JPS603797B2 - Josephson tunnel junction device - Google Patents
Josephson tunnel junction deviceInfo
- Publication number
- JPS603797B2 JPS603797B2 JP57091824A JP9182482A JPS603797B2 JP S603797 B2 JPS603797 B2 JP S603797B2 JP 57091824 A JP57091824 A JP 57091824A JP 9182482 A JP9182482 A JP 9182482A JP S603797 B2 JPS603797 B2 JP S603797B2
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- voltage
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- curve
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- 239000000956 alloy Substances 0.000 claims description 6
- 239000002887 superconductor Substances 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 53
- 210000003127 knee Anatomy 0.000 description 17
- 239000001307 helium Substances 0.000 description 8
- 229910052734 helium Inorganic materials 0.000 description 8
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000011160 research Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 230000001351 cycling effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 229910000978 Pb alloy Inorganic materials 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910001152 Bi alloy Inorganic materials 0.000 description 2
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 2
- 235000011613 Pinus brutia Nutrition 0.000 description 2
- 241000018646 Pinus brutia Species 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 241000282421 Canidae Species 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/10—Junction-based devices
- H10N60/12—Josephson-effect devices
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- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Description
【発明の詳細な説明】
本発明は、ジョセフソン・トンネル接合素子殊に、電波
望遠鏡におけるミリ波のへテロダィン・ミクサとしてと
かビデオ・デイテクタとして使用するに好適なジョセフ
ソン・トンネル接合素子に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a Josephson tunnel junction device, particularly a Josephson tunnel junction device suitable for use as a millimeter-wave heterodyne mixer in a radio telescope or as a video detector.
絶縁層乃至トンネル障壁層を一対の超電導体電極層で挟
んで成るジョセフソン・トンネル接合素子は、超電導体
−絶縁層−超電導体(SuperConductor一
1ns山ator一SuperCond肌tor)構造
、略してSIS構造と呼ばれ、以下、本書でもこれに従
い、SIS型ジョセフソン素子と略称するが、このSI
S型ジョセフソン素子は、昨今に至って、受動素子であ
りながらも量子効果により電力ゲインが探れること等か
ら、上記したミリ波のへテロダイン・ミクサとしてとか
ビデオ・デイテクタとして卓越した性能を示し得ること
が願うかにされ、この種アナログ用途に通したSIS構
造の研究、電極材質の研究がなされてきた。A Josephson tunnel junction device consisting of an insulating layer or a tunnel barrier layer sandwiched between a pair of superconductor electrode layers has a superconductor-insulating layer-superconductor (SuperConductor-1ns peakator-SuperCond structure) structure, abbreviated as SIS structure. This is called the SIS type Josephson element in this book, but this SI
Recently, S-type Josephson devices have been able to exhibit outstanding performance as the above-mentioned millimeter wave heterodyne mixers and video detectors, because even though they are passive devices, power gain can be detected through quantum effects. With this hope in mind, research has been carried out on SIS structures and electrode materials for this type of analog use.
本発明もこうした一連の研究過程の延長線上にあるもの
で、より優れた電気的、物理的諸特性を持つこの種アナ
ログ用SIS型ジョセフソン素子を提供するものである
が、ここで、要求される電気的諸特性とはどのような類
いのものであるかを説明するために、先づ第1図に、一
般的なSIS型ジョセフソン素子の電流電圧特性(1−
Vカーブ)を挙げる。The present invention is an extension of this series of research processes, and aims to provide this type of analog SIS type Josephson device with superior electrical and physical properties. In order to explain the types of electrical characteristics, first, Figure 1 shows the current-voltage characteristics (1-
V curve).
周知のように、こうしたSIS型ジョセフソン素子は、
絶縁層を挟む両電極層が超電導遷移する極低温環境下に
置かれて動作するが、素子電流1が或る臨界電流値lc
を越えるまでは、当該素子電流は所謂ジョセフソン・ト
ンネル電流となり、従って当該SIS構造から成る接合
両端(両電極層間)には電圧の発生しない状態が続く。As is well known, these SIS type Josephson elements are
Both electrode layers sandwiching an insulating layer operate in an extremely low temperature environment where superconducting transition occurs, but when the device current 1 reaches a certain critical current value lc.
Until the value exceeds 0, the device current becomes a so-called Josephson tunnel current, and therefore, a state in which no voltage is generated continues at both ends of the junction (between both electrode layers) of the SIS structure.
これを接合が零電圧状態にあると言う。而して、素子電
流が臨界電流lcに至ると、第1図中、矢印.ナTで示
すように、接合両端に電極層材質で定まる所定の電圧値
(ギャップ電圧)V6を発生する点Pに遷移して、接合
は所謂電圧状態となる。This state is said to be that the junction is in a zero voltage state. When the element current reaches the critical current lc, the arrow . As shown by T, the junction transitions to a point P where a predetermined voltage value (gap voltage) V6 determined by the electrode layer material is generated at both ends of the junction, and the junction enters a so-called voltage state.
接合がこのようにして、一度び電圧状態に遷移すると、
素子電流1が零に戻されるまでは、この電圧状態に保た
れ、素子電流1が零となると再び雫電圧状態に戻る。Once the junction transitions to the voltage state in this way,
This voltage state is maintained until the element current 1 is returned to zero, and when the element current 1 becomes zero, it returns to the drop voltage state again.
しかして、このようなヒステリシスカーブにあって、本
発明対象となるアナ。Therefore, an analyzer that has such a hysteresis curve and is the object of the present invention.
