JPS6034946B2 - Method for producing chlorobenzene sulfochloride - Google Patents
Method for producing chlorobenzene sulfochlorideInfo
- Publication number
- JPS6034946B2 JPS6034946B2 JP16074380A JP16074380A JPS6034946B2 JP S6034946 B2 JPS6034946 B2 JP S6034946B2 JP 16074380 A JP16074380 A JP 16074380A JP 16074380 A JP16074380 A JP 16074380A JP S6034946 B2 JPS6034946 B2 JP S6034946B2
- Authority
- JP
- Japan
- Prior art keywords
- sulfuric acid
- chlorobenzene
- water
- sulfochloride
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- JESCPVSKEGXYSC-UHFFFAOYSA-N chlorobenzene;sulfurochloridic acid Chemical compound OS(Cl)(=O)=O.ClC1=CC=CC=C1 JESCPVSKEGXYSC-UHFFFAOYSA-N 0.000 title claims description 41
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 110
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 44
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 41
- XTHPWXDJESJLNJ-UHFFFAOYSA-N chlorosulfonic acid Substances OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 claims description 39
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 claims description 28
- 239000007795 chemical reaction product Substances 0.000 claims description 19
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 13
- 238000005406 washing Methods 0.000 claims description 13
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 7
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 7
- 239000002351 wastewater Substances 0.000 claims description 7
- 238000000354 decomposition reaction Methods 0.000 claims description 5
- 239000000243 solution Substances 0.000 claims description 5
- 238000010790 dilution Methods 0.000 claims description 4
- 239000012895 dilution Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 description 14
- 239000011269 tar Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 4
- MNURPFVONZPVLA-UHFFFAOYSA-N 2-chlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1Cl MNURPFVONZPVLA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- MVPPADPHJFYWMZ-IDEBNGHGSA-N chlorobenzene Chemical group Cl[13C]1=[13CH][13CH]=[13CH][13CH]=[13CH]1 MVPPADPHJFYWMZ-IDEBNGHGSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】
本発明は、クロルベンゼンと、クロルスルホン酸との反
応物を、水または、希硫酸中に加えて過剰のクロルスル
ホン酸を分解して、クロルベンゼンスルホクロリトを製
造する方法に係わるものであり、更に詳しくはクロルベ
ンゼンとクロルスルホン酸との反応物を、水または、希
硫酸中に加えて過剰のクロルスルホン酸を分解して、発
生する塩化水素を系外に駆逐し、該分解終了後の硫酸層
の硫酸濃度を60〜90%にし、5000以上の温度に
て、該硫酸層より、クロルベンゼンスルホクロリド層を
液体状態で分離し、不活性有機溶媒を加えて溶液とした
後、少量の水で水洗することにより、クロルベンゼンス
ルホクロリドを製造する際、前記水洗後の廃水を、クロ
ルベンゼンと、クロルスルホン酸との反応物中の過剰の
ク。Detailed Description of the Invention The present invention produces chlorobenzene sulfochloride by adding a reaction product of chlorobenzene and chlorosulfonic acid to water or dilute sulfuric acid and decomposing excess chlorosulfonic acid. More specifically, the reaction product of chlorobenzene and chlorosulfonic acid is added to water or dilute sulfuric acid to decompose excess chlorosulfonic acid, and the generated hydrogen chloride is removed from the system. After the decomposition, the sulfuric acid concentration in the sulfuric acid layer is 60 to 90%, and the chlorobenzene sulfochloride layer is separated from the sulfuric acid layer in a liquid state at a temperature of 5000°C or more, and an inert organic solvent is added. When producing chlorobenzene sulfochloride, the excess water in the reaction product of chlorobenzene and chlorosulfonic acid is removed by washing the solution with a small amount of water.
ルスルホン酸を分解する際の水成分として、また、同目
的で使用する希硫酸を調製する際の希釈水成分として、
再使用することを特徴とする、クロルベンゼンスルホク
ロリドの製造方法に関するものである。クロルベンゼン
スルホクロリドは一般に、高分子化合物のモノマー製造
の中間体として、また、医薬、農薬製造の中間体として
供される。As a water component when decomposing rusulfonic acid, and as a dilution water component when preparing dilute sulfuric acid used for the same purpose.
