is used as a cathode, an anode is arranged on the side of the surface to be plated of the object to be plated, and a potential is applied between the object to be plated and the anode to electroplat the surface to be plated. In the electroplating method, a back-up prevention electrode is placed on the back side of the object to be plated, and while the potential is applied between the object to be plated and the anode, a plate is placed between the object to be plated and the back-out prevention electrode. A method for preventing plating from turning around in electroplating, which prevents plating from being applied to the back side of an object to be plated by applying a potential between a deposition potential and an elution potential when the potential of the object to be plated is taken as a reference potential. 2. Equipped with a plating tank for storing an electrolytic solution, an anode immersed in the electrolytic solution, an object to be plated as a cathode immersed in the electrolytic solution, and a power source for passing a direct current between the anode and the object to be plated. , in the electroplating device that performs electroplating with the surface to be plated of the object to be plated facing the anode, a back-turn prevention electrode is disposed on the back side of the object to be plated, and the back-turn prevention electrode is connected to the object to be plated. 1. An apparatus for preventing reverse plating in electric plating, characterized in that a power source is provided between which a direct current is applied with the side of the object to be plated as the positive side. 3. The object to be plated is a half-split sliding bearing whose inner sliding surface is the plated surface, and the sliding bearing has its back side attracted and held by a permanent magnet provided on the support stand, and the back side of the slide bearing is held by a permanent magnet installed on the support stand. 3. A plating prevention device for electroplating according to claim 2, characterized in that a prevention electrode is arranged and fixed.
JP4483281A 1981-03-27 1981-03-27 Method and device for preventing plating from turning in electric plating Expired JPS6034636B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4483281A JPS6034636B2 (en) 1981-03-27 1981-03-27 Method and device for preventing plating from turning in electric plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4483281A JPS6034636B2 (en) 1981-03-27 1981-03-27 Method and device for preventing plating from turning in electric plating

Publications (2)

Publication Number Publication Date
JPS57158395A JPS57158395A (en) 1982-09-30
JPS6034636B2 true JPS6034636B2 (en) 1985-08-09

Family

ID=12702430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4483281A Expired JPS6034636B2 (en) 1981-03-27 1981-03-27 Method and device for preventing plating from turning in electric plating

Country Status (1)

Country Link
JP (1) JPS6034636B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2653635B2 (en) * 1994-03-10 1997-09-17 栄電子工業株式会社 Method and apparatus for plating printed circuit board
JP3423631B2 (en) * 1998-02-05 2003-07-07 キヤノン株式会社 Method for forming zinc oxide thin film, method for manufacturing semiconductor element substrate using the same, and method for manufacturing photovoltaic element
DE102010000853A1 (en) 2010-01-13 2011-07-14 Federal-Mogul Wiesbaden GmbH, 65201 Holder for galvanic coating of plain bearings and tools with a holder
JP6173197B2 (en) * 2013-12-09 2017-08-02 大豊工業株式会社 Plating equipment
JP6165613B2 (en) * 2013-12-09 2017-07-19 大豊工業株式会社 Plating equipment

Also Published As

Publication number Publication date
JPS57158395A (en) 1982-09-30

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