グ用途と、そうでないデジタル用途では、電気的に注目
すべき個所は本来的に異なったものとなる。デジタル系
の用途では、麦電圧状態から電圧状態への遷移部分に重
さが置かれる。The areas that require electrical attention are inherently different for digital applications and for digital applications. In digital applications, emphasis is placed on the transition from one voltage state to another.
例えば臨界電流lcが素子毎にバラ付くこともなく、設
計仕様を満足しているか否か、等である。これに対して
、アナログ系のミクサとかディテクタとしての用途では
、電圧状態における曲線領域、即ち、点Pを含んで、ギ
ャップ電圧Vgを維持したまま電流値1を可変できる略
々垂直に立った曲線部分Caと、ギャップ電圧Vgを維
持し得ずに急速に原点0に向かう略々電圧軸Vに沿った
曲線部分Cb、及び、両曲線部分の継ぎ目となる、ニ−
(Knee;ひざ)と呼ばれる部分Ckに着目される。For example, whether the critical current lc does not vary from element to element and satisfies design specifications. On the other hand, when used as an analog mixer or detector, the curve region in the voltage state, that is, the almost vertical curve that includes point P and allows the current value 1 to be varied while maintaining the gap voltage Vg. A portion Ca, a curved portion Cb roughly along the voltage axis V that rapidly moves toward the origin 0 without being able to maintain the gap voltage Vg, and a knee that forms the joint between both curved portions.
Attention is focused on a portion Ck called (knee).
ここで、電磁波受信系に用いられる場合に要求される、
乃至は改善すると望ましい電気的特性を列挙してみる。Here, required when used in an electromagnetic wave receiving system,
Let us enumerate the electrical characteristics that would be desirable to improve.
(i)くニー特性>ニー特性とは、第1図中、模式的に
角度8で示したように、ギャップ電圧Vgを維持したま
まで電流値1を可変できる1−V曲線中のクェサィパー
ティクルな電流立ち上がり部分Caと、ギャップ電圧V
gから零電圧状態に戻る部分Cbとのなす角度8が、9
00に対してどの程度鈍角側に開いているか、乃至はど
の程度900に近いかということを目安として云々され
、90oより開く程、ニーは丸いと言われへ 900に
近い程、ニーは鋭い、等と表現される。(i) Knee characteristic>Knee characteristic refers to the quasi in the 1-V curve that allows the current value 1 to be varied while maintaining the gap voltage Vg, as schematically shown by angle 8 in Fig. 1. Particle current rise portion Ca and gap voltage V
The angle 8 formed with the part Cb that returns to the zero voltage state from g is 9
It is said to be based on how obtuse the angle is to 00, or how close it is to 900.The closer it is to 900, the rounder the knee is.The closer it is to 900, the sharper the knee. etc.
結論から言えば、ニーは鋭い程、良いとされ、別な見方
をすれば曲線部分Cbが電圧軸Vと平行で、電流軸方向
への浮き上がり傾斜の傾きが4・ごし、程、良いとされ
る。In conclusion, the sharper the knee, the better.From another perspective, if the curve part Cb is parallel to the voltage axis V, and the slope of the rising slope in the current axis direction is 4. be done.
というのも、この部分Cbの浮き上がり分は等価的にS
IS接合の漏洩電流分を示すものとなるからで、ミクサ
等としている場合には、漏洩電流が少し、程、変換効率
が増すことは当然である。結局は、第1図中に仮想線で
示す目標曲線Cai,Ck;,Cbiに近いカーブとな
るもの、即ち、ニー部分Ckiの角度8i≠900で示
されるように、ギャップ電圧Vgにおけるクェサイパー
テイクルな電流の立ち上がりが急峻で、ギャップ電圧V
gから零電圧状態への曲線部分Cbiが略々電圧軸上に
載るような曲線に近いカーブを探るもの程、望ましい強
い非直線性を持ち、高い変換効率が得られることになる
。This is because the raised portion of this portion Cb is equivalently S
This is because it indicates the leakage current of the IS junction, and in the case of a mixer or the like, it is natural that the conversion efficiency increases as the leakage current decreases. In the end, a curve close to the target curve Cai, Ck;, Cbi shown by the imaginary line in FIG. The rise of the current is steep, and the gap voltage V
The closer a curve is found to a curve in which the curve portion Cbi from g to zero voltage state is approximately on the voltage axis, the more desirable the strong nonlinearity is and the higher the conversion efficiency can be obtained.
しかして、ニー特性を云々するのに既述のようにニーが
丸いとか、或いはニーが鋭い、乃至はニーが良い等と角
度的な言い表し方をするにしても、測定系では角度8で
は定量化が不便なため、実際にはギャップ電圧Vgに対
して△V(一般には0.5のV)高い電圧値における抵
抗値Raと、△V低い電圧値における抵抗値Rbとの比
Ra/Rbを探って正規化し、ニー特性を判断している
。However, even if we use angular expressions such as "the knee is round,""the knee is sharp," or "the knee is good" to describe the knee characteristics, as mentioned above, the measurement system cannot quantify it at an angle of 8. In practice, the ratio Ra/Rb of the resistance value Ra at a voltage value △V (generally 0.5 V) higher than the gap voltage Vg and the resistance value Rb at a voltage value △V lower is used. is searched and normalized to determine the knee characteristics.
即ち、比Ra/Rbが小さい程、ニー特性は優れている
ことになり、既述の目標曲線における比Ra′/Rb′
は極めて小さくなる。In other words, the smaller the ratio Ra/Rb, the better the knee characteristics, and the ratio Ra'/Rb' in the target curve described above.
becomes extremely small.