The present invention relates to a method for producing chlorobenzene sulfochloride, which is characterized in that it is reused. Chlorbenzene sulfochloride is generally used as an intermediate in the production of monomers for polymeric compounds, and also as an intermediate in the production of pharmaceuticals and agricultural chemicals.
クロルベンゼンスルホク0リドが、クロルベンゼンと、
クロルスルホン酸との反応によって製造される場合、反
応式は次のように示される。Chlorobenzene sulfolide is chlorobenzene,
When produced by reaction with chlorosulfonic acid, the reaction formula is shown as follows.
この反応では目的とするクロルベンゼンスルホクロリド
の生成と同時に、塩化水素ガスおよび硫酸の副生成が起
こり、また、2段目の反応が、平衡反応のため、クロル
ベンゼンスルホクロリドの収率を上げるために、通常過
剰のクロルスルホン酸が用いられる。それ故に、該反応
生成物中には、前記スルホクロリドと、硫酸のほか、通
常未反応のクロルスルホン酸及び少量のクロルベンゼン
スルホン酸をも含んでいる。このような反応生成物から
、スルホクロリドを分離するには、通常、上記反応生成
物を大量の冷水、または、氷水中に投入し、未反応のク
ロルスルホン酸を塩化水素と硫酸とに分解し、冷水中に
沈殿するスルホクロリドを固体として分離する方法が採
用されている。しかしながら、前記の方法によってスル
ホクロリドを分離しようとすれば、大量の水を使用する
ため、クロルスルホン酸の加水分解により生成する塩酸
および、硫酸は希薄なものとなり、回収塩酸および回収
硫酸としての再利用が困難となる。したがって大量の廃
水を生じることとなり、経済的に非常に大きな不利を有
する。更に前記方法によって、スルホクロリドを分離し
ようとすれば、未反応のクロルスルホン酸の加水分解反
応による発熱と、反応生成物中に含まれる硫酸およびク
ロルスルホン酸の加水分解によって生成した硫酸の希釈
熱とによって、系の温度が急激に上昇し、その熱のため
に、目的とするスルホクロリドの分解反応が起こり、収
率を低下させる欠点があるとされている。したがって前
記の方法を採用する際には、スルホクロリドの分解反応
を抑えるために、終始約30℃以下の低温下で行なわれ
るのが一般的であり、除熱に要するェネルギ−が莫大な
ものとなる。In this reaction, hydrogen chloride gas and sulfuric acid are produced as by-products at the same time as the desired chlorobenzene sulfochloride is produced.Also, since the second stage reaction is an equilibrium reaction, the yield of chlorobenzene sulfochloride is increased. An excess of chlorosulfonic acid is usually used. Therefore, in addition to the sulfochloride and sulfuric acid, the reaction product usually also contains unreacted chlorosulfonic acid and a small amount of chlorobenzenesulfonic acid. To separate sulfochloride from such a reaction product, the reaction product is usually poured into a large amount of cold water or ice water, and unreacted chlorosulfonic acid is decomposed into hydrogen chloride and sulfuric acid. , a method has been adopted in which sulfochloride, which precipitates in cold water, is separated as a solid. However, when attempting to separate sulfochloride by the above method, a large amount of water is used, so the hydrochloric acid and sulfuric acid produced by hydrolysis of chlorosulfonic acid are diluted and cannot be recycled as recovered hydrochloric acid and recovered sulfuric acid. It becomes difficult to use. Therefore, a large amount of waste water is generated, which is economically disadvantageous. Furthermore, when attempting to separate sulfochloride by the above method, heat generated by the hydrolysis reaction of unreacted chlorosulfonic acid and heat of dilution of sulfuric acid generated by hydrolysis of sulfuric acid and chlorosulfonic acid contained in the reaction product are generated. This is said to cause a rapid rise in the temperature of the system, which causes a decomposition reaction of the target sulfochloride, resulting in a decrease in yield. Therefore, when employing the above method, it is generally carried out at a low temperature of about 30°C or less throughout in order to suppress the decomposition reaction of sulfochloride, and the energy required for heat removal is enormous. Become.