以上のように、良いニー特性を得るということは、強い
非直線性を得るための一つの条件となり、変換効率を向
上させる上で重要な因子となるのである。As described above, obtaining good knee characteristics is one of the conditions for obtaining strong nonlinearity, and is an important factor in improving conversion efficiency.
(ii)<ギャップ電圧Vg>
ギャップ電圧Vgは、SIS接合に用いる電極層の材料
によって決定され、この電圧Vgは高い程、良いとされ
る。(ii) <Gap Voltage Vg> The gap voltage Vg is determined by the material of the electrode layer used for the SIS junction, and it is said that the higher the voltage Vg, the better.
というのも、このギャップ電圧Vgは、当該電極層材料
のェネルギ・バンド・ギャップ2△/q(q:エレクト
ロン電荷量)に相当するため、2△/q=ナ肌x・h(
h:プランク定数)より、高い程、最高動作周波数ナm
axを上げ、受信可能範囲を拡大することができるから
である。例えばミリ波帯用へテロダィン・ミクサとして
は当該ミリ波帯30〜3000世を十分な余裕をもって
カバーすることが望ましい。ミクサとしてではなくとも
、最大受信可能周波数を上げられるということは、幅広
いスペクトル分布の受信能力を持ち得るということであ
り、将来的な応用範囲の拡大に継ながるものとなる。(
iii)<ギャップ電圧Vgにおける電流密度>ギャッ
プ電圧Vgにおける電流密度(A/地)は高い方が良い
。This is because this gap voltage Vg corresponds to the energy band gap 2△/q (q: electron charge amount) of the electrode layer material, so 2△/q = Na skin x h (
h: Planck's constant), the higher the value, the higher the maximum operating frequency.
This is because it is possible to increase the ax and expand the receivable range. For example, it is desirable for a millimeter wave band heterodyne mixer to cover the millimeter wave band 30 to 3000 generations with sufficient margin. Even if it is not used as a mixer, being able to increase the maximum receivable frequency means that it has the ability to receive a wide spectrum distribution, which will lead to an expanded range of applications in the future. (
iii) <Current density at gap voltage Vg> The higher the current density (A/ground) at gap voltage Vg, the better.
例えば、第1図中でギャップ電圧Vgにおける最大電流
をlmとすると、面積パラメータ等他の条件が同一なら
ば、先の目標曲線上に示すように、電流値lmiまで探
れれば、抵抗Ra′は、より小さくなる理となる。また
、接合への入射ェネルギ範囲も拡大され、ひいてはダイ
ナミックマシーンの拡大にも継ながる。具体的には数百
A/地から1000A′の以上程度が望ましい。以上が
ミクサ等としてのアナログ用SIS素子に電気的に要請
される主たる事項であるが、先に述べたように、デジタ
ル系用のそれとは本質的に異なっている。For example, if the maximum current at the gap voltage Vg in FIG. becomes smaller. Furthermore, the range of energy incident on the junction is expanded, which in turn leads to the expansion of the dynamic machine. Specifically, it is desirable that the current is from several hundred A/ground to more than 1000 A'. The above are the main electrical requirements for analog SIS elements such as mixers, but as mentioned earlier, they are essentially different from those for digital systems.
また、1−V曲線には出ないが、デジタル系用途では、
障壁層及至両電極層間絶縁膜の誘電率にも着目され、余
りに大きいと動作速度の低下が問題となるが、本発明の
ような用途ではその絶対値は問題とされることがない。
しかし、両系に共通して要求される事項もある。Also, although it does not appear on the 1-V curve, in digital applications,
Attention is also paid to the dielectric constant of the barrier layer and the insulating film between the two electrode layers, and if it is too large, a reduction in operating speed becomes a problem, but in applications such as the present invention, its absolute value is not a problem.
However, there are some requirements that are common to both systems.
それは専ら、物理的諸特性、特に所謂熱サイクル特性乃
至温度サイクル特性である。即ち、室温と動作温度(一
般には液体ヘリウム温度4.松乃至は減圧雰囲気におい
てのそれ以下の温度)との間を何回も往復させても素子
が壊れないこと(これを温度サイクル特性が良いと言う
)が、実用上からして満足させ紬まならない重要な因子
となってくるのである。These are exclusively physical properties, in particular the so-called thermal cycling properties or temperature cycling properties. In other words, the device must not be damaged even if it is cycled many times between room temperature and operating temperature (generally liquid helium temperature 4.5 or lower in a reduced pressure atmosphere). ) is an important factor that must be satisfied from a practical point of view.
以上を総合してみると、注目すべき電気的諸特性の種類
の相異乃至特殊性から、本来的にミクサ等の用途に向く
SIS型ジョセフソン素子はそれ専用のものとして研究
、開発されて然るべきである。Taking all of the above into account, the SIS type Josephson element, which is originally suitable for uses such as mixers, has been researched and developed as a device exclusively for mixers due to the differences and special characteristics of various electrical characteristics that should be noted. It should be.
が、従来からも、物としての物理的強度がとにかくも採
れなければ実用上は無意味であることから、アナログ系
用であるとデジタル系用であるとを問わず、とりあえず
或る程度の物理的強度乃至温度サイクル特性を持つもの
の中から上記したミクサ用等としての(i)、(ii)
、(iii)の諸元を或る程度満足し得るものがないか
との比較対象研究がなされていた。こうした研究過程中
で探り上げられたものの一つに、これは本来デジタル系
用として開発されたものであるが、下部電極層としてP
b/ln(1がt%)/Au(4M%)合金を用い、こ
れを酸化してトンネル障壁層としての酸化膜を作り、そ
の上に形成する上部電極層はPb/Bi(2卵t%)合
金としたSIS型素子がある。However, it has traditionally been meaningless if the physical strength of the object cannot be achieved, so regardless of whether it is for analog or digital systems, a certain level of physical strength is required for the time being. (i) and (ii) for use in mixers, etc. mentioned above from among those with physical strength and temperature cycle characteristics.
Comparative research has been conducted to see if there is a product that can satisfy the specifications of (iii) to some extent. One of the things that was discovered during this research process was that although this was originally developed for digital systems, it was possible to use P as the lower electrode layer.
A b/ln (t% of 1)/Au (4M%) alloy is used and oxidized to form an oxide film as a tunnel barrier layer. %) There is an SIS type element made of an alloy.
この素子は、温度サイクル特性が良く、500回以上の
熱サイクルが探れることで優れているが、ギャップ電圧
Vgは約2.3mVと満足できない値であり、またAu
のため、漏洩電流が多く、良好な非直線性が得られない
という欠点がある。This element has good temperature cycle characteristics and is excellent in that it can be tested for more than 500 thermal cycles, but the gap voltage Vg is about 2.3 mV, which is an unsatisfactory value, and the Au
Therefore, there is a drawback that leakage current is large and good nonlinearity cannot be obtained.
これに対して、下部電極層にAuの含まれていないPb
/lnを用いることにより、ミクサ用として開発された
ものもあるが、これもギャップ電圧は約2.8肌Vと高
くはなく、非直線性乃至ニー特性も、既述の抵抗値Ra
/Rbを探ると、4.狐で0.15と余り小さな値では
ない。On the other hand, Pb containing no Au in the lower electrode layer
/ln has been developed for mixers, but this also has a gap voltage of about 2.8V, which is not high, and the nonlinearity or knee characteristics are also lower than the resistance value Ra mentioned above.
/Rb, 4. For foxes, the value is 0.15, which is not too small.
因みに、このPb/ln下部電極層とPb/Bi上部電
極層から成る素子の最大動作周波数を計算すると、先掲
の式Vg白2△/q=プ肌・hより、約55にHzとな
り、それ程に高い値とはならない。また、Auの入って
いない分だけ、漏洩電流も少くなってはいるが、極めて
少ないという程はない。これ等とはまた別な従来素子と
して、上下両電極層共、Pb/Bi(2卵t%)とした
素子もある。Incidentally, when calculating the maximum operating frequency of the element consisting of this Pb/ln lower electrode layer and Pb/Bi upper electrode layer, it is approximately 55 Hz from the above formula Vg white 2 △/q = Pu skin h, The value is not that high. Furthermore, the leakage current is reduced due to the absence of Au, but it is not extremely small. As another conventional element, there is also an element in which both the upper and lower electrode layers are made of Pb/Bi (2% by weight).
ビスマスBiの29重量パーセントというのは、良好な
合金を形成するために一義的に定まる値である。この素
子では、ギャップ電圧Vgは約3.4のV、従って最高
動作周波数「‘ま81昨日zとかなりなワイドレンジと
なるが、Biは寧ろ物理的強度を下げる方向に作用する
ことが判っており、現にこの素子では数回の温度サイク
ルにも耐え得ないものとなっている。29 weight percent of bismuth Bi is a uniquely determined value for forming a good alloy. In this element, the gap voltage Vg is approximately 3.4 V, and therefore the maximum operating frequency has a fairly wide range of ``'81'', but it has been found that Bi acts in the direction of lowering the physical strength. In fact, this device cannot withstand even several temperature cycles.
温度サイクルは現時点におけるミクサ実用化への過渡期
においてさえ、少くとも、十回程度は必要とされる。こ
の外、そもそも物理的強度が鉛合金系に比べて高いNb
系材料を用いたものも見られ、Nb/山下都電極層一酸
化膜一Pb/Bi上部電極層とかNb下部電極層−希±
頻酸化勝一Pb上部電極層等のSIS構造も提案されて
いるが、デジタル用としてはとも角、ミクサ等としては
いづれも電流密度が大きく探れない欠点を持っている。Temperature cycling is required at least ten times even in the current transition period for commercialization of mixers. In addition to this, Nb has higher physical strength compared to lead alloys.
Some materials are also used, such as Nb/Miyako Yamashita electrode layer monoxide film, Pb/Bi upper electrode layer, and Nb lower electrode layer.
SIS structures such as a frequently oxidized Katsuichi Pb upper electrode layer have also been proposed, but both have the disadvantage that they have a large current density and cannot be used for digital applications, mixers, etc.
どちらかと言えば、Nb系はミクサ用としては不向きで
あり、物理的強度の高さが逆に災いして微細加工作業性
を悪化させるという欠点が目立ってしまう。本発明は、
上記のように、各元素が様々な効果を引き起こす複雑に
絡み合った実情の中で、ミリ波へテロダィン・ミクサと
かビデオ・ディテクタとして既述の望ましい電気的諸特
性…、(ii)、(iii’を総て改善し、尚且つ第四
番目の目標諸元としてGの物理的強度を満足できる素子
乃至その電極層組成を提供せんとしたものである。因み
に、上記した従来例の素子では、いづれも、例え微かで
も良いから上記四つの特性総ての改善をなし得た、とい
うものは一つもなく、どれか一つは少くとも悪化させる
結果に終わっていたのである。If anything, Nb-based materials are unsuitable for use in mixers, and their high physical strength has a conspicuous drawback in that they adversely affect microfabrication workability. The present invention
As mentioned above, in the complexly intertwined situation where each element causes various effects, the desirable electrical characteristics already mentioned for millimeter wave heterodyne mixers and video detectors... (ii), (iii' The purpose of this invention is to provide an element or its electrode layer composition that can improve all of the above and satisfy the physical strength of G as the fourth target specification. However, none of the above four characteristics were improved, even if only slightly, and at least one of them ended up getting worse.