また、改良製造方法として、芳香族炭化水素と、クロル
スルホン酸との反応物を希硫酸中に加え、35午0以下
の温度で過剰のクロルスルホン酸を分解し、発生する塩
化水素を系外に駆逐し、最終的に、硫酸層の硫酸濃度を
、70%以上にした後該硫酸層より、芳香族スルホクロ
リドを分離する方法(特開昭50一100035)や、
硫酸の希釈熱を抑えるため希硫酸のかわりに、20%以
上の塩酸を用いて、35qo以下の温度で、かつ最終的
に、硫酸層の硫酸濃度が70%以上になるような状態で
、過剰のクロルスルホン酸を分解することによって、塩
化水素の脱離を起こさせ、この脱離反応が吸熱反応であ
ることを利用し、除熱を効率よく行なう方法(特関昭5
4−555548)などが、提案されている。しかし、
クロルベンゼンスルホクロリドの場合、これらの方法は
、目的とするクロルベンゼンスルホクロリドの融点が約
5yoであるため、35qo以下の温度では、半泥状の
固体となり、70%以上の高い硫酸濃度では、炉過によ
る分離が非常に困難であり、かつ、分離された固体成分
には、大量の硫酸及び未反応のクロルベンゼンスルホン
酸が含まれているので、該スルホクロリドの精製に大量
の冷水を必要とするなどの欠点があり、工業的には非常
に大きな不利な点があり採用しがたい方法である。本発
明者等は、これらの点に留意し、融点が約53ooで常
温で固体であるクロルベンゼンスルホクロリドを各濃度
の硫酸と接触させた時のクロルベンゼンスルホクロリド
の分解率と、温度の関係について調べてみた。In addition, as an improved production method, a reaction product of aromatic hydrocarbons and chlorosulfonic acid is added to dilute sulfuric acid, excess chlorosulfonic acid is decomposed at a temperature below 35:00, and the generated hydrogen chloride is removed from the system. A method of separating aromatic sulfochloride from the sulfuric acid layer after finally increasing the sulfuric acid concentration of the sulfuric acid layer to 70% or more (Japanese Patent Application Laid-open No. 50-100035),
In order to suppress the dilution heat of sulfuric acid, use 20% or more hydrochloric acid instead of dilute sulfuric acid, and at a temperature of 35 qo or less, and in a state where the sulfuric acid concentration in the sulfuric acid layer becomes 70% or more, excessive A method for efficiently removing heat by decomposing chlorosulfonic acid to cause hydrogen chloride to be eliminated, and utilizing the fact that this elimination reaction is an endothermic reaction.
4-555548) and the like have been proposed. but,
In the case of chlorobenzene sulfochloride, these methods have a melting point of about 5yo, so at temperatures below 35yo it becomes a semi-sludgy solid, and at high sulfuric acid concentrations of 70% or more, Separation by filtration is extremely difficult, and since the separated solid component contains a large amount of sulfuric acid and unreacted chlorobenzenesulfonic acid, a large amount of cold water is required to purify the sulfochloride. This method has very large disadvantages and is difficult to adopt from an industrial perspective. With these points in mind, the present inventors investigated the relationship between the decomposition rate of chlorobenzene sulfochloride and temperature when chlorobenzene sulfochloride, which has a melting point of about 53 oo and is solid at room temperature, is brought into contact with sulfuric acid of various concentrations. I looked into it.
その結果、硫酸濃度が60〜90%であった場合、クロ
ルベンゼンスルホクロリドの融点以上の温度、たとえば
、6500の温度にても、クロルベンゼンスルホクロリ
ドが実質上ほとんど分解しないというこれまでの常識を
打ち破る新規な事実を見出し、先に特許出願した(特腰
昭55−143425(特公昭58一34469)。先
の出願の方法とは、クロルベンゼンとクロルスルホン酸
との反応物を該分解終了後の硫酸層の硫酸濃度が60〜
90%になるように計量された水、または、希硫酸中に
滴下し、過剰のクロルスルホン酸を分解した後、50午
0以上の温度で、クロルベンゼンスルホクロリド層を硫
酸層から液体状態で分離するというものである。このよ
うにして分離されたクロルベンゼンスルホクロリド層は
、そのままでも十分にクロルベンゼンスルホクロリドと
して高純度であり、残存する硫酸量もクロルベンゼンス
ルホン酸量も少なし・。As a result, when the sulfuric acid concentration was 60 to 90%, the conventional wisdom that chlorobenzene sulfochloride hardly decomposed even at temperatures above the melting point of chlorobenzene sulfochloride, for example, 6500 ℃, was confirmed. He discovered a new fact that could be used to overcome the problem and filed a patent application (Special Publication No. 55-143425 (Japanese Patent Publication No. 58-134469). The sulfuric acid concentration of the sulfuric acid layer is 60~
After decomposing excess chlorosulfonic acid by dropping it into water or diluted sulfuric acid weighed to 90%, the chlorobenzene sulfochloride layer is separated from the sulfuric acid layer in a liquid state at a temperature of 50 pm or higher. It is called separation. The chlorobenzenesulfochloride layer separated in this way is highly pure as chlorobenzenesulfochloride even as it is, and the amount of residual sulfuric acid and chlorobenzenesulfonic acid is small.