本発明SIS型素子は、端的に言えば、少くとも、下部
電極層をPb/Bi/1川組成としたものである。To put it simply, the SIS type element of the present invention has at least a lower electrode layer having a composition of Pb/Bi/1.
インジウムlnに就いては後述するが、ビスマスBiの
重量パーセントは、先に説明したように、鉛Pbと良好
な合金を形成するために2卵t%となる。以下、本発明
一実施例のSIS型ジョセフソン素子の一製作例を第2
図に即して説明する。Although indium ln will be described later, the weight percent of bismuth Bi is 2% by weight in order to form a good alloy with lead Pb, as explained above. Hereinafter, a manufacturing example of an SIS type Josephson element according to an embodiment of the present invention will be described as a second example.
This will be explained based on the diagram.
先づ、第2図Aに示すように、水晶基板等の適当な基板
1上に、所要の下部電極層用のメタル・マスク(図示せ
ず)を施し、スパッ夕蒸着装層内で真空雰囲気、室温に
てPb/Biから成る下部電極母材層2′を形成する。First, as shown in FIG. 2A, a metal mask (not shown) for the required lower electrode layer is applied on a suitable substrate 1 such as a quartz substrate, and a vacuum atmosphere is applied within the sputter deposition layer. , a lower electrode base material layer 2' made of Pb/Bi is formed at room temperature.
Pb/Bi合金のBiの重量パーセントは既述の2卵t
%である。また、層膜厚は2000△である。ここで、
下部電極“母材”層2′としたのは、この時点では、ま
だlnが導入されていないからで、将来、本発明で言う
Pb/Bi/ln下部電極層が形成される元となる層と
いう意味であり、但し、平面形状自体は所要の下部電極
層と同じにしておく。The weight percentage of Bi in the Pb/Bi alloy is
%. Further, the layer thickness is 2000Δ. here,
The lower electrode "base material" layer 2' was selected because ln has not yet been introduced at this point, and it is a layer from which the Pb/Bi/ln lower electrode layer referred to in the present invention will be formed in the future. However, the planar shape itself is the same as that of the required lower electrode layer.
次に、第2図B‘こ示すように、上記のPb/Bi層2
′上に、真空を被ることなく、同じスバッタ蒸着装置で
loo乃至200へのln層3′を形成する。Next, as shown in FIG. 2B', the above Pb/Bi layer 2
On top of ', an ln layer 3' from loo to 200 is formed in the same sputter deposition apparatus without applying a vacuum.
この層3′を、第2図Cに示すように乾燥酸素02の雰
囲気に基板温度室温で数時間、晒すと、酸化膜3として
の酸化インジウム層が得られる。同時に、この酸化工程
において、lnが下地層2′内に拡散するものと考えら
れ、結果として所要のPb/Bi/ln下部電極層2が
形成されている。より実質的には、Pb/Bi層2′の
比較的表面に近い領域面がPb/Bi/IJ員2を構成
していると考えることができる。その後、上部電極用の
マスクを施した後、Pb/Bi(29の%)から成る層
膜厚約2000Aの上部電極層4を形成し、第2図Dの
ようにSIS接合部5を形成した。When this layer 3' is exposed to an atmosphere of dry oxygen 02 at a substrate temperature of room temperature for several hours as shown in FIG. 2C, an indium oxide layer as the oxide film 3 is obtained. At the same time, it is thought that ln diffuses into the base layer 2' during this oxidation step, and as a result, the required Pb/Bi/ln lower electrode layer 2 is formed. More practically, it can be considered that the area plane relatively close to the surface of the Pb/Bi layer 2' constitutes the Pb/Bi/IJ member 2. Thereafter, after applying a mask for the upper electrode, an upper electrode layer 4 made of Pb/Bi (29%) with a thickness of about 2000 Å was formed, and an SIS junction 5 was formed as shown in FIG. 2D. .
本発明ジョセフィン素子10は、SIS接合部5に上述
した特徴、殊に少くとも下部電極層のPb/Bi/ln
組成を持てば良いが、より実際的に、例えばミリ波へテ
ロダインの他励ミクサ素子として応用する場合には、上
下両電極層2,4の中、少なくとも一方において、第3
図の平面図に示すように、上記した接合部5から出力端
子面部6に至る露路部分8に、キヤパシタンス及びィン
ダクタンスから成るフィルタ部7を幾何形態の調整によ
り所要の値として設けると良い。The Josephine device 10 of the present invention has the above-mentioned features in the SIS junction 5, especially Pb/Bi/ln of at least the lower electrode layer.
However, in more practical applications, for example, as a separately excited mixer element for millimeter-wave heterodyne, at least one of the upper and lower electrode layers 2 and 4 has a
As shown in the plan view of the figure, a filter section 7 consisting of capacitance and inductance may be provided in the open circuit section 8 extending from the above-mentioned joint section 5 to the output terminal surface section 6 to a desired value by adjusting the geometry.
このようにすれば、中間周波のみを出力端子6,6間に
採り出すことができ、第3図の素子10‘ま一つのミク
サ・セルとなる。In this way, only the intermediate frequency can be extracted between the output terminals 6, 6, and the element 10' of FIG. 3 becomes a single mixer cell.
但し、フィルタ部7は図示の場合、双方の電極層2,4
の電路部分8に設けられているが、いづれか一方のみで
も良い。第3図中のローロ線に沿う接合部5の断面が第
2図Dに示す断面構造に相当し、また、第3図示の平面
図形においては、接合部5は両電極層2,4の先端のナ
イフエッヂ状の重なり部分となっており、その重なり面
積、即ち接合面積は、本出願人の製作例では3〜12ム
めである。However, in the case shown, the filter section 7 is connected to both electrode layers 2 and 4.
Although it is provided in the electric circuit portion 8 of , it is also possible to provide only one of them. The cross section of the joint 5 along the Rollo line in FIG. 3 corresponds to the cross-sectional structure shown in FIG. 2D, and in the plan view shown in FIG. This is a knife edge-shaped overlapping portion, and the overlapping area, that is, the joint area is 3 to 12 mm in the example manufactured by the present applicant.
また、図示はしていないが、基板1と出力断面部6,6
間にはクロム接点面層を設ける等しても良い。本素子1
0乃至ミクサ・セル10は、第4図示のように、公知通
常のミリ波導波管11内に裾付けて用いることができる
。Also, although not shown, the substrate 1 and the output cross-section portions 6, 6
A chrome contact surface layer may be provided between them. This element 1
The mixer cells 0 to 10 can be used by being fitted inside a conventional millimeter wave waveguide 11, as shown in FIG.
導波管11には公知構造を援用して、通常、備えられる
ショート・プランジヤ12やチューニング・スタブ13
………等も併示し、また、本素子10は要部のみで基板
を省略して示しているが、こうした構成において、導波
管11内にミリ波入力角周波数信号のi(一般にはのi
=のs−の。を得ることができる。而して、上記製作例
に応じた本発明素子10の接合部5の特性に就き言及し
ていくと、以下のような好結果に至る。電流密度は上記
製作例ではインジウム層を10分間、約2momの環境
下で酸化すると、約1000A/嫌は採れ、種々な条件
を探ったとしても、少くとも250A/のという十分な
値から最大では1600A/地に及び、完全に満足でき
る範囲を得ることができる。The waveguide 11 is usually equipped with a short plunger 12 and a tuning stub 13 using a known structure.
In addition, only the essential parts of the device 10 are shown with the substrate omitted, but in such a configuration, the millimeter wave input angular frequency signal i (generally no i
='s-'s. can be obtained. Now, referring to the characteristics of the joint portion 5 of the device 10 of the present invention according to the above manufacturing example, the following favorable results are reached. In the above production example, when the indium layer is oxidized for 10 minutes in an environment of about 2 mom, a current density of about 1000 A/N can be obtained, and even if various conditions are explored, the current density is at least 250 A/N, which is a sufficient value, but it cannot reach the maximum. It is possible to obtain a completely satisfactory range of up to 1600 A/ground.
第5図は、十分ではあるが本発明素子の中では比較的低
い電流密度25船/地の素子(接合部面積6れで:各層
厚は既述の通り)を、液体ヘリウム温度と室温間で十回
、往復させた後に採ったデータで、このデータが採れた
こと自体、温度サイクル特性も決して損なわれていない
ことが裏付けられるが、更に電気的特性を精査すると次
のことが言える。Figure 5 shows a device with a sufficient but relatively low current density among devices of the present invention (with a junction area of 6; each layer thickness is as described above) between liquid helium temperature and room temperature. The fact that this data was obtained after cycling back and forth 10 times confirms that the temperature cycle characteristics have not been impaired in any way, but further examination of the electrical characteristics reveals the following.
先づ、本発明素子自体における動作温度に関する相対的
な関係としては、実線で示す4.弧の時のカーブよりも
仮想線で示す氷の動作温度下での特性が優れていること
は顕らかで、班における1−V曲線は見事である。First, the relative relationship regarding the operating temperature of the device of the present invention itself is shown by the solid line 4. It is obvious that the characteristics under the operating temperature of ice shown by the imaginary line are better than the curve at the time of arc, and the 1-V curve at the group is excellent.
一般的にも、動作温度は低い方が良好な特性を示す。冒
頭に述べた従来例との比較のために、今度は具体的数値
例を挙げてみると、本例のギャップ電圧は約3.4のV
と極めて良好な値である。In general, the lower the operating temperature, the better the characteristics. For comparison with the conventional example mentioned at the beginning, let's take a concrete numerical example.The gap voltage in this example is about 3.4V.
This is an extremely good value.
従釆例でも、Pb/B:下部電極層素子では、やはりこ
の程度の値が孫れてはいたが温度サイクル特性が問題に
ならない程、悪かったことは既述した。逆に、温度サイ
クル特性が或る程度満足できる従来例素子のギャップ電
圧に比せば、本発明素子では約15〜30%の改善率と
なっている。このギャップ電圧に基づく最高動作周波数
ナMxを求めると、先掲の式より約81の世となって完
全に満足すべき値が得られる。As mentioned above, in the related example, the Pb/B: lower electrode layer element had a value of this level, but the temperature cycle characteristics were so bad that they were not a problem. On the other hand, compared to the gap voltage of the conventional element whose temperature cycle characteristics are satisfactory to some extent, the element of the present invention has an improvement rate of about 15 to 30%. When determining the maximum operating frequency Mx based on this gap voltage, it is approximately 81 from the above equation, which is a completely satisfactory value.