しかし、精密な合成反応に使用する場合には、よりいっ
そう純度を高めることが必要とされるので、本発明著等
は、硫酸層から分離したクロルベンゼンスルホクロリド
のロスがなくて、しかも廃物を出さない精製方法につい
てて研究を進めた結果、硫酸層から分離したクロルベン
ゼンスルホクロリド層を不活性有機溶媒に溶解した後、
少量の水で水洗するだけで、容易に精製でき、しかも水
洗後の廃水を全量クロルベンゼンとクロルスルホン酸と
の反応物中の過剰のクロルスルホン酸を分解する際の水
成分として、また同目的で使用する希硫酸を調製する際
の水成分として使用しても純水を用いた場合と異なるこ
となく、クロルベンゼンスルホクロリドを製造できるこ
とを見出し、本発明を完成させるに到った。すなわち本
発明は、先の出願の技術を更に進め、より精製されたク
ロルベンゼンスルホクロリドの製造方法を提示するもの
であり、かつ精製されたクロルベンゼンスルホクロリド
の製造において、まったく廃水を生成しない方法を与え
るものである。However, when used in precise synthesis reactions, it is necessary to further increase the purity, so the authors of the present invention have developed a method that eliminates the loss of chlorobenzene sulfochloride separated from the sulfuric acid layer and eliminates waste. As a result of conducting research on a purification method that does not release any
It can be easily purified by simply washing with a small amount of water, and the entire amount of waste water after washing can be used as the water component when decomposing excess chlorosulfonic acid in the reaction product of chlorobenzene and chlorosulfonic acid, and for the same purpose. The present inventors have discovered that chlorobenzene sulfochloride can be produced even when used as a water component when preparing dilute sulfuric acid for use in the same way as when pure water is used, and the present invention has been completed. That is, the present invention further advances the technology of the previous application and presents a method for producing more purified chlorobenzene sulfochloride, and a method that does not generate any waste water in the production of purified chlorobenzene sulfochloride. It gives
本発明において使用される不活性有機溶媒は、クロルベ
ンゼンスルホクロリドを分解することなく、十分溶解性
を有し、しかも、水に不溶または難溶の溶媒が使用され
る。The inert organic solvent used in the present invention is a solvent that does not decompose chlorobenzene sulfochloride, has sufficient solubility, and is insoluble or sparingly soluble in water.
たとえば、脂肪族飽和炭化水素、芳香族炭化水素、ハロ
ゲン化脂肪族炭化水素、ハロゲン化芳香族炭化水素が用
いられる。その具体例としては、ヘキサン・ヘプタン、
オクタン、ベンゼン、トルエン、キシレン、メチレンク
ロリド、クロロホルム、ジクロルエタン、トリクロルエ
タン、クロルベンゼン、ジクロルベンゼン等が挙げられ
る。また本発明において、クロルベンゼンスルホクロリ
ド層に不活性有機溶媒を加えて溶液とした後、水洗に供
される少量の水とは、クロルベンゼンとクロルスルホン
酸との反応物中の過剰のクロルスルホン酸を分解して、
最終的に硫酸層の硫酸濃度を60〜90%にするために
使用される水の量以下であることが必要である。For example, aliphatic saturated hydrocarbons, aromatic hydrocarbons, halogenated aliphatic hydrocarbons, and halogenated aromatic hydrocarbons are used. Specific examples include hexane, heptane,
Examples include octane, benzene, toluene, xylene, methylene chloride, chloroform, dichloroethane, trichloroethane, chlorobenzene, dichlorobenzene, and the like. Furthermore, in the present invention, the small amount of water used for washing after adding an inert organic solvent to the chlorobenzene sulfochloride layer to form a solution refers to the excess chlorosulfone in the reaction product of chlorobenzene and chlorosulfonic acid. decomposes acid,
It is necessary that the amount of water be equal to or less than the amount of water used to ultimately bring the sulfuric acid concentration in the sulfuric acid layer to 60 to 90%.