次に、ニー特性乃至非直線性はどうかと言えば、既述し
た所でギャップ電圧Vgからの偏差電圧△Vを0.5の
Vとして、Vg(3.4wV)土△V(0.5mV)の
所で探った抵抗値(直流抵抗分)Ra,Rbの比Ra/
Rbを求めると、4.がでもRa/Rb(4.が)=0
.06と優れた値を示し、氷ではRa/Rb(松)=0
.013と極めて優れた値となる。Next, regarding knee characteristics or nonlinearity, as mentioned above, assuming that the deviation voltage △V from the gap voltage Vg is 0.5 V, Vg (3.4 wV) and △V (0.5 mV) ) The ratio of the resistance value (DC resistance) Ra and Rb found at
When calculating Rb, 4. Gabut Ra/Rb (4. Ga) = 0
.. Shows an excellent value of 06, and on ice Ra/Rb (pine) = 0
.. 013, which is an extremely excellent value.
尚、本例の素子の等価常導電抵抗は1400とミクサと
して用いた場合のインピーダンス整合性も十分にある。
上述のように、この第5図示のデータは、既に十回の温
度サイクルを経ているが、サイクル数をパラメータとし
て上述の素子の1一V曲線を探ると、第6図示のように
なる。Note that the equivalent normal conductive resistance of the element of this example is 1400, which provides sufficient impedance matching when used as a mixer.
As mentioned above, the data shown in Figure 5 has already undergone ten temperature cycles, but when the 11V curve of the above-mentioned element is examined using the number of cycles as a parameter, it becomes as shown in Figure 6.
この測定は、この素子が第4図示のような実際の装置内
の構成子として組まれた場合の状況にできるだけ近いも
のとなるように勘案して行った。This measurement was carried out with consideration given to the situation as close as possible to the situation when this element is assembled as a component in an actual device as shown in FIG.
サンプルホルダ中にヘリウムガスを満たし、本素子を密
封した。ヘリウムガスは液体ヘリウム中にホルダごと浸
潰した時に素子と液体ヘリウムとが熱結合するように図
るために充填された。先づこの状態で、測定に先立ち、
密封庫内一8℃の温度下で6日間、保存した。第6図中
、円で囲った数字がサイクル回数で、それが示す曲線が
そのサイクル回転後の1−Vカーブであるが、11回の
サイクルを二週間に亘つて行なった。途中で適宜、ヘリ
ウムガスの排気をし、大気環境に素子を触れさせてもい
るし、また液体ヘリウムに直接させてもいる。而して、
第6図示のデータによれば、最初の数サイクルでは抵抗
値が減少し、その後増加した後、10回目から11回目
においては再び減少している。The sample holder was filled with helium gas and the device was sealed. Helium gas was filled in to ensure thermal coupling between the device and liquid helium when the holder was immersed in liquid helium. Before starting the measurement,
It was stored for 6 days at a temperature of -8°C in a sealed warehouse. In FIG. 6, the circled numbers are the number of cycles, and the curve shown by the circle is the 1-V curve after the cycle rotation, and 11 cycles were performed over two weeks. During the process, the helium gas is pumped out to expose the element to the atmospheric environment, or it is exposed directly to liquid helium. Then,
According to the data shown in FIG. 6, the resistance value decreases during the first few cycles, then increases, and then decreases again from the 10th to the 11th cycle.
このように、1一V曲線は厳密には完全に安定ではない
が、その変化は全く微力であり、他の従来例に比しても
十分に小さなものである。In this way, strictly speaking, the 11V curve is not completely stable, but its changes are very slight and are sufficiently small compared to other conventional examples.
第7図は、本発明による他の実施例素子の第5図同機の
1−V曲線であるが、この素子では、動作温度2.狐に
おいて、接合面積10A〆で電流密度1000A/地、
ギャップ電圧約3.45肌V、ニー特性Ra/Rb(2
.松)=0.043、等価抵抗220と、これまた十分
な値が得られる。FIG. 7 is a 1-V curve of the device shown in FIG. 5 of another example device according to the present invention, but in this device, the operating temperature is 2. In fox, the current density is 1000A/ground with a junction area of 10A,
Gap voltage approximately 3.45 skin V, knee characteristics Ra/Rb (2
.. pine) = 0.043 and equivalent resistance of 220, which are also sufficient values.
ところで、本発明においての下部電極層2にあって、l
nの含有量をどの程度の範囲に探るかということである
が、温度サイクル特性を始め電気的諸特性のどれ一つを
も大きく損うことがないという本発明の基本的効果を全
うするには、本発明者の研究、実験によれば約1〜1肌
t%の範囲と言うことができる。By the way, in the lower electrode layer 2 in the present invention, l
The question is what range should the n content be in order to achieve the basic effect of the present invention, which is not to significantly impair any of the electrical properties including the temperature cycle properties. According to the research and experiments of the present inventors, it can be said that the range is approximately 1 to 1 t% of the skin.
余りにlnが多過ぎると、Pb−Biの結合よりもPb
−lnの関係が強くなり、先に述べたPb/ln系の従
来例の欠点が出始めるからである。If there is too much ln, Pb
This is because the -ln relationship becomes stronger and the drawbacks of the Pb/ln-based conventional example described above begin to appear.
また、上記した実施例では、上部電極層はPb/Biで
あって、lnを含まないが、Pb/Bi合金系であれば
lnは勿論、他の元素を含んでいて良い。Further, in the above embodiment, the upper electrode layer is made of Pb/Bi and does not contain ln, but if it is based on a Pb/Bi alloy, it may contain ln as well as other elements.