この様な条件下の水量であるならば、精製されたクロル
ベンゼンスルホクロリドを得る際、廃水を皆無にするこ
とができる。すなわち、水洗後の廃水は、全量クロルベ
ンゼンとクロルスルホン酸との反応物中の過剰のクoル
スルホン酸を分解する際の水成分として、また同目的で
使用する希硫酸を調製する際の水成分として再利用する
ことが可能である。With the amount of water under these conditions, it is possible to completely eliminate waste water when obtaining purified chlorobenzene sulfochloride. In other words, the wastewater after washing with water is used as a water component when decomposing excess chlorosulfonic acid in the reaction product of chlorobenzene and chlorosulfonic acid, and as water when preparing dilute sulfuric acid used for the same purpose. It can be reused as a component.
したがって、この精製工程では、まったく廃水が出ない
。以下具体的に、本発明を説明するために、実施例及び
参考例を示すが、本発明は、これらの実施例に限定され
るものではない。参考例 1
クロルスルホン醸524タr(4.5モル)をコルベン
に仕込み冷却下これにクロルベンゼン169タr(1.
5モル)を滴下投入し、内温を60q○以下に保ちなが
ら約30分を要して滴下を終了した後2時間60℃に保
ち、次いで本反応物を純水140タr中に40〜60o
oの温度で20分を要して滴下した。Therefore, this purification process does not produce any waste water. EXAMPLES Examples and reference examples will be specifically shown below to explain the present invention, but the present invention is not limited to these examples. Reference Example 1 524 t (4.5 mol) of chlorsulfonate was charged into a Kolben and 169 t (1.5 mol) of chlorobenzene was added to it while cooling.
5 mol) was added dropwise, and the dropwise addition took about 30 minutes while keeping the internal temperature below 60 q○.After the dropwise addition was completed, the temperature was kept at 60°C for 2 hours.Then, this reaction product was added in 140 tar of pure water at 40~ 60o
The mixture was added dropwise over a period of 20 minutes at a temperature of
滴下終了後60〜65℃で20分反応を熟成させ、暫時
反応物に乾燥空気を吹きこみ、残存する塩化水素を系外
に駆逐した後、反応物を保温滴下ロートに移し、65℃
で分液した。下層は、硫酸層であり、濃度73%の硫酸
が約424タr回収できた。上層は、クロルベンゼンス
ルホクロリド層であり、純度90%のクロルベンゼンス
ルホクロリド289タrを得た。仕込みクロルベンゼン
に対する収率は82%であった。つぎに、硫酸層から分
離したクロルベンゼンスルホクロリド層に210の‘の
クロルベンゼンを加えて溶液とし、室温にて120タr
の純水を加え、20分離拝した後30分静暦し、水層を
分離した。After the completion of the addition, the reaction was aged for 20 minutes at 60 to 65°C, and after blowing dry air into the reaction product to drive out the remaining hydrogen chloride, the reaction product was transferred to a heat-retaining dropping funnel and heated at 65°C.
The liquid was separated. The lower layer is a sulfuric acid layer, and approximately 424 tare of sulfuric acid with a concentration of 73% was recovered. The upper layer was a chlorobenzene sulfochloride layer, and chlorobenzene sulfochloride 289 tar with a purity of 90% was obtained. The yield based on the charged chlorobenzene was 82%. Next, 210' of chlorobenzene was added to the chlorobenzene sulfochloride layer separated from the sulfuric acid layer to form a solution, and the mixture was heated to 120 trp at room temperature.
Pure water was added to the mixture, and the mixture was stirred for 20 minutes, then allowed to stand still for 30 minutes, and the aqueous layer was separated.
得られた水層の量は135タrであった。水層を分離し
たクロルベンゼン層から減圧にてクロルベンゼンを蟹去
し、純度95%のクロルベンゼンスルホクロリドを27
4タr得た。参考例 2
クロルスルホン酸とクロルベンゼンの反応物を、試薬の
97%硫酸4磯タrと300タrの純水で調製した60
%硫酸788タr中に滴下したこと以外は、すべて参考
例−1と同様に行なった。The amount of aqueous layer obtained was 135 tar. After separating the aqueous layer, chlorobenzene was removed from the chlorobenzene layer under reduced pressure to obtain chlorobenzene sulfochloride with a purity of 95%.
I got 4 tars. Reference Example 2 A reaction product of chlorosulfonic acid and chlorobenzene was prepared using 97% sulfuric acid as a reagent and 300 tar of pure water.
The same procedure as in Reference Example 1 was carried out except that the mixture was added dropwise into 788% sulfuric acid.
硫酸層とクロルベンゼンスルホクロリド層を分液するこ
とによって、下層より濃度73%の硫酸が約1100多
r回収できた。上層より純度92%のクロルベンゼンス
ルホククロリド286タrを得た。仕込みク。ルベンゼ
ンに対する収率は83%であった。水洗後は、129タ
rの水層と純度95%のクロルベンゼンスルホクロリド
277タrが得られた。実施例 1
クロルスルホン酸とクロルベンゼンの反応物を参考例−
1で得られた水洗後の水層の全量135タrと純水20
タrを混合した水成分1559r中に滴下したこと以外
はすべて参考例−1と同様に行なった。By separating the sulfuric acid layer and the chlorobenzene sulfochloride layer, approximately 1100 r of sulfuric acid with a concentration of 73% was recovered from the lower layer. From the upper layer, chlorbenzenesulfocchloride 286tar with a purity of 92% was obtained. Preparation. The yield based on rubenzene was 83%. After washing with water, an aqueous layer of 129 tar and 277 tar of chlorobenzene sulfochloride with a purity of 95% were obtained. Example 1 A reference example of the reaction product of chlorosulfonic acid and chlorobenzene -
The total amount of the water layer after washing obtained in step 1 was 135 ta r and pure water 20
The same procedure as in Reference Example 1 was carried out except that the mixture was dropped into the water component 1559r mixed with tar.
硫酸層とクロルベンゼンスルホクロリド層を分液するこ
とによって、下層より濃度73%の硫酸が約450タr
回収できた。上層より純度85%のクロルベンゼンスル
ホクロリド304多rを得た。仕込みクロルベンゼンに
対する収率は、82%であった。水洗後は、1509r
の水層と純度95%のクロルベンゼンスルホクロリド2
74タrが得られた。参考例1との比較で、過剰のクロ
ルスルホン酸を分解するのに、純水の代り‘こ参考例1
の水洗後の水成分を用いても精製クロルベンゼンスルホ
クロリドの純度、収量は全くかわらない。実施例 2
クロルスルホン酸とクロルベンゼンの反応物を試薬の9
7%硫酸488タrと参考例−1で得られた水層の全量
135タr及び純水180タrで調製した60%硫酸8
03タr中に滴下したこと以外はすべて参考例一1と同
様に行なった。By separating the sulfuric acid layer and the chlorobenzene sulfochloride layer, approximately 450 trr of sulfuric acid with a concentration of 73% is extracted from the lower layer.
I was able to recover it. Chlorobenzene sulfochloride 304 with a purity of 85% was obtained from the upper layer. The yield based on the charged chlorobenzene was 82%. After washing with water, 1509r
aqueous layer and 95% purity chlorobenzene sulfochloride 2
74 tar was obtained. In comparison with Reference Example 1, in order to decompose excess chlorosulfonic acid, this reference example 1 was used instead of pure water.
Even if the water component after washing with water is used, the purity and yield of purified chlorobenzene sulfochloride do not change at all. Example 2 The reaction product of chlorosulfonic acid and chlorobenzene was added to the reagent 9.
60% sulfuric acid prepared with 488 t r of 7% sulfuric acid, the total amount of 135 t r of the aqueous layer obtained in Reference Example-1, and 180 t r of pure water.
The same procedure as in Reference Example 11 was carried out except that the mixture was dropped into the 03 tank.