というのも、下部電極層はその後の様々な素子製作上の
各素工程に耐えねばならないが、殆ど最後に形成される
上部電極層はその必要がないからである。This is because, while the lower electrode layer must withstand various subsequent elemental steps in manufacturing the device, the upper electrode layer, which is formed almost last, does not need to do so.
逆に言えば、素子製作工程中に何等かの悪影響を下部電
極層が受けると、素子完成後にその温度サイクルに問題
が出てくるということだからである。これは従来例の開
発過程を見ても顕らかである。ともかくも、本発明によ
れば、ミリ波へテロダィン・ミクサとかビデオ・ディテ
クタ等として要求される電気的諸特性及び物理的特性の
中、そのいずれの一つもの擬性なく、バランスの孫れた
SIS型ジョセフソン素子が提供できることは因より、
望めば極めて改善率の高い特性の素子を得ることができ
、従来では全く達し得なかった極めて顕著な効果を呈す
るものである。Conversely, if the lower electrode layer is affected by any adverse effects during the device manufacturing process, problems will arise in the temperature cycle after the device is completed. This is obvious even when looking at the development process of conventional examples. In any case, according to the present invention, none of the electrical and physical characteristics required for millimeter-wave heterodyne mixers, video detectors, etc. are pseudo-viral, and a balance is achieved. The fact that the SIS type Josephson element can be provided is due to the fact that
If desired, it is possible to obtain an element with extremely high improvement rate of characteristics, and it exhibits an extremely remarkable effect that has not been achieved in the past.
第1図はSIS型ジョセフソン・トンネル接合素子の各
要求諸特性を説明するための電流−電圧曲線による説明
図、第2図は本発明素子の製作工程の説明図、第3図は
ミクサ用とした本発明一実施例素子の平面図、第4図は
同じく第3図示の素子の使用例の要部破砕した斜視図、
第5図は第一実施例素子の電気的特性の説明図、第6図
は同じく電気的特性に化体した物理的特性の説明図、第
7図は第二実施例素子の第5図同様の説明図である。
図中「 2は下部電極層、3は絶縁層乃至酸化膜、4は
上部電極層、5はジョセフソン・トンネル接合部、10
は全体としての素子である。
第1図第3図
第2A図
第2B図
第2C図
第2D図
第4図
第5図
第6図
第7図Figure 1 is an explanatory diagram using current-voltage curves to explain the required characteristics of the SIS type Josephson tunnel junction element, Figure 2 is an explanatory diagram of the manufacturing process of the device of the present invention, and Figure 3 is for mixers. FIG. 4 is a plan view of a device according to an embodiment of the present invention, and FIG. 4 is a perspective view of an example of use of the device shown in FIG.
FIG. 5 is an explanatory diagram of the electrical characteristics of the device of the first embodiment, FIG. 6 is an explanatory diagram of the physical characteristics that are also converted into electrical characteristics, and FIG. 7 is the same as FIG. 5 of the device of the second embodiment. FIG. In the figure, 2 is a lower electrode layer, 3 is an insulating layer or oxide film, 4 is an upper electrode layer, 5 is a Josephson tunnel junction, 10
is the element as a whole. Figure 1 Figure 3 Figure 2A Figure 2B Figure 2C Figure 2D Figure 4 Figure 5 Figure 6 Figure 7
Claims (1)
セフソン・トンネル接合素子において、上部電極性はP
_bとB_iの合金系材料とすると共に、下部電極層は
P_bとB_iの合金材料にI_nを含ませて成ること
を特徴とするジヨセフソン・トンネル接合素子。1 In a Josephson tunnel junction device in which an insulating film is sandwiched between a pair of upper and lower superconductor electrode layers, the upper polarity is P.
A Josephson tunnel junction device characterized in that the lower electrode layer is made of an alloy material of P_b and B_i and I_n is included in the alloy material of P_b and B_i.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57091824A JPS603797B2 (en) | 1982-05-29 | 1982-05-29 | Josephson tunnel junction device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57091824A JPS603797B2 (en) | 1982-05-29 | 1982-05-29 | Josephson tunnel junction device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58209175A JPS58209175A (en) | 1983-12-06 |
| JPS603797B2 true JPS603797B2 (en) | 1985-01-30 |
Family
ID=14037359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57091824A Expired JPS603797B2 (en) | 1982-05-29 | 1982-05-29 | Josephson tunnel junction device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS603797B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6993719B1 (en) | 2000-02-11 | 2006-01-31 | Sony Corporation | System and method for animated character photo-editing interface and cross-platform education icon |
| US7136528B2 (en) | 2000-02-11 | 2006-11-14 | Sony Corporation | System and method for editing digital images |
| US7262778B1 (en) | 2000-02-11 | 2007-08-28 | Sony Corporation | Automatic color adjustment of a template design |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8800857A (en) * | 1988-04-05 | 1989-11-01 | Philips Nv | APPARATUS AND METHOD FOR MANUFACTURING AN APPARATUS |
-
1982
- 1982-05-29 JP JP57091824A patent/JPS603797B2/en not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6993719B1 (en) | 2000-02-11 | 2006-01-31 | Sony Corporation | System and method for animated character photo-editing interface and cross-platform education icon |
| US7136528B2 (en) | 2000-02-11 | 2006-11-14 | Sony Corporation | System and method for editing digital images |
| US7262778B1 (en) | 2000-02-11 | 2007-08-28 | Sony Corporation | Automatic color adjustment of a template design |
| US7538776B2 (en) | 2000-02-11 | 2009-05-26 | Sony Corporation | Automatic color adjustment of a template design |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58209175A (en) | 1983-12-06 |
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