硫酸層とクロルベンゼンスルホクロリド層を分液するこ
とによって、下層より、濃度73%の硫酸が約1115
タr回収できた上層より純度92%のクロルベンゼンス
ルホクロリド286汐rを得た。仕込みクロルベンゼン
に対する収率は83%であった。水洗後は、129多r
の水層と純度95%のクロルベンゼンスルホクロリド2
77タrが得られた。参考例2との比較で過剰のクロス
ルホン酸を分解するのに純水の代りに、参考例1での水
洗後の水成分を用いた60%硫酸を用いても精製クロル
ベンゼンスルホクロリドの純度、収量は全くかわらない
。By separating the sulfuric acid layer and the chlorobenzene sulfochloride layer, approximately 1115 sulfuric acid with a concentration of 73% is extracted from the lower layer.
Chlorobenzene sulfochloride 286% with a purity of 92% was obtained from the upper layer from which the tar was recovered. The yield based on the charged chlorobenzene was 83%. After washing with water, 129%
aqueous layer and 95% purity chlorobenzene sulfochloride 2
77 tar was obtained. In comparison with Reference Example 2, the purity of purified chlorobenzene sulfochloride was also improved by using 60% sulfuric acid using the water component after washing with water in Reference Example 1 instead of pure water to decompose excess cross-sulfonic acid. , the yield does not change at all.
実施例−3
硫酸層から分離したクロルベンゼンスルホクロリド層を
210の‘のジクロルェタンで溶液としたこと以外は、
すべて実施例−2と同様に行なった。Example-3 Except that the chlorobenzene sulfochloride layer separated from the sulfuric acid layer was made into a solution with 210% dichloroethane.
Everything was carried out in the same manner as in Example-2.
Claims (1)
水または、希硫酸中に加えて過剰のクロルスホン酸を分
解して、発生する塩化水素を系外に駆逐し、該分解終了
後の硫酸層の硫酸濃度を60〜90%にし、50℃以上
の温度にて該硫酸層より、クロルベンゼンスルホクロリ
ド層を液体状態で分離し、不活性有機溶媒を加えて溶液
とした後、少量の水で水洗することにより、クロルベン
ゼンスルホクロリドを製造する際、前記水洗後の廃水を
、クロルベンゼンと、クロルスルホン酸との反応物中の
過剰のクロルスルホン酸を分解する際の水成分として、
また、同目的で使用する希硫酸を調製する際の希釈水成
分として、再使用することを特徴とする、クロルベンゼ
ンスルホクロリドの製造方法。1 The reaction product of chlorobenzene and chlorosulfonic acid is
Excess chlorsulfonic acid is decomposed by adding it to water or dilute sulfuric acid, the generated hydrogen chloride is expelled from the system, the sulfuric acid concentration in the sulfuric acid layer after the decomposition is 60 to 90%, and the temperature is increased to 50°C or higher. When producing chlorobenzene sulfochloride by separating the chlorobenzene sulfochloride layer in a liquid state from the sulfuric acid layer at temperature, adding an inert organic solvent to make a solution, and washing with a small amount of water, The waste water after the water washing is used as a water component when decomposing excess chlorosulfonic acid in the reaction product of chlorobenzene and chlorosulfonic acid,
Further, a method for producing chlorobenzene sulfochloride, which is characterized in that it is reused as a dilution water component when preparing dilute sulfuric acid used for the same purpose.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16074380A JPS6034946B2 (en) | 1980-11-17 | 1980-11-17 | Method for producing chlorobenzene sulfochloride |
| GB8130118A GB2087386B (en) | 1980-10-14 | 1981-10-06 | Process for producing chlorobenzene sulfochloride |
| DE19813140854 DE3140854A1 (en) | 1980-10-14 | 1981-10-14 | METHOD FOR PRODUCING CHLORBENZENE SULFOCHLORIDE |
| FR8119353A FR2491923A1 (en) | 1980-10-14 | 1981-10-14 | PROCESS FOR PRODUCING CHLOROBENZENE SULFOCHLORIDE |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16074380A JPS6034946B2 (en) | 1980-11-17 | 1980-11-17 | Method for producing chlorobenzene sulfochloride |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5785359A JPS5785359A (en) | 1982-05-28 |
| JPS6034946B2 true JPS6034946B2 (en) | 1985-08-12 |
Family
ID=15721488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16074380A Expired JPS6034946B2 (en) | 1980-10-14 | 1980-11-17 | Method for producing chlorobenzene sulfochloride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6034946B2 (en) |
-
1980
- 1980-11-17 JP JP16074380A patent/JPS6034946B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5785359A (en) | 1982-05-28 |